CN1776884A - Base-board treating device - Google Patents
Base-board treating device Download PDFInfo
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- CN1776884A CN1776884A CNA2005101088580A CN200510108858A CN1776884A CN 1776884 A CN1776884 A CN 1776884A CN A2005101088580 A CNA2005101088580 A CN A2005101088580A CN 200510108858 A CN200510108858 A CN 200510108858A CN 1776884 A CN1776884 A CN 1776884A
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- substrate
- aforementioned
- supporting member
- movable supporting
- rotation
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- 239000000758 substrate Substances 0.000 claims abstract description 188
- 230000007246 mechanism Effects 0.000 claims abstract description 27
- 238000012545 processing Methods 0.000 claims description 57
- 230000032258 transport Effects 0.000 claims description 57
- 230000003028 elevating effect Effects 0.000 claims description 3
- 238000012546 transfer Methods 0.000 abstract description 13
- 239000000428 dust Substances 0.000 abstract description 4
- 230000000630 rising effect Effects 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229960002050 hydrofluoric acid Drugs 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 235000014347 soups Nutrition 0.000 description 2
- 208000036829 Device dislocation Diseases 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
To provide an apparatus having a mechanism that transfers a substrate from a horizontal carrier means to a substrate rotating and treating device, the apparatus being prevented from rising dust and from inconvenience in performing wet treatment, and having a simple structure with footprint relatively small. The apparatus comprises: a carrier 20 including a substrate rotating and treating device 10 and a conveyance roller 16, and being disposed so as to face an end portion of a carrying passage of the conveyance roller and to come a substrate supporting surface of a free roller 28 and a substrate carrying surface on the same level; a transfer arm 32 for moving the substrate horizontally from the end portion of a carrying passage of the conveyance roller onto the carrier; and a supporting/moving mechanism for moving the carrier which supports the substrate from a substrate exchanging position A onto a rotary holding disk 12 of the substrate rotating and treating device; and in which the rotary holding disk includes supporting pins 44 and 46 for holding a mounting surface and the substrate.
Description
Technical field
The present invention relates to a kind ofly have the liquid crystal indicator of making (LCD) with glass substrate, plasma display (PDP) time, carry out the substrate board treatment of the substrate rotation processing unit that the cleaning, etching, development, film forming etc. of substrate handle with the rotation of substrates such as glass substrate, semiconductor wafer, printed circuit board (PCB), electronic device substrate.
Background technology
For example, use in the photoetch operation of substrate at flat-panel monitors such as LCD (FPD), make substrate keep level and be that the center is rotated, used every processing substrate such as the photoetch of fluoric acid, the rinsing that utilizes pure water and oven dry simultaneously respectively with the vertical axis.But the size along with substrate becomes big in recent years, little by little becomes difficult and carry out whole processing according to above-mentioned rotation mode.Therefore, following method has been proposed: handle about photoetch processing and rinsing, carry out separately processing with the high rotation mode of treatment effeciency that adopts soup, and handle for the oven dry of substrate, few flat of the damage of substrate sent mode, is that supporting substrate dewaters to substrate by air knife when horizontal direction is carried and the mode of drying is carried out this processing than rotation mode.In such method, need the device of horizontal feed substrate, for example need substrate is installed to the substrate rotation processing unit from the roller path commentaries on classics, perhaps, substrate is installed on the roller path from the commentaries on classics of substrate rotation processing unit.
As carrying out the mechanism that above-mentioned such substrate changes the dress action, the structure of the mechanism that uses is in the past: the substrate rotation processing unit is configured in to bow is seen as on the extended line of roller path, so that it is adjacent to the end of roller path; In the both sides of roller path and substrate rotation processing unit a pair of slide rail parallel to each other is set, and is provided with and engages with this slide rail and lead and move back and forth shuttle (シ ャ ト Le) between roller path end and substrate rotation processing unit by slide rail; By this shuttle, can load and unload 4 limits of supporting substrate freely, and between roller path end and substrate rotation processing unit moving substrate.In addition, be provided with and have hand that keeps substrate and the transportation manipulator of the arm that is connected with hand, by this transportation manipulator, in roller path end and the handing-over (for example put down into patent application in 10 years and disclose communique No. 156295) that also can carry out substrate substantially between the rotation processing unit with reference to Japan.
