CN201447502U - Continuous vacuum coater with multiple chambers - Google Patents
Continuous vacuum coater with multiple chambers Download PDFInfo
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- CN201447502U CN201447502U CN2009200561994U CN200920056199U CN201447502U CN 201447502 U CN201447502 U CN 201447502U CN 2009200561994 U CN2009200561994 U CN 2009200561994U CN 200920056199 U CN200920056199 U CN 200920056199U CN 201447502 U CN201447502 U CN 201447502U
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Abstract
A continuous vacuum coater with multiple chambers comprises a sheet feed vacuum chamber 2, a front buffer vacuum chamber 4, a front transitional vacuum chamber 6, a filming coating vacuum chamber 8, a rear transitional vacuum chamber 9, a rear buffer vacuum chamber 11 and a sheet discharge vacuum chamber 13, which are in sequential and series connection and are separated by six valves; a plurality of target sheets 7 are arranged in the filming coating vacuum chamber 8; the vacuum chambers are connected with vacuum generating devices, including a front primary vacuum system 16 and a rear primary vacuum system 22 which are connected with the sheet feed vacuum chamber and the sheet discharge vacuum chamber; a front buffer depth exhaust system 17 and a rear buffer depth exhaust system 21 which are connected with the front and the rear buffer vacuum chambers; a front depth exhaust system 18 and a rear depth exhaust system 20 which are connected with the front and the rear transitional vacuum chambers; and a filming coating depth exhaust system 19 connected with the filming coating vacuum chamber. The continuous vacuum coater with stable vacuum degree without fluctuation, good quality of coated films, reasonable layout of the vacuum chambers and high efficiency reduces the exhaust time of the sheet feed chamber and the sheet discharge chamber, and improves the production efficiency. Moreover, the continuous vacuum coater is suitable for various vacuum coaters for continuous production.
Description
Technical field
The utility model relates to the magnetron sputtering film device, particularly a kind of production equipment of multicell continuous vacuum coating.
Technical background
Developing rapidly of sputter vacuum coating technology, make the vacuum chamber of core, turn to two Room from single chamber, then to the multicell development, production equipment develops towards the multicell tinuous production also from the single chamber intermittent type, production efficiency constantly is improved, save greatly to produce and prepare and non-cutting time, and gas clean-up and stability thereof, coating quality promoted.When coating chamber is evacuated to certain vacuum and spends, in coating chamber, charge into working gas (argon gas commonly used), regulate the shielding power supply electric current, make the interior ionization of gas situation of coating chamber stable, positive ion bombardment target material surface by ionization goes out sputters target atom to substrate, just forms film.Application number 200810143143.2 " big area reflective conductive film continuous magnetron sputtering coating film production line ", a designed huge production line, include each vacuum chamber adjacent successively and that be communicated with vacuum system, as preceding pre-vacuum chamber, preceding transition chamber, preceding transfer chamber, continuous 5 medium coating chambers are isolated transfer chamber, insulated chamber for 2, the conducting film coating chamber, back transfer chamber, back transition chamber, and be in entering the section and going out the section of two, also has set magnetic steering transport unit, the production loop that workpiece reversion frame etc. are formed.Unquestionable, the equipment of such production line is quite numerous and jumbled, invest huge, the production cost height.No. 00122078.0 " processing set-up of continuous in-line plating equipment for multi-layer film " (publication number CN 1338531 A) of Chinese patent application, disclose a kind of layout of continuous coating apparatus, this production-line arrangement is followed successively by: separate valve-load vacuum chamber-separate valve-transition vacuum chamber-separate valve-conversion vacuum chamber-2 placed in-line plated film vacuum chamber-buffer vacuum chamber-2 placed in-line plated film vacuum chamber-conversion vacuum chamber-separate valve-transition vacuum chamber-separate valve-unloading piece vacuum chamber-separate valve.Each vacuum chamber is furnished with heating system and temperature control system, and the equipment of core has forward and backward each two plated film vacuum chamber of being kept apart by surge chamber, and this surge chamber is that a high vacuum is isolated air pocket, and each platform independent valve is located at respectively between each vacuum chamber.As can be seen, this is to have reduced on equipment layout compared with the top production line of quoting from, and can reach the two-layer technological effect with upper film of on-line continuous plated film system.
