CN1848405A - 晶片举升装置及举升方法 - Google Patents
晶片举升装置及举升方法 Download PDFInfo
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- CN1848405A CN1848405A CN 200510126436 CN200510126436A CN1848405A CN 1848405 A CN1848405 A CN 1848405A CN 200510126436 CN200510126436 CN 200510126436 CN 200510126436 A CN200510126436 A CN 200510126436A CN 1848405 A CN1848405 A CN 1848405A
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CNB2005101264366A CN100423224C (zh) | 2005-12-09 | 2005-12-09 | 晶片举升装置及举升方法 |
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CNB2005101264366A CN100423224C (zh) | 2005-12-09 | 2005-12-09 | 晶片举升装置及举升方法 |
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CN1848405A true CN1848405A (zh) | 2006-10-18 |
CN100423224C CN100423224C (zh) | 2008-10-01 |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101916739A (zh) * | 2010-07-13 | 2010-12-15 | 上海技美电子科技有限公司 | 晶圆承载装置 |
CN102299090A (zh) * | 2010-06-25 | 2011-12-28 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 顶针及具有该顶针的等离子体刻蚀装置 |
CN104347358A (zh) * | 2014-09-15 | 2015-02-11 | 上海华力微电子有限公司 | 改善器件等离子体损伤的方法 |
CN107305858A (zh) * | 2016-04-20 | 2017-10-31 | 北京北方华创微电子装备有限公司 | 顶针机构及预清洗腔室 |
CN108155094A (zh) * | 2016-12-05 | 2018-06-12 | 东京毅力科创株式会社 | 等离子体处理装置 |
CN108962794A (zh) * | 2018-07-20 | 2018-12-07 | 北京北方华创微电子装备有限公司 | 一种升针方法及应用其的顶针升降装置 |
CN109072422A (zh) * | 2016-05-12 | 2018-12-21 | 康宁股份有限公司 | 具有不规则表面平坦度的盖板玻璃的静电夹持 |
CN112309889A (zh) * | 2019-08-02 | 2021-02-02 | 合肥晶合集成电路股份有限公司 | 一种基板检测装置及其检测方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06112303A (ja) * | 1992-09-29 | 1994-04-22 | Sony Corp | ウエハ処理装置及びウエハ処理方法 |
JPH11233601A (ja) * | 1998-02-10 | 1999-08-27 | Hitachi Ltd | 静電吸着装置及びそれを用いた試料処理装置 |
US6665168B2 (en) * | 2001-03-30 | 2003-12-16 | Taiwan Semiconductor Manufacturing Co. Ltd | Electrostatic chuck apparatus and method for efficiently dechucking a substrate therefrom |
US6646857B2 (en) * | 2001-03-30 | 2003-11-11 | Lam Research Corporation | Semiconductor wafer lifting device and methods for implementing the same |
US7107667B2 (en) * | 2001-11-01 | 2006-09-19 | Tdk Corporation | Method for fabricating thin film magnetic head |
JP2003347395A (ja) * | 2002-05-28 | 2003-12-05 | Tokyo Electron Ltd | 処理装置及び静電チャックの脱離方法 |
KR20050018063A (ko) * | 2003-08-13 | 2005-02-23 | 삼성전자주식회사 | 반도체 제조장치의 기판 척킹/디척킹 장치 및 그의 방법 |
-
2005
- 2005-12-09 CN CNB2005101264366A patent/CN100423224C/zh active Active
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102299090A (zh) * | 2010-06-25 | 2011-12-28 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 顶针及具有该顶针的等离子体刻蚀装置 |
CN102299090B (zh) * | 2010-06-25 | 2014-03-19 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 顶针及具有该顶针的等离子体刻蚀装置 |
CN101916739B (zh) * | 2010-07-13 | 2012-08-01 | 上海技美电子科技有限公司 | 晶圆承载装置 |
CN101916739A (zh) * | 2010-07-13 | 2010-12-15 | 上海技美电子科技有限公司 | 晶圆承载装置 |
CN104347358A (zh) * | 2014-09-15 | 2015-02-11 | 上海华力微电子有限公司 | 改善器件等离子体损伤的方法 |
CN107305858A (zh) * | 2016-04-20 | 2017-10-31 | 北京北方华创微电子装备有限公司 | 顶针机构及预清洗腔室 |
CN107305858B (zh) * | 2016-04-20 | 2020-11-10 | 北京北方华创微电子装备有限公司 | 顶针机构及预清洗腔室 |
CN109072422A (zh) * | 2016-05-12 | 2018-12-21 | 康宁股份有限公司 | 具有不规则表面平坦度的盖板玻璃的静电夹持 |
CN108155094A (zh) * | 2016-12-05 | 2018-06-12 | 东京毅力科创株式会社 | 等离子体处理装置 |
CN108155094B (zh) * | 2016-12-05 | 2022-02-15 | 东京毅力科创株式会社 | 等离子体处理装置 |
CN108962794B (zh) * | 2018-07-20 | 2020-08-21 | 北京北方华创微电子装备有限公司 | 一种升针方法及应用其的顶针升降装置 |
CN108962794A (zh) * | 2018-07-20 | 2018-12-07 | 北京北方华创微电子装备有限公司 | 一种升针方法及应用其的顶针升降装置 |
CN112309889A (zh) * | 2019-08-02 | 2021-02-02 | 合肥晶合集成电路股份有限公司 | 一种基板检测装置及其检测方法 |
Also Published As
Publication number | Publication date |
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CN100423224C (zh) | 2008-10-01 |
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Address after: 100176 8 Wenchang Avenue, Beijing economic and Technological Development Zone, Beijing Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100015 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
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