CN1292534C - 表面声波滤波器、平衡型电路以及通信设备 - Google Patents
表面声波滤波器、平衡型电路以及通信设备 Download PDFInfo
- Publication number
- CN1292534C CN1292534C CNB038001411A CN03800141A CN1292534C CN 1292534 C CN1292534 C CN 1292534C CN B038001411 A CNB038001411 A CN B038001411A CN 03800141 A CN03800141 A CN 03800141A CN 1292534 C CN1292534 C CN 1292534C
- Authority
- CN
- China
- Prior art keywords
- surface acoustic
- acoustic wave
- wave filter
- electrode
- idt electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 247
- 238000004891 communication Methods 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims abstract description 79
- 238000009413 insulation Methods 0.000 claims description 95
- 238000001914 filtration Methods 0.000 claims description 12
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 11
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 8
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims description 6
- 230000001902 propagating effect Effects 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000010409 thin film Substances 0.000 abstract 1
- 230000003071 parasitic effect Effects 0.000 description 30
- 230000004044 response Effects 0.000 description 30
- 238000010586 diagram Methods 0.000 description 26
- 229910000838 Al alloy Inorganic materials 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 239000003990 capacitor Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 6
- 230000003321 amplification Effects 0.000 description 5
- 238000003199 nucleic acid amplification method Methods 0.000 description 5
- 239000010949 copper Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- JRBRVDCKNXZZGH-UHFFFAOYSA-N alumane;copper Chemical compound [AlH3].[Cu] JRBRVDCKNXZZGH-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010295 mobile communication Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
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- UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 description 1
- 230000008569 process Effects 0.000 description 1
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- 238000011160 research Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/0023—Balance-unbalance or balance-balance networks
- H03H9/0028—Balance-unbalance or balance-balance networks using surface acoustic wave devices
- H03H9/0033—Balance-unbalance or balance-balance networks using surface acoustic wave devices having one acoustic track only
- H03H9/0038—Balance-unbalance or balance-balance networks using surface acoustic wave devices having one acoustic track only the balanced terminals being on the same side of the track
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/0023—Balance-unbalance or balance-balance networks
- H03H9/0028—Balance-unbalance or balance-balance networks using surface acoustic wave devices
- H03H9/0033—Balance-unbalance or balance-balance networks using surface acoustic wave devices having one acoustic track only
- H03H9/0042—Balance-unbalance or balance-balance networks using surface acoustic wave devices having one acoustic track only the balanced terminals being on opposite sides of the track
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02952—Means for compensation or elimination of undesirable effects of parasitic capacitance
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (15)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP060343/2002 | 2002-03-06 | ||
JP2002060343 | 2002-03-06 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2006101598978A Division CN1945969A (zh) | 2002-03-06 | 2003-03-03 | 表面声波滤波器、平衡型电路以及通信设备 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1498455A CN1498455A (zh) | 2004-05-19 |
CN1292534C true CN1292534C (zh) | 2006-12-27 |
Family
ID=27784789
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2006101598978A Pending CN1945969A (zh) | 2002-03-06 | 2003-03-03 | 表面声波滤波器、平衡型电路以及通信设备 |
CNB038001411A Expired - Lifetime CN1292534C (zh) | 2002-03-06 | 2003-03-03 | 表面声波滤波器、平衡型电路以及通信设备 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2006101598978A Pending CN1945969A (zh) | 2002-03-06 | 2003-03-03 | 表面声波滤波器、平衡型电路以及通信设备 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7046102B2 (zh) |
