CN1800980A - Sandblast resistant durable emulsion type photosensitive resin - Google Patents
Sandblast resistant durable emulsion type photosensitive resin Download PDFInfo
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- CN1800980A CN1800980A CN 200610041637 CN200610041637A CN1800980A CN 1800980 A CN1800980 A CN 1800980A CN 200610041637 CN200610041637 CN 200610041637 CN 200610041637 A CN200610041637 A CN 200610041637A CN 1800980 A CN1800980 A CN 1800980A
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- photosensitive resin
- polyurethane prepolymer
- diisocyanate
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Abstract
The invention discloses a sandblasting-proof emulsion photosensitive resin, which comprises the following parts: 30-60 wt percent polyurethane prepolymer, 20-50 wt percent water-soluble photosensitive resin and 01.-20 wt percent photopolymerizing initiator. The invention can dissolve in the pure water or diluted alkaline water solution, which can connects the barrier layer stickly to reduce the bubble, which improves the excellent-production ration in the fine image masking of plasma display screen barrier.
Description
Technical field
The present invention relates to a kind of photosensitive polymer combination, particularly a kind of emulsion type photosensitive resin of sandblast resistant durable.
Background technology
In recent years, follow the development of photoetching technique and sandblast technology, processing fine pattern on materials such as glass, low-melting glass, pottery becomes possibility.Particularly in the manufacturing process of the rear panel of chromatic alternating-current Plasmia indicating panel (AC-PDP), need be on glass or low melting point glass layer, pass through blasting method, process the barrier structure of strip, clathrate or wafer shape, its method for making is: the first step: the slurry coating of barrier the back glass substrate, drying; Second step: stacked photosensitive dry film resist on barrier layer (Dry Film Resist abbreviates DFR as), this layer DFR film have can be resisted sandblast and add the characteristic of grinding the material etching man-hour behind photo-hardening; The 3rd step: the DFR film is exposed by photo mask; The 4th step: video picture, DFR film have only the part of photo-hardening to cover on the barrier layer; The 5th step: sandblast, the barrier layer that has the DFR film to cover is preserved, and remainder is ground material and is etched away, and obtains patterned barrier; At last, the DFR film is peeled off,, finished the processing of barrier layer through burning till.
In lamination process, frequent air pocket bubble causes local DFR film and baseplate-laminating defective to occur between DFR film and the substrate.In follow-up sandblast process, the barrier layer of fault location loses the protection of DFR film, is easy to be ground material and etches away, and causes the defective of this part barrier figure.
Summary of the invention
The objective of the invention is to overcome the shortcoming of above-mentioned prior art; providing a kind of can fit tightly with barrier layer; and can be behind the drying and forming-film as the sandblast resistant durable protective seam of barrier layer pattern engraving, the emulsion type photosensitive resin of the sandblast resistant durable of the yields that the raising sandblast is made.
For achieving the above object, the technical solution used in the present invention is: comprise the polyurethane prepolymer of 30～60wt%, the water soluble light-sensitive resin of 20～50wt% and the Photoepolymerizationinitiater initiater of 0.1～20wt%.
The said polyurethane prepolymer of the present invention is had the polymkeric substance or the terminal monomer that hydroxyl is arranged of hydroxyl by end, polyisocyanates, the compound reaction that molecule contains unsaturated combination of ethylene type and reactive hydrogen functional group obtains, its process is: at first, have in the polymkeric substance of hydroxyl or the terminal monomer that hydroxyl arranged to 100～200 parts end by mass fraction and to add 15～60 parts polyisocyanates, after fully stirring, be heated to 80 ℃, reaction was carried out 4-6 hour, and then the molecule that adds 3～18 parts contains unsaturated combination of ethylene type and reactive hydrogen functional group's compound, after fully stirring, make reaction carry out obtaining in 1.5-2.5 hour polyurethane prepolymer again; Said end have the polymkeric substance of hydroxyl be the many alcohol of polyester-type, the many alcohol of polyether-type, end contain the hydrogen base 1,4-polybutadiene or the rare nitrile interpolymer of butadiene-third; It is the dihydromethyl propionic acid that ethylene glycol, propylene glycol, tetramethylene glycol, diglycol, triethylene glycol or molecule contain carboxyl that said end has the monomer of hydroxyl; Said polyisocyanates be toluene diisocyanate, diphenyl methane-4,4 '-diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, hydrogenated diphenyl methane diisocyanate or-Xylene Diisocyanate; The compound that said molecule contains unsaturated combination of ethylene type and reactive hydrogen functional group is 2-hydroxyethyl methacry-late, acrylic acid-2-hydroxyl ethyl ester, methacrylic acid-2-hydroxypropyl acrylate, acrylic acid-2-hydroxypropyl acrylate, trimethylolpropane diacrylate or pentaerythritol triacrylate.
