CN1959447A - Method for constructing depolarization filter of wide spectrum and 45 degree angle of incidence - Google Patents

Method for constructing depolarization filter of wide spectrum and 45 degree angle of incidence Download PDF

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Publication number
CN1959447A
CN1959447A CN 200610118740 CN200610118740A CN1959447A CN 1959447 A CN1959447 A CN 1959447A CN 200610118740 CN200610118740 CN 200610118740 CN 200610118740 A CN200610118740 A CN 200610118740A CN 1959447 A CN1959447 A CN 1959447A
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substrate
membrane
film
layers
thicknesses
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马小凤
刘定权
陈刚
李大琪
朱圳
张凤山
严义勋
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Shanghai Institute of Technical Physics of CAS
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Shanghai Institute of Technical Physics of CAS
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Abstract

A method for structuring depolarization filter with 45degree incoming wide spectrum includes applying two double-reflection films with different central wavelength to form basic module system by stacking three matching layers then optimizing film layer thickness of basic module system by operating size variation program in module design and analysis software of Tfcalc3.5 in order to obtain final film layer thickness of module system on coated film.

Description

The construction method of 45 ° of wide spectral depolarization optical filters of incident
Technical field
The present invention relates to optical filter, be meant a kind of construction method of 45 ° of wide spectral depolarization Thin Film Filters of incident especially.
Background technology
Thin Film Filter is one of important optical element in the multispectral remote sensing instrument system light path.Many places are in the oblique incidence duty in system light path for it, and the oblique incidence meeting of light brings polarization effect for the transmitted light or the reflected light of system, and adding the spectrum that is detected a lot is exactly polarization spectrum originally, has had a strong impact on the accurate detection of target information.For guaranteeing that spectral instrument receives the accurate target radiation data, must subtract polarization to system, the requirement of depolarization correspondingly Thin Film Filter has also been proposed.
The domestic and international at present research at the depolarization optical filter mainly concentrates in the narrower spectral range, the film system of design mostly adopts the coating materials combination more than three kinds or three kinds, and the film structure number of plies that designs is more and be non-ordered structure, and this makes that the work of being coated with of sample faces huge test in the future.So its optical property of optical filter of now using also has very big gap from desirable requirement, two indexs of low degree of polarization and high transmission (or high reflection) are cost with mutual sacrifice all often.And it is less for the research of low degree of polarization optical filter that desiredly in the multispectral ocean remote sensing instrument system light path in visible waveband 400～600nm scope, has high reflectance, in 650～1000nm scope, has a high-transmission rate, do not appear in the newspapers, possible this also is one of factor of restriction ocean remote sensing system development.
Summary of the invention
The objective of the invention is to propose a kind of construction method that is applicable to 45 ° of wide spectral depolarization Thin Film Filters of incident of ocean remote sensing optical system, the rejection zone of this optical filter is 400～600nm, and the transmission band is 650～1000nm.
For achieving the above object, technical scheme of the present invention is: underlying membrane system is set up in the design of adopting two different bireflection membrane stacks of centre wavelength to add three matching layers, part thicknesses of layers to underlying membrane system is optimized then, promptly gets the thicknesses of layers that finally plates membrane system.
Adopting two different double reflecting films of centre wavelength to pile up the purpose that adds is to increase the cut-off width of the zone of reflections.Because film system is to be the underlying membrane architecture with the bireflection membrane stack, so bigger ripple can occur in required transmission band.The appearance of ripple is owing to reflect the mismatch of refractive index between membrane stack and the surrounding medium, reaches coupling to reduce the ripple in the transmission band for making refractive index, is reflecting between membrane stack and the air, is reflecting between membrane stack and the substrate and add matching layer respectively.In addition, also reach better matching to avoid the appearance of secondary peak in the zone of reflections, between the two, also add a matching layer as smooth layer for making between two reflection membrane stacks.
The construction method of 45 ° of wide spectral depolarization Thin Film Filters of incident of the present invention comprises step:
§ 1 sets up underlying membrane system:
The substrate front surface film is:
Substrate/(g 1Hg 2Lg 1H) 2(HL) 8(g 1Hg 2Lg 1H) 2(H ' L ') 11(g 1Hg 2Lg 1H) 2/ air;
The backside of substrate film is:
Substrate/0.8H0.6L1.3H2L/ air;
Wherein: incident medium is an air, and substrate is vitreosil or BK7 glass;
G1, g2 are the thicknesses of layers coefficients, and its span all between 0.5～2.5, is decided on reference wavelength;
(HL) 8(H ' L ') 11Be two bireflection membrane stacks that centre wavelength is different, (HL) 8Centre wavelength is λ 1, (H ' L ') 11Centre wavelength is λ 2
Two (g 1Hg 2g 1H) 2Be matching layer, two (g that reflect between the membrane stack 1Hg 2Lg 1H) 2Be smooth layer;
It is λ that H, L represent optical thickness respectively 1It is λ that/4 high and low refractive index retes, H ', L ' are represented optical thickness respectively 2/ 4 high and low refractive index retes.
The thicknesses of layers that 2 pairs of above-mentioned substrate front surface films of § are is optimized:
The utilization film is the change dimensional optimization method among the design and analysis software Tfcalc3.5, with the transmissivity T=100% of the reflectivity R=100% of the rejection zone of optical filter and transmission band as the optimization aim function, the thicknesses of layers of each matching layer in the above-mentioned front side films system and the low refractive index film layer thickness in the reflection membrane stack are become dimensional optimization, promptly get the thicknesses of layers that finally plates membrane system.
