CN1580636A - Whirlpool-type reaction chamber poison gas processing apparatus and method - Google Patents
Whirlpool-type reaction chamber poison gas processing apparatus and method Download PDFInfo
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- CN1580636A CN1580636A CN 03152654 CN03152654A CN1580636A CN 1580636 A CN1580636 A CN 1580636A CN 03152654 CN03152654 CN 03152654 CN 03152654 A CN03152654 A CN 03152654A CN 1580636 A CN1580636 A CN 1580636A
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Abstract
This invention provides a swirl reaction cavity poisonous gas processing device and a method, among which, the gas enters into the reaction cavity in tangent direction, so that, the distribution of generated speed field has the function of washing the inside wall of the reactor and its following channel to reduce stacking of small molecule solids on its inside wall in splitting to further prolong time of routine washing needed by the reactor, beside, this invention divides the post water channel set into a first and a second parts so as to bring out all small molecules suspending on water surface in the set effectively.
Description
Technical Field
The invention relates to a vortex type reaction cavity toxic gas treatment device and a method, in particular to a mode of brushing the inner wall surface of a reactor, which can introduce gas into the reaction cavity without external force, and is used for reducing the accumulation of micromolecular solids generated in the cracking process of the toxic gas on the inner wall of the reactor, thereby prolonging the time for the reactor to be cleaned regularly.
Background
One of the full-vapor fixed-temperature chamber control gases, wherein SF6HFCs, PFCs, and the like are mainly artificial greenhouse gas components. Although HFCs and PFCs do not deplete the ozone layer, they are potent greenhouse gases, which have a Global warming potential index (Global warming potential or GWP) that is thousands of times higher than carbon dioxide, and can stay in the atmosphere for a relatively long time, have an extremely long lifetime, and have an irreversible cumulative effect in the atmosphere. In recent years, CF has been widely used in semiconductor manufacturing processes (e.g., chamber cleaning process in dry etching chemical vapor deposition, etc.)4、C2F6、C3F8、NF3These fluorides (Perfluorocompounds or PFCs) are used as process gases, and only a small portion of these gases are actually used in the process, the remaining major portion being: about 90% of the residual gas in the Chemical Vapor Deposition (CVD) process is used as an important source of the greenhouse effect due to the exhaust gas emission. Since the developed semiconductor industry has common cognition and future agreementRegulations to reduce the emission of PFCs gases will also be imposed by taiwan semiconductor industry. However, the amount of perfluoro compounds in the manufacturing technology of semiconductor devices is increasing with the progress of semiconductor manufacturing process, so it is necessary to control and treat the perfluoro compounds to avoid the generation of environmental pollution, and to adopt a new PFCs waste gas treatment system to meet the stricter waste gas emission standard in the future.
The existing toxic gas waste gas treatment device mainly adopts the design principle of pyrolysis and washing for removing harmful substances, has the best efficiency, and uses plasma mode (plasma)to carry out pyrolysis. As shown in FIG. 1, the method is characterized in that waste gas is introduced to directly act with plasma and then enters the reaction chamber for treatment, a water sprayer group is arranged at the outlet of the reaction chamber, the waste gas is cooled by the water sprayer group and then is introduced into a wet scrubber for treatment and then is discharged, and the circulating water of the wet scrubber is provided with a water tank for supply.
