CN1373373A - Oblique raster type light isolator and its preparing process - Google Patents

Oblique raster type light isolator and its preparing process Download PDF

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CN1373373A
CN1373373A CN 01109388 CN01109388A CN1373373A CN 1373373 A CN1373373 A CN 1373373A CN 01109388 CN01109388 CN 01109388 CN 01109388 A CN01109388 A CN 01109388A CN 1373373 A CN1373373 A CN 1373373A
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refractive index
light
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郝明
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Abstract

A light isolator with oblique raster is made through irradiating the shaped polymer by light to induce the periodic variation of refractivity at irradiated position and form a raster which has an included angle beta relative to light direction and a period A, and further irradiating it to form a coated layer on its surface, whose refractivity is non-axially symmetrical. Its advantages are simple structure, high isolating level and low cost.

Description

Oblique raster type optoisolator and autofrettage thereof
The present invention relates to optical-fiber type and optical-waveguide-type optoisolator, especially about not using such as Faraday rotators such as magnetism crystallizations and the optoisolator that constitutes also relates to optical wavelength selection type photo-coupler and optical branching device.
Popularizing and the development of multimode communication along with optical-fiber network in recent years, and to the continuous expansion of communication need, use the exploitation of the extra long distance optical fiber communication technology more than 10,000 kilometers of fiber amplifier, and desire is applied to optical fiber communication technology and connects broadband digital formula service colligate system and the experiment of the practicality between the user comprise portable display device, and the technological development of the unprecedented high capacity of light communication system etc. launches.Yet the realization of this communication system one of requisite optical device be exactly that optoisolator etc. is because of the different optical device that produce different translucent effects of direction.Optoisolator is that a kind of light of forward that makes passes through, then intransitable passive optical device that allows the light one-way transmission of reverse light.For example, a kind of so-called wavelength division multiplexer spare (WDM) that is used for improving the capacity of network transmission system can waltz through wavelength selection type optical branching device with regard to a plurality of optoisolators of needs with the session that guarantees light path system and carry out branch's (cancelling channel), when perhaps being coupled (increase channel) by photo-coupler, and the interference of not reflected noise etc.And for example, in the time of will being connected with optical fiber as the semiconductor laser mouth of signal emitting-source, when the reflected light that produces in the junction of optical fiber promptly reflects noise and reenters lasing light emitter, thereby the decline that easily produces the S/N ratio plays pendulum laser, if at this moment this optoisolator is put between laser port and the light path system, just can be very difficult for this to happen.
As everyone knows, the example as optoisolator has: the magnetism crystalline solid that will have faraday's rotatory polarization effect is used for doing the polarisation rotation miter angle that polarization apparatus comes incident.Usually many is that the polarization direction that this faraday's rotatory polarization device is clipped in transmission light is staggered between two polariscopes of miter angle by practical ways.Be that the laser that one of them polarizer will be launched rises partially, see through the magnetic crystalline solid when this quilt plays polarisation, promptly its polarization direction will be towards direction rotation 45 degree during Faraday rotator.Then penetrated by another polarizer.But, will be inclined to one side from the light that shines in the other direction by another polarizer, its polarization direction will rotate 45 degree in the same direction by Faraday rotator the time.Therefore, this polarisation can not pass through last polarizer with the rectangular state of last polarizer relatively.So, this kind optoisolator is disposed at the Laser emission mouth can prevents that reflected light from injecting in the laser again.
Optoisolator mainly is divided into by its principle of work and uses Faraday rotator, and utilizes two kinds of TE (TransverseElectric, transverse mode)-TM (Transverse Magnetic, longitudinal mode) mode switch.And can be divided into the sheet type by its shape, three kinds on fibrous type and three-dimensional optical waveguide type.
Optoisolator wherein commonly used is to use the sheet type optoisolator of Faraday rotator, is substantially to be made of the plate shape polarizer and Faraday rotator and a plate shape inspection polarizer.Always, polarizer and inspection polarizer use wafer such as kalzit, rutile or ahrens prism to wait to do always.Faraday rotator is then mostly to be to wait and make with permanent magnetism glass or plate shape YIG (yttrium-iodo-garnet) crystal.Launching recently about replace the research of permanent magnetism glass with (GdBi) IG (gadolinium-bismuth-iodo-garnet) spar and garnet.
In addition, also favourable optical fibre light isolator with Faraday rotator.This is the part that a kind of core material that faraday's coefficient of rotary is big forms the optical fiber of light path system, or a very small Faraday rotator is clipped in its inside and the optoisolator of formation.Because this kind optoisolator must not use collimation lens and sheet type polarizer to be expected to make small-sized optoisolator.
Moreover, the representative optical-waveguide-type optoisolator that utilizes TE (transverse mode)-TM (longitudinal mode) mode switch principle is to form a kind of YIG spar film that mixes trace bismuth on garnet (GGG) spar substrate, and plates layer of aluminum and form TE (transverse mode)-TM (longitudinal mode) mode converter in its both sides.
In sum, according to technology in the past, the optoisolator that is made of magnetic crystalline solid and polarizer also needs four kinds of devices at least in addition and comprises that seal adds the magnetite of external magnetic field.Because these devices are to be made of inorganic crystal material substantially, so there are problems such as the materials processing difficulty is big, package program is complicated, time-consuming.Therefore cost height not only, and insert that loss is big, isolation is low, so its stability and confidence level are all not good enough.In addition, even can both operate as normal, must make the performance of optoisolator can not depend on polarized condition in order to guarantee that this kind optoisolator inserts the unascertainable any fiber position of polarized condition passed through.For this reason, with more device of needs and complicated light path system, thereby not only improve the cost of optoisolator, and hinder miniaturization.
What the object of the present invention is to provide a kind of easy to use, simple structure and insert that loss is low, isolation is high does not use special inorganic material such as magnetic crystallization, and is to use the optoisolator that the polymeric material that is easy to process makes and is beneficial to a large amount of productions, manufacture method cheaply.
The manufacturing technology of the optoisolator that the present invention developed, its first feature are can finish as long as polymer moulded bodies is carried out rayed.For example, the manufacture process of optoisolator can comprise following operation: first operation is that to make the light beam refractive index through beam splitting be n 0Film like, sheet or polymer moulded bodies such as fibrous shine by institute's fixed condition, and the refractive index of bringing out illuminated position produces periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be that β, cycle are the grating of Λ.Its second operation be for to carrying out rayed in the surface of above-mentioned formed body, and the variations in refractive index that makes its illuminated position till the formed grating of above-mentioned first engineering is to n 1, when forming covering 1, and the refractive index of portion's formation within it is n 0Core.And refractive index and covering 1 are nonaxisymmetrical covering 2, be to finish by the 3rd engineering, promptly certain part on the surface of above-mentioned formed body is carried out rayed, thereby make the refractive index at its illuminated position till the formed grating of preceding note first engineering further be changed to n 2Till.
Here need to prove: refractive index is n 1Covering 1 and refractive index be n 2Covering 2 be that the shaft section that is in formed body is the symmetric position of the plane of symmetry.And the angle between shaft section and grating face also is β.
When adopting above-mentioned illuminating method and manufacturing process, because being whole section along formed body, grating forms, so when second operation is shone the formed body surface, the periphery of established grating face will be repeated irradiation.And that the refractive index variable quantity of the part that is repeated to shine will lack will be bigger.But, because second operation will make the fall of refractive index bigger, so the performance to optoisolator can not produce any influence in former.
Certainly, in above-mentioned manufacture process, can not adopt light beam splitting method to come, and to be carved with the inclination angle on the surface cover of formed body be β, irradiation is also passable again after being spaced apart the screen diaphragm of parallel grating of Λ to the formed body cross-fire.
Spendable light source can be vitalight lamp, laser etc.Though to its wavelength without limits, need consider to use different light sources and illuminating method at different materials and different manufacturing process.For example when making the covering of above-mentioned oblique raster type optoisolator, promptly in second and third operation because of need shining, so efficient is higher when usually using ultraviolet light source to the integral body or the part of the appearance of formed body.At this moment the wavelength of employed ultraviolet light source is more satisfactory in the spectral range of material.Certainly do not get rid of use laser.
