CN1834272A - Elliptic hole type multiporous metallic material and mfg. technique - Google Patents
Elliptic hole type multiporous metallic material and mfg. technique Download PDFInfo
- Publication number
- CN1834272A CN1834272A CN 200610046339 CN200610046339A CN1834272A CN 1834272 A CN1834272 A CN 1834272A CN 200610046339 CN200610046339 CN 200610046339 CN 200610046339 A CN200610046339 A CN 200610046339A CN 1834272 A CN1834272 A CN 1834272A
- Authority
- CN
- China
- Prior art keywords
- hole type
- copper
- nickel
- multiporous
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
This invention discloses an electrophoretic deposition method for manufacturing a porous metal material with ellipse/ellipse-like pores. The key to the method is modifying the pore structure of the porous foam matrix used on the porous metal material. The ratio of the long axis to the short axis of the ellipse pores can be adjustable in the range of 1.3-10.0, thus the properties of the porous metal material have strong directional characteristics. Along the long axis direction of the ellipse pores, the tensile strength and electrical conductivity of the porous metal material are obviously higher than those with equal axes and the same apparent density, which is particularly suitable for manufacturing products that possess directional characteristics.
Description
Technical field
The present invention is the porous metal functional materials that belongs in the new material technology field, be specially the porous metal material and the manufacturing process thereof of a kind of ellipse (or class ellipse) pass structure, the major technique of its manufacturing process is an electro-deposition techniques, and the core technology of acquisition product structure characteristic of the present invention is remodeling and typing control to the pass of porous matrix.
Background technology
The technical scheme (is example with foaming nickel) that porous metal material is made in galvanic deposit in the past all is to make every effort to make in technological process the rubber-like porous matrix to be in " zero " tension state, or part the power state a little, maintenance waits the axis hole type as far as possible, to obtain isotropic functional performance.For example in patent of invention (patent No.: ZL 97104463.5) lay special stress on this point, the aspect ratio that can obtain structure and performance thereof approximates 1 product, its objective is to make its scalable application professional domain, and convenient the application.Yet in some professional domains, improve its product performance, often wish that the porous metal material performance has directivity characteristics, to adapt to the technical requirements of product to the function directivity for making full use of material.For example in the battery professional domain, along with technical development, the multiplication of battery operated electric current and output rating, demand reducing the internal resistance of cell and the conductive capability that increases the sense of current urgently, the object of the invention one is and satisfies this type of technical requirements and develop, for example use " the oval pass foaming nickel " of the present invention's exploitation, its characteristic feature is to have controllable, higher aspect rate, and its numerical value is in the scope of 1.3-10.0.
Summary of the invention
The purpose of this invention is to provide a kind of porous metal material and manufacturing process thereof of ellipse/class oval pass structure of galvanic deposit manufacturing, this porous metal performance has direction characteristic; On the long axis direction of its oval pass structure, performances such as its tensile strength and specific conductivity all are significantly higher than the identical porous metal that wait the axis hole type of apparent mass density.This characteristic is suitable for manufacturing especially has the product of directivity technical requirements to material property, and for example " oval pass foaming nickel " is used to make ni-mh high-energy power battery, electrochemistry in industry electrode etc.
Technical scheme of the present invention is:
The porous metal material of a kind of ellipse/class oval pass structure, this porous metal material is the three dimensional network pore structure, porosity 80-99%, pass surperficial at it or that be parallel on surperficial any section is ellipse or class oval pass, the major and minor axis ratio of ellipse or class elliptical aperture be the ratio of the long axis length in hole and minor axis length in 1.3～10.0 scopes, typical range is 1.3-2.0; Hole count on the per inch length of this porous metal material (PPI, JIS6400 standard) is the 10-200 scope, the apparent mass density (area density) of this porous metal material for 100-4000 gram/square metre; Its face shaping is tabular or continuous band-shaped, and its thickness range is 0.3-25mm, and the typical thickness of board-like material is 0.3-10mm, and the typical thickness of continuous ribbon-like materials is 0.3-5mm.At it perpendicular to Y direction, promptly longitudinally on the cross section, the quantity of the metalolic network skeleton in the unit surface, that is mass surface density is significantly higher than other corresponding numerical value in direction cross section; Therefore performance perameters such as the tensile strength of this direction, specific conductivity also are significantly higher than other directions, so this porous metal material performance presenting direction feature, on the long axis direction of its oval pass structure, performances such as its tensile strength and specific conductivity all are higher than the identical porous metal that wait the axis hole type of apparent mass density, the tensile strength of this direction (conventional be about 1MPa) more than 1.3MPa; Its square electricity is led more than 330 siemenss (conventional be about 260 siemenss), and tensile strength and specific conductivity all improve more than 25%.
The technical scheme of manufacturing process of the present invention, be before the galvanic deposit operation, obtain the matrix of the oval pass of required major and minor axis ratio earlier, then to its conduction processing, perhaps adopt single stage method, to carry out simultaneously the drawing and setting of matrix and conductionization processing, thereby acquisition is made the model of elliptic hole type multiporous metallic material of the present invention that is negative electrode as galvanic deposit.
The technological method that the present invention obtains the oval pass body material has multiple:
One, axis hole rubber-like sponge plastics type or little ovality pass (as porous plastics such as urethane etc.) base band will be waited, even heating and at the uniform velocity traction in continuous tunnel furnace, controlled temperature and tensile deformation amount, temperature range is 100-400 ℃, representative value is 100-250 ℃, the traction speed of traveling at the uniform speed is that the base band travelling speed is 3-100m/h, the tensile deformation amount requires to control according to the aspect rate of pass structure, travel at the uniform speed and enter cooling room and make it air cooling to room temperature and finalize the design, make it meet the requirements of the pass structure aspect rate, and then under tension-free state, implement the conductionization treatment process.Here " the conductionization treatment process " of indication comprises that vacuum metal film plating conductionization, chemical plating metal film conductionization, Tu apply multiple conduction metallization processes such as electrically conducting coating conductionization.
So far, body material (the being negative electrode) preparation as galvanic deposit manufacturing elliptic hole type multiporous metallic material finishes.Subsequently, as negative electrode, the metal of the same race of the porous metal that obtain with desire is that anode or anode material are electroplated with this base band of leading electrochemical oval pass; Or, electroplate with insoluble anode to contain the plating bath of the metal ion that desire obtains.
In order to prevent the high temperature oxidation of sponge plastics, can be under inert atmosphere protection, for example atmosphere protections such as nitrogen, argon gas, carbonic acid gas heating down, and under inert atmosphere protection, be quickly cooled to the room temperature typing.
They are two years old, axis hole rubber-like sponge plastics type or little ovality pass porous plastics such as (etc.) urethane base band will be waited, directly form the oval pass structure and body material that be attached with conductive film layer with desired aspect rate in vacuum plating (PVD) conduction metallization processes process of preparing, detailed process can be ZL01128040.9 referring to the patent No., promptly can be used as the body material negative electrode of making elliptic hole type multiporous metallic.In vacuum plating conductionization treatment facility, has the function that the porous plastics matrix is applied vertical controllable tensile stress, and utilize original controlled heating and cooling body, the controlled temperature scope is 100-400 ℃, representative value is 100-250 ℃, at the uniform velocity drawing the base band travelling speed is 3-300m/h, representative value is 30-90m/h, the tensile deformation amount requires to control according to the aspect rate of pass structure, and the change of above-mentioned pass structure is finished in conduction metallization processes process simultaneously with typing.Certainly this aspect rate is controllable, prepares its ratio that finishes and also is fixed.Subsequently, as negative electrode, the metal of the same race of the porous metal that obtain with desire is that anode or anode material are electroplated with this base band of leading electrochemical oval pass; Or, use insoluble anode to contain the plating bath of the metal ion that desire obtains, electroplate as iridium ru oxide, iridium tantalum palladium oxide and graphite, Pb alloy etc.
Among the present invention, the three-dimensional network body structure that is interconnected and forms by numerous NE Deng the structure of the elasticity sponge plastics of axis hole type or little ovality pass, referring to accompanying drawing 2 and accompanying drawing 4, each NE is the polyhedron configuration, be typically the dodecahedron configuration, in the present invention, this unit networks such as is referred to as at axis hole type or little ovality pass, and its major-minor axis ratio is usually in the 1-1.3 scope.Its long axis length (Y) or minor axis length (X) can be in the 0.1-10mm scopes.
The electrodeposition technology of technical solution of the present invention, to be controlled at the oval pass structure of certain aspect rate that maintenance has obtained in its process especially, prevent that promptly the additional stress of aspect rate from appearring destroy/influencing in electrodeposition technology, to obtain to meet the elliptic hole type multiporous metallic material of technical requirements.
