CN202512297U - Projection optical system - Google Patents
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- CN202512297U CN202512297U CN2012201712387U CN201220171238U CN202512297U CN 202512297 U CN202512297 U CN 202512297U CN 2012201712387 U CN2012201712387 U CN 2012201712387U CN 201220171238 U CN201220171238 U CN 201220171238U CN 202512297 U CN202512297 U CN 202512297U
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Abstract
The utility model provides a projection optical system used for imaging a graphic within an object plane into an image plane, wherein the projection optical system comprises a front group, an aperture diaphragm and a back group in a direction of an optical axis. The front group comprises a first lens group, a second lens group and a third group; the first lens group and the third lens group are provided with positive focal power; the second lens group is provided with negative focal power; the back group comprises a fourth lens group, a fifth lens group and sixth lens group; the fourth lens group and the sixth lens group are provided with positive focal power; the fifth lens group is provided with negative focal power; and the front group and the back group are symmetric to each other relative to the aperture diaphragm and satisfy a certain relational expression. Through the adoption of the projection optical system provided by the utility model, each aberration can be effectively corrected, the dimension of an image view field can be enlarged and imaging quality can be improved; moreover, as the aperture of a lens is small and no aspherical lens is included, the machining, detecting, assembling and calibrating difficulty and cost are greatly reduced.
Description
Technical field
The utility model relates to a kind of projection optical system, and particularly a kind of symmetrical expression double-telecentric projection optical system is mainly used in etching system and photomechanical projection optical systems such as semiconductor, solar cell, liquid crystal, printed circuit board (PCB).
Background technology
Along with the development of projection lithography technology, the performance of projection optical system progressively improves, and projection optical system has gone for multiple fields such as circuit manufacturing.The projection lithography technology also can be used for more large tracts of land, big depth of focus, technical fields such as the semiconductor of higher yields, solar cell, liquid crystal, printed circuit board (PCB).
Yet in the prior art, like U.S. Pat 6,879; 383 (day for announcing: on April 12nd, 2005), employing refraction reflection configuration, overall dimensions is big; Optical glass material is required very strictness, the processing of especially bigbore concave mirror, detection technique requires very strict.The size in the visual field, operating distance, dress school requirement, aspects such as manufacturing cost have advantage not as the total refraction system.
Chinese patent CN98113037.2 (the day for announcing: be the double gauss optical system of a kind of picture Fang Yuanxin on July 23rd, 2003); Because this patent adopts 2 cemented surfaces; In the projection lithography equipment of high yield, lens adhesive can produce very big distortion even sex change, causes the optical imagery performance to reduce; Shorten the serviceable life of projection lens, do not meet the photoetching technique requirement.
In view of this, a kind of not only economy is provided but also has that good quality guarantees, big field size; The projection optical system of big depth of focus; And improving the operating distance of projection optical system, for worktable and mask stage provide bigger design space, is the important technology problem of industry.
The utility model content
To the deficiency of prior art, the purpose of the utility model is to provide a kind of projection optical system, and it not only can enlarge picture side's field size effectively, and has bigger operating distance, and favorable imaging quality and disposition far away are to reach application request.
For solving the problems of the technologies described above; The utility model adopts following technical scheme: a kind of projection optical system, be used for the pattern imaging in the object plane in the picture plane, and said projection optical system comprises preceding group, aperture diaphragm and back group along its optical axis direction; Wherein, Group comprises the first mirror group, the second mirror group and the 3rd mirror group before said, and said first mirror group and the 3rd mirror group have positive light coke, and the said second mirror group has negative power; The said second mirror group is between said first mirror group and the 3rd mirror group, and the said first mirror group is between the said object plane and the second mirror group; Said back group comprises the 4th mirror group, the 5th mirror group and the 6th mirror group; Said the 4th mirror group and the 6th mirror group have positive light coke; Said the 5th mirror group has negative power; Said the 5th mirror group is between said the 4th mirror group and the 6th mirror group, and said the 6th mirror group is between said picture plane and the 5th mirror group; Group is organized about said aperture diaphragm symmetry with the back before said, and described projection optical system satisfies:
Relational expression 1:0.2＜f1/fa＜1.4;
Relational expression 2:-0.4＜f2/fa＜-0.06;
Relational expression 3:0.12＜f3/fa＜0.6,
Wherein, f1: the combined focal length of the first mirror group; F2: the combined focal length of the second mirror group; F3: the combined focal length of the 3rd mirror group; Fa: preceding group combined focal length.