Can also can use the laser more than two to shine or cross-fire simultaneously with one when using laser to make light source along same direction.In addition, it also can be different wavelength that several laser can have same wavelength, both can shine simultaneously also and can shine sequentially.
According to the form of formed body often needs select different light sources and different illuminating methods for use.When making above-mentioned oblique raster type optoisolator, for example can earlier grating be write after the formed body inside, the organizator to the remainder of grating periphery carries out rayed and forms covering again.The manufacture process of optoisolator in this case is: 1, and after the beam splitting of the process of the light source beyond the spectral range of polymkeric substance, refractive index is n again with wavelength 0Polymer moulded bodies inside carry out cross-fire, produce periodically changes delta n thereby bring out, and then forming one, to form an inclination angle with optical transmission direction be that β, cycle are the grating of Λ by the refractive index at cross-fire position.2, wavelength is shone the surface of above-mentioned formed body with interior light in the spectral range of polymkeric substance, thereby the variations in refractive index that makes its illuminated position till the journey 1 formed grating of before recording workpoints is to n 1, and when forming covering 1, the refractive index of portion's formation within it is n 0Core.3, wavelength is carried out rayed with interior light to the surface of above-mentioned formed body in the spectral range of polymkeric substance, thereby make the refractive index at the illuminated position till its journey 1 formed grating of extremely before recording workpoints further be changed to n 2, and then form refractive index and covering 1 is nonaxisymmetrical covering 2.
In operation 1, the light with the identical wavelength of two bundles shines simultaneously in principle, and makes the two radiation modality that intersects in the inside of formed body ideal.Certainly do not get rid of and use the different light beam of wavelength.Here said two-beam can be that the light from same light source is formed through beam splitting, also can be to use two different light sources such as laser instrument, vitalight lamp etc.
In addition, can put in place in the pre-irradiation one-shot forming, light irradiation process and molding procedure are hocketed as the formed body that forms optoisolator.The manufacturing process of optoisolator is more simplified.For example: can be earlier be n with the light beam refractive index of beam splitting 0Polymer moulded bodies shine, and the refractive index of bringing out illuminated position produces periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be β, cycle to be after the grating of Λ, again with polymer-coated on above-mentioned forming polymer external surface after, carry out rayed to above-mentioned through the surface that is coated with the formed body of handling again, the variations in refractive index that makes the illuminated position till the formed grating in its journey of extremely before recording workpoints is to n 1, and when forming covering 1, and the refractive index of portion's formation within it is n 0Core.Carry out rayed to above-mentioned through the surface that is coated with the formed body of handling at last, make the refractive index at the illuminated position till the formed grating in its journey of extremely before recording workpoints further be changed to n 2, and then form refractive index and covering 1 is nonaxisymmetrical covering 2.
Certainly the polymer coating here can with the identical or different polymkeric substance of the formed body first time.Also can be potpourri of polymkeric substance and low molecular compound etc., here to this unqualified necessity.
Also methods such as employing gummed, extruding such as the film of polymkeric substance or non-polymer, sheet material can be laid on the formed body surface that forms grating.
Another technical characterictic of the present invention is, can process very simply by common industrial means as the polymer moulded bodies of rayed object.For example, the fibrous polymer formed body can use general extrusion shaping machine; Membranaceous article shaped then can use cast molding, compression molding, spin coating, and method such as extrusion molding make.
Certainly, polymeric material moulding on suitable substrate is also passable, be clipped in perhaps that to make three-layer structure between the two-layer substrate also passable.When making three-layer structure, it is transparent requiring to have one piece of substrate at least.Employed light source can see through and not be absorbed just in this transparent making engineering that is meant in fact afterwards.
Material as aforesaid substrate can be inorganicss such as polymeric material, glass and metal such as resin.Here this is not imposed any restrictions.Certainly, two or more superpolymer or oligomer mixing use is also passable, and the mixed body of organism and inorganics is also passable.But this material material that preferably employed light source can see through in afterwards the making engineering.
Have under the situation of two-layer structure or three-layer structure, covering 1 or covering 2 that substrate can be used as optoisolator use, and also can use as reinforcement merely.
And for example, needn't specially use materials such as polymkeric substance, and air layer is also passable as the covering 2 of above-mentioned optoisolator.When being used as covering 2, can obtain two-dimensional fundamental form type optoisolator with air layer.Certainly in addition also have a lot of additive methods.Enumerate no longer one by one at this.
Moreover, polymkeric substance is made after the desired shape, optical fiber and optoisolator can be made of one by rayed, can reduce like this and insert loss.
Above-mentioned polymer moulded bodies will be if optical fiber will form optical fibre light isolator; If film will form the optical-waveguide-type optoisolator.Certainly as required polymkeric substance is made arbitrary shape.But no matter make its light illuminating method of which kind of shape is constant substantially.In other words, use above-mentioned arbitrary method, not only optical-fiber type and optical-waveguide-type optoisolator all can be made easily.
Another feature of the present invention is: constitute the each several part of oblique raster type optoisolator, promptly core and the oblique raster, the refractive index that are positioned at core are that nonaxisymmetrical covering 1, covering 2 are one.Their refractive index value that is prescribed is separately all given by rayed.And irradiated formed body formed by more than one polymkeric substance, and polymkeric substance contains a kind of for it is imposed superpolymer, oligomer, low molecular organic compound or the mineral compound etc. that rayed can cause that its refractive index changes at least.Might as well be defined as photo-induction variable refractivity type material to this class material later on.
As the polymer moulded bodies of rayed object, just can use so long as contain the polymkeric substance of photo-induction variable refractivity type material.That is to say,, it is characterized in that on its main chain and/or side chain, being connected to photo-induction variable refractivity type material as such polymeric material.Its feature also is, two or more photo-induction variable refractivity type superpolymer, oligomer are mixed mutually, perhaps photo-induction variable refractivity type material is dispersed in superpolymer or the oligomer.
For example have as photo-induction variable refractivity type material among the present invention: silicon-containing compound, contain nitron derivant, cinnamic acid derivative, contain stilbene derivative, diphenylethyllene pyrazine derivant, anthracyclinone derivatives, connect phenyl derivatives, azo derivative, connect azo derivative, connect alkene derivatives etc.Certainly optional two or more while Use Limitations really can be better from these compounds.
Optically active compounds is aggregated into superpolymer, perhaps it is dispersed in the superpolymer and also can uses.For example the superpolymer that stilbene derivative, company's naphthol derivative, menthol derivative, company's phenyl derivatives etc. are connected on main chain or/and the side chain all can use.
Can list as the nitron derivant: α-t-butyl-N-phenyl nitron, alpha-alpha-dimethyl aminophenyl-N-phenyl nitron, α-phenyl-N-phenyl nitron etc.
Connecting alkene derivatives for example has: 1, and the 5-hexamethylene is two rare, 1, and 5-ring last of the ten Heavenly stems is two rare, 1,5,5-trimethyl two rare ketone, 1,4-diphenyl diethylene, 1, oneself is three rare for the 6-diphenyl, 1,2,3,4, and oneself two rare grades has double linked compound 5-pentaphene basic ring.
Compound listed above can use separately, also can select the use that combines more than several.
The normal superpolymer that uses also has the homogeneity polysilane, and with siliceous single multipolymer of measuring body and other single amount body copolymerizations.For example the chemical structural formula of part of compounds is:
Figure A0110938800091
(chemical structural formula 1)
Figure A0110938800092
(chemical structural formula 2)
Figure A0110938800093
(chemical structural formula 3)
Figure A0110938800094
(chemical structural formula 4) wherein R1, R2, and R3, R4 can be any one hydrocarbon, aliphatic hydrocarbon compound, ring type hydrocarbon, aromatic hydrocarbon etc.More particularly can be phenyl, naphthyl, anthrone base, phenanthryl, connect phenyl, alkyl etc.These hydrocarbon-based can be by halogen family essence, ehter bond, thioether bonds or are contained the functional group, hydroxyl, mercapto, carboxyl etc. of fat key the functional group replaced.With regard to same superpolymer, R1, R2, R3, R4 can be the same or different.