Anode material of the present invention is all metals and the alloy thereof that is applicable to galvanic deposit, perhaps uses insoluble anode, and uses corresponding bath solution.
Porous metal that desire obtains and corresponding anode metal thereof comprise the alloy that two or more metal such as nickel, copper, iron, tin, lead, chromium, cobalt, tungsten, silver, gold, platinum, palladium and nickel-copper, nickel-cobalt, Ni-Fe, Fe-Ni-Cr-, lead-Xi, copper-Yin, copper-zinc, nickel-tungsten, copper-tungsten, copper-Xi, nickel-palldium alloy is formed.
The invention has the beneficial effects as follows:
1, use the elliptic hole type multiporous metallic material of technical scheme manufacturing of the present invention, the major and minor axis ratio of its elliptical aperture promptly vertically can design and control with horizontal ratio (Y/X), and may command should be than rate score in 1.3～10.0 scopes; Therefore this porous metal material performance has direction characteristic, on the long axis direction of its oval pass structure, compare with the axis hole type porous material that waits of the raw metal manufacturing of same amount, at its long axis direction, on promptly vertical, its performance perameter is significantly higher than the latter, and performances such as its tensile strength and specific conductivity all are significantly higher than the identical porous metal that wait the axis hole type of apparent mass density, can improve more than 20%; This characteristic is suitable for manufacturing has the directivity technical requirements to material property product especially.
2, the conventional like product that compares, this material more are applicable to makes Ni-MH power cell high-power current discharge, high power density output; Because the raising of this specific conductivity, its discharge current density and output power density can improve more than 10%.
Description of drawings
Fig. 1, Fig. 2, Fig. 3, Fig. 4 are respectively the contrast of the apparent pattern of SEM of the foaming nickel of using the technology of the present invention and prior art manufacturing.
Fig. 1 is the apparent pattern and the characteristic parameter of the oval pass product of the embodiment of the invention 1 technical scheme manufacturing, and aspect rate is Y/X=1.6, and endwise tensile strength and specific conductivity all improve more than 25% than the product of prior art;
Fig. 2 is the apparent pattern and the characteristic parameter of the product that waits the axis hole type of prior art;
Fig. 3 is the apparent pattern and the characteristic parameter of the oval pass product of the embodiment of the invention 2 technical schemes manufacturing, and aspect rate is Y/X=1.5, and endwise tensile strength and specific conductivity all improve more than 25% than the product of prior art;
Fig. 4 is the apparent pattern and the characteristic parameter of the product that waits the axis hole type of prior art;
Fig. 5 is the apparent pattern and the characteristic parameter of the large aspect ratio oval pass product of the embodiment of the invention 3 technical schemes manufacturing, and aspect rate is Y/X=4.0, and endwise tensile strength and specific conductivity all improve more than 40% than the product of prior art.
Embodiment
The sponge plastics that the employed base material of product of the present invention uses as gives a definition:
1, kind: various organic foaies as the organic foam of various thermoplasticss, comprise polyester type polyurethane, polyether(poly)urethane, polyethylene, polystyrene or polypropylene expanded body etc.
2, among the present invention the thickness of employed organic foam base material in the 1-30mm scope.
3, the PPI of the employed organic foam base material (hole count of per inch among the present invention; The JIS6400 standard) number is between the 10-200.
Embodiment 1 oval pass foaming nickel
This product specification technical requirements is: 110ppi, thickness are 1.7mm, and area density is 400g/m
2, oval pass aspect rate Y/X=1.6; Endwise tensile strength and specific conductivity obviously improve (more than 20%) than axis hole type products such as identical faces density.
Present embodiment will wait rubber-like sponge plastics porous plastics such as () urethane base band even heating and at the uniform velocity traction in continuous tunnel furnace of axis hole type, controlled temperature and tensile deformation amount, the control Heating temperature is 250 ℃, the tensile deformation amount requires to control according to the aspect rate of pass structure, and vertically evenly traction base band travelling speed is 15mm/h; Traveling at the uniform speed enters cooling room and makes it air cooling to room temperature and finalize the design, and makes it meet the requirements of the pass structure aspect rate, and then implement PVD sputter nickel plating conductionization treatment process under tension-free state; As negative electrode, is anode with the metallic nickel with this base band of leading electrochemical oval pass, does not have tension force electric deposition nickel technological process; Electric deposition nickel adopts Watts type bath solution.Apparent pattern and the characteristic parameter of the SEM of its product are shown among Fig. 1, and the banded foaming of oval pass rolling of the present invention nickel is 110ppi, thickness 1.7mm, area density 400g/m
2, aspect ratio is 1.6 foaming nickel, porosity 97%, and Y is vertical major axis among the figure, and X is horizontal minor axis, and it is 330 siemenss that vertical square electricity is led, and endwise tensile strength is higher by 25% than normal process.As shown in Figure 2, prior art is 110ppi, thickness 1.7mm, area density 400g/m
2, aspect ratio is 1.0 foaming nickel, it is 265 siemenss that vertical square electricity is led.
