CN1346790A - Process for synthesizing nano-size uniform mesoporous silicon oxide ball separating agent - Google Patents

Process for synthesizing nano-size uniform mesoporous silicon oxide ball separating agent Download PDF

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Publication number
CN1346790A
CN1346790A CN 01126877 CN01126877A CN1346790A CN 1346790 A CN1346790 A CN 1346790A CN 01126877 CN01126877 CN 01126877 CN 01126877 A CN01126877 A CN 01126877A CN 1346790 A CN1346790 A CN 1346790A
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China
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silicon oxide
water
tensio
active agent
mixed solvent
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CN 01126877
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CN1173885C (en
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赵东元
罗骞
屠波
周亚明
李莉
薛志元
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Fudan University
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Fudan University
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Abstract

A process for preparing nano-size silicon oxide spheres with uniform mesopores and used as separating agent includes mixing organic solvent with water, adding ammonia water as catalyst, coassembling surfactant as structure guiding agent and inorganic silicon material to obtain micro spheres and removing surfactant at high temp. Its product can be used for adsorption, separation and optical material.

Description

The synthetic method of the uniform mesoporous silicon oxide ball separating agent of nano-scale
Technical field
The invention belongs to material field, inorganic hole, be specifically related to a kind of method for preparing the uniform mesoporous silicon oxide ball separating agent of nano-scale.
Technical background
The hole material is widely used at aspects such as catalysis, separation, absorption.In order to adapt to some macromolecular catalyzed reactions, and the application of aspects such as separation, absorption, need to use the bigger hole material in aperture.And mesoporous material since the aperture between 2---30nm, and synthetic simple, thereby can use in these areas.When being applied to the separation aspect, especially when being applied to instrument such as chromatogram, need to use the spheric mesoporous material.People can synthesize the spherical material of some mesopore silicon oxides.But the diameter of energy synthetic mesopore silicon oxide spheres is mostly between 2 to 6 μ m and 0.1 to 2mm at present.The synthetic mesoporous ball of diameter below 1 μ m can be filled up this blank.In addition, the mesoporous ball that 1 μ m is following is because its diameter in the light wavelength scope, makes it also can be widely used at optical field.
Summary of the invention
The objective of the invention is to propose a kind of method of uniform mesoporous silicon oxide ball separating agent that can the synthesis of nano size.
The method of the uniform mesoporous silicon oxide ball separating agent of the synthesis of nano size that the present invention proposes, be in the mixed solvent of organic solvent and water, under the katalysis of ammoniacal liquor, with the tensio-active agent is structure directing agent, be assembled into bead altogether with the inorganic silicon material with the sight ordered structure that is situated between, slough tensio-active agent under the high temperature, promptly obtain a kind of even mesoporous silicon oxide ball that has as template.Concrete steps are as follows:
(1) under 40-60 ℃ of condition, tensio-active agent cetyl trimethylammonium bromide (CTAB) is dissolved in organic solvent N, in the mixed solvent of dinethylformamide (DMF) and water.Be cooled to room temperature;
(2) an amount of ammoniacal liquor and tetraethoxy are joined in the solution, electromagnetism at the uniform velocity stirred 16---25 hour, and is complete substantially until reaction.Each component consumption mol ratio is SiO 2: CTAB: NH 3: DMF: H 2O=1: (0.12---0.30): (0.85---7.35): (9.6---34.2): (72.2---172.2);
(3) the solution filtration is obtained white powder, water repetitive scrubbing 2-5 time.It is dry to put into vacuum then;
(4) with dried silica material 500-600 ℃ of roasting, slough tensio-active agent, obtain mesopore silicon oxide spheres.
In the present invention, adopted organic solvent N, the mixed solvent of dinethylformamide (DMF) and water.The composition of mixed solvent and proportioning can be influential to the shape and the size of mesopore silicon oxide spheres.Change the proportioning of mixed solvent, can change the size of resulting mesopore silicon oxide spheres.During the synthesizing mesoporous monox bead, the tensio-active agent cetyl trimethylammonium bromide, organic solvent N, dinethylformamide (DMF) and water, ammoniacal liquor, the ratio of tetraethoxy in synthetic can change in a bigger scope.Keep the gross weight constant (for example being 38 grams) of solvent, the relative proportioning of regulating two solvents is worked as N, and dinethylformamide (DMF) is 25 grams, and when water was 13 grams, the diameter of the silicon oxide ball of acquisition can reach 800nm.Work as N, the amount of dinethylformamide (DMF) reduces, and during corresponding increases of the amount of water, the diameter of the silicon oxide that obtains reduces, and at N, dinethylformamide (DMF) reduces to 7 grams, and the amount of water is increased to 31 when restraining, and the diameter of silicon oxide can reduce to 80nm.