Possess to make and load and unload the device that is freely supporting the shuttle of substrate and making its reciprocating mechanism between roller path end and substrate rotation processing unit by the slide rail guiding, because of shuttle and slide rail sliding contact are moved, so shuttle might produce dust when moving, in addition, it is not suitable for being used on the device with the processing unit that uses soup or pure water and carry out wet treatment.In addition, also has following problems: lift substrate, particularly large substrate from roller path, the complexity that become such as mechanism that perhaps make substrate turn back to the mechanism on the roller path and support 4 limits of large substrate.On the other hand, also have such problem: the device of handing-over substrate still is not suitable for wet treatment between roller path end and basic rotation processing unit by transportation manipulator, also have,, become big so take up room because of needs are brandished the space of the arm of transportation manipulator.
Summary of the invention
The present invention In view of the foregoing, its purpose is for providing a kind of substrate board treatment, the device that comprises the mechanism that has the substrate rotation processing unit and change the dress substrate from horizontal conveyance device toward this processing unit, do not worry producing dust, in the device with the processing unit that carries out wet treatment uncomfortable situation can not take place yet, simple in structure, also diminish relatively and occupy the space.
For achieving the above object, the invention provides such device.
(1), a kind of substrate board treatment, possesses the substrate rotation processing unit, it is that the center rotates freely ground rotation retaining member supported, that substrate remained level that this substrate rotation processing unit has with the vertical axis, and make substrate rotation and handle, it is characterized in that, comprise: horizontal conveyance device, it transports substrate to the horizontal direction straight line; Movable supporting member, it has base plate supports is the support portion of level, and with relative with the Trail termination portion that transports of aforementioned levels conveyer to mode, and transport face with the substrate of the base plate supports face of aforementioned support portion and horizontal conveyance device and become the mode of equal height and be configured; Change assembling device, it makes substrate move horizontally to aforementioned movable supporting member from the Trail termination portion that transports of aforementioned horizontal conveyance device; Mobile device, it makes the aforementioned movable supporting member that is supporting substrate, from with the Trail termination portion that transports of aforementioned levels conveyer relative to the position move to the rotation retaining member of aforesaid base plate rotation processing unit, aforementioned rotation retaining member has the loading surface that loads aforementioned movable supporting member and from being loaded in that aforementioned movable supporting member on this loading surface is left upward and the substrate maintaining part that keeps substrate.
(2), as (1) described substrate board treatment, it is characterized in that, with relative with the Trail termination portion that transports of aforementioned levels conveyer to the aforementioned movable supporting member that disposes of mode, be positioned at the aforesaid base plate rotation processing unit the rotation retaining member directly over, aforementioned mobile device has the elevating mechanism that makes aforementioned movable support member lifting.
(3), as (2) described substrate board treatment, it is characterized in that, on aforementioned movable supporting member, be provided with a plurality of through holes that are used to insert the substrate maintaining part that connects aforementioned rotation retaining member.
(4), as each described substrate board treatment in (1) to (3), it is characterized in that the support portion of aforementioned movable supporting member is for being installed in a plurality of free roller of the upper surface side of movable supporting member respectively in the mode freely of rotating.
(5), as each described substrate board treatment in (1) to (3), it is characterized in that aforementioned mobile device has with engaging or the mode freely of breaking away from and is sticked in aforementioned movable supporting member and supports the engaging support portion of movable supporting member.
(6), as each described substrate board treatment in (1) to (3), it is characterized in that the aforementioned levels conveyer is that a plurality of rollers that transport by arrangement parallel to each other constitute.