Embodiment 2 oval passs foaming nickel
Difference from Example 1 is:
This product specification technical requirements is: 94ppi, thickness are 1.8mm, and area density is 400g/m
2, oval pass aspect rate Y/X=1.5; Endwise tensile strength and square electricity are led than axis hole type products such as identical faces density and are obviously improved (more than 20%).
Present embodiment will wait rubber-like sponge plastics (porous plastics such as urethane) base band of axis hole type, directly form the oval pass structure and body material that be attached with the conductive nickel rete with desired aspect rate in vacuum plated nickel film (PVD) conduction metallization processes process of preparing, promptly can be used as the body material of the electric deposition nickel of making elliptic hole type multiporous metallic, i.e. negative electrode.In PVD equipment, have the function that the porous plastics matrix is applied vertical controllable tensile stress and (see Chinese patent for details, the patent No. is ZL01128040.9, different is that the present invention vertically applies even constant load 2-10kg to base material, present embodiment is 5.4kg), and the yield of radiation and the deposition of nickel of the plasma body of control during magnetron sputtering, vertically evenly drawing the base band travelling speed is 1m/min, naturally cools to after the setting below 50 ℃.The tensile deformation amount requires to control according to the aspect rate of pass structure.And as embodiment 1, as negative electrode, be anode with the metallic nickel with this base band of leading electrochemical oval pass, electric deposition nickel adopts Watts type bath solution.Apparent pattern and the characteristic parameter of the SEM of its product are shown among Fig. 3, and the banded foaming of oval pass rolling of the present invention nickel is 94ppi, thickness 1.8mm, area density 450g/m
2, aspect ratio is 1.5 foaming nickel, porosity 97%, and it is 350 siemenss that vertical square electricity is led, endwise tensile strength is higher by 25% than normal process.As shown in Figure 4, prior art is 94ppi, thickness 1.8mm, area density 400g/m
2, aspect ratio is 1.0 foaming nickel, it is 275 siemenss that vertical square electricity is led.
Embodiment 3 elongated hole type foam coppers
Difference from Example 1 is: use as filtering material, require acid resistance and bigger endwise tensile strength;
This product specification technical requirements is: 60ppi, and thickness (through rolling) is 0.5mm, area density is 200g/m
2, elongated hole type aspect rate Y/X=4.0; Endwise tensile strength and specific conductivity significantly improve (more than 40%) than axis hole type products such as identical faces density.
Present embodiment will wait rubber-like sponge plastics (the polypropylene expanded body PP of 1.8mm thickness) base band even heating and at the uniform velocity traction in continuous tunnel furnace of axis hole type, controlled temperature and tensile deformation amount, for preventing the PP oxidation, under nitrogen atmosphere protection, the control Heating temperature is 165 ± 5 ℃; Because aspect ratio very big (Y/X=4), the tensile deformation amount is that very big requirement is controlled according to the aspect rate of pass structure, therefore, to travel at the uniform speed with less speed longitudinal traction base band, speed is 5m/h, traveling at the uniform speed enters cooling room, and is quickly cooled to the room temperature typing with the low temperature nitrogen below 10 ℃, makes it meet the requirements of the pass structure aspect rate; And then under tension-free state, implement electroless copper conductionization treatment process; The base band that this electroless copper is led electrochemical elongated hole type is anode as negative electrode with the metallic copper, does not have tension force acid copper technological process; Galvanic deposit is with adopting conventional common acid copper sulfate type bath solution.Its product performance parameter: the banded foam copper of present embodiment elongated hole type rolling is 60ppi, and the thickness after the acid copper is 1.7mm, area density 200g/m
2, aspect ratio is the foam copper of Y/X=4, porosity 95.5%; Vertical rolling through by a relatively large margin makes thickness become 0.5mm, and endwise tensile strength significantly improves than normal process, and is high more than 40%.Apparent pattern and the characteristic parameter of the SEM of its product are shown among Fig. 5.