The operation is as follows: the reactor 110 includes three parts, i.e., an exhaust gas inlet 111, a plasma torch 112, and a reaction chamber 113, wherein the interior of the reaction chamber is constructed with a refractory material. The generated extreme high temperature stream of the plasma torch 112 and the toxic gas exhaust gas entering from the exhaust gas inlet 111 are instantaneously pyrolyzed, atomized or ionized in the reaction chamber 113 to form hydrogen (H)2) Carbon monoxide (CO) and carbon dioxide (CO)2) And Hydrogen Fluoride (HF), and the like. Subsequently, at the outlet of the reaction chamber 113 of the reactor 110, a water sprayer group 120 is arranged, so that the sprayed water mist absorbs heat to rapidly cool the product and dissolve part of Hydrogen Fluoride (HF) in the product. The rest of the products falling on the surface of the water tank are discharged from the water tank by the bottom drainage modeAnd (4) discharging the wastewater. Since the high temperature affects the solubility of the gas, after the product is spray cooled, the impurities and solids are filtered through a filter 140 and the effluent gas is introduced into a wet scrubber 150 filled with high surface area packing. When the toxic gas waste gas passes through the wet scrubber tower 150, the entrained solids, such as silicon-containing powder, can be cleaned and filtered outThe hydrogen fluoride is also absorbed, and the sprayed water mist can be added with alkaline solution to neutralize the hydrogen fluoride acidity when the hydrogen fluoride product is treated. However, in the present situation, a wastewater treatment plant is installed in a scientific park, and the fluorine-containing wastewater can be treated by the wastewater treatment plant, so that the stored water in the water tank can be discharged in batches or continuously to the wastewater treatment plant. When the static pressure of the air stream provided by the waste gas source is insufficient, a windmill 160 can be added at the rear end of the wet scrubber 150 to compensate the static pressure, so as to smoothly discharge the designed air volume value.
However, in the prior art, in order to improve the efficiency of toxic gas waste gas treatment, harmful waste gases generated from semiconductor and other industrial processes, such as: c2F6、SiH4、CF4、NF3、CHF3Etc. often the reaction is processed simultaneously in the reactor. The reaction equation sequence is as follows:
wherein all the products of the waste gas reaction are gases except SiO generated after SiH cracking2The solids are easily adsorbed on the inner wall of the reactor, and the inner wall needs to be cleaned more frequently to maintain the efficiency of the reactor, so the method has the defects of reducing the service life of equipment and increasing the cost of enterprises.
Disclosure of Invention
The invention mainly aims to provide a vortex type reaction cavity toxic gas treatment device and method, which can introduce gas into a reaction cavity without external force, and scrub micromolecular solids adsorbed on the inner wall surface of a reactor while carrying out reaction.
The invention also provides a device and a method for treating toxic gas in a vortex reaction chamber, which utilize the force generated by the gas generated by reaction to wash small molecular solids adsorbed on the inner wall surface.
Another objective of the present invention is to provide a device for treating toxic gas in a vortex reaction chamber, wherein a connecting water pipe is disposed between a first water tank and a second water tank, so as to effectively carry small molecules out of the first water tank.
The technical scheme of the invention is as follows:
the invention relates to a method for treating toxic gas in a vortex reaction chamber, which is characterized by comprising the following steps:
(a) waste gas enters a reaction cavity through a torch, the waste gas is pyrolyzed instantly in the reaction cavity to form a waste gas product, and the waste gas product is composed of gaseous molecules and solid small molecules;
(b) introducing gas from a reaction cavity gas inlet of the reaction cavity, washing the inner wall of the reaction cavity by the force generated by the gas introduction speed field, and removing the solid micromolecules attached to the inner wall of the reaction cavity;
(c) the gaseous molecules dissolve part of hydrogen fluoride in the gaseous molecules through a water tank group and carry away the solid small molecules floating on the water surface of the water tank group; and
(d) a wetscrubber tower processes the remaining gaseous molecules and solid small molecules.
Wherein the reaction cavity comprises a waste gas inlet, a torch, a reaction cavity and a reaction cavity air inlet.
Wherein the torch is formed by one of a plasma method, an electric heating method and a gas method.
Wherein the number of the reaction chamber gas inlets can be a plurality.
Wherein said reaction chamber is perpendicular to said reaction chamber gas inlet such that said gas enters said reaction chamber in a tangential direction.
Wherein the gas is an inert gas such as nitrogen.
Wherein the water tank group comprises a water tank which is connected with the reaction cavity.
The water tank group comprises a first water tank and a second water tank, wherein the position relation between the first water tank and the second water tank is the reaction cavity, the first water tank and the second water tank from top to bottom in sequence, and the first water tank is connected with the second water tank through a connector.
