CN1299326C - Tin-doped indium oxide film and making process of fine pattern - Google Patents
Tin-doped indium oxide film and making process of fine pattern Download PDFInfo
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- CN1299326C CN1299326C CNB200410026379XA CN200410026379A CN1299326C CN 1299326 C CN1299326 C CN 1299326C CN B200410026379X A CNB200410026379X A CN B200410026379XA CN 200410026379 A CN200410026379 A CN 200410026379A CN 1299326 C CN1299326 C CN 1299326C
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- tin
- indium oxide
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Priority Applications (1)
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CNB200410026379XA CN1299326C (en) | 2004-07-30 | 2004-07-30 | Tin-doped indium oxide film and making process of fine pattern |
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CNB200410026379XA CN1299326C (en) | 2004-07-30 | 2004-07-30 | Tin-doped indium oxide film and making process of fine pattern |
Publications (2)
Publication Number | Publication Date |
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CN1599024A CN1599024A (en) | 2005-03-23 |
CN1299326C true CN1299326C (en) | 2007-02-07 |
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CNB200410026379XA Expired - Fee Related CN1299326C (en) | 2004-07-30 | 2004-07-30 | Tin-doped indium oxide film and making process of fine pattern |
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CN (1) | CN1299326C (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100819062B1 (en) * | 2007-03-19 | 2008-04-03 | 한국전자통신연구원 | Synthesis method of indium tin oxide(ito) electron-beam resist and pattern formation method of ito using the same |
CN101174088B (en) * | 2007-10-19 | 2010-08-18 | 西安理工大学 | Polymethyl methacrylate-TiO2 hybrid material preparation and minute pattern production |
CN101337773B (en) * | 2008-08-14 | 2010-12-08 | 浙江理工大学 | Method for preparing ITO film with high conductivity |
CN102044737A (en) * | 2009-10-10 | 2011-05-04 | 江国庆 | Manufacturing method of film antenna |
CN105152545B (en) * | 2015-06-25 | 2017-09-29 | 西安理工大学 | A kind of preparation method of nanocrystalline doped tungsten oxide electrochomeric films figure |
CN107986637B (en) * | 2017-11-23 | 2020-08-18 | 西安理工大学 | Preparation method of in-situ crystallized tin-doped indium oxide nanocrystalline thin film |
CN108439821B (en) * | 2018-02-05 | 2020-11-17 | 西安理工大学 | High-performance dual-frequency independent modulation electrochromic film and preparation method thereof |
CN112054120B (en) * | 2020-08-26 | 2024-03-19 | 深圳泓越信息科技有限公司 | Preparation method of resistance memory film with adjustable conductive filaments |
CN113831025B (en) * | 2021-08-31 | 2023-01-03 | 西安理工大学 | Tin-doped indium oxide nano array and preparation method thereof |
CN113816615B (en) * | 2021-08-31 | 2023-06-16 | 西安理工大学 | Ultrahigh transparent conductive ITO film and preparation method thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1043827A (en) * | 1988-12-22 | 1990-07-11 | 菲利浦光灯制造公司 | The caustic solution of indium and tin oxide film |
JPH07153332A (en) * | 1993-11-29 | 1995-06-16 | Toppan Printing Co Ltd | Formation of transparent electrode |
JPH09142884A (en) * | 1995-09-08 | 1997-06-03 | Dainippon Printing Co Ltd | Composition for forming transparent conductive film and method for forming transparent conductive film |
CN1280960A (en) * | 2000-07-15 | 2001-01-24 | 昆明理工大学 | Process for preparing sol-gel of indium tin oxide film |
CN1359032A (en) * | 2001-12-28 | 2002-07-17 | 西安理工大学 | Photoinduction SiO2 gel preparation and microfine pattern making method thereof |
-
2004
- 2004-07-30 CN CNB200410026379XA patent/CN1299326C/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1043827A (en) * | 1988-12-22 | 1990-07-11 | 菲利浦光灯制造公司 | The caustic solution of indium and tin oxide film |
JPH07153332A (en) * | 1993-11-29 | 1995-06-16 | Toppan Printing Co Ltd | Formation of transparent electrode |
JPH09142884A (en) * | 1995-09-08 | 1997-06-03 | Dainippon Printing Co Ltd | Composition for forming transparent conductive film and method for forming transparent conductive film |
CN1280960A (en) * | 2000-07-15 | 2001-01-24 | 昆明理工大学 | Process for preparing sol-gel of indium tin oxide film |
CN1359032A (en) * | 2001-12-28 | 2002-07-17 | 西安理工大学 | Photoinduction SiO2 gel preparation and microfine pattern making method thereof |
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Publication number | Publication date |
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CN1599024A (en) | 2005-03-23 |
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C06 | Publication | ||
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Shenzhen New Nanya Technology Development Co., Ltd. Assignor: Xi'an University of Technology Contract fulfillment period: 2008.5.1 to 2015.5.1 contract change Contract record no.: 2009440001469 Denomination of invention: Tin-doped indium oxide film and making process of fine pattern Granted publication date: 20070207 License type: Exclusive license Record date: 2009.9.24 |
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LIC | Patent licence contract for exploitation submitted for record |
Free format text: EXCLUSIVE LICENSE; TIME LIMIT OF IMPLEMENTING CONTACT: 2008.5.1 TO 2015.5.1; CHANGE OF CONTRACT Name of requester: SHENZHEN NEW NANYA TECHNOLOGY DEVELOPMENT CO., LTD Effective date: 20090924 |
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C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070207 Termination date: 20110730 |