Above-mentioned existing vacuum coating production line device, the vacuum chamber that is put into operation, and supporting vacuum apparatus, suitable bulky complex, facility investment is big, the production cost height.With the less application number 00122078.0 of relative equipment,, when reducing equipment, also to enhance productivity though equipment has reduced.It is proper that this depends on whether processing set-up disposes, and the partner is reasonable, to give full play to the utilising efficiency of equipment.On the propulsive direction of film-coating workpiece, glass is to enter from entering the section on the leading frame, through the plated film district, comes out from going out the section again.In progradation, the vacuum tightness of each vacuum chamber can be to change, or takes out or stop, or elementary take out or essence is taken out (being degree of depth exhaust), and the vacuum generating process required time and the workpiece residence time have also just been distinguished to some extent.As excessive, will influence whole efficiency in the residence time of each chamber difference.Vacuum chamber is many, and total residence time is just long, and producing the required energy consumption of vacuum also can increase.As above-mentioned processing set-up, when wherein the substrate dolly is in load chamber and two, unloading piece chamber, be to adopt the intermittent type action, in remaining coating chamber, be continuous operations only, make like this in the loading, unloading sheet chamber at production line two, the vacuum loading amount is very big, so adopted more than 3 vacuum pumps of series connection, is vented to 0.27 * 10
-3Pa just begins plated film.The sheet chamber at this two has just become " bottleneck " effect.Wherein the quantity of coating chamber depends on coating layers.So, when guaranteeing coating quality, to guarantee not only that promptly coating chamber vacuum tightness is enough high and stable, exhaust process steadily, do not fluctuate also need not reduce workpiece in residence time of each chamber with obtain time of vacuum as far as possible, so that raise the efficiency, save energy; , grasp the key link, reasonably each vacuum chamber of scientific allocation just seems very important for this reason.
Summary of the invention
The purpose of this utility model is to avoid above-mentioned the deficiencies in the prior art part, and provides a kind of coating quality good, and equipment is less, and operation is convenient; Production efficiency is higher, particularly can reduce the multicell continuous vacuum coating device into and out of sheet chamber evacuation time.
The purpose of this utility model can reach by following measure:
A kind of multicell continuous vacuum coating device, comprise by valve between the two and connecting mutually, and the device of the other a plurality of vacuum chambers that are connected to vacuum generating device, a kind of continuous vacuum coating of being connected into, it is characterized in that, described a plurality of vacuum chamber and a plurality of placed in-line valve include placed in-line successively following equipment:
Valve I-advances before buffer vacuum chamber before sheet vacuum chamber-valve II--valve III-buffer vacuum chamber-valve V-slice vacuum chamber-valve VI behind transition vacuum chamber-plated film vacuum chamber-back transition vacuum chamber-valve IV-; In the plated film vacuum chamber, be equiped with 1 or some target bars as the sputter coating material;
Described vacuum generating device comprises being connected to pumped vacuum systems on each vacuum chamber, elementary and degree of depth exhaust system; In the middle of have and be connected the into preceding elementary pumped vacuum systems of sheet vacuum chamber, be connected the back elementary pumped vacuum systems of slice vacuum chamber; The preceding buffer depth exhaust system of buffer vacuum chamber before being connected, the preceding degree of depth exhaust system of transition vacuum chamber before being connected, be connected the plated film degree of depth exhaust system of plated film vacuum chamber, be connected the back degree of depth exhaust system of back transition vacuum chamber, and the back buffer depth exhaust system on the buffer vacuum chamber after being connected, these systems are by vacuum valve, vacuum pump and corresponding vacuum pipe, and connect into vacuum generating system.