Preferably, in above-mentioned projection optical system, the said first mirror group comprises first lens and second lens, and said first lens and second lens are biconvex lens.
Preferably, in above-mentioned projection optical system, the said second mirror group comprises the 3rd lens and the 4th lens, and said the 3rd lens have negative power, and said the 3rd lens comprise a concave surface towards said picture plane; Said the 4th lens have negative power, and said the 4th lens comprise a concave surface towards said object plane.
Preferably, in above-mentioned projection optical system, said the 3rd mirror group comprises the 5th lens and the 6th lens, and said the 5th lens have positive light coke, and said the 6th lens have positive light coke.
Preferably, in above-mentioned projection optical system, described projection optical system satisfies:
Relational expression 4:-2.0＜r1/r2＜-0.5;
Relational expression 5:1.0＜r3/r2＜2.0,
Wherein, r1: the radius-of-curvature of the concave surface of said the 3rd lens; R2: the radius-of-curvature of the concave surface of said the 4th lens; R3: the radius-of-curvature that the absolute value in the curved surface of the 3rd mirror group is minimum.
Preferably, in above-mentioned projection optical system, the lens numbers in the said projection optical system is more than or equal to 10, and smaller or equal to 20.
Preferably, in above-mentioned projection optical system, the absolute value of the radius-of-curvature of the rarest 2 curved surfaces equates in the lens of the said first mirror group.
Preferably, in above-mentioned projection optical system, the combination back focus of said preceding group is positioned at the center of said aperture diaphragm, and the combination front focus of said back group is positioned at the center of said aperture diaphragm.
The beneficial effect of the utility model: the utility model compared with prior art has advantage: 1, the projection optical system of the utility model adopts and has the positive light coke first mirror group, has the negative power second mirror group and have positive light coke the 3rd mirror group structure; Therefore have big field size, the advantage of long reach; 2, the projection optical system of the utility model adopts the second smaller mirror group of caliber size; The focal length distribution structure of the 3rd mirror group, the 4th mirror group and the 5th mirror group; And do not introduce aspherical lens, thereby reduced the processing of camera lens, the difficulty and the cost in test and dress school.3, the projection optical system of the utility model adopts the total refraction structure of symmetrical expression, and aberration such as the correcting astigmatism and the curvature of field improves image quality effectively.
Description of drawings
Shown in Figure 1 is the structural representation of projection optical system in the utility model embodiment;
Shown in Figure 2 is the transport function MTF synoptic diagram of projection optical system among Fig. 1.
Embodiment
Describe below in conjunction with the preferred embodiment of accompanying drawing, should be appreciated that preferred embodiment described herein only is used for explanation and explains the utility model, and be not used in qualification the utility model the utility model.
The utility model embodiment provides a kind of projection optical system; This projection optical system is a symmetrical structure; Promptly comprise preceding group, aperture diaphragm and back group in order from object plane one side, and preceding group with the lens constituent element of back group with described aperture diaphragm be plane of symmetry optical texture fully symmetry (the surface curvature radius, symmetry equivalent at interval; The optical material symmetry is consistent), enlargement ratio is-1.Before combination back focus and the combination front focus of back group of group overlap, and overlaps with the aperture diaphragm center, constitute two far optical textures of the hearts.Two telecentric optics structures are at object plane and place, picture plane; Because the light cone center line is vertical with the picture plane with object plane; The imaging light cone center line of object space and image space is that chief ray is parallel to optical axis, does not change along moving of optical axis direction along with object plane with as the plane so guaranteed enlargement ratio.Like this, even object plane and departed from focal plane as the plane is still constant at the height perpendicular to thing on the optical axis direction and picture, so enlargement ratio can not change.
Join shown in Figure 1ly, projection optical system is made up of preceding group 30 12 lens with back group 40 totally.Six mirror groups that are divided into G1～G6 successively.From object plane 10 1 sides is the first mirror group G1 with positive light coke in order, the second mirror group G2 of negative power, the 3rd mirror group G3 of positive light coke; Aperture diaphragm 50; The 4th mirror group G4 of positive light coke, the 5th mirror group G5 of negative power, the 6th mirror group G6 of positive light coke.
