CN1300179A - Laser plasma soft X-ray source with jet target - Google Patents
Laser plasma soft X-ray source with jet target Download PDFInfo
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- CN1300179A CN1300179A CN 99126340 CN99126340A CN1300179A CN 1300179 A CN1300179 A CN 1300179A CN 99126340 CN99126340 CN 99126340 CN 99126340 A CN99126340 A CN 99126340A CN 1300179 A CN1300179 A CN 1300179A
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Abstract
The present invention belongs to the field of short-wave optical technology, relates to an improvement on laser plasma soft X ray source with jet target. It is comprised of vacuum target chamber, snifting valve, focussing lens, differential chamber, vacuum pump and laser beam. Said invention adopts external trigger electric signal provided by laser to control power supply of snifting valve so as to ensure that the laser beam can be accurately focussed on the peak value place of gas jet quantity to produce strong soft X ray radiation, and can make the process, method and operation to produce gas target simple and easy to control. Said invention is applicable to various fields of soft X ray microscopy, soft X ray projection photoetching and radiomethy, etc.
Description
The invention belongs to the shortwave optical technical field, is a kind of soft x-ray laser plasma source of low-debris, relates to a kind of improvement to the laser plasma soft X-ray source that has jet target.
Often the grenz ray light source that uses has laser plasma soft X-ray source and synchrotron radiation.Compare with synchrotron radiation, laser plasma light source has advantages such as cost is low, volume is little, peak brightness is high, easy to use, make it more be applicable to the laboratory and the business environment of general condition, thereby be widely used in every field such as soft X ray microscopy, grenz ray projection lithography, astrophysics, Atomic Physics, radiant quantity.
Conventional laser plasma soft X-ray source is to be power density 10
11～10
13W/cm
2Pulse laser focusing on metallic target, produce high-temperature plasma, and then go out grenz ray by plasma resonance.When forming, plasma also is accompanied by the generation of metal fragment, maximum chip diameter can reach 50 μ m, maximal rate reaches 640m/s, and the chip of these high speeds, high temperature can cause damage to the soft x-ray optics element of contiguous light source or reduce its optical property.People such as FJin have studied the influence of the chip of Sn target generation to x-ray reflectivity, Mo/Si multilayer film (centre wavelength is 13nm) are placed apart from plasma source 75mm place, when the target practice number of times is 4.5 * 10
3When inferior, the Mo/Si multilayer film reduces to zero at the reflectivity at 13nm place, therefore must develop low-debris or not have the chip laser plasma light source.The surface of managing to stop chip to arrive optical element at first is used to solve this difficult problem with the generation that reduces chip.The patent No. is 4,872,189,4,837,793 and 5,151,928 United States Patent (USP) uses the equally thin sheet metal of similar common audio tape to make the target of plasma source, under the light laser effect, the volume of the chip that the metallic target of the volume ratio routine of the chip that this target generates produces is much smaller, but can not eliminate chip fully.People such as M.S.Schulz adopt the method for cutting sheet of placing a high speed rotating between plasma source and optical element to come capture velocity chip within the specific limits, and this method can not be eliminated chip.The patent No. is that 5,577,091 United States Patent (USP) feeds freezer unit to water vapour and is frozen into ice pellets, can produce the low-debris plasma as target, but the pellet formation speed is slow, and flight precision is low, is difficult to guarantee that laser focusing is on pellet.
The patent No. is 5, the concrete device of 577,092 United States Patent (USP) " extreme ultraviolet and soft x-ray laser plasma micel bundle target " (Cluster beam targets for laserplasma extreme ultraviolet and soft x-ray sources) is as shown in Figure 1: it is made up of mist bottle 1, vacuum chamber 2, temperature controlled solenoid shape valve 3, conical nozzle 4, focus lamp 5, vacuum pump 6.Dynamic process is: (first kind is water vapour, CF to the mist of being exported by mist bottle 1
4, CO
2, HCL, F
2, H
2S, B
2H
6, O
2, a kind of among Ar, the Xe, second kind be a kind of among Ne, the At, the third is a kind of among Ne, Ar, the Kr, these three kinds of gases mix the gas that forms) spray from conical nozzle 4 through temperature controlled solenoid shape valve 2, form the micel bundle, with this micel bundle is target, and the power density that is produced by Nd:YAG or infrared laser is 10
11～10
12W/cm
2Laser beam 7 line focus mirrors 5 focus on the micel bundle, produce the low-debris laser plasma.