Wherein the upper end opening of the connector protrudes out of the bottom in the upper water tank connected with the connector and is close to but lower than the normal water surface, and the lower end opening of the connector is arranged in the lower water tank connected with the connector and is used for taking away the solid micromolecules floating on the water surface in the step (c).
The invention relates to a method for treating toxic gas in a vortex reaction chamber, which is characterized by comprising the following steps:
(a) waste gas is introduced into a reaction cavity through a waste gas inlet, high heat is provided by a torch, and the waste gas is cracked to form a waste gas product consisting of gaseous molecules and solid small molecules, wherein the waste gas inlet is vertical to the reaction cavity;
(b) the gaseous molecules dissolve part of hydrogen fluoride in the gaseous molecules through a water tank group and carry away the solid small molecules floating on the water surface of the water tank group; and
(c) a wet scrubber tower treats the remaining waste gas product.
Wherein the reaction cavity comprises a waste gas inlet, a torch and a reaction cavity.
Wherein the torch is formed by one of a plasma method, an electric heating method and a gas method.
Wherein the number of the waste gas inlets may be plural.
Wherein the waste gas inlet is vertical to the reaction cavity, and the force generated by the velocity field generated when the waste gas is introduced can wash the inner wall of the reaction cavity.
Wherein the water tank group comprises a water tank which is connected with the reaction cavity.
The water tank group comprises a first water tank and a second water tank, wherein the position relation between the first water tank and the second water tank is the reaction cavity, the first water tank and the second water tank from top to bottom in sequence, and the first water tank is connected with the second water tank through a connector.
Wherein the upper end opening of the connector protrudes out of the bottom in the upper water tank connected with the connector and is close to but lower than the normal water surface, and the lower end opening of the connector is arranged in the lower water tank connected with the connector and is used for taking away the solid micromolecules floating on the water surface in the step (b).
The invention relates to a device for treating toxic gas in a vortex reaction chamber, which is characterized by comprising:
a reaction chamber;
the reaction cavity gas inlet is positioned on the reaction cavity and is vertical to the reaction cavity, so that gas enters the reaction cavity in a tangential direction;
a water tank group, wherein the water tank group is connected with the reaction cavity; and
a wet scrubber tower, wherein said sump set is connected to said wet scrubber tower;
wherein, the waste gas and the torch are directly mixed and enter the reaction cavity for reaction, and external gas is introduced into a gas inlet of the reaction cavity in the reaction for taking away reacted solid micromolecules adsorbed on the inner wall of the reaction cavity; and then, part of the product after the reaction falls into the water tank group, is discharged after separation and precipitation processes, and the rest part of the product is introduced into the wet scrubber tower for treatment and then is discharged.
Wherein the reaction chamber comprises at least one waste gas inlet group and the torch.
Wherein the reaction chamber gas inlet can be plural.
Wherein the torch is formed by one of a plasma method, an electric heating method and a gas method.
Wherein the number of the gas inlets of the reaction chamber can be plural.
Wherein the external gas is vertical to the reaction chamber, and the external gas can wash the inner wall of the reaction chamber by the force generated by the velocity field generated by introducing the gas.
Wherein the external gas isan inert gas such as nitrogen.
The water tank group comprises a first water tank and a second water tank, wherein the position relation between the first water tank and the second water tank is the reaction cavity, the first water tank and the second water tank from top to bottom in sequence, and the first water tank is connected with the second water tank through a connector.
The invention relates to a device for treating toxic gas in a vortex reaction chamber, which is characterized by comprising:
a reaction chamber, wherein an exhaust gas inlet is positioned on the reaction chamber and is vertical to the reaction chamber, so that the exhaust gas enters the reaction chamber in a tangential direction;
a water tank group, wherein the water tank group is connected with the reaction cavity; and
a wet scrubber tower, wherein said sump set is connected to said wet scrubber tower;
the waste gas is directly mixed with a torch from the waste gas inlet and enters the reaction cavity for reaction, and simultaneously solid micromolecules which are fixedly adsorbed on the inner wall of the reaction cavity after reaction are carried; and then the reaction product falls into the water tank group, is discharged after separation and precipitation processes, and the rest part is introduced into the wet washing tower for treatment and then is discharged.
Wherein the reaction cavity comprises at least the waste gas inlet group and a torch.
Wherein the exhaust gas inlet may be plural.
Wherein the torch is one of a plasma method, an electric heating method and a gas method.
Wherein the water tank group comprises a water tank which is connected with the reaction cavity.
The water tank group comprises a first water tank and a second water tank, wherein the position relation between the first water tank and the reaction cavity is the reaction cavity, the first water tank and the second water tank from top to bottom in sequence, and the first water tank is connected with the second water tank through a connector.
Drawings
To further illustrate the technical content of the present invention, the following detailed description is provided in conjunction with the embodiments and the accompanying drawings, in which:
fig. 1 is a prior art toxic gas exhaust treatment device.
FIG. 2 shows an incineration disposal apparatus of a toxic gas off-gas burner according to an embodiment of the present invention.
FIGS. 3A and B are simulated front sectional velocity fields upstream and downstream of a process exhaust port in accordance with the present invention.
Detailed Description
The invention can be applied to the treatment of waste gas of perfluorinated compounds (PFCs) in a factory, and introduces the gas to form a vortex gas flow for cleaning products attached to the inner wall of a reaction chamber in the process of combusting the perfluorinated compounds (PFCs).
Referring to FIG. 2, the present invention is an incineration disposal apparatus for a toxic gas waste gas burner. The incineration treatment is the same as the incineration treatment of a common waste gas combustion furnace, firstly, the waste gas and the plasma are directly mixed, then, the mixture enters the reaction cavity for treatment, then, a water sprayer group is arranged at the outlet of the reaction cavity, the waste gas and the solid micromolecules carried by the waste gas are cooled by the water sprayer group and then are introduced into a wet type washing tower for treatment and then are discharged, and the circulating water of the wet type washing tower is provided with a water tank for supply. The difference is that: in the treatment process, the treatment device introduces gas, and the velocity generated by the gas is used for generating force to wash the solid micromolecules adsorbed on the inner wall of the reactor. The operation mode is as follows:
the plasma reactor 310 includes four parts, a waste gas inlet 311, a plasma torch 312, a reaction chamber 313, and a reaction chamber gas inlet 314, wherein the interior of the reaction chamber is constructed by refractory and adiabatic materials, and a high temperature environment can be formed under the heating of the plasma torch. Toxic gas exhaust gas enters the reaction cavity 313 from the exhaust gas inlet 311, passes through the extremely high temperature (10,000 ℃) plasma beam of the plasma torch 312, is instantaneously pyrolyzed, atomized or ionized in the reaction cavity 313, chemical bonds of the toxic gas exhaust gas are broken down and destroyed, molecules or atoms which are simple and easy to process, such as hydrogen, carbon monoxide, carbon dioxide, hydrogen fluoride and the like, are formed, and solid small molecules which are easy to adsorb on the surface of the inner cavity, such as silicon-containing powder of silicon dioxide and the like, are generated.
In order to remove the solid molecules on the surface of the inner cavity, more than one reaction cavity gas inlet 314 vertical to the cavity is formed in the reaction cavity 313 body for introducing gas, so that the gas inlet direction enters the reaction cavity in a tangential direction, and the inner wall of the reactor and the subsequentchannel thereof are scoured by the force generated by the gas introducing speed. Since the reaction chamber 313 is in a negative pressure state during the process of burning the exhaust gas. Therefore, without any external assistance, gas can be introduced into the reaction chamber 313 from the reaction chamber gas inlet 314, wherein the introduced gas is mainly inert gas which does not participate in the reaction such as: nitrogen gas.
If it is not desired to form the reaction chamber gas inlet 314 in the reaction chamber 313 for the purpose of removing solid small molecules in the reaction chamber, a similar design can be made at the waste gas inlet 311 for introducing waste gas. That is, the exhaust inlet 311 is designed to be perpendicular to the reaction chamber 313, so that the incoming exhaust also has the velocity field forces to scrub the inner walls of the reactor and its subsequent channels. In the present embodiment, a simulation of the velocity field associated with the processing equipment is also shown, and the four exhaust gas inlets are used as an example to achieve an intake of 50LPM, as shown in fig. 3A and B, so that it can be confirmed that the introduced gas can actually achieve the function of scrubbing the inner wall.
The exhaust products after the combustion reaction fall into the first water tank 330, a water sprayer group 320 in the first water tank sprays water mist, the water absorbs heat to rapidly cool the products and dissolve part of Hydrogen Fluoride (HF) in the exhaust products, but because the high temperature affects the solubility of the products, after the exhaust products are spray-cooled, impurities and solids are filtered by the first water tank 330 and a filter 340, and then the exhaust products are introduced into a wet scrubber 350 to be filled with high-surface-area fillers. While the waste gas product passes through the wet scrubber 350, the entrained solids, such as silicon-containing powder, can be washed and filtered, and the gasified hydrogen can be absorbed at the same time, and the water mist sprayed during the treatment of the gasified hydrogen product can be added with alkaline solution to neutralize the acidity of the gasified hydrogen.
The solid small molecules in the waste gas products fall and suspend on the water surface of the first water tank 330 due to the high temperature, so that the solid small molecules are not easy to be carried away from the water tank by the traditional bottom drainage mode, and the absorption efficiency of the wet scrubber tower is affected. Therefore, the solution composed of solid small molecules and water in the first water tank 330 is projected to a connecting water pipe 332 close to the water surface of the upper water tank through the opening, and the small molecules on the water surface of the first water tank 330 are carried to the second water tank 331 by the water flow for precipitation; after a suitable time, the small molecules will settle to the bottom of the second water tank 331, and then the small molecules can be effectively carried out through the bottom drainage mode. The remaining undissolved waste products and entrained solids, such as silicon-containing fines, are directed through filter 340 into a wet scrubber 350 for further processing and finally discharged by windmill 360. When the static pressure of the air stream provided by the waste gas source is insufficient, a windmill 360 can be added at the rear end of the wet scrubber 350 to supplement the static pressure, so as to smoothly discharge the designed air volume value.
The embodiment of the present invention is illustrated by using plasma as an embodiment, but the present invention can also be applied to other combustion methods such as: gas or electric heating. The same problems can be encountered in the combustion process by using gas or electric heating, and the invention can be used for solving the problems.
The foregoing is only a preferred embodiment of the present invention, and should not be construed as limiting the scope of the invention, which is to be accorded the full breadth of the appended claims and any and all modifications thereof.
In addition, the invention is not disclosed in any public occasion or publication before application, so the invention has the patent condition of 'practicability, novelty and creativity', and the application of the invention patent is made according to law.
Claims (31)
1. A method for treating toxic gases in a vortex reaction chamber, comprising:
(a) waste gas enters a reaction cavity through a torch, the waste gas is pyrolyzed instantly in the reaction cavity to form a waste gas product, and the waste gas product is composed of gaseous molecules and solid small molecules;
(b) introducing gas from a reaction cavity gas inlet of the reaction cavity, washing the inner wall of the reaction cavity by the force generated by the gas introduction speed field, and removing the solid micromolecules attached to the inner wall of the reaction cavity;
(c) the gaseous molecules dissolve part of hydrogen fluoride in the gaseous molecules through a water tank group and carry away the solid small molecules floating on the water surface of the water tank group; and
(d) a wet scrubber tower processes the remaining gaseous molecules and solid small molecules.
2. The method of claim 1, wherein the reaction chamber comprises a waste gas inlet, a torch, a reaction chamber, and a reaction chamber air inlet.
3. The method as claimed in claim 1, wherein the torch is formed by one of a plasma method, an electric heating method and a gas method.
4. The method as claimed in claim 1, wherein the number of the gas inlets of the reaction chamber is plural.
5. The method of claim 1, wherein the reaction chamber is perpendicular to the reaction chamber gas inlet such that the gas enters the reaction chamber in a tangential direction.
6. The toxic gas treatment method for vortex reaction chamber according to claim 1, wherein the gas is an inert gas such as nitrogen.
