CN1584400A - Purifier for harmful gases - Google Patents
Purifier for harmful gases Download PDFInfo
- Publication number
- CN1584400A CN1584400A CNA2004100582070A CN200410058207A CN1584400A CN 1584400 A CN1584400 A CN 1584400A CN A2004100582070 A CNA2004100582070 A CN A2004100582070A CN 200410058207 A CN200410058207 A CN 200410058207A CN 1584400 A CN1584400 A CN 1584400A
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- gas
- purifier
- thermal decomposition
- pernicious gas
- decomposition chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/005—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by heat treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
- F23G5/00—Incineration of waste; Incinerator constructions; Details, accessories or control therefor
- F23G5/02—Incineration of waste; Incinerator constructions; Details, accessories or control therefor with pretreatment
- F23G5/027—Incineration of waste; Incinerator constructions; Details, accessories or control therefor with pretreatment pyrolising or gasifying stage
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
- F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
- F23G7/06—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/10—Oxidants
- B01D2251/102—Oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- Thermal Sciences (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Incineration Of Waste (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention relates to a harmful gas purifier, and provides a cleaning facility capable of stably removing a harmful gas discharged from a semiconductor manufacturing process in safety for a long time by inhibiting the lowering of a decomposition ratio of a treated harmful gas and the accumulation of powdered matter on a wall face of a decomposition chamber without using a large-scaled or complicated constitution. In this cleaning facility for removing the harmful gas discharged from the semiconductor manufacturing process by thermally decomposing the harmful gas by the combustion waste gas or flame obtained by burning the fuel, a side face of the thermal decomposition chamber is a wall having air permeability and heating insulating property, and the oxygen-containing gas is introduced into the thermal decomposition chamber through the wall.
Description
Technical field
The present invention relates to a kind of purifier, this purifier is used to remove the pernicious gas with oxious component of discharging from semiconductor fabrication processes.More particularly, the present invention relates to a kind of purifier, this purifier is used for having oxygen, make the pernicious gas with oxious component of discharging under the condition of high temperature from semiconductor fabrication processes, the burning and gas-exhausting or the flame that obtain with combustion fuel contact, make its thermal decomposition, thus, with its material that becomes innocuous substance or can carry out harmless treatment easily.
Background technology
Follow the development of semi-conductor industry in recent years, in semiconductor fabrication processes, adopt a variety of gas.But these gases mostly are harmful material for human body and environment, must row before outside the factory it be purified.Make these gas combustions, thus, the method easily that the combustion-type purification method of resolution process adopts for composition, the rerum natura that can not rely on exhaust is particularly in the occasion of high concentration, big flow, comparing with dry cleaning method, wet purification method, is effective.
The pernicious gas of handling by the combustion-type purification method is in the combustion chamber, and burning gases, air or oxygen with propane, LPG, LNG etc. as required, mix, burn with inert gas, are treated to harmless oxide or can realize innoxious material easily.The common combustion-type purifier of Shi Yonging is used for and will be comprised that the oxygen-containing gas of handling pernicious gas object, that have oxious component, burning gases, air etc. imports the various pipes of combustion chamber, is used for the outlet that the gas after burning is discharged from the combustion chamber is constituted by the combustion chamber that is used for pernicious gas is burnt in the past.In addition, have following device, in this device, be provided with the guarantor's flame device that flame is remained on the coniform or shape similar that stable status uses with it.
In the combustion-type purifier of such structure, to the pernicious gas processing of burning, this gas is discharged by the outlet of gas, is discharged in the atmosphere or with it and is sent to next processor.But, handling object gas such as the occasion that is the such gas of silane, hydrogen phosphide, arsenic hydride, diborane, by burning, produce the immobilized particles shape oxide of silicon, phosphorus, arsenic, boron respectively, most of through the step behind the inside, combustion chamber, obtain handling, but a part is piled up in inside, combustion chamber as powder, produce following such rough sledding, the generation problem.
That is, above-mentioned such powder is followed harmful burning of gas to begin and is taken place, and is piled up in the inwall in the combustion chamber, follows the passing of burning time, and its bond area, thickness increase.Consequently, hinder even mixing of pernicious gas and burning gases, air, oxygen etc., obstruction completing combustion, not only produce the reduction of ignition temperature, the reduction of the resolution ratio of the pernicious gas of processing object, and, have the danger of catching fire in the more occasion of the accumulating amount of powder.
