CN201276761Y - 一种具有变形缝的建筑结构 - Google Patents
一种具有变形缝的建筑结构 Download PDFInfo
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- CN201276761Y CN201276761Y CNU200820152791XU CN200820152791U CN201276761Y CN 201276761 Y CN201276761 Y CN 201276761Y CN U200820152791X U CNU200820152791X U CN U200820152791XU CN 200820152791 U CN200820152791 U CN 200820152791U CN 201276761 Y CN201276761 Y CN 201276761Y
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNU200820152791XU CN201276761Y (zh) | 2008-09-05 | 2008-09-05 | 一种具有变形缝的建筑结构 |
Applications Claiming Priority (1)
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CNU200820152791XU CN201276761Y (zh) | 2008-09-05 | 2008-09-05 | 一种具有变形缝的建筑结构 |
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CN201276761Y true CN201276761Y (zh) | 2009-07-22 |
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CNU200820152791XU Expired - Lifetime CN201276761Y (zh) | 2008-09-05 | 2008-09-05 | 一种具有变形缝的建筑结构 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103485424A (zh) * | 2013-10-14 | 2014-01-01 | 广州市设计院 | 一种隐藏式高低跨变形缝及其防水构造 |
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2008
- 2008-09-05 CN CNU200820152791XU patent/CN201276761Y/zh not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103485424A (zh) * | 2013-10-14 | 2014-01-01 | 广州市设计院 | 一种隐藏式高低跨变形缝及其防水构造 |
CN103485424B (zh) * | 2013-10-14 | 2016-05-18 | 广州市设计院 | 一种隐藏式高低跨变形缝及其防水构造 |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: HUADONG ARCHITECTURE DESIGN + RESEARCH INST CO., L Free format text: FORMER OWNER: SHANGHAI XIAN DAI ARCHITECTURAL DESIGN (GROUP) CO., LTD. Effective date: 20140402 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 200041 HUANGPU, SHANGHAI TO: 200041 JING'AN, SHANGHAI |
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TR01 | Transfer of patent right |
Effective date of registration: 20140402 Address after: 200041 Jingan District Road, Shimen, No. two, No. 258, Shanghai Patentee after: Shanghai Architectural Design & Research Institute Co., Ltd. Patentee after: East China Architectural Design & Research Institute Co., Ltd. Address before: 200041 No. two, 258, Shimen, Shanghai Patentee before: Shanghai Architectural Design & Research Institute Co., Ltd. Patentee before: Shanghai Xiandai Archtectural Design (Group) Co., Ltd. |
|
CX01 | Expiry of patent term |
Granted publication date: 20090722 |
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CX01 | Expiry of patent term |