The method that this invention forms the micel bundle is by mist above-mentioned constant entropy expansion in temperature controlled solenoid shape valve body 3, and spray by conical nozzle 4 supersonic speed, gas temperature reduces in course of injection, produce Van der Waals for (Van der waals forces) between gas molecule, under this power effect, formation is by a plurality of first kind of micel that gas molecule is formed, and numerous micel forms the micel bundle.
The objective of the invention is to solve when gas sprays from nozzle with impulse form in the prior art, because temperature controlled nozzle is difficult to guarantee that laser beam just in time focuses on the peak value place of gas jet, form the method complexity of molecular cluster, wayward and unhandy problem.The invention provides a kind of easy to control and easy to operate laser plasma soft X-ray source with jet target.
Device of the present invention is by shown in Figure 2, it is by vacuum target chamber 1, snifting valve 2, focus lamp 3, difference chamber 4, vacuum pump 5, laser beam 6 is formed, snifting valve 2 is screwed on vacuum target chamber 1, can disassemble from vacuum target chamber 1 at any time as required, focus lamp 3 places a window front of vacuum target chamber 1, vacuum pump 5 is fixedly linked with vacuum target chamber 1, difference chamber 4 is fixed on the vacuum target chamber 1 and links to each other with vacuum chamber that optical element is equipped with in the outside, the structure of snifting valve as shown in Figure 3, it is by air intake 7, insulating bar 8, seal bar 9, spring 10, spring 11, piezoelectric ceramic vibrator 12, nozzle 13, caulking gum 14, anode 15, nozzle entrance 16, valve body 17 is formed, air intake 7 is fixed on the valve body 17, seal bar 9 is fixed on the piezoelectric ceramic vibrator 12, and guarantee that it just in time is in the center of piezoelectric ceramic vibrator 12, caulking gum 14 is fixed on the seal bar 9, can play motion with one.Caulking gum 14 is between the nozzle entrance 16 on seal bar 9 and the nozzle 13, insulating bar 8 is fixed on the spring 10, spring 10 and spring 11 are fixed on the valve body 17, nozzle 13 is screwed on valve body 17, can be convenient to change the nozzle 13 in different apertures at any time from valve body 17 dismountings, anode 15 is fixed on the valve body 17 and does its negative electrode with valve body 17.
Dynamic process of the present invention: feed 20 atmospheric gas (CO by gas cylinder
2, Ar, Xe, O
2In a kind of), gas enters snifting valve 2 from air intake 7, this moment, piezoelectric ceramic vibrator 12 was in the equilbrium position under the effect of spring 10, spring 11, therefore the seal bar 9 on the piezoelectric ceramic 12 tightly withstands on the nozzle entrance 16 by the caulking gum on it 14, and gas can not be sprayed from nozzle 13.When the pulse laser beam 6 that produces with the Nd:YAG laser was practiced shooting, laser also produced the power supply that an external trigger signal triggers control piezoelectric ceramic vibrator 12 when producing laser beam 6.Piezoelectric ceramic vibrator 12 begins vibration, and drives seal bar 9 and move together, and when the caulking gum on the seal bar 9 14 left nozzle entrance 16, gas sprayed with velocity of sound adiabatic expansion from nozzle 13, and the gaseous mass of ejection is approximate Gaussian distribution in time.(need 150 μ m approximately) when gas pulses reaches peak value, the power density that is produced by Nd:YAG is 10
11～10
13W/cm
2Pulse laser beam (pulsewidth 5-9ns, cycle 10Hz) just in time focus on the gas, produce laser plasma, give off grenz ray by laser plasma again.The about 100 μ m of the focused spot diameter at laser beam 6 focus places for avoiding 6 dozens of laser beams on metallic nozzle 13, produce metal fragment, and laser beam 6 focuses on the gas at 13 times 1mm places of nozzle usually.
Good effect of the present invention: when gas sprays from nozzle with impulse form in the prior art, owing to adopt temperature control nozzle to be difficult to guarantee that laser beam just in time focuses on the peak value place of gas jet, form the method complexity of molecular cluster, wayward and operation inconvenience.The power supply that the external trigger signal of telecommunication that the present invention adopts laser to provide is controlled snifting valve has solved the problem that temperature control nozzle brings in the prior art, guarantee that laser beam focuses on the peak value place of gas blowing amount exactly, produce strong soft x-ray radiation, make again the process that produces gas target and method simple to operate, be easy to control.The present invention is applicable to every field such as soft X ray microscopy, grenz ray projection lithography, astrophysics, Atomic Physics, radiant quantity.
Description of drawings of the present invention:
Fig. 1 is the structural representation of prior art
Fig. 2 is a structural representation of the present invention
Fig. 3 is the snifting valve structural representation
One embodiment of the present of invention are as shown in Figures 2 and 3: vacuum target chamber 1 is the Cylinder shape, make by fine aluminium, three faces are provided with glass window, and one side is made circular port and linked to each other with the outer vacuum chamber that optical element is housed, and the napex of vacuum target chamber 1 is used to install snifting valve 2; The valve body 17 of snifting valve 2 is made by stainless steel, and whole snifting valve 2 is cone shape, the about 10mm of interior diameter of its air intake 7, and long 200mm directly is welded on the valve body 17, and the top of air intake 7 has screw thread to link to each other with the gas cylinder of outside; Insulating bar 8, seal bar 9 all adopt garden column polytetrafluoroethylene, what seal bar 9 usefulness were special is adhesive on the piezoelectric ceramic vibrator 12, spring 10, spring 11 are steel springs, piezoelectric ceramic vibrator 12 adopts general piezoceramics crystal, the vibration frequency of piezoelectric ceramic vibrator 12 is up to 400Hz, preparation nozzle entrance 16 and being made of copper on the body of nozzle 13, nozzle 13 usefulness screw fixings are on valve body 17, and nozzle 13 diameters are 0.25～1.5mm.Caulking gum 14 is made the garden post shapes and with the special seal bar 9 that is adhesive in.17 insulation of anode 15 and valve body are fixedlyed connected, and with the surface of polytetrafluoroethylene wire bonds at piezoelectric ceramic vibrator 12.Focus lamp 3 is quartz lenss, and focal length is 100mm, and difference chamber 4 is processed by copper, is taper, and the vertex of a cone has a pin hole, and vacuum pump 5 is FB-450 type molecular pumps.Laser beam 6 is produced by the Nd:YAG laser of outside, and the pulsewidth 5-9ns of laser, the energy of each pulse are 2 joules.
Claims (1)
1, a kind of laser plasma soft X-ray source with jet target, it comprises vacuum target chamber 1, focus lamp 3, vacuum pump 5 and laser beam 6, it is characterized in that: snifting valve 2 is screwed on vacuum target chamber 1, focus lamp 3 places a window front of vacuum target chamber 1, vacuum pump 5 is fixedly linked with vacuum target chamber 1, difference chamber 4 is fixed on the vacuum target chamber 1 and links to each other with vacuum chamber that optical element is equipped with in the outside, snifting valve 2 includes gas port 7, insulating bar 8, seal bar 9, spring 10, spring 11, piezoelectric ceramic vibrator 12, nozzle 13, caulking gum 14, anode 15, nozzle entrance 16 and valve body 17, air intake 7 is fixed on the valve body 17, seal bar 9 is fixed on the piezoelectric ceramic vibrator 12, seal bar 9 is in the center of piezoelectric ceramic vibrator 12, and caulking gum 14 is fixed on the seal bar 9 and can plays motion with one.Caulking gum 14 is between the nozzle entrance 16 on seal bar 9 and the nozzle 13, insulating bar 8 is fixed on the spring 10, spring 10 and spring 11 are fixed on the valve body 17, and nozzle 13 is screwed on valve body 17, and anode 15 is fixed on the valve body 17 and does its negative electrode with valve body 17.