CN1444006A - 地上移动军用装备及其可见光隐身法 - Google Patents
地上移动军用装备及其可见光隐身法 Download PDFInfo
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- CN1444006A CN1444006A CN 03114269 CN03114269A CN1444006A CN 1444006 A CN1444006 A CN 1444006A CN 03114269 CN03114269 CN 03114269 CN 03114269 A CN03114269 A CN 03114269A CN 1444006 A CN1444006 A CN 1444006A
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CN 03114269 CN1444006A (zh) | 2003-04-17 | 2003-04-17 | 地上移动军用装备及其可见光隐身法 |
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CN 03114269 CN1444006A (zh) | 2003-04-17 | 2003-04-17 | 地上移动军用装备及其可见光隐身法 |
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CN1444006A true CN1444006A (zh) | 2003-09-24 |
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CN 03114269 Pending CN1444006A (zh) | 2003-04-17 | 2003-04-17 | 地上移动军用装备及其可见光隐身法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102466427A (zh) * | 2010-10-29 | 2012-05-23 | 刘忠诚 | 抗激光武器及反激光武器 |
CN105291694A (zh) * | 2015-11-19 | 2016-02-03 | 衡阳泰豪通信车辆有限公司 | 一种车轮轮毂隐身装置 |
WO2017219392A1 (zh) * | 2016-06-24 | 2017-12-28 | 施剑波 | 一种三维喷涂隐身的方法 |
CN107562061A (zh) * | 2017-10-18 | 2018-01-09 | 长沙冰眼电子科技有限公司 | 反侦察无人车 |
CN109782506A (zh) * | 2019-01-10 | 2019-05-21 | 上海理工大学 | 一种光学可变玻璃及光学可变悬浮展示装置 |
-
2003
- 2003-04-17 CN CN 03114269 patent/CN1444006A/zh active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102466427A (zh) * | 2010-10-29 | 2012-05-23 | 刘忠诚 | 抗激光武器及反激光武器 |
CN105291694A (zh) * | 2015-11-19 | 2016-02-03 | 衡阳泰豪通信车辆有限公司 | 一种车轮轮毂隐身装置 |
WO2017219392A1 (zh) * | 2016-06-24 | 2017-12-28 | 施剑波 | 一种三维喷涂隐身的方法 |
CN107562061A (zh) * | 2017-10-18 | 2018-01-09 | 长沙冰眼电子科技有限公司 | 反侦察无人车 |
CN109782506A (zh) * | 2019-01-10 | 2019-05-21 | 上海理工大学 | 一种光学可变玻璃及光学可变悬浮展示装置 |
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CI01 | Correction of invention patent gazette |
Correction item: Inventor Correct: Xu Feiyong False: Tu Feiyong Number: 39 Page: 111 Volume: 19 |
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CI02 | Correction of invention patent application |
Correction item: Inventor Correct: Xu Feiyong False: Tu Feiyong Number: 39 Page: The title page Volume: 19 |
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Free format text: CORRECT: INVENTOR; FROM: TU FEIYONG TO: XU FEIYONG |
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Free format text: CORRECT: INVENTOR; FROM: TU FEIYONG TO: XU FEIYONG |
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C12 | Rejection of a patent application after its publication | ||
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