7. The toxic gas treatment method for a vortex reaction chamber according to claim 1, wherein the water tank set comprises a water tank connected to the reaction chamber.
8. The method as claimed in claim 1, wherein the water tank set comprises a first water tank and a second water tank, wherein the first water tank and the second water tank are arranged in the reaction chamber from top to bottom, and the first water tank and the second water tank are connected by a connector.
9. The toxic gas treatment method for vortex reaction chamber according to claim 7, wherein the upper opening of the connector protrudes from the bottom of the upper water tank connected to the connector and is close to but lower than the normal water level, and the lower opening of the connector is located inside the lower water tank connected to the connector for carrying away the small solid molecules floating on the water surface in the step (c).
10. A method for treating toxic gases in a vortex reaction chamber, comprising:
(a) waste gas is introduced into a reaction cavity through a waste gas inlet, high heat is provided by a torch, and the waste gas is cracked to form a waste gas product consisting of gaseous molecules and solid small molecules, wherein the waste gas inlet is vertical to the reaction cavity;
(b) the gaseous molecules dissolve part of hydrogen fluoride in the gaseous molecules through a water tank group and carry away the solid small molecules floating on the water surface of the water tank group; and
(c) a wet scrubber tower treats the remaining waste gas product.
11. The method of claim 10, wherein the reaction chamber comprises an exhaust inlet, a torch, and a reaction chamber.
12. The method as claimed in claim 10, wherein the torch is formed by one of a plasma method, an electric heating method and a gas method.
13. The method of claim 10, wherein the number of waste gas inlets is plural.
14. The method as claimed in claim 10, wherein the exhaust gas inlet is vertical to the reaction chamber, and the force generated by the velocity field generated when the exhaust gas is introduced is used to wash the inner wall of the reaction chamber.
15. The toxic gas treatment method for vortex reaction chamber as claimed in claim 10, wherein said water tank set comprises a water tank connected to said reaction chamber.
16. The method as claimed in claim 10, wherein the water tank set comprises a first water tank and a second water tank, wherein the first water tank and the second water tank are arranged in the reaction chamber from top to bottom, and the first water tank and the second water tank are connected by a connector.
17. The toxic gas treating method for vortex reaction chamber according to claim 16, wherein the upper end of the connector is opened to protrude from the bottom of the upper water tank connected to the connector and is close to but lower than the normal water level, and the lower end of the connector is opened to take away the small solid molecules floating on the water surface in the step (b).
18. An apparatus for treating toxic gases in a vortex chamber, comprising:
a reaction chamber;
the reaction cavity gas inlet is positioned on the reaction cavity and is vertical to the reaction cavity, so that gas enters the reaction cavity in a tangential direction;
a water tank group, wherein the water tank group is connected with the reaction cavity; and
a wet scrubber tower, wherein said sump set is connected to said wet scrubber tower;
wherein, the waste gas and the torch are directly mixed and enter the reaction cavity for reaction, and external gas is introduced into a gas inlet of the reaction cavity in the reaction for taking away reacted solid micromolecules adsorbed on the inner wall of the reaction cavity; and then, part of the product after the reaction falls into the water tank group, is discharged after separation and precipitation processes, and the rest part of the product is introduced into the wet scrubber tower for treatment and then is discharged.
19. The apparatus of claim 18, wherein the reaction chamber comprises at least one waste gas inlet set and the flare.
The apparatus as claimed in claim 18, wherein the number of the reaction chamber gas inlets is plural.
21. The apparatus of claim 18, wherein the torch is formed by one of a plasma method, an electric heating method and a gas method.
22. The apparatus of claim 18, wherein the number of the gas inlets of the cyclone reaction chamber is plural.
The apparatus for treating toxic gas in a vortex type reaction chamber according to claim 18, wherein the external gas washes the inner wall of the reaction chamber by a force generated by a velocity field generated when the gas is introduced, since the external gas is perpendicular to the reaction chamber.
24. The toxic gas treatment method for vortex reaction chamber according to claim 18, wherein the external gas is an inert gas such as nitrogen.
