CN1399076A - Vacuum pump - Google Patents
Vacuum pump Download PDFInfo
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- CN1399076A CN1399076A CN 01123499 CN01123499A CN1399076A CN 1399076 A CN1399076 A CN 1399076A CN 01123499 CN01123499 CN 01123499 CN 01123499 A CN01123499 A CN 01123499A CN 1399076 A CN1399076 A CN 1399076A
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- cooling water
- vacuum pump
- water chamber
- casing
- temperature
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Abstract
The vacuum pump has a cooling water passage to communicate the main casing cooling water chamber and the discharge side casing cooling water chamber, the cooling water outlet pipe is connected to the entrance of the three way valve, the pipeline connected to the cooling water chamber is connected to the change port of the three way valve, and the pipeline connected to the outlet pipe of the three way valve is connected to the suction side casing cooling water chamber, and in the cooling water draining pipe a throttle valve capable of applying back pressure to cooling water is provided.
Description
Technical Field
The present invention relates to a dry vacuum pump of the helical rotor type, and more particularly to a vacuum pump suitable for treating deposits formed in the pump by reaction of gases.
Background
Fig. 5 is a longitudinal sectional view showing a configuration of a vacuum pump, the pumping housing being formed of: the main casing 1, a side casing 2 attached to the right end face suction side of the main casing 1, a side casing 3 attached to the left end face discharge side of the main casing 1, and a gear case 4 attached to the left side of the discharge side casing 3, and a motor 5 is attached to the left end face of the gear case 4.
The main casing 1 is provided with: an inner cylinder 1a penetrating in the longitudinal direction, a suction port 6 communicating from the outside to the right side of the inner cylinder 1a, and a cooling water chamber 7 cooling the outer wall surface of the main casing 1.
Two screw rotors 8 (only 1 screw rotor is shown in fig. 5) that mesh with each other are housed in the inner cylindrical portion 1 a.
Bearing boxes 9 (only 1 is shown in fig. 5) are fitted into two holes provided in the suction-side surface casing 2, and shaft portions 8a at the right end portions of the two screw rotors 8 are rotatably supported by bearings 10 provided inside the bearing boxes 9.
Bearing boxes 11 (only 1 is shown in fig. 5) are fitted into two holes provided in the discharge-side surface casing 3, and the shaft portions 8a at the left end portions of the two screw rotors 8 are rotatably supported by bearings 12 provided inside the bearing boxes 11.
The two screw rotors 8 are accommodated in the mutually engageable tooth-shaped portions 8b of the inner cylindrical portion 1a, one screw rotor 8 is a screw rotor on the driving side, a timing gear 24 is fitted to the outer surface of the left shaft portion 8a thereof, and a left coupling 25 is inserted thereto and connected to the output shaft 5a of the motor 5.
A timing gear (not shown) meshing with the positioning gear 24 is provided on the left shaft portion 8a of the screw rotor 8 on the other driven side.
When the screw rotor 8 rotates, the fluid (gas) sucked in from the suction port 6 is sent out from the discharge port 13.
The vacuum pump generates heat due to operation to generate high temperature, and the oil seal or seal of the shaft seal and the bearings supporting both ends of the screw rotor are damaged by the high temperature or the screw rotor is burned due to thermal expansion, so that it is necessary to cool the screw rotor by using cooling water.
Therefore, the discharge port 13 communicating with the inner cylinder 1a is provided in the discharge-side surface casing 3, and a cooling water chamber 19 for cooling the outer wall surface of the discharge-side surface casing 3 is provided.
The gear case 4 is cylindrical, and has a coolant chamber 14 on the outer wall surface and a coolant chamber 15 on the outer wall surface of the motor 5.
As shown in fig. 6, the cooling water supply system for the vacuum pump is configured such that the cooling water chamber 15 of the motor 5 is supplied from the cooling water supply pipe 16, the motor 5 is cooled, and then the cooled water is sent to the cooling water chamber 14 of the gear box 4 via the connection pipe 17, and the gear box 4 is cooled.
The cooling water in the cooling gear box 4 is sent to the cooling water chamber 19 of the discharge-side surface casing 3 via the connection pipe 18, is sent to the cooling water chamber 7 of the main casing 1 via the connection pipe 20 after cooling the discharge-side surface casing 3, is sent to the cooling water chamber 22 of the intake-side surface casing 2 via the connection pipe 21 after cooling the main casing 1, cools the intake-side surface casing 2, and is discharged from the discharge pipe 23. Thus removing heat generated by the operation.