Thus, people propose that following device is arranged, and wherein, in the combustion chamber, accompanying rotation are set, and reciprocating along the vertical direction scraping blade and fixed projection can be wiped the powder of piling up off (No. 193916/1999 open communique of Japanese application for a patent for invention); Or, proposition has following purification method and purifier (No. 211036/1999 open communique of Japanese application for a patent for invention) etc., wherein, and under condition near the blending ingredients of theoretical air requirement, make fuel combustion, possess in the gas at the heat energy that obtains by burning, import semiconductor and make exhaust, it is carried out thermal decomposition, then, by another part, the excess supply air is finished oxidation reaction.
Patent documentation 1: No. 193916/1999 open communique of Japanese application for a patent for invention
Patent documentation 2: No. 211036/1999 open communique of Japanese application for a patent for invention
Summary of the invention
But, in the purifier of in No. 193916/1999 open communique of Japanese application for a patent for invention, describing, have following rough sledding, that is, necessarily require to adopt the rotation that is used to follow scraper plate, make its reciprocating drive division along the rotating shaft direction, device is complicated, and the valency height is higher.In addition, the accumulation situation of the fixedly attachment of the occasion of employing scraper plate and fixed projection is compared with the occasion that does not adopt them, and is extremely good, but, can not avoid regular decomposition cleaning, install and be labyrinth, thus, has the maintenance cost rough sledding of more time.
In No. 211036/1999 open described purifier of communique of Japanese application for a patent for invention, owing to when the pernicious gas after the semiconductor fabrication processes is carried out thermal decomposition, do not adopt flame, so danger of not catching fire, in addition this moment, the oxygen amount is controlled, suppressed the generation of the oxide of solid granular, thus, can reduce the powder on the wall that is piled up in the decomposition chamber, still, have at next step, must adopt oxidation furnace, install rough sledding into large-scale and complicated structure.
So, the purifier of the pernicious gas that the problem that the present invention will solve is to provide following, it solves the shortcoming of these prior arts, do not adopt large-scale or complicated structure, can suppress to handle the reduction of the resolution ratio of object pernicious gas, and the accumulation of the powder of decomposition chamber wall, can realize with security and stability purifying for a long time.
Result as the further investigation that can solve these problems, the inventor finds, at burning and gas-exhausting that obtains by combustion fuel or flame, the pernicious gas of discharging from semiconductor fabrication processes is carried out thermal decomposition (or burning), it is carried out in the purifier of purified treatment, with the side of thermal decomposition chamber as wall with aeration and thermal insulation, by it, oxygen-containing gas is imported thermal decomposition chamber, thus, do not adopt large-scale or complicated structure, the pernicious gas of resolution process object effectively easily, and can suppress the accumulation of the powder of decomposition chamber wall, in addition, can completely stably realize for a long time purifying, therefore, realize the purifier of pernicious gas of the present invention.
Promptly, the present invention relates to a kind of purifier of pernicious gas, burning and gas-exhausting or flame that it obtains by combustion fuel carry out thermal decomposition to the pernicious gas of discharging from semiconductor fabrication processes, it is carried out purified treatment, it is characterized in that the thermal decomposition chamber that it comprises pernicious gas at least; Nozzle, this nozzle imports this thermal decomposition chamber with burning and gas-exhausting or flame; Pernicious gas is imported the nozzle of this thermal decomposition chamber; By the thermal wall of aeration, with oxygen containing gas from the side, import the mechanism of this thermal decomposition chamber; Outlet, this outlet gas row after with thermal decomposition is to the outside.
The present invention is suitable for following purifier, wherein, the burning and gas-exhausting or the flame that obtain by combustion fuel, the pernicious gas of discharging from semiconductor fabrication processes is carried out thermal decomposition, it is carried out purified treatment, but particularly reacting, producing the occasion that the gas of the oxious component of powder is handled, having the effect of aspect of the accumulation of the powder that can suppress the decomposition chamber wall comprising with oxygen.
As the pernicious gas composition that can handle by purifier of the present invention, can exemplify the halohydrocarbon of the chloro gas, perfluocarbon, hydrofluorocarbons etc. of the sour gas, ammonia, single methylamine, dimethylamine, trimethylamine, hydrazine etc. of the oxide gas, boron trifluoride, three boroaluminate useds, ocratation, silicon tetrachloride, titanium tetrachloride, aluminium chloride, tetrafluoride germanium, tungsten hexafluoride etc. of arsenic hydride, hydrogen phosphide, silane, disilane, dichlorosilane, diborane, hydrogen selenide, germne etc.The concentration of these compositions is usually 10～100, in the scope of 000ppm.