Above-mentioned plated film degree of depth exhaust system, be included in diffusion pump or molecular pump that each 3 symmetries in plated film vacuum chamber both sides connect, every diffusion pump or molecular pump are to smoke valve by 1 essence separately to be connected on the vacuum chamber both sides, and the exhaust side of every pump the other end all is connected to one group and comprises on vacuum pipe lobe pump and fore pump, vacuum pump group inlet end.
Above-mentioned preceding degree of depth exhaust system, comprise each 1 in preceding transition vacuum chamber both sides, diffusion pump or molecular pump that symmetry connects, every diffusion pump or molecular pump, be to take out the both sides that valve is connected to vacuum chamber by 1 essence separately, and the exhaust side of every pump the other end all is connected to one group and includes on vacuum pipe lobe pump and fore pump, vacuum pump group inlet end; Described back degree of depth exhaust system, comprise each 1 in transition vacuum chamber both sides, back, diffusion pump or molecular pump that symmetry connects, every diffusion pump or molecular pump, be to take out the both sides that valve is connected to vacuum chamber by 1 essence separately, and the exhaust side of every pump the other end all is connected to one group and includes on vacuum pipe lobe pump and fore pump, vacuum pump group inlet end.
Above-mentioned preceding buffer depth exhaust system, comprise each 1 in preceding buffer vacuum chamber both sides, the symmetry diffusion pump or the molecular pump that connect, every diffusion pump or molecular pump, be to smoke valve by 1 essence separately to be connected to the vacuum chamber both sides, and the exhaust side of every pump the other end, all be connected to one group and comprise on vacuum pipeline lobe pump and fore pump, vacuum pump group inlet end, this organizes the inlet end of vacuum pump group, and is connected to a side of above-mentioned preceding buffer vacuum chamber; Described back buffer depth exhaust system, comprise diffusion pump or molecular pump that each 1 both sides in the back buffer vacuum chamber, symmetry connect, every diffusion pump or molecular pump, be to smoke valve by 1 essence separately to be connected to the vacuum chamber both sides, and the exhaust side of every pump the other end, all be connected to one group and comprise on vacuum pipe lobe pump and fore pump, vacuum pump group inlet end, this organizes the inlet end of vacuum pump group, and is connected to a side of above-mentioned back buffer vacuum chamber.
Above-mentioned preceding elementary pumped vacuum systems includes and slightly takes out valve by 1 and be connected to the into vacuum pump of sheet vacuum chamber, and purging valve, relevant vacuum pipe; The elementary pumped vacuum systems in described back includes by 1 and slightly takes out the vacuum pump that valve is connected to the slice vacuum chamber, and purging valve, relevant vacuum pipe.
Above-mentioned valve I, valve II, valve III, valve IV, valve V and valve VI are a kind of turning plate valves.
Vacuum coater of the present utility model has following advantage:
Vacuum tightness steadily, do not fluctuate, coating quality is good.Both sides in coating chamber and forward and backward transition vacuum chamber, 5 groups of diffusion pump of totally 10 have been symmetrical arranged evenly, perhaps totally 10 can produce the molecular pump that condition of high vacuum degree more and nothing are returned oily phenomenon, and in the elementary deflated vacuum pump of its exhaust side series connection upper level group, make in these vacuum chambers, each locational vacuum tightness is high and quite steady, can not fluctuate, help the stable of target current, improve coating quality.
2. shorten in evacuation time, enhance productivity into and out of the sheet chamber.Workpiece is in the sheet chamber, and vacuum generating system is bled to it, is not to be extracted into the condition of high vacuum degree stage always, but this process is decomposed into two stages.Therefore, only disposing elementary pumped vacuum systems into and out of the sheet chamber, taking out from normal pressure just that to be vented to 500Pa be the fs, workpiece is subordinate phase in forward and backward surge chamber, is extracted into 8 * 10 from 500Pa in this two Room
-1Pa.By the buffering of forward and backward surge chamber to vacuum tightness, workpiece can be tapered to one fen half in the waiting time into and out of the sheet chamber from 3 minutes, enhance productivity exponentially, simultaneously also corresponding the minimizing in the configuration into and out of the vacuum generating equipment of sheet chamber solved ' bottleneck ' difficult problem of serialization production process.