In addition, be 5 to 10000 natural number as the n of the poly-silicon compound of homogeneity, can be respectively 1 to 10000 natural number as n, the m of copolymerization silicon compound and k, n and m can be the same or different.
The poly-silicon thing of these homogeneities all can use for example: polymethyl-benzene base silane, the poly-methyl-monosilane, poly-cyclohexyl silane, poly-dibutyl silane, poly-methyl-propyl silane, poly-methyl butyl silane, poly-methyl of connecting connect benzoyl silane, poly-methyl hexyl silane, poly-methyl-4-chlorophenyl silane, poly-methyl-4-chloro butyl silane, poly-methyl-3-fluoro propyl silane, poly-doubly-linked benzoyl silane, poly-dihexyl silane, poly-naphthyl silane, polychlorostyrene for naphthyl silane, poly-naphthyl silane etc.
Above-mentioned poly-silicon compound can use separately, also can be with two or more mixed uses.Also can use having in the oligomer of above-mentioned structure or the superpolymer that superpolymer is mixed in other types.The co-polymer that and for example has siliceous single amount body of different R1 and R2 also can use.
And for example, in order to improve the performance, particularly its mechanical property of poly-silicon compound, can make poly-silicon compound crosslinked mutually and constitute network structure with crosslinking chemical.Its method for example will have the such photo-polymerization type list amount body of vinyl and add at the polymerization stage of poly-silicon compound, or add when poly-silicon compound moulding.This class photo-polymerization type list amount style that often is used is if any styrene, connect acrylate etc. to divinylbenzene, ethylene glycol.These photo-polymerization type list amount bodies will be cut off once its pair of rayed key, meanwhile the σ key of poly-silicon compound also is cut off because of rayed, therefore the two recombination and form network structure and become to be insoluble to and comprise that water must all solvents, its mechanical property etc. thereby improve.
Photo-induction variable refractivity type material is dispersed in superpolymer or the oligomer also can be used as the formed body material.Single amount body as these superpolymer can be listed below: styrene; chlorostyrene; vinyl acetal; α-Jia Jibenyixi; the p-chlorostyrene; vinyl cyanide; the phenyl vinyl acetal; the rare fat of benzoic acid second; naphthalene ethene fat; vinylidene chloride fat; ETHYL CYANOACRYLATE; butyl acrylate; acrylic acid hexamethylene fat; acrylic acid benzene fat; acrylic acid benzil fat; acrylic acid phosphinylidyne fat; acrylic acid hydroxyl alkane fat; acrylic acid perfluoro alkane fat; the superpolymer or the oligomer of acrylates such as two glycerine tetrapropylene acid fat; methacrylic acid naphthalene fat; hydroxyethyl methacrylate alkane fat; methacrylic acid phosphinylidyne fat; methacrylic acid naphthalene fat; methacrylic acid dicyclohexyl fat; methacrylic acid ethyl fat; methacrylic acid phenyl fat; metering system acid butyl fat; methacrylic acid nitrile fat; methacrylic acid methyl fat; 2; 2; 2-three fluoridizes ethylacrylic acid methyl fat; 4-methylcyclohexyl ethyl propylene acid methyl fat; 2; 2; 2-three fluoridizes ethyl fat acrylic acid methyl fat; methacrylic acid furfural base fat; 1-benzene is for ethyl propylene acid methyl fat; 1-benzene is for cyclohexyl acrylic acid methyl fat; methacrylic acid connects the superpolymer and the oligomer of methacrylate such as benzoyl group fat; and their derivant, perhaps polyester resin; epoxy resin etc.Other polymkeric substance that are suitable for processing and forming all can use.
When photo-induction variable refractivity type material is sneaked into above-mentioned superpolymer and oligomer, it directly can be connected on and constitute the main type polymkeric substance that connects on the main chain of superpolymer or oligomer, perhaps be connected on formation branched chain type polymkeric substance on the side chain, also can be connected on simultaneously on the even main and side chain of polymkeric substance.
In the time of photo-induction variable refractivity type material need being dispersed in above-mentioned superpolymer, oligomer, for example material to be disperseed can be dispersed in earlier in the appropriate solvent, also can be directly and superpolymer and oligomer stir together.As long as no matter which kind of mode of employing can evenly be mixed the two.
Photo-induction variable refractivity type material can wait to determine to the ratio of superpolymer and oligomer according to the kind of material and the refractive index that will obtain.Usually its concentration is more satisfactory between 5% to 60%.
The method even main and side chain of photo-induction variable refractivity type material being received above-mentioned superpolymer and oligomer has a lot.For example, at first photo-induction variable refractivity type material is made single amount body and made its independent polymerization also passable afterwards, also can with other single amount body copolymerization.Can also earlier other single amount bodies be aggregated into after superpolymer and the oligomer, photo-induction variable refractivity type material be received main connect and side chain gets on by addition reaction.Also have other all can use the method on the even main and side chain of photo-induction variable refractivity type material importing superpolymer and oligomer.
Core technology of the present invention is that oblique raster of design makes it possess the function that only allows the light one-way transmission.According to Fraunhofer spectrum diffraction phenomena, adopt the non-rotational symmetry type of refractive index covering model, if λ is with the optical wavelength that is transmitted, n 0, n r, n 1And n 2Be respectively the refractive index of core, grating face, covering 1 and covering 2.They satisfy relational expression: n 0>n r>n 1>n 2Words, can know by inference by Prague is approximate: the grating of the oblique raster that can achieve the above object is Λ at interval, and the angle β that the grating face is become with optical transmission direction will determine by the refractive index of the each several part of above-mentioned formation optoisolator, and satisfy relationship 1 and relationship 2 respectively.
Λ 2=λ 2(n r-n 1)/[n 1(n r 2-n 2 2)] (1)
cosβ=[Λ 2(n r 2-n 2 2)+λ 2]/(2λΛn r) (2)
After the interval of grating Λ and angle of inclination beta thereof are determined, if the refractive indices n that is brought out in grating by rayed can know that needed grating is long just can be obtained from relationship 3:
L=2Λ/Δn (3)
For example, suppose that the refringence that produces because of rayed can reach 10 in grating -2, can know that from 3 formulas the length of grating has just might be made reflected light be deleted 100% ground by light to reflex to covering 1 below 0.5 millimeter.Above-mentioned cited most of materials can bring out its refractive index by rayed and take place 10 -2To 10 -1Between variation, so the length of oblique raster just can obtain fully big isolation effect usually below 0.5 millimeter.Therefore optoisolator can be done very for a short time.Particularly this technology is applied to and touch when using optoisolator more, its grating length can obtain desirable light isolation effect just sufficient below several millimeters.
As mentioned above, pass through optimized design in the present invention to interval Λ, angle of inclination beta and the length L thereof of grating, and by using suitable light source to come formed body is shone, and the each several part of control formation optoisolator reaches desired refractive index respectively, has so just finished the making of optoisolator.When light along the forward transmitted of optoisolator during at core, it is not subjected to stopping of grating and passes through; But when light along the reverse transfer of optoisolator during at core, will total reflection take place at the light place of deleting and be emitted by covering 1.The result is, produces very large difference in forward and reverse transmitance of the core of optoisolator, thereby obtains the light isolation characteristic.
The principle of work of this kind oblique raster type optoisolator (100) can be explained by Fig. 1.For example will not be reflected and directly by grating (103) from the major part of the laser beam (11) of right side incident, this is because the specific inductive capacity of covering 2 cause low than covering 1, so for for the laser beam (11) of right side incident, grating only is equivalent to one group of lens.Even there is a pettiness part to be reflected, also can be reflected again by covering 2 (105).This is incided the required critical value of light generation total reflection that the two interface is come because the refractive index of covering 2 is relative and the refractive index of core (102) is low to surpassing to make.So analogize when the light that is reflected by covering 2 arrives grating and will repeat in this movement.The result who repeats down like this is that the light from generating laser incident will be all through optoisolator.