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99126340 CN1300179A (en) | 1999-12-16 | 1999-12-16 | Laser plasma soft X-ray source with jet target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99126340 CN1300179A (en) | 1999-12-16 | 1999-12-16 | Laser plasma soft X-ray source with jet target |
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| Publication Number | Publication Date |
|---|---|
| CN1300179A true CN1300179A (en) | 2001-06-20 |
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|---|---|---|---|
| CN 99126340 Pending CN1300179A (en) | 1999-12-16 | 1999-12-16 | Laser plasma soft X-ray source with jet target |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100366129C (en) * | 2002-05-13 | 2008-01-30 | 杰特克公司 | Method and arrangement for producing radiation |
| CN100373994C (en) * | 2004-11-02 | 2008-03-05 | 中国科学院长春光学精密机械与物理研究所 | Soft X ray light source of laser plasma for liquid microflow jetting target |
| CN100391316C (en) * | 2003-03-18 | 2008-05-28 | 皇家飞利浦电子股份有限公司 | Device for and method of generating extreme ultraviolet and/or soft X-ray radiation by means of a plasma |
| CN101065999B (en) * | 2004-11-29 | 2011-04-06 | 皇家飞利浦电子股份有限公司 | Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology |
| CN102022624A (en) * | 2009-09-10 | 2011-04-20 | 方础光电科技股份有限公司 | Laser module |
| CN101795527B (en) * | 2002-09-19 | 2013-02-20 | Asml荷兰有限公司 | Radiation source, lithographic apparatus and device manufacturing method |
| CN105874887A (en) * | 2013-12-30 | 2016-08-17 | Asml荷兰有限公司 | Extreme ultraviolet light source |
| CN111836446A (en) * | 2019-04-16 | 2020-10-27 | 学校法人冲绳科学技术大学院大学学园 | Laser driven microplasma XUV source |
| CN112859533A (en) * | 2015-11-16 | 2021-05-28 | 科磊股份有限公司 | Plasma-based light source with target material coated on cylindrically symmetric element |
| RU2776420C1 (en) * | 2021-12-24 | 2022-07-19 | Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр Институт прикладной физики Российской академии наук" (ИПФ РАН) | Gas-filled laser target |
-
1999
- 1999-12-16 CN CN 99126340 patent/CN1300179A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100366129C (en) * | 2002-05-13 | 2008-01-30 | 杰特克公司 | Method and arrangement for producing radiation |
| CN101795527B (en) * | 2002-09-19 | 2013-02-20 | Asml荷兰有限公司 | Radiation source, lithographic apparatus and device manufacturing method |
| CN100391316C (en) * | 2003-03-18 | 2008-05-28 | 皇家飞利浦电子股份有限公司 | Device for and method of generating extreme ultraviolet and/or soft X-ray radiation by means of a plasma |
| CN100373994C (en) * | 2004-11-02 | 2008-03-05 | 中国科学院长春光学精密机械与物理研究所 | Soft X ray light source of laser plasma for liquid microflow jetting target |
| CN101065999B (en) * | 2004-11-29 | 2011-04-06 | 皇家飞利浦电子股份有限公司 | Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrology |
| CN102022624A (en) * | 2009-09-10 | 2011-04-20 | 方础光电科技股份有限公司 | Laser module |
| CN105874887A (en) * | 2013-12-30 | 2016-08-17 | Asml荷兰有限公司 | Extreme ultraviolet light source |
| CN105874887B (en) * | 2013-12-30 | 2018-10-30 | Asml荷兰有限公司 | EUV light source |
| CN112859533A (en) * | 2015-11-16 | 2021-05-28 | 科磊股份有限公司 | Plasma-based light source with target material coated on cylindrically symmetric element |
| CN111836446A (en) * | 2019-04-16 | 2020-10-27 | 学校法人冲绳科学技术大学院大学学园 | Laser driven microplasma XUV source |
| RU2776420C1 (en) * | 2021-12-24 | 2022-07-19 | Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр Институт прикладной физики Российской академии наук" (ИПФ РАН) | Gas-filled laser target |
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