3. the configuration of vacuum chamber is reasonable, efficient is high.The series connection vacuum chamber system of the utility model device, by 6 turning plate valves, it is divided into 5 zones, can make each zone that different vacuum tightness is arranged in the operation, reduced the cycle time in certain stage of film plating substrate, raising equipment is the consistence of operation continuously, particularly into and out of the surge chamber that is provided with between sheet chamber and the transition chamber, reasonably make two long stages of exhaust process, wherein subordinate phase exhaust is put in the surge chamber carries out, this rational scientific allocation has improved the production efficiency of whole production line.
The utility model is done the narration of further indefiniteness below in conjunction with drawings and Examples.
Description of drawings
Fig. 1 is the structural representation of the utility model multicell continuous vacuum coating device;
Among the figure, the 1st, valve I, the 2nd, advance the sheet vacuum chamber, the 3rd, valve II, the 4th, preceding buffer vacuum chamber, the 5th, valve III, the 6th, preceding transition vacuum chamber, the 7th, target bar, the 8th, plated film vacuum chamber, the 9th, back transition vacuum chamber, the 10th, valve IV, the 11st, back buffer vacuum chamber, the 12nd, valve V, the 13rd, slice vacuum chamber, the 14th, valve VI, the 15th, preceding purging valve, the elementary pumped vacuum systems of 16 expressions, the 161st, the vacuum pump of this system, buffer depth exhaust system before 17 expressions, 171,172nd, the diffusion pump of this system or molecular pump, the 173rd, the lobe pump of this system, the 174th, the fore pump of this system, degree of depth exhaust system before 18 expressions, 181,182nd, the diffusion pump of this system or molecular pump, the 183rd, the lobe pump of this system, the 184th, the fore pump of this system, 19 expression plated film degree of depth exhaust system, 191,192,193,194,195, the 196th, the diffusion pump of this system or molecular pump, the 197th, the lobe pump of this system, the 198th, the fore pump of this system, 20 expression back degree of depth exhaust system, 201, the 202nd, the diffusion pump of this system or molecular pump, the 203rd, the lobe pump of this system, the 204th, the fore pump of this system, 21 expression back buffer depth exhaust system, 211,212nd, the diffusion pump of this system or molecular pump, the 213rd, the lobe pump of this system, the 214th, the fore pump of this system, the elementary pumped vacuum systems in 22 expression backs, the 221st, the vacuum pump of this system, the 23rd, back purging valve.
Embodiment
As shown in drawings, on the basis of a production line, following vacuum chamber is installed successively: advance before the sheet vacuum chamber 2-before the buffer vacuum chamber 4-behind the transition vacuum chamber 6-plated film vacuum chamber 8-buffer vacuum chamber 11-slice vacuum chamber 13 behind the transition vacuum chamber 9-; Wherein, there are some at 8 li devices of coating chamber, maximum 10, general 4 target bar 7, the plated film vacuum chamber with before, back transition vacuum chamber is direct-connected, other each vacuum chamber then connects by turning plate valve one by one. two of production line, promptly enter the inlet of sheet chamber and the exit of slice chamber, turning plate valve also is installed, and such valve is followed successively by valve I, valve II, valve III, valve IV, valve V, valve VI, its code name is respectively 1,3,5,10,12,14. like this, along the working direction of substrate, install the vacuum chamber of said sequence, and the valve between chamber and the chamber. above-mentioned each vacuum chamber is connected with the vacuum generating system that comprises elementary pumped vacuum systems and degree of depth exhaust system separately.