Optical filter construction method of the present invention has the advantage of the following aspects:
1. only adopt two kinds of coating materials of high low-refraction;
2. only the part thicknesses of layers is optimized, and the rete number of plies is less, is easy to be coated with;
3. incident angle is insensitive to polarization variations, and is very little to the optical polarization performance impact of optical filter when incident angle changes in 30 °～50 ° scopes;
4. this optical filter has the characteristics of wide spectrum, low degree of polarization and High Extinction Ratio;
5. the substrate selection of optical filter and coating materials selection range are wide.
Description of drawings
Fig. 1 is the structural representation of optical filter of the present invention; Wherein 1-substrate, 2-matching layer, 3-reflective stack, 4-matching layer, 5-reflective stack, 6-matching layer, 7-back side film system.
Fig. 2 is that embodiment 1 adopts TiO 2And SiO 2The spectrum calculated curve of Thin Film Filter during coating materials;
Fig. 3 is that embodiment 1 adopts TiO 2And SiO 2The spectral measurement curve of the Thin Film Filter that coating materials is coated with;
Fig. 4 is that embodiment 2 adopts TiO 2And Al 2O 3The spectrum calculated curve of the Thin Film Filter during coating materials.
Embodiment
The present invention is further illustrated below in conjunction with accompanying drawing:
Rejection zone according to optical filter of the present invention is 400～600nm, and the transmission band is 650～1000nm.The refractive index n of selectable high index film material HScope is 1.98-2.50, and its material can be selected Ta 2O 5, ZrO 2, ZnS, TiO 2Deng; Low-refraction coating materials refractive index n LSpan be 1.38-1.64, its material can be selected Al 2O 3, SiO 2, MgF 2Deng.
Table 1 is that example 1 is selected TiO 2(n H=2.40) as high index film material, SiO 2(n L=1.43) as low-refraction coating materials, fused silica materials as substrate, central wavelength lambda 1Be 486nm, central wavelength lambda 2Be 573nm, g 1Be 0.5, g 2Be 1.0, using film then is that change dimensional optimization method among the design and analysis software Tfcalc3.5 is that high and low refractive index thicknesses of layers in each matching layer and the low refractive index film layer thickness of reflection in the membrane stack are optimized and obtain to above-mentioned substrate front surface underlying membrane.Fig. 2 calculates the curve of spectrum according to the thicknesses of layers after example 1 table 1 distribution optimization, Fig. 3 adopts electron beam evaporation and ion beam assisted deposition to prepare the measured spectra curve of Thin Film Filter according to the thicknesses of layers after example 1 table 1 distribution optimization, the back side film system of optical filter need not to optimize, and promptly the back side underlying membrane system by above-mentioned design is coated with.The spectral width that can draw it can reach 550nm or wideer, rejection zone internal reflection rate all greater than 98.44%, the average degree of polarization of reflectivity is 0.21%, maximum degree of polarization is 1.57%, and the passband internal transmission factor all greater than 95.70%, the average degree of polarization of transmissivity is 0.66%, maximum degree of polarization is 1.70%, average extinction ratio is greater than 484.It is good to calculate the curve of spectrum and measured spectra curve conformity.Its optical property can satisfy the request for utilization of ocean remote sensing optical system fully.
Example 2 is that with the difference of example 1 high index film material adopts TiO 2, the low-refraction coating materials adopts Al 2O 3, the thicknesses of layers of telolemma system distributes as shown in table 2ly after optimizing, and calculates the curve of spectrum as shown in Figure 4.
Table 1. example 1 adopts TiO 2And SiO 2The physical thickness of the initial rete of coating materials and optimization back rete distributes
The rete sequence number Coating materials TiO 2(H) SiO 2(L) The physical thickness (nm) of initial rete Optimize the physical thickness (nm) of back rete The rete sequence number Coating materials TiO 2(H) SiO 2(L) The physical thickness (nm) of initial rete Optimize the physical thickness (nm) of back rete
1 H 26.7 26.7 27 H 63.9 63.9
2 L 83.7 96.2 28 L 95.5 121.1
3 H 54.2 66.1 29 H 63.9 63.9
4 L 83.7 51.0 30 L 95.5 101.0
5 H 80.6 120.4 31 H 63.9 63.9
6 L 83.7 61.1 32 L 95.5 95.2
7 H 54.2 54.2 33 H 63.9 63.9
8 L 83.7 146.3 34 L 95.5 68.0
9 H 54.2 54.2 35 H 63.9 63.9
10 L 83.7 62.7 36 L 95.5 70.4
11 H 54.2 54.2 37 H 63.9 63.9
12 L 83.7 22.1 38 L 95.5 91.8
13 H 54.2 54.2 39 H 63.9 63.9
14 L 83.7 106.0 40 L 95.5 97.8
15 H 54.2 54.2 41 H 63.9 63.9
16 L 83.7 80.1 42 L 95.5 90.9
17 H 54.2 54.2 43 H 63.9 63.9
18 L 83.7 80.7 44 L 95.5 71.5
19 H 54.2 54.2 45 H 63.9 63.9
20 L 83.7 22.6 46 L 95.5 58.5
21 H 26.7 48.9 47 H 26.7 85.5
22 L 83.7 97.1 48 L 83.7 40.6
23 H 54.2 58.0 49 H 54.2 79.8
24 L 83.7 86.98 50 L 83.7 187.1
25 H 26.7 105.0 51 H 26.7 0
26 L 95.5 77.3
Table 2. example 2 adopts TiO 2And Al 2O 3The physical thickness of the initial rete of coating materials and optimization back rete distributes
The rete sequence number Coating materials TiO 2(H) Al 2O 3(L) The physical thickness (nm) of initial rete Optimize the physical thickness (nm) of back rete The rete sequence number Coating materials TiO 2(H) Al 2O 3(L) The physical thickness (nm) of initial rete Optimize the physical thickness (nm) of back rete
1 H 25.5 14.2 27 H 60.3 60.3
2 L 74.1 101.9 28 L 87.4 83.7
3 H 51.1 46.2 29 H 60.3 60.3
4 L 74.2 59.1 30 L 87.4 97.7
5 H 76.5 56.1 31 H 60.3 60.3
6 L 74.1 61.5 32 L 87.4 87.3
7 H 51.1 51.1 33 H 60.3 60.3
8 L 74.1 73.1 34 L 87.4 103.1
9 H 51.1 51.1 35 H 60.3 60.3
10 L 74.1 80.4 36 L 87.4 87.5
11 H 51.1 51.1 37 H 60.3 60.3
12 L 74.1 68.7 38 L 87.4 103.2
13 H 51.1 51.1 39 H 60.3 60.3
14 L 74.1 64.2 40 L 87.4 89.0
15 H 51.1 51.1 41 H 60.3 60.3
16 L 74.1 77.0 42 L 87.4 97.5
17 H 51.1 51.1 43 H 60.3 60.3
18 L 74.1 88.5 44 L 87.4 91.6
19 H 51.1 45.7 45 H 60.3 60.3
20 L 74.1 73.2 46 L 87.4 91.5
21 H 25.5 50.9 47 H 25.5 60.3
22 L 74.1 53.9 48 L 74.1 52.6
23 H 51.1 32.3 49 H 51.1 109.4
24 L 87.4 70.2 50 L 74.1 145.0
25 H 85.8 60.3 51 H 25.5 0
26 L 87.4 73.6

Claims (1)

1. the construction method of the one kind 45 ° wide spectral depolarization optical filters of incident is characterized in that comprising the steps:
§ A. sets up underlying membrane system:
The substrate front surface film is
Substrate/(g 1Hg 2Lg 1H) 2(HL) 8(g 1Hg 2Lg 1H) 2(H ' L ') 11(g 1Hg 2Lg 1H) 2/ air; The backside of substrate film is:
Substrate/0.8H0.6L1.3H2L/ air;
Wherein: incident medium is an air, and substrate is vitreosil or BK7 glass;
G1, g2 are the thicknesses of layers coefficients, and its span all between 0.5～2.5, is decided on reference wavelength;
(HL) 8(H ' L ') 11Be two bireflection membrane stacks that centre wavelength is different, (HL) 8Centre wavelength is λ 1, (H ' L ') 11Centre wavelength is λ 2
Two (g 1Hg 2Lg 1H) 2Be matching layer, two (g that reflect between the membrane stack 1Hg 2Lg 1H) 2Be smooth layer;
It is λ that H, L represent optical thickness respectively 1It is λ that/4 high and low refractive index retes, H ', L ' are represented optical thickness respectively 2/ 4 high and low refractive index retes.
§ B. is optimized above-mentioned front underlying membrane mesentery layer thickness:
The utilization film is the change dimensional optimization method among the design and analysis software Tfcalc3.5, with the transmissivity T=100% of the reflectivity R=100% of optical filter rejection zone and transmission band thereof as the optimization aim function, the thicknesses of layers of each matching layer in the above-mentioned front side films system and the low refractive index film layer thickness in the reflection membrane stack are become dimensional optimization, promptly get the thicknesses of layers that finally plates membrane system.
CN 200610118740 2006-11-24 2006-11-24 Method for constructing depolarization filter of wide spectrum and 45 degree angle of incidence Pending CN1959447A (en)