Claims (9)
1, a kind of elliptic hole type multiporous metallic material is characterized in that: this porous metal material is the three dimensional network pore structure, porosity 80-99%; Its surface or be parallel to Y-axis, promptly the pass on any section of elliptical aperture major axis is ellipse or class oval pass, the major and minor axis ratio of ellipse or class elliptical aperture, promptly the ratio of the long axis length in hole and minor axis length is in 1.3～10.0 scopes; Hole count PPI on the per inch length of this porous metal material is 10-200; The apparent mass density of this porous metal material is 100-4000 gram/M
2Its face shaping is tabular or continuous band-shaped, and its thickness range is 0.3-25mm.
2, according to the described elliptic hole type multiporous metallic material of claim 1, it is characterized in that: the typical range of the major and minor axis ratio of ellipse or class elliptical aperture is 1.3-2.0, the typical thickness of board-like material is 0.3-10mm, and the typical thickness of continuous ribbon-like materials is 0.3-5mm.
3, according to the manufacturing process of the described elliptic hole type multiporous metallic material of claim 1, it is characterized in that: the rubber-like sponge plastics base band axis hole type or little ovality pass such as have former, even heating also at the uniform velocity draws and travels at the uniform speed in continuous tunnel furnace, controlled temperature and tensile deformation amount, temperature range is 100-400 ℃, traction base band travelling speed is 3-100m/h, the tensile deformation amount requires to control according to the major and minor axis ratio of pass structure, adopt air cooling to the room temperature typing, and then under tension-free state, implement the conductionization treatment process; So far, the body material preparation as galvanic deposit manufacturing elliptic hole type multiporous metallic material finishes; Subsequently, as negative electrode, the metal of the same race of the porous metal that obtain with desire is that anode or anode material are electroplated with this base band of leading electrochemical oval pass; Or, electroplate with insoluble anode to contain the plating bath of the metal ion that desire obtains.
4, according to the manufacturing process of the described elliptic hole type multiporous metallic material of claim 1, it is characterized in that: will wait the rubber-like sponge plastics base band axis hole type or little ovality pass, directly form the oval pass structure and body material that be attached with conductive film layer with desired major and minor axis ratio in vacuum magnetic-control sputtering conduction metallization processes process of preparing, promptly can be used as galvanic deposit and make the body material of elliptic hole type multiporous metallic, i.e. negative electrode; In the conductionization treatment facility, has the function that the porous plastics matrix is applied vertical controllable tensile stress, and utilize controlled heating and refrigerative mechanism, the controlled temperature scope is 100-400 ℃, the traction base band speed of traveling at the uniform speed is 3-300m/h, the tensile deformation amount requires to control according to the major and minor axis ratio of pass structure, and works simultaneously in conduction metallization processes process and finish; Subsequently, as negative electrode, the metal of the same race of the porous metal that obtain with desire is that anode or anode material are electroplated with this base band of leading electrochemical oval pass; Or, electroplate with insoluble anode to contain the plating bath of the metal ion that desire obtains.
5, according to the manufacturing process of the described elliptic hole type multiporous metallic material of claim 3, it is characterized in that: in order to prevent the high temperature oxidation of sponge plastics, under inert atmosphere protection, heat, and under inert atmosphere protection, be quickly cooled to the room temperature typing.
6, according to the manufacturing process of the described elliptical porous metallic substance of claim 3, it is characterized in that: " the conductionization treatment process " of indication comprises that vacuum metal film plating conductionization, chemical plating metal film conductionization Huo Tu apply the electrically conducting coating conductionization; The related metallic substance of various conduction metallization processes comprises: the alloy that two or more metal such as nickel, copper, iron, tin, lead, titanium, chromium, cobalt, tungsten, silver, gold, platinum, palladium and nickel-copper, nickel-cobalt, Ni-Fe, Fe-Ni-Cr-, lead-Xi, copper-Yin, copper-zinc, nickel-tungsten, copper-tungsten, copper-Xi, nickel-palldium alloy is formed.
7, according to the manufacturing process of claim 3 or 4 described elliptic hole type multiporous metallic materials, it is characterized in that: described anode material is all metals and the alloy thereof that is applicable to galvanic deposit, perhaps use insoluble anode, and use contain mutually should metal ion bath solution.