What be connected with valve I and valve II respectively at the working direction two ends advances sheet vacuum chamber 2, purging valve 15 before its side is equipped with, and preceding elementary pumped vacuum systems 16, this vacuum system 16 includes the vacuum pump of slightly taking out 161, the inlet end of this pump 161 is slightly taken out valve by one and is connected on the sheet vacuum chamber 2, and this pump inlet end also has been connected to one and has led to atmospheric termination of pumping inflation valve.And, similarly, having two ends to be connected with the slice vacuum chamber 13 of valve V and valve VI respectively equally at the production line end, its side is equipped with back purging valve 23 and the back elementary pumped vacuum systems 22 that is connected with the vacuum pump of slightly taking out 221.Preceding buffer vacuum chamber 4 both sides in above-mentioned valve II back, be symmetrically arranged with each 1 diffusion pump or molecular pump 171,172, and comprise lobe pump 173 and fore pump 174 vacuum pump groups, preceding buffer depth exhaust system 17, the inlet end of these 2 pumps is respectively taken out valve by 1 essence and is connected to the vacuum chamber two sides, and the exhaust side parallel connection of 2 pumps, be connected to by a valve, the vacuum pump group that comprises lobe pump 173 and fore pump 174, the inlet end of this pump group is also taken out valve by an essence and is connected to the vacuum chamber side, be manipulation require, this lobe pump also is equipped with a by-pass valve, and the termination of pumping inflation valve is housed between lobe pump and fore pump.Similarly, on the buffer vacuum chamber 11 of back, be connected with back buffer depth exhaust system 21 equally, there be diffusion pump or the molecular pump of installing in the chamber zygomorphy 211,212 in this system, comprises the vacuum pump group of lobe pump 213 and fore pump 214 in the exhaust side parallel connection of pump.Working direction by valve III be connected with preceding buffer vacuum chamber 4 above-mentioned before transition vacuum chamber 6, zygomorphy in the chamber is equipped with diffusion pump or molecular pump 181,182, this 2 pumps are smoked valve by essence separately and are connected the both sides, chamber, the exhaust side parallel connection of 2 pumps, be connected to the vacuum pump group that comprises lobe pump 183 and fore pump 184 by 1 deck valve door, between lobe pump and fore pump, the side is connected to a termination of pumping inflation valve.Each vacuum apparatus that transition vacuum chamber 6 is connected in face of going up is formed a preceding degree of depth exhaust system 18.Similarly, by valve IV with above the back transition vacuum chamber 9 that afterwards buffer vacuum chamber 11 is connected, be connected with back degree of depth exhaust system 20, they are to connect each 1 diffusion pump or molecular pump 201 in the chamber zygomorphy, 202, the inlet end of these 2 pumps is smoked valve by 1 essence separately and is connected on the chamber, the exhaust side parallel connection of pump, by 1 by-pass valve control, be connected to the vacuum pump group that comprises lobe pump 203 and fore pump 204.Before above-mentioned, between the back transition vacuum chamber 6 and 9, it is the nucleus equipment of the utility model device, plated film vacuum chamber 8, indoor set has 4 target bars 7, device is in the plated film degree of depth exhaust system 19 of this chamber, include 2 groups of totally 6 diffusion pump or molecular pumps 191,192,193 and 194,195,196, their symmetries are installed in the both sides of coating chamber, and every pump is smoked valve by essence separately and is connected on the vacuum chamber, the exhaust side parallel connection of pump, be connected to a vacuum pump group by an operated valve, the pump group has lobe pump 197 and foreline valve 198, connects a termination of pumping inflation valve between this two pump.Like this, form above-mentioned plated film degree of depth exhaust system 19.
During use, divide and to prepare the stage, in plated film production (operation automatically) stage, shut-down-phase will be advanced sheet vacuum chamber 2 earlier and be evacuated down to 500Pa, and preceding buffer vacuum chamber 4 is being evacuated to when being higher than 500Pa, and substrate enters this chamber fast.Valve-off II continues to vacuumize arriving 8 * 10
-1During Pa,, finish plated film production later on according to operating process.The utility model device is applicable to the vacuum coating film equipment that various serializations are produced.