In addition, fuel gas can adopt propane gas, natural-gas etc.As required, these gases use with the inert gas of nitrogen etc.
As shown in Figure 1, the purifier of pernicious gas of the present invention comprises the thermal decomposition chamber 1 of pernicious gas at least; Nozzle 2, this nozzle 2 imports this thermal decomposition chamber with burning and gas-exhausting or flame; Pernicious gas is imported the nozzle 3 of this thermal decomposition chamber; The introducing port 4 of oxygen-containing gas; The thermal wall 5 of aeration; To the outside, this purifier supplies to the thermal wall 5 of the oxygen-containing gas of device inside by aeration according to from introducing port 4 with the row of the gas after the thermal decomposition for outlet 17, this outlet 17, and from the side, the mode that imports thermal decomposition chamber constitutes.In the present invention, thermal wall by aeration, with oxygen containing gas from the side, the mechanism that imports this thermal decomposition chamber is made of the stream of oxygen containing gas introduction port and oxygen containing gas, and the stream of this oxygen containing gas is arranged in the scope of periphery integral body of thermal wall of aeration.
In the purifier of pernicious gas of the present invention, be provided with the thermal wall 5 of aeration, this thermal wall is cylinder, square tube, the polygon tube or with they similar tubulars.In the present invention, in thermal decomposition chamber, pernicious gas contacts with the burning and gas-exhausting or the flame of high-temperature, and contacts with the oxygen-containing gas of the air of supplying with from the thermal wall 5 of thermal decomposition chamber side etc., and the oxious component that comprises in the pernicious gas is carried out thermal decomposition.At this moment, follow the kind of oxious component, produce powder, still, follow the such oxygen containing gas flow shown in the arrow among Fig. 1, can suppress the accumulation of powder at the thermal decomposition chamber wall.
If the composition material of thermal wall 5 has the corrosion resistance of oxious component, the hear resistance and the thermal insulation of opposing heat decomposition temperature then do not limit especially, still, as preferred composition material, can enumerate pottery.In this pottery, best from the aspect of corrosion resistance, hear resistance and thermal insulation, adopt aluminium oxide, silica, titanium dioxide.In addition,, must have following structures, in this structure, the oxygen-containing gas of the necessary flow of thermal decomposition of oxious component from flying the wall integral body of powder in fact, be supplied to thermal decomposition chamber 1 steadily in the long term as the form of thermal wall 5.
As the form on the surface of thermal wall 5, such as, such structure shown in Figure 2 can be enumerated.Fig. 2 (a), Fig. 2 (b) amplifies section plan for the part of the wall of pottery with pin hole, and its aperture (diameter) in the scope of 0.01～3.0mm, is preferably in the scope of 0.02～1.0mm usually.In addition, hole 18 is not limited to circle, and the hole of such occasion is of a size of the size that is equivalent to aforesaid aperture.The arrangement in hole also can adopt the edge in length and breadth to configuration regularly or the arrangement of configuration at random.Fig. 2 (c) amplifies section plan for the part of the wall in gap 19 with wire.Its gap in the scope of 0.005～2.0mm, is preferably in the scope of 0.01～1.0mm usually.Fig. 2 (d) amplifies section plan for the part of the wall in gap 20 with grille shape, and its gap in the scope of 0.01～3.0mm, is preferably in the scope of 0.02～1.0mm usually as the length that is scaled one side of foursquare occasion.In addition, the configuration of surface of thermal wall 5 is not limited to this, such as, in addition, can enumerate form by the stacked laminated body of the stacked laminated body of the porous ceramic with micropore, a plurality of fibrous pottery or a plurality of graininess pottery etc.
In addition, in the hole of thermal wall, the gap has the oxygen containing gas stream biasing of thermal decomposition chamber greater than the occasion of aforesaid scope, the danger of part that the flow of generation gas is more and less part, and powder is piled up in the less danger of flow of gas.In addition, in the occasion less than aforesaid scope, have in the short period, hole, gap are by the danger of sealings such as efflorescence thing.
In addition, the thickness of thermal wall can not be specified according to the size of thermal decomposition chamber, the decomposition condition of pernicious gas, the composition material of thermal wall etc. without exception, but in the occasion that adopts pottery, usually, this thickness is preferably in the scope of 5～30mm in the scope of 2～50mm.
