CN202323010U - Horizontal substrate conveying device for vacuum coating - Google Patents
Horizontal substrate conveying device for vacuum coating Download PDFInfo
- Publication number
- CN202323010U CN202323010U CN 201120460791 CN201120460791U CN202323010U CN 202323010 U CN202323010 U CN 202323010U CN 201120460791 CN201120460791 CN 201120460791 CN 201120460791 U CN201120460791 U CN 201120460791U CN 202323010 U CN202323010 U CN 202323010U
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- chamber
- substrate
- guide rod
- foerderanlage
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Abstract
The utility model relates to a horizontal substrate conveying device for vacuum coating. The horizontal substrate conveying device comprises a coating production line chamber, wherein the front and back ends of the chamber are provided with an inlet and an outlet for conveying respectively. The horizontal substrate conveying device is characterized in that: thin walls on the left and right sides of the coating production line chamber are provided with a group of transmission shafts (4) arranged uniformly along the front and back directions of the chamber; each transmission shaft (4) passes through the thin walls on both sides of the chamber; the end part of each transmission shaft (4) in the chamber is connected with a transmission wheel; a substrate frame (1) is further arranged in the chamber; the substrate frame (1) is provided with a horizontal accommodating surface for accommodating a substrate, and two side guide rods (3) which are fixedly connected with the bottom surface of the accommodating surface and are arranged along the front and back directions of the chamber; and each side guide rod (3) is in contact fit with at least three transmission wheels on a corresponding side simultaneously. The substrate conveying device has the beneficial effects that: the structure of a substrate conveying system is simplified, cost is reduced, and maintenance and repair are easy.
Description
Technical field
The utility model relates to a kind of substrate level e Foerderanlage, is specifically related to a kind of vacuum plating and uses the substrate level e Foerderanlage.
Background technology
Vacuum plating is used for the glass substrate vacuum coating production line with the substrate level e Foerderanlage; It is a device of realizing that substrate is steadily carried in the coating film production line chamber; Traditional plated film line adopts substrate vertical transport mode to carry out plated film; This plated film mode has not only limited the dimensions of substrate, and brings difficulty for the maintenance of entire equipment.Now, the most employing of large size plated film line both at home and abroad is horizontal to be that substrate is a horizontal positioned, but the roller mode of movement is adopted in the conveying of substrate; This mode of movement exists the problem of substrate sideslip; And the pair of rollers material requires harshness, device structure complicacy, cost of investment height.
The utility model content
The purpose of the utility model is to exist the defective of the problem of substrate sideslip in order to overcome existing this mode of movement, and provides a kind of vacuum plating to use the substrate level e Foerderanlage.
The utility model solves the technical scheme that its technical problem adopted:
The substrate level e Foerderanlage is used in a kind of vacuum plating; Comprise the coating film production line chamber; The rear and front end of chamber has the import and the outlet of transmission usefulness respectively; It is characterized in that: be respectively equipped with one group of transmission shaft on the left and right sides thin-walled of coating film production line chamber and evenly be provided with along the chamber fore-and-aft direction, each transmission shaft runs through the thin-walled of chamber both sides, and the end of each transmission shaft in chamber connects a power wheel; In chamber, also be provided with a substrate frame; The placed side that substrate frame has a level is used to place substrate; And the both sides guide rod along the setting of chamber fore-and-aft direction that is fixedly connected with the bottom surface, placed side, at least three power wheels of a described every side guide rod while and a corresponding side are connected.
This device is realized the steady conveying of substrate in the coating film production line chamber; Simultaneously, this device has the structure of simplifying, reduces cost, safeguards easily.
On the basis of above-mentioned main technical schemes, can increase following further perfect technical scheme:
Described left side power wheel is a locating wheel, and the width of the notch of described locating wheel and the width of guide rod adapt, and the locating wheel notch is limited in substrate frame in certain scope, has avoided the deviation phenomenon of substrate frame in transmission course.
Described right side power wheel is non-locating wheel, and the width of the notch of described non-locating wheel is greater than the width of guide rod, and non-locating wheel width of rebate is bigger, allows some leeway for the expansion of substrate frame, and this just makes substrate frame can carry substrate and moves ahead stably.
Has a India-rubber strip on the described guide rod bottom surface that contacts with roller along the elongated setting of guide rod; The rubber coefficient of contact friction is high; When improving locating wheel and non-locating wheel frictional force; Also avoided the play of substrate frame when starting and stopping, thereby made film plating substrate to move ahead according to correct running orbit.
On bottom surface, be respectively equipped with a L shaped baffle plate,, improved India-rubber strip work-ing life because the existence of L baffle plate can effectively stop the influence of heat to rubber performance near the inboard substrate frame of every side guide rod.
Both sides on the bottom surface in the coating film production line chamber are respectively equipped with a U-shaped baffle plate and cooperate with corresponding L shaped baffle plate; A segment distance staggers between the U-shaped baffle plate of a corresponding side and L shaped baffle plate; The cooperation of two baffle plates has improved heat insulation effect, has improved rubber is protected.
Also be provided with a main shaft that runs through the both sides thin-walled on the both sides thin-walled of described coating film production line chamber; The two ends of main shaft are connected with the end of a close transmission shaft of a corresponding side through synchronous band respectively, pass through band connection synchronously between two transmission shafts of a corresponding side.
Described transmission mechanism also can adopt chain drive structure or gear transmission structure.
The beneficial effect of the utility model is this substrate transmission device; Not only simplified the structure of substrate delivery system, and reduced cost, and made maintenance be easy to carry out; Locating wheel and non-locating wheel are limited in substrate frame in certain scope; Substrate frame is heated the back to non-locating wheel one side expansion, has avoided the deviation phenomenon of substrate frame in transmission course, thereby has effectively solved the difficult problem of film plating substrate sideslip.
Below in conjunction with accompanying drawing and embodiment the utility model is further specified.
Description of drawings:
Fig. 1 is the front view of the utility model;
Fig. 2 is the vertical view of the utility model.
Embodiment
As depicted in figs. 1 and 2; The substrate level e Foerderanlage is used in a kind of vacuum plating of the utility model; Comprise the coating film production line chamber; The rear and front end of chamber has the import and the outlet of transmission usefulness respectively, is respectively equipped with one group of transmission shaft 4 on the left and right sides thin-walled of coating film production line chamber and evenly is provided with along the chamber fore-and-aft direction, and each transmission shaft 4 runs through the thin-walled of chamber both sides.The end of each transmission shaft 4 in left side connects a locating wheel 5 in chamber, is used for the location, and the end of each transmission shaft 4 on right side connects a non-locating wheel 8 in chamber; Above the chamber inner driving wheel, also be provided with a substrate frame 1; The placed side that substrate frame 1 has a level is used to place substrate; And the both sides guide rod 3 that is fixedly connected with the bottom surface, placed side along the setting of chamber fore-and-aft direction; Described every side guide rod 3 simultaneously with at least three locating wheels 5 of a corresponding side and the notch contact matching of three non-locating wheels 8, substrate frame 1 moves ahead along with the rotation of locating wheel 5 and non-locating wheel 8 carries substrate.Also be provided with a main shaft 7 that runs through the both sides thin-walled on the both sides thin-walled of described coating film production line chamber; The two ends of main shaft 7 are connected with the end of a close transmission shaft 4 of a corresponding side through synchronous band respectively; 4 of two transmission shafts of a corresponding side pass through band connection synchronously, drive each transmission shaft 4 by main shaft 7 and move.
Locating wheel and non-locating wheel are installed on the transmission shaft on both sides in the plated film chamber, and the transmission shaft on chamber both sides is realized rotating synchronously through the main shaft of cavity below; Glass substrate places on the substrate frame, and substrate frame places on locating wheel and the non-locating wheel through the guide rod of its below; Locating wheel and non-locating wheel 8 have notch, can prevent substrate frame 1 in operational process sideslip and fall the frame phenomenon; Be connected through collets between guide rod 3 and the substrate frame 1, and guide rod 3 bottoms are embedded with India-rubber strip.The transmission shaft on both sides and power wheel are pressed the certain intervals layout along whole piece plated film line in the plated film chamber, but must guarantee that every guide rod under the substrate frame 1 contacts with at least three power wheels simultaneously.L type baffle plate 2 is fixed in substrate frame 1 bottom near the guide rod place, and U type baffle plate 6 is fixed on cavity bottom near the power wheel place, can effectively prevent the damage that thermal radiation causes India-rubber strip.When main shaft 7 drives magnetic fluid transmission shaft 4 rotation synchronously on cavity both sides; Owing to contact through India-rubber strip between substrate frame 1 and the power wheel; Point of contact frictional force is bigger, and locating wheel lateral confinement system the position, the left and right sides of substrate frame 1, non-locating wheel side since the rib spacing bigger; Allow some leeway for the expansion of substrate frame 1, this just makes substrate frame 1 can carry substrate and moves ahead stably.
Claims (7)
1. the substrate level e Foerderanlage is used in a vacuum plating; Comprise the coating film production line chamber; The rear and front end of chamber has the import and the outlet of transmission usefulness respectively; It is characterized in that: be respectively equipped with one group of transmission shaft (4) on the left and right sides thin-walled of coating film production line chamber and evenly be provided with along the chamber fore-and-aft direction, each transmission shaft (4) runs through the thin-walled of chamber both sides, and the end of each transmission shaft (4) in chamber connects a power wheel; In chamber, also be provided with a substrate frame (1); The placed side that substrate frame (1) has a level is used to place substrate; And the both sides guide rod (3) that is fixedly connected with the bottom surface, placed side along the setting of chamber fore-and-aft direction, at least three power wheel contact matching of described every side guide rod (a 3) while and a corresponding side.