Claims (10)
1. multicell continuous vacuum coating device, comprise by valve between the two and connecting mutually, and the device of the other a plurality of vacuum chambers that are connected to vacuum generating device, a kind of continuous vacuum coating of being connected into, it is characterized in that, described a plurality of vacuum chamber and a plurality of placed in-line valve include placed in-line successively following equipment:
Valve I (1)-advance sheet vacuum chamber (2)-valve II (3)-preceding buffer vacuum chamber (4)-valve III (5)-preceding transition vacuum chamber (6)-plated film vacuum chamber (8)-back transition vacuum chamber (9)-valve IV (10)-back buffer vacuum chamber (11)-valve V (12)-slice vacuum chamber (13)-valve VI (14); In plated film vacuum chamber (8) lining, be equiped with 1 or some target bars (7) as the sputter coating material;
Described vacuum generating device comprises being connected to pumped vacuum systems on each vacuum chamber, elementary and degree of depth exhaust system; In the middle of have and be connected the into preceding elementary pumped vacuum systems (16) of sheet vacuum chamber (2), be connected the back elementary pumped vacuum systems (22) of slice vacuum chamber (13); Be connected the preceding buffer depth exhaust system (17) of preceding buffer vacuum chamber (4), be connected the preceding degree of depth exhaust system (18) of preceding transition vacuum chamber (6), be connected the plated film degree of depth exhaust system (19) of plated film vacuum chamber (8), be connected the back degree of depth exhaust system (20) of back transition vacuum chamber (9), and the back buffer depth exhaust system (21) on the buffer vacuum chamber (11) after being connected, these systems pass through vacuum valve, vacuum pump and corresponding vacuum pipe, and connect into vacuum generating system.
2. multicell continuous vacuum coating device according to claim 1, it is characterized in that, described plated film degree of depth exhaust system (19), be included in diffusion pump or molecular pump (191 that each 3 symmetries in plated film vacuum chamber (8) both sides connect, 192,193,194,195,196), every diffusion pump or molecular pump (191,192,193,194,195,196) be to smoke valve by 1 essence separately to be connected on the vacuum chamber both sides, and the exhaust side of every pump the other end all is connected to one group and comprises lobe pump (197) and fore pump (198), on the vacuum pipe of vacuum pump group inlet end.
3. multicell continuous vacuum coating device according to claim 1 and 2, it is characterized in that, degree of depth exhaust system (18) before described, comprise each 1 in preceding transition vacuum chamber (6) both sides, diffusion pump or molecular pump (181 that symmetry connects, 182), every diffusion pump or molecular pump (181,182), be to take out the both sides that valve is connected to vacuum chamber by 1 essence separately, and the exhaust side of every pump the other end all is connected to one group and includes on vacuum pipe lobe pump (183) and fore pump (184), vacuum pump group inlet end; Described back degree of depth exhaust system (20), comprise each 1 in transition vacuum chamber (9) both sides, back, diffusion pump or molecular pump (201 that symmetry connects, 202), every diffusion pump or molecular pump (201,202) are to take out the both sides that valve is connected to vacuum chamber by 1 essence separately, and the exhaust side of every pump the other end all is connected to one group and includes on vacuum pipe lobe pump (203) and fore pump (204), vacuum pump group inlet end.
