CN201867585U - Photoresist coating device - Google Patents
Photoresist coating device Download PDFInfo
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- CN201867585U CN201867585U CN2010206569494U CN201020656949U CN201867585U CN 201867585 U CN201867585 U CN 201867585U CN 2010206569494 U CN2010206569494 U CN 2010206569494U CN 201020656949 U CN201020656949 U CN 201020656949U CN 201867585 U CN201867585 U CN 201867585U
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- coating equipment
- photoresist coating
- groove
- guiding element
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Abstract
The utility model discloses a photoresist coating device comprising a coating base, a photoresist coating rod, a front guiding piece and a rear guiding piece. The front guiding piece is positioned below the position on the coating base, where the photoresist coating rod moves from the static position to start to move at constant speed; the tail end of the front guiding piece is positioned below the position on the coating base, where the photoresist coating rod starts to move at constant speed; the rear guiding piece is positioned below the position on the coating base, where the coating rod moves to the stopping position from the position where the coating rod starts to decelerate; and the starting end of the rear guiding piece is positioned below the position on the coating base, where the coating rod starts to decelerate on the coating base. The front guiding piece and the rear guiding piece are respectively arranged at the starting-accelerating section and the stopping-decelerating section of the coating rod, thus guaranteeing that photoresist can be coated on a film forming base plate between the starting-accelerating section and the stopping-decelerating section at constant speed.
Description
Technical field
The utility model relates to lcd technology, relates in particular to a kind of photoresist coating equipment.
Background technology
LCD is a flat-panel monitor commonly used at present, and wherein Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display is called for short TFT-LCD) is the main product in the LCD.
The photoresist coating is the important step in the LCD manufacture process.The typical structure that photoresist applies comprises coating base station, gluing bar.
Wherein, apply the substrate for film deposition that base station is used for placing photoresist to be coated, the gluing bar is the bar that has slit, and pipeline is arranged in the bar, and photoresist flows to slit by pipeline, again by slot coated on substrate for film deposition.
The gluing bar is positioned at the top of board, and substrate for film deposition is transferred to the coating base station by mechanical arm after cleaning, then the gluing bar is moved on to substrate for film deposition one end, and the gluing bar at the uniform velocity drips glue with beginning simultaneously.The gluing bar at the uniform velocity moves to the other end of substrate for film deposition then, stops to drip glue, finishes coating.
The defective that prior art exists is: the gluing bar is from beginning to move to the process of uniform motion, and translational speed is less than uniform motion, and that the gluing bar drips the speed of glue is constant, and the photoresist that causes the gluing initial segment of substrate for film deposition to apply is thicker.And, when the gluing bar moves to the other end of substrate for film deposition, reduce speed now, and that the gluing bar drips glue speed is still constant, the photoresist that causes the gluing ending segment of substrate for film deposition to apply is thicker, even make substrate for film deposition through the even glue process of follow-up rotation, uniformity of gluing still is difficult to guarantee.
The utility model content
The utility model provides a kind of photoresist coating equipment, evenly applies to realize the photoresist on the substrate for film deposition.
The utility model provides a kind of photoresist coating equipment, comprises applying base station and gluing bar, also comprises:
Preceding guiding element is positioned at the above gluing bar of described coating base station from static below of at the uniform velocity moving the place to beginning; The tail end of guiding element is positioned at the below that the above gluing bar of described coating base station begins at the uniform velocity to move the place before described;
Back guiding element is positioned at the below that the above gluing bar of described coating base station stops to locate from reducing speed now to; The starting end of described back guiding element is positioned at the below that the above gluing bar of described coating base station reduces speed now and locates.
Aforesaid photoresist coating equipment, wherein, described preceding guiding element can be front guide.
As further improvement of the utility model, aforesaid photoresist coating equipment also can comprise:
Preposition groove is positioned at the below of described front guide, in be provided with photoresist lift off liquid;
Preposition air nozzle is positioned at the side that described front guide deviates from described back guide, and towards described front guide.The photoresist that applies on the guide plate of front and back is reclaimed economical with materials.