In above-mentioned (1) described substrate board treatment of the present invention, when transporting substrate by horizontal conveyance device and transport the terminal part in path to it, the terminal part that transports the path from horizontal conveyance device moves horizontally substrate by changeing assembling device, installs to the base plate supports face that is configured to the support portion and transports face with the substrate of horizontal conveyance device and become on the movable supporting member of equal height and change.When substrate is being supported by the support portion of movable supporting member, pass through mobile device, the movable supporting member of supporting substrate is moved on the rotation retaining member of substrate rotation processing unit, and movable supporting member is loaded on the loading surface of rotation retaining member, and substrate leaves upward and is maintained on the substrate maintaining part of rotation retaining member from movable supporting member simultaneously.Thereby be rotated by rotation retaining member under the state that has loaded movable supporting member, thereby make the substrate rotation, and carry out the processing of substrate.
Therefore, when adopting above-mentioned (1) described substrate board treatment of the present invention, part almost is not slidingly connected between the member of formation, so substrate is not being worried producing dust when the horizontal conveyance device commentaries on classics installs to the substrate rotation processing unit, in addition, uncomfortable situation can not take place yet in the device with the processing unit that carries out wet treatment.Also have because this substrate board treatment do not have from horizontal conveyance device and do not lift the mechanism of substrate or the mechanism on 4 limits of supporting substrate etc., so structure become simply, and, owing to transportation manipulator is not set, also become smaller so occupy the space.
In above-mentioned (2) described substrate board treatment of the present invention, movable supporting member be positioned at the substrate rotation processing unit the rotation retaining member directly over, and can only descend and rise with respect to the rotation retaining member by elevating mechanism, become littler so occupy the space.
In above-mentioned (3) described substrate board treatment of the present invention, when movable supporting member descends with respect to the rotation retaining member of substrate rotation processing unit, lead in the through hole of movable supporting member by the substrate maintaining part of rotation retaining member is slotting, movable supporting member does not interfere with the substrate maintaining part and is loaded on the loading surface of rotation retaining member, and substrate leaves and is maintained on the substrate maintaining part of rotation retaining member from movable supporting member simultaneously.By so simple structure, just can realize that the substrate of the substrate maintaining part of the loading action of the movable supporting member on the loading surface of rotation retaining member and rotation retaining member keeps action.
In above-mentioned (4) described substrate board treatment, when the Trail termination portion that transports that makes substrate from horizontal conveyance device by mobile device moved horizontally, substrate was transferred in the free roller of movable supporting member and is supported.Therefore, wounded substrate and positively changeing from horizontal conveyance device does not install on the movable supporting member.
In above-mentioned (5) described substrate board treatment of the present invention, movable supporting member is being stuck under the state that supports the support portion with the engaging the support portion engaging of mobile device, be transported to by mobile device on the rotation retaining member of substrate rotation processing unit, then, break away from from movable supporting member by the engaging support portion, the rotation retaining member just can be rotated under the state that keeps movable supporting member.By so simple mechanism in ratio school, can positively realize the moving of movable supporting member on the rotation retaining member of substrate rotation processing unit.
In above-mentioned (6) described substrate board treatment of the present invention, by a plurality of rollers that transport, substrate by horizontal feed to relative with movable supporting member to the position.
Description of drawings
Fig. 1 represents 1 example of form of implementation of the present invention, is the vertical view of structure of the major part of expression substrate board treatment;
Fig. 2 is the side sectional view of substrate board treatment shown in Figure 1;
Fig. 3 is the vertical view as the movable supporting member of the constitutive requirements of substrate board treatment shown in Figure 1 (transporting plate);
Fig. 4 A is the A-A cutaway view of Fig. 3;
Fig. 4 B is the B-B cutaway view of Fig. 3;
Fig. 4 C is the C-C cutaway view of Fig. 3;
Fig. 5 A～Fig. 5 C is the figure that is used for illustrating the commentaries on classics dress action of the substrate in the substrate board treatment shown in Figure 1, is the side sectional view of the part of expression roller path;
Fig. 6 is that expression is transported plate, transported the end view of the part of the support of plate and travel mechanism and substrate rotation processing unit equally;
Fig. 7 is that expression is transported plate, transported the end view of the part of the support of plate and travel mechanism and substrate rotation processing unit equally;
Fig. 8 is that expression is transported plate, transported the end view of the part of the support of plate and travel mechanism and substrate rotation processing unit equally;
Fig. 9 is that expression is transported plate, transported the end view of the part of the support of plate and travel mechanism and substrate rotation processing unit equally;
Figure 10 is that expression is transported plate, transported the end view of the part of the support of plate and travel mechanism and substrate rotation processing unit equally.