The said water soluble light-sensitive resin of the present invention is to introduce stibazole group or styryl quinoline group in polyvinyl alcohol polymer, and stibazole group of introducing or styryl quinoline group are 0.3～20mol% of vinyl alcohol polymerized unit or add N-hydroxyacrylamide or N-hydroxymethyl acrylamide in polyvinyl alcohol polymers, and the N-hydroxyacrylamide or the N-hydroxymethyl acrylamide that add are 0.05～25mol% of vinyl alcohol polymerized unit.
The said Photoepolymerizationinitiater initiater of the present invention is benzoin alkylether, acetophenone, anthraquinone, thioxanthones, ketal or benzophenone.
Because the present invention is dissolvable in water pure water or diluted alkaline aqueous solution; can fit tightly with barrier layer; bubble is between the two significantly reduced; and can be behind the drying and forming-film as the sandblast resistant durable protective seam of barrier layer pattern engraving; improve the yields of sandblast process; particularly make in the fine pattern of barrier of plasma panel, use as mask at sand-blast.
Embodiment
Embodiment 1, present embodiment comprises the polyurethane prepolymer of 30wt%, the water soluble light-sensitive resin of introducing the stibazole group in polyvinyl alcohol polymer of 50wt%, and the stibazole group of introducing is the 20mol% of vinyl alcohol polymerized unit and the benzoin alkylether of 20wt%; Polyurethane prepolymer in the present embodiment is for pressing mass fraction adds 60 parts in 100 parts the many alcohol of polyether-type toluene diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 4 hours, and then add 15 parts 2-hydroxyethyl methacry-late, after fully stirring, make reaction carry out obtaining in 1.5 hours polyurethane prepolymer again.
Embodiment 2, present embodiment comprises the polyurethane prepolymer of 50wt%, the water soluble light-sensitive resin of introducing styryl quinoline group in polyvinyl alcohol polymer of 40wt%, and the styryl quinoline group of introducing is the 1mol% of vinyl alcohol polymerized unit and the acetophenone man of 10wt%; Polyurethane prepolymer in the present embodiment for press mass fraction to 160 parts 1, the diphenyl methane-4 of 15 parts of interpolations in the 4-polybutadiene, 4 '-diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 5 hours, and then add acrylic acid-2-hydroxyl ethyl ester of 6 parts, after fully stirring, make reaction carry out obtaining in 2.5 hours polyurethane prepolymer again.
Embodiment 3, present embodiment comprises the polyurethane prepolymer of 60wt%, the water soluble light-sensitive resin of introducing the stibazole group in polyvinyl alcohol polymer of 25wt%, and the stibazole group of introducing is the 0.3mol% of vinyl alcohol polymerized unit and the anthraquinone of 15wt%; Polyurethane prepolymer in the present embodiment is for pressing mass fraction adds 32 parts in 130 parts the rare nitrile interpolymer of butadiene-third hexamethylene diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 6 hours, and then add methacrylic acid-2-hydroxypropyl acrylate of 3 parts, after fully stirring, make reaction carry out obtaining in 2 hours polyurethane prepolymer again.
Embodiment 4, present embodiment comprises the polyurethane prepolymer of 55wt%, the water soluble light-sensitive resin of introducing styryl quinoline group in polyvinyl alcohol polymer of 35wt%, and the styryl quinoline group of introducing is the 10mol% of vinyl alcohol polymerized unit and the thioxanthones of 10wt%; Polyurethane prepolymer in the present embodiment adds 55 parts isophorone diisocyanate for pressing mass fraction in 200 parts ethylene glycol, after fully stirring, be heated to 80 ℃, reaction was carried out 5 hours, and then add acrylic acid-2-hydroxypropyl acrylate of 9 parts, after fully stirring, make reaction carry out obtaining in 2 hours polyurethane prepolymer again.
Embodiment 5, present embodiment comprises the polyurethane prepolymer of 54.9wt%, the water soluble light-sensitive resin of introducing styryl quinoline group in polyvinyl alcohol polymer of 45wt%, and the styryl quinoline group of introducing is the 1mol% of vinyl alcohol polymerized unit and the ketal of 0.1wt%; Polyurethane prepolymer in the present embodiment is for pressing mass fraction adds 43 parts in 180 parts propylene glycol hydrogenated diphenyl methane diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 6 hours, and then add 18 parts trimethylolpropane diacrylate, after fully stirring, make reaction carry out obtaining in 2.5 hours polyurethane prepolymer again.