As further improvement of the utility model, aforesaid photoresist coating equipment also can comprise:
Preposition revolving part comprises pivot arm and fixed arm, and an end of described pivot arm and described fixed arm flexibly connect, and the other end is connected with described front guide fixed vertical;
The distance of photoresist glass metal liquid level is smaller or equal to the length of described pivot arm in the described preposition groove.Automatic rotation with guiding element before realizing.
Perhaps, described preceding guiding element can be front guide slot.Preferably, the groove inner bottom surface of described front guide slot is the inclined-plane that tends to a side vertical with described gluing bar moving direction; Further, aforesaid photoresist coating equipment also can comprise:
Preposition glue box is positioned at the downward-sloping side in described inclined-plane, with the inner conducting of described front guide slot.The photoresist that applies on the guide groove of front and back is reclaimed economical with materials.
Similarly, described back guiding element can be back guide.Further, aforesaid photoresist coating equipment also can comprise:
Rearmounted groove is positioned at the below of described back guide, in be provided with photoresist lift off liquid;
Rearmounted air nozzle is positioned at the side that described back guide deviates from described front guide, and towards described back guide.
Aforesaid photoresist coating equipment also can further comprise:
Rearmounted revolving part comprises pivot arm and fixed arm, and an end of described pivot arm and described fixed arm flexibly connect, and the other end is connected with described back guide fixed vertical;
The distance of photoresist glass metal liquid level is smaller or equal to the length of described pivot arm in the described rearmounted groove.
Perhaps, described back guiding element can be the back guide groove.The groove inner bottom surface of described back guide groove can be an inclined-plane, and is downward-sloping along the length direction of described back guide groove;
Described photoresist coating equipment also can further comprise:
Rearmounted glue box is positioned at the downward-sloping side in described inclined-plane, with the inner conducting of described back guide groove.
The photoresist coating equipment that the utility model provides, by guiding element at the startup accelerating sections of gluing bar and before stopping braking section and being provided with respectively and back guiding element, the gluing process that has guaranteed to start accelerating sections and stopped on the substrate for film deposition between the braking section is gluing process at the uniform velocity, solved the thicker problem of photoresist that the substrate for film deposition front and back end applies, improved the gluing homogeneity of substrate for film deposition, especially the photoresist homogeneity of gluing front-end and back-end, thereby improved the homogeneity of post-exposure and etching, and then improved yields.
Description of drawings
The vertical view of the photoresist coating equipment that Fig. 1 provides for the utility model embodiment one;
The vertical view of the photoresist coating equipment that Fig. 2 provides for the utility model embodiment two;
The structural representation when gluing bar gluing of guide plate, front and rear revolving part and front and rear groove before and after in the photoresist coating equipment that Fig. 3 A provides for the utility model embodiment two;
The structural representation when front and back guide plate photoresist is stripped from of guide plate, front and rear revolving part and front and rear groove before and after in the photoresist coating equipment that Fig. 3 B provides for the utility model embodiment two;
The structural representation when the front and back guide plate is dried of guide plate, front and rear revolving part and front and rear groove before and after in the photoresist coating equipment that Fig. 3 C provides for the utility model embodiment two;
The vertical view of the photoresist coating equipment that Fig. 4 provides for the utility model embodiment three;
The inside surface cross sectional representation of guide groove before and after in the photoresist coating equipment that Fig. 5 A provides for the utility model embodiment three;
The structural representation of guide groove and front and rear glue box before and after in the photoresist coating equipment that Fig. 5 B provides for the utility model embodiment three.
Embodiment
For the purpose, technical scheme and the advantage that make the utility model embodiment clearer, below in conjunction with the accompanying drawing among the utility model embodiment, technical scheme among the utility model embodiment is clearly and completely described, obviously, described embodiment is the utility model part embodiment, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the utility model protection.
Embodiment one
The vertical view of the photoresist coating equipment that Fig. 1 provides for the utility model embodiment one, as shown in Figure 1, the photoresist coating equipment comprises and applies base station 1, gluing bar 2, preceding guiding element 3 and back guiding element 4.Wherein, preceding guiding element 3 is positioned at and applies the below of gluing bar 2 from static to the at the uniform velocity mobile place of beginning on the base station 1; The tail end of preceding guiding element 3 is positioned at the below that applies the at the uniform velocity mobile place of gluing bar 2 beginnings on the base station 1.
Back guiding element 4 is positioned at and applies the below that gluing bar 2 stops to locate from reducing speed now on the base station 1; The starting end of back guiding element 4 is positioned at and applies the below that gluing bar 2 reduces speed now and locates on the base station 1.
Distance between the starting end of the tail end of preceding guiding element 3 and back guiding element 4 equals the length of substrate for film deposition 5; The width of the width of preceding guiding element 3 and back guiding element 4 all equals the length of gluing bar 2 slits at least.
Because the gluing bar is from static at the uniform velocity mobile to beginning, and all needing to stop a process from reducing speed now to, make that the gluing thickness of initiating terminal and end end is thicker than zone line, therefore, leading zone that guiding element provides before increasing in the gluing process and back guiding element provide after lead the zone, make substrate for film deposition be in the gluing bar at the uniform velocity in the process of gluing, thereby improve gluing homogeneity on the substrate for film deposition.
When the photoresist coating equipment that uses present embodiment to provide applied photoresist, between guiding element 3 and the back guiding element 4, preceding guiding element 3 was fitted with substrate for film deposition 5 left ends before substrate for film deposition 5 was placed on, and substrate for film deposition 5 right-hand members are fitted with back guiding element 4 left ends.
Gluing bar 2 moves on to preceding guiding element 3 left ends, opens to drip the glue valve beginning gluing.
Then, gluing bar 2 at the uniform velocity moves on the substrate for film deposition 5, at the uniform velocity drips glue simultaneously.In the process of blade coating, because speed remains unchanged, the gluing thickness of whole substrate for film deposition 5 is even.
In the present embodiment, preceding guiding element is specifically as follows front guide, front guide slot, further can comprise preposition groove, preposition glue box, with the photoresist that applies on the guiding element before reclaiming, economical with materials.Similarly, back guiding element is specifically as follows back guide, back guide groove, further can comprise rearmounted groove, rearmounted glue box, to reclaim the photoresist that applies on the guiding element of back, economical with materials.
Embodiment two
The vertical view of the photoresist coating equipment that Fig. 2 provides for the utility model embodiment two, as shown in Figure 2, the photoresist coating equipment comprises front guide 31, preposition revolving part 32 (referring to Fig. 3), preposition groove 33, preposition air nozzle 34, back guide 41, rearmounted revolving part 42 (referring to Fig. 3), rearmounted groove 43 and rearmounted air nozzle 44.
As shown in Figure 3A, preposition revolving part 32 comprises pivot arm 321 and fixed arm 322, and an end of pivot arm 321 and fixed arm 322 flexibly connect, and the other end is connected with front guide 31 fixed vertical.Preposition groove 33 is positioned at the below of front guide 31, in be provided with photoresist lift off liquid, be used for peeling off and be gummed the photoresist that bar 2 applies on the front guide 31, reclaim.The distance of photoresist glass metal liquid level is smaller or equal to the length of pivot arm 321 in the preposition groove 33, and when rotating to the below with assurance pivot arm 321, the one side that front guide 31 can be scribbled photoresist immerses in the photoresist glass metal of preposition groove 33.Preposition air nozzle 34 is positioned at the side that front guide 31 deviates from back guide 41, and towards front guide 31, so that behind front guide 31 stripping photoresists, the one side of being stripped from photoresist is towards preposition air nozzle 34, and the air-flow that sprays by preposition air nozzle 34 carries out drying.
Similarly, rearmounted revolving part 42 comprises pivot arm 421 and fixed arm 422, and an end of pivot arm 421 and fixed arm 422 flexibly connect, and the other end is connected with back guide 41 fixed vertical.Rearmounted groove 43 is positioned at the below of back guide 41, in be provided with photoresist lift off liquid, be used for peeling off and be gummed the photoresist that bar 2 applies on the back guide 41, reclaim.The distance of photoresist glass metal liquid level is smaller or equal to the length of pivot arm 421 in the rearmounted groove 43, and when rotating to the below with assurance pivot arm 421, the one side that back guide 41 can be scribbled photoresist immerses in the photoresist glass metal of rearmounted groove 43.Rearmounted air nozzle 44 is positioned at the side that back guide 41 deviates from front guide 31, and towards back guide 41, so that behind back guide 41 stripping photoresists, the one side of being stripped from photoresist is towards rearmounted air nozzle 44, and the air-flow that sprays by rearmounted air nozzle 44 carries out drying.
The process that the photoresist coating equipment that uses present embodiment to provide applies photoresist comprises:
Substrate for film deposition 5 through the cleaning-drying technologies after, be transferred to by mechanical arm and apply base station 1 (not shown among Fig. 2), front guide 31 and back guide 41 are by going to apply base station 1 parallel by preposition revolving part 32, rearmounted revolving part 42 respectively simultaneously.Adjust front guide 31 upper surfaces and back guide 41 upper surfaces to substrate for film deposition 5 on same surface level.Front guide 31 right-hand members and substrate for film deposition 5 left ends are fitted, and substrate for film deposition 5 right-hand members and back guide 41 left ends are fitted.
Gluing bar 2 moves on to front guide 31 left ends, opens to drip the glue valve beginning gluing.
Then, gluing bar 2 at the uniform velocity moves on the substrate for film deposition 5, at the uniform velocity drips glue simultaneously.In the process of blade coating, because speed remains unchanged, the gluing thickness of whole substrate for film deposition 5 is even.
In deceleration time section t2, gluing bar 2 speed are reduced to zero from v, and period average speed v 2 is less than speed v.The length s2 of whole braking section is less than the length L 2 of back guide 41, and the width of back guide 41 is greater than the length of slit on the gluing bar 2, and the length s2 of whole braking section is less than the length L 2 of back guide.Guaranteed gluing bar 2 at photoresist full coat that braking section s2 drips on the back guide 41.
After gluing was finished, Pin transferred to substrate for film deposition 5 jack-up the rotation equipment for evenly dividing glue by mechanical arm with substrate for film deposition 5 and is rotated even glue.
Shown in Fig. 3 B, after gluing bar 2 shifted out front guide 31, front guide 31 was rotated counterclockwise 180 degree by preposition revolving part 32, and the plate face immerses in the photoresist lift off liquid in the preposition groove 33, with the photoresist lift off that applies on the plate face.
Afterwards, shown in Fig. 3 C, front guide 31 turn 90 degrees by preposition revolving part 32 dextrorotations, and the plate face is towards preposition air nozzle 34.The surface of the dry front guide 31 of preposition air nozzle 34 ejection dry airs.
Similarly, after gluing bar 2 shifted out back guide 41, back guide 41 rotated in the photoresist lift off liquid that immerses in the rearmounted groove 43 photoresist that applies on the peel plate face by rearmounted revolving part 42.Afterwards, back guide 41 is rotated counterclockwise 90 degree by rearmounted revolving part 42, the dry back guide of rearmounted air nozzle 44 ejection dry airs 41 surfaces.
At last, front guide 31 dextrorotations turn 90 degrees, and back guide 41 is rotated counterclockwise 90 degree, make the surface on same surface level, and parallel with coating base station 1 surface, wait for gluing next time.
The size of supposing substrate for film deposition 5 is 1100mm * 1300mm, and the length of front guide is 50-80 μ m, and the length of back guide is 30-60 μ m, and front guide face and back guide face are decided according to the substrate for film deposition 5 of different-thickness than the high 0.5-0.7mm of base station face.
Embodiment three
The vertical view of the photoresist coating equipment that Fig. 4 provides for the utility model embodiment three, as shown in Figure 4, the photoresist coating equipment comprises: front guide slot 35, preposition glue box 36, back guide groove 45 and rearmounted glue box 46.
Shown in Fig. 5 A, the inside surface xsect of front guide slot 35, back guide groove 45 is a U-shaped, and shown in Fig. 5 B, the groove inner bottom surface of front guide slot 35, back guide groove 45 is an inclined-plane, tends to a side vertical with gluing bar 2 moving directions, and is promptly downward-sloping along the length direction of back guide groove 45, also promptly along the direction parallel with gluing bar 2, the groove inner bottom surface of front guide slot 35, back guide groove 45 tilts from the top down or tilts from bottom to top, and an end is higher than the other end, makes things convenient for photoresist to flow.
The end that preposition glue box 36 and front guide slot 35 groove inner bottom surfaces are low links to each other, and reclaims the photoresist that applies in front guide slot 35 grooves.
Similarly, the end that rearmounted glue box 46 and back guide groove 45 groove inner bottom surfaces are low links to each other, reclaims the photoresist of coating in guide groove 45 grooves of back.
The process that the photoresist coating equipment that uses present embodiment to provide applies photoresist comprises:
After the substrate for film deposition 5 process cleaning-drying technologies, mechanical arm drops on substrate for film deposition 5 earlier on the Pin that applies base station 1 (not shown among Fig. 4), and substrate for film deposition 5 is transferred to apply on the base station 1 along with Pin descends then.The end face of adjustment front guide slot 35 and back guide groove 45 and substrate for film deposition 5 are on same surface level.
Gluing bar 2 moves on to front guide slot 35 left ends, opens to drip the glue valve beginning gluing.From the static speed v that accelerates to, period average speed v 1 is less than v in acceleration time section t1 for gluing bar 2, and the length s1 of whole accelerating sections is less than the length L 1 of front guide slot.And the width of front guide slot 35 is greater than the length of slit on the gluing bar 2, guaranteed gluing bar 2 at photoresist full coat that accelerating sections s1 drips on front guide slot 35.Simultaneously, the photoresist in the front guide slot 35 flows in the preposition glue box 36.
Gluing bar 2 moves on the substrate for film deposition 5 with v at the uniform velocity, and remains a constant speed and drip glue.In the process of blade coating, because speed remains unchanged, the gluing thickness of whole glass is even.
Gluing bar 2 shifts out substrate for film deposition 5 zones with v at the uniform velocity, moves to guide groove 45 zones, back, reduces speed now, and closes simultaneously and drips a glue valve.Finished this moment substrate for film deposition 5 has been applied photoresist.
In deceleration time section t2, gluing bar 2 speed are reduced to zero from v, and period average speed v 2 is less than v, the length s2 of whole braking section is less than the length L 2 of back guide groove 45, guaranteed gluing bar 2 at photoresist full coat that braking section s2 drips on the guide groove 45 of back.Simultaneously, the photoresist in the back guide groove 45 flows in the rearmounted glue box 46.
After gluing was finished, Pin transferred to substrate for film deposition 5 jack-up the rotation equipment for evenly dividing glue by mechanical arm with substrate for film deposition 5 and is rotated even glue.
Flow to the photoresist recovery in preposition glue box 36 and the rearmounted glue box 46 or treat as liquid waste processing.A gluing like this is finished, and waits for gluing next time.
In the present embodiment, mechanical arm picks and places time, Pin and rises and falls the action etc. of time, guide plate by programmed control.The size of supposing substrate for film deposition is 1100mm * 1300mm, and the width of front guide slot is 50-80 μ m, and the width of back guide groove is 30-60 μ m, and front guide slot end face and back guide groove end face are decided according to the glass of different-thickness than the high 0.5-0.7mm of coated base table top.
The photoresist coating equipment that the foregoing description provides is by guiding element at the startup accelerating sections of gluing bar and before stopping braking section and being provided with respectively and back guiding element, the gluing process that has guaranteed to start accelerating sections and stopped on the substrate for film deposition between the braking section is gluing process at the uniform velocity, improved the gluing homogeneity of substrate for film deposition, especially the photoresist homogeneity of gluing front-end and back-end, thereby improved the homogeneity of post-exposure and etching, prevent the spend quarter generation of (Channel Over Etch) of residual (Remain) and raceway groove, thereby improved yields.
It should be noted that at last: above embodiment only in order to the explanation the technical solution of the utility model, is not intended to limit; Although the utility model is had been described in detail with reference to previous embodiment, those of ordinary skill in the art is to be understood that: it still can be made amendment to the technical scheme that aforementioned each embodiment put down in writing, and perhaps part technical characterictic wherein is equal to replacement; And these modifications or replacement do not make the essence of appropriate technical solution break away from the spirit and scope of each embodiment technical scheme of the utility model.
Claims (11)
1. a photoresist coating equipment comprises applying base station and gluing bar, it is characterized in that, also comprises:
Preceding guiding element is positioned at the above gluing bar of described coating base station from static below of at the uniform velocity moving the place to beginning; The tail end of guiding element is positioned at the below that the above gluing bar of described coating base station begins at the uniform velocity to move the place before described;
Back guiding element is positioned at the below that the above gluing bar of described coating base station stops to locate from reducing speed now to; The starting end of described back guiding element is positioned at the below that the above gluing bar of described coating base station reduces speed now and locates.
2. photoresist coating equipment according to claim 1 is characterized in that, described preceding guiding element is a front guide.
3. photoresist coating equipment according to claim 2 is characterized in that, also comprises:
Preposition groove is positioned at the below of described front guide, in be provided with photoresist lift off liquid;
Preposition air nozzle is positioned at the side that described front guide deviates from described back guide, and towards described front guide.
4. photoresist coating equipment according to claim 3 is characterized in that, also comprises:
Preposition revolving part comprises pivot arm and fixed arm, and an end of described pivot arm and described fixed arm flexibly connect, and the other end is connected with described front guide fixed vertical;
The distance of photoresist glass metal liquid level is smaller or equal to the length of described pivot arm in the described preposition groove.
5. photoresist coating equipment according to claim 1 is characterized in that, described preceding guiding element is a front guide slot.
6. photoresist coating equipment according to claim 5 is characterized in that, the groove inner bottom surface of described front guide slot is the inclined-plane that tends to a side vertical with described gluing bar moving direction;
Described photoresist coating equipment also comprises:
Preposition glue box is positioned at the downward-sloping side in described inclined-plane, with the inner conducting of described front guide slot.
7. photoresist coating equipment according to claim 1 is characterized in that, described back guiding element is a back guide.
8. photoresist coating equipment according to claim 7 is characterized in that, also comprises:
Rearmounted groove is positioned at the below of described back guide, in be provided with photoresist lift off liquid;
Rearmounted air nozzle is positioned at the side that described back guide deviates from described front guide, and towards described back guide.
9. photoresist coating equipment according to claim 8 is characterized in that, also comprises:
Rearmounted revolving part comprises pivot arm and fixed arm, and an end of described pivot arm and described fixed arm flexibly connect, and the other end is connected with described back guide fixed vertical;
The distance of photoresist glass metal liquid level is smaller or equal to the length of described pivot arm in the described rearmounted groove.
10. photoresist coating equipment according to claim 1 is characterized in that, described back guiding element is the back guide groove.
11. photoresist coating equipment according to claim 10 is characterized in that, the groove inner bottom surface of described back guide groove is an inclined-plane, and is downward-sloping along the length direction of described back guide groove;
Described photoresist coating equipment also comprises:
Rearmounted glue box is positioned at the downward-sloping side in described inclined-plane, with the inner conducting of described back guide groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206569494U CN201867585U (en) | 2010-12-06 | 2010-12-06 | Photoresist coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206569494U CN201867585U (en) | 2010-12-06 | 2010-12-06 | Photoresist coating device |
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| Publication Number | Publication Date |
|---|---|
| CN201867585U true CN201867585U (en) | 2011-06-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010206569494U Expired - Lifetime CN201867585U (en) | 2010-12-06 | 2010-12-06 | Photoresist coating device |
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| CN (1) | CN201867585U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107470090A (en) * | 2017-08-31 | 2017-12-15 | 京东方科技集团股份有限公司 | Coating machine platform and coating machine |
-
2010
- 2010-12-06 CN CN2010206569494U patent/CN201867585U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107470090A (en) * | 2017-08-31 | 2017-12-15 | 京东方科技集团股份有限公司 | Coating machine platform and coating machine |
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Owner name: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY Effective date: 20150707 Owner name: JINGDONGFANG SCIENCE AND TECHNOLOGY GROUP CO., LTD Free format text: FORMER OWNER: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20150707 |
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| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20150707 Address after: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee after: BOE Technology Group Co., Ltd. Patentee after: Beijing BOE Photoelectricity Science & Technology Co., Ltd. Address before: 100176 Beijing economic and Technological Development Zone, West Central Road, No. 8 Patentee before: Beijing BOE Photoelectricity Science & Technology Co., Ltd. |
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| CX01 | Expiry of patent term |
Granted publication date: 20110615 |
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| CX01 | Expiry of patent term |