In addition, the reflected light (12) that comes from the left side almost 100% is reflected to covering 1 (104) at grating, is emitted to the outside as loss light (13).This is on the one hand that the refractive index of covering 1 than the higher institute of the refractive index of covering 2 extremely on the other hand because the refractive index of covering 1 refractive index relative and core does not reach to be enough to make from the next required critical value of light generation total reflection of optical grating reflection.The light of trace is after first grating face of seeing through, and it will be in the movement of second grating face repetition at first grating face.So analogize, consequently almost 100% emitted to the outside and can not see through grating from the next light of left side reflection.
Like this,, and the index of refraction relationship of its each several part is done some adjust, just can only be allowed the unidirectional characteristic that sees through of light as long as in optical waveguide, do an oblique raster.
This technology can also be applied to technical fields such as wavelength selection type photo-coupler and optical branching device.Up to the present there are a lot of distinct methods to be used to improve the capacity of optical transmission system.For example in the Wave division multiplexing transmission channel multiplexed with demultiplexing on different carrier wavelengths, so that acquired information stream.Its essence is exactly to utilize Wave division multiplexing to improve the utilization factor of the wavelength available of optical fiber in the network.Yet the core of this technology is the transmission channel that needs on a kind of different optical carrier wavelength that can provide in demultiplexing and the multiplexed optical-fiber network.
About a kind of multichannel multiplexing method of bus network or loop network is to increase/cancel multiplexed, and promptly one or more so-called information channels that are arranged on the aforementioned carrier wavelength are cancelled or be increased to the process of information flow from information flow.And at this moment one of requisite optical device is exactly wavelength selection type photo-coupler and optical branching device.About the structure and the principle of work of the photo-coupler and the optical branching device of prior art, know for the technician who is engaged in this respect work, so this no longer explaining more.But based on existing technology, because wavelength is selected mostly to be by extra electric field, heated and reach phase control, perhaps the mechanical type means realize, so increase/cancel the problem that channel and transmission channel power consumption become prior art greatly.Another problem then is how to reduce acceptable channel interference level.
From mathematical expression (1) to (3) as can be known, because interval Λ, angle of inclination beta and the length L thereof of grating depend on the transmission light wavelength, if above-mentioned apsacline optoisolator is applied to optical wavelength selection type photo-coupler and optical branching device gets on, can make optoisolator, wavelength selection and optically-coupled/splitter and waveguide have the type device concurrently.Can solve existing technical matters effectively like this.For example, this can finish by following method: promptly can make the oblique raster type optoisolator that two coverings 1 are in the arranged on opposite sides position on film, and make these two isolators be positioned at the inside of Y shape or X-guide, just formed wavelength selection type photo-coupler and splitter that top said smooth isolation features has concurrently.As shown in Figure 2, if want to allow the wavelength of injecting first optoisolator be the light of λ i when being separated to second optoisolator, can design first optoisolator to such an extent that only allow the light transmission of wavelength of the light reflection of λ i and other; Second optoisolator then is designed to be the light transmission that allows λ i.When the light of λ i is reflected at the grating place of first optoisolator and penetrates by covering 1, will enter the covering 1 of second optoisolator, and then enter its core like this.The refractive index of the covering 1 of certain second optoisolator preferably is equal to, or greater than the covering 1 of first optoisolator.Also can make two optoisolators have same covering 1.Equally, if make second optoisolator allow λ iLight reflection and be coupled into first optoisolator by covering 1, promptly itself play the effect of wavelength selection type photo-coupler.In other words, use the optical branching device and the photo-coupler of optoisolator can carry out optically-coupled and branch simultaneously.
Obviously, this kind wavelength selection type optical branching device and photo-coupler do not consume any energy when work.Its great advantage also is to obtain very low channel interference level.Its reason has: by the optimized design to pitch angle, interval and the length thereof of oblique raster, the wavelength selectivity of grating can reach in several millimicrons usually, and reflection efficiency can reach 100%.Be made in the inside of waveguide again because of optoisolator, therefore saved a lot of interfaces.Main is owing to adopt optoisolator formula photo-coupler and splitter, has realized that single device is multi-functional, and the optoisolator that does not need to be connected in series other in addition also can make its noise such as reflected light of avoiding in the light path system disturb.
Below the present invention is done into delegation's explanation by embodiment.Fig. 1 is the principle key diagram of optoisolator of the present invention.Fig. 2 is the pie graph of optical wavelength selection type photo-coupler of the present invention and optical branching device.Fig. 3 is a full sectional view and a cross-sectional view that is in the optical fibre light isolator in the manufacturing process of the present invention.Fig. 4 is one of the present invention and forms the irradiation unit synoptic diagram that oblique raster is used.Fig. 5 is an irradiation unit synoptic diagram that forms covering of the present invention.Fig. 6 is an irradiation unit figure who forms oblique raster of the present invention.Fig. 7 is a full sectional view and a cross-sectional view that is in the optical-waveguide-type optoisolator in the manufacturing process of the present invention.Fig. 8 is a full sectional view and a cross-sectional view that is in the optical-waveguide-type optoisolator in the manufacturing process of the present invention.
Symbol is respectively among the figure: 1, and laser instrument; 2, condenser; 3, beam splitter; 4, catoptron; 5, the portable sample fixed station of twin shaft; 6, annular vitalight lamp; 7, guiding trestle; 8, the screen diaphragm; 9, vitalight lamp; 10, the angle of inclination beta of grating; 11, incident light; 12, reflected light; 13, loss light; 14, penetrate light; 100, optoisolator; 101, optical fiber or formed body such as membranaceous; 102, core; 103, the grating face; 104, covering 1; 105, covering 2; 106, polymer film; 107, substrate; 108, three-dimensional optical waveguide.
Embodiment 1 will be dissolved in after the tetrahydrochysene cyclohexanone with the sodium that it is excessive that list is measured body relatively, and circulation was continued 6 hours in the back of dripping at leisure after dichloro cyclohexyl methyl silicomethane is mixed with 1: 1 molecule equivalent proportion dichloromethyl phenyl silicomethane.Afterwards polymkeric substance is taken out and carry out making its drying after the several times precipitation process.The molecular weight of the multipolymer that obtains like this is Mn=6 ten thousand.Be 0.15 millimeter optical fiber then with copolymerization silicon compound melt and dissolved diameter of making under 310 degree.Again this optical fiber is immersed 55% to taking out dry back in the Ethenylbenzene solution as sample.
The refractive index of the copolymerization silicon compound of pre-irradiation is 1.65, shines that its refractive index will reduce by 0.04 after two minutes.Establishing the light wavelength lambda that is transmitted again is 1.3 microns, and the refractive index of covering 1 is n 1=1.55, the refractive index of covering 2 is n 2=1.53, the interval Λ that can calculate grating is 0.64 micron, and its angle of inclination beta is 48.2 degree.
Optical fiber (101) is fixed on after two-way moving bolster (5) shown in Figure 4 goes up, with wavelength be helium-cadmium ultraviolet laser (1) of 325 millimicrons through beam splitter (3) beam splitting, after catoptron (4) reflection, shine on the optical fiber again.Because know the isolation that will keep stable by calculating, the error of grating slope angle β (10) must be controlled at below 0.2 degree, has therefore shone two minutes after the Laser emission light path system has been carried out accurate adjustment.Si-Si key along with illuminated part in the optical fiber is cut off like this, and its refractive index generating period ground descends, and forms the grating (103) shown in Fig. 3 a.Meanwhile, cut Si-Si key combines with the divinyl benzene radical that generates because of rayed again and forms network structure.
Coat the methylbenzene solution of 30% copolymerization silicon compound again on the surface of the optical fiber that forms oblique raster, after drying, be fixed on the device shown in Fig. 5 a (5), use annular vitalight lamp (6) from around shone for 30 seconds, shown in Fig. 3 b, around grating, formed covering 1 (104).At this moment original optical fiber then is equivalent to core (102) and is left.The suffered luminous energy of optical fiber surface is 50 milliwatt/square centimeters during irradiation, and ultraviolet centre wavelength is 315 millimicrons.Then in order only to allow the top of grating be shone, leave screen diaphragm (8) cover in 0.12 millimeter slit on one optical fiber after, shone 3 minutes with the vitalight lamp (9) of Fig. 5 b, formed the lower covering 2 (105) (Fig. 3 c) of refractive index.Core diameters approximately is 10 microns.