The first mirror group G1 comprises the first lens L1 and the second lens L2 with positive light coke; The first lens L1 and the second lens L2 are biconvex lens; It mainly acts on is to keep the telecentric beam path structure, simultaneously comprehensive spherical aberration and the astigmatism that produces of a plurality of lens of the balance second mirror group G2.
The second mirror group G2 comprises the 3rd lens L3 and the 4th lens L4 with negative power.Wherein, the 3rd lens L3 has a concave surface in the face of picture plane 20, and the radius-of-curvature of this concave surface is r1; The 4th adjacent lens L4 has a concave surface towards object plane, and the radius-of-curvature of this concave surface is r2.The second mirror group G2 significant feature is to produce the positive spherical aberration and the positive curvature of field.In other embodiments, the second mirror group G2 has the negative power lens by 2 to form at least, and comprises one in the face of the concave surface of image planes and the adjacent next one concave surface towards object plane.
The 3rd mirror group G3 comprises the 5th lens L5 and the 6th lens L6 with positive light coke; Main effect is the spherical aberration and the curvature of field of the balance second mirror group G2; Two lens (the 5th lens L5 and the 6th lens L6) with positive light coke can be shared focal power simultaneously, avoid producing the too much high-order spherical aberration and the senior curvature of field.
The 4th mirror group G4 and the 3rd mirror group G3 are about aperture diaphragm 50 symmetries; Comprise the 7th lens L7 and the 8th lens L8 with positive light coke; Main effect is the spherical aberration and the curvature of field of balance the 5th mirror group G5; Two lens (the 7th lens L7 and the 8th lens L8) with positive light coke can be shared focal power simultaneously, avoid producing the too much high-order spherical aberration and the senior curvature of field.
The 5th mirror group G5 and the second mirror group G2 comprise the 9th lens L9 and the tenth lens L10 with negative power about aperture diaphragm 50 symmetries, and wherein the 9th lens L9 has a concave surface in the face of the picture plane, and the radius-of-curvature of this concave surface is r2; The tenth adjacent lens L10 has a concave surface towards object plane, and the radius-of-curvature of this concave surface is r1.The main effect of the 5th mirror group G5 is to produce the positive spherical aberration and the positive curvature of field.In other embodiments, the 5th mirror group G5 has the negative power lens by 2 to form at least, and comprises one in the face of the concave surface of image planes and the adjacent next one concave surface towards object plane.
The 6th mirror group G6 and the first mirror group G1 are about aperture diaphragm 50 symmetries; Comprise the 11 lens L11 and the 12 lens L12 with positive light coke; The 11 lens L11 and the 12 lens L12 are biconvex lens; Main effect is to keep the telecentric beam path structure, simultaneously comprehensive spherical aberration and the astigmatism that produces of a plurality of lens of balance the 5th mirror group G5.
L1 among the first mirror group G1 and L2 respectively with the 6th mirror group G6 in L12 and L11 be symmetrical in aperture diaphragm 50.
L3 among the second mirror group G2 and L4 respectively with the 5th mirror group G5 in L10 and L9 be symmetrical in aperture diaphragm 50.
L5 among the 3rd mirror group G3 and L6 respectively with the 4th mirror group G4 in L8 and L7 be symmetrical in aperture diaphragm 50 respectively.
Like this, the preceding group 30 individual lens combination with back group 40 be plane of symmetry optical texture symmetry fully with aperture diaphragm 50, perpendicular to the aberration of optical axis: coma, distort, ratio chromatism, is zero from NMO correction.
Projection optical system among the utility model embodiment satisfies following relational expression:
Relational expression 1:0.2＜f1/fa＜1.4;
Relational expression 2:-0.4＜f2/fa＜-0.06;
Relational expression 3:0.12＜f3/fa＜0.6,
Wherein, f1: the combined focal length of the first mirror group; F2: the combined focal length of the second mirror group; F3: the combined focal length of the 3rd mirror group; Fa: preceding group combined focal length.
