CN1257861C - Method for preparing titanium dioxide photo catalytic film by wet hot oxidation method - Google Patents
Method for preparing titanium dioxide photo catalytic film by wet hot oxidation method Download PDFInfo
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- CN1257861C CN1257861C CN 200410017608 CN200410017608A CN1257861C CN 1257861 C CN1257861 C CN 1257861C CN 200410017608 CN200410017608 CN 200410017608 CN 200410017608 A CN200410017608 A CN 200410017608A CN 1257861 C CN1257861 C CN 1257861C
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- film
- titanium dioxide
- titanium
- damp
- hot oxidation
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Abstract
The present invention relates to a method for preparing a titanium dioxide photocatalytic film with a moist-heat oxidation method. The present invention specifically comprises the procedures: glass is usually used as a base plate, one layer of pure titanium film is firstly plated with a magnetron sputtering method, and a titanium dioxide photocatalytic film is made with a moist-heat oxidization method. Moist-heat oxidization is carried out in a way that a titanium layer is heated and oxidized to be transparent in air with water vapor or in oxygen. The method for preparing a titanium dioxide photocatalytic film of the present invention has the advantages of simplicity, high technique stability and low cost.
Description
Technical field
The invention belongs to the photocatalysis thin film technical field, be specifically related to the method that a kind of damp and hot oxidation prepares optically catalytic TiO 2 film.
Background technology
Because photic super water-wet behavior and photocatalytic effect, titanium dioxide is in building, and every field such as medical treatment are widely used.The method for preparing the photocatalysis titanium dioxide film has a lot, wherein the photocatalysis titanium dioxide film of reactive magnetron sputtering preparation has good automatically cleaning effect, but from the suitability for industrialized production aspect, the solution two-forty of still needing in the successive reaction magnetron sputtering, the two large problems of low temperature deposition of titanium oxide photocatalysis thin film.
Summary of the invention
The objective of the invention is to propose the novel method of a kind of speed height, simple to operate, preparation optically catalytic TiO 2 film that technology stability is good.
The method for preparing optically catalytic TiO 2 film that the present invention proposes is to prepare titanium deoxid film with the titanium base.With common glass is substrate, and earlier by the pure titanium film of magnetron sputtering method plating one deck, regulating the interior total pressure of coating chamber is 1.33 * 10
-1Pa-13.3pa, sputtering current are 20-30mA/cm
2, substrate temperature is 20 ℃-200 ℃; Make optically catalytic TiO 2 film by damp and hot oxidation style again; The condition of damp and hot oxidation be the glass that is coated with titanium layer 450-550 ℃ of baking down, feed the air or oxygen that has water vapor simultaneously, with the titanium layer heated oxide to transparent getting final product.
Experimental result shows, has good photic water-wet behavior and photic catalysis characteristics with the method for wet air (oxygen) oxidation at the titanium deoxid film that glass surface prepares gained.Because its preparation method is simple, process stabilizing is good, is a kind of novel method for preparing optically catalytic TiO 2 film cheaply.
Description of drawings
Fig. 1 is the titanium dioxide glass comparison diagram that the water droplet contact angle changes under uviolizing of different methods preparation.
Fig. 2 decomposes the comparison diagram of organic solution methylene blue for the titanium dioxide glass of different methods preparation.
Number in the figure: curve a is the titanium deoxid film of dry air oxidation preparation.
Curve b is the titanium deoxid film of wet air thermooxidizing preparation.
Embodiment
Concrete operations step of the present invention is as follows:
1, glass substrate is cleaned up, it is indoor to put into vacuum plating, and the distance of glass substrate and magnetron sputtering target is about 8-12cm, and target titanium plate purity is better than 99.5%.
2, coating chamber vacuumizes, and base vacuum is 2.66 * 10
-3Below the pa, charge into argon gas, make in the coating chamber to keep 10
-2The running balance pressure of the pa order of magnitude.
3, regulate main valve, make to reach the required total pressure of sputter in the coating chamber, its scope is 1.33 * 10
-1Pa-13.3pa.
4, during sputter coating, the adjusting sputtering current is 20-30mA/cm
2, substrate temperature is 20 ℃-200 ℃.The control sputtering time just can plate the titanium layer of desired thickness.Thickness generally can be 50nm-500nm.
5, the glass that is coated with titanium layer is put into retort furnace and toast, feed the air or oxygen that has water vapor, controlled temperature is 450 ℃-550 ℃ in the retort furnace, and the titanium coating heated oxide is to transparent.
Through the test proof, the titanium deoxid film at glass surface that is prepared by the present invention has the good photic hydrophilicity and the ability of decomposing organic matter:
1, at 200 μ w/cm
2, wavelength is under the 254nm UV-irradiation, the film surface water contact angle of tested glass is variation relation in time, as shown in Figure 1.
2, the slide of the titanium deoxid film that is prepared by dry-oxygen oxidation method and the titanium dioxide slide with damp and hot oxidation style preparation are placed the methylene blue solution of 20ml, its concentration is 1.0 * 10
-5Mol/l.At 200 μ w/cm
2, wavelength is under the 254nm UV-irradiation, the absorbancy of test methylene blue solution characterizes film over time and decomposes organic ability.As shown in Figure 2.
Claims (1)
1, a kind of damp and hot method for preparing optically catalytic TiO 2 film is characterized in that with common glass be substrate, and earlier by the pure titanium film of magnetron sputtering method plating one deck, regulating the interior total pressure of coating chamber is 1.33 * 10
-1Pa-13.3pa, sputtering current are 20-30mA/cm
2, substrate temperature is 20 ℃-200 ℃; Make optically catalytic TiO 2 film by damp and hot oxidation style again, the condition of damp and hot oxidation is that the glass that is coated with titanium layer is toasted down at 450-550 ℃, feeds the air or oxygen that has water vapor simultaneously, and the titanium layer heated oxide is extremely transparent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410017608 CN1257861C (en) | 2004-08-20 | 2004-08-20 | Method for preparing titanium dioxide photo catalytic film by wet hot oxidation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410017608 CN1257861C (en) | 2004-08-20 | 2004-08-20 | Method for preparing titanium dioxide photo catalytic film by wet hot oxidation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1597587A CN1597587A (en) | 2005-03-23 |
| CN1257861C true CN1257861C (en) | 2006-05-31 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410017608 Expired - Fee Related CN1257861C (en) | 2004-08-20 | 2004-08-20 | Method for preparing titanium dioxide photo catalytic film by wet hot oxidation method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1257861C (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5107541B2 (en) | 2006-08-22 | 2012-12-26 | ルネサスエレクトロニクス株式会社 | Insulating film forming method and semiconductor device manufacturing method |
| TWI700257B (en) * | 2019-09-17 | 2020-08-01 | 崑山科技大學 | Thermal insulation and self-cleaning glass and manufacturing method thereof |
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2004
- 2004-08-20 CN CN 200410017608 patent/CN1257861C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1597587A (en) | 2005-03-23 |
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| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
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Granted publication date: 20060531 |