Be that the loss during from right-hand member (Fig. 3) incident of optical fibre light isolator (100) of 1.3 microns semiconductor laser is 0.45dB with wavelength, the loss during from left side incident is 36dB.In other words, compare basically and can ignore with the transmission loss that is the incident light of left end face the other way around, promptly had isolation characteristic from the transmission loss of the laser of the right-hand member incident of optical fiber.Consequently the light from semiconductor laser emission can pass through optical fiber, but its reflected light but can not be transmitted and reenters laser inside.Embodiment 2 is that polymethyl-benzene base silane melt and dissolved diameter of making under 320 degree of Mn=5 ten thousand is 0.15 millimeter a optical fiber with molecular weight.This optical fiber is fixed on the irradiation unit of Fig. 6, using two wavelength is that 625 millimicrons red laser (1) is to its irradiation again.For will shielding diaphragm, the grating shown in formation Fig. 3 a covers on optical fiber top.The diameter of laser beam is poly-after 10 microns by condenser (2), shines from different angles in the internal chiasma of optical fiber for making two laser beams.Made every two minutes during irradiation optical fiber relatively and laser move axially 0.2 millimeter along optical fiber.Because of the refractive index of the polymethyl-benzene base silane of pre-irradiation is 1.68, shine that its refractive index will reduce by 0.05 after two minutes, establishing the light wavelength lambda that is transmitted again is 1.3 microns, presses the illuminate condition of precedent, the interval Λ of its grating is 0.53 micron, and the angle of inclination beta of grating is 37.7 degree.
Then be fixed on the device shown in Fig. 5 a, use vitalight lamp from around shone for 30 seconds, shown in Fig. 3 b, around grating, form covering 1, simultaneously the core of portion's formation within it.For allow the bottom of grating shone and with the screen diaphragm with on its cover, shone with the irradiation unit of Fig. 5 b again and formed the lower covering 2 (Fig. 3 c) of refractive index in 3 minutes.Be that the result that 1.3 microns laser is tested this optical fibre light isolator is that forward loss is 0.5dB with wavelength, reverse anchor jam nut is 34dB.The polymethyl-benzene base silane optical fiber surface that embodiment 3 makes at embodiment 2 is coated with last layer polyvinylidene fluoride (molecular weight Mn=53 ten thousand).Because polyvinylidene fluoride does not absorb in ultraviolet spectral range, so not overslaugh uses UV-irradiation at the inner grating that forms of formed body.Moreover because of the refractive index of polyvinylidene fluoride is 1.42,1.68 little a lot of than polymethyl-benzene base silane can directly be used as covering.
This optical fiber is fixed on the irradiation unit of Fig. 4, the interval Λ of grating is 0.46 micron, and the angle of inclination beta of grating is 20.6 degree.The use wavelength is that helium-cadmium ultraviolet laser of 325 millimicrons shone two minutes it.Then be fixed on the device shown in Fig. 5 b, be 1.51 with the screen diaphragm with the refractive index of having shone 10 minutes illuminated parts after on the other parts cover in order only to allow the bottom of grating be shone, and formed covering 1 (Fig. 3 c).Be that the result that 1.3 microns laser is tested this optical fibre light isolator is that forward loss is 0.34dB with wavelength, reverse anchor jam nut is 37dB.Embodiment 4 will connect naphthols and be dissolved in after the tetrahydrochysene cyclohexanone, after methacrylate chlorine fat is maintained zero degree and drips at leisure, continue at room temperature to stir 24 hours.Through washing, single amount body being imposed free radical polymerization after refining, to have obtained molecular weight be that the polyisobutylene acid of Mn=33 ten thousand connects naphthols fat.Its refractive index is 1.57.With this polymkeric substance melt and dissolved diameter of making under 330 degree is 0.15 millimeter optical fiber.This optical fiber is fixed on the irradiation unit of Fig. 4, the use wavelength is that helium-cadmium ultraviolet laser of 325 millimicrons has shone two minutes it, makes it form the grating shown in Fig. 3 a.This situation is that the spatial structure of illuminated part changes and causes its refractive index to descend and then form grating.After coating 30% polymethyl methyl fat (refractive index is 1.49) solution drying, the surface of the optical fiber that forms oblique raster is fixed on the device shown in Fig. 5 b again, in order only to allow the bottom of grating be shone, and after on the other parts cover, shone 2 minutes with the screen diaphragm.The refractive index of illuminated part rises to 1.5 and formed covering 1 (Fig. 3 c).Because of the refractive index on top not accident be equivalent to covering 2.
The refractive index of the polyisobutylene acid dinaphthol fat that this embodiment uses is 1.57, and shining 1 minute its variable quantity is 0.05.In fact as covering 2 be poly-methyl isobutylene methyl fat, so the interval Λ of grating is 0.5 micron, the angle of inclination beta of grating is 29.9 degree.Be that the result that 1.3 microns laser is tested this optical fibre light isolator is that forward loss is 1.65dB with wavelength, reverse anchor jam nut is 25dB.Embodiment 5 inserts alpha-alpha-dimethyl aminophenyl-N-phenyl nitron on the side chain of poly-three fluoro methyl polyacrylates, obtain the superpolymer that molecular weight is Mn=23 ten thousand.Its refractive index is 1.54.With this polymkeric substance melt and dissolved diameter of making under 280 degree is 0.15 millimeter optical fiber.
Use the same device of embodiment 1, the interval Λ of grating is 0.5 micron, and the angle of inclination beta of grating is 25 degree, has shone 1 minute.Then be fixed on the device shown in Fig. 5 b, in order only to allow the top of grating be shone, and after leaving on the screen diaphragm cover in 0.12 millimeter slit with one optical fiber, shine and made it form the lower covering 2 (Fig. 3 c) of refractive index in 3 minutes.The result who uses the laser of 1.3 microns of wavelength to test to this optical fibre light isolator is: forward loss is 0.47dB, and reverse anchor jam nut is 32dB.Embodiment 6 uses optoisolator for making to touch more, is 0.25 millimeter optical fiber with the polymethyl-benzene base silane at the 320 melt and dissolved diameters of making under spending.This optical fiber is fixed on the irradiation unit of Fig. 4, because of optical wavelength transmission is 0.65 micron, so the interval Λ of its grating is 0.24 micron, the angle of inclination beta of grating is 33.2 degree again.For reduce its change of refractive amount irradiation time cripetura be 50 seconds its refractive index will reduce by 0.03.
Then be fixed on the device shown in Fig. 5 a, use vitalight lamp from irradiation all around.Shown in Fig. 3 b, around grating, form covering 1, portion forms core within it.So only shone for 50 seconds in order to reduce the former difference of refractive index must being controlled in the minimum zone of modulus.Refractive index at this condition under-clad layer 1 is 1.61.Then with on the screen lower cover of diaphragm with grating, shone 3 minutes with the irradiation unit of Fig. 5 b, formed the lower covering 2 (Fig. 3 c) of refractive index.Core diameters is 50 microns.Using wavelength is that 0.65 micron semiconductor light-emitting-diode is directly from the end incident of this optical fibre light isolator.The result who tests is: forward loss is 0.8dB, and reverse anchor jam nut is 25dB.More this presentation of results utilizes present technique can produce very simply to touch and uses optoisolator.In other words by the control rayed time, if its core is accomplished to can be used as the single mode optoisolator below 10 microns; If cripetura irradiation time then its core can be accomplished tens of micron is used optoisolator and form to touch more.In addition, in order to guarantee to touch isolation effect, can make the refringence between core and covering as much as possible little with optoisolator more.Usually refringence is controlled at below 1%, can reduces modulus effectively.