Embodiment 6, present embodiment comprises the polyurethane prepolymer of 40wt%, the water soluble light-sensitive resin that adds the N-hydroxyacrylamide in polyvinyl alcohol polymer of 48wt%, and the N-hydroxyacrylamide that adds is the 10mol% of vinyl alcohol polymerized unit and the benzophenone of 12wt%; Polyurethane prepolymer in the present embodiment for press mass fraction in 140 parts tetramethylene glycol, add 26 parts between-Xylene Diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 4 hours, and then add 13 parts pentaerythritol triacrylate, after fully stirring, make reaction carry out obtaining in 1.5 hours polyurethane prepolymer again.
Embodiment 7, present embodiment comprises the water soluble light-sensitive resin that adds N-hydroxymethyl acrylamide in polyvinyl alcohol polymer of polyurethane prepolymer, the 42wt% of 53wt%, and add or N-hydroxymethyl acrylamide be the 18mol% of vinyl alcohol polymerized unit and the benzoin alkylether of 5wt%; Polyurethane prepolymer in the present embodiment is for pressing mass fraction adds 18 parts in 110 parts diglycol toluene diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 5 hours, and then add 5 parts 2-hydroxyethyl methacry-late, after fully stirring, make reaction carry out obtaining in 2 hours polyurethane prepolymer again.
Embodiment 8, present embodiment comprises the polyurethane prepolymer of 35wt%, the water soluble light-sensitive resin that adds the N-hydroxyacrylamide in polyvinyl alcohol polymer of 50wt%, and the N-hydroxyacrylamide that adds is the 25mol% of vinyl alcohol polymerized unit and the acetophenone of 15wt%; Polyurethane prepolymer in the present embodiment is for pressing mass fraction adds 50 parts in 170 parts triethylene glycol diphenyl methane-4,4 '-diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 6 hours, and then add acrylic acid-2-hydroxyl ethyl ester of 10 parts, after fully stirring, make reaction carry out obtaining in 2.5 hours polyurethane prepolymer again.
Embodiment 9, present embodiment comprises the polyurethane prepolymer of 52wt%, the interpolation in polyvinyl alcohol polymer of 30wt% or the water soluble light-sensitive resin of N-hydroxymethyl acrylamide, and the N-hydroxymethyl acrylamide that adds is the 0.05mol% of vinyl alcohol polymerized unit and the ketal of 18wt%; Polyurethane prepolymer in the present embodiment is for pressing mass fraction adds 20 parts in 120 parts dihydromethyl propionic acid hexamethylene diisocyanate, after fully stirring, be heated to 80 ℃, reaction was carried out 4 hours, and then add methacrylic acid-2-hydroxypropyl acrylate of 12 parts, after fully stirring, make reaction carry out obtaining in 1.5 hours polyurethane prepolymer again.
Embodiment 10, present embodiment comprises the water soluble light-sensitive resin that adds the N-hydroxyacrylamide in polyvinyl alcohol polymer of polyurethane prepolymer, the 47wt% of 37wt%, and the N-hydroxyacrylamide that adds or be the 6mol% of vinyl alcohol polymerized unit and the thioxanthones of 16wt%; Polyurethane prepolymer in the present embodiment adds 40 parts isophorone diisocyanate for pressing mass fraction in 150 parts the many alcohol of polyester-type, after fully stirring, be heated to 80 ℃, reaction was carried out 6 hours, and then add 16 parts trimethylolpropane diacrylate, after fully stirring, make reaction carry out obtaining in 1.5 hours polyurethane prepolymer again.
Claims (5)
1, a kind of emulsion type photosensitive resin of sandblast resistant durable is characterized in that: comprise the polyurethane prepolymer of 30～60wt%, the water soluble light-sensitive resin of 20～50wt% and the Photoepolymerizationinitiater initiater of 0.1～20wt%.
2, the emulsion type photosensitive resin of sandblast resistant durable according to claim 1, it is characterized in that: said polyurethane prepolymer is had the polymkeric substance or the terminal monomer that hydroxyl is arranged of hydroxyl by end, polyisocyanates, the compound reaction that molecule contains unsaturated combination of ethylene type and reactive hydrogen functional group obtains, its process is: at first, have in the polymkeric substance of hydroxyl or the terminal monomer that hydroxyl arranged to 100～200 parts end by mass fraction and to add 15～60 parts polyisocyanates, after fully stirring, be heated to 80 ℃, reaction was carried out 4-6 hour, and then the molecule that adds 3～18 parts contains unsaturated combination of ethylene type and reactive hydrogen functional group's compound, after fully stirring, make reaction carry out obtaining in 1.5-2.5 hour polyurethane prepolymer again.