Embodiment
Below, with reference to description of drawings preferred forms of the present invention.
Fig. 1 to Fig. 4 represents 1 example of form of implementation of the present invention, Fig. 1 is the vertical view of structure of the major part of expression substrate board treatment, Fig. 2 is its side sectional view, Fig. 3 is the vertical view as the movable supporting member of the constitutive requirements of this substrate board treatment (transporting plate), Fig. 4 A is the A-A cutaway view of Fig. 3, Fig. 4 B is the B-B cutaway view of Fig. 3, and Fig. 4 C is the C-C cutaway view of Fig. 3.
This substrate board treatment has the substrate rotation processing unit of handling 10 in the rotation LCD substrate W square with glass substrate etc.In this processing unit 10, for example use the photoetch of fluoric acid to handle, utilized the rinsing processing of pure water etc.Processing unit 10, have by rotating the rotation maintenance plectane 12 that back shaft 14 is supported for level and substrate W is remained level, and should rotation keep plectane 12, make the rotation of rotation back shaft 14 by not shown rotation motor, thus can be in horizontal plane be that the center rotates with the vertical axis.Also have, set in the processing unit 10 to remaining on rotation and keep the nozzle etc. of the jet surface fluoric acid of the substrate W on the plectane 12 or pure water etc., but omit explanation these.
In this substrate board treatment, set roller path 16 adjacent with substrate rotation processing unit 10 and that substrate W is transported to the horizontal direction straight line.Roller path 16 is that a plurality of rollers 18 that transport by arrangement parallel to each other constitute.With flat shape greater than substrate W square transport rotation that plate 20 is configured in processing unit 10 keep plectane 12 directly over the position, and make its terminal part that transports the path with this roller path 16 relative to.
Transport in the plate 20, as shown in Figure 3, a pair ofly be provided with totally 8 bight through holes 22, and on whole, disperse and a plurality of small-bores through hole 24 is set thereby respectively be provided with respectively at 4 angles.In addition, formed the shallow trench 26 of linearity at the middle body of the upper surface that transports plate 20.Further, at the upper surface that transports plate 20, set in rotating shaft is vertical with the length direction of groove 26 separately mode and a plurality of free roller 28 that is installed with rotating freely.Shown in Fig. 4 C, each free roller 28 is with from the upper surface that transports plate 20 mode of an outstanding part respectively, and the mode that all is positioned at same horizontal plane with the upper end of whole free rollers 28 is being mounted.This transports plate 20, and the upper end by a plurality of free rollers 28 is contacted with the lower surface of substrate W respectively and substrate W is supported for level.Also have, transport plate 20 be positioned at as shown in Figure 2 relative with the terminal part that transports path roller path 16 to substrate transfer position A the time, the base plate supports face that is formed by the upper end of a plurality of free rollers 28 and the substrate of roller path 16 transport face to be become the mode of same height and is being configured.In addition, transport on the central portion of a side of plate 20 and formed cross-drilled hole 30.
In roller path 16 1 sides, set the commentaries on classics dress arm 32 of elongated plate-like at the upper side of the rotating shaft that transports roller 18.At the leading section that changes dress arm 32 and the upper surface of rearward end, be provided with respectively with close in checkpost of each end of substrate W and engage protuberance 34a, 34b.Change dress arm 32, be supported for level by not shown support and travel mechanism, and carry out linear reciprocation in the horizontal direction when moving, direction has only moving back and forth of slight distance up and down.Constitute thereby change dress arm 32,, move back and forth in the terminal part position of transporting the path of roller path 16 and be provided with between the substrate transfer position A that transports plate 20 by shift action to horizontal direction; And by the shift action of direction up and down, move back and forth in the upper position that checkpost of each end of engaging protuberance 34a, 34b and substrate W closes and engage protuberance 34a, 34b between the lower position of each limit of holding disengaging of substrate W.