The situation of optical-waveguide-type optoisolator too, if promptly the thickness of film is accomplished below 10 microns, even the amplitude broad point of waveguide uses as the single-mode optics isolator too.If when thickness is accomplished that tens of microns are above, then can form to touch more and use optoisolator.Embodiment 7 is dissolved in the polymethyl-benzene base silane after the methylbenzene that to obtain concentration after the insolubles Lu removed be 30% solution.Then with this solution and 55% to divinylbenzene solution in polymethyl-benzene base silane comparison divinylbenzene be 50: 1 ratio mixed after, using spin-coating method is that to make thickness on 1.56 the glass (107) be 7 microns film (106) in refractive index.This film is fixed on the irradiation unit of Fig. 4, the interval Λ that adjusts its grating is 0.49 micron, and angle of inclination beta is 31.8 degree.Because of will being made in grating the center section of film, so formed the grating shown in Fig. 7 a in two minutes with shining again after on other part covers with shielding diaphragm.Then, form the optical waveguide shown in Fig. 7 b 30 seconds with having shone on the grating cover and use another kind of screen diaphragm instead in order only to allow the both sides of grating be shone.
On the surface of the optical waveguide that forms, again the poly-silicon compound solution of above-mentioned preparation is spin-coated as the thin layer (Fig. 7 c) of 3 micron thickness.Whole thin layer has been shone the three-dimensional optical waveguide (108) that forms for 30 seconds shown in Fig. 7 d.The glass substrate of its underpart then is equivalent to covering 2, so three-dimensional waveguide type optoisolator of making like this and above-mentioned optical fibre light isolator have same isolation effect.It is that result that 1.3 microns semiconductor laser the is tested loss when being left end (forward) incident from Fig. 7 is 0.45dB that this three-dimensional waveguide type optoisolator is used wavelength, and the loss during from right-hand member (oppositely) incident is 36dB.It is that to make thickness on 1.51 the tygon substrate be 7 microns film in refractive index that embodiment 8 will use spin-coating methods at the prepared polymethyl-benzene base silane solution of embodiment 7, sticks the thin plate of one piece of polyvinylidene fluoride system again on film.This three-decker film is fixed on the irradiation unit of Fig. 4, has formed the grating shown in Fig. 7 a based on same condition irradiation two minutes according to the method for embodiment 7.
Then, 90 seconds were shone in its both sides, made the refractive index of illuminated part become 1.51 with shielding diaphragm with on the grating cover.Owing to the refractive index of tygon and polyvinylidene fluoride can not change because of rayed, the result is that the refractive index of polymethyl-benzene base silane reduces, so form the three-dimensional optical waveguide shown in Fig. 7 d.The tygon substrate of its underpart then is equivalent to covering 1, and the polyvinylidene fluoride substrate on top then is equivalent to covering 2, so three-dimensional waveguide type optoisolator of making like this and above-mentioned optical fibre light isolator have same isolation effect.It is that the result that 1.3 microns semiconductor laser is tested is that this waveguide type optoisolator is used wavelength: during from right-hand member (forward) incident of Fig. 7, its loss is 0.8dB, and during from left end (oppositely) incident, its loss is 28dB.Embodiment 9 is that 20,000 polymethyl-benzene base silane is miscible in 1: 1 ratio and poly-methyl methacrylate base fat with molecular weight, and its refractive index is 1.58.Be spin-coated on refractive index then and be that to make thickness on 1.51 the tygon substrate be 7 microns film, on film, stick the thin plate of one piece of polyvinylidene fluoride system again.Condition by embodiment 8 has been made optoisolator.Be that the result that 1.3 microns laser is tested this waveguide type optoisolator is that forward loss is 0.55dB with wavelength, reverse anchor jam nut is 24dB.
Experiment showed, that polyacrylic acid lipid superpolymer all can be mixed with ratio arbitrarily with the polymethyl-benzene base silane.Moreover, the poly-silicon compound shown in the chemical structural formula 1 to 4 all equally can be mixed mutually with polyacrylic acid lipid.For example the polymethyl-benzene base silane all can obtain desirable effect to the ratio of poly-methyl methacrylate base fat usually between 1: 9 to 9: 1.The mixed solution that is not limited to of poly-silicon compound and polyacrylic acid lipid superpolymer can mix under the condition of fusion too.For example, with polymethyl-benzene base silane and poly-methyl methacrylate base fat 320 degree can drawing optic fibre after the fusion to the conditions of 330 degree or cast molding be sheet material.It is that to make thickness on 1.61 the glass plate be 100 microns rete that embodiment 10 usefulness casting mouldings are molded over refractive index with the polymethyl-benzene base silane, sticks one deck refractive index again in the above and be the thin plate of 1.59 polystyrene system.As touching with optoisolator time transmission light wavelength is 0.65 micron more, and the calculated value of the interval Λ of its grating is 0.24 micron, and the angle of inclination beta of grating then is 32.7 degree.This three-decker film is fixed on the irradiation unit of Fig. 4, has formed the grating shown in Fig. 7 a by the irradiation of the method for embodiment 8.It is 30 seconds in order to reduce its change of refractive amount irradiation time cripetura here but.Then will shine and make for 50 seconds the refractive index of illuminated part reduce to 1.61 just gathering silicon compound again by glass plate on the grating cover with the screen diaphragm.The difference of refractive index is controlled in this scope can reduce modulus effectively.Making wavelength is that 0.65 micron semiconductor light-emitting-diode is directly from the end incident of waveguide type optoisolator.The result who tests is: the loss during from right-hand member (forward) incident of Fig. 7 is 1.2dB, and the loss during from left end (oppositely) incident is 25dB.More this result proof is utilized present technique to produce very simply to touch and is used the optical-waveguide-type optoisolator.Embodiment 11 usefulness casting mouldings are configured as the film of 1 millimeters thick with the polymethyl-benzene base silane, and are fixed on the irradiation unit of Fig. 6, shine by the method for embodiment 9 to have formed the grating shown in Fig. 7 a.Then along perpendicular to the direction (Fig. 7) of paper after the two sides of grating are shone 5 minutes respectively, above film, shone in turn 5 minutes again, shone below it that to form cross section wide in 3 minutes be 50 microns, height is 50 microns a core.Using wavelength is that 0.65 micron semiconductor light-emitting-diode is directly from the end incident of this waveguide type optoisolator.The result who tests is: the loss during from right-hand member (forward) incident of Fig. 7 is 0.6dB, and the loss during from left end (oppositely) incident is 28dB.Embodiment 12 usefulness casting mouldings are to make the film that thickness is 10 micron thickness on 1.61 the glass substrate in refractive index with the polymethyl-benzene base silane.Film is fixed on the irradiation unit of Fig. 6, has formed the grating shown in Fig. 7 a by the irradiation of the method for embodiment 10.Then the screen diaphragm has shone its both sides and makes for 50 seconds the refractive index of illuminated part reduce to 1.61 just on the upper cover of grating.Then it is enclosed in the glass rectangular tank and make the optical-waveguide-type optoisolator.At this moment the air layer above the waveguide is equivalent to covering 2.Using wavelength is that result that 1.3 microns laser is tested this optoisolator loss when being right-hand member (forward) incident from Fig. 7 is 0.5dB, and the loss during from left end (oppositely) incident is 31dB.It is that to make thickness on 1.56 the polycarbonate system substrate be 10 microns film in refractive index that embodiment 13 uses spin-coating method with polymethyl-benzene base silane solution, sticks the thin plate of another piece polycarbonate system again on film.Then as shown in Figure 8, along this three-decker film being shone, formed the grating shown in Fig. 8 a with the paper vertical direction.The bottom of then shining grating makes the refractive index of its illuminated part become 1.56, and the top of shining grating then makes the variations in refractive index to 1.53 of illuminated part form the three-dimensional optical waveguide shown in Fig. 8 b.At this moment grating top is equivalent to covering 2, and other periphery of grating then is equivalent to covering 1.It is that result that 1.3 microns semiconductor laser the is tested loss when being right-hand member (forward) incident from Fig. 1 is 0.5dB that this waveguide type optoisolator is used wavelength, and the loss during from left end (oppositely) incident is 28dB.