The main effect of relational expression 1 is to keep the telecentric beam path structure; Make the first mirror group G1 produce an amount of spherical aberration and astigmatism with comprehensive spherical aberration and the astigmatism that produces of a plurality of lens of the balance second mirror group G2; Keep a plurality of aperture of lens sizes of the second mirror group G2 and the 3rd mirror group G3 smaller simultaneously; Reduce the processing of whole camera lens, the difficulty and the cost in test and dress school.
The main effect of relational expression 2 is to make the second mirror group G2 produce enough positive spherical aberrations and the positive curvature of field, the negative spherical aberration and the negative curvature of field that balance first mirror group G1 and the 3rd mirror group G3 produce.
The main effect of relational expression 3 is to make the 3rd mirror group G3 produce an amount of spherical aberration and the curvature of field with the comprehensive spherical aberration and the curvature of field that produces of a plurality of lens of the balance second mirror group G2, and the combination back focus of group is positioned at the center of aperture diaphragm 50 before keeping simultaneously.
The projection optical system of the utility model also satisfies following relational expression:
Relational expression 4:-2.0＜r1/r2＜-0.5,
Relational expression 5:1.0＜r3/r2＜2.0,
Wherein, r1: the radius-of-curvature of the concave surface of said the 3rd lens; R2: the radius-of-curvature of the concave surface of said the 4th lens; R3: the radius-of-curvature that the absolute value in the curved surface of the 3rd mirror group is minimum.
The main effect of relational expression 4 is to make two curved surfaces with negative power of the second mirror group G2 suitably share focal power; Avoid producing the too much high-order spherical aberration and the senior curvature of field; And make elementary spherical aberration, and high-order spherical aberration, the elementary curvature of field and the senior curvature of field can obtain well-corrected simultaneously.
The main effect of relational expression 5 is to make the 3rd mirror group G3 produce the suitable high-order spherical aberration and the senior curvature of field, the positive high-order spherical aberration and the just senior curvature of field that the balance second mirror group G2 produces.
The projection optical system of the utility model is by more than 10 or 10, when the lens below 20 or 20 constitute; Both can proofread and correct elementary and senior spherical aberration well; Coma, astigmatism, each item aberrations such as the curvature of field and distortion; Can reduce the processing of camera lens again, the difficulty and the cost in test and dress school.
The projection optical system of the utility model; Have in the lens of the first mirror group G1 when 2 perhaps the absolute value of the radius-of-curvature of the curved surface more than 2 equates, promptly can proofread and correct each item aberration well, can reduce the processing of camera lens again; The cost in test and dress school, especially just current cost.
The symmetrical expression double-telecentric projection optical system of the utility model, preceding group 30 combination back focus is positioned at the center of aperture diaphragm 50; The combination front focus of back group 40 is positioned at the center of aperture diaphragm 50, and main effect is to constitute two telecentric beam path structures, makes vertical axial aberration: coma, and distortion, ratio chromatism, is zero from NMO correction.
The design parameter of the projection optical system among the utility model embodiment is as shown in table 1, and operation wavelength is 365nm, highly is 102mm as square half field-of-view, owing to be symmetrical structure, the operating distance of object space and picture side is 175.42mm.For optics processing, the convenience of optical check and reducing cost, all optical elements of the utility model are sphere, have no non-spherical element.
Table 1
| Operation wavelength | 365nm |
| Picture number formulary value aperture NA | 0.07 |
| Visual field, picture side (radius) | 102mm |
| Enlargement ratio | -1 |
| Object space work distance | 175.4228mm |
| Picture side's work distance | 175.4228mm |
Table 2 has provided the concrete parameter value of each sheet eyeglass of the projection optical system of present embodiment.Wherein " sequence number " hurdle is represented from object plane to each the surperficial pairing sequence number the picture plane; Indicate from object plane to each the surperficial pairing eyeglass the picture plane on " affiliated object " hurdle; " radius " hurdle provided each surface the radius-of-curvature of corresponding sphere; " thickness/spacing " hurdle has provided the axial distance between adjacent two surfaces; If these two surfaces belong to same eyeglass; Then the center thickness of this eyeglass of numeric representation of " thickness/spacing " arrives the distance of eyeglass or the airspace of adjacent mirror otherwise the expression object plane perhaps looks like the plane; " optical material " hurdle represent the material of corresponding eyeglass; " semiaperture " hurdle represent 1/2 aperture value on corresponding surface.
Except that eyeglass, also be provided with aperture diaphragm STOP between eyeglass L6 and the L7, the change of its 1/2 aperture size can influence the imaging effect of this projection optical system.
Table 2
Table 3 has provided the relational expression result of calculation of the symmetrical expression double-telecentric projection optical system of present embodiment, from result of calculation, can find out, the utility model can satisfy relational expression (1) effectively to relational expression (5).
Table 3
| Relational expression 1 | f1/fa＝0.55 |
| Relational expression 2 | f2/fa＝-0.15 |
| Relational expression 3 | f3?/fa＝0.28 |
| Relational expression 4 | r1/r2＝-1.14 |
| Relational expression 5 | r3/r2＝1.24 |
Join shown in Figure 2ly, be the transport function MTF synoptic diagram of projection optical system among Fig. 1, the image quality of the projection optical system of reflection the utility model.As can be seen from Figure 2, the utility model can obtain high imaging quality effectively in the radius 102mm gamut of visual field, picture side.When operation wavelength was 365nm, the analysis result of professional optical design software showed that its wave aberration WFE (RMS) is 1/30th of operation wavelength.When operating wavelength range during at 362～368nm, its wave aberration WFE (RMS) is 1/28th of an operation wavelength.
The projection optical system of the utility model under the condition of long reach, in the gamut of visual field, picture side, has been proofreaied and correct spherical aberration effectively; Coma, astigmatism, the curvature of field; Distortion and each item aberration such as aberration have been compressed the second mirror group in the middle part of the camera lens, the 3rd mirror group effectively; The caliber size of the 4th mirror group and the 5th mirror group has reduced the processing of camera lens, the difficulty and the cost in test and dress school.Be enough to the technical requirement of satisfied 8 inches large area lithography equipment.
In sum; The beneficial effect of the utility model is: 1, the projection optical system of the utility model adopts and has the positive light coke first mirror group, has the negative power second mirror group and have positive light coke the 3rd mirror group structure; Therefore have big field size, the advantage of long reach; 2, the projection optical system of the utility model adopts the second smaller mirror group of caliber size; The focal length distribution structure of the 3rd mirror group, the 4th mirror group and the 5th mirror group; And do not introduce aspherical lens, thereby reduced the processing of camera lens, the difficulty and the cost in test and dress school.3, the projection optical system of the utility model adopts the total refraction structure of symmetrical expression, and aberration such as the correcting astigmatism and the curvature of field improves image quality effectively.
What should explain at last is: the above is merely the preferred embodiment of the utility model; Be not limited to the utility model; Although the utility model has been carried out detailed explanation with reference to previous embodiment; For a person skilled in the art, it still can be made amendment to the technical scheme that aforementioned each embodiment put down in writing, and perhaps part technical characterictic wherein is equal to replacement.All within the spirit and principle of the utility model, any modification of being done, be equal to replacement, improvement etc., all should be included within the protection domain of the utility model.
Claims (8)
1. projection optical system; Be used for the pattern imaging in the object plane in the picture plane; Said projection optical system comprises preceding group, aperture diaphragm and back group along its optical axis direction; It is characterized in that: group comprises the first mirror group, the second mirror group and the 3rd mirror group before said, and said first mirror group and the 3rd mirror group have positive light coke, and the said second mirror group has negative power; The said second mirror group is between said first mirror group and the 3rd mirror group, and the said first mirror group is between the said object plane and the second mirror group; Said back group comprises the 4th mirror group, the 5th mirror group and the 6th mirror group; Said the 4th mirror group and the 6th mirror group have positive light coke; Said the 5th mirror group has negative power; Said the 5th mirror group is between said the 4th mirror group and the 6th mirror group, and said the 6th mirror group is between said picture plane and the 5th mirror group; Group is organized about said aperture diaphragm symmetry with the back before said, and described projection optical system satisfies:
Relational expression 1:0.2＜f1/fa＜1.4;
Relational expression 2:-0.4＜f2/fa＜-0.06;
Relational expression 3:0.12＜f3/fa＜0.6,
Wherein, f1: the combined focal length of the first mirror group; F2: the combined focal length of the second mirror group; F3: the combined focal length of the 3rd mirror group; Fa: preceding group combined focal length.
2. a kind of projection optical system according to claim 1 is characterized in that: the said first mirror group comprises first lens and second lens, and said first lens and second lens are biconvex lens.
3. a kind of projection optical system according to claim 1 is characterized in that: the said second mirror group comprises the 3rd lens and the 4th lens, and said the 3rd lens have negative power, and said the 3rd lens comprise a concave surface towards said picture plane; Said the 4th lens have negative power, and said the 4th lens comprise a concave surface towards said object plane.
4. a kind of projection optical system according to claim 3 is characterized in that: said the 3rd mirror group comprises the 5th lens and the 6th lens, and said the 5th lens have positive light coke, and said the 6th lens have positive light coke.
5. a kind of projection optical system according to claim 3 is characterized in that: described projection optical system satisfies:
Relational expression 4:-2.0＜r1/r2＜-0.5;
Relational expression 5:1.0＜r3/r2＜2.0,
Wherein, r1: the radius-of-curvature of the concave surface of said the 3rd lens; R2: the radius-of-curvature of the concave surface of said the 4th lens; R3: the radius-of-curvature that the absolute value in the curved surface of the 3rd mirror group is minimum.
6. a kind of projection optical system according to claim 1 is characterized in that: the lens numbers in the said projection optical system is more than or equal to 10, and smaller or equal to 20.
7. a kind of projection optical system according to claim 1 is characterized in that: the absolute value of the radius-of-curvature of the rarest 2 curved surfaces equates in the lens of the said first mirror group.
8. a kind of projection optical system according to claim 1 is characterized in that: the combination back focus of group is positioned at the center of said aperture diaphragm before said, and the combination front focus of said back group is positioned at the center of said aperture diaphragm.
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| CN2012201712387U CN202512297U (en) | 2012-04-21 | 2012-04-21 | Projection optical system |
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| CN2012201712387U CN202512297U (en) | 2012-04-21 | 2012-04-21 | Projection optical system |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102621668A (en) * | 2012-04-21 | 2012-08-01 | 张家港鹏博光电科技有限公司 | Projection optical system |
| CN104122669A (en) * | 2014-08-07 | 2014-10-29 | 张家港鹏博光电科技有限公司 | Symmetrical double telecentric projection optical system and photoetching apparatus |
| CN105204142A (en) * | 2015-09-18 | 2015-12-30 | 苏州莱能士光电科技有限公司 | High-resolution and ultra-wide field fish-eye lens optical system with day-and-night confocal function |
| CN109375480A (en) * | 2018-12-30 | 2019-02-22 | 上海微电子装备（集团）股份有限公司 | A kind of photoetching projection objective lens and litho machine |
-
2012
- 2012-04-21 CN CN2012201712387U patent/CN202512297U/en not_active Withdrawn - After Issue
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102621668A (en) * | 2012-04-21 | 2012-08-01 | 张家港鹏博光电科技有限公司 | Projection optical system |
| CN102621668B (en) * | 2012-04-21 | 2013-12-11 | 张家港鹏博光电科技有限公司 | Projection optical system |
| CN104122669A (en) * | 2014-08-07 | 2014-10-29 | 张家港鹏博光电科技有限公司 | Symmetrical double telecentric projection optical system and photoetching apparatus |
| CN104122669B (en) * | 2014-08-07 | 2016-08-10 | 张家港鹏博光电科技有限公司 | A kind of symmetrical expression double-telecentric projection optical system and lithographic equipment |
| CN105204142A (en) * | 2015-09-18 | 2015-12-30 | 苏州莱能士光电科技有限公司 | High-resolution and ultra-wide field fish-eye lens optical system with day-and-night confocal function |
| CN105204142B (en) * | 2015-09-18 | 2018-04-17 | 苏州莱能士光电科技股份有限公司 | A kind of high-resolution ultra-wide angle day and night confocal FISH EYE LENS OPTICS system |
| CN109375480A (en) * | 2018-12-30 | 2019-02-22 | 上海微电子装备（集团）股份有限公司 | A kind of photoetching projection objective lens and litho machine |
| TWI715392B (en) * | 2018-12-30 | 2021-01-01 | 大陸商上海微電子裝備（集團）股份有限公司 | Photoetching projection objective lens and photoetching machine |
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