In the present invention, adopted the catalyzer of ammoniacal liquor during the synthetic silica ball as hydrolysis reaction.The amount of ammoniacal liquor can influence the size of resulting ball.At organic solvent N, the ratio one of dinethylformamide (DMF) and water regularly increases the amount of ammoniacal liquor, and the diameter of the silicon oxide bead that synthesizes can increase thereupon.
In the present invention, should keep the stirring velocity of magnetic stirrer constant in the building-up process.Stirring at the uniform velocity is also influential to the silicon oxide bead that generates the diameter homogeneous.When low whipping speed was very fast, the diameter of resulting silicon oxide ball can have increase slightly.
In the present invention, adopted tensio-active agent cetyl trimethylammonium bromide (CTAB) as structure directing agent, under the catalysis of ammoniacal liquor, silicon oxide that teos hydrolysis obtains and cetyl trimethylammonium bromide (CTAB) are assembled into to be situated between altogether sees ordered structure.Owing to the effect and the even stirring condition of organic solvent, resulting mesopore silicon oxide spheres has uniform spherical, and has the mesopore orbit structure of similar mesoporous material MCM-41 simultaneously.Mesopore silicon oxide spheres has the diameter of homogeneous and can be found out by scanning electronic microscope (SEM) and transmission electron microscope (TEM).Nitrogen adsorption--desorption experiment (BET) result shows that resulting mesopore silicon oxide spheres has the high specific surface and the pore size distribution of homogeneous.Surfactant A ldrich P123 (molecular-weight average 5800, EO have been adopted 20PO 70EO 20) during as structure directing agent, the aperture of resulting mesopore silicon oxide spheres reaches 10nm.This shows, change structure directing agent, can change mesoporous aperture in the resulting mesoporous ball as template.
In the present invention, we also can with the product of step (2) 100 ℃ of hydrothermal treatment consists 24-48 hour.By X-ray diffraction (XRD) collection of illustrative plates as can be known, through after the hydrothermal treatment consists, resulting mesopore silicon oxide spheres has more orderly meso-hole structure.
Embodiment
The invention will be further elaborated for following Application Example:
Embodiment 1, and stirring and dissolving is at 19 gram N under low-grade fever with 0.8 gram tensio-active agent cetyl trimethylammonium bromide (CTAB), and dinethylformamide (DMF) and 19 restrains in the mixed solvent of water.Be cooled to room temperature.
1.0 gram strong aquas are joined in the solution, then with in the disposable apace adding solution of 2.08 gram tetraethoxys.Electromagnetism at the uniform velocity stirs under the room temperature, and stirring velocity remains on 480 rev/mins.Stir after 16---25 hour, react complete substantially.Stop to stir.
Product is transferred in the bottle of tetrafluoroethylene, is placed in the baking oven of 100 degree hydrothermal treatment consists 24 hours.
White mixture after the hydro-thermal is filtered, obtain white powder, the water repetitive scrubbing for several times.It is dry to put into vacuum drier then.
Dried silica material 550 ℃ of roastings 5 hours, is sloughed tensio-active agent, obtain mesopore silicon oxide spheres.
From scanning electronic microscope (SEM) photo as seen, the diameter of resulting mesopore silicon oxide spheres is about 200 nanometers.X-ray diffraction (XRD) collection of illustrative plates of sample shows before the roasting, and silicon oxide ball has the similar ordered structure with MCM-41.After the roasting, the degree of order of sample descends to some extent.Transmission electron microscope (TEM) collection of illustrative plates shows, the diameter homogeneous of mesopore silicon oxide spheres, and surface arrangement the hole that hexagonal is arranged, and the aperture coincide with the result (3.1nm) of nitrogen adsorption-desorption experiment (BET) about 3.0nm.From the result of nitrogen adsorption-desorption experiment (BET) also as can be known, mesopore silicon oxide spheres has high specific surface, reaches 1020 meters squared per gram.
Embodiment 2, and each process, reagent just change the relative proportion of solvent all by embodiment 1 program, and the mol ratio that changes each reagent of back is: 1SiO 2: 0.22 CTAB: 1.5NH 3: 34.2DMF: 72.2H 2O.
At this moment, the diameter of resulting mesopore silicon oxide spheres is about 800 nanometers.And the result of aperture, structure and embodiment 1 is close.
Embodiment 3, and each process, reagent change the relative proportion of solvent all by embodiment 1 program, and the mol ratio that changes each reagent of back is: 1SiO 2: 0.22CTAB: 1.5NH 3: 9.6DMF: 172.2H 2O.
The diameter of the mesopore silicon oxide spheres that obtains is about 80nm.The result of aperture, structure and embodiment 1,2 is close.
Embodiment 4, and each process, reagent change the amount of ammoniacal liquor all by embodiment 1 program, and the mol ratio that changes each reagent of back is: 1SiO 2: 0.22CTAB: 0.85NH 3: 26.0DMF: 106.0H 2O.
The diameter of the mesopore silicon oxide spheres that obtains is about 150nm.

Claims (3)

1, a kind of synthetic method of uniform mesoporous silicon oxide ball separating agent of nano-scale, it is characterized in that in the mixed solvent of organic solvent and water, under the katalysis of ammoniacal liquor, with the tensio-active agent is structure directing agent, be assembled into bead altogether with the inorganic silicon material with the sight ordered structure that is situated between, slough the tensio-active agent as template under the high temperature, obtain a kind of even mesoporous silicon oxide ball that has, concrete steps are as follows:
(1) under 40-60 ℃ of condition, the tensio-active agent cetyl trimethylammonium bromide is dissolved in organic solvent N, in the mixed solvent of dinethylformamide and water, is cooled to room temperature;
(2) an amount of ammoniacal liquor and tetraethoxy are joined in the solution, electromagnetism at the uniform velocity stirred 16---25 hour, and complete substantially until reaction, each amounts of components mol ratio is SiO 2: CTAB: NH 3: DMF: H 2O=1: (0.12---0.30): (0.85---7.35): (9.6---34.2): (72.2---172.2);
(3) the solution filtration is obtained white powder, water repetitive scrubbing 2-5 time, it is dry to put into vacuum then;
(4) with dried silica material 500-600 ℃ of roasting, slough tensio-active agent, obtain mesopore silicon oxide spheres.
2, synthetic method according to claim 1 is characterized in that under the constant situation of the mixed solvent total amount of organic solvent and water, with the proportioning that changes mixed solvent, changes the size of mesopore silicon oxide spheres.
3, synthetic method according to claim 1, it is characterized in that also can be at 100 ℃ of hydrothermal treatment consists 24-48 hours to the product of step (2).
CNB011268778A 2001-09-26 2001-09-26 Process for synthesizing nano-size uniform mesoporous silicon oxide ball separating agent Expired - Fee Related CN1173885C (en)

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7244657B2 (en) 2002-11-13 2007-07-17 Shin-Etsu Chemical Co. Ltd. Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
CN1329293C (en) * 2005-06-17 2007-08-01 朱广山 Ultrasonic method for synthesizing mesoporous monox nanometer ball carrier material
CN100366533C (en) * 2003-07-29 2008-02-06 株式会社德山 Mesoporous silica particles and production process thereof
CN100369672C (en) * 2005-12-14 2008-02-20 中国科学院山西煤炭化学研究所 Organic and inorganic conjugated solid acid preparation method
CN1816493B (en) * 2003-06-11 2010-04-28 浦项产业科学研究院 Method for fabricating a porous silica sphere
CN102126729A (en) * 2011-01-26 2011-07-20 大连理工大学 Method for preparing nanoscale spherical silicon-based mesoporous materials and controlling grain size and topography
CN101205420B (en) * 2007-12-06 2012-01-18 复旦大学 Magnetic inorganic nano-particle/ordered meso-porous silica core-shell microspheres and preparation thereof
CN102942721A (en) * 2012-10-26 2013-02-27 武汉工程大学 Nanometer white carbon black reinforced styrene-butadiene rubber composite material preparation process
CN109796019A (en) * 2019-02-21 2019-05-24 华中科技大学 A kind of hollow silicon dioxide nanosphere and its preparation method and application
CN113401913A (en) * 2021-07-30 2021-09-17 陕西科技大学 Hierarchical pore SiO2Microsphere material and preparation method and application thereof

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7244657B2 (en) 2002-11-13 2007-07-17 Shin-Etsu Chemical Co. Ltd. Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
US7405459B2 (en) 2002-11-13 2008-07-29 Shin-Etsu Chemical Co. Ltd. Semiconductor device comprising porous film
CN1816493B (en) * 2003-06-11 2010-04-28 浦项产业科学研究院 Method for fabricating a porous silica sphere
US7959728B2 (en) 2003-07-29 2011-06-14 Tokuyama Corporation Mesoporous silica particles and production process thereof
CN100366533C (en) * 2003-07-29 2008-02-06 株式会社德山 Mesoporous silica particles and production process thereof
CN1329293C (en) * 2005-06-17 2007-08-01 朱广山 Ultrasonic method for synthesizing mesoporous monox nanometer ball carrier material
CN100369672C (en) * 2005-12-14 2008-02-20 中国科学院山西煤炭化学研究所 Organic and inorganic conjugated solid acid preparation method
CN101205420B (en) * 2007-12-06 2012-01-18 复旦大学 Magnetic inorganic nano-particle/ordered meso-porous silica core-shell microspheres and preparation thereof
CN102126729A (en) * 2011-01-26 2011-07-20 大连理工大学 Method for preparing nanoscale spherical silicon-based mesoporous materials and controlling grain size and topography
CN102126729B (en) * 2011-01-26 2012-12-26 大连理工大学 Method for preparing nanoscale spherical silicon-based mesoporous materials and controlling grain size and topography
CN102942721A (en) * 2012-10-26 2013-02-27 武汉工程大学 Nanometer white carbon black reinforced styrene-butadiene rubber composite material preparation process
CN102942721B (en) * 2012-10-26 2014-10-15 武汉工程大学 Nanometer white carbon black reinforced styrene-butadiene rubber composite material preparation process
CN109796019A (en) * 2019-02-21 2019-05-24 华中科技大学 A kind of hollow silicon dioxide nanosphere and its preparation method and application
CN109796019B (en) * 2019-02-21 2020-12-15 华中科技大学 Hollow silicon dioxide nanosphere and preparation method and application thereof
CN113401913A (en) * 2021-07-30 2021-09-17 陕西科技大学 Hierarchical pore SiO2Microsphere material and preparation method and application thereof

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