In the purifier of pernicious gas of the present invention, usually,, in the periphery entire scope of the thermal wall of aeration, the stream 6 of oxygen containing gas is set foregoing.The width of the stream of this oxygen containing gas in the scope of 5～200mm, is preferably in the scope of 10～100mm usually.When pernicious gas was handled, the temperature of thermal decomposition chamber was at 500～1200 ℃ high temperature, and by adopting such scheme, the heat diffusion that can prevent thermal decomposition chamber is to outside situation.In addition, the outer wall of the stream of oxygen containing gas is corresponding with the shape of thermal wall 5, be generally be cylinder, square tube, polygon tube or with they similar tubulars.
In the purifier of pernicious gas of the present invention, according to before thermal decomposition chamber, fuel mixes with oxygen containing gas, realizes that the mode of burning is set.When fuel combustion, the front end of flame 7 both can enter thermal decomposition chamber, also can not enter thermal decomposition chamber.In addition, as shown in Figure 1, the nozzle 3 that pernicious gas is imported thermal decomposition chamber is arranged at the outer circumferential side that burning and gas-exhausting or flame 7 is imported the nozzle 2 of thermal decomposition chamber usually.By adopting such scheme, by burning and gas-exhausting, the occasion to pernicious gas carries out thermal decomposition when burning and gas-exhausting can be remained on high-temperature, supplies to thermal decomposition chamber with it.The temperature of the burning and gas-exhausting when in addition, importing thermal decomposition chamber is usually in 1000～1500 ℃ scope.In addition, the gas pressure of thermal decomposition chamber is not subjected to special restriction, is generally normal pressure, still, can depress in the such decompression of 10Kpa (absolute pressure) or such the adding of 0.5MPa (absolute pressure) yet and handle.
To carry out the gas after the thermal decomposition process is discharged in the atmosphere or delivers to following treatment process, but, being sent to the such occasion of next treatment step, in the purifier of pernicious gas of the present invention, also can be provided for implementing the equipment of such treatment step simultaneously.
The tank 12 of Fig. 1 and the equipment of scraper plate are used for harmful processing of handling at the purifier by pernicious gas of the present invention, the removal of the powder that comprises in the gas after handling, and the removal of the new oxious component (can realize innoxious composition easily) that produces, in the present invention, their optional equipment, but these equipment preferably are set.That is, best, in the discharge side of thermal decomposition chamber, be provided with the removal portion of powder and/or the removal portion of sour gas.
Such as, by the purifier of pernicious gas of the present invention, the occasion that the hydride of arsenic hydride, hydrogen phosphide, silane, diborane etc. is handled by burning, produces the solid granular oxide of arsenic, phosphorus, silicon, boron etc.In addition, to boron trifluoride, boron chloride, ocratation, silicon tetrachloride, C
2F
6Deng the occasion handled of halide, newly produce the sour gas (can realize innoxious composition easily) of hydrogen chloride, hydrogen fluoride etc.In the purifier of Fig. 1, the watering that powder can be by scraper plate 9, and capturing of porous plate 14 and removing.In addition, hydrogen chloride, hydrogen fluoride etc. can mainly be removed by packing material 15.In addition, by fog-proof device 16, also simultaneously with moisture removal.In addition, in Fig. 1, label 8 expression cooling tubes, label 10 expression flowmeters, label 11 expression pumps, label 13 expression water pipes, label 17 expressions are discharged to outside outlet with the gas after the thermal decomposition.
The purifier of pernicious gas of the present invention relates to following purifier, wherein, it is under the condition of aerobic, high temperature, the burning and gas-exhausting or the flame that obtain with combustion fuel from the pernicious gas of semiconductor fabrication processes discharge are contacted, it is carried out thermal decomposition and purified treatment, side according to thermal decomposition chamber is the wall with aeration and thermal insulation, and by it, the mode that oxygen containing gas is imported thermal decomposition chamber constitutes.By such scheme, can prevent the thermal diffusion of relatively hot decomposition chamber, by oxygen containing gas stream, powder is difficult to be piled up on the decomposition chamber wall.So the purifier of pernicious gas of the present invention is the device of small-sized, simple structure, can be effectively resolution process object pernicious gas easily, can suppress the accumulation of the powder of decomposition chamber wall, in addition, can realize the purified treatment of safety and stability chronically.In addition, can reduce the spended time of maintenance significantly.
Description of drawings
Fig. 1 is the longitudinal sectional view of the example of the purifier of expression pernicious gas of the present invention;
Fig. 2 (a)～Fig. 2 (d) is the pie graph of the example on the surface of the thermal wall of the aeration of expression purifier of the present invention.
The specific embodiment
Below by embodiment, the present invention is described more specifically, still, the invention is not restricted to these embodiment.
