CN1727935A - System for collecting images of material ablation under ultra high temperature - Google Patents
System for collecting images of material ablation under ultra high temperature Download PDFInfo
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- CN1727935A CN1727935A CN200510010202.5A CN200510010202A CN1727935A CN 1727935 A CN1727935 A CN 1727935A CN 200510010202 A CN200510010202 A CN 200510010202A CN 1727935 A CN1727935 A CN 1727935A
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- high temperature
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Abstract
A collection system of material ablation pattern with superhigh temperature comprises CCD camera connected to optical varifocus lens through connecting piece and sleeve connected to front of optical varifocus lens. It features that polarization sheet set, narrowband filter, polarized light sheet are set in sleeve as polarized light sheet is near to optical varifocus lens and narrowband filter is set between polarized light sheet and polarization sheet set.
Description
(1) technical field
What the present invention relates to is a kind of image capturing system, specifically a kind of special image acquisition system of developing for the monitoring of material ablation test process under superhigh temperature jet environment.
(2) background technology
With the AC plasma well heater is the heat resistant material ground analogue test system of core, can the ablation process of simulation material under environment such as superhigh temperature, by the key parameters in the process of the test is gathered and is analyzed, can disclose the ablative mechanism of material, for material and structure optimization design provide foundation.Online the obtaining of the ablation characteristics image on test specimen surface is crucial in the ablation test process.
At present, the equipment that can be used for high temperature image acquisition and processing is thermal infrared imager, possesses image acquisition and thermometric function.This equipment is divided into two-beam with optical signalling, and a part enters video camera and another part is sent to scanning thermo-detector, and final image and temperature can be seen on graphoscope.Thermal infrared imager adopts infrared imaging and optical measurement technology, and complex structure costs an arm and a leg.
(3) summary of the invention
The object of the present invention is to provide a kind of simple in structure, cost is low, reliable good system for collecting images of material ablation under ultra high temperature.
The object of the present invention is achieved like this: it comprises the CCD camera, the CCD camera connects Zoom optic lens by web member, pass through the web member coupling sleeve before the Zoom optic lens, polarizer group, narrow band pass filter, polaroid are installed in sleeve, polaroid is near Zoom optic lens, and narrow band pass filter is between polaroid and polarizer group.
The present invention can also comprise some architectural features like this:
1, narrow band pass filter is by abutment sleeve between polaroid and the narrow band pass filter and location rubber cushion axial restraint.
2, have the polarizer group installation opening on the sleeve, ladder platform and turn axial location in the polarizer group sleeve.
3, the printing opacity wavelength of narrow band pass filter is at 650-720nm, and the transmitance in the 50nm scope of center is 50%, and the edge transmitance is 10%.
4, the CCD camera is a valid pixel 768 (H) * 582 (V), and horizontal definition 570 lines have advanced digital regulated backlight compensation function, and minimal illumination is the CCD camera of 0.81ux (0.008fc).
That the present invention has is simple in structure, cost is low, reliable good advantage.This system can shield superhigh temperature plasma jet and stray light effectively, onlinely obtains high-quality material ablation surface image, realizes that the ablation test process reappears, and according to the surface ablation rate of the image calculation material of gathering.
(4) description of drawings
Fig. 1 is a structural principle synoptic diagram of the present invention;
Fig. 2 is a carbon/carbon compound material ablated surface characteristic pattern;
Fig. 3 is for mixing carbon/carbon compound material ablated surface characteristic pattern;
Fig. 4 ablates in real time for material surface and retreats rate.
(5) specific embodiments
For a more detailed description to the present invention for example below in conjunction with accompanying drawing:
In conjunction with Fig. 1, the composition of system for collecting images of material ablation under ultra high temperature comprises CCD camera 12.The CCD camera connects Zoom optic lens 10 by web member 11, passes through web member 8 coupling sleeves 1 before the Zoom optic lens.Polarizer group 3, narrow band pass filter 5, polaroid 7 are installed in sleeve.Polaroid is near Zoom optic lens, and narrow band pass filter is between polaroid and polarizer group.Narrow band pass filter is by abutment sleeve between polaroid and the narrow band pass filter 6 and location rubber cushion 4 axial restraints.Have the polarizer group installation opening on the sleeve, ladder platform and turn 2 axial location in the polarizer group sleeve.The printing opacity wavelength of narrow band pass filter is at 650-720nm, and the transmitance in the 50nm scope of center is 50%, and the edge transmitance is 10%.The CCD camera is a valid pixel 768 (H) * 582 (V), and horizontal definition 570 lines have advanced digital regulated backlight compensation function, and minimal illumination is the CCD camera of 0.81ux (0.008fc).Wherein said web member is an abutment ring.Abutment ring 8 is fixed on the Zoom optic lens by prohibiting solid screw 9.