2. the substrate level e Foerderanlage is used in a kind of vacuum plating according to claim 1, it is characterized in that: described left side power wheel is locating wheel (5), and the width of the width of the notch of described locating wheel (5) and guide rod (3) adapts.
3. the substrate level e Foerderanlage is used in a kind of vacuum plating according to claim 1, it is characterized in that: described right side power wheel is non-locating wheel (8), and the width of the notch of described non-locating wheel (8) is greater than the width of guide rod (3).
4. use the substrate level e Foerderanlage according to claim 1,2 or 3 described a kind of vacuum platings, it is characterized in that: have a India-rubber strip on the described guide rod that contacts with power wheel (3) bottom surface along the elongated setting of guide rod (3).
5. the substrate level e Foerderanlage is used in a kind of vacuum plating according to claim 4, it is characterized in that: on the bottom surface near the inboard substrate frame of every side guide rod (3), be respectively equipped with a L shaped baffle plate (2).
6. the substrate level e Foerderanlage is used in a kind of vacuum plating according to claim 5; It is characterized in that: the both sides on the bottom surface in the coating film production line chamber are respectively equipped with a U-shaped baffle plate (6) and cooperate with corresponding L shaped baffle plate (2), and a segment distance staggers between the U-shaped baffle plate of a corresponding side and L shaped baffle plate.
7. the substrate level e Foerderanlage is used in a kind of vacuum plating according to claim 6; It is characterized in that: also be provided with a main shaft (7) that runs through the both sides thin-walled on the both sides thin-walled of described coating film production line chamber; The two ends of main shaft (7) are connected with the end of a close transmission shaft (4) of a corresponding side through synchronous band respectively, pass through band connection synchronously between two transmission shafts (4) of a corresponding side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120460791 CN202323010U (en) | 2011-11-19 | 2011-11-19 | Horizontal substrate conveying device for vacuum coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120460791 CN202323010U (en) | 2011-11-19 | 2011-11-19 | Horizontal substrate conveying device for vacuum coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202323010U true CN202323010U (en) | 2012-07-11 |
Family
ID=46434997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201120460791 Expired - Fee Related CN202323010U (en) | 2011-11-19 | 2011-11-19 | Horizontal substrate conveying device for vacuum coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202323010U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103866295A (en) * | 2012-12-14 | 2014-06-18 | 汉能新材料科技有限公司 | Apparatus used for reaction chamber substrate heating and transmission |
| CN104120401A (en) * | 2013-04-26 | 2014-10-29 | 汉能新材料科技有限公司 | Alignment type multi-sheet transmission system and thin film deposition equipment using alignment type multi-sheet transmission system |
| CN104213094A (en) * | 2013-06-04 | 2014-12-17 | 金弼 | Vacuum coating device |
| CN107841726A (en) * | 2017-12-21 | 2018-03-27 | 北京铂阳顶荣光伏科技有限公司 | Full-automatic coating machine |
| CN110643968A (en) * | 2019-11-07 | 2020-01-03 | 湘潭宏大真空技术股份有限公司 | Substrate transportation transmission device for horizontal vacuum coating production line |
-
2011
- 2011-11-19 CN CN 201120460791 patent/CN202323010U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103866295A (en) * | 2012-12-14 | 2014-06-18 | 汉能新材料科技有限公司 | Apparatus used for reaction chamber substrate heating and transmission |
| CN104120401A (en) * | 2013-04-26 | 2014-10-29 | 汉能新材料科技有限公司 | Alignment type multi-sheet transmission system and thin film deposition equipment using alignment type multi-sheet transmission system |
| CN104213094A (en) * | 2013-06-04 | 2014-12-17 | 金弼 | Vacuum coating device |
| CN107841726A (en) * | 2017-12-21 | 2018-03-27 | 北京铂阳顶荣光伏科技有限公司 | Full-automatic coating machine |
| CN110643968A (en) * | 2019-11-07 | 2020-01-03 | 湘潭宏大真空技术股份有限公司 | Substrate transportation transmission device for horizontal vacuum coating production line |
| CN110643968B (en) * | 2019-11-07 | 2022-05-31 | 湘潭宏大真空技术股份有限公司 | Substrate transportation transmission device for horizontal vacuum coating production line |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120711 Termination date: 20141119 |
|
| EXPY | Termination of patent right or utility model |