CN1328757C - Gas processing equipment having clearing device - Google Patents
Gas processing equipment having clearing device Download PDFInfo
- Publication number
- CN1328757C CN1328757C CNB2004100817771A CN200410081777A CN1328757C CN 1328757 C CN1328757 C CN 1328757C CN B2004100817771 A CNB2004100817771 A CN B2004100817771A CN 200410081777 A CN200410081777 A CN 200410081777A CN 1328757 C CN1328757 C CN 1328757C
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- gas treatment
- treatment trough
- gas
- lautertuns
- deposit
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Abstract
The present invention relates to a gas treatment device which at least comprises a first processing groove, a second processing groove, a sediment removing device, a bearing groove and a gas outlet, wherein the first processing groove is provided with a gas inlet, and the second processing groove is adjacent to the first processing groove and provided with a nozzle device; the sediment removing device is adjacent to the first processing groove and provided with a first side surface which is used for forming at least a part of side wall of the first processing groove, the sediment removing device comprises a scraper and a control mechanism, wherein the a scraper is arranged on the first side surface and faced to the inner side of the first processing groove, and the control mechanism is arranged on the first side surface and faced to the outer side of the first processing groove in order to control the operation of the scraper; the bearing groove is communicated with the lower parts of the first processing groove and the second processing groove, and the gas outlet is communicated with the second processing groove.
Description
Technical field
The present invention relates to a kind of gas treatment equipment with deposit scavenge unit, and be particularly related to a kind of can be rapidly and keep the choke free gas treatment equipment of gas treatment chamber interior effectively.
Background technology
In semiconductor technology, the product that some consersion unit such as etching machines or chemical vapor depsotition equipment etc. produced needs before discharging through handling again.With the etching machines is example, and the auxiliary device that is attached thereto for example gas treatment equipment is to be used for handling the waste gas that etching process produces.And this gas treatment equipment can produce deposit in use for some time, therefore need clean in order to avoid sedimental accumulation makes the gas treatment equipment internal blocking.Please refer to Fig. 1, it is described is a kind of schematic diagram of gas treatment equipment of traditional etching machines.Gas treatment equipment 100 comprises a gas treatment chamber 10 and three first, second and the 3rd lautertuns 12,14,16 with a plurality of filter balls.The top of first, second lautertuns 12,14 has spray nozzle device 112,114 can spray aqueous vapor downwards.Gas treatment equipment 100 outer setting one Pressure gauge (not shown) is with the display unit pressure inside.The reacting gas of dry-etching such as common chlorine (Cl
2), sulfur fluoride (SF
6), oxygen (O
2), hydrogen (H
2) etc., waste gas that its reaction back is produced 101 enters gas treatment equipment 100 from entering the mouth.The waste gas that reaction is produced can be prior to gas treatment chamber 10 and aqueous vapor reaction after entering gas treatment equipment 100, and the reactant of generation can fall in the pond of below, but also can be deposited on the wall of gas treatment chamber 10.Then the waste gas of these treated mistakes can be done further filtration via first, second and the 3rd lautertuns 12,14,16 again, just is disposed to the external world via outlet 103 after reaching environmental standard and ISO standard.
Yet the reactant that is produced with the aqueous vapor reaction in gas treatment chamber 10 itself blocks gas treatment chamber 10 through regular meeting.Its former because this reaction product on the wall that is deposited on gas treatment chamber 10, also be deposited on of connection place of gas treatment chamber 10 belows especially easily, for example among the figure shown in the position of deposit 102 near first lautertuns 12.When deposit 102 more and more thicker and when making the cavity (cross-sectional area) of gas treatment chamber 10 more and more narrow; the waste gas of treated mistake will be not easy to enter first lautertuns 12 from gas treatment chamber 10; gauge hand on the equipment 100 descends at this moment, and operating personnel must shut down to carry out cleaning.Cleaning maintenance frequency is decided on the process frequency, generally speaking approximately per two weeks needs maintenance downtime at least once, and each maintenance takes about 2 hours from start to end, not only expends time in, also waste of manpower.