25. The method as claimed in claim 18, wherein the water tank set comprises a first water tank and a second water tank, wherein the first water tank and the second water tank are arranged in the reaction chamber from top to bottom, and the first water tank and the second water tank are connected by a connector.
26. An apparatus for treating toxic gases in a vortex chamber, comprising:
a reaction chamber, wherein an exhaust gas inlet is positioned on the reaction chamber and is vertical to the reaction chamber, so that the exhaust gas enters the reaction chamber in a tangential direction;
a water tank group, wherein the water tank group is connected with the reaction cavity; and
a wet scrubber tower, wherein said sump set is connected to said wet scrubber tower;
the waste gas is directly mixed with a torch from the waste gas inlet and enters the reaction cavity for reaction, and simultaneously solid micromolecules which are fixedly adsorbed on the inner wall of the reaction cavity after reaction are carried; and then the reaction product falls into the water tank group, is discharged after separation and precipitation processes, and the rest part is introduced into the wet washing tower for treatment and then is discharged.
27. The vortex reactor apparatus of claim 26 wherein the reactor chamber comprises at least the set of waste gas inlets and a flare.
28. The apparatus of claim 26, wherein the exhaust inlet is a plurality of inlets.
29. The apparatus of claim 28, wherein the torch is one of a plasma, an electric heating and a gas.
30. The apparatus of claim 26, wherein the set of water tanks comprises a water tank connected to the reaction chamber.
31. The apparatus of claim 26, wherein the set of water tanks comprises a first water tank and a second water tank, wherein the first water tank and the second water tank are sequentially connected from top to bottom in the reaction chamber, and the first water tank and the second water tank are connected by a connector.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 03152654 CN1580636A (en) | 2003-08-04 | 2003-08-04 | Whirlpool-type reaction chamber poison gas processing apparatus and method |
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| CN 03152654 CN1580636A (en) | 2003-08-04 | 2003-08-04 | Whirlpool-type reaction chamber poison gas processing apparatus and method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102753249A (en) * | 2010-01-19 | 2012-10-24 | 马斯特瑞达股份公司 | Neutralisation of gaseous contaminants by means of artificial photosynthesis |
| WO2019009811A3 (en) * | 2017-07-07 | 2019-02-28 | 鑑鋒國際股份有限公司 | Device and system for controlling decomposition oxidation of gaseous pollutants |
-
2003
- 2003-08-04 CN CN 03152654 patent/CN1580636A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102753249A (en) * | 2010-01-19 | 2012-10-24 | 马斯特瑞达股份公司 | Neutralisation of gaseous contaminants by means of artificial photosynthesis |
| CN102753249B (en) * | 2010-01-19 | 2015-10-07 | 马斯特瑞达股份公司 | Utilize artificial photosynthesis to the neutralization of gas pollutant |
| WO2019009811A3 (en) * | 2017-07-07 | 2019-02-28 | 鑑鋒國際股份有限公司 | Device and system for controlling decomposition oxidation of gaseous pollutants |
| KR20200020953A (en) * | 2017-07-07 | 2020-02-26 | 에스아이더블유 엔지니어링 피티이. 엘티디. | Device and System for Decomposing and Oxidizing Gaseous Pollutant |
| US10814271B2 (en) | 2017-07-07 | 2020-10-27 | Siw Engineering Pte. Ltd. | Device and system for decomposing and oxidizing gaseous pollutant |
| US10898853B2 (en) | 2017-07-07 | 2021-01-26 | Siw Engineering Pte. Ltd. | Device and system for decomposing and oxidizing gaseous pollutant |
| US10946334B2 (en) | 2017-07-07 | 2021-03-16 | Siw Engineering Pte. Ltd. | Device and system for decomposing and oxidizing gaseous pollutant |
| KR102318517B1 (en) | 2017-07-07 | 2021-10-27 | 에스아이더블유 엔지니어링 피티이. 엘티디. | Device and System for Decomposing and Oxidizing Gaseous Pollutant |
| US11406934B2 (en) | 2017-07-07 | 2022-08-09 | Siw Engineering Pte. Ltd. | Device and system for decomposing and oxidizing gaseous pollutant |
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