Form optical imaging system by polarizer group, optical filter, polaroid and optical lens, the optical imagery of test specimen is projected the photoelectricity coupling array of CCD camera, form digital picture.Polarizer group is made up of 2 polaroids, regulates the angle between the polaroid, reduces light intensity; Narrow band pass filter only allows the visible light of certain wavelength (650-720nm) to pass through, in the center range (50nm) be filtered into 50% thoroughly, the edge transmitance is 10%; Polaroid is used for the filtering parasitic light, eliminates halation.The valid pixel 768 (H) * 582 (V) of CCD camera, horizontal definition 570 lines have advanced digital regulated backlight compensation (BLC) function, and minimal illumination is 0.81ux (0.008fc).Then, image acceptance and the storage system formed by image pick-up card and image capture software are saved in hard disc of computer in real time with digital picture, image capture software possesses the function of image acquisition, storage, playback and analysis, image acquisition speed was 10~20 frame/seconds, and acquisition time is relevant with test period and hard disc of computer capacity.Can freely set playback speed during the process playback.After ablation test finishes, utilize the playback function of software to reproduce the change procedure and the ablation characteristics on test specimen surface in the entire test, and the gauging surface ablation velocity.
At first the requirement according to ground ablation simulation system is seated the ablator test specimen, by abutment ring 11 Zoom optic lens 10 is connected with CCD camera 12, regulates lens focus and CCD camera focus, obtains the clear image of certain multiple.Fixing by trip bolt 9 between abutment ring 8 and the camera lens, the external sleeve 1 of abutment ring is installed polaroid 7 in the sleeve, and as the reference light source, polaroid angle filtering scattered light is regulated on irradiation test specimen surface with tungsten ribbon lamp.Connect polarizer group 3 and narrow band pass filter 5, narrow band pass filter is by abutment sleeve 6 and location rubber cushion 4 axial location, and polarizer group is carried out axial location by sleeve 1 and turn 2, regulates the angle (80-95 degree) between the polaroid, reduce light intensity, obtain satisfied image.The CCD camera is connected with high speed image acquisition board, drives image capture software.Operation AC plasma well heater carries out the ground simulation ablation test to test specimen, and hard disc of computer is gathered and be saved in to the image of test specimen ablated surface in real time.After ablation test finishes, utilize the playback function of software to reproduce the change procedure and the ablation characteristics on test specimen surface in the entire test, and the ablation in real time of calculation testing piece surface retreat rate.
Experimental test shows, the present invention can shield plasma jet and the stray light that temperature surpasses 4000K effectively, online heat proof material ablation surface (temperature 3000K) image and the ablation characteristics that obtains high-quality (resolution 0.01mm), shown in Fig. 2,3, mixing the logistics of carbon/carbon compound material surface melting drops down, as shown in Figure 3, the material surface ablating rate is process over time, as shown in Figure 4.
Claims (8)
1, a kind of system for collecting images of material ablation under ultra high temperature, it comprises the CCD camera, the CCD camera connects Zoom optic lens by web member, it is characterized in that: pass through the web member coupling sleeve before the Zoom optic lens, polarizer group, narrow band pass filter, polaroid are installed in sleeve, polaroid is near Zoom optic lens, and narrow band pass filter is between polaroid and polarizer group.
2, system for collecting images of material ablation under ultra high temperature according to claim 1 is characterized in that: narrow band pass filter is by abutment sleeve between polaroid and the narrow band pass filter and location rubber cushion axial restraint.
3, system for collecting images of material ablation under ultra high temperature according to claim 1 and 2 is characterized in that: have the polarizer group installation opening on the sleeve, ladder platform and turn axial location in the polarizer group sleeve.