Traditional gas treatment equipment outside has only slight preventive maintenance (PreventiveMaintenance, PM) window.After the shutdown, the cleanup crew stretches into hand after dressing vest, goggles and acid-proof gloves from the PM window, to grab out deposit.Because traditional PM window all too is little, quite inconvenience when cleaning.And too small PM space causes the overlong time of maintaining, and whole gas treatment chamber interior can't be done cleaning up hill and dale.In addition, also can't really confirm from slight PM window whether deposit too much needs to be maintained.
Therefore, can produce sedimental traditional gas treatment equipment needs frequent shutdown to do cleaning, and traditional maintenance mode is consuming time especially and effort.Just need be cleaned maintenance at short notice for the gas treatment equipment that is connected with the etching machines of intensive action, use traditional cleaning way the related progress of etching process that makes is affected, this time cost will improve production cost indirectly.
Summary of the invention
Therefore; purpose of the present invention just provides a kind of gas treatment equipment with deposit scavenge unit; by installing a deposit scavenge unit with agitating function additional, just can be simply under the situation that gas treatment equipment need not be shut down and promptly carry out sedimental cleaning, time saving and energy saving.
According to purpose of the present invention, a kind of gas treatment equipment is proposed, comprise one first treatment trough (a for example gas treatment chamber), one second treatment trough (for example one first lautertuns), a deposit scavenge unit, a holding groove and a gas vent at least.First treatment trough has a gas access, and a discharging waste gas enters first treatment trough and carries out gas treatment from the gas access.Second treatment trough and the first treatment trough adjacency, and have a spray nozzle device with downward sprinkling aqueous vapor.The deposit scavenge unit and the first treatment trough adjacency, and have one first side, first side form at least partly sidewall of first treatment trough, and the deposit scavenge unit comprises: a scraper is arranged at first side and towards the inside of first treatment trough; With a controlling organization, be arranged at first side and towards the outside of first treatment trough with the work of control scraper, make the scraper scraped be attached to deposit in first side or first treatment trough.Holding groove is communicated in the below of first treatment trough and second treatment trough, in order to accept treat liquid and deposit.Gas vent then communicates with second treatment trough, so as to discharging treated gas.
Description of drawings
What Fig. 1 described is a kind of schematic diagram of gas treatment equipment of traditional etching machines.
What Fig. 2 described is the schematic diagram of gas treatment equipment according to one preferred embodiment of the present invention.
What Fig. 3 A was described is the enlarged diagram of the deposit scavenge unit of one embodiment of the present invention.
Fig. 3 B is the front view of Fig. 3 A.
What Fig. 4 A was described is the end view of gas treatment equipment according to one preferred embodiment of the present invention.
Fig. 4 B is the top view of tray among Fig. 4 A.
Description of reference numerals
100,200: dry-etching equipment
10,20: gas treatment chamber
12,22: the first lautertuns
14,24: the second lautertuns
16,26: the three lautertuns
101,201: inlet
102,202: deposit
103,203: outlet
112,114,212,214: spray nozzle device
204: filtrate
30: the deposit scavenge unit
280: filter ball
31: box-like body
311: the first sides
313: transparent window
315: the second sides
32: controlling organization
33: couple axle
34: scraper
40: holding groove
41: tray
43: pore
45: control valve
A, b, c, d: four corners of tray
Embodiment
The present invention improves the gas treatment equipment that is connected with process equipment; wherein gas treatment equipment has a deposit scavenge unit; when deposit occurring or periodically, clean in advance, gas treatment equipment just can simply and promptly be cleared up under situation about need not shut down with alr mode.Not only process is easy rapidly, more can clean in real time to keep the cleanliness factor of gas treatment equipment inside, keeps the cavity in the gas treatment chamber unobstructed effectively.
Below be example with the gas treatment equipment of an etching machines, a preferred embodiment of the present invention is described.Yet the present invention is not as limit.Concerning those skilled in the art, the present invention can be applicable in other any processing unit that needs sediment cleaning.