In the semiconductorIn general, a dry vacuum pump used in a bulk manufacturing process needs to have a vacuum degree of 1Pa (10 Pa)-3Torr level), 10 is required for release into large or medium size5A compression ratio of a degree, thereforeA large amount of compression heat is generated.
Therefore, as in a general vacuum pump, cooling by cooling water is indispensable, but there are the following problems:
when the casing of the dry vacuum pump is cooled, the process gas flowing in the main casing 1 is easily cooled, and AlCl and NH contained in the gas4Cl and the like are solidified and adhere to the inner cylindrical portion 1a or the screw rotor 8, and a gap between the screw rotors 8 and a gap between the screw rotor 8 and the inner cylindrical portion 1a are closed, thereby causing an accident that rotation is not possible.
Vacuum pumps are used in semiconductor manufacturing processes for example for load locks, commonly known as the clean process, where no formation occurs, for sputtering, known as the light process step, where no problems are encountered with conventional techniques, but formation occurs with Al Etching in the Nitride, Teos, or Etching processes in cvd (chemical vapor deposition) for forming thin films on wafers.
For example, for Nitride, because
for aluminum etching, because
NH4Cl is sublimated from solid into gas NH at atmospheric pressure and at a temperature of over 180 DEG C3Cl was sublimed around 338 ℃.
Since the gas is very thin in a vacuum state and no formation is generated, N can be used or collected2Flushing the discharge side screw rotor without destroying vacuum to prevent formationThe method is not sufficient.
In the case where the heavy process step and thelight process step are performed in the same semiconductor process, it is troublesome to prepare different types of vacuum pumps and to switch the vacuum pumps to be used as needed.
Disclosure of Invention
The object of the invention is to provide a vacuum pump which is at N2In the rinsing method, a heating method is used together, which is not a heating method using an electric heater or the like as in the conventional method, but a heating method in which the generation of the formed product is suppressed by controlling the compression heat during the operation of the vacuum pump, and the heating method can be used for the light process step and the heavy process step by one operation with one vacuum pump.
In order to achieve the above object, a vacuum pump according to the present invention includes: an inner cylindrical portion capable of accommodating the intermeshing helical rotors; a main casing having a cooling water chamber on its outer wall surface, a side casing mounted on one side of the main casing, and a cooling water chamber suction side on its outer wall surface; and a side surface shell which is arranged at the other side of the main shell and is provided with a cooling water chamber discharge side on the outer wall surface. The method is characterized in that: a cooling water passage is provided to communicate the cooling water chamber of the discharge side surface casing with the cooling water chamber of the main casing, a cooling water outlet pipe of the cooling water chamber of the discharge side surface casing is connected to an inlet of a triple valve, a switching port of the triple valve is connected to the cooling water chamber of the main casing, an outlet of the triple valve is connected to the cooling water chamber of the suction side surface casing, and a pipe valve is provided at a cooling water discharge port connectedto the cooling water chamber of the suction side surface casing.
The valve provided in the cooling water discharge pipe may be a throttle valve.
The temperature detector can detect the temperature of the main shell rising above a certain temperature, and the control device can automatically adjust the throttle valve according to the detection signal of the temperature detector.
After the invention is adopted, the following effects can be achieved: the dry vacuum pump can be used as both a light process step and a heavy process step by switching the three-way valve; when the heavy process step is used, the opening of the throttle valve can be adjusted, and the back pressure of cooling water can be adjusted to control the temperature of the shell; by controlling the temperature of the casing to an appropriate temperature, accumulation of the formed matter can be prevented and an excessive rise in the temperature of the vacuum pump can be prevented.
Drawings
FIG. 1 is a front view of a dry vacuum pump of the present invention.
Fig. 2 is a cross-sectional view of fig. 1.
Fig. 3 is an X-X sectional view of fig. 1.
Fig. 4 is a schematic piping diagram of the cooling water.
Fig. 5 is a cross-sectional view showing the internal configuration of the vacuum pump.
Fig. 6 is a schematic diagram illustrating a cooling water pipe of a conventional vacuum pump.
Detailed Description
The dry vacuum pump has the same structure as the conventional vacuum pump, and therefore, the same reference numerals and detailed description as those of the conventional example are omitted, and only the differences from the conventional vacuum pump will be described.