4, system for collecting images of material ablation under ultra high temperature according to claim 1 and 2 is characterized in that: the printing opacity wavelength of narrow band pass filter is at 650-720nm, and the transmitance in the 50nm scope of center is 50%, and the edge transmitance is 10%.
5, system for collecting images of material ablation under ultra high temperature according to claim 3 is characterized in that: the printing opacity wavelength of narrow band pass filter is at 650-720nm, and the transmitance in the 50nm scope of center is 50%, and the edge transmitance is 10%.
6, according to claim 1,2 or 5 described system for collecting images of material ablation under ultra high temperature, it is characterized in that: the CCD camera is a valid pixel 768 (H) * 582 (V), horizontal definition 570 lines, have advanced digital regulated backlight compensation function, minimal illumination is the CCD camera of 0.81ux (0.008fc).
7, system for collecting images of material ablation under ultra high temperature according to claim 3, it is characterized in that: the CCD camera is a valid pixel 768 (H) * 582 (V), horizontal definition 570 lines have advanced digital regulated backlight compensation function, and minimal illumination is the CCD camera of 0.81ux (0.008fc).
8, system for collecting images of material ablation under ultra high temperature according to claim 4, it is characterized in that: the CCD camera is a valid pixel 768 (H) * 582 (V), horizontal definition 570 lines have advanced digital regulated backlight compensation function, and minimal illumination is the CCD camera of 0.81ux (0.008fc).
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CNB2005100102025A CN1303447C (en) | 2005-07-20 | 2005-07-20 | System for collecting images of material ablation under ultra high temperature |
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CNB2005100102025A CN1303447C (en) | 2005-07-20 | 2005-07-20 | System for collecting images of material ablation under ultra high temperature |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101980074A (en) * | 2010-10-12 | 2011-02-23 | 黄锐敏 | Method for applying polarized lens between lens and optical coupler |
CN102706919A (en) * | 2011-11-28 | 2012-10-03 | 北京科技大学 | Method for detecting oxidation and ablation resisting performance of high-temperature material |
CN103234898A (en) * | 2013-04-15 | 2013-08-07 | 清华大学 | Ablation testing apparatus and method for applying load on-line |
CN103411958A (en) * | 2013-08-08 | 2013-11-27 | 哈尔滨工业大学 | Dynamic testing device and method for ablation rate of material |
CN104199169A (en) * | 2014-09-15 | 2014-12-10 | 常州宝仪机电设备有限公司 | Electric lens diaphragm unit |
CN112129483A (en) * | 2020-08-21 | 2020-12-25 | 中国航天空气动力技术研究院 | Ablation ground simulation test device and method based on ablation backset compensation |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05344952A (en) * | 1992-06-16 | 1993-12-27 | Olympus Optical Co Ltd | Image pick-up device for endoscope |
JP2003228038A (en) * | 2002-02-01 | 2003-08-15 | Sony Corp | Dimming device and imaging device |
CN2541820Y (en) * | 2002-05-23 | 2003-03-26 | 东北大学 | Tester for slag molten temp characteristic |
-
2005
- 2005-07-20 CN CNB2005100102025A patent/CN1303447C/en not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101980074A (en) * | 2010-10-12 | 2011-02-23 | 黄锐敏 | Method for applying polarized lens between lens and optical coupler |
CN102706919A (en) * | 2011-11-28 | 2012-10-03 | 北京科技大学 | Method for detecting oxidation and ablation resisting performance of high-temperature material |
CN102706919B (en) * | 2011-11-28 | 2014-04-02 | 北京科技大学 | Method for detecting oxidation and ablation resisting performance of high-temperature material |
CN103234898A (en) * | 2013-04-15 | 2013-08-07 | 清华大学 | Ablation testing apparatus and method for applying load on-line |
CN103411958A (en) * | 2013-08-08 | 2013-11-27 | 哈尔滨工业大学 | Dynamic testing device and method for ablation rate of material |
CN103411958B (en) * | 2013-08-08 | 2014-06-18 | 哈尔滨工业大学 | Dynamic testing device and method for ablation rate of material |
CN104199169A (en) * | 2014-09-15 | 2014-12-10 | 常州宝仪机电设备有限公司 | Electric lens diaphragm unit |
CN112129483A (en) * | 2020-08-21 | 2020-12-25 | 中国航天空气动力技术研究院 | Ablation ground simulation test device and method based on ablation backset compensation |
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