Please refer to Fig. 2, what it was described is the schematic diagram of gas treatment equipment according to one preferred embodiment of the present invention.Gas treatment equipment 200 comprises for example for example a lautertuns, a deposit scavenge unit 30, a holding groove 40 and a gas vent 203 of gas treatment chamber 20, one second treatment trough of one first treatment trough at least.Wherein, gas treatment chamber 20 has a gas access 201, and waste gas 201 enters gas treatment chamber 20 and handles from the gas access.Second treatment trough then with first treatment trough (being gas treatment chamber 20) adjacency, and have a spray nozzle device; Second treatment trough comprises one first lautertuns 22, one second lautertuns 24 and one the 3rd lautertuns, 26, the first lautertuns 22 and gas treatment chamber 20 adjacency of connection in this embodiment, is placed with a plurality of filter balls 280 in second lautertuns 24 and the 3rd lautertuns 26.The deposit scavenge unit 30 and first treatment trough (being gas treatment chamber 20) adjacency has one first side 311, and this first side 311 forms at least partly sidewall of gas treatment chamber 20.40 of holding grooves are communicated in the below of first treatment trough (being gas treatment chamber 20) and second treatment trough (i.e. first lautertuns 22), in order to accept treat liquid and deposit.Gas vent 203 communicates with second treatment trough, so as to discharging treated gas; In this embodiment, gas vent 203 is arranged at the 3rd lautertuns 26 tops, can be communicated with the waste gas after will handling with first lautertuns 22 to discharge.
Details are as follows for the process of exhaust-gas treatment.In gas treatment equipment 200 outsides one Pressure gauge (not shown) can be set, with the pressure of display device.The reacting gas of dry-etching such as common chlorine (Cl
2), sulfur fluoride (SF
6), oxygen (O
2), hydrogen (H
2) etc., waste gas that its reaction back is produced from enter the mouth 201 enter gas treatment equipment 200 after, can be prior to gas treatment chamber 20 and aqueous vapor reaction, the reactant of generation can fall in the pond of below, but also can be deposited on the wall of gas treatment chamber 20.Then the waste gas of these treated mistakes can be done further filtration via first, second and the 3rd lautertuns 22,24,26 again, and the top of first, second lautertuns 22,24 has spray nozzle device 212,214 sprinkling aqueous vapor downwards.Waste gas after the processing reach environmental standard and ISO standard after be disposed to the external world via gas vent 203 again.The deposit that is produced in exhaust-gas treatment is except being deposited on the cell wall, also be deposited on gas treatment chamber 20 belows especially easily and be communicated with place (shown in the position of deposit among the figure 202), and the cavity of barrier gas process chamber 20 near gas treatment chamber 20 and first lautertuns 22.
Please be simultaneously with reference to Fig. 3 A, Fig. 3 B.What Fig. 3 A was described is the enlarged diagram of the deposit scavenge unit of one embodiment of the present invention.Fig. 3 B is the front view of Fig. 3 A.In this preferred embodiment, deposit scavenge unit 30 comprises a box-like body 31, and controlling organization 32 is positioned in the box-like body 31, and is positioned at first side 311 of box-like body 31.First side 311 forms the partial sidewall at least of gas treatment chamber 20.When controlling organization 32 starts, can drive scraper 34, to strike off deposit.In addition, those skilled in the art should know: the position of the material of scraper 34, length, shape and setting is decided by the practical operation condition, and the present invention is not particularly limited.For example, the waste gas that desire is handled is acid, and then scraper preferably can be selected acidproof, corrosion resistant polyvinyl chloride (PVC), pottery for use, appearance has the PVC coating or appearance has the material of ceramic coating, certainly, as mentioned above, is not limited to these materials; The position of the length of scraper, shape and setting then need be done to set and adjust with the height of easy accumulated deposits 202 according to the overall space of the gas treatment chamber of using 20, scraper can be design be used for removing be stuck in that single wall (as first side 311) is gone up or four walls on deposit 202, be not particularly limited at this.
In addition, on first side 311 of box-like body 30, also have a transparent window 313, can be observed the internal state (for example whether producing deposit) of gas treatment chamber 20.Box-like body 31 also has second side 315, is oppositely arranged with first side 311.And preferably second side 315 is a transparent panel, and makes up with the mode and the box-like body 31 of dismantled and assembled or unlatching, when desiring start-up control mechanism 32, earlier second side 315 is removed or opens, and again second side 315 and box-like body 31 is assembled or is closed after cleaning out.
Moreover, in order to prevent controlling organization 32 (for example rocking bar) from having loosening in use for some time waste gas is spilt in gas treatment chamber 20, box-like body 31 is an air-tight state after assembling is finished in second side 315, and the deposit scavenge unit can preferably be provided with a detector (sensor) (not shown), and whether the box-like body 31 that is air-tight state with detection has gas to spill from gas treatment chamber 20.