Also have, to shown in Figure 10, at the opposition side of roller path 16, set the support and the travel mechanism 36 that transport plate 20 across transporting plate 20 as Fig. 6.Support and travel mechanism 36 comprises: engaging support bar 38, it has leading screw portion, and leading section is fastened in the cross-drilled hole 30 that transports plate 20 in the mode that can freely engage or break away from and plate 20 is transported in support; Horizontal drive portion 40, omission is for the explanation of structure, but it has the nut portions that screws togather with the leading screw portion that engages support bar 38, make it not being rotated, and make the leading section of engaging support bar 38 enter in the cross-drilled hole 30 that transports plate 20 or withdraw from from the cross-drilled hole 30 that transports plate 20 with the modes that engage the common rotation of support bar 38; And lifting drive division 42, it supports this horizontal drive portion 40, and it is moved back and forth on above-below direction.By this support and travel mechanism 36, transport plate 20 and the terminal part that transports the path of roller path 16 relatively to above substrate transfer position A and the rotation that is loaded in substrate rotation processing unit 10 keep on the plectane 12 below rotation processing position B between move back and forth.
The rotation of substrate rotation processing unit 10 keeps plectane 12, its upper surface constitutes and supports the loading surface that transports plate 20, be provided with in upper surface side and engage with each bight of substrate W respectively and each of supporting substrate W is a pair of, totally 8 bight supporting pins 44, be provided with a plurality of lower surface supporting pins 46 that contact supporting substrate W on it respectively with the lower surface of substrate W simultaneously disperseing on whole.These each bight supporting pins 44 and each lower surface supporting pin 46, with the corresponding respectively position, formation position that is arranged on each bight through hole 22 of transporting on the plate 20 and each small-bore through hole 24 on dispose.Also have, each bight supporting pin 44 and each lower surface supporting pin 46, shown in Fig. 4 A and Fig. 4 B (supporting pin 44,46 represent with double dot dash line), form respectively and to insert logical each the bight through hole 22 that transports on the plate 20 and the size in each small-bore through hole 24 of being arranged at, in addition, the height of the height of the base plate supports portion of each bight supporting pin 44 and each lower surface supporting pin 46 upper end is greater than the thickness that transports plate 20.By having such structure, when transporting plate 20 declines, each the bight through hole 22 and each the small-bore through hole 24 that transport plate 20 keep each bight supporting pin 44 and each lower surface supporting pin 46 of plectane 12 not to contact mutually respectively with rotation, and the down maneuver that allows to transport plate 20 can be loaded on the rotation maintenance plectane 12 thereby transport plate 20.
Then, according to Fig. 5 to Figure 10, the commentaries on classics dress action of the substrate W in the substrate board treatment with said structure is described.
Shown in Fig. 5 A, be positioned under the state of bottom at commentaries on classics dress arm 32, when transporting substrate W by roller path 16 when the terminal part position of transporting the path stops, changeing dress arm 32 moves to upper position, shown in Fig. 5 B, the engaging protuberance 34b that changes dress arm 32 engages with the posterior end edge of substrate W.Then, shown in Fig. 5 C, move horizontally by changeing the substrate transfer position A side that dress arm 32 transports plate 20 to configuration, substrate W is supported on transporting on the roller 18 of roller path 16, and the engaging protuberance 34b that is changeed dress arm 32 simultaneously promotes the posterior end edge and moves to substrate transfer position A.Thereby substrate W is transported to substrate transfer position A by changeing dress arm 32 simultaneously from progressively be transformed into the state of free roller 28 supports that are transported plate 20 by the state that transports roller 18 supports of roller path 16.
