CN201711851U - 一种硅片抛光装置 - Google Patents
一种硅片抛光装置 Download PDFInfo
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- CN201711851U CN201711851U CN 201020261767 CN201020261767U CN201711851U CN 201711851 U CN201711851 U CN 201711851U CN 201020261767 CN201020261767 CN 201020261767 CN 201020261767 U CN201020261767 U CN 201020261767U CN 201711851 U CN201711851 U CN 201711851U
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- polishing
- silicon chip
- wheel
- silicon wafer
- polishing wheel
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201020261767 CN201711851U (zh) | 2010-07-12 | 2010-07-12 | 一种硅片抛光装置 |
Applications Claiming Priority (1)
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CN 201020261767 CN201711851U (zh) | 2010-07-12 | 2010-07-12 | 一种硅片抛光装置 |
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CN201711851U true CN201711851U (zh) | 2011-01-19 |
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CN 201020261767 Expired - Lifetime CN201711851U (zh) | 2010-07-12 | 2010-07-12 | 一种硅片抛光装置 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103009222A (zh) * | 2012-12-03 | 2013-04-03 | 天津中环领先材料技术有限公司 | 一种高局部平整度重掺硅晶圆抛光片的无蜡抛光工艺 |
CN115106928A (zh) * | 2022-07-15 | 2022-09-27 | 长沙米淇仪器设备有限公司 | 一种行星式高温平面研磨机 |
-
2010
- 2010-07-12 CN CN 201020261767 patent/CN201711851U/zh not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103009222A (zh) * | 2012-12-03 | 2013-04-03 | 天津中环领先材料技术有限公司 | 一种高局部平整度重掺硅晶圆抛光片的无蜡抛光工艺 |
CN115106928A (zh) * | 2022-07-15 | 2022-09-27 | 长沙米淇仪器设备有限公司 | 一种行星式高温平面研磨机 |
CN115106928B (zh) * | 2022-07-15 | 2023-10-24 | 长沙米淇仪器设备有限公司 | 一种行星式高温平面研磨机 |
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Legal Events
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Free format text: FORMER OWNER: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Effective date: 20120121 Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS Effective date: 20120121 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120121 Address after: 100088, 2, Xinjie street, Beijing Patentee after: GRINM Semiconductor Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Co-patentee before: GRINM Semiconductor Materials Co., Ltd. Patentee before: General Research Institute for Nonferrous Metals |
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C56 | Change in the name or address of the patentee |
Owner name: GRINM ADVANCED MATERIALS CO., LTD. Free format text: FORMER NAME: GRINM SEMICONDUCTOR MATERIALS CO., LTD. |
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CP01 | Change in the name or title of a patent holder |
Address after: 100088, 2, Xinjie street, Beijing Patentee after: YOUYAN NEW MATERIAL CO., LTD. Address before: 100088, 2, Xinjie street, Beijing Patentee before: GRINM Semiconductor Materials Co., Ltd. |
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ASS | Succession or assignment of patent right |
Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GRINM ADVANCED MATERIALS CO., LTD. Effective date: 20150611 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150611 Address after: 101300 Beijing city Shunyi District Shuanghe Linhe Industrial Development Zone on the south side of the road Patentee after: You Yan Semi Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Patentee before: YOUYAN NEW MATERIAL CO., LTD. |
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CX01 | Expiry of patent term |
Granted publication date: 20110119 |
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CX01 | Expiry of patent term |