A coolant passage 26 is provided to allow communication between coolant chamber 14 of discharge side surface casing 3 and coolant chamber 7 of main casing 1, and a coolant outlet pipe 27 connected to coolant chamber 14 of discharge side surface casing 3 is connected to an inlet 28a of three-way valve 28.
An end portion of the pipe line 29 connected to the switching port 28b of the triple valve 28 is connected to the coolant chamber 7 of the main casing 1, a pipe line 30 connected to the outlet 28c of the triple valve 28 is connected to the coolant chamber 22 of the suction-side casing 2, and a throttle valve 32 capable of adjusting the back pressure of the coolant is disposed in a coolant discharge pipe 31 connected to the coolant chamber 22.
When the three-way valve 28 is manually switched and the throttle valve 32 is adjusted, a warning device (not shown) may be provided to give a warning when a temperature detector (not shown) detects that the temperature of the main casing 1 has risen to a predetermined temperature or higher.
When the switching of the three-way valve 28 and the adjustment of the throttle valve 32 are automatically operated, a control device is provided which can control the switching of the three-way valve 28 and the throttle valve 32 based on the detection signal of the temperature detector.
The operation of the dry vacuum pump constructed as above will be described in the order of the use of the light process steps and the use of the heavy process steps.
In the light process step, the three-way valve 28 is opened to switch the port 28b, and the inlet port 28a is closed.
The coolant at this time flows through coolant supply pipe 16, coolant chamber 15 of motor 5, connection pipe 17, coolant chamber 14 of gear box 4, connection pipe 18, and side surface housing 3 on the discharge side in this order, and then flows through coolant passage 26 to coolant chamber 7 of main housing 1.
Thus, the main casing 1 is cooled and the temperature of the gas flowing through the main casing 1 is around 15 ℃.
The cooling water passing through the cooling water chamber 7 flows in the direction of arrow F in the pipe line 29, flows through the switching port 28b of the three-way valve 28 to the pipe line 30 as indicated by arrow G, passes through the cooling water chamber 22 of the suction-side surface shell 2 from the pipe line 30, and is discharged from the cooling water discharge pipe 31.
When the reprocessing step is performed, the three-way valve 28 is closed to switch the port 28b and the inlet port 28a is opened.
The cooling water flows from the cooling water chamber 19 of the discharge-side surface casing 3 to the pipe line 30 through the cooling water outlet pipe 27 via the inlet 28a of the three-way valve 28 as indicated by the arrow H.
The water staying in the cooling water chamber 7 of the main casing 1 rises to 100 ℃ due to the compression heat of the gas in the inner cylindrical portion 1a, and then starts to evaporate, so that the pressure in the cooling water chamber 7 rises, and the water corresponding to the increased pressure enters the cooling water chamber 19 of the discharge-side surface casing 3 through the cooling water passage 26 (see fig. 3) and mixes with the cooling water in the discharge-side surface casing 3.
At this time, when the throttle valve 32 is closed, the pressure loss is added, and the vapor pressure temperature in the cooling water chamber 7 becomes higher from 100 ℃, so that the temperature of the main casing 1 can be increased.
The temperature of the main casing 1 is heated to 100 to 120 ℃, so that the temperature of the gas discharged from the main casing 1 can be controlled to be about 350 ℃.
Because of the NH contained in the gas4Cl，AlCl2When the sublimation temperature of the substance is 350 ℃ or lower (760 Torr), the resultant is not solidified in the main casing 1, and therefore, the problem of the stop of the operation due to the accumulation of the resultant does not occur.
At the same time, the throttle valve 32 is adjusted to prevent the temperature of the main casing 1 from rising to an unnecessarily high temperature, thereby preventing the risk of shortening the life of the vacuum pump or scalding due to overheating.
A temperature detector (not shown) capable of detecting that the temperature in the cooling water chamber 7 is higher than a predetermined temperature is disposed in the cooling water chamber 7 of the main casing 1, and when an alarm is issued by an alarm device based on a signal detected by the temperature detector, an operator receiving the alarm operates the throttle valve 32, so that the temperature of the gas discharged from the main casing 1 can be controlled to about 350 ℃.
The control device is provided to receive the detection signal of the detector and automatically control the throttle valve opening and closing mechanism, so that the operation of the throttle valve manually operated by the operator can be automated.