The 1st embodiment
(making of purifier)
Make shown in Figure 1 like that, the height that outer wall is made by stainless steel (SUS316) is the purifier of 2000mm.As the thermal wall of the side of thermal decomposition chamber, adopt the cylinder of the such aluminum shown in Fig. 2 (b) with small porous.The diameter of this thermal wall is 300mm, and length is 600mm, and thickness is 25mm, has to be equivalent to the small porous of diameter in the scope of 10～100 μ m.In addition, it is 480mm that the outer wall in the outside adopts diameter, and thickness is the cylinder of the stainless steel of 3mm.In addition, the internal diameter that burning and gas-exhausting is imported the nozzle of thermal decomposition chamber is 32mm, and the internal diameter that pernicious gas is imported the nozzle of thermal decomposition chamber is 44mm, and length is 200mm.
In the bottom of purifier, it is 1000mm that longitudinal size is set, and lateral dimension is 600mm, highly is the tank of 500mm, at the right part of purifier, be provided with porous plate, be the packing material of main material with acrylic resin, and the scrubber with fog-proof device.In addition, connect supply nozzle, flowmeter, pump etc., finally form purifier.
(evaluation of purifier)
Be injected in the tank at Jiang Shui, after the degree of depth is 350mm, make runnings such as pump, from supply nozzle, injection water.In addition, propane (flow is 30L/min) will be mixed with air (flow is 715L/min), make its burning and the burning and gas-exhausting that obtains from nozzle, import thermal decomposition chamber, and according to the flow of 200L/min, from the side, by thermal wall, air is imported thermal decomposition chamber.Then, the nitrogen (flow is 490L/min) that will comprise the silane (flow is 10L/min) as pernicious gas imports thermal decomposition chamber from nozzle, carries out thermal decomposition process.
The thermal decomposition process of silane was carried out 120 hours, for during this period, confirmed the variation of the fired state of silane, by being arranged at the temperature sensor in the decomposition chamber, measure the decomposition chamber temperature inside, to processings of taking a sample of the part of the gas of discharging, the concentration of mensuration silane from outlet.In addition, in the mensuration of the concentration of silane, the TG-4000XA (being limited to 1.5ppm under detecting) that adopts バ イ オ ニ Network ス (strain) society to produce.Its result provides at table 1.(ND in the table 1 represents the occasion that can't detect.) the situation of solid adhesion after experiment finishes is on the wall of combustion chamber, piles up some degree.In addition, according to the measurement result of chamber temperature, and the measurement result of the silane concentration of combustor exit and confirm that silane fully burns.
Comparative example 1
Making at the purifier of embodiment 1, (diameter is 300mm except the thermal wall of the side of thermal decomposition chamber adopts the cylinder of the aluminum of non-aeration, length is 500mm, thickness is 25mm), can be from the space of the top 100mm of thermal wall, oxygen-containing gas is imported beyond the scheme of thermal decomposition chamber,, make purifier according to the mode identical with embodiment 1.
Adopt this purifier, according to the mode identical with embodiment 1, silane is decomposed, the result of its evaluation provides in table 1.The situation of the solid adhesion after experiment finishes is the state of piling up in large quantities on the wall of combustion chamber.In addition, confirm that follow the passing of time, resolution ratio reduces according to the measurement result of the silane concentration of combustor exit.
Table 1
| Elapsed time (h) | Embodiment 1 | Comparative example 1 | ||
| Temperature (℃) | Silane concentration (ppm) | Temperature (℃) | Silane concentration (ppm) | |
| ????0 | ????812 | ????ND | ????813 | ????ND |
| ????10 | ????803 | ????ND | ????806 | ????ND |
| ????30 | ????805 | ????ND | ????808 | ????ND |
| ????60 | ????807 | ????ND | ????809 | ????10 |
| ????90 | ????801 | ????ND | ????802 | ????32 |
| ????120 | ????807 | ????ND | ????804 | ????105 |
Claims (9)
1. the purifier of a pernicious gas, burning and gas-exhausting or flame that it obtains by combustion fuel, the pernicious gas of discharging from semiconductor fabrication processes is carried out thermal decomposition, it is carried out purified treatment, it is characterized in that the thermal decomposition chamber that it comprises pernicious gas at least; Nozzle, this nozzle imports this thermal decomposition chamber with burning and gas-exhausting or flame; Pernicious gas is imported the nozzle of this thermal decomposition chamber; By the thermal wall of aeration, with oxygen containing gas from the side, import the mechanism of this thermal decomposition chamber; Outlet, this outlet gas row after with thermal decomposition is to the outside.
2. the purifier of pernicious gas according to claim 1 is characterized in that the thermal wall of aeration is cylinder, square tube, the polygon tube or with they similar tubulars.
3. the purifier of pernicious gas according to claim 1, it is characterized in that thermal wall by aeration, with oxygen containing gas from the side, the mechanism that imports this thermal decomposition chamber is made of the stream of oxygen containing gas introduction port and oxygen containing gas, and the stream of this oxygen containing gas is arranged in the scope of periphery integral body of thermal wall of aeration.
4. the purifier of pernicious gas according to claim 1 is characterized in that the thermal wall of aeration is made of pottery.
5. the purifier of pernicious gas according to claim 1 is characterized in that the thermal wall of aeration is made of the laminated body of the pottery with pin hole, the pottery with gap of wire, the pottery with gap of grille shape, porous ceramic, a plurality of fibrous potteries or the laminated body of a plurality of graininess potteries.
6. the purifier of pernicious gas according to claim 1 is characterized in that the nozzle that pernicious gas imports thermal decomposition chamber is arranged at the outer circumferential side that burning and gas-exhausting or flame is imported the nozzle of thermal decomposition chamber.
7. the purifier of pernicious gas according to claim 1, it is characterized in that the pernicious gas of discharging from semiconductor fabrication processes for comprise by with oxygen reaction, the gas of the oxious component of generation powder.
8. the purifier of pernicious gas according to claim 1 is characterized in that the pernicious gas of discharging from semiconductor fabrication processes is the gas that comprises the oxious component that produces sour gas.
9. the purifier of pernicious gas according to claim 1 is characterized in that the discharge side in thermal decomposition chamber, is provided with the removal portion of powder and/or the removal portion of sour gas.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003296475 | 2003-08-20 | ||
| JP296475/2003 | 2003-08-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1584400A true CN1584400A (en) | 2005-02-23 |
Family
ID=34611371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2004100582070A Pending CN1584400A (en) | 2003-08-20 | 2004-08-17 | Purifier for harmful gases |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR20050023120A (en) |
| CN (1) | CN1584400A (en) |
| TW (1) | TW200519328A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105090999A (en) * | 2014-05-12 | 2015-11-25 | 日本派欧尼株式会社 | Exhaust gas combustion type purification device |
| CN105864801A (en) * | 2015-02-09 | 2016-08-17 | 日本派欧尼株式会社 | Waste gas combustion type purifying device |
| CN109595568A (en) * | 2018-12-11 | 2019-04-09 | 南京普兰特换热设备有限公司 | High-purity is given up ammonia incinerator, system and technique |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100877144B1 (en) * | 2007-08-31 | 2009-01-07 | 주식회사 케이피씨 | Gas scrubber |
| KR100901267B1 (en) * | 2008-01-25 | 2009-06-09 | 고등기술연구원연구조합 | Oxygen enrichment type combustion apparatus of synthesis gas |
| KR101689166B1 (en) * | 2014-10-20 | 2016-12-26 | 씨에스케이(주) | Scrubber System |
| CN105597517B (en) * | 2015-10-30 | 2018-08-17 | 广东美的制冷设备有限公司 | Remove device and its application of smog smoke |
-
2004
- 2004-08-16 KR KR1020040064228A patent/KR20050023120A/en not_active Application Discontinuation
- 2004-08-17 CN CNA2004100582070A patent/CN1584400A/en active Pending
- 2004-08-19 TW TW093124910A patent/TW200519328A/en unknown
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105090999A (en) * | 2014-05-12 | 2015-11-25 | 日本派欧尼株式会社 | Exhaust gas combustion type purification device |
| CN105090999B (en) * | 2014-05-12 | 2018-11-20 | 日本派欧尼株式会社 | The combustion-type purification device of exhaust gas |
| CN105864801A (en) * | 2015-02-09 | 2016-08-17 | 日本派欧尼株式会社 | Waste gas combustion type purifying device |
| CN109595568A (en) * | 2018-12-11 | 2019-04-09 | 南京普兰特换热设备有限公司 | High-purity is given up ammonia incinerator, system and technique |
| CN109595568B (en) * | 2018-12-11 | 2020-04-03 | 江苏普蓝特节能技术有限公司 | High-purity waste ammonia gas incinerator, system and process |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200519328A (en) | 2005-06-16 |
| KR20050023120A (en) | 2005-03-09 |
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