The gas treatment equipment 200 of this preferred embodiment have a holding groove 40 be communicated in the gas treatment chamber 20 and first lautertuns 22 below, in order to accept treat liquid and deposit.Holding groove 40 comprises a tray.Please refer to Fig. 4 A, what it was described is the end view of gas treatment equipment according to one preferred embodiment of the present invention.Fig. 4 B is the top view of tray among Fig. 4 A.Tray 41 is arranged at the bottom of the gas treatment chamber 20 and first lautertuns 22 obliquely, can accept waste gas enters product behind the gas treatment chamber 20 and scraper 34 and strikes off the deposit 202 that gets off, these materials of being accumulated after handling needed to be eliminated if accumulate shown in the filtrate on the tray 41 among Fig. 4 A 204 at most.Have a plurality of pores 43 on the tray 41, be positioned at the flowability of the filtrate 204 of tray with the mode increase of ejection gas.Because tray 41 is to be obliquely installed, so these filtrate 204 that fall into tray can flow to the lowest part that tilts.The mode that tilts as for tray 41 is not particularly limited, and can be that a, b are contour in four corners of tray 41, and c, d are contour but be lowest part with a, b; Also can be that a, b, c, d are contour but be lowest part with a, the filtrate 204 that drops on tray 41 is flowed to lowest part.In addition, a control valve (Control Valve) 45 more is set, and control valve 45 is connected with tray 41 in the bottom of gas treatment chamber 20, if observe on the tray 41 filtrate 204 accumulations too much, then can open control valve 45 to remove too much filtrate 204.
In this embodiment, when desiring to carry out preventive maintenance, at first (for example mode to remove) opened in second side 315 of box-like body 31, and start-up control mechanism, to drive scraper 34.For example, if with rocking bar as controlling organization, then can hand or automated manner rotating rocker, and drive inner scraper 34 and strike off the deposit 202 that is attached to gas treatment chamber 20 with rotating manner.After rotation finishes, with second side 315 and box-like body 31 combinations, make box-like body 31 be an air-tight state again.In addition, excessive if the filtrate 204 that deposit that strikes off 202 and waste gas filtering product are accumulated occurs on tray 41, then open control valve 45 so that too much filtrate 204 is derived outside the gas treatment chambers 20.And these steps can be finished under the non-stop-machine situation of gas treatment equipment, and therefore coupled process apparatus (as etching machines) can be proceeded the manufacture craft process, the cost of saving time when the maintenance gas treatment equipment.
The mode of when carrying out preventive maintenance as for decision has a variety of, comprises the Pressure gauge observed on the gas treatment equipment, sees through window (as transparent window 313) and observe the gas treatment chamber interior and whether produce too much deposit or take the mode such as periodic maintenance can.Find that with present experimental result as long as regularly rotate one time rocking bar 32 sooner or later, gas treatment chamber 20 does not need to shut down through trimestral continued operation does maintenance.
In addition, after long period of operation gas treatment equipment a period of time, utilize apparatus of the present invention, manually maintenance mode is removed the inside of gas treatment chamber 20.When practical application, deposit scavenge unit 30 can be designed to mode dismantled and assembled or that open and be connected with a side of gas treatment chamber 20, after deposit scavenge unit 30 is pulled down or is opened, promptly see the inside of gas treatment chamber 20, make operating personnel can remove the inside of gas treatment chamber 20 easily.
Compare with traditional gas treatment equipment and manner of cleaning up, use improved device of the present invention and preventive maintenance method, can be effectively and reach the purpose that makes the gas treatment chamber inner chamber body unobstructed easily.And use the present invention and can not need deposit for a long time with manual type cleaning gas treatment chamber interior, only need at random or regularly start-up control mechanism the deposit of gas treatment chamber can be struck off to drive inner scraper.Therefore, the present invention has time saving and energy saving advantage, and the efficient of clear maintenance is significantly promoted.
In sum; though the present invention with a preferred embodiment openly as above; yet; it is not in order to limit the present invention; those skilled in the art; under the premise without departing from the spirit and scope of the present invention, can be used for a variety of modifications and variations certainly, so protection scope of the present invention should be as the criterion with the scope that appending claims was defined.