Make shading construction if will shield the grating of diaphragm here, and other parts are made the printing opacity structure, then oblique raster and covering 1 can be accomplished once-forming.14 pairs of films of making in embodiment 13 of embodiment along shown in Figure 8 shining with the paper vertical direction, have formed two optoisolators shown in Figure 2 by same condition.Covering 1 arranged on opposite sides of two optoisolators.The distance of the two is 1 millimeter.The refractive index of a wherein following optoisolator more top one high by 0.005.Being positioned at top optoisolator, only to allow wavelength be that light wave beyond 0.85 micron passes through; Being positioned at following optoisolator, then to allow wavelength be that 0.85 micron light wave passes through.When wavelength was respectively 1.55,1.3,0.85 microns light the left end of the optoisolator above being positioned at is injected simultaneously, the right-hand member of optoisolator had below been observed 0.85 micron ejaculation light.This illustrates that this assembling device possesses wavelength and selects and the optical branch function.
Certainly, equally also can make wavelength selection type photo-coupler.In addition, if with two optical fibre light isolators by the requirement mode arrange, can make wavelength selection type optical branching device or photo-coupler equally.
It must be emphasized that as the light of optoisolator delete between face and optical transmission direction angle β usually 0 to 90 the degree between.If be designed to 90 the degree, such element also can as wavelengths filters or with suitable device, for example delete the type optoisolator and be combined into optical branching device, optical coupling device etc. with light.In this case, covering 1 and covering 2 can have identical refractive index, also can have different refractive indexes.But no matter be optical-fiber type or optical-waveguide-type, the refractive index that the refractive index of covering 1 must be deleted face less than core and light.Embodiment 15 is 20,000 polymethyl-benzene base silane with molecular weight, and miscible to become refractive index be 1.58 solution in 1: 1 ratio and poly-methyl methacrylate base fat.With spin-coating method with this solution coat in refractive index be 1.49 poly-methyl methacrylate base fat to substrate after, press in the above again another piece poly-methyl methacrylate base fat to the substrate for using.At first will be carved with the screen diaphragm that right angle light deletes and cover on formed body, light beam is shone perpendicular to the surface of formed body, the right angle light that form an angle of inclination beta like this and be 90 degree are deleted.The both sides enforcement illumination that this light is deleted then is mapped to its refractive index and drops to till 1.49, forms first three-dimensional waveguide type light and deletes.This three-dimensional waveguide type light is deleted and only allowed wavelength is 1.55 microns light transmission.
Then apart from 1 millimeter place of first waveguide, made an optical transmission direction by the method for embodiment 13 and deleted the type optoisolator with the oblique light that the former is parallel to each other, the interval Λ that is positioned at the grating of its waveguide is 0.5 micron, and angle of inclination beta is 30 to spend.It is 1.3 microns light transmission that this optoisolator can allow wavelength.Wavelength is respectively 1.55,1.3 microns light injects simultaneously when having the waveguide that right angle light deletes, only observe 1.55 microns light at its ejecting end; And observed 1.3 microns light at the ejecting end of optoisolator.This illustrates that this assembling device possesses wavelength and selects and the optical branch function.
Embodiment described here only is the part of the experiment of doing, but enough technical characterictic of the present invention is described.Even being opened the technology shown and related some corrections of works such as material or improvement, the present invention all will be considered to be infringement to right of the present invention.
As mentioned above, as long as the present invention is to fibrous, film like or the tabular formed body that waits other shapes impose rayed earlier within it portion form one by the core that constitutes optoisolator, covering 1, covering 2 and grating index determined, grating be spaced apart Λ, the pitch angle is the grating of β.When then making their refractive index satisfy core>grating face>covering 1>covering 2 these relations with the surface of rayed formed body, forming one group of refractive index is nonaxisymmetrical covering 1 and covering 2.When light will can not be reflected during by the core of forward transmitted at the optoisolator that forms like this and directly passes through grating; In the time of in the other direction then by optical grating reflection after covering 1 emits to the outside goes.Thereby the result produces the characteristic that difference is greatly only allowed the light one-way transmission at optical waveguide forward and reverse light transmission coefficient.
Use technology of the present invention, needn't use magnetic crystalline solid and magnetite, the polarizer etc. and as long as in entire making process, press fixed condition, to containing refractive index is but that the polymer moulded bodies of light mutagen matter is implemented rayed and just can be finished, so not only autofrettage simply is beneficial to a large amount of productions, and the optical isolator structure that forms is simple, easy to use, and cost is low.Moreover, because light is deleted, core, covering all are to be made of the same formed body of same material, expand so can prevent the material that produces because of temperature variation, and because of and other devices between the noise that connection produced, thereby enhance product performance and stable.
Optoisolator in the past can only be used for single mode, and because the optical property of materials such as magnetic spar, reasons such as cost are limit, and the optoisolator that can be used in the visible-range does not almost have.Its range of application is confined to single mode communication and semiconductor laser emission coefficient, and its pairing wavelength coverage is generally between 0.85 micron to 1.55 microns.For example, touch communication field and use the aspects such as test macro, office machine, instrument, Household Electrical goods of visible light emitters then can not use more.But, since technical characterictic of the present invention be to polymer moulded bodies by fixed condition need only implement rayed and just can make optoisolator, as long as select suitable polymers, single mode optoisolator not only, as much is touched with optoisolator and also can be made easily.Therefore the present invention's optoisolator that can provide relates to the laser of the various wavelength that comprise that ultraviolet wavelength is above, and semiconductor light-emitting-diode is made nearly all emission coefficient of light source, communication system and other various fields.
Use technology of the present invention, the length of deleting because of oblique light just can obtain enough isolation effects below 1 millimeter usually, so multiple miniature optical-fiber type and optical-waveguide-type optoisolator can be provided.Therefore, requisite two dimension and three-dimensional light integrated circuit Primary Components such as wavelength division multiplexer spare, wavelengths filters, optical branching device, optical coupling device integrated and microminiaturized for example in the establishment of optical-fiber network, and the connection that such device and peripheral devices are for example transmitted the optical fiber, terminal part of usefulness etc. becomes easy, therefore not only can promote the harmony between each device, and can reduce because of the loss that connection brought between device.

Claims (16)

1. the autofrettage of an optical fibre light isolator is characterized in that comprising: making the light beam refractive index through beam splitting is n 0Polymer moulded bodies irradiation, the refractive index of bringing out illuminated position produces periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be β, cycle to be the engineering 1 of the grating of Λ; And rayed is carried out on the surface of above-mentioned formed body, thereby the variations in refractive index that makes its illuminated position till the journey 1 formed grating of before recording workpoints is to n 1, when forming covering 1, the refractive index of portion's formation within it is n again 0The engineering 2 of core; And the part surface of above-mentioned formed body carried out rayed, make the refractive index at its illuminated position till the journey 1 formed grating of before recording workpoints further be changed to n 2, and then form refractive index and covering 1 is the engineering 3 of nonaxisymmetrical covering 2.
2. the autofrettage of an optical fibre light isolator is characterized in that comprising: with light source the two-beam refractive index through beam splitting after of wavelength beyond the spectral range of formed body is n 0Polymer moulded bodies implement cross-fire, bring out its refractive index and produce periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be β, cycle to be the engineering 1 of the grating of Λ by the cross-fire position; And wavelength is shone the surface of above-mentioned formed body with interior light in the spectral range of formed body, thereby the variations in refractive index that makes its illuminated position till the journey 1 formed grating of before recording workpoints is to n 1, and when forming covering 1, the refractive index of portion's formation within it is n 0The engineering 2 of core; And wavelength carried out rayed with interior light to the part surface of above-mentioned formed body in the spectral range of formed body, thereby make the refractive index at its illuminated position till the journey 1 formed grating of before recording workpoints further be changed to n 2, and then form refractive index and covering 1 is the engineering 3 of nonaxisymmetrical covering 2.
3. the autofrettage of an optical fibre light isolator is characterized in that comprising: making the light beam refractive index through beam splitting is n 0Polymer moulded bodies irradiation, the refractive index of bringing out the illuminated position of its inside produces periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be β, cycle to be the engineering 1 of the grating of Λ; And the masking liquid that will contain polymkeric substance coats the engineering 2 of above-mentioned formed body outside surface, and rayed is carried out on the surface of the formed body handled through coating, thereby the variations in refractive index that makes its illuminated position till the journey 1 formed grating of before recording workpoints is to n 1, when forming covering 1, and the refractive index of portion's formation within it is n 0The engineering 3 of core, and the part surface of the above-mentioned formed body of handling through coating carried out rayed, thereby makes the refractive index at its illuminated position till the journey 1 formed grating of before recording workpoints further be changed to n 2, and then form refractive index and covering 1 is the engineering 4 of nonaxisymmetrical covering 2.