3, the emulsion type photosensitive resin of sandblast resistant durable according to claim 2 is characterized in that: said end have the polymkeric substance of hydroxyl be the many alcohol of polyester-type, the many alcohol of polyether-type, end contain the hydrogen base 1,4-polybutadiene or the rare nitrile interpolymer of butadiene-third;
It is the dihydromethyl propionic acid that ethylene glycol, propylene glycol, tetramethylene glycol, diglycol, triethylene glycol or molecule contain carboxyl that said end has the monomer of hydroxyl;
Said polyisocyanates be toluene diisocyanate, diphenyl methane-4,4 '-diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, hydrogenated diphenyl methane diisocyanate or-Xylene Diisocyanate;
The compound that said molecule contains unsaturated combination of ethylene type and reactive hydrogen functional group is 2-hydroxyethyl methacry-late, acrylic acid-2-hydroxyl ethyl ester, methacrylic acid-2-hydroxypropyl acrylate, acrylic acid-2-hydroxypropyl acrylate, trimethylolpropane diacrylate or pentaerythritol triacrylate.
4, the emulsion type photosensitive resin of sandblast resistant durable according to claim 1, it is characterized in that: said water soluble light-sensitive resin is for introducing stibazole group or styryl quinoline group in polyvinyl alcohol polymer, and stibazole group or the styryl quinoline group introduced are 0.3～20mol% of vinyl alcohol polymerized unit, or add N-hydroxyacrylamide or N-hydroxymethyl acrylamide in polyvinyl alcohol polymer, and the N-hydroxyacrylamide or the N-hydroxymethyl acrylamide that add are 0.05～25mol% of vinyl alcohol polymerized unit.
5, the emulsion type photosensitive resin of sandblast resistant durable according to claim 1 is characterized in that: said Photoepolymerizationinitiater initiater is benzoin alkylether, acetophenone, anthraquinone, thioxanthones, ketal or benzophenone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610041637 CN1800980A (en) | 2006-01-11 | 2006-01-11 | Sandblast resistant durable emulsion type photosensitive resin |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610041637 CN1800980A (en) | 2006-01-11 | 2006-01-11 | Sandblast resistant durable emulsion type photosensitive resin |
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| CN1800980A true CN1800980A (en) | 2006-07-12 |
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| CN 200610041637 Pending CN1800980A (en) | 2006-01-11 | 2006-01-11 | Sandblast resistant durable emulsion type photosensitive resin |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102608867A (en) * | 2012-03-27 | 2012-07-25 | 惠州联大电子材料有限公司 | Photosensitive water developing corrosion-resistant composition and photosensitive water developing corrosion-resistant dry film |
| CN102964761A (en) * | 2011-09-02 | 2013-03-13 | 田菱精细化工（昆山）有限公司 | Resin composition for sandblasting three-dimensional protective film |
| CN106154749A (en) * | 2015-05-12 | 2016-11-23 | 三菱制纸株式会社 | Sandblasting photosensitive polymer combination and grit-blasting treatment process |
-
2006
- 2006-01-11 CN CN 200610041637 patent/CN1800980A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102964761A (en) * | 2011-09-02 | 2013-03-13 | 田菱精细化工（昆山）有限公司 | Resin composition for sandblasting three-dimensional protective film |
| CN102608867A (en) * | 2012-03-27 | 2012-07-25 | 惠州联大电子材料有限公司 | Photosensitive water developing corrosion-resistant composition and photosensitive water developing corrosion-resistant dry film |
| CN102608867B (en) * | 2012-03-27 | 2014-04-02 | 惠州联大电子材料有限公司 | Photosensitive water developing corrosion-resistant composition and photosensitive water developing corrosion-resistant dry film |
| CN106154749A (en) * | 2015-05-12 | 2016-11-23 | 三菱制纸株式会社 | Sandblasting photosensitive polymer combination and grit-blasting treatment process |
| CN106154749B (en) * | 2015-05-12 | 2021-10-12 | 三菱制纸株式会社 | Photosensitive resin composition for sandblasting and sandblasting method |
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Owner name: SICHUAN SHIJI SHUANGHONG DISPLAY DEVICES CO., LTD Free format text: FORMER OWNER: IRICO GROUP ELECTRONICS CO., LTD. Effective date: 20070622 |
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Effective date of registration: 20070622 Address after: 621000, Zhou Yonghong, No. 35 Tung Hing East Road, hi tech Zone, Sichuan, Mianyang Applicant after: Sichuan Sterope Orion Display Co., Ltd. Address before: 712021 No. 1 Rainbow Road, Shaanxi, Xianyang Applicant before: IRICO Group Electronics Co., Ltd. |
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