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101430425B (en) * 2007-11-09 2010-04-14 鸿富锦精密工业（深圳）有限公司 Dichroic mirror and projection device using the same
CN103984054A (en) * 2014-05-16 2014-08-13 中国科学院上海光学精密机械研究所 All-medium F-P narrow-band depolarization optical filter
CN109683225A (en) * 2019-02-27 2019-04-26 成都国泰真空设备有限公司 A kind of flat sheet membranes edge filter for depolarization
CN109856729A (en) * 2019-03-12 2019-06-07 飞秒光电科技(西安)有限公司 A kind of light splitting self-focusing lens film plating process and Glens lens
CN110687681A (en) * 2019-09-10 2020-01-14 华中科技大学 Optical film system optimization design method and product
CN110879435A (en) * 2019-11-18 2020-03-13 中国科学院上海技术物理研究所 Medium-long wave infrared wide spectrum color separation sheet with zinc selenide crystal as substrate
WO2020103206A1 (en) * 2018-11-22 2020-05-28 福州高意光学有限公司 Polarization-independent filter
CN112162340A (en) * 2020-09-15 2021-01-01 中国科学院上海技术物理研究所 Infrared broad spectrum color separation sheet using germanium as substrate and inclined at 45-degree angle
CN113050272A (en) * 2021-03-03 2021-06-29 中国科学院上海光学精密机械研究所 Deep ultraviolet filter and design method thereof
CN114859549A (en) * 2022-05-10 2022-08-05 中国计量大学 Blue light high-reflection film insensitive to small-size nodule defects and design method
CN118068470A (en) * 2024-04-18 2024-05-24 福州百晶光电有限公司 Laser emission angle positioning and identifying optical filter and application thereof

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101430425B (en) * 2007-11-09 2010-04-14 鸿富锦精密工业（深圳）有限公司 Dichroic mirror and projection device using the same
CN103984054A (en) * 2014-05-16 2014-08-13 中国科学院上海光学精密机械研究所 All-medium F-P narrow-band depolarization optical filter
CN103984054B (en) * 2014-05-16 2017-04-12 中国科学院上海光学精密机械研究所 All-medium F-P narrow-band depolarization optical filter
CN111290064A (en) * 2018-11-22 2020-06-16 福州高意光学有限公司 Polarization-independent optical filter
WO2020103206A1 (en) * 2018-11-22 2020-05-28 福州高意光学有限公司 Polarization-independent filter
CN109683225A (en) * 2019-02-27 2019-04-26 成都国泰真空设备有限公司 A kind of flat sheet membranes edge filter for depolarization
CN109856729A (en) * 2019-03-12 2019-06-07 飞秒光电科技(西安)有限公司 A kind of light splitting self-focusing lens film plating process and Glens lens
CN110687681A (en) * 2019-09-10 2020-01-14 华中科技大学 Optical film system optimization design method and product
CN110879435A (en) * 2019-11-18 2020-03-13 中国科学院上海技术物理研究所 Medium-long wave infrared wide spectrum color separation sheet with zinc selenide crystal as substrate
CN112162340A (en) * 2020-09-15 2021-01-01 中国科学院上海技术物理研究所 Infrared broad spectrum color separation sheet using germanium as substrate and inclined at 45-degree angle
CN112162340B (en) * 2020-09-15 2022-03-29 中国科学院上海技术物理研究所 Infrared broad spectrum color separation sheet using germanium as substrate and inclined at 45-degree angle
CN113050272A (en) * 2021-03-03 2021-06-29 中国科学院上海光学精密机械研究所 Deep ultraviolet filter and design method thereof
CN114859549A (en) * 2022-05-10 2022-08-05 中国计量大学 Blue light high-reflection film insensitive to small-size nodule defects and design method
CN114859549B (en) * 2022-05-10 2024-01-12 中国计量大学 Blue light high-reflection film insensitive to small-size node defects and design method
CN118068470A (en) * 2024-04-18 2024-05-24 福州百晶光电有限公司 Laser emission angle positioning and identifying optical filter and application thereof

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