EP (1) | EP1481474A1 (zh) |
JP (1) | JP4339614B2 (zh) |
KR (1) | KR100892195B1 (zh) |
CN (2) | CN1945969A (zh) |
WO (1) | WO2003075458A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8451809B2 (en) | 2007-04-13 | 2013-05-28 | Hart Communication Foundation | Wireless gateway in a process control environment supporting a wireless communication protocol |
US8570922B2 (en) | 2007-04-13 | 2013-10-29 | Hart Communication Foundation | Efficient addressing in wireless hart protocol |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4251476B2 (ja) * | 2001-10-29 | 2009-04-08 | パナソニック株式会社 | 弾性表面波フィルタ素子 |
CN1945969A (zh) * | 2002-03-06 | 2007-04-11 | 松下电器产业株式会社 | 表面声波滤波器、平衡型电路以及通信设备 |
JP4222197B2 (ja) * | 2003-02-24 | 2009-02-12 | 株式会社村田製作所 | 弾性表面波フィルタ、通信機 |
WO2005112258A1 (en) * | 2004-05-17 | 2005-11-24 | Gvr Trade Sa | Saw device with suspended electrodes |
CN1842961B (zh) * | 2004-07-23 | 2010-10-20 | 株式会社村田制作所 | 声表面波器件 |
JP4244057B2 (ja) * | 2006-08-30 | 2009-03-25 | 富士通メディアデバイス株式会社 | バランスフィルタおよび分波器 |
JP2008067289A (ja) * | 2006-09-11 | 2008-03-21 | Fujitsu Media Device Kk | 弾性波デバイスおよびフィルタ |
JP4943787B2 (ja) * | 2006-09-13 | 2012-05-30 | 太陽誘電株式会社 | 弾性波デバイス、共振器およびフィルタ |
JP2008078739A (ja) * | 2006-09-19 | 2008-04-03 | Fujitsu Media Device Kk | 弾性波デバイスおよびフィルタ |
WO2009098840A1 (ja) * | 2008-02-05 | 2009-08-13 | Murata Manufacturing Co., Ltd. | 弾性境界波装置 |
JP2014504827A (ja) * | 2011-01-24 | 2014-02-24 | エプコス アクチエンゲゼルシャフト | 表面音響波フィルタ |
DE102011011377B4 (de) | 2011-02-16 | 2016-05-25 | Epcos Ag | Mit akustischen Wellen arbeitendes Bauelement |
DE102011087820A1 (de) * | 2011-12-06 | 2013-06-06 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Akustisches oberflächenwellenbauelement und verfahren zu seiner herstellung |
JP6116120B2 (ja) * | 2012-01-24 | 2017-04-19 | 太陽誘電株式会社 | 弾性波デバイス及び弾性波デバイスの製造方法 |
CN104040887B (zh) * | 2012-02-06 | 2016-08-17 | 株式会社村田制作所 | 滤波器装置 |
JP6034222B2 (ja) * | 2012-12-27 | 2016-11-30 | 京セラ株式会社 | 弾性波素子、分波器および通信モジュール |
EP3007357B1 (en) * | 2013-05-27 | 2019-05-01 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
JP6176324B2 (ja) * | 2013-06-13 | 2017-08-09 | 株式会社村田製作所 | フィルタ装置及びデュプレクサ |
JP6170349B2 (ja) * | 2013-06-18 | 2017-07-26 | 太陽誘電株式会社 | 弾性波デバイス |
JP6284800B2 (ja) * | 2014-03-26 | 2018-02-28 | 太陽誘電株式会社 | 弾性表面波デバイス及びフィルタ |
JP6380558B2 (ja) * | 2015-01-07 | 2018-08-29 | 株式会社村田製作所 | 弾性波装置 |
CN104868873A (zh) * | 2015-05-27 | 2015-08-26 | 上海交通大学 | 一种多层复合结构声表面波器件基底 |
WO2017154260A1 (ja) * | 2016-03-08 | 2017-09-14 | 株式会社村田製作所 | 弾性波装置及びデュプレクサ |
US11728784B2 (en) | 2020-10-05 | 2023-08-15 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with split die sub-filters |
US11476834B2 (en) | 2020-10-05 | 2022-10-18 | Resonant Inc. | Transversely-excited film bulk acoustic resonator matrix filters with switches in parallel with sub-filter shunt capacitors |
US11658639B2 (en) | 2020-10-05 | 2023-05-23 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with noncontiguous passband |
US11463066B2 (en) | 2020-10-14 | 2022-10-04 | Resonant Inc. | Transversely-excited film bulk acoustic resonators with piezoelectric diaphragm supported by piezoelectric substrate |
US11496113B2 (en) | 2020-11-13 | 2022-11-08 | Resonant Inc. | XBAR devices with excess piezoelectric material removed |
CN114039573A (zh) * | 2022-01-07 | 2022-02-11 | 深圳新声半导体有限公司 | 声表面波谐振器、滤波器及其制作方法和通讯装置 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
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US3582840A (en) * | 1966-09-27 | 1971-06-01 | Zenith Radio Corp | Acoustic wave filter |
US3760299A (en) | 1971-08-09 | 1973-09-18 | Hazeltine Corp | Acoustic surface wave-apparatus having dielectric material separating transducer from acoustic medium |
US3839687A (en) * | 1972-11-20 | 1974-10-01 | Zenith Radio Corp | Surface wave filter and method |
US3872410A (en) * | 1972-12-04 | 1975-03-18 | Gte Laboratories Inc | Surface wave filter for tv if stage |
US3868608A (en) * | 1974-04-01 | 1975-02-25 | Gte Sylvania Inc | Surface wave filter |