Claims (4)
1. A vacuum pump has an inner cylinder portion for accommodating mutually meshed spiral rotors; a main casing having a suction port and a discharge port communicating with one side and the other side of the inner cylinder portion, and having a cooling water chamber on an outer wall surface; a side surface shell which is arranged at one side of the main shell and the outer wall surface of which is provided with a cooling water chamber suction side; and install at above-mentioned main shell opposite side, the outer wall is equipped with the cooling water room and spits side surface shell, its characterized in that: the vacuum pump is further provided with a cooling water passage for allowing the discharge side surface casing cooling water chamber and the main casing cooling water chamber to communicate with each other, wherein a cooling water outlet pipe of the discharge side surface casing cooling water chamber is connected to an inlet of a triple valve, a switching port of the triple valve is connected to the cooling water chamber of the main casing, an outlet of the triple valve is connected to the cooling water chamber of the suction side surface casing, and a valve is provided on a cooling water discharge pipe connected to the suction side surface casing cooling water chamber.
2. A vacuum pump according to claim 1, wherein: the valve arranged on the cooling water discharge pipe is a throttle valve.
3. A vacuum pump according to claim 1 or 2, wherein: the vacuum pump is also provided with a temperature detector for detecting the temperature of the main casing rising above a certain temperature, and an alarm device for warning the throttle operation of the throttle valve by detecting signals from the temperature detector.
4. A vacuum pump according to claim 1 or 2, wherein: the vacuum pump is also provided with a temperature detector for detecting that the temperature of the main casing rises above a certain temperature, and a control device for automatically performing the throttle operation of the throttle valve by detecting a signal from the temperature detector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 01123499 CN1399076A (en) | 2001-07-27 | 2001-07-27 | Vacuum pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 01123499 CN1399076A (en) | 2001-07-27 | 2001-07-27 | Vacuum pump |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1399076A true CN1399076A (en) | 2003-02-26 |
Family
ID=4665103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 01123499 Pending CN1399076A (en) | 2001-07-27 | 2001-07-27 | Vacuum pump |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1399076A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100429405C (en) * | 2003-09-30 | 2008-10-29 | 英国爱德华兹有限公司 | Vacuum pump |
| CN1860301B (en) * | 2003-09-30 | 2012-10-10 | 爱德华兹有限公司 | Vacuum pump |
| CN103688059A (en) * | 2011-06-20 | 2014-03-26 | 爱斯佰股份有限公司 | Screw-type vacuum pump having a direct cooling device |
| CN104632630A (en) * | 2013-11-13 | 2015-05-20 | 中国科学院沈阳科学仪器股份有限公司 | System and method for controlling thermal expansion of Roots dry pump |
| CN106151037A (en) * | 2016-06-23 | 2016-11-23 | 成都市鑫裕华科技有限公司 | A kind of pumped vacuum systems of automatic water-removing vapour |
| CN111502954A (en) * | 2018-12-28 | 2020-08-07 | 株式会社荏原制作所 | Vacuum pump device |
-
2001
- 2001-07-27 CN CN 01123499 patent/CN1399076A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100429405C (en) * | 2003-09-30 | 2008-10-29 | 英国爱德华兹有限公司 | Vacuum pump |
| CN1860301B (en) * | 2003-09-30 | 2012-10-10 | 爱德华兹有限公司 | Vacuum pump |
| CN102062109B (en) * | 2003-09-30 | 2012-11-28 | 爱德华兹有限公司 | Vacuum pump |
| CN103688059A (en) * | 2011-06-20 | 2014-03-26 | 爱斯佰股份有限公司 | Screw-type vacuum pump having a direct cooling device |
| CN103688059B (en) * | 2011-06-20 | 2016-01-27 | 爱斯佰股份有限公司 | Direct cooling spiral formula vacuum pump |
| CN104632630A (en) * | 2013-11-13 | 2015-05-20 | 中国科学院沈阳科学仪器股份有限公司 | System and method for controlling thermal expansion of Roots dry pump |
| CN104632630B (en) * | 2013-11-13 | 2017-01-11 | 中国科学院沈阳科学仪器股份有限公司 | System and method for controlling thermal expansion of Roots dry pump |
| CN106151037A (en) * | 2016-06-23 | 2016-11-23 | 成都市鑫裕华科技有限公司 | A kind of pumped vacuum systems of automatic water-removing vapour |
| CN111502954A (en) * | 2018-12-28 | 2020-08-07 | 株式会社荏原制作所 | Vacuum pump device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |