CN1637052A - 铳盐光敏引发剂及其用途 - Google Patents
铳盐光敏引发剂及其用途 Download PDFInfo
- Publication number
- CN1637052A CN1637052A CNA200410098187XA CN200410098187A CN1637052A CN 1637052 A CN1637052 A CN 1637052A CN A200410098187X A CNA200410098187X A CN A200410098187XA CN 200410098187 A CN200410098187 A CN 200410098187A CN 1637052 A CN1637052 A CN 1637052A
- Authority
- CN
- China
- Prior art keywords
- phenyl
- photoinitiator
- thio
- sulfonium salt
- structural formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
- C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
- C07D335/16—Oxygen atoms, e.g. thioxanthones
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Sealing Material Composition (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
Abstract
Description
配方和固化时间 | 无滤光器 | 有ITO玻璃滤光器 |
配方1,20秒 | 完全固化 | 完全固化 |
配方1,40秒 | 完全固化 | 完全固化 |
配方1,60秒 | 完全固化 | 完全固化 |
配方2,20秒 | 完全固化 | 很少固化 |
配方2,40秒 | 完全固化 | 部分固化,表面很粘 |
配方2,60秒 | 完全固化 | 部分固化,表面发粘 |
Claims (19)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/700,754 US7230122B2 (en) | 2003-11-04 | 2003-11-04 | Sulfonium salt photinitiators and use thereof |
US10/700754 | 2003-11-04 | ||
US10/918,946 US20050095531A1 (en) | 2003-11-04 | 2004-08-16 | Sulfonium salt photoinitiators and use thereof |
US10/918946 | 2004-08-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1637052A true CN1637052A (zh) | 2005-07-13 |
CN100522957C CN100522957C (zh) | 2009-08-05 |
Family
ID=34468076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB200410098187XA Active CN100522957C (zh) | 2003-11-04 | 2004-11-04 | 锍盐光敏引发剂及其用途 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1538149B1 (zh) |
JP (1) | JP4855670B2 (zh) |
KR (1) | KR101197539B1 (zh) |
CN (1) | CN100522957C (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102754028A (zh) * | 2010-02-05 | 2012-10-24 | 佳能株式会社 | 感光性树脂组合物、结构体的生产方法和液体排出头 |
CN104334642A (zh) * | 2012-05-25 | 2015-02-04 | 汉高股份有限及两合公司 | 聚合物组合物 |
US9061499B2 (en) | 2010-02-05 | 2015-06-23 | Canon Kabushiki Kaisha | Negative photosensitive resin composition, pattern formation method, and liquid discharge head |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4677353B2 (ja) * | 2005-02-18 | 2011-04-27 | 富士フイルム株式会社 | レジスト組成物、該レジスト組成物に用いる化合物及び該レジスト組成物を用いたパターン形成方法 |
US7541131B2 (en) * | 2005-02-18 | 2009-06-02 | Fujifilm Corporation | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
TWI323251B (en) * | 2005-10-19 | 2010-04-11 | Tokyo Ohka Kogyo Co Ltd | New compound, acid genelator, chemically amplified photoresist composition, resist laminate, and process for forming resist pattern |
JP4828201B2 (ja) * | 2005-10-19 | 2011-11-30 | 東京応化工業株式会社 | 化学増幅型ホトレジスト組成物、レジスト層積層体およびレジストパタ−ン形成方法 |
JP4823640B2 (ja) * | 2005-10-19 | 2011-11-24 | 東京応化工業株式会社 | 新規な酸発生剤、化学増幅型ホトレジスト組成物、レジスト層積層体およびレジストパターン形成方法 |
TWI370525B (en) | 2008-04-25 | 2012-08-11 | Ind Tech Res Inst | Encapsulant composition and method for fabricating encapsulant material |
JP6708382B2 (ja) * | 2015-09-03 | 2020-06-10 | サンアプロ株式会社 | 硬化性組成物及びそれを用いた硬化体 |
CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
CN108440495A (zh) * | 2018-03-16 | 2018-08-24 | 吉安市东庆精细化工有限公司 | 一种光引发剂1-氯-4-丙氧基硫杂蒽酮的制备方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4161478A (en) * | 1974-05-02 | 1979-07-17 | General Electric Company | Photoinitiators |
US4694029A (en) * | 1985-04-09 | 1987-09-15 | Cook Paint And Varnish Company | Hybrid photocure system |
TW237466B (zh) * | 1992-07-21 | 1995-01-01 | Giba Gerigy Ag | |
JP3942202B2 (ja) * | 1994-12-15 | 2007-07-11 | 日本化薬株式会社 | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JPH107649A (ja) * | 1996-06-18 | 1998-01-13 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JPH10212286A (ja) * | 1997-01-30 | 1998-08-11 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JPH11335442A (ja) * | 1998-05-25 | 1999-12-07 | Nippon Kayaku Co Ltd | 光カチオン重合性エポキシ樹脂系固形組成物及び物品 |
CA2452566C (en) * | 2001-07-19 | 2011-08-23 | Lamberti Spa | Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
GB0204468D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel thioxanthone derivatives, and their use as cationic photoinitiators |
GB0204467D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
US7318991B2 (en) * | 2002-03-04 | 2008-01-15 | Wako Pure Chemical Industries, Ltd. | Heterocycle-bearing onium salts |
-
2004
- 2004-11-03 KR KR1020040088840A patent/KR101197539B1/ko active IP Right Grant
- 2004-11-04 EP EP04026159A patent/EP1538149B1/en active Active
- 2004-11-04 JP JP2004320965A patent/JP4855670B2/ja active Active
- 2004-11-04 CN CNB200410098187XA patent/CN100522957C/zh active Active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102754028A (zh) * | 2010-02-05 | 2012-10-24 | 佳能株式会社 | 感光性树脂组合物、结构体的生产方法和液体排出头 |
US8980968B2 (en) | 2010-02-05 | 2015-03-17 | Canon Kabushiki Kaisha | Photosensitive resin composition, method for producing structure, and liquid discharge head |
CN102754028B (zh) * | 2010-02-05 | 2015-06-03 | 佳能株式会社 | 感光性树脂组合物、结构体的生产方法和液体排出头 |
US9061499B2 (en) | 2010-02-05 | 2015-06-23 | Canon Kabushiki Kaisha | Negative photosensitive resin composition, pattern formation method, and liquid discharge head |
CN104334642A (zh) * | 2012-05-25 | 2015-02-04 | 汉高股份有限及两合公司 | 聚合物组合物 |
US9765218B2 (en) | 2012-05-25 | 2017-09-19 | Henkel Ag & Co. Kgaa | Polymer composition |
Also Published As
Publication number | Publication date |
---|---|
JP2005187799A (ja) | 2005-07-14 |
KR101197539B1 (ko) | 2012-11-12 |
CN100522957C (zh) | 2009-08-05 |
KR20050043648A (ko) | 2005-05-11 |
EP1538149A3 (en) | 2005-06-29 |
EP1538149A2 (en) | 2005-06-08 |
JP4855670B2 (ja) | 2012-01-18 |
EP1538149B1 (en) | 2010-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5547660B2 (ja) | スルホニウム塩光反応開始剤とその使用 | |
CN1708488A (zh) | 光引发剂的贮存稳定性的改善 | |
CN1157359C (zh) | 非挥发性苯基乙醛酸酯 | |
CN1066462C (zh) | 用作粘合剂和密封剂的不同臂不对称辐射形或星形的嵌段共聚物 | |
CN1177346A (zh) | 含有碳氟化合物阴离子的可用能量活化的盐 | |
CN1662559A (zh) | 聚合物光引发剂 | |
EP1177182B1 (en) | Novel photoinitiators and their applications | |
CN1637052A (zh) | 铳盐光敏引发剂及其用途 | |
CN1050143C (zh) | 对辐射固化高敏感的乙烯基芳烃嵌段共聚物和含该共聚物的组合物 | |
CN1066275A (zh) | 交联环氧官能聚二烯嵌段聚合物,其制备方法,粘合剂组合物及起始嵌段共聚物 | |
CN1308081A (zh) | 有机金属-酰基芳基膦 | |
CN1514845A (zh) | 具有复合结构的肟酯光引发剂 | |
CN1649905A (zh) | 可引入的光敏引发剂 | |
CN1434834A (zh) | 可光固化组合物及其制造方法,可光固化压敏粘合片及其制造方法和粘合方法 | |
CN1447844A (zh) | 采用表面活性的光致引发剂的涂料的制备方法 | |
CN102803205B (zh) | 碱和自由基产生剂、使用其的组合物及固化所述组合物的方法 | |
JPS63174945A (ja) | 硬化性組成物と該組成物を構成するスチリルオキシ化合物 | |
CN1926167A (zh) | 紫外线固化型组合物 | |
JP4125805B2 (ja) | 活性エネルギー線硬化型粉体塗料組成物 | |
JP2006008822A (ja) | 硬化型粘接着材料 | |
JP4581507B2 (ja) | 硬化型粘接着材料 | |
JP4645075B2 (ja) | 硬化型粘接着材料 | |
JP4481963B2 (ja) | 活性エネルギー線硬化型粉体塗料組成物 | |
JP2005126580A (ja) | 硬化型粘接着材料 | |
JP2006008824A (ja) | 硬化型粘接着材料 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN Free format text: FORMER OWNER: NATIONAL STARCH + CHEMICAL INVESTMENT HOLDING CORP Effective date: 20110425 |
|
C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee |
Owner name: HENKEL AG + CO. KGAA Free format text: FORMER NAME: HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN |
|
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: DELAWARE, THE USA TO: DUSSELDORF, GERMANY |
|
CP01 | Change in the name or title of a patent holder |
Address after: Dusseldorf Patentee after: HENKEL AG & Co.KGaA Address before: Dusseldorf Patentee before: HENKEL AG & Co.KGaA |
|
TR01 | Transfer of patent right |
Effective date of registration: 20110425 Address after: Dusseldorf Patentee after: HENKEL AG & Co.KGaA Address before: Delaware Patentee before: NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING Corp. |