DE2607837C2 (de) * | 1975-03-04 | 1984-09-13 | Murata Manufacturing Co., Ltd., Nagaokakyo, Kyoto | Mehrschichten-Interdigital-Wandler für akustische Oberflächenwellen |
IT1049444B (it) | 1975-06-24 | 1981-01-20 | Italchemi Spa | Procedimento di preparazione ed applicazioni terapeutiche dell acido n p.clorofenossi isobutiroil tiazoli dincarbossilico |
JPS523061A (en) | 1975-06-26 | 1977-01-11 | Kyowa Gas Chem Ind Co Ltd | Process for preparing 4-cyanoimidazole-5-carbamic acid esters |
DE2631671A1 (de) * | 1975-07-14 | 1977-02-03 | Tokyo Shibaura Electric Co | Vorrichtung fuer elastische oberflaechenwellen |
US4063202A (en) * | 1976-05-05 | 1977-12-13 | Rockwell International Corporation | Band-pass filter with surface acoustic wave devices |
WO1997042705A1 (fr) | 1996-05-08 | 1997-11-13 | Kabushiki Kaisha Toshiba | Element a onde acoustique de surface et procede de fabrication correspondant |
JP3186604B2 (ja) * | 1996-10-09 | 2001-07-11 | 株式会社村田製作所 | 弾性表面波フィルタ装置 |
JPH1188101A (ja) | 1997-07-08 | 1999-03-30 | Toshiba Corp | 弾性表面波素子および弾性表面波素子の製造方法 |
JP3391346B2 (ja) * | 2000-04-18 | 2003-03-31 | 株式会社村田製作所 | 縦結合共振子型弾性表面波フィルタ |
JP3391347B2 (ja) * | 2000-06-26 | 2003-03-31 | 株式会社村田製作所 | 縦結合共振子型弾性表面波フィルタ |
JP2002151997A (ja) | 2000-11-13 | 2002-05-24 | Mitsubishi Electric Corp | 弾性波装置 |
FR2827720B1 (fr) * | 2001-07-20 | 2005-05-20 | Thales Sa | Dispositif a ondes acoustiques de surface a faibles pertes avec couche dielectrique de forte permittivite |
CN1945969A (zh) * | 2002-03-06 | 2007-04-11 | 松下电器产业株式会社 | 表面声波滤波器、平衡型电路以及通信设备 |
-
2003
- 2003-03-03 CN CNA2006101598978A patent/CN1945969A/zh active Pending
- 2003-03-03 EP EP03710233A patent/EP1481474A1/en not_active Withdrawn
- 2003-03-03 US US10/473,129 patent/US7046102B2/en not_active Expired - Lifetime
- 2003-03-03 WO PCT/JP2003/002409 patent/WO2003075458A1/en active Application Filing
- 2003-03-03 KR KR1020037014396A patent/KR100892195B1/ko active IP Right Grant
- 2003-03-03 CN CNB038001411A patent/CN1292534C/zh not_active Expired - Lifetime
- 2003-03-04 JP JP2003056654A patent/JP4339614B2/ja not_active Expired - Lifetime
-
2006
- 2006-03-24 US US11/388,297 patent/US20060164184A1/en not_active Abandoned
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8451809B2 (en) | 2007-04-13 | 2013-05-28 | Hart Communication Foundation | Wireless gateway in a process control environment supporting a wireless communication protocol |
US8570922B2 (en) | 2007-04-13 | 2013-10-29 | Hart Communication Foundation | Efficient addressing in wireless hart protocol |
US8676219B2 (en) | 2007-04-13 | 2014-03-18 | Hart Communication Foundation | Combined wired and wireless communications with field devices in a process control environment |
Also Published As
Publication number | Publication date |
---|---|
US20040233020A1 (en) | 2004-11-25 |
CN1498455A (zh) | 2004-05-19 |
US20060164184A1 (en) | 2006-07-27 |
US7046102B2 (en) | 2006-05-16 |
JP2003332874A (ja) | 2003-11-21 |
KR100892195B1 (ko) | 2009-04-07 |
JP4339614B2 (ja) | 2009-10-07 |
WO2003075458A1 (en) | 2003-09-12 |
KR20040087859A (ko) | 2004-10-15 |
EP1481474A1 (en) | 2004-12-01 |
CN1945969A (zh) | 2007-04-11 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
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Owner name: SKYWORKS PANASONIC FILTRATE SOLUTIONS JAPAN CO., L Free format text: FORMER OWNER: MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. Effective date: 20150123 |
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Effective date of registration: 20150123 Address after: Osaka Japan Patentee after: Tiangong Panasonic Filter Solutions Japan Co.,Ltd. Address before: Osaka Japan Patentee before: Matsushita Electric Industrial Co.,Ltd. |
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Address after: Osaka Japan Patentee after: SKYWORKS PANASONIC FILTER SOLUTIONS JAPAN CO.,LTD. Address before: Osaka Japan Patentee before: Tiangong Panasonic Filter Solutions Japan Co.,Ltd. |
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Granted publication date: 20061227 |
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