Claims (8)
1. gas treatment equipment comprises at least:
One first treatment trough has a gas access;
One second treatment trough with the described first treatment trough adjacency, has a spray nozzle device;
One deposit scavenge unit with the described first treatment trough adjacency, has one first side, described first side forms at least partly sidewall of described first treatment trough, described deposit scavenge unit comprises: a scraper is arranged at described first side, towards the inside of described first treatment trough; With a controlling organization, be arranged at described first side, towards the outside of described first treatment trough, so as to controlling the work of described scraper;
One holding groove is communicated in the below of described first treatment trough and described second treatment trough; And
One gas vent communicates with described second treatment trough, and wherein said holding groove also comprises a tray, is arranged at the bottom of described first treatment trough and described second treatment trough obliquely, and has a plurality of pores on the described tray.
2. gas treatment equipment as claimed in claim 1, the bottom of wherein said first treatment trough also is provided with a control valve, and described control valve is connected with described tray.
3. gas treatment equipment as claimed in claim 1, wherein said deposit scavenge unit comprises a box-like body, described controlling organization is arranged in the described box-like body, and is positioned at one first side of described box-like body, and described first side forms at least partly sidewall of described first treatment trough.
4. gas treatment equipment as claimed in claim 3 is put, and wherein said first side has a transparent window to observe the internal state of described first treatment trough.
5. gas treatment equipment as claimed in claim 3, wherein said box-like body also include one second side that is provided with opposite, described first side, and described second side is a transparent panel.
6. gas treatment equipment as claimed in claim 1, wherein said first treatment trough is a gas treatment chamber, described second treatment trough is one first lautertuns.
7. gas treatment equipment as claimed in claim 6 is placed with a plurality of filter balls in wherein said first lautertuns.
8. gas treatment equipment as claimed in claim 6, wherein also comprise one second lautertuns, in abutting connection with described first lautertuns, described second lautertuns has a spray nozzle device, described holding groove is communicated in the below of described first treatment trough, described second treatment trough and described second lautertuns, and is placed with a plurality of filter balls in described second lautertuns.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100817771A CN1328757C (en) | 2004-12-31 | 2004-12-31 | Gas processing equipment having clearing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100817771A CN1328757C (en) | 2004-12-31 | 2004-12-31 | Gas processing equipment having clearing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1632912A CN1632912A (en) | 2005-06-29 |
| CN1328757C true CN1328757C (en) | 2007-07-25 |
Family
ID=34847228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100817771A Expired - Fee Related CN1328757C (en) | 2004-12-31 | 2004-12-31 | Gas processing equipment having clearing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1328757C (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102155734B1 (en) * | 2013-07-25 | 2020-09-15 | 삼성디스플레이 주식회사 | Evaporating device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6010576A (en) * | 1998-08-27 | 2000-01-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for cleaning an exhaust gas reactor |
| US6171353B1 (en) * | 1997-05-26 | 2001-01-09 | Union Industry Co., Ltd. | Apparatus for treating waste gases |
| US6217640B1 (en) * | 1999-08-09 | 2001-04-17 | United Microelectronics Corp. | Exhaust gas treatment apparatus |
| CN2487455Y (en) * | 2001-04-23 | 2002-04-24 | 东服企业有限公司 | Cleaner for waste gas treating tank |
| JP2003083531A (en) * | 2001-09-11 | 2003-03-19 | Koike Sanso Kogyo Co Ltd | Exhaust gas disposer |
-
2004
- 2004-12-31 CN CNB2004100817771A patent/CN1328757C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6171353B1 (en) * | 1997-05-26 | 2001-01-09 | Union Industry Co., Ltd. | Apparatus for treating waste gases |
| US6010576A (en) * | 1998-08-27 | 2000-01-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for cleaning an exhaust gas reactor |
| US6217640B1 (en) * | 1999-08-09 | 2001-04-17 | United Microelectronics Corp. | Exhaust gas treatment apparatus |
| CN2487455Y (en) * | 2001-04-23 | 2002-04-24 | 东服企业有限公司 | Cleaner for waste gas treating tank |
| JP2003083531A (en) * | 2001-09-11 | 2003-03-19 | Koike Sanso Kogyo Co Ltd | Exhaust gas disposer |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1632912A (en) | 2005-06-29 |
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Granted publication date: 20070725 Termination date: 20201231 |
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