8, according to the manufacturing process of claim 3 or 4 described elliptic hole type multiporous metallic materials, it is characterized in that: porous metal that desire obtains and corresponding anode metal thereof comprise the alloy that two or more metal such as nickel, copper, iron, tin, lead, chromium, cobalt, tungsten, silver, gold, platinum, palladium and nickel-copper, nickel-cobalt, Ni-Fe, Fe-Ni-Cr-, lead-Xi, copper-Yin, copper-zinc, nickel-tungsten, copper-tungsten, copper-Xi, nickel-palldium alloy is formed.
9, according to the manufacturing process of claim 3,4 or 5 described elliptic hole type multiporous metallic materials, it is characterized in that: described sponge plastics is the organic foaies of various thermoplasticss, comprises multiple foaies such as polyester type polyurethane, polyether(poly)urethane, polyethylene, polystyrene or polypropylene.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610046339 CN1834272A (en) | 2006-04-18 | 2006-04-18 | Elliptic hole type multiporous metallic material and mfg. technique |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610046339 CN1834272A (en) | 2006-04-18 | 2006-04-18 | Elliptic hole type multiporous metallic material and mfg. technique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1834272A true CN1834272A (en) | 2006-09-20 |
Family
ID=37002169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610046339 Pending CN1834272A (en) | 2006-04-18 | 2006-04-18 | Elliptic hole type multiporous metallic material and mfg. technique |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1834272A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007121659A1 (en) * | 2006-04-18 | 2007-11-01 | Inco Advanced Technology Materials (Dalian) Co., Ltd | Porous metal materials with elliptic type pores and their manufacturing process |
| CN102094225A (en) * | 2011-03-03 | 2011-06-15 | 常德力元新材料有限责任公司 | Porous metal material and preparation method thereof |
| CN102212791A (en) * | 2011-06-02 | 2011-10-12 | 爱蓝天高新技术材料(大连)有限公司 | Equipment and method for performing magnetron-controlled sputter coating on polyester type polyurethane foam matrix |
| CN102443823A (en) * | 2010-10-13 | 2012-05-09 | 周宏霞 | Foamed copper-silver alloy material and its preparation method |
| CN102903972A (en) * | 2012-10-23 | 2013-01-30 | 浙江凯恩电池有限公司 | High-power nickel-metal hydride battery and manufacturing method thereof |
| CN104210090A (en) * | 2014-09-09 | 2014-12-17 | 常德力元新材料有限责任公司 | Processing process of polyester sponge used for preparing power battery foam nickel materials |
| CN106145278A (en) * | 2016-08-25 | 2016-11-23 | 山东清大银光金属海绵新材料有限责任公司 | Sponge-type nickel cerium praseodymium neodymio body load oxide skin(coating) decontamination anode material preparation method |
| CN108448064A (en) * | 2018-02-05 | 2018-08-24 | 东莞超霸电池有限公司 | A kind of nickel-hydrogen battery negative pole woven wire wet preparation method |
| WO2019192070A1 (en) * | 2018-04-02 | 2019-10-10 | 吴江明 | Foam metal preparation method |
| EP3499615A4 (en) * | 2017-10-25 | 2020-02-05 | Sumitomo Electric Toyama Co., Ltd. | Fuel cell and method for manufacturing metal porous body |
| CN111088493A (en) * | 2019-12-26 | 2020-05-01 | 西安泰金工业电化学技术有限公司 | Preparation method of titanium anode with titanium-based coating |
-
2006
- 2006-04-18 CN CN 200610046339 patent/CN1834272A/en active Pending
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007121659A1 (en) * | 2006-04-18 | 2007-11-01 | Inco Advanced Technology Materials (Dalian) Co., Ltd | Porous metal materials with elliptic type pores and their manufacturing process |
| CN102443823A (en) * | 2010-10-13 | 2012-05-09 | 周宏霞 | Foamed copper-silver alloy material and its preparation method |
| CN102094225A (en) * | 2011-03-03 | 2011-06-15 | 常德力元新材料有限责任公司 | Porous metal material and preparation method thereof |
| CN102212791A (en) * | 2011-06-02 | 2011-10-12 | 爱蓝天高新技术材料(大连)有限公司 | Equipment and method for performing magnetron-controlled sputter coating on polyester type polyurethane foam matrix |
