CN201459233U - Sputtering target material cooling device - Google Patents
Sputtering target material cooling device Download PDFInfo
- Publication number
- CN201459233U CN201459233U CN2009200743259U CN200920074325U CN201459233U CN 201459233 U CN201459233 U CN 201459233U CN 2009200743259 U CN2009200743259 U CN 2009200743259U CN 200920074325 U CN200920074325 U CN 200920074325U CN 201459233 U CN201459233 U CN 201459233U
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- Prior art keywords
- sputtering target
- support frame
- target material
- support framework
- collar
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Abstract
The utility model discloses a sputtering target material cooling device which comprises a support framework, and a plurality of target rings hitched on the support framework. A water intake pipe and a water drain pipe which pass through a magnetic core are arranged in the support framework; a lantern ring is arranged between the target rings and the support framework; the lantern ring is hitched on the support framework; and a perforated net is arranged between the lantern ring and the support framework. The improved sputtering target material cooling device improves the cooling efficiency and prolongs the service life of the sputtering target.
Description
Technical field
The utility model relates to the cooling technology of the sputtering target material of industry such as sputter, particularly the circulating water cooling device of the scoring ring of making of some high rigidity, materials with high melting point.
Background technology
Present magnetron sputtering equipment both domestic and external, no matter its sputtering source-target is plane magnetic controlled sputtering target or coaxial magnetron sputtering target, and its common trait is all the sputtering target inside pipe wall to be cooled off as refrigerant with recirculated water, to improve its work efficiency and work-ing life, this kind structure as shown in Figure 1.And the material very high to some fusing point, hardness, as alloys such as wolfram varbides, owing to adopt method moulding such as powder metallurgy, generally be shaped to the about 300mm of length left and right sides scoring ring 3, during use by a plurality of scoring rings be sleeved on skeleton 4 ' on, water coolant enters from water inlet pipe 1, passes magnetic core along water inlet pipe, after the inwall of scoring ring skeleton carries out heat exchange, flow out from exporting 8.Water inlet pipe and water outlet pipe is all on target head 2, and target stand 7 is connected by skeleton with the target head.The drawback of this structure direct refrigerative of water that is cooled exactly is a skeleton, and scoring ring is cooled indirectly by skeleton, so refrigerative efficient is not high.
The utility model content
Technical problem to be solved in the utility model provides a kind of refrigerating unit of improved sputtering target material, makes cooling efficiency higher, the longer service life of sputtering target.
In order to solve the problems of the technologies described above, the utility model adopts following technical scheme:
A kind of refrigerating unit of sputtering target material, comprise a support frame, a plurality of scoring ring that is set on the support frame, be provided with a water inlet pipe and a water shoot that passes magnetic core in the support frame, between described scoring ring and described support frame, be provided with a collar, the described collar is set on the described support frame, is provided with the punching net between the described collar and the described support frame.
Further, described collar two ends respectively are provided with a pressure ring that is used for fixing the collar.
Patent device is owing to adopt the punching net to add thin metallic sheath structure at the scoring ring inwall on the structure to replace conventional steel pipe skeleton, the space layer of heat exchange is reduced greatly, thereby improved cooling efficiency, prolonged scoring ring work-ing life.
Description of drawings
Below in conjunction with the drawings and specific embodiments the utility model is elaborated:
Fig. 1 is the structural representation of sputtering target refrigerating unit in the prior art;
Fig. 2 is the structural representation of the utility model refrigerating unit;
Fig. 3 is the part sectioned view of the utility model refrigerating unit;
Embodiment
As Fig. 2 is the structural representation of the utility model refrigerating unit; A kind of refrigerating unit of sputtering target material, comprise a support frame 4, a plurality of scoring rings 3 that are set on the support frame 4, be provided with a water inlet pipe 1 and a water shoot 8 that passes magnetic core 6 in the support frame 4, between scoring ring 3 and support frame 4, be provided with a collar 5, the collar 5 is set on the support frame 4, it is fixing by the pressure ring 9 at two ends to be provided with punching net 8. collars 5 between the collar 5 and the support frame 4, water coolant enters from water-in 1, flow through the water inlet pipe that places magnetic core 6, be full of whole magnetic core 6 peripheries, pass the punching net 4 compressing Thin Stainless Steel collars 5 simultaneously, under the dual function of the collar 5 negative pressure in the static pressure of water coolant and working cavity to outer process, because being subjected to the constraint of sputter scoring ring 3 inwalls the two is fully contacted, carries out heat exchange, scoring ring 3 is fully cooled off.
The scoring ring refrigerating unit that the utility model relates to includes but not limited to above-mentioned plane or coaxial magnetron sputtering target.Those skilled in the art will recognize that, above-mentioned embodiment is exemplary, be in order better to make those skilled in the art can understand this patent, can not be interpreted as it is the restriction that this patent is comprised scope, so long as according to spirit that this patent discloses done anyly be equal to change or modify, all fall into the scope that this patent comprises.
Claims (2)
1. the refrigerating unit of a sputtering target material comprises a support frame, a plurality of scoring ring that is set on the support frame, is provided with a water inlet pipe and a water shoot that passes magnetic core in the support frame, it is characterized in that:
Be provided with a collar between described scoring ring and described support frame, the described collar is set on the described support frame, is provided with the punching net between the described collar and the described support frame.
2. the refrigerating unit of a kind of sputtering target material according to claim 1 is characterized in that:
Described collar two ends respectively are provided with a pressure ring that is used for fixing the collar.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200743259U CN201459233U (en) | 2009-07-27 | 2009-07-27 | Sputtering target material cooling device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200743259U CN201459233U (en) | 2009-07-27 | 2009-07-27 | Sputtering target material cooling device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201459233U true CN201459233U (en) | 2010-05-12 |
Family
ID=42386587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009200743259U Expired - Fee Related CN201459233U (en) | 2009-07-27 | 2009-07-27 | Sputtering target material cooling device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201459233U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102049568A (en) * | 2010-10-29 | 2011-05-11 | 宁波江丰电子材料有限公司 | Machining device for tantalum ring fixing component |
| CN102808157A (en) * | 2011-05-31 | 2012-12-05 | 无锡华润上华半导体有限公司 | Pipeline system for sputtering target maintenance |
| CN103628031A (en) * | 2012-08-22 | 2014-03-12 | Ap***股份有限公司 | Cooling water process apparatus and processing method and the substrate processing apparatus applying the same |
| CN107976328A (en) * | 2018-01-12 | 2018-05-01 | 北京航空航天大学 | Anti-splash molsink skeleton |
-
2009
- 2009-07-27 CN CN2009200743259U patent/CN201459233U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102049568A (en) * | 2010-10-29 | 2011-05-11 | 宁波江丰电子材料有限公司 | Machining device for tantalum ring fixing component |
| CN102808157A (en) * | 2011-05-31 | 2012-12-05 | 无锡华润上华半导体有限公司 | Pipeline system for sputtering target maintenance |
| CN103628031A (en) * | 2012-08-22 | 2014-03-12 | Ap***股份有限公司 | Cooling water process apparatus and processing method and the substrate processing apparatus applying the same |
| CN107976328A (en) * | 2018-01-12 | 2018-05-01 | 北京航空航天大学 | Anti-splash molsink skeleton |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100512 Termination date: 20170727 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |