CN1632548A - High molecular resistance type thin film humidity sensitive element with interpenetrating network structure and fabricating method thereof - Google Patents
High molecular resistance type thin film humidity sensitive element with interpenetrating network structure and fabricating method thereof Download PDFInfo
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- CN1632548A CN1632548A CN 200410010511 CN200410010511A CN1632548A CN 1632548 A CN1632548 A CN 1632548A CN 200410010511 CN200410010511 CN 200410010511 CN 200410010511 A CN200410010511 A CN 200410010511A CN 1632548 A CN1632548 A CN 1632548A
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- 238000000034 method Methods 0.000 title claims abstract description 21
- 239000010409 thin film Substances 0.000 title claims description 17
- 239000011521 glass Substances 0.000 claims abstract description 35
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 35
- 239000010931 gold Substances 0.000 claims abstract description 35
- 229910052737 gold Inorganic materials 0.000 claims abstract description 35
- 239000010408 film Substances 0.000 claims description 45
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 20
- 229920000642 polymer Polymers 0.000 claims description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 14
- 238000004132 cross linking Methods 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 13
- 239000001856 Ethyl cellulose Substances 0.000 claims description 12
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 claims description 12
- 229920001249 ethyl cellulose Polymers 0.000 claims description 12
- 235000019325 ethyl cellulose Nutrition 0.000 claims description 12
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 9
- BXXWFOGWXLJPPA-UHFFFAOYSA-N 2,3-dibromobutane Chemical compound CC(Br)C(C)Br BXXWFOGWXLJPPA-UHFFFAOYSA-N 0.000 claims description 7
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims description 7
- 230000032683 aging Effects 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000001259 photo etching Methods 0.000 claims description 7
- 238000007669 thermal treatment Methods 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 229920002521 macromolecule Polymers 0.000 abstract description 2
- 230000001681 protective effect Effects 0.000 abstract description 2
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- 125000005456 glyceride group Chemical group 0.000 abstract 1
- 239000013081 microcrystal Substances 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 description 13
- 238000003618 dip coating Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Abstract
This invention discloses a macromolecule resistance film wet-sensitive element with mutual network structure and its process method. The wet-sensitive element is characterized by the micro-crystal glass base plate surface with eight to sixteen pairs of gold electrode and the coated wet-sensitive film and protective film. The wet-sensitive film has crosslinked (4-vinyl pyridine) and crosslinked (methacrylic acid compressed glyceride) to form mutual network structure.
Description
Technical field
The present invention relates to a kind of polymer resistance type thin film humidity-sensitive element with high and preparation method thereof with inierpeneirating network structure.
Background technology
High molecule humidity sensor is to use the wider novel humidity sensor of a class at present, mainly contains capacitor type and resistor-type two big classes, is just obtaining increasingly extensive application at aspects such as storage, commercial production, process control, environmental monitoring, household electrical appliance, meteorologies.Macromolecule resistance type humidity sensor wherein, more with its good response characteristic, the hygrometric wide ranges is made simply, is easy to integratedly, and miniaturization is produced in batches, and lower-price characteristic becomes the trend of research and development.Owe to be difficult to measure low wet environment soon but it also has response speed, and response sensitivity is low under the high humidity environment, shortcomings such as anti-high humidity environment ability.
Summary of the invention
The purpose of this invention is to provide a kind of polymer resistance type thin film humidity-sensitive element with high and preparation method thereof with inierpeneirating network structure.
Polymer resistance type thin film humidity-sensitive element with high with inierpeneirating network structure is to be matrix with the microcrystalline glass; evaporation, photoetching have many to golden interdigital electrode on the microcrystalline glass surface; on interdigital gold electrode, be connected with lead-in wire; on microcrystalline glass and interdigital gold electrode surfaces, be coated with humidity-sensitive film; be coated with the ethyl cellulose diaphragm on the humidity-sensitive film, humidity-sensitive film has the inierpeneirating network structure that crosslinked poly-(4-vinylpridine) and crosslinked poly-(glycidyl methacrylate) forms.
The step of method for making of polymer resistance type thin film humidity-sensitive element with high with inierpeneirating network structure is as follows:
1) with dip coater the interdigital gold electrode of devitrified glass be impregnated in the wet-sensitive liquid, after lifting, taking out, under 80～120 ℃, carried out quaternary ammoniated while cross-linking reaction 1～15 hour, make humidity-sensitive film with inierpeneirating network structure;
2) the interdigital gold electrode of devitrified glass that will have humidity-sensitive film with dip coater impregnated in the ethanol solution of ethyl cellulose of concentration expressed in percentage by weight 0.1%～1%, after lifting, taking out, places 65～85 ℃ of thermal treatments 20～40 minutes, makes diaphragm;
3) will have the interdigital gold electrode of devitrified glass of humidity-sensitive film and diaphragm at 30～40 ℃; humidity is under 60～90%RH environment, 100～1000mv in addition, the alternating voltage of 100～1000Hz; aging 10～50 hours of energising makes polymer resistance type thin film humidity-sensitive element with high.
Advantage of the present invention is:
1) with the interdigital gold electrode of particular design devitrified glass: interdigital is 8～16 pairs; Interdigital width is 20～80 μ m, and interdigital gap is 40～80 μ m, and each interdigital length is 2～3mm; Electrode size is 6mm * 5mm * 0.5mm, and it is little to have a volume, low cost, advantage such as easy to use.The kind electrode structure reduces the humidity-sensitive element impedance owing to interdigital thin and close, and sensitivity improves, thereby can measure the humidity under the low wet environment, and sensing range is widened;
2) when the preparation humidity-sensitive film, by controlling two kinds of polymkeric substance, the appropriate ratio and the concentration of poly-(4-vinylpridine) and poly-(glycidyl methacrylate) and two kinds of crosslinking chemicals (dibromobutane and diethylenetriamine) make humidity-sensitive element have express moisture absorption and dehumidification response speed;
When 3) preparing humidity-sensitive film, adopt the technology of quaternary ammoniated while cross-linking reaction,, form humidity-sensitive film, make humidity-sensitive element have wide hygrometric scope, high sensitivity with inierpeneirating network structure by controlling the temperature and time of quaternary ammoniated cross-linking reaction; Element impedance is low, under low wet environment good response is arranged, and anti-high humidity environment ability is strong;
4) use ethyl cellulose as the diaphragm material, concentration, speed, time of immersion and heat treatment process parameter by control dip-coating solution, make the diaphragm that makes have suitable thickness, can protect the quick film of sense, improve anti-high humidity environment ability of element and long-time stability, can make diaphragm have permeability again, can allow hydrone freely passes through in the atmosphere, the holding element response rapidly and the good characteristics of low humidity response characteristic;
5) under 30～40 ℃ and 60～90%RH humidity environment, element is passed to certain alternating voltage, carry out burin-in process, can make element reach steady state (SS) within a short period of time, have high stability and anti-high humidity environment ability;
6) adopt the humidity-sensitive material of the present invention's design and the humidity-sensitive element of method preparation, the humidity sensing characteristic excellence has very fast response speed especially, the low humidity response characteristic that good anti-high humidity environment ability is become reconciled, and simple and easy to do, the element high conformity, cost is low, is suitable for producing in batches.
Description of drawings
Fig. 1 is the structural representation of humidity-sensitive element of the present invention;
Fig. 2 is the typical response characteristic figure of humidity-sensitive element of the present invention;
Fig. 3 is the typical humidity hysteresis performance plot of humidity-sensitive element of the present invention;
Fig. 4 is humidity-sensitive element typical response time response figure of the present invention.
Embodiment
The present invention selects the interdigital gold electrode of the devitrified glass with particular design for use; Select for use poly-(4-vinylpridine), poly-(glycidyl methacrylate) crosslinked with dibromobutane, diethylenetriamine respectively, form the material of inierpeneirating network structure, adopt dip-coating, crosslinked technology of quaternary ammoniated while to prepare humidity-sensitive film as humidity-sensitive film; Select for use ethyl cellulose as the diaphragm material, adopt dipping process coating protective film on humidity-sensitive film.By the ratio of each component of optimization humidity-sensitive film, and the process conditions of quaternary ammoniated while cross-linking reaction; Optimize the preparation process condition of diaphragm, make the polymer resistance type thin film humidity-sensitive element with high of preparation have excellent humidity sensing characteristic.(3～97%RH), highly sensitive, not only anti-high humidity environment ability is strong, and still has good humidity sensing characteristic in the low humidity scope for its hygrometric wide ranges; The response speed that is exceedingly fast and little temperature coefficient are arranged.
Polymer resistance type thin film humidity-sensitive element with high with inierpeneirating network structure is to be matrix 1 with the microcrystalline glass; evaporation, photoetching have many to golden interdigital electrode 2 on the microcrystalline glass surface; on interdigital gold electrode, be connected with lead-in wire 5; on microcrystalline glass and interdigital gold electrode surfaces, be coated with humidity-sensitive film 3; be coated with ethyl cellulose diaphragm 4 on the humidity-sensitive film, humidity-sensitive film 3 has the inierpeneirating network structure that crosslinked poly-(4-vinylpridine) and crosslinked poly-(glycidyl methacrylate) forms.
Evaporation, photoetching have 8～16 pairs of interdigital gold electrodes on the microcrystalline glass surface, and the interdigital width of interdigital gold electrode is 20～80 μ m, and interdigital gap is 40～80 μ m, and each interdigital length is 2～3mm, and electrode size is 6mm * 5mm * 0.5mm.Humidity-sensitive film has in the inierpeneirating network structure of crosslinked poly-(4-vinylpridine) and crosslinked poly-(glycidyl methacrylate) formation, and crosslinked poly-(4-vinylpridine) and crosslinked poly-(glycidyl methacrylate) weight ratio are 1: 2～4.
The preparation method of humidity-sensitive film is as follows: adopt dip coater that the interdigital gold electrode of devitrified glass be impregnated in the wet-sensitive liquid, after lifting, taking out, carried out quaternary ammoniated while cross-linking reaction 1～15 hour at 80～120 ℃, make the humidity-sensitive film with inierpeneirating network structure.
Each component of wet-sensitive liquid is by weight percentage: polymkeric substance is 2～5%, dibromobutane is 1～25%, diethylenetriamine is 0.5～3%, dimethyl sulfoxide (DMSO) is 70～96%, wherein in the polymkeric substance, gather (4-vinylpridine): poly-(glycidyl methacrylate)=1: 2～4.
The diaphragm preparation method is as follows: the interdigital gold electrode of devitrified glass that adopts dip coater will have humidity-sensitive film impregnated in the ethyl cellulose ethanol solution of concentration expressed in percentage by weight 0.5%～1%; after lifting, taking out; place 65～85 ℃ of thermal treatments 20～40 minutes, make diaphragm.
Ageing method is as follows: the interdigital gold electrode of the devitrified glass that is coated with humidity-sensitive film and diaphragm that will prepare places climatic chamber; at 30～40 ℃; humidity is under 60～90%RH environment; 100～1000mv in addition; the alternating voltage of 100～1000Hz; aging 10～50 hours of energising makes polymer resistance type thin film humidity-sensitive element with high.
Embodiment 1:
1) coats and fully feel wet film and quaternary ammoniated cross-linking reaction
Adopt dip coater that the interdigital gold electrode of devitrified glass is immersed in the wet-sensitive liquid, after lifting, taking out, under 80 ℃, carried out quaternary ammoniated while cross-linking reaction 15 hours.Each component of wet-sensitive liquid is by weight percentage: polymkeric substance is 2.5% (poly-(4-vinylpridine): gather (glycidyl methacrylate)=4: 1); Dibromobutane is 2%; Diethylenetriamine is 0.5%; Dimethyl sulfoxide (DMSO) is 95%.
2) dip-coating prepares diaphragm and aftertreatment
The interdigital gold electrode of devitrified glass that adopts dip coater will have humidity-sensitive film impregnated in in the ethyl cellulose ethanol solution (concentration expressed in percentage by weight 0.1%), lifts, and takes out 70 ℃ of following thermal treatment 40 minutes;
3) burin-in process
With having the humidity-sensitive element of humidity-sensitive film and diaphragm on the interdigital gold electrode of devitrified glass, place climatic chamber, at 30 ℃, under the 90%RH environment, 800mv in addition, the alternating voltage of 100Hz, aging 20 hours of energising.
Embodiment 2:
1) dip-coating prepares humidity-sensitive film and quaternary ammoniated cross-linking reaction
Adopt dip coater that the interdigital gold electrode of devitrified glass is immersed in the wet-sensitive liquid, after lifting, taking out, under 90 ℃, carried out quaternary ammoniated while cross-linking reaction 5 hours.Each component of wet-sensitive liquid is by weight percentage: polymkeric substance is 5% (poly-(4-vinylpridine): gather (glycidyl methacrylate)=1: 1); Dibromobutane is 23%; Diethylenetriamine is 2%; Dimethyl sulfoxide (DMSO) is 70%.
2) dip-coating prepares diaphragm and aftertreatment
The interdigital gold electrode of devitrified glass that adopts dip coater will have humidity-sensitive film impregnated in in the ethyl cellulose ethanol solution (concentration expressed in percentage by weight 1%), lifts, and takes out 85 ℃ of following thermal treatment 20 minutes;
3) burin-in process
With having the humidity-sensitive element of humidity-sensitive film and diaphragm on the interdigital gold electrode of devitrified glass, place climatic chamber, at 40 ℃, under the 60%RH environment, 200mv in addition, the alternating voltage of 1000Hz, aging 10 hours of energising.