4. the autofrettage of the optical-waveguide-type optoisolator that to have claim 1 to each manufacturing engineering of recording and narrating of claim 3 be feature.
5. the autofrettage of an optical-waveguide-type optoisolator, it is characterized by: with refractive index is n 0Forming polymer be n in refractive index 1Substrate on engineering 1; And along becoming the β angle direction to carry out rayed with the table plane of formed body, the refractive index of bringing out irradiated polymkeric substance produces periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be β, cycle to be the engineering 2 of the grating of Λ; And delete the formed body of both sides and carry out rayed being positioned at light, the variations in refractive index that makes irradiated polymkeric substance is to n 1, the engineering 3 of formation covering 1; And rayed is carried out on the formed body surface that is parallel to substrate, make the refractive index of irradiated polymkeric substance further be changed to n 2, and then when to form refractive index and covering 1 be asymmetrical covering 2, and the formation refractive index is n 0The engineering 4 of three-dimensional waveguide.
6. the autofrettage of an optical-waveguide-type optoisolator, it is characterized by: with refractive index is n 0Forming polymer be n in refractive index 1Two-layer substrate between engineering 1; And carry out rayed along the direction vertical with the table plane of formed body, the refractive index of bringing out irradiated polymkeric substance produces periodically changes delta n, so form one with its optical transmission direction form an inclination angle be β, cycle are Λ's and light delete the engineering 2 of face perpendicular to the grating on moulding body surface plane; And delete the formed body of a side and carry out rayed being positioned at light, the variations in refractive index that makes irradiated polymkeric substance is to n 1, the engineering 3 of formation covering 1; And delete the formed body of opposite side and carry out rayed being positioned at light, make the refractive index of irradiated polymkeric substance further be changed to n 2, and then when to form refractive index and covering 1 be asymmetrical covering 2, and the formation refractive index is n 0The engineering 4 of three-dimensional waveguide.
7. the autofrettage of an optical-waveguide-type optoisolator, it is characterized by: with refractive index is n 0Forming polymer be respectively n in refractive index 1And n 2Two-layer substrate between engineering 1; Along becoming the β angle direction to carry out rayed with the table plane of formed body, the refractive index of bringing out irradiated polymkeric substance produces periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be β, cycle to be the engineering 2 of the grating of Λ; And delete the formed body of both sides and carry out rayed being positioned at light, the variations in refractive index that makes irradiated polymkeric substance is to n 1, and then when to form refractive index and covering 2 be asymmetrical covering 1, and the formation refractive index is n 0The engineering 3 of three-dimensional waveguide.
8. in the manufacturing engineering of preceding note oblique raster type optoisolator, the light source of use is: be contained in the polymer moulded bodies, desire with rayed bring out the material that its refractive index changes absorption spectrum maximum wavelength the wavelength more than two times or two times and have the autofrettage of the oblique raster type optoisolator of arbitrary feature that claim 1 recorded and narrated to the claim 7.
9. according to the oblique raster type optoisolator of claim 1 to claim 8, it is characterized by: the refractive index of core, grating face, covering 1 and covering 2 is respectively n 0, n r, n 1And n 2, satisfying n 0>n r>n 1>n 2The time, its light is deleted interval Λ and can be satisfied: Λ 22(n r-n 1)/(n 1(n r 2-n 2 2)); The angle β that while grating face is become with optical transmission direction can satisfy: cos β=(Λ 2(n r 2-n 2 2)+λ 2)/(2 λ Λ n r) (λ is the optical wavelength that is transmitted).
10. according to the oblique raster type optoisolator of claim 1 to claim 9, it is characterized by: employed formed body contains the whole or a part of Si-Si of the containing keys of a kind of main chain and/or side chain or the polymkeric substance of Si-C key at least.
11. according to the oblique raster type optoisolator of claim 1 to claim 9, it is characterized by: employed formed body is based on a kind of polymkeric substance, the available light of mixing more than one is in addition at least shone superpolymer, the oligomer that brings out its refractive index and change, perhaps low molecular compound, the inorganics particulate constitutes.
12. the autofrettage that optical-fiber type and optical-waveguide-type light are deleted is characterized by: having arbitrary illuminating method that claim 1 recorded and narrated to the claim 8 is n to containing refractive index 0The formed body of polymkeric substance shine, the refractive index of bringing out the illuminated position of its inside produces periodically changes delta n, and then forming one, to form an inclination angle with its optical transmission direction be that 90 degree, cycle are the engineering 1 of the grating of Λ; And rayed is carried out on the surface of formed body, thereby the variations in refractive index that makes its illuminated position till the journey 1 formed grating of before recording workpoints is to n 1, when forming covering 1, and the refractive index of portion's formation within it is n 0The engineering 2 of core.
13. the autofrettage of wavelength selection type optical branching device and photo-coupler is characterized by: 1, by the manufacturing engineering that claim 1 is recorded and narrated to each of claim 8, be n containing refractive index 0The formed body of polymkeric substance in make one to contain the inclination angle at core be 0<β<90 degree, cycle to be optical-fiber type or the waveguide type optoisolator that the light of Λ is deleted; 2, the manufacturing engineering of being recorded and narrated to each of claim 8 by claim 1, making one in same formed body, to contain the inclination angle at core be 0<β<90 degree, cycle to be optical-fiber type or the waveguide type optoisolator that the light of Λ is deleted, and the two is arranged in parallel along optical transmission direction mutually with appropriate intervals.
14. the autofrettage of wavelength selection type optical branching device and photo-coupler is characterized by: 1, by the manufacturing engineering that claim 1 is recorded and narrated to each of claim 8, be n containing refractive index 0The formed body of polymkeric substance in make one to contain the inclination angle at core be that 90 degree, cycle are optical-fiber type or the waveguide type grating of Λ; 2, the manufacturing engineering of being recorded and narrated to each of claim 8 by claim 1, making one in same formed body, to contain the inclination angle at core be 0<β<90 degree, cycle to be optical-fiber type or the waveguide type optoisolator that the light of Λ is deleted, and the two is arranged in parallel along optical transmission direction mutually with appropriate intervals.
15. according to wavelength selection type optical branching device and the photo-coupler of claim 13 to claim 14.
16. wavelength selection type optical branching device and photo-coupler is characterized by and contain at least that any one is above according to the optoisolator of claim 1 to claim 11, and along optical transmission direction arrangement parallel to each other.
CN 01109388 2001-03-06 2001-03-06 Oblique raster type light isolator and its preparing process Pending CN1373373A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101228483B (en) * 2005-06-03 2010-05-26 诺基亚公司 General use diffraction optics method for expanding exit pupil
CN102621634A (en) * 2012-04-10 2012-08-01 北京交通大学 Optical fiber circulator based on blazed fiber bragg gratings
CN102621635A (en) * 2012-04-10 2012-08-01 北京交通大学 Optical fiber isolator based on blazed fiber bragg gratings
CN102621636A (en) * 2012-04-11 2012-08-01 北京交通大学 Optical fiber isolator based on twin-core optical fibers
CN113589434A (en) * 2021-08-04 2021-11-02 南京科天光电工程研究院有限公司 Novel polarization-independent optical isolator

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101228483B (en) * 2005-06-03 2010-05-26 诺基亚公司 General use diffraction optics method for expanding exit pupil
CN102621634A (en) * 2012-04-10 2012-08-01 北京交通大学 Optical fiber circulator based on blazed fiber bragg gratings
CN102621635A (en) * 2012-04-10 2012-08-01 北京交通大学 Optical fiber isolator based on blazed fiber bragg gratings
CN102621636A (en) * 2012-04-11 2012-08-01 北京交通大学 Optical fiber isolator based on twin-core optical fibers
CN113589434A (en) * 2021-08-04 2021-11-02 南京科天光电工程研究院有限公司 Novel polarization-independent optical isolator

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