As shown in Figure 6, substrate W is transported to substrate transfer position A by changeing dress arm 32, substrate W be supported on by support and the free roller 28 that transports plate 20 that the engaging support bar 38 of travel mechanism 36 is supporting on and stop, as shown in Figure 7, change dress arm 32 and in the groove 26 that transports plate 20, move to lower position.Thus, the fastening state on the limit, two ends of engaging protuberance 34a, the 34b of commentaries on classics dress arm 32 and substrate W is disengaged.Then, change the place, terminal part position that transports the path that dress arm 32 is moved horizontally to roller path 16, break away from from substrate transfer position A.
As shown in Figure 8, when changeing dress arm 32 when substrate transfer position A breaks away from, by free roller 28 upper support substrate W transport plate 20, the lifting drive division 42 by support and travel mechanism 36 is moved to substrate rotation processing unit 10.Then, along with the down maneuver of transporting plate 20 from substrate transfer position A to substrate rotation processing position B, as shown in Figure 9, substrate W is transferred to rotation from the free roller 28 that transports plate 20 and keeps on the bight supporting pin 44 and lower surface supporting pin 46 of plectane 12, and substrate W is when keeping the bight supporting pin 44 of plectane 12 and lower surface supporting pin 46 to keep by rotation, will transport plate 20 and load and remain on rotation and keep on the upper surface of plectane 12.
Be maintained at the upper surface that rotation keeps plectane 12 when transporting plate 20, and substrate W is when being kept by bight supporting pin 44 and lower surface supporting pin 46, by supporting and the horizontal drive portion 40 of travel mechanism 36, engaging support bar 38 is to moving from transporting the direction that plate 20 leaves.Thus, as shown in figure 10, the leading section of engaging support bar 38 is extracted from the cross-drilled hole 30 that transports plate 20, and engaging support bar 38 is disengaged with the fastening state of transporting plate 20.Therefore, rotation keeps plectane 12 to become rotatable state, and the processing substrate of stipulating in substrate rotation processing unit 10.
When the processing of the substrate W that finishes in substrate rotation processing unit 10, by the action opposite with above-mentioned action, substrate W keeps being changeed to install on the plectane 12 transporting on the plate 20 from rotation, and be supported on and transport on the plate 20 and after moving to substrate transfer position A from substrate rotation processing position B, by changeing dress arm 32 and turning back on the roller path 16 from transporting plate 20.
Substrate board treatment of the present invention, constituting the action of going forward side by side as mentioned above does, but, the level of base plate conveyer, transport plate, structure such as the commentaries on classics assembling device from horizontal conveyance device to the substrate that transports plate, the support of transporting plate and mobile device, be not that content by above-mentioned form of implementation is defined, but can adopt various mechanisms.
Claims (6)
1. substrate board treatment, possess the substrate rotation processing unit, this substrate rotation processing unit have with the vertical axis be the center rotate freely ground supported, substrate is remained the rotation retaining member of level, and make the substrate rotation and handle, it is characterized in that, comprising:
Horizontal conveyance device, it transports substrate to the horizontal direction straight line;
Movable supporting member, it has base plate supports is the support portion of level, and with relative with the Trail termination portion that transports of aforementioned levels conveyer to mode, and transport face with the substrate of the base plate supports face of aforementioned support portion and horizontal conveyance device and become the mode of equal height and be configured;
Change assembling device, it makes substrate move horizontally to aforementioned movable supporting member from the Trail termination portion that transports of aforementioned horizontal conveyance device;
Mobile device, it makes the aforementioned movable supporting member that is supporting substrate, from the Trail termination portion that transports of aforementioned levels conveyer relative to the position move to the rotation retaining member of aforesaid base plate rotation processing unit,
Aforementioned rotation retaining member has the loading surface that loads aforementioned movable supporting member and from being loaded in that aforementioned movable supporting member on this loading surface is left upward and the substrate maintaining part that keeps substrate.
2. substrate board treatment as claimed in claim 1, it is characterized in that, with relative with the Trail termination portion that transports of aforementioned levels conveyer to the aforementioned movable supporting member that disposes of mode, be positioned at the aforesaid base plate rotation processing unit the rotation retaining member directly over, aforementioned mobile device has the elevating mechanism that makes aforementioned movable support member lifting.
3. substrate board treatment as claimed in claim 2 is characterized in that, on aforementioned movable supporting member, is provided with a plurality of through holes that are used to insert the substrate maintaining part that connects aforementioned rotation retaining member.
4. as each described substrate board treatment in the claim 1 to 3, it is characterized in that the support portion of aforementioned movable supporting member is for being installed in a plurality of free roller of the upper surface side of movable supporting member respectively in the mode freely of rotating.
5. as each described substrate board treatment in the claim 1 to 3, it is characterized in that aforementioned mobile device has with engaging or the mode freely of breaking away from and is sticked in aforementioned movable supporting member and supports the engaging support portion of movable supporting member.
6. as each described substrate board treatment in the claim 1 to 3, it is characterized in that the aforementioned levels conveyer is that a plurality of rollers that transport by arrangement parallel to each other constitute.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004330261 | 2004-11-15 | ||
| JP2004330261A JP4313284B2 (en) | 2004-11-15 | 2004-11-15 | Substrate processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1776884A true CN1776884A (en) | 2006-05-24 |
| CN100352000C CN100352000C (en) | 2007-11-28 |
Family
ID=36620976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101088580A Expired - Fee Related CN100352000C (en) | 2004-11-15 | 2005-10-09 | Base-board treating device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4313284B2 (en) |
| KR (1) | KR100643053B1 (en) |
| CN (1) | CN100352000C (en) |
| TW (1) | TWI276199B (en) |
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| CN1987436B (en) * | 2006-12-27 | 2010-04-21 | 友达光电股份有限公司 | Base board detector and glass base board detector |
| CN101671113B (en) * | 2008-09-12 | 2011-12-21 | 佛山市顺德区高力威机械有限公司 | Automatic linear conveying transfer station for glass |
| CN101558001B (en) * | 2007-02-20 | 2012-03-21 | 株式会社Ihi | Substrate transfer apparatus |
| CN102633103A (en) * | 2012-03-21 | 2012-08-15 | 李莉 | Plate glass rotary table |
| CN103443913A (en) * | 2011-04-13 | 2013-12-11 | 夏普株式会社 | Substrate support device, and drying device |
| CN106225467A (en) * | 2016-07-14 | 2016-12-14 | 武汉华星光电技术有限公司 | Thin film dehydrator support and thin film dehydrator |
| CN108137240A (en) * | 2015-10-22 | 2018-06-08 | 惠普深蓝有限责任公司 | Sense the article in conveyer |
| CN108841474A (en) * | 2018-07-28 | 2018-11-20 | 贵州怀宫酒业销售有限公司 | Liquor made from sorghum preparation Raw material processing device |
| CN108861595A (en) * | 2018-07-02 | 2018-11-23 | 君泰创新（北京）科技有限公司 | Positioning device |
| CN109004108A (en) * | 2018-08-02 | 2018-12-14 | 京东方科技集团股份有限公司 | The manufacturing method and display panel of display panel |
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2005
- 2005-10-06 KR KR1020050093769A patent/KR100643053B1/en not_active IP Right Cessation
- 2005-10-09 CN CNB2005101088580A patent/CN100352000C/en not_active Expired - Fee Related
- 2005-10-17 TW TW094136143A patent/TWI276199B/en not_active IP Right Cessation
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| CN109004108A (en) * | 2018-08-02 | 2018-12-14 | 京东方科技集团股份有限公司 | The manufacturing method and display panel of display panel |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW200620529A (en) | 2006-06-16 |
| TWI276199B (en) | 2007-03-11 |
| KR100643053B1 (en) | 2006-11-10 |
| CN100352000C (en) | 2007-11-28 |
| KR20060053995A (en) | 2006-05-22 |
| JP4313284B2 (en) | 2009-08-12 |
| JP2006140380A (en) | 2006-06-01 |
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