Embodiment 3
1) dip-coating prepares humidity-sensitive film and quaternary ammoniated cross-linking reaction
Adopt dip coater that the interdigital gold electrode of devitrified glass is immersed in the wet-sensitive liquid, after lifting, taking out, under 110 ℃, carried out quaternary ammoniated while cross-linking reaction 2 hours.Each component of wet-sensitive liquid is by weight percentage: polymkeric substance is 3% (poly-(4-vinylpridine): gather (glycidyl methacrylate)=1: 2); Dibromobutane is 7%; Diethylenetriamine is 3%; Dimethyl sulfoxide (DMSO) is 87%.
2) dip-coating prepares diaphragm and aftertreatment
The interdigital gold electrode of devitrified glass that adopts dip coater will have humidity-sensitive film impregnated in in the ethyl cellulose ethanol solution (concentration expressed in percentage by weight 0.5%), lifts, and takes out 75 ℃ of following thermal treatment 30 minutes;
3) burin-in process
With having the humidity-sensitive element of humidity-sensitive film and diaphragm on the interdigital gold electrode of devitrified glass, place climatic chamber, at 35 ℃, under the 80%RH environment, 400mv in addition, the alternating voltage of 1000Hz, aging 48 hours of energising.
Electrode structure studies show that in a large number to the wet quick response characteristic influence of element, the employing devitrified glass is a substrate, evaporation, photoetching have interdigital gold electrode closeer and that logarithm is more on it, this helps reducing the impedance of humidity-sensitive element, improve the sensitivity of element, make element can detect humidity under the low wet environment, enlarge sensing range.And this electrode size is little, and cost is low.
During the preparation humidity-sensitive film, crosslinked poly-(4-vinylpridine) forms inierpeneirating network structure with crosslinked poly-(glycidyl methacrylate) with an appropriate ratio, this is the response speed that humidity-sensitive element is had be exceedingly fast, and the ability of anti-high humidity environment and the necessary condition of good low wet environment humidity sensing characteristic are arranged again.During the preparation humidity-sensitive film, the control of quaternary ammoniated cross-linking reaction temperature and time is the adequate condition that ensures that inierpeneirating network structure forms.
Adopt the ethyl cellulose ethanol solution to prepare diaphragm; need control by solution concentration, dip-coating speed, dip time and heat treatment process parameter; make film have suitable thickness; can protect humidity-sensitive film; improve anti-high humidity environment ability of element and long-time stability; can make diaphragm have permeability again, can allow hydrone can freely pass through in the atmosphere, not influence the fast response characteristic of humidity-sensitive element.
Improve anti-high humidity environment ability of element and long-time stability, must carry out burin-in process making element.Under the super-humid conditions of heating, to element energising certain hour, can make element reach steady state (SS) within a short period of time, its wet quick response characteristic no longer changes, thereby has high stability and anti-high humidity environment ability, has improved the performance of element greatly.
Adopt dipping process to prepare element, simple and easy to do, and also preparation element high conformity, the yield rate height.
Adopt its main advanced feature of advanced polymer resistance type thin film humidity-sensitive element with high of designed humidity-sensitive material of the present invention and method preparation to be:
1) hygrometric wide ranges (3%RH～97%RH), have the ability of anti-high humidity environment, energy measurement low humidity ambient humidity simultaneously;
2) response time＜10 second;
3) humidity hysteresis＜1.5%RH.
4) temperature coefficient＜0.3%RH/ ℃
Claims (6)
1. polymer resistance type thin film humidity-sensitive element with high with inierpeneirating network structure; it is characterized in that with the microcrystalline glass being matrix (1); evaporation, photoetching have many to golden interdigital electrode (2) on the microcrystalline glass surface; on interdigital gold electrode, be connected with lead-in wire (5); on microcrystalline glass and interdigital gold electrode surfaces, be coated with humidity-sensitive film (3); be coated with ethyl cellulose diaphragm (4) on the humidity-sensitive film, humidity-sensitive film (3) has the inierpeneirating network structure that crosslinked poly-(4-vinylpridine) and crosslinked poly-(glycidyl methacrylate) forms.
2. a kind of polymer resistor type film humidity sensing film element according to claim 1 with inierpeneirating network structure, it is characterized in that: evaporation, photoetching have 8～16 pairs of interdigital gold electrodes on the described microcrystalline glass surface, the interdigital width of interdigital gold electrode is 20～80 μ m, interdigital gap is 40～80 μ m, each interdigital length is 2～3mm, and electrode size is 6mm * 5mm * 0.5mm.
3. a kind of polymer resistance type thin film humidity-sensitive element with high according to claim 1 with inierpeneirating network structure, it is characterized in that: described humidity-sensitive film has in the inierpeneirating network structure of crosslinked poly-(4-vinylpridine) and crosslinked poly-(glycidyl methacrylate) formation, and crosslinked poly-(4-vinylpridine) and crosslinked poly-(glycidyl methacrylate) weight ratio are 1: 2～4.
4. method for making with polymer resistance type thin film humidity-sensitive element with high of inierpeneirating network structure, it is characterized in that: the step of method for making is as follows:
1) with dip coater the interdigital gold electrode of devitrified glass be impregnated in the wet-sensitive liquid, after lifting, taking out, under 80～120 ℃, carried out quaternary ammoniated while cross-linking reaction 1～15 hour, make humidity-sensitive film with inierpeneirating network structure;
2) the interdigital gold electrode of devitrified glass that will have humidity-sensitive film with dip coater impregnated in the ethanol solution of ethyl cellulose of concentration expressed in percentage by weight 0.1%～1%, after lifting, taking out, places 65～85 ℃ of thermal treatments 20～40 minutes, makes diaphragm;
3) will have the interdigital gold electrode of devitrified glass of humidity-sensitive film and diaphragm at 30～40 ℃; humidity is under 60～90%RH environment, 100～1000mv in addition, the alternating voltage of 100～1000Hz; aging 10～50 hours of energising makes polymer resistance type thin film humidity-sensitive element with high.
5. according to a kind of method for making described in the claim 4 with polymer resistance type thin film humidity-sensitive element with high of inierpeneirating network structure, it is characterized in that: each component of described wet-sensitive liquid is by weight percentage: polymkeric substance is 2～5%, dibromobutane is 1～25%, diethylenetriamine is 0.5～3%, dimethyl sulfoxide (DMSO) is 70～96%, wherein in the polymkeric substance, gather (4-vinylpridine): poly-(glycidyl methacrylate)=1: 2～4.
6. a kind of method for making according to claim 4 with polymer resistance type thin film humidity-sensitive element with high of inierpeneirating network structure, it is characterized in that: the interdigital gold electrode of described devitrified glass is to be matrix with the microcrystalline glass, evaporation, photoetching thereon has 8～16 pairs of interdigital gold electrodes, the interdigital width of interdigital gold electrode is 20 μ m～80 μ m, interdigital gap is 40 μ m～80 μ m, each interdigital length is 2～3mm, and electrode size is 6mm * 5mm * 0.5mm.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104502420A (en) * | 2014-10-01 | 2015-04-08 | 浙江大学 | Humidity-sensitive composite membrane, preparation method of humidity-sensitive composite membrane and humidity sensor |
| CN106093141A (en) * | 2016-07-29 | 2016-11-09 | 广州奥松电子有限公司 | A kind of humistor based on 5730 encapsulation |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1009863B (en) * | 1988-04-28 | 1990-10-03 | 中国建筑科学研究院空气调节研究所 | Dewing sensor |
| CN2085963U (en) * | 1991-01-31 | 1991-10-02 | 中国建筑科学研究院空调研究所 | Film type dewing sensor |
| CN1034769C (en) * | 1991-11-19 | 1997-04-30 | 电子科技大学 | Non-linear moisture sensor |
| JP3557245B2 (en) * | 1994-05-24 | 2004-08-25 | 松下電器産業株式会社 | Humidity-sensitive element and method of manufacturing the same |
| TW507073B (en) * | 2000-03-31 | 2002-10-21 | Tdk Corp | Humidity sensor and method for making |
| CN1182386C (en) * | 2002-05-24 | 2004-12-29 | 杨慕杰 | Compound polymer resistor type film humidity-sensitive element and its making process |
| CN1215578C (en) * | 2002-12-19 | 2005-08-17 | 李扬 | Orgaic polymer-inorganic nano composite resistance type thin film humidity sensitive element and its manufacturing method |
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2004
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104502420A (en) * | 2014-10-01 | 2015-04-08 | 浙江大学 | Humidity-sensitive composite membrane, preparation method of humidity-sensitive composite membrane and humidity sensor |
| CN106093141A (en) * | 2016-07-29 | 2016-11-09 | 广州奥松电子有限公司 | A kind of humistor based on 5730 encapsulation |
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| CN1300575C (en) | 2007-02-14 |
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