CN202369639U - Water bath heating device for gas storage tank for chemical vapor deposition - Google Patents
Water bath heating device for gas storage tank for chemical vapor deposition Download PDFInfo
- Publication number
- CN202369639U CN202369639U CN2011205027322U CN201120502732U CN202369639U CN 202369639 U CN202369639 U CN 202369639U CN 2011205027322 U CN2011205027322 U CN 2011205027322U CN 201120502732 U CN201120502732 U CN 201120502732U CN 202369639 U CN202369639 U CN 202369639U
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- gas
- shell
- heating
- holder
- water bath
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Abstract
The utility model relates to a water bath heating device for a gas storage tank for chemical vapor deposition. The device comprises a shell and a heating source, wherein the middle part of the top of the shell is provided with a tank body groove which is used for containing the gas storage tank, the shell and the tank body groove are hermetically connected to form a cavity, the top or the upper part of a side wall of the shell is provided with a water inlet, the upper part of the side wall of the shell is provided with an overflow port, and the bottom of the side wall of the shell is provided with a water outlet; and the heating source is arranged outside the shell or in the cavity. The heat is transferred to a wall of the gas storage tank through a liquid medium, so that a phenomenon that the gas storage tank is locally overheated because an electric heater is directly contacted with the gas storage tank is avoided; and the tank body groove is matched with the gas storage tank in shape, so that gas in the gas storage tank is uniformly heated, the heating speed is gradually reduced and easy to control, and dangerous accidents are prevented.
Description
Technical field
The utility model relates to a kind of gas-holder heating in water bath device that is used for chemical vapour deposition.
Background technology
In chemical vapor deposition processes, two or more gaseous state starting material issue biochemical reaction in the condition of heating and vacuum, form a kind of new material and deposit on the matrix surface.Need use gas in the deposition process and participate in reaction, in actual mechanical process, most of gas need not heat, and directly gets in the reaction chamber and reacts, like gases such as nitrogen, ammonias; But some gas is the mode that needs through heating, and the pressure that improves gas makes gas be more prone in gas-holder, come out, and guarantees that simultaneously the operation in pipeline is smooth and easy.Bottled gas for the needs heating; Often adopt heating jacket that the mode of gas-holder parcel is heated; Often because of the frequent loading and unloading of the replacing of gas-holder, its shortcoming is described heating jacket: heating jacket is directly to the gas-holder heating, not only makes the gas inequality of being heated; Rate of heating is too fast wayward, the phenomenon of local superheating can occur; And heating jacket causes Peril Incident in case damage very easily causes temperature control.
Summary of the invention
To above technical deficiency, the utility model provides a kind of gas-holder heating in water bath device, when bottled gas is heated, can guarantee that not only gas is heated evenly, guarantees constant, the safety in production of Heating temperature simultaneously.
The technical scheme of the utility model is following:
A kind of gas-holder heating in water bath device; Comprise shell and heating source; Be provided with confession at middle part, shell top and hold the tank body groove that gas-holder is used, said tank body groove and shell seal are connected to form cavity, are provided with water-in in said cover top portion or side wall upper part; On side wall of outer shell top spillway is set, is provided with water outlet in the sidewall bottom of said shell.
Described heating source is arranged in the outside or said cavity of said shell.
Described heating source is an electric heater.Preferably, described electricradiator in cavity at the bottom of tank body bottom land and the shell between.
Further preferred, described electric heater is large power, electrically hotting mask or large power, electrically heated filament.
In said cavity, liquid medium is housed.Preferably, described liquid medium is a pure water.
Preferably, the profile of described tank body groove and gas-holder adapts.
Preferably, water-in is positioned at top one edge of said shell.
The utility model is used for chemical vapour deposition and produces the evenly lasting thermostatically heating of bottled gas.
The advantage of the utility model is:
1. the utility model is skillfully constructed, easy care simple in structure.
2. the utility model can be multiple reactant gases heating when being applied to chemical vapour deposition, guarantees that the reactant gases in the gas-holder is derived smoothly.
3. the utility model, is avoided heating source directly to contact with gas-holder and the phenomenon of gas-holder local superheating occurred to gas storage tank skin transferred heat amount through liquid medium; Described tank body groove and gas-holder profile adapt, and the gas in the gas-holder is heated evenly, and rate of heating eases up and is prone to control, the generation of the Peril Incident of stopping to produce because of gas temperature is too high.
Description of drawings
Fig. 1 is the structural representation of embodiment 2; Fig. 2 is the part sectioned view of Fig. 1; Among the figure, 1, water-in; 2, tank body groove; 3, spillway; 4, water outlet; 5, shell; 6, cavity; 7, heating source.
Embodiment
Below in conjunction with embodiment and Figure of description the utility model is done detailed explanation, but be not limited thereto.
Embodiment 1,
A kind of gas-holder heating in water bath device that is used for chemical vapour deposition; Comprise shell 5 and heating source 7; Be provided with confession at the middle part, top of shell 5 and hold the tank body groove 2 that gas-holder is used, said shell 5 is connected to form cavity 6 with 2 sealings of tank body groove, is provided with water-in 1 said at said shell 5 tops; On side wall of outer shell top spillway 3 is set, is provided with water outlet 4 in the sidewall bottom of said shell 5; Described heating source 7 is arranged on shell 5 outsides.
Embodiment 2, a kind of gas-holder heating in water bath device that is used for chemical vapour deposition, structure is like Fig. 1, shown in 2.
Of embodiment 1, different is: described heating source is arranged in the said cavity 6, and said heating source is the large power, electrically hotting mask, and said large power, electrically hotting mask is installed between the bottom of bottom and tank body groove 2 of shell 5.
Embodiment 3,
A kind of gas-holder heating in water bath device that is used for chemical vapour deposition; Of embodiment 1; Different is: described heating source is arranged in the said cavity 6, and said heating source is the large power, electrically heated filament, and said large power, electrically heated filament is installed at the interior end of 2 ends of tank body groove and shell 5.
The working process of the utility model:
Like embodiment 1, the water-in 1 that is provided with through housing 5 tops injects the pure water that necessarily has fixed temperature to cavity 6, and wherein the temperature of pure water is decided according to reactant gases is temperature required.When spillway 3 beginning spilling waters; The gas-holder of needs heating is contained in the tank body groove, continues to inject to the cavity internal recycle pure water of certain temperature, this moment, the heat of pure water sent gas-holder to through the tank body groove; And then realization is to the heating of gas in the jar; Present embodiment through control water temperature just can pilot-gas temperature, and whole gas-holder is heated evenly, avoided the too high and situation of causing danger of gas Yin Wendu.During use, said heating source when being heated to suitable temperature, injects described cavity 6 with pure water along water-in 1 shell 5 outside earlier pure water the heating.This moment, the heat of pure water sent gas-holder to through tank body groove 2; And then realization is to the heating of gas in the jar; Present embodiment through control water temperature just can pilot-gas temperature, and whole gas-holder is heated evenly, avoided the too high and situation of causing danger of gas Yin Wendu.
Like embodiment 2,3, be the water of room temperature through the water-in 1 on housing 5 tops to cavity 6 implantation temperatures, when spillway 3 beginning spilling waters, stop water filling, with the energising of the electric heater in the cavity 6, realize the water in the cavity 6 is heated.The gas-holder of needs heating is contained in the tank body groove.
In the time need not using the utility model that gas-holder is heated, only need open the water outlet 4 on the sidewall, the water in the cavity 6 are released get final product.
Claims (8)
1. gas-holder heating in water bath device that is used for chemical vapour deposition; It is characterized in that, comprise shell and heating source, be provided with at middle part, shell top and hold the tank body groove that gas-holder is used; Said tank body groove and shell seal are connected to form cavity; Be provided with water-in in said cover top portion or side wall upper part, spillway be set, be provided with water outlet in the sidewall bottom of said shell on side wall of outer shell top.
2. gas-holder heating in water bath device according to claim 1 is characterized in that described heating source is arranged in said housing exterior or the said cavity.
3. gas-holder heating in water bath device according to claim 1 and 2 is characterized in that described heating source is an electric heater.
4. gas-holder heating in water bath device according to claim 3 is characterized in that, described electricradiator in cavity at the bottom of tank body bottom land and the shell between.
5. according to claim 3 or 4 described gas-holder heating in water bath devices, it is characterized in that described electric heater is large power, electrically hotting mask or large power, electrically heated filament.
6. gas-holder heating in water bath device according to claim 1 is characterized in that, in said cavity, liquid medium is housed.
7. gas-holder heating in water bath device according to claim 6 is characterized in that described liquid medium is a pure water.
8. gas-holder heating in water bath device according to claim 1 is characterized in that the profile of described tank body groove and gas-holder adapts.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011205027322U CN202369639U (en) | 2011-12-06 | 2011-12-06 | Water bath heating device for gas storage tank for chemical vapor deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2011205027322U CN202369639U (en) | 2011-12-06 | 2011-12-06 | Water bath heating device for gas storage tank for chemical vapor deposition |
Publications (1)
Publication Number | Publication Date |
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CN202369639U true CN202369639U (en) | 2012-08-08 |
Family
ID=46593352
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN2011205027322U Expired - Lifetime CN202369639U (en) | 2011-12-06 | 2011-12-06 | Water bath heating device for gas storage tank for chemical vapor deposition |
Country Status (1)
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CN (1) | CN202369639U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104390134A (en) * | 2014-11-20 | 2015-03-04 | 河南平高电气股份有限公司 | Inflating device for high-pressure switch equipment |
-
2011
- 2011-12-06 CN CN2011205027322U patent/CN202369639U/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104390134A (en) * | 2014-11-20 | 2015-03-04 | 河南平高电气股份有限公司 | Inflating device for high-pressure switch equipment |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20120808 |