4. multicell continuous vacuum coating device according to claim 1 and 2, it is characterized in that, buffer depth exhaust system (17) before described, comprise each 1 in preceding buffer vacuum chamber (4) both sides, diffusion pump or molecular pump (171 that symmetry connects, 172), every diffusion pump or molecular pump (171,172), be to smoke valve by 1 essence separately to be connected to the vacuum chamber both sides, and the exhaust side of every pump the other end, all be connected to one group and comprise lobe pump (173) and fore pump (174), on the vacuum pipe of vacuum pump group inlet end, this organizes the inlet end of vacuum pump group, and is connected to a side of above-mentioned preceding buffer vacuum chamber (4); Described back buffer depth exhaust system (21), comprise diffusion pump or molecular pump (211 that each 1 both sides in back buffer vacuum chamber (11), symmetry connect, 212), every diffusion pump or molecular pump (211,212), be to smoke valve by 1 essence separately to be connected to the vacuum chamber both sides, and the exhaust side of every pump the other end, all being connected to one group comprises on vacuum pipe lobe pump (213) and fore pump (214), vacuum pump group inlet end, this organizes the inlet end of vacuum pump group, and is connected to a side of above-mentioned back buffer vacuum chamber (11).
5. multicell continuous vacuum coating device according to claim 3, it is characterized in that, buffer depth exhaust system (17) before described, comprise each 1 in preceding buffer vacuum chamber (4) both sides, diffusion pump or molecular pump (171 that symmetry connects, 172), every diffusion pump or molecular pump (171,172), be to smoke valve face by 1 essence separately to be connected to the vacuum chamber both sides, and the exhaust side of every pump the other end, all be connected to one group and comprise lobe pump (173) and fore pump (174), on the vacuum pipe of vacuum pump group inlet end, this organizes the inlet end of vacuum pump group, and is connected to a side of above-mentioned preceding buffer vacuum chamber (4); Described back buffer depth exhaust system (21), comprise diffusion pump or molecular pump (211 that each 1 both sides in back buffer vacuum chamber (11), symmetry connect, 212), every diffusion pump or molecular pump (211,212) be to smoke valve face by 1 essence separately to be connected to the vacuum chamber both sides, and the exhaust side of every pump the other end, all being connected to one group comprises on vacuum pipe lobe pump (213) and fore pump (214), vacuum pump group inlet end, the inlet end of this group vacuum pump group also is parallel to a side of above-mentioned back buffer vacuum chamber (11).
6. multicell continuous vacuum coating device according to claim 1 and 2, it is characterized in that, described before elementary pumped vacuum systems (16), include and slightly take out valve by 1 and be connected to the into vacuum pump (161) of sheet vacuum chamber (2), and purging valve, relevant vacuum pipe; Described back elementary pumped vacuum systems (22) includes by 1 and slightly takes out the vacuum pump (221) that valve is connected to slice vacuum chamber (13), and purging valve, relevant vacuum pipeline.
7. multicell continuous vacuum coating device according to claim 3, it is characterized in that, described before elementary pumped vacuum systems (16), include and slightly take out valve by 1 and be connected to the into vacuum pump (161) of sheet vacuum chamber (2), and purging valve, relevant vacuum pipe; Described back elementary pumped vacuum systems (22) includes by 1 and slightly takes out the vacuum pump (221) that valve is connected to slice vacuum chamber (13), and purging valve, relevant vacuum pipe.
8. multicell continuous vacuum coating device according to claim 4, it is characterized in that, described before elementary pumped vacuum systems (16), include and slightly take out valve by 1 and be connected to the into vacuum pump (161) of sheet vacuum chamber (2), and purging valve, relevant vacuum pipeline; Described back elementary pumped vacuum systems (22) includes by 1 and slightly takes out the vacuum pump (221) that valve is connected to slice vacuum chamber (13), and purging valve, relevant vacuum pipe.
9. multicell continuous vacuum coating device according to claim 6, it is characterized in that, described before elementary pumped vacuum systems (16), include and slightly take out valve by 1 and be connected to the into vacuum pump (161) of sheet vacuum chamber (2), and purging valve, relevant vacuum pipe; Described back elementary pumped vacuum systems (22) includes by 1 and slightly takes out the vacuum pump (221) that valve is connected to slice vacuum chamber (13), and purging valve, relevant vacuum pipe.
10. multicell continuous vacuum coating device according to claim 1 is characterized in that, described valve I (1), and valve II (3), valve III (5), valve IV (10), valve V (12) and valve VI (14) they are a kind of turning plate valves.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200561994U CN201447502U (en) | 2009-05-11 | 2009-05-11 | Continuous vacuum coater with multiple chambers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200561994U CN201447502U (en) | 2009-05-11 | 2009-05-11 | Continuous vacuum coater with multiple chambers |
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| CN201447502U true CN201447502U (en) | 2010-05-05 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2009200561994U Expired - Fee Related CN201447502U (en) | 2009-05-11 | 2009-05-11 | Continuous vacuum coater with multiple chambers |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102329084A (en) * | 2011-06-23 | 2012-01-25 | 江苏宇天港玻新材料有限公司 | Glass coating equipment and multiple groups of switch rooms therein |
| CN102943243A (en) * | 2012-11-27 | 2013-02-27 | 湘潭宏大真空技术股份有限公司 | Magnetron sputtering coating production line for capacitive touch screens |
| CN103374699A (en) * | 2012-04-26 | 2013-10-30 | 北京物华天宝镀膜科技有限公司 | Glass coating equipment |
| CN103486090A (en) * | 2012-06-14 | 2014-01-01 | 浙江五环钛业股份有限公司 | Vacuum self-consuming furnace cooling energy-saving device |
| CN104913601A (en) * | 2014-12-29 | 2015-09-16 | 深圳市信宇人科技有限公司 | Method for baking lithium ion battery or battery pole piece in tunnel mode |
| CN106011751A (en) * | 2016-06-28 | 2016-10-12 | 广东腾胜真空技术工程有限公司 | Continuous coating equipment for metalizing opening of circuit board and method thereof |
| CN107365973A (en) * | 2017-08-29 | 2017-11-21 | 肇庆市前沿真空设备有限公司 | A kind of vacuum coating production line and film plating process |
| CN114525490A (en) * | 2022-02-18 | 2022-05-24 | 重庆诺奖二维材料研究院有限公司 | Vacuum pumping control system and control method for roll-to-roll film coating machine |
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2009
- 2009-05-11 CN CN2009200561994U patent/CN201447502U/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102329084A (en) * | 2011-06-23 | 2012-01-25 | 江苏宇天港玻新材料有限公司 | Glass coating equipment and multiple groups of switch rooms therein |
| CN103374699A (en) * | 2012-04-26 | 2013-10-30 | 北京物华天宝镀膜科技有限公司 | Glass coating equipment |
| CN103374699B (en) * | 2012-04-26 | 2015-12-02 | 北京物华天宝镀膜科技有限公司 | A kind of glass coating equipment |
| CN103486090A (en) * | 2012-06-14 | 2014-01-01 | 浙江五环钛业股份有限公司 | Vacuum self-consuming furnace cooling energy-saving device |
| CN102943243A (en) * | 2012-11-27 | 2013-02-27 | 湘潭宏大真空技术股份有限公司 | Magnetron sputtering coating production line for capacitive touch screens |
| CN104913601A (en) * | 2014-12-29 | 2015-09-16 | 深圳市信宇人科技有限公司 | Method for baking lithium ion battery or battery pole piece in tunnel mode |
| CN106011751A (en) * | 2016-06-28 | 2016-10-12 | 广东腾胜真空技术工程有限公司 | Continuous coating equipment for metalizing opening of circuit board and method thereof |
| CN107365973A (en) * | 2017-08-29 | 2017-11-21 | 肇庆市前沿真空设备有限公司 | A kind of vacuum coating production line and film plating process |
| CN107365973B (en) * | 2017-08-29 | 2024-02-02 | 肇庆市德信真空设备有限公司 | Vacuum coating production line and coating method |
| CN114525490A (en) * | 2022-02-18 | 2022-05-24 | 重庆诺奖二维材料研究院有限公司 | Vacuum pumping control system and control method for roll-to-roll film coating machine |
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