| CN102903972B (en) * | 2012-10-23 | 2015-09-02 | 浙江凯恩电池有限公司 | A kind of high-capacity nickel-hydrogen battery and preparation method thereof |
| CN102903972A (en) * | 2012-10-23 | 2013-01-30 | 浙江凯恩电池有限公司 | High-power nickel-metal hydride battery and manufacturing method thereof |
| CN104210090A (en) * | 2014-09-09 | 2014-12-17 | 常德力元新材料有限责任公司 | Processing process of polyester sponge used for preparing power battery foam nickel materials |
| CN106145278A (en) * | 2016-08-25 | 2016-11-23 | 山东清大银光金属海绵新材料有限责任公司 | Sponge-type nickel cerium praseodymium neodymio body load oxide skin(coating) decontamination anode material preparation method |
| CN106145278B (en) * | 2016-08-25 | 2019-02-19 | 山东清大银光金属海绵新材料有限责任公司 | Sponge-type nickel cerium praseodymium neodymium matrix loads oxide skin(coating) decontamination anode material preparation method |
| EP3499615A4 (en) * | 2017-10-25 | 2020-02-05 | Sumitomo Electric Toyama Co., Ltd. | Fuel cell and method for manufacturing metal porous body |
| US11316172B2 (en) | 2017-10-25 | 2022-04-26 | Sumitomo Electric Toyama Co., Ltd. | Fuel cell and method of manufacturing metal porous body |
| CN108448064A (en) * | 2018-02-05 | 2018-08-24 | 东莞超霸电池有限公司 | A kind of nickel-hydrogen battery negative pole woven wire wet preparation method |
| CN108448064B (en) * | 2018-02-05 | 2020-08-04 | 东莞超霸电池有限公司 | Wet preparation method of nickel-metal hydride battery cathode wire mesh |
| WO2019192070A1 (en) * | 2018-04-02 | 2019-10-10 | 吴江明 | Foam metal preparation method |
| CN111088493A (en) * | 2019-12-26 | 2020-05-01 | 西安泰金工业电化学技术有限公司 | Preparation method of titanium anode with titanium-based coating |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1834272A (en) | Elliptic hole type multiporous metallic material and mfg. technique | |
| EP2644753B1 (en) | Surface-treated copper foil | |
| WO2007121659A1 (en) | Porous metal materials with elliptic type pores and their manufacturing process | |
| CN1113111C (en) | Copper foil for printed wiring board, its producing method and electrolytic device | |
| CN110359065B (en) | Jet electrodeposition nozzle and method for manufacturing seamless metal pipe by using same | |
| CN102605397A (en) | Electroplating system and electroplating method | |
| CN113621998A (en) | Nano twin crystal copper foil and preparation method thereof | |
| US4326931A (en) | Process for continuous production of porous metal | |
| KR20120097344A (en) | Forming method for nanotwined copper material and nanotwined copper material formed by the method | |
| JP2014051687A (en) | Aluminum plating apparatus and method for producing aluminum film using the same | |
| US20030102209A1 (en) | Metal foil electrolytic manufacturing apparatus | |
| CN102534733B (en) | Electroplanting device and electro-plating method | |
| CN1786287A (en) | Gradient porous metal materiel manufactured by electrodeposition and its manufecturing technology | |
| CN111074317A (en) | Surface treatment method of copper foil and copper foil material | |
| CN201924097U (en) | Electroplating device | |
| CN104928723A (en) | Foam metal plate and manufacturing method thereof | |
| CN108425135B (en) | Production equipment of electrolytic copper foil and current adjusting and controlling device thereof | |
| CN1307651A (en) | Method for producing nickel foam and nickel foam thus obtainable | |
| CN1276131C (en) | Continuous electroforming process to form strip for battery electrodes and mandrel to be used in said process | |
| KR101894443B1 (en) | Producing method the electroforming sheet and electroforming device | |
| JP2020084279A (en) | Copper-clad laminate and manufacturing method copper-clad laminate | |
| KR101271980B1 (en) | Method of manufacturing iron and nickel alloy substrate having cnt and resin layers for oled | |
| US11158843B2 (en) | Method for making nanoporous nickel composite material | |
| CN114959814A (en) | Method for quickly electroplating high-conductivity and high-heat-conductivity copper layer | |
| CN111472031B (en) | Electroplating device and method for manufacturing mold core by using same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |