CN1249704A - Abrasive article for providing clear surface finish on glass - Google Patents

Abstract

An abrasive article is provided which comprises a backing; and at least one three-dimensional abrasive coating comprising diamond particles dispersed within a binder bonded to a surface of the backing, the binder comprising a cured binder precursor including a urethane acrylate oligomer. The abrasive article is capable of rapid glass stock removal coupled with reducing the surface finish as indicated by reduced Ra values using an RPP test procedure.

Description

Be used for the abrasive product that obtains the transparent surface smooth surface on glass

Background of invention

Invention field

The present invention relates to the method that is used for the abrasive product of polished glass and uses this abrasive product.

The discussion of prior art

Glassware is seen everywhere in household, office and factory, and its form has lens, prism, mirror, CRT screen etc.These many glass surfaces are used in the optical element, and this just needs these surfaces is optical clears and does not have visible defects and/or imperfect.If there is defective, imperfect, even minute scratch marks also can suppress the optical clarity of glassware.In some instances, these defectives, imperfect and/or minute scratch marks may suppress to see through the correct ability of observing of glass.Therefore, need glass surface to be substantially free of any defective, imperfect and/or cut.

Many glass elements are arcs or contain relative radius.These radiuses and arc normally produce in glass forming process.Yet glass forming process may make and have defective (as loft, rough surface, point and other little defective) on the outer surface of glass.These defectives and/or the imperfect how little optical clarity that all can influence glass.Application grinding method is to remove these imperfect and/or defectives widely.These Ginding process can be divided into three main types usually: grinding, refine (fining) and polishing.

Grinding steps by with grinding tool corase grind glass elements further perfect required arc or radius, and removed any casting flaw.Grinding tool contains superhard abrasive particle (as diamond, tungsten carbide or cubic boron nitride) usually.The gained glass surface has roughly required curvature usually.Yet the used grinding tool of this corase grind technology can stay thick cut on glass surface, causes the gained glass surface neither enough accurately also enough smoothless directly to be polished to optically transparent state.

Second step is called refine.The purpose of refine step is that the thick cut that is produced by corase grind technology is repaired.This refine step can be removed the dark cut that corase grind causes usually, though obtain without the smooth basically surface of polishing.Refine technology also should be able to be removed thick cut fully so that glass surface can be polished optically transparent surface.If this refine step is not removed all thick cuts, want so polishing step remove these cuts obtain optically transparent surface be very the difficulty.

The refine step is carried out with loose abrasive slurry usually.Loose abrasive slurry comprises the many abrasive particles that are dispersed in the liquid medium (as water).The prevailing abrasive particle that is used for loose abrasive slurry is float stone, carborundum, aluminium oxide etc.Loose abrasive slurry can randomly contain other additive, as dispersant, lubricant, defoamer etc.In most of the cases, loose abrasive slurry is pumped between glass pieces and the grinding pad, makes loose abrasive slurry be present between the two.Grinding pad can make with any material, as rubber, foamed material, polymeric material, metal, steel etc.In general, glass pieces and grinding pad can relatively rotate.This refine process generally includes one or more steps, and each step can produce more and more thinner any surface finish face (surfacefinish) gradually on glass pieces.Meticulousr any surface finish face can obtain by the whole bag of tricks, comprises using soft abrasive particle, less abrasive particle, soft grinding pad material and/or different processing conditions.The surface smoothness that optical element obtains after refine technology is about 0.06-0.13 micron (Ra) and/or Rtm usually greater than about 0.30 to 0.90 micron.

The roughness on surface is normally caused by cut or cut pattern, and they are that naked eyes are visible or sightless.The cut pattern can be defined as the surface and go up a series of projection and depression.Rtm and Ra are measuring of roughness commonly used in the abrasive material technology.Yet accurate measure can change with the instrument type that the evaluation table surface roughness uses.Rtm used herein and Ra measurement result are that (Leicester, England) the profilometer measuring method of carrying out is for the basis as the Rank Taylor Hobson of SURTRONIC 3 to use trade name.

The definition of Ra is the numerical value of average roughness height, and it is the arithmetic mean of instantaneous value of deviation between the profile of surface irregularity and the surperficial average line.In the evaluation length scope that Rank Taylor Hobson instrument is set, measure more than the surperficial average line and following plurality of positions.Ra and Rtm (being defined as follows) measure with the profilometer probe, and described probe is that radius is that 5 microns needle point is the diamond probe, and measurement result is unit representation with micron (m).Amount to the measurement result of these deviations, divided by measuring number, obtain mean value then.Usually the Ra value is more little, and smooth surface is smooth more.

The definition of Rt is the maximum height value that is raised between depression.Rtm measures in 5 evaluation length in succession, between the projection depression that each evaluation length is recorded the maximum height value average and value.In general, the Rtm value is more little, and smooth surface is smooth more.When on the commercially available profilometer of the different trades mark, carrying out the measurement to the glass surface of identical fineness, may but the variation a little of Ra and Rtm value must not take place.

The 3rd step of whole technology is a polishing step, and it produces more smooth, optically transparent surface on glassware.In most of the cases, this polishing step carries out with loose abrasive slurry, because loose abrasive slurry can obtain optically transparent surface usually, and does not have defective, imperfect and/or minute scratch marks basically.Loose abrasive slurry comprises the ceria abrasive particles that is dispersed in the water usually.

Though loose abrasive slurry is widely used in refine and polishing step, optically transparent any surface finish face is provided on glassware, loose abrasive slurry still has many shortcomings.These shortcomings comprise: handle required a large amount of abrasive slurry inconveniences, need to stir the uniform concentration that prevents the abrasive particle sedimentation and guarantee to polish abrasive particle on the interface, the extra equipment of needs prepares, processes and handles or reclaim and recycle loose abrasive slurry.In addition, to abrasive slurry itself also must periodic analysis to guarantee its quality and dispersion stabilization, this needs again additionally to expend man-hour.And other parts that contact with loose abrasive slurry in pump head, valve, feed pipe, grinding pad and the abrasive slurry supply equipment finally all can show undesirable wearing and tearing.In addition, use the step of abrasive slurry very untidy usually, because loose abrasive slurry is a viscous liquid, splatter is difficult to splendid attire easily.

Be appreciated that the someone attempts replacing loose abrasive slurry to carry out refine and polishing step with the polishing with abrasive coating with abrasive material, and obtained some successes.Polishing with abrasive coating comprises a backing usually with abrasive material, is bonded with abrasive coating on the backing.This abrasive coating comprises the many abrasive particles that are dispersed in the adhesive.For example, United States Patent(USP) Nos. 4,255,164 (Butzke etc.), 4,576,612 (Shukla etc.), 4,733,502 (Braun) and european patent application No.650,803 have disclosed multiple abrasive product and finishing method.The polishing that description has an abrasive coating comprises United States Patent(USP) Nos. 4,644,703 (Kaczmarek etc.), 4,773,920 (Chasman etc.) and 5,014,468 (Ravipati etc.) with other list of references of abrasive product.Yet the polishing with abrasive coating does not substitute loose abrasive slurry all sidedly with abrasive material.In some cases, the polishing with abrasive coating can not obtain the surface of optical clear and essentially no defective, imperfect and/or minute scratch marks with abrasive material.In other cases, the polishing with abrasive coating needs the long period that glassware is polished with abrasive material, therefore uses the cost effectiveness of loose abrasive slurry high all the better.Equally in some cases, though have the polishing of abrasive coating and do not look with the life-span of abrasive material and suffice to show that it is worth that its cost is higher than loose abrasive slurry.So in some cases, the polishing with abrasive coating meets the requirements not as loose abrasive slurry economically with abrasive material.

The abrasive product that needs on the glass technology is the shortcoming relevant with loose abrasive slurry not, but can glass surface be polished to optically transparent surface on efficient and cost-effective ground within reasonable time, so that it does not have basically is imperfect, defective and/or cut.

The general introduction of invention

One aspect of the present invention is the abrasive product that is used for the polished glass workpiece.This abrasive product comprises a backing and is bonded in the three-dimensional abrasive coating of a lip-deep one deck at least of this backing, and this coating better comprises the diamond particles that is dispersed in the adhesive.

At least the three-dimensional abrasive coating of one deck better comprises many abrasive compounds.Many abrasive compounds can be the abrasive compound that clear and definite shape is arranged, abrasive compound in irregular shape, or shape is roughly the abrasive compound that clear and definite shape is arranged of the truncated pyramid of flat-top.There is the abrasive compound of clear and definite shape to be preferably the shared surface area in bottom greater than top at the most 60%, more preferably at the most 40%, be preferably at the most 20%.

Adhesive is preferably and is formed by the adhesive precursor that comprises olefinic unsaturated-resin (as acrylate).Be more preferably described adhesive precursor and comprise urethane acrylate oligomer (urethane acrylateoligomer), ethylenically unsaturated monomer and their blend.Ethylenically unsaturated monomer is preferably the acrylate monomer of the acrylate monomer that is selected from simple function, dual functional acrylate monomer, trifunctional, and their mixture.Adhesive precursor better comprises the urethane acrylate monomer of about 30-70 weight portion and the ethylenically unsaturated monomer of about 70-30 weight portion; Be preferably the ethylenically unsaturated monomer of the urethane acrylate oligomer that comprises about 34-65 weight portion and about 46-54 weight portion; Best is the urethane acrylate oligomer of about 50 weight portions and the ethylenically unsaturated monomer of about 50 weight portions.

Abrasive particle better comprises diamond abrasive grain.Diamond particles can randomly mix with the rigid abrasive particle of other non-diamond, soft inorganic abrasive particle and their mixture mutually.The particle mean size of abrasive particle is about the 0.01-300 micron preferably, better is about the 5-150 micron, preferably is about the 9-80 micron.

In one embodiment of the invention, abrasive product can use RPP method (its polishing time is about 25 seconds) that glass is tested to be about 1.2 microns or higher Initial R a on the base and to reduce to and be about 0.7 micron or lower final Ra.The particle mean size that is preferably the included diamond particles of abrasive product is about 74 microns.

In another embodiment of the invention, abrasive product can use RPP method (its polishing time is about 25 seconds) that glass is tested to be about 0.2 micron or higher Initial R a on the base and to reduce to and be about 0.12 micron or lower final Ra.The particle mean size that is preferably the included diamond particles of abrasive product is about the 30-45 micron.

In another embodiment of the present invention, abrasive product can use RPP method (its polishing time is about 25 seconds) that glass is tested to be about 0.05 micron or higher Initial R a on the base and to reduce to and be about 0.05 micron or lower final Ra.The particle mean size that is preferably the included diamond particles of abrasive product is about the 9-15 micron.

These abrasive products can sequentially be used for the polished glass workpiece in the glass polishing system, can access very fine any surface finish face.

The RPP test method

" RPP " method use " Buehler Ecomet 4 " variable-ratio grinding-and-polishing machine that " Buehler Ecomet 2 " unit head is installed (both are all available from Buehler Industires, Ltd. ofLake Bluff, Ill).Use following condition to carry out this test: motor speed is set in 500rpm, and the power on glass test base (the glass test blank) surface area is 50 pounds, is about 7.1psi (about 50kPa).

Used glass test base is smooth circular glass test base, and its diameter is that 7.62 centimetres of (3 inches), thickness are about 1.0 centimetres, and available from Corning Glass Co., commodity are called CORNING#9061.This glass material is put into the unit head of grinding-and-polishing machine.12 inches aluminium platforms of grinding-and-polishing machine are rotated counterclockwise, and the unit head of wherein having fixed glass test base turns clockwise with 35rpm.

Abrasive product to be tested is die-cut into the circle of 20.3 centimetres of (8.0 inches) diameters, is directly bonded to the slab foams polyurethane backing pad of extruding with contact adhesive, its Xiao A hardness is about 90 hardness.Polyurethane backing pad is bonded in the extruding slab that thickness is about 30 millimeters and opens wide on the soft foam pad of micropore.This combination mat is placed on the aluminium platform of grinder/polishing machine.Spray running water to abrasive product with about 3 liters/minute flow, between surface of abrasive articles and glass test base, provide lubrication.

In order on glass test base, to obtain substantially the same initial surface fineness (promptly before polishing) with abrasive product, (St. Paul, MN) the diamond abrasive goods of the metlbond of the commodity of Chu Shouing " 3M Flexible Diamond M125 " by name grind every glass test base with 3M.The particle mean size of these diamond particles is about 125 microns.

Use (Leicester, the initial surface fineness on the profilometer evaluation glass test base of the diamond probe of the SURTRONIC 3 (112/1518-822323) by name of commodity England) available from Taylor Hobson.And the initial weight of record glass test base.The initial surface fineness (or Ra value) that is used to evaluate abrasive product of the present invention drops in three kinds of scopes usually: about 1.2 microns or higher, and about 0.2 micron or higher, about 0.05 micron or higher.

Use above-mentioned grinder/polishing machine that glass test base is polished.The polishing time of this grinder/polishing machine is set at 15 seconds or 10 seconds.Yet the actual contact time on abrasive product and glass test base surface can be higher than this setting-up time, because grinder/polishing machine just picks up counting after glass test base surface is stable from abrasive product.That is to say that abrasive product may some vibrations take place on glass surface or beat, and grinder/polishing machine just picks up counting when being contact substantially constant between abrasive product and glass surface.Therefore, Shi Ji polishing time (being the time of contact between abrasive product and glass surface) is about 25 seconds or still less.After the polishing, write down final surface smoothness and final weight.The weight change of the glass test base in whole polishing time (" X ", second) is called as " stock removal rate ", and unit is gram (cutting output of glass)/" X " second.

Should be appreciated that, according to above method glass pieces is polished to meeting of required real time of Ra value (rate) and changes, the speed of for example used polishing apparatus, the backing pad below the abrasive product, abrasive material rotation, the size of polished surface, contact pressure, the granularity of abrasive particle, the original state of polished surface etc. with many factors.Every kind of above-mentioned RPP method all provides a kind of baseline performance characteristic simply, and it can be used for goods of the present invention and method and conventional glass polishing technology are compared.

Another aspect of the present invention is a kind of method that glass pieces is polished, it comprises that the glass pieces that will have Initial R a contacts with above-mentioned abrasive product, applicating liquid on the interface between glass pieces and abrasive product, glass pieces and abrasive product are relatively moved, Initial R a is reduced to final Ra.

In one embodiment, this method comprises that adopting RPP method (its polishing time is about 25 seconds) to make Initial R a be about 1.2 microns or higher glass pieces can test base from glass and remove about 0.75 abrasive product that restrains glass blank and contact with a kind of, Initial R a is reduced to be about 0.7 micron or littler final Ra.Be preferably, abrasive product comprises the diamond particles that is dispersed in the adhesive.The particle mean size that is more preferably abrasive grain is about 74 microns.

In another embodiment, this method comprises that adopting RPP method (its polishing time is about 25 seconds) to make Initial R a be about 0.2 micron or higher glass pieces can test base from glass and remove about 0.2 abrasive product that restrains glass blank and contact with a kind of, Initial R a is reduced to be about 0.05 micron or littler final Ra.Be preferably, abrasive product comprises the diamond particles that is dispersed in the adhesive.The particle mean size that is more preferably abrasive grain is about the 30-45 micron.

In a further embodiment, this method comprises that adopting RPP method (its polishing time is about 25 seconds) to make Initial R a be about 0.05 micron or higher glass pieces can test base from glass and remove about 0.02 abrasive product that restrains glass blank and contact with a kind of, Initial R a is reduced to be about 0.05 micron or littler.Be preferably, abrasive product comprises the diamond particles that is dispersed in the adhesive.The particle mean size that is more preferably abrasive grain is about the 9-15 micron.

Being used for the abrasive product of the present invention of ground glass surface can be astoundingly obtain smooth surface in the quite short time.Although do not wish to be bound by any theory, just make abrasive product have this desired properties exactly because it is believed that the chemical property of adhesive.Particularly, it is believed that the chemical property of adhesive provides a kind of tough and tensile, durable and long-acting medium, can in the whole service life of abrasive product, all keep abrasive particle securely.When adhesive used with diamond abrasive grain, its chemical property was effective especially.Because diamond abrasive grain is much more long-acting than the most conventional abrasive particle, so need tough and tensile and durable adhesive.Therefore, the combination of the blend of urethane acrylate oligomer or urethane acrylate oligomer and acrylate monomer and diamond abrasive grain can obtain long-acting and durable abrasive coating.The chemical property of supposing abrasive particle and adhesive provides a kind of synergistic combination, the feasible effect that can improve glass polishing with abrasive product of the present invention.

" clear and definite shape is arranged " used herein is meant the abrasive compound that solidifies this adhesive precursor and form when adhesive precursor is formed on the backing and fill up the lip-deep cavity of fabrication tool.These abrasive compounds have 3D shape, it is defined by more smooth side, a plurality of surfaces, these sides are the boundary and interconnect with the clearly demarcated sharp edge of shape, the sharp edge that described shape is clearly demarcated has edge length and end points clearly clearly, and these end points are that a plurality of sides are intersected and to be formed.The structure that has that abrasive product of the present invention is alleged is meant many abrasive materials that clear and definite shape is so arranged of outfit.Abrasive compound also can be in irregular shape, and " out-of-shape " used herein is meant that the face that forms abrasive compound or border all cave in and is unintelligible.In abrasive compound in irregular shape, earlier abrasive slurry is formed required shape and/or pattern.In case abrasive slurry is shaped, the adhesive precursor in the abrasive slurry is solidified or sclerosis.Be shaped and adhesive precursor solidify between gap for some time usually.In this intersegmental crack, abrasive slurry can flow and/or cave in, so some distortion take place the shape that causes being shaped.The size of abrasive compound, spacing or shape also can change in single abrasive product, described in March 23 nineteen ninety-five disclosed WO95/07797 and August 24 nineteen ninety-five disclosed WO 95/22436.

" border " used herein is meant the exposed surface and the edge of each composite, and it defines the actual 3D shape of each abrasive compound.When examining under a microscope the section of abrasive product of the present invention, can easily see the border that these are clear and legible.These borders can make a distinction an abrasive compound and another abrasive compound, though two abrasive compounds along the public boundary of its bottom in abutting connection with the time also can make a distinction.For the abrasive compound of clear and definite shape is arranged, border and edge are clear tangible.In contrast to this, in the abrasive product that does not possess the Compostie abrasive particles that clear and definite shape is arranged, border and edge are uncertain, and promptly Compostie abrasive particles can subside before finishing its curing.These abrasive compounds (though its shape be clearly or irregular) can be the geometry that any obviously clear and legible border is defined, wherein clear and definite geometry is selected from cube, prismatic, conical, the truncated cone like bulk, pyramid, truncated pyramid, cylindrical, hemispherical etc.

" texture (texture) " used herein is meant that polishing layer has any above-mentioned three-dimensional composite material, and be clear and definite shape or in irregular shape no matter the single 3 D composite has.This texture can be that many abrasive compounds that all have basic identical geometry form, and promptly texture is regular.Equally, texture also can be the random patterns that the mutually different abrasive compound of geometry forms.

Optically transparent surface is meant does not have macroscopic any defective substantially, the surface of imperfect and/or minute scratch marks.

Brief description of drawings

Fig. 1 is the plane of a kind of preferable abrasive product of the present invention.

Fig. 2 is the profile of abrasive product shown in Figure 1 2-2 along the line.

Fig. 3 is the plane of the another kind of preferable abrasive product of the present invention.

Fig. 4 is the profile of abrasive product shown in Figure 3 4-4 along the line.

Detailed description of the invention

The present invention relates to a kind of goods and a kind of method with abrasive product refine (better being polishing) glass pieces. Described abrasive product comprises a backing and is bonded in the three-dimensional abrasive coating of a lip-deep at least one deck of this backing, and this coating better comprises the diamond particles that is dispersed in the adhesive. Described abrasive coating comprises adhesive and the many abrasive particles that is formed by adhesive precursor, is preferably diamond abrasive grain.

The final use of glass may be in household or industrial environment. Glass can be used for decorating or structural member. At least one surface of glass should be polished. Glass can be more smooth or some relative outline lines is arranged. These outline lines can be arc or corner angle shape. The example of glass pieces comprises optical element, such as lens, prism, mirror, CRT (cathode-ray tube) screen etc. The CRT screen is widely used for the display surface of equipment such as television set, computer monitor, terminal. The size of CRT screen (measuring along diagonal) is in 10 centimetres (4 inches) to 100 centimetres (40 inches) or larger scope. The outer surface of CRT screen is convex, has certain radius of curvature. Abrasive product of the present invention can polish the CRT screen in polishing process.

A. adhesive

Adhesive is formed by adhesive precursor. Described adhesive precursor comprises uncured or the resin of polymerization state not. In the process of making abrasive product, resin generation polymerization or curing in the adhesive precursor form adhesive. But adhesive precursor can comprise the resin of the resin addition polymerization of condensation curable, the resin of free-radical curable and/or combination and the mixture of these resins.

Better adhesive precursor is the resin by the free radical mechanism polymerization. With adhesive precursor under suitable catalyst is in the energy (such as heat energy or radiant energy), initiated polymerization. The example of radiant energy comprises electron beam, ultraviolet light or visible light.

The example of the resin of free-radical curable comprise polyurethane, the propylene acidifying of propylene acidifying epoxides, the polyester of propylene acidifying, the undersaturated compound of olefinic, have unsaturated carbonyl as the aminoplast derivative of side group, have at least one pendant acrylate groups isocyanurate derivative, have the isocyanate derivates of at least one pendant acrylate groups and their mixture and combination. Term " acrylate " comprises esters of acrylic acid and methyl acrylic ester.

A kind of better adhesive precursor of the present invention comprises the blend of urethane acrylate oligomer or urethane acrylate oligomer and ethylenically unsaturated monomer. Better ethylenically unsaturated monomer is the acrylate monomer of the acrylate monomer of simple function, dual functional acrylate monomer, trifunctional, and their mixture. Although do not wish to be bound by any theory, just make abrasive product have desired properties exactly because it is believed that the adhesive chemistry character that is obtained by above-mentioned adhesive precursor. Particularly, the chemical property of this adhesive provides a kind of tough and tensile, durable and long-acting medium, can all keep securely abrasive particle in the whole service life of abrasive product. Adhesive chemistry character is effective especially when adhesive uses with diamond abrasive grain, because diamond abrasive grain is much more long-acting than the most conventional abrasive particle. In order to take full advantage of the long-life of diamond abrasive grain, need tough and tensile and durable adhesive. Therefore, the combination of the blend of urethane acrylate oligomer or urethane acrylate oligomer and acrylate monomer and diamond abrasive grain can obtain long-acting and durable abrasive coating.

The polyurethane of propylene acidifying also can be the polyester of hydroxy-end capped isocyanates chain extension or the acrylate of polyethers, can be aliphatic series or aromatics. The example of commercially available propylene acidifying polyurethane comprises following these known materials: Henkel Corp. Hoboken, the PHOTOMER of NJ (such as PHOTOMER 6010); UCB Radcure Inc. Smyrna, the EBECRYL 220 of GA (the aromatic polyurethane acrylate of six senses, molecular weight is 1000), EBECRYL 284 (aliphatic urethane diacrylate, molecular weight is 1200, with 1, the dilution of 6-hexanediyl ester), EBECRYL 4827 (aromatic polyurethane diacrylate, molecular weight is 1600), EBECRYL 4830 (aliphatic urethane diacrylate, molecular weight is 1200, dilute with tetraethylene glycol diacrylate), EBECRYL 6602 (the aromatic polyurethane acrylate of trifunctional, molecular weight is 1300, with the dilution of trimethylolpropane ethyoxyl triacrylate) and EBECRYL 840 (aliphatic urethane diacrylate, molecular weight are 1000); Sartomer Co..West Chester, the SARTOMER of PA (such as SARTOMER 9635,9645,9655,963-B80,966-A80 etc.); And Morton International, the UVITHANE of Chicago Ill (such as UVITHANE 782).

Ethylenically unsaturated monomer or oligomer, perhaps acrylate monomer or oligomer can be simple function, difunctionality, trifunctional or four senses, even have more degree of functionality. Term acrylate comprises acrylate and methacrylate. The undersaturated adhesive precursor of olefinic comprises monomer and the polymer that contains carbon, hydrogen and oxygen and optional nitrogen and these atoms of halogen. Oxygen atom or nitrogen-atoms or the two are present in ether, ester, carbamate, acid amides and the urea groups usually. The undersaturated compound of olefinic is preferably to have and is lower than about 4,000 molecular weight is preferably the ester that is made by the compound that contains aliphatic monohydroxy group or aliphatic polyhydroxy group and the compound reaction that contains unsaturated carboxylic acid (such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, iso-crotonic acid, maleic acid etc.). The representative example of ethylenically unsaturated monomer comprises methyl methacrylate, EMA, styrene, divinylbenzene, hydroxy-ethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxy propyl methacrylate, acrylic acid hydroxy butyl ester, methacrylic acid hydroxy butyl ester, vinyltoluene, glycol diacrylate, poly-ethylene glycol diacrylate, ethylene glycol dimethacrylate, hexanediyl ester, triethylene glycol diacrylate, trimethylolpropane triacrylate, three acrylic acid glyceride, pentaerythritol triacrylate, pentaerythritol acrylate trimethyl, tetramethylol methane tetraacrylate and pentaerythritol tetramethylacrylate. Other olefinic unsaturated-resin comprises ester and the acid amides of a pi-allyl, polyenoid propyl group and many methylallyls of carboxylic acid, such as diallyl phthalate, diallyl adipate and N, and N-diallyl adipamide. Other nitrogen-containing compound also comprises three (2-acrylyl oxy-ethyl) isocyanuric acid ester, 1,3,5-three (2-methylacryoyloxyethyl)-s-triazine, acrylamide, Methacrylamide, N methacrylamide, N, N-DMAA, NVP and N-vinyl piperidones, and available from the CMD 3700 of Radcure Specialties. The example of the unsaturated diluent of olefinic or monomer is found in United States Patent(USP) Nos. 5,236,472 (Kirk etc.) and 5,580,647 (Larson etc.).

In general, the weight ratio between these acrylic monomers depends on the percetage by weight of required diamond abrasive grain in the final abrasive product. Yet the normally about 5-95 weight portion of the weight ratio of these acrylate monomers urethane acrylate oligomer is than about 5-95 weight portion ethylenically unsaturated monomer. Being preferably these acrylate monomers is that the urethane acrylate oligomer of about 30-70 weight portion is than the ethylenically unsaturated monomer of about 30-70 weight portion, be more preferably 34-65 weight portion urethane acrylate oligomer than about 46-54 weight portion ethylenically unsaturated monomer, best is that about 50 weight portion urethane acrylate oligomer are than 50 weight portion ethylenically unsaturated monomers.

Be found in assignee's common unexamined patent application No.08/694 about the information of other potential available adhesive and adhesive precursor, in 014 (applying date is on August 8th, 1996), it is to be the patent application No.08/557 on November 11st, 1995 applying date, the part continuation application of 727 (Bruxvoort etc.), be also shown in U.S. Patent No. 4,772,920 (Chasman etc.).

The epoxy resin of propylene acidifying is the diacrylate of epoxy resin, such as the diacrylate of bisphenol A epoxide resin. The example of commercially available propylene acidifying epoxy resin comprises CMD 3500, CMD 3600 and the CMD 3700 available from Radcure Specialties.; And available from Sartomer, West Chester, the CN103 of PA, CN104, CN111, CN112 and CN114.

The example of polyester acrylate comprises the Corporation available from Henkel, Hoboken, the Photomer 5007 of NJ and Photomer 5018.

Each molecule or the oligomer of amino resin have at least one α, the side group of beta-unsaturated carbonyl. These unsaturated carbonyls can be the groups of acrylate, methacrylate or acid/acrylic amide type. The example of these materials comprises N-(methylol)-acrylamide, N, the methylated novolac of acrylamido methylated phenol, acrylamido of N '-oxygen dimethylene diacrylamine, ortho position and contraposition, and their mixture. These materials also are described in U.S. Patent No. 4,903, among 440 (Larson etc.) and 5,236,472 (Kirk etc.).

U.S. Patent No. 4,652,27 (Boettcher) have also illustrated the isocyanurate derivative with at least one pendant acrylate groups and the isocyanate derivates with at least one pendant acrylate groups. Better isocyanuric acid ester material is three (ethoxy) isocyanuric acid ester triacrylate.

Be how to solidify or polymerization according to the resin of free-radical curable, adhesive precursor can also comprise curing agent (being also referred to as catalyst or initator). When curing agent is in suitable lower time of the energy, it can produce radical source, initiated polymerization.

Adhesive precursor can comprise epoxy resin. Epoxy resin has oxirane, carries out polymerization by open loop. These epoxy resin comprise the epoxy resin of cyclosiloxane monomer epoxy resins and polymerization. The example of some preferred epoxy resins comprises 2, [4-(2 for 2-two, the 3-glycidoxy)-and phenyl] diglycidyl ether of propane, bis-phenol, the commodity of Shell Chemical Co. are called the commercially available material of EPON 828, EPON 1004 and EPON 1001F, and DER-331, the DER-332 of Dow Chemical Co. and the commercially available material of DER-334. Other suitable epoxy resin comprises the glycidol ether (such as DEN-431 and the DEN-428 of Dow Chemical Co.) of cyclic aliphatic epoxy resin, phenolic novolac. U.S. Patent No. 4,751 has also illustrated the blend of radically curable resin and epoxy resin among 138 (Tumey etc.) and the No. 5,256,170 (Harmer etc.).

In some cases, be preferably with structure coating (make coating) and upper gel coating (size coating) formation abrasive product. In the embodiment of these abrasive products, structure coating is applied on the backing, on this backing of abrasive particle paint, make again structure coating be under the condition of at least part of curing structure coating. Upper gel coating is administered on abrasive particle and the structure coating. Then, making this structural member be in is enough to solidify under the condition of structure coating and upper gel coating. As known in the art, also can use optional pre-upper gel coating and super upper gel coating (supersize coating).

B. back lining materials

The effect of backing is for providing support by adhesive and abrasive particle in conjunction with the abrasive material composite article that forms. The used backing of the present invention must can be bonding with adhesive after adhesive precursor is exposed to condition of cure, being preferably this backing is flexible after described exposure, so that the used goods of the inventive method can be fitted surface profile, radius and scrambling along glass.

In the application of many glass polishings, it is strong and durable needing backing, and the abrasive product that obtains like this is only long-acting. In addition, it is strong and flexible needing backing in some polishings are used, and abrasive product can be fitted equably along glass pieces like this. It is normally such when glass pieces has shape or the profile relevant with it. Backing can be polymeric membrane, paper, vulcanised fibre, treated non-woven backing or treated fabric liner, to obtain required intensity and suitable compliance. The example of polymer film comprises polyester film, polyimide film, PA membrane of polyester film, copolymerization etc. Supatex fabric (comprising paper) can soak into thermosetting or thermoplastic, to obtain desired properties.

A kind of better backing is treated fabric liner. Fabric can be the fabric of J weight, X weight, Y weight or M weight. The fiber or the yarn that form fabric can be selected from: polyester, nylon, artificial silk, cotton, fibrous glass and combination thereof. Fabric can be knitting or woven fabric (such as twill, twill or satin weave), perhaps can be stitch bonded fabrics or weft-knitted fabric. Grey cloth can through distortion, singe, destarch or any conventional treatment. Be preferably with polymeric material and process fabric with the sealing fabric and protect fabric fibre. This processing can comprise one or more following processing: pre-starching, saturated or rear starching. A kind of such processing method comprises and at first applies pre-starching coating, then applies rear starching coating. Or apply first the saturator coating, apply again rear starching coating. Usually the front surface that is preferably backing is more smooth. Equally, process coating and should make the fabric liner waterproof, because glass polishing normally carries out in the presence of water. Similarly, processing coating should make fabric liner have enough intensity and flexibility. It is with crosslinked urethane acrylate oligomer and acrylate monomer resin alloy that a kind of preferably backing is processed. The chemical material of fabric treating is identical with the chemical material of adhesive or similar in nature, also belongs in the scope of the present invention. The chemical material of fabric treating also can comprise additive, such as: filler, dyestuff, pigment, wetting agent, coupling agent, plasticizer etc.

Other is processed coating and comprises thermosetting and thermoplastic resin. The example of typical and better thermosetting resin comprises phenolic resins, amino resin, polyurethane resin, epoxy resin, olefinic unsaturated-resin, propylene acidifying isocyanuric acid ester resin, urea-formaldehyde resins, isocyanuric acid ester resin, propylene acidifying polyurethane resin, propylene acidifying epoxy resin, di maleimide resin, and their mixture. The example of better thermoplastic resin comprises polyamide (such as nylon), mylar and polyurethane resin (comprising the polyurethane-urea resin). A kind of better thermoplastic resin is the polyurethane of being derived and being obtained by the product of the pure and mild isocyanates of polyester polyols.

C. abrasive particle

Abrasive product of the present invention also comprises many abrasive particles. Term " abrasive particle " comprises with adhesive many single abrasive particles being bonded together and forms abrasive grit agglomerates or complex. Abrasive grit agglomerates is in United States Patent(USP) Nos. 4,311,489; In 4,652,275 and 4,799,939 description is arranged also. Abrasive particle can also comprise surface treatment or coating, such as coupling agent or metal or ceramic coating.

The particle mean size of the used abrasive particle of the present invention is preferably about 0.01 micron (granule) to 300 microns (bulky grains), is more preferably about 5 microns to 150 microns, and best is about 9 microns to about 80 microns.The Mohs' hardness of abrasive particle is preferably and is at least 8, is more preferably and is at least 9.The example of these abrasive particles comprises fused alumina, ceramic alumina, through heat treated aluminium oxide, carborundum, alumina zirconia, iron oxide, diamond (natural and synthetic), ceria, cubic boron nitride, garnet, and their mixture.

For glass polishing, abrasive product is preferably and utilizes diamond abrasive grain.These diamond abrasive grains can be natural diamond or the synthetic diamond that makes.The synthetic diamond particles that makes can be thought " resin-bonding diamond ", " saw blade grade diamond " or " metlbond diamond ".These diamonds can be bulk or needle-like.Diamond particles can contain face coat, as metal coating (as nickel, aluminium, copper etc.), inorganic coating (as silica) or organic coating.Abrasive product of the present invention can contain the mixture of diamond and other abrasive particle.

Three-dimensional abrasive coating can comprise about 0.1-90 part abrasive particle and 10-99.9 part adhesive by weight.Yet because diamond abrasive grain costs an arm and a leg, abrasive coating is preferably and comprises about 0.1-50 part abrasive particle and about 50-99.9 part adhesive.Be more preferably, abrasive coating comprises about 1-30 part abrasive particle and about 70-99 part adhesive, and best is that abrasive coating comprises about 3-25 part abrasive particle and about 75-97 part adhesive.

D. additive

Abrasive coating of the present invention also comprises optional additive, as abrasive particle surface modified additive, coupling agent, filler, blowing agent, fiber, antistatic additive, curing agent, suspending agent, sensitising agent, lubricant, wetting agent, surfactant, pigment, dyestuff, ultra-violet stabilizer and antioxidant.Select the consumption of these additives to obtain desired properties.

Coupling agent

Coupling agent can provide the bridge of association between adhesive and abrasive particle.In addition, coupling agent also can provide the bridge of association between adhesive and filler particles.The example of coupling agent comprises silane, titanate, zircoaluminate.The method of sneaking into coupling agent has many.For example coupling agent directly can be added in the adhesive precursor.Abrasive coating can contain the coupling agent of 0-30% (weight), is preferably 0.1-25% (weight).Perhaps coupling agent can be applied on the surface of filler particles.In another kind of mode, coupling agent was administered to before abrasive particle is sneaked into abrasive product on its surface.Abrasive particle can contain the coupling agent of the 0-3% that has an appointment (weight), is benchmark with the weight of abrasive particle and coupling agent.The example of commercially available coupling agent comprises OSI company " A174 " and " A1230 ".Another example of commercially available coupling agent is available from Kenrich Petrochemicals, Bayonne, the isopropyl three isooctadecane acyl titanates of the commodity of NJ " KR-TTS " by name.

Filler

Abrasive coating can also randomly comprise filler.Filler is a bulk material, and its particle mean size is typically between the 1-30 micron between the 0.1-50 micron.The present invention can with the example of filler comprise: metal carbonate is (as calcium carbonate (chalk, calcite, marl, calcareous tufa, marble and lime stone), magnesium calcium carbonate, sodium carbonate, magnesium carbonate), silica is (as quartz, bead, glass envelope and glass fibre), silicate is (as talcum, clay, (imvite) feldspar, mica, calcium silicates, calcium metasilicate, sodium silicoaluminate, sodium metasilicate), metal sulfate is (as calcium sulfate, barium sulfate, sodium sulphate, aluminum sodium sulfate, aluminum sulfate), gypsum, vermiculite, wood powder, aluminum trihydrate, carbon black, metal oxide (as calcium oxide (lime)), aluminium oxide, tin oxide (as tin ash), titanium dioxide) and metal sulphite (as calcium sulfite), thermoplastic granulates (Merlon, PEI, polyester, polyethylene, polysulfones, polystyrene, the acrylonitrile-butadiene-styrene (ABS) block copolymer, polypropylene, acetal polymer, polyurethane, the nylon particle) and thermoset particles (steep as phenolic resins, the phenolic resins pearl, polyurethane foam particle etc.).Filler can also be a salt, as halide salts.The example of halide salts comprises sodium chloride, elpasolite, sodium cryolite, ammonium ice crystal, potassium tetrafluoroborate, sodium tetrafluoroborate, silicon fluoride, potassium chloride, magnesium chloride.The example of metal packing comprises tin, lead, bismuth, cobalt, antimony, cadmium, iron, titanium.Other mixed fillers comprises sulphur, organosulfur compound, graphite and metal sulfide.

Suspending agent

The example of suspending agent is the amorphous silicas particle, and its surface area is less than 150 meters squared per gram, available from DeGussa Corp., and Ridgefield Park, NJ, commodity are called " OX-50 ".The adding suspending agent can reduce total viscosity of abrasive water.The use of suspending agent also is described in U.S. Patent No. 5,368, in 619.

Curing agent

Adhesive precursor can also comprise curing agent.Curing agent is help to cause and finish polymerization or cross-linking reaction so that adhesive precursor is converted into the material of adhesive.The term curing agent comprises initator, light trigger, catalyst and activator.The consumption of curing agent and type depend primarily on the chemical property of adhesive precursor.

Radical initiator

The preferable ethylenically unsaturated monomer or the polymerisation of oligomer are undertaken by free radical mechanism.If the energy is electron beam, electron beam can produce the free radical of initiated polymerization.Yet even adhesive precursor is exposed under the electron beam, the present invention still can use initator.If the energy is heat, ultraviolet light or visible light, then must exist initator to produce free radical.Be exposed to the example that just produces the initator (being light trigger) of free radical under ultraviolet ray or the heat and include but not limited to organic peroxide, azo-compound, quinones, nitroso compound, acyl halide, hydrazone, sulfhydryl compound, pyrylium compound, imidazoles, chlorination triazine, benzoin, benzoin alkylether, diketone, benzene ketone, and their mixture.Be exposed to the example that ultraviolet ray just produces down the commercially available light trigger of free radical and comprise Company, Hawthorne, the IRGACURE 651 of NJ and IRGACURE 184 and available from the DAROCUR 1173 of Merck. available from Ciba Geigy.Be exposed to the example that just produces the initator of free radical under the visible light and be found in U.S. Patent No. 4,735, in 632.Be exposed to the another kind of light trigger that just produces free radical under the visible light and have trade name IRGACURE 369, available from Ciba Geigy Company.

The consumption of initator is generally 0.1-10%, is preferably 2-4% (weight), is benchmark with the weight of adhesive precursor.In addition, be preferably adding any bulk material (as abrasive particle and/or filler particles) and before initator be distributed in the adhesive precursor, suitable evenly to be separated into.

In general, be preferably adhesive precursor and be exposed under the radiant energy, be preferably ultraviolet light or visible light.In some instances, some abrasive particle and/or some additive can absorb ultraviolet ray and visible light, make to be difficult to cure adhesive precursor suitably.When using ceria abrasive particles and silicon carbide abrasive particles, this phenomenon is all the more so.Unexpectedly found to use phosphatic light trigger, especially contained the light trigger of acylphosphine oxide, can overcome this problem.The example of this light trigger is 2,4,6-trimethylbenzoyl diphenyl phosphine oxide, and available from BASF Corporation, Charlotte, NC, commodity are called LUCIRIN TPO.The example of other commercially available acylphosphine oxide comprises available from the DAROCUR 4263 of Merck and DAROCUR 4265.

Sensitising agent

Curable composition also can randomly contain sensitising agent or photoinitiator system, and it can influence polymerisation in air or inert atmosphere (as nitrogen).These sensitising agents or photoinitiator system comprise the compound with carbonyl or uncle's amino, and their mixture.Preferable carbonyl containing compound is benzophenone, acetophenone, benzil, benzaldehyde, o-chlorobenzaldehyde, xanthene ketone, thioxanthones, 9, and 10-anthraquinone and other can be used as the aromatics ketone of sensitising agent.Preferable tertiary amine is methyl diethanolamine, ethyldiethanolamine, triethanolamine, phenyl methyl monoethanolamine and benzoic acid dimethylamino ethyl ester.The consumption of sensitising agent or photoinitiator system is generally 0.01-10% (weight), and 0.25-4.0% (weight) more preferably is in the weight of adhesive precursor.The example of sensitising agent comprises the QUANTICURE ITX available from Biddle Sawyer Corp., QUANTICURE QTX, QUANTICUREPTX and QUANTICURE EPD.

Abrasive product of the present invention comprises a backing, has one deck abrasive coating bonding with it on this backing.Be preferably this abrasive coating and comprise many abrasive compounds that shape is arranged.These abrasive compounds can be that clear and definite shape arranged or in irregular shape.Abrasive compound is preferably clear and definite shape, because there is the abrasive compound of clear and definite shape more even and consistent.

Referring now to accompanying drawing, Fig. 1 and Fig. 2 have illustrated a preferable embodiment of abrasive product 10 of the present invention respectively with plane and profile.Abrasive product 10 comprises backing 12 and the abrasive compound 16 that loads on first type surface of backing.Abrasive compound 16 comprises many abrasive particles 14 that are dispersed in the adhesive 15.Abrasive particle 14 can be the mixture of different abrasive materials.Adhesive 15 can be used to abrasive compound 16 and backing 12 are bonded together.Pre-upward gel coating (presize coating) is that tack coat 13 can be randomly between abrasive compound 16 and backing 12.

Abrasive compound 16 is preferably has recognizable shape.Being preferably initial abrasive particle does not protrude from adhesive surface 15.When abrasive product 10 is used to grind certain surface, the said composition disintegration will be exposed without the abrasive particle 14 that uses.

The shape of abrasive compound can be an Any shape.The cross-sectional area of bottom one side that common this shape contacts with backing is greater than the cross-sectional area of abrasive compound away from backing one side.The shape of abrasive compound is optional from many geometries, as cube, bulk, cylindrical, prismatic, rectangle, pyramid, truncated pyramid, taper shape, truncated cone, cross, have the cylindricality of flat top surface.Other shape has hemispherical, also is described in PCT WO95/22436.The gained abrasive product can have difform abrasive compound mixture.

The bottom of abrasive compound can be adjacent to each other, and the bottom of perhaps adjacent abrasive compound can be apart from one another by one section specific distance.Should be appreciated that the definition of adjacency also comprises such arrangement mode, the bridge-like structure that promptly adjacent abrasive compound is shared an abrasive material bonding land or connected and extend between the relative sidewall of abrasive compound.(abrasive material land) formed by the identical abrasive slurry that is used to form abrasive compound in the abrasive material bonding land.Abrasive compound is that being meant of " adjacent " drawn an imaginary line between the center of two abrasive compounds, is not having other abrasive compound on this straight line between these two abrasive materials.

A preferred shape of abrasive compound 16 is truncated pyramids roughly, and it has flat-top 18 and outside open bottom 20, as shown in Figure 2.Be preferably on whole abrasive product 10 through applying, the height H of abrasive compound 16 all is constant, but also can be the abrasive compound with differing heights.The height H of abrasive compound can be the value of about 10-1500 micron, better about 25-1000 micron, better about 100-600 micron, preferably about 300-500 micron.

The bottom 20 that is preferably adjacent abrasive compound is separated from each other by engaging zones 22.Although do not wish to be bound by any theory, think that this engaging zones 22 or interval can make fluid media (medium) freely flow between abrasive compound.And this of fluid media (medium) flows freely the surface finish that can obtain better stock removal rate in the process of glass polishing or strengthens flatness.The spacing of Compostie abrasive particles can change to the scope of about 100 Compostie abrasive particles of every linear centimeter at about 1 Compostie abrasive particles of every linear centimeter, be preferably about 5 Compostie abrasive particles of every linear centimeter to about 20 Compostie abrasive particles of every linear centimeter, be more preferably about 5 Compostie abrasive particles of every linear centimeter to about 10 Compostie abrasive particles of every linear centimeter, best is the about 6-7 of an every linear centimeter Compostie abrasive particles.

Aspect of abrasive product, the area distributions of abrasive compound for be at least 5 Compostie abrasive particles/centimetre ², be preferably at least 100 Compostie abrasive particles/centimetre ²In another embodiment of the invention, the area distributions of abrasive compound is 1-12,000 Compostie abrasive particles/centimetre ²

When using rectangle or truncated pyramid shape, bottom 20 length be about the 100-500 micron usually.The side that forms Compostie abrasive particles can be straight or gradient.If the side is gradient, can more easily abrasive compound 16 be taken out from the cavity of fabrication tool usually, as described below.Angle among Fig. 2 " A " intersects parts draws the imaginary vertical line imaginary line of bonding land 22 (promptly perpendicular to) and records in the bottom 20 of abrasive compound 16 and the bonding land between the abrasive compound 16 22.Angle " A " can better be about 2 °-50 ° in about 1 °-75 ° scope, better be about 3 °-35 °, preferably is about 5 °-15 °.

In polishing process, the backing 12 of abrasive product is fixed on the backing pad 24, and the backing pad for example is a polyurethane backing pad, and its Xiao A hardness is about 90 hardness, perhaps polysiloxanes foam pad, and its Xiao A hardness is about 65 hardness, also has some other.Abrasive product backing 12 can be directly bonded on the backing pad 24 with contact adhesive.Backing pad 24 is placed on the foam pad 26, and foam pad 26 provides buffering for abrasive product in polishing process.Then foam pad 26 (comprising abrasive product) is installed on the polishing machine platform 28.

Referring now to Fig. 3 and Fig. 4, Fig. 3 and Fig. 4 respectively with plane and profile illustrated abrasive product 10 of the present invention ' another preferable embodiment.In this embodiment, abrasive compound 16 ' be hemispheric, as shown in Figure 4.The woven polyester backing 12 of abrasive product 10 ' have ', a first type surface of backing is gone up gel coating 13 ' sealing in advance with one deck thermoplastic polyester.See through the silk screen (not shown) and go up gel coating 13 ' use slurries to sclerosis pre-, these slurries comprise abrasive particle and adhesive precursor.Hemispheric abrasive compound 16 ' size and dimension can change, can random arrangement or be arranged in equably pre-go up gel coating 13 ' on.Be preferably, hemispherical abrasive compound 16 ' from plane (Fig. 3) is circular, and has identical diameter.

No matter the shape of single abrasive compound how, the surface area that is preferably the about 20%-90% of backing is covered by these abrasive compounds, and more preferably about 40%-70% is preferably about 50%-60%.In addition, the difference in surface area of bottom surface and end face better is about 0%-60%, better about 0%-40%, preferably about 0%-20%.

The preparation method that the abrasive compound of clear and definite shape is arranged

The first step of preparation abrasive product is the preparation abrasive slurry.Abrasive slurry is with any suitable hybrid technology adhesive precursor, abrasive particle and optional additive to be mixed to make.The example of hybrid technology comprises low the shearing and high shear mixing, is preferably high shear mixing.Ultrasonic energy also can combine with blend step to be used to reduce abrasive slurry viscosity.Abrasive particle normally little by little adds in the adhesive precursor.Being preferably abrasive slurry is the homogeneous mixture of adhesive precursor, abrasive particle and optional additive.If necessary, can add entry and/or solvent to reduce viscosity.The amount of air bubble can minimize it by vacuumizing when mixing or after mixing in the abrasive slurry.Be preferably in some cases and in about 30 ℃-70 ℃ usually scope, heat abrasive slurry to reduce its viscosity.Importantly before coating, detect abrasive slurry with guarantee to have can be well applied rheological property, and abrasive particle and other filler can sedimentations before applying in the abrasive slurry.

This method obtains the abrasive compound of clear and definite shape usually.In order to obtain clear and definite shape, the cavity that is arranged in fabrication tool when abrasive slurry just makes adhesive precursor harden basically or solidifies.If not, fabrication tool just took off before adhesive precursor solidifies basically, can be caved in, be erose sidewall sometimes.

The used fabrication tool of preferable manufacture method of abrasive product that includes the abrasive compound of clear and definite shape contains many cavitys.These cavitys are the anti-phase shape of required abrasive compound basically, can produce the shape of abrasive compound.Cavity number by every squared unit area obtains the abrasive product that every squared unit area has corresponding abrasive compound number.These cavitys can have any geometry, as cylindrical, hemispherical, pyramid, rectangle, truncated pyramid, prism, cube, circular cone, truncated cone, perhaps has the Any shape in the end face cross section of triangle, square, circle, rectangle, hexagon, octagonal etc.The size of selecting cavity is to reach the abrasive compound number of required every squared unit area.Cavity can exist by dot pattern, has spacing between the adjacent cavities, and perhaps cavity can be connected to each other.

Abrasive slurry can be coated in the cavity of fabrication tool with any routine techniques, as the coating of mouth pattern, the coating of vacuum port pattern, spraying, roller coat, transfer coating, scraper coating etc.If the cavity that fabrication tool comprises has flat-top or more straight sidewall, be preferably in coating process and use vacuum so that air is carried secretly minimizes.

Fabrication tool can be band, sheet, continuous sheet or plate, applicator roll (changeing recessed roller as wheel), be installed in sleeve or mouthful mould on the applicator roll.Fabrication tool can be made up of metal, comprises nickel plating surface, metal alloy, pottery or plastics.About the further information of fabrication tool, its manufacture method and material etc. is found in U.S. Patent No. 5,152, among 917 (Pieper etc.) and 5,435,816 (Spurgeon etc.).A kind of preferable fabrication tool is the thermoplasticity fabrication tool that obtains with the metal mother embossing.

When abrasive slurry comprises the resinoid precursor, then adhesive precursor is solidified or polymerization.Usually being exposed to just can initiated polymerization under the energy.Institute's energy requirement depends on multiple factor usually, as the chemical property of adhesive precursor, the size of abrasive slurry, the consumption and the type of abrasive particle, and the consumption of optional additive and type.Radiant energy is the preferable energy.Radiation energy comprises electron beam, ultraviolet light or visible light.Electron beam (ionization) radiation can be used on the energy level of about 0.1-10Mrad, is preferably about 0.1-10Mrad energy level.Ultra-violet radiation is meant the non-particle radiation of wavelength in 200-400 nanometer (being advisable with the 250-400 nanometer) scope.The output of preferable radiant energy be the 118-236 watt/centimetre.Visible radiation is meant the non-particle radiation of wavelength in 400-800 nanometer (being advisable with the 400-550 nanometer) scope.

After having applied fabrication tool, backing is contacted make the front surface of the wetting backing of abrasive slurry with abrasive slurry.For example, available contact nip rolls makes abrasive slurry contact with backing.Then, be conveyed in the abrasive slurry so that small part cure adhesive precursor by the energy (as described herein) of the energy some forms.For example, fabrication tool can be that transparent material (as polyester, polyethylene or polypropylene) is so that radiation energy is transmitted through the abrasive slurry that is held in the instrument internal cavity.Term " partly solidified " is meant that adhesive precursor is polymerized to the state that can not flow from fabrication tool when abrasive slurry takes out.If adhesive precursor does not have completely crued words, can from fabrication tool, take out the back at it and solidify fully with any energy.Other details of using fabrication tool to prepare abrasive product according to this preferred approach is found in United States Patent(USP) Nos. 5,152,917 (Pieper etc.) and 5,435,916 (Spurgeon etc.), at No.5, the abrasive product through applying that makes in 152,917 is the anti-phase duplicate (inverse replica) of fabrication tool.

In the another kind of changing method of this first method, abrasive slurry can be coated on the backing and not be coated in the cavity of fabrication tool.To contact with fabrication tool through the backing that abrasive slurry applies then, so that abrasive slurry flows in the cavity of fabrication tool.Other step of making abrasive product is with top described identical.About this method, be preferably with emittance and make adhesive precursor curing.Emittance can see through backing and/or see through fabrication tool.If radiation energy sees through backing or fabrication tool, backing or fabrication tool absorbed radiation energy significantly not then.In addition, radiation energy should not make the degraded of backing or fabrication tool significantly.For example, ultraviolet light can see through the polyester film backing.

Perhaps, if fabrication tool is to be made by some thermoplastic, ultraviolet light or visible light can see through fabrication tool and enter into abrasive slurry.Described thermoplastic for example is polyethylene, polypropylene, polyester, Merlon, polyether sulfone, polymethyl methacrylate, polyurethane, polyvinyl chloride, and their mixture.In some cases, be preferably UV light stabilizing agent and/or antioxidant are sneaked in the thermoplasticity fabrication tool.The material that deformability is strong more is easy more to be processed.For thermoplastic matrix's fabrication tool, the processing conditions that should set the preparation abrasive product is not so that can produce excessive heat.If produce excessive heat, it can make thermoplasticity tool variations or fusion.

After making abrasive product, can carry out bending and/or wetting to it, change into suitable form/shape then, re-use this abrasive product.

The another kind of method of preparation abrasive product is that many agglomeration of abrasive particles body and backing is bonding.These agglomeration of abrasive particles bodies comprise with first adhesive many abrasive particles being bonded together and are formed with the agglomerate of shape.Be dispersed in gained agglomeration of abrasive particles body in second adhesive precursor then and be coated on the backing.Second adhesive precursor solidify to form adhesive, and the agglomeration of abrasive particles body just has been bonded on the backing.

The agglomeration of abrasive particles body can comprise above-mentioned optional additive.The agglomeration of abrasive particles body should have suitable ablation rate (erodibility), so that in use can disintegration.Equally, this ablation rate can be by abrasive type, first adhesive type, additive types and ratio decision thereof.

The agglomeration of abrasive particles body can make with any conventional method, and for example United States Patent(USP) Nos. 4,311, and 489; 4,652,275; 4,799,939 and 5,500, described in 273.

The agglomeration of abrasive particles body is dispersed in second adhesive precursor and forms abrasive slurry.The remaining step of preparation abrasive product can be identical with above-mentioned steps.Perhaps, abrasive slurry can be coated on the backing, carries out with scraper coating, roller coat, spraying, grooved roll coating, mouthful pattern coating, curtain flow coat cloth or other conventional coating technique.Then abrasive slurry is exposed under a kind of energy with the cure adhesive precursor, abrasive slurry is changed into abrasive compound.

The preparation method of the abrasive compound of non-clear and definite shape

The second method of preparation abrasive product relates to clear and definite shape of abrasive compound right and wrong or erose method.In the method, abrasive slurry is exposed under a kind of energy once taking out from fabrication tool.The first step is abrasive slurry to be coated on the front surface of backing with routine techniques, and routine techniques is forging die coating machine, roll-coater, knife type coater, curtain stream coating machine, vacuum die coater or die coater for example.Can before coating, heat abrasive slurry if necessary and/or abrasive slurry is carried out ultrasonic processing to reduce its viscosity.Then, abrasive slurry/backing combination is contacted with fabrication tool.The type of fabrication tool can be identical with above-mentioned fabrication tool.Fabrication tool comprises a series of cavitys, and abrasive slurry flows in these cavitys.In case take out abrasive slurry from fabrication tool, abrasive slurry will have the pattern relevant with it, and the pattern of abrasive compound is to be formed by the cavity in the fabrication tool.After taking out, the backing that scribbles abrasive slurry is exposed under the energy to cause the polymerisation of adhesive precursor, so form abrasive compound.Usually be preferably, the backing that scribbles abrasive slurry is fetched into the time of adhesive precursor between solidifying from fabrication tool shorter.If oversize during this period of time, abrasive slurry can flow, and pattern will be deformed to the degree of basic disappearance.

In the another kind of changing method of this second method, abrasive slurry can be coated in the cavity of fabrication tool and not be coated on the backing.Backing is contacted with fabrication tool make that abrasive slurry is wetting and be adhered on the backing.In this changing method, fabrication tool for example can be that wheel changes recessed roller.The remaining step of preparation abrasive product is identical with above-mentioned steps.

Also having a kind of changing method is to see through the silk screen spraying or apply abrasive slurry to produce pattern.Then, solidify or the curing adhesive precursor, form abrasive compound.

The method that another preparation contains the abrasive product of the abrasive coating with pattern or relative texture provides a kind of backing through embossing, then abrasive slurry is coated on the backing.Abrasive coating obtains pattern or veined coating according to the profile through the embossing backing.

The another kind of method for preparing abrasive product is found in U.S. Patent No. 5,219, in 462.Abrasive slurry is coated in the recess of embossing backing.Abrasive slurry contains abrasive particle, adhesive precursor and blowing agent.Resulting structures spare is under certain condition, so that blowing agent makes abrasive slurry foam on the backing front surface.Then the curing adhesive precursor is to form adhesive, and abrasive slurry changes into abrasive compound.

Abrasive product can become any required shape or form according to the thaumatropy of glass polishing needs.This conversion can be finished by cutting, die-cut or any suitable mode.

The method of polished glass

Before with method polishing of the present invention, usually glass is carried out many Physical Processing (comprising grinding), to obtain the glass of required size.These previous technologies can stay cut or open discontinuity on glass surface, can obtain intensely dark surface usually.The present invention relates to a kind of method that glass surface is polished, it can fully remove scratch depth and defective, obtains being polished to optically transparent surface.

In the polishing step of the inventive method, use more than a kind of " polishing " or " refine " goods usually.In the past, a kind of abrasive product with given average abrasive grain granularity is not enough to obtain the very high surface of glossiness.But to continue to use several abrasive products, the mean depth continuous decrease of cut during this period.First kind of used abrasive product contains the bigger abrasive particle of granularity usually.Along with the carrying out of polishing, the user changes abrasive product, and the wear particle size of used abrasive product constantly reduces.This makes scratch depth reduce gradually.The type of the number of used abrasive product, polishing time, abrasive particle and abrasive particle size depend on multiple factor, as the size of polished glass surface, the cut of polishing existence on glass before and/or the order of severity of defective, and the composition of glass itself.

Be preferably in the presence of liquid glass is polished.Liquid has many advantages, the heat localization during it can suppress to polish, and from polishing the interface except that anti-dandruff end.Term " bits end " is used for describing by abrasive product and grinds the actual glass bits that get off.In some instances, polished glass surface can be destroyed in the chips of glass end.Therefore need be removed from the interface.In the presence of liquid, polish and on glass surface, to obtain meticulousr any surface finish face.Liquid can be water, organic lubricant, washing agent, cooling agent, perhaps their mixture.Liquid can also contain additive to strengthen polishing.Water is liquid preferably normally.

In polishing process, abrasive product moves with respect to glass surface, and is pressed towards on the glass surface, and this pressure is preferably about 0.35-7.0 gram/millimeter ², be more preferably about 0.7-3.5 gram/millimeter ², the best 5 gram/millimeters that are about ²If downward power is too big, then abrasive product can not the refine scratch depth, also may deepen scratch depth in some cases.In addition, if downward power is too big, abrasive product also may excessively be denuded.On the contrary, if downward power is too little, then abrasive product can not carry out refine to produce optically transparent surface to scratch depth effectively.

As mentioned above, glass or abrasive product or the two relatively move during polishing step.This move can be rotatablely move, irregular motion or linear movement.Rotatablely move mill to be connected on the throw and produce.Glass surface and abrasive product can equidirectional or rightabout be rotated motion, but if the equidirectional rotation, rotating speed should be different.For machine, work rpm reaches as high as about 4000rpm, better about 25-2000rpm, and better about 50-1000rpm, this depends on used abrasive product.For example, when the mill that uses as depicted in figs. 1 and 2, the rotating speed of machine is about 25-2000rpm, is about 500rpm usually.Irregular orbital motion can produce with irregular track instrument, and linear movement can bring generation with continuous grinding.Relative motion between glass and the abrasive product can also be depended on the size of glass.If glass is bigger, is preferably and when polishing, makes the static and mobile abrasive product of glass maintenance.

In many cases, abrasive product is connected on the support pads.The normally compressible material of support pads, it provides supporting for abrasive product.And support pads makes with suitable compliance material, so that when abrasive product is connected on the support pads, resulting product can be fitted as required along glass pieces, profile especially arranged or the glass pieces of relevant therewith shape is arranged.Support pads can be made by foam or any other suitable material of polyurethane foam, elastomeric material, elastomer, rubber-based.Select the hardness and/or the compressibility of support pads material, so that suitable polishing performance (life of product of stock removal rate, abrasive product and the surface smoothness of glass pieces) to be provided.

Support pads can have continuously and than even curface to be fixed for abrasive product.Perhaps, support pads can have the noncontinuous surface that has a series of bossings and recess and fixes for abrasive product.Under the situation of noncontinuous surface, abrasive product can only be fixed on the bossing.On the contrary, one section abrasive product can be fixed on the more than one bossing, and whole like this abrasive product is just not exclusively supported.Select the noncontinuous surface on the support pads, flow and required polishing performance (life of product of stock removal rate, abrasive product and the surface smoothness of glass pieces) with the fluid that obtains required water.

Perhaps, the present invention comprises that also the backing of abrasive product is as support pads.For example, backing can be a foam-back, as polyurethane foam.

Support pads can have Any shape, as circle, rectangle, square, ellipse etc.The size of support pads (the longest size) is in about 5-1500 centimetre scope.

Jockey

Abrasive product can be fixed on the support pads with jockey.Jockey can be contact adhesive, hook-and-loop connection, mechanical connection or permanent adhesive.Jockey should make abrasive product be securely fixed on the support pads, and can bear the severe condition (wet environment, heat produce and pressure) of glass polishing.

The representative example that is applicable to contact adhesive of the present invention comprises latex wrinkle (latex crepe), rosin, acrylic polymer and copolymer (as butyl polyacrylate, polyacrylate), vinyl ethers (as the polyvinyl n-butyl ether), alkyd resin adhesiver agent, rubber adhesive (as natural rubber, synthetic rubber, chlorinated rubber), and their mixture.Contact adhesive can water or solvent apply.In some cases, be preferably the contact adhesive that uses rubber-based, it applies with non-polar organic solvent.Perhaps contact adhesive can be a transfering belt.

Perhaps, abrasive product can contain hook-and-loop type linked system so that abrasive product is fixed on the support pads.The circle fabric can be hooked on the backing pad at the back side of the abrasive product through applying.Perhaps hook can be at the back side of the abrasive product through applying, and circle is on the backing pad.The linked system of hook and circle type can see for details in United States Patent(USP) Nos. 4,609,581; 5,254,194 and 5,505,747 and PCT WO 95/19242 in.

Embodiment

Further specify the present invention with following test method and non-restrictive example.Except as otherwise noted, all umber, percentage, ratio etc. all are by weight among the embodiment.

The RPP test method

" RPP " method use " Buehler Ecomet 4 " variable-ratio grinding-and-polishing machine that " Buehler Ecomet 2 " unit head is installed (both are all available from Buehler Industires, Ltd. of Lake Bluff, Ill).Use following condition to carry out this test: motor speed is set in 500rpm, and the power on the glass test base surface area is 50 pounds, is about 7.1psi (about 50kPa).

Used glass test base is smooth circular glass test base, and its diameter is that 7.62 centimetres of (3 inches), thickness are about 1.0 centimetres, and available from Corning Glass Co., commodity are called CORNING#9061.This glass material is put into the unit head of grinding-and-polishing machine.12 inches aluminium platforms of grinding-and-polishing machine are rotated counterclockwise, and the unit head of wherein having fixed glass test base turns clockwise with 35rpm.

Abrasive product to be tested is die-cut into the circle of 20.3 centimetres of (8.0 inches) diameters, is directly bonded on the polyurethane backing pad that Xiao A hardness is about 90 hardness with contact adhesive.Polyurethane backing pad is bonded on the soft foam pad of unlimited micropore that the thickness that cuts down from soft foam piece is about 30 millimeters.This combination mat is placed on the aluminium platform of grinder/polishing machine.Spray running water to abrasive product with about 3 liters/minute flow, between surface of abrasive articles and glass test base, play lubrication.

In order on glass test base, to obtain substantially the same initial surface fineness (promptly before polishing) with abrasive product, (St. Paul, MN) the diamond abrasive goods of the metlbond of the commodity of Chu Shouing " 3M Flexible Diamond M125 " by name grind every glass test base with 3M.The particle mean size of these diamond particles is about 125 microns.

Use (Leicester, the initial surface fineness on the profilometer evaluation glass test base of the diamond probe of the SURTRONIC 3 (112/1518-822323) by name of commodity England) available from Taylor Hobson.And the initial weight of record glass test base.The initial surface fineness (or Ra value) that is used to evaluate abrasive product of the present invention drops in three kinds of scopes usually: about 1.2 microns or higher, and about 0.2 micron or higher, about 0.05 micron or higher.

Use above-mentioned grinder/polishing machine that glass test base is polished.The polishing time of this grinder/polishing machine is set at 15 seconds or 10 seconds.Yet, find that the time of abrasive product and glass test base surface actual contact is higher than this setting-up time, because grinder/polishing machine just picks up counting after glass test base surface is stable from abrasive product.That is to say, find that abrasive product some vibrations have taken place or is beated on glass surface, and grinder/polishing machine picks up counting when being contact substantially constant between abrasive product and glass surface.Therefore, when polishing time is set at 15 seconds or 10 seconds the time, actual polishing time (being the time of contact between abrasive product and glass surface) is about 25 seconds or still less.After the polishing, write down final surface smoothness and final weight.The weight change of glass test base is expressed as the gram number that grinds off glass in the whole polishing time.Record cutting output (grinding off the gram number of glass) and Ra value.

Use following abbreviation in the text:

Material explanation UAO urethane acrylate, available from Morton International, INc., Chicago, IL, commodity are by name

UVITHANE 893; HDDA 1, the 6-hexanediyl ester, and available from Sartomer Co., Inc., Exton, PA, commodity are called SR 238; The TPDA tripropylene glycol diacrylate, available from Sartomer Co., Inc., Exton, PA, commodity are called SR 306; PH2 2-benzyl-2-N, N-dimethylamino-1-(4-morpholino phenyl)-1-butanone light trigger is available from Ciba Geigy

Corp., Greensboro, NC, commodity are called IRGACURE 369; ACH 1,1 '-azo two (cyclohexanenitrile), available from DuPont de Nemours, Wilmington, DE, commodity are by name

VAZO 88; ASF amorphous carbon/silicon dioxide filler, available from DeGussa GmbH, Germany, commodity are called AEROSIL

R-972; TFS trifluoro propyl methylsiloxane antifoam agent, available from Dow Corning Company, Midland, MI, merchant

Product are labeled as 7; DIA structure bort particle (multiple size), available from Warren Diamond, Olyphant, PA, commodity are by name

RB; With SIC silicon carbide abrasive particles (particle mean size is 60 microns), available from Norton Company, Worcester, MA

The form of abrasive compound

Form A makes in order to the below method.Having the metal mother mould top casting polypropylene material of the mould surface that comprises the adjacent truncated pyramid of a group, make fabrication tool.The metal mother mould is made by diamond turning technology.The fabrication tool of gained polymerization contains the cavity that is shaped as the four sides truncated pyramid.The height of each truncated pyramid is about 355 microns (14 mils), and every base is about 1427 microns (1.4 millimeters), and it is 1350 microns (1.35 millimeters) that top sides is about.Distance between the adjacent truncated pyramid bottom is about 445 microns.

Form B as above makes, and the height of different is each truncated pyramid is about 760 microns, and every base is about 880 microns, and top margin is about 640 microns.Distance between the adjacent truncated pyramid bottom is about 127 microns.Compostie abrasive particles in every kind of form all has clear and definite shape.

Embodiment 1-18

Embodiment 1-9 made (addition sequence from left to right) in 30 minutes by listed component in the mixture table 1 in high shear air mixer.The particle mean size of diamond (DIA) is 74 microns.

Table 1

Embodiment	?UAO	??HDDA	??TPDA	??PH2	??ACH	??ASF	??DIA	???SIC	??TFS	??DI
											????1	?60.70	??7.70	??23.00	??1.00	??0.50	??2.00	??5.00	????0	??0.10	??5％
????2	?55.70	??7.70	??23.00	??1.00	??0.50	??2.00	??10.00	????0	??0.10	??10％
											????3	?50.70	??7.70	??23.00	??1.00	??0.50	??2.00	??15.00	????0	??0.10	??15％
????4	?45.7	??7.70	??23.00	??1.00	??0.50	??2.00	??20.00	????0	??0.10	??20％
											????5	?35.70	??7.70	??23.00	??1.00	??0.50	??2.00	??30.00	????0	??0.10	??30％
????6	?25.70	??7.70	??23.00	??1.00	??0.50	??2.00	??40.00	????0	??0.10	??40％
											????7	?55.70	??7.70	??23.00	??1.00	??0.50	??2.00	??5.00	????5.00	??0.10
????8	?45.70	??7.70	??23.00	??1.00	??0.50	??2.00	??10.00	????10.00	??0.10
											????9	?35.70	??7.70	??23.00	??1.00	??0.50	??2.00	??15.00	????15.00	??0.10

The preparation of abrasive product

Using the rubber spatula will as above mix the abrasive slurry that obtains at room temperature applies in the cavity that is administered to fabrication tool (form A).Then, (ethylene acrylic acid, EAA) polyester film of priming coat (thick 108 microns) contacts with the fabrication tool that scribbles abrasive slurry, so that the wetting front surface with backing of priming coat of abrasive slurry with ethylene acrylic is arranged on its surface.Making ultraviolet light and visible radiation see through backing then enters in the abrasive slurry.Use two lamps successively.These two lamps are available from American Ultraviolet Co., Murray Hill, and the ultraviolet-visible lamp of NJ, it uses the medium pressure mercury lamp bubble, work when 157.5 watts/centimetre (400 watts/inch).Curing rate is about 7.62 meters/minute (25 feet per minute clocks).In a single day adhesive precursor is exposed under the ultraviolet light, just changes into adhesive, and abrasive slurry just changes into abrasive compound.Then, take fabrication tool away from abrasive compound/backing.

As preparation embodiment 10-18 as described in the embodiment 1-9, the different fabrication tools that is to use form B.

The RPP test method that is about 25 seconds with polishing time is as mentioned above tested embodiment 1-18.Charging Ra is about the 1.4-1.5 micron.The results are shown in the table 2.

Table 2

Embodiment	Cutting output (gram)	Ra (micron)
			????1	????1.54	????0.55
????2	????1.52	????0.52
			????3	????1.43	????0.44
????4	????1.42	????0.39
			????5	????1.10	????0.34
????6	????1.25	????0.35
			????7	????1.33	????0.45
????8	????1.33	????0.47
			????9	????1.19	????0.44
????10	????1.39	????0.60
			????11	????1.35	????0.48
????12	????1.43	????0.53
			????13	????1.32	????0.40
????14	????NA	????NA
			????15	????1.13	????0.36
????16	????1.08	????0.52
			????17	????1.17	????0.43
????18	????1.17	????0.39

Method by embodiment 1-9 prepares embodiment 19 and 20 (form A), the different listed components of following table 3 that are to use.Embodiment 19 and 21 has used granularity to be about the mixture of two kinds of diamond particles of 30 microns and 45 microns.Embodiment 20 and 22 has used granularity to be about the mixture of two kinds of diamond particles of 9 microns and 15 microns.Embodiment 21 and 22 is prepared according to embodiment 19 and 20, and different is that used fabrication tool has form B.

Use is tested embodiment 19 and 20 through the glass test base of the abrasive product polishing of embodiment 4,7,8 and 9.Therefore, final Ra value becomes the charging Ra value of embodiment 19-22.Use the described RPP test method of embodiment 1-18 that embodiment 19 and 21 is tested.Abrasive product with embodiment 20 and 22 uses aforesaid RPP test method (polishing time is about 25 seconds) that these glass test bases are polished then.This polishing system comprises the abrasive product of the present invention of following polishing order: embodiment 4,7,8 and 9 (about 74 microns of adamantine particle mean size); Embodiment 19 (granularity is about the mixture of two kinds of diamond particles of 30 microns and 45 microns) and embodiment 20 (granularity is about the mixture of two kinds of diamond particles of 9 microns and 15 microns) evaluate this polishing system.Initial R a before polishing with embodiment 4,7,8 and 9 is about 1.4 microns or bigger.The results are shown in the table 4.

Table 3

Embodiment	??UAO	?HDDA	?TPDA	??PH2	??ACH	??ASF	??TFS	????DIA	??DIA
										?19/21	?45.70	?7.70	?23.00	??1.00	??0.50	??2.00	??0.10	(15.00 30 microns)	(5.00 45 microns)
?20/22	?45.80	?30.60	?0	??1.00	??0.50	??2.00	??0.10	(15.00 9 microns)	(5.00 15 microns)

Table 4

Embodiment	???Ra	Embodiment	????Ra	Embodiment	????Ra	Embodiment	????Ra
								????4	??0.39	????7	??0.45	????8	??0.47	????9	??0.44
????19	??0.06	????19	??0.07	????19	??0.08	????19	??0.08
								????20	??0.04	????20	??0.03	????20	??0.04	????20	??0.04

The gained result shows in the table 4, adds silicon-carbide particle in the bigger abrasive product of granularity, can not improve the value of surface smoothness Ra before polishing with two kinds of less abrasive products of granularity.Yet whole fineness does not affect adversely yet.

Comparative examples A-F

Press the described preparation Comparative examples A-F of embodiment 1-9, different be to use listed component in the table 5.For every pair of comparative example (being A and B, C and D, E and F), first comparative example uses form A, and second comparative example uses form B.The particle mean size of silicon-carbide particle (SIC) is 60 microns.

By aforesaid embodiment 1-18 comparative example A-F is tested.For each comparative example, test two samples; The result of two samples is listed in the table below in 6.Ra and Rtm value are the mean value to 5 measurement results of every kind of abrasive product to be measured.

Table 5

Embodiment	?UAO	?HDDA	?TPDA	??PH2	??ACH	??ASF	??SIC	??TFS	??SIC
										??A/B	?60.70	?7.70	?23.00	??1.00	??0.50	??2.00	??5.00	??0.10	??5％
??C/D	?55.70	?7.70	?23.00	??1.00	??0.50	??2.00	??10.00	??0.10	??10％
										??E/F	?50.70	?7.70	?23.00	??1.00	??0.50	??2.00	??15.00	??0.10	??15％

Table 6

	Comparative examples A	Comparative example B	Comparative example C	Comparative Example D	Comparative Example E	Comparative Example F
							Cutting output (gram)	??0.01	??0.01	??0.02	??0.03	??0.02	??0.05
Average Ra	??0.81	??0.90	??1.21	??0.70	??0.73	??0.52
Cutting output (gram)	??0.02	??0.05	??0.02	??0.03	??0.03	??0.05
							Average Ra.	??1.17	??0.95	??0.69	??0.71	??0.74	??0.96

Data show, compare with the abrasive product of the present invention shown in the embodiment 1-18 in the table 2, comprise that the abrasive product of silicon-carbide particle is removed less glass blank.And, do not see tangible polishing difference between form A and the form B.

Comparative example G-S

With next group comparative example, comparative example G to S has shown to comprise that 20% particle mean size is about the ability of embodiment 20 of the diamond particles of 9 microns and 15 microns.Comparative example G-S is commercially available and other similar abrasive product.Glass after polishing through the abrasive product among embodiment 4 (adamantine particle mean size is about 74 microns) and the embodiment 19 (two kinds of granularities are about the mixture of the diamond particles of 30 microns and 45 microns) is tested on the base abrasive product of comparative example G-S is tested.Evaluate abrasive product to be tested with above-mentioned test method, the different polysiloxanes foam pads that is to use Xiao A hardness to be about 65 hardness replaces polyurethane to open wide the soft foam pad of micropore.As mentioned above, the variation of backing pad expection can influence polishing performance: to restrain cutting output that numerical table shows and with the surface smoothness of Ra value representation.In addition, alleged " polishing time " is meant the polishing time of actual set on polishing machine/grinder equipment in the following table.Charging Ra value before polishing with the abrasive product among the embodiment 4 is about 1.4 microns or bigger.

Table 7

Embodiment	????4	????19	????20
				Polishing time	15 seconds	15 seconds	10 seconds
Cutting output (gram)	????1.2	????0.18	????0
				Average Ra.	????0.32	????0.07	????0.03

Data in the table 7 show that the variation of backing pad comprises that for use the glass blank gram number that the abrasive product of the present invention of three kinds of particle size range abrasive particles is removed from glass test base has produced influence really.Yet, after polishing, on glass test base, obtain optically transparent basically any surface finish face with the abrasive product of embodiment 20 (two kinds of granularities are about the mixture of the diamond particles of 9 microns and 15 microns).

For comparative example G-S, use the RPP test method to polish test by the foregoing description 20 and 22.The result is as follows.

Comparative example G is the diamond abrasive goods of metlbond, available from Minnesota Mining andManufacturing Company, and St.Paul, the commodity of MN (hereinafter referred to as " 3M ") are called " FlexibleDiamond M20 (3M 600lJ) ".The particle mean size of diamond particles is about 20 microns.

Comparative Example H is the diamond abrasive goods of metlbond, available from the commodity " 3M FlexibleDiamond M10 (3M 6001J) " by name of 3M.The particle mean size of diamond particles is about 10 microns.

Table 8

Embodiment	????4	????19	Comparative example G	Comparative Example H
					Cutting output (gram)	????0.2	????0.02	????1.56	????0.79
Polishing time	10 seconds	10 seconds	10 seconds	10 seconds
					Average Ra.	????0.23	????0.06	????0.61	????0.35

Comparative Example I is conventional carborundum grinding abrasive product, available from the commodity " ImperialMicorfinishing Film S/C PSA (3M 468L) " by name of 3M.The particle mean size of silicon-carbide particle is about 9 microns.

As mentioned above to embodiment 4 and 19 and Comparative Example I test.Charging Ra is about 1.59 microns.

Table 9

Embodiment	????4	????19	Comparative Example I
				Polishing time	15 seconds	15 seconds	10 seconds
Average Ra.	????0.24	????0.06	????0.04

Comparative Example J is conventional carborundum grinding abrasive product, available from the commodity " ImperialMicrofinishing Film S/C PSA (3M 468L) " by name of 3M.The particle mean size of silicon-carbide particle is about 15 microns.

As mentioned above to embodiment 4 and 19 and Comparative Example J test.Charging Ra is 1.42 microns, and charging Rtm is 15.35 microns.

Table 10

Embodiment	????4	????19	Comparative Example J
				Cutting output (gram)	????0.78	????0.09	????0.04
Polishing time	15 seconds	15 seconds	10 seconds
				Average Ra.	????0.24	????0.06	????0.05
Average Rtm	????8.91	????10.25	????9.82

As mentioned above to embodiment 4 and 19 and Comparative Example I and J test.Charging Ra is 1.50 microns, and charging Rtm is 10.56 microns.

Table 11

Embodiment	????4	????19	Comparative Example J	Comparative Example I
					Cutting output (gram)	????0.63	????0.09	????0.08	????0.0
Polishing time	10 seconds	10 seconds	10 seconds	10 seconds
					Average Ra.	????0.026	????0.06	????0.06	????0.04
Average Rtm	????3.42	????4.22	????5.91	????7.77

Comparative example K is conventional alumina lap abrasive product, available from the commodity " ImperialFre-Cut Microfinishing Flim PSA (3M 266L) " by name of 3M.The particle mean size of alumina particle is about 15 microns.

As mentioned above to embodiment 4 and 19 and comparative example K test.Charging Ra is 1.54 microns, and charging Rtm is 10.38 microns.

Table 12

Embodiment	????4	????19	Comparative example K
				Cutting output (gram)	????0.95	????0.13	????0.0
Polishing time	15 seconds	15 seconds	10 seconds
				Average Ra.	????0.29	????0.07	????0.06
Average Rtm	????2.44	????0.90	????0.84

Comparative example L is conventional diamond lap abrasive product, available from the commodity " Imperial 3 mil backing diamond lap films (Diamond Lapping Film 3 mil backing) (3M 662X) " by name of 3M.The particle mean size of diamond particles is about 15 microns.

Comparative example M is conventional diamond lap abrasive product, available from the commodity " Imperial 3 mil backing diamond lap films (3M 662X) " by name of 3M.The particle mean size of diamond particles is about 9 microns.

As mentioned above to embodiment 4 and 19 and comparative example L and M test.Charging Ra is 1.41 microns.

Table 13

Embodiment	????4	????19	Comparative example L	Comparative example M
					Cutting output (gram)	????0.21	????0.02	????0.02	????0.01
Polishing time	10 seconds	10 seconds	10 seconds	10 seconds
					Average Ra.	????0.19	????0.08	????0.08	????0.06

Comparative example N is the diamond abrasive goods of the resin-bonding of routine, available from the commodity " Imperial diamond lap film-type P PSA (3M 664X) " by name of 3M.The particle mean size of diamond particles is about 9 microns.

As mentioned above to embodiment 4 and 19 and comparative example N test.Charging Ra is about 1.34 microns.

Table 14

Embodiment	????4	????19	Comparative example N
				Cutting output (gram)	????0.44	????0.07	????0.02
Polishing time	15 seconds	15 seconds	10 seconds
				Average Ra.	????0.23	????0.07	????0.06

Comparative example O is conventional pearl diamond abrasive goods, available from the commodity " Imperial diamond lap film-type B PSA (3M 666X) " by name of 3M.The particle mean size of diamond particles is about 9 microns.

As mentioned above to embodiment 4 and 19 and comparative example O test.Charging Ra is 1.60 microns.

Table 15

Embodiment	????4	????19	Comparative example O
				Cutting output (gram)	????0.68	????0.09	????0.04
Polishing time	15 seconds	15 seconds	10 seconds
				Average Ra.	????0.25	????0.06	????0.08

Comparative example P is conventional alumina lap abrasive product, available from the commodity " ImperialFre-Cut MIcrofinishing Film PSA (3M 266L) " by name of 3M.The particle mean size of alumina particle is about 9 microns.

As mentioned above to embodiment 4 and 19 and comparative example K and P test.Charging Ra is 1.72 microns, and charging Rtm is 11.62 microns.

Table 16

Embodiment	????4	????19	Comparative example K	Comparative example P
					Cutting output (gram)	????0.55	????0.11	????0.01	????0.0
Polishing time	10 seconds	10 seconds	10 seconds	10 seconds
					Average Ra.	????0.31	????0.08	????0.06	????0.05
Average Rtm	????2.86	????0.85	????0.64	????0.61

As mentioned above to embodiment 4 and 19 and comparative example P test.Charging Ra is about 1.47 microns.

Table 17

Embodiment	????4	????19	Comparative example P
				Cutting output (gram)	????0.45	????0.07	????0.0
Polishing time	15 seconds	15 seconds	10 seconds
				Average Ra.	????0.22	????0.06	????0.06

As preparation comparative example Q as described in the embodiment 20,50/50 mixture of the white alumina of different is used abrasive particle is particle mean size is about 9 microns and 15 microns.

As mentioned above to embodiment 4 and 19 and comparative example Q test.Charging Ra is about 1.51 microns.

Table 18

Embodiment	????4	????19	Comparative example Q
				Cutting output (gram)	????0.28	????0.03	????0.01
Polishing time	15 seconds	15 seconds	10 seconds
				Average Ra.	????0.15	????0.05	????0.06

As preparation comparative example R as described in the embodiment 20, different is to replace white alumina with silicon carbide abrasive particles.Comparative example S is the abrasive product that comprises cerium oxide particle, is prepared as follows.Abrasive slurry comprises following component: BP1: tetramethylol methane tetraacrylate, and available from Sartomer Co., Inc. Exton, PA, commodity are called 1SR 2951; BP2: acrylic acid 2-phenoxy ethyl resin, available from Sartomer, Co., Inc., commodity are called 1SR 3391; CA1:3-methacryloxypropyl trimethoxy monosilane coupling agent, available from OSI Specialties, Inc., Danbury,

CT, commodity are called 1A-1741; PH7:2,4, the liquid light trigger of 6-trimethylbenzene formyl-diphenyl-phosphine oxide, available from BASF, Charlotte, NC, merchant

Product are called 1 Lucirin LR 88931; CEO1: ceria abrasive particles, its particle mean size are about 0.5 micron, available from Rhone Poulenc, and Shelton, CT,

And APS: anion surface of polyester activating agent, available from ICI Americas, Inc., Wilmington, DE, commodity are by name

1FP41 and " PS4 ".

Abrasive product by the formulation preparation of abrasive slurry described in the table 19 embodiment 1.

Table 19

Material	Weight %
		????BP1	????6.85
????BP2	????6.85
		????CA1	????0.84
????APS	????1.26
		????PH7	????0.47
????CEO1	????83.74

Prepare abrasive product by ceria slurry with above-mentioned prescription.Abrasive product includes the abrasive compound of clear and definite shape.The particle mean size of cerium oxide particle is about 0.3 micron.

Use above-mentioned test method to embodiment 4 and 19 and comparative example R and S test, but by the different polishing times of pointing out in the table 20.Charging Ra is about 1.46 microns.

Table 20

Embodiment	????4	????19	Comparative example R	Comparative example S
					Cutting output (gram)	????0.25	????0.0	????0.0	????0.0
Polishing time	10 seconds	10 seconds	10 seconds	10 seconds
					Average Ra.	????0.15	????0.07	????0.05	????0.06

Compare with the result that abrasive product with the foregoing description 20 obtains, the abrasive product of comparative example G-S obtain aspect the almost optically transparent any surface finish face so ineffective.Though the Ra value that the Ra value can obtain with the abrasive product with embodiment 20 is compared, discovery shows any surface finish face that comprehensively has mist degree (haze) through the glass test base of the abrasive product polishing of comparative example G-S, and some any surface finish masks have dark cut.

Comparative example T-W

With glass polishing goods of the present invention, three part abrasive product systems shown in embodiment 4 (particle mean size is about 74 microns abrasive particle), embodiment 19 (particle mean size is about the abrasive particle of 30 microns and 45 microns) and embodiment 20 (particle mean size is about the abrasive particle of 9 microns and 15 microns), with the system that the structured abrasives pad is arranged that comprises alumina abrasive grain relatively.The particle mean size of the alumina abrasive grain of comparative example T, U, V and W is respectively 125 microns, 35 microns, 10 microns and 5 microns.These abrasive pad are generally used for grinding conveniently (off-handlapping), available from 3M (St. Paul, MN), trade name is respectively A 125 MIC 3M 268XA XO, A 35MIC 3M 268XA AO, A 10 MIC 3M 268XA AO and A 5 MIC 3M 268XA AO.

Table 21

Embodiment	??????T	????????U	??????V	??????W
					Cutting output (gram)	??8.05??2.26	???0.58??0.16	??0.10???0.03	??0.01???0.01
Polishing time	15 seconds	15 seconds	15 seconds	10 seconds
					Average Ra.	?????1.97	??????0.43	?????0.17	??????0.08

It is meticulous that any surface finish face use not as shown in table 7 abrasive product of the present invention of the glass test base that as seen, polishes with comparative example T-W abrasive product system polishes the gained result.In addition, the mist degree of also finding any surface finish face that the abrasive product with comparative example T-W obtains is greater than the result who obtains with abrasive product of the present invention.

Under the situation that does not depart from the scope of the invention and spirit, be that those skilled in the art are conspicuous to various changes and the variation that the present invention did.Should be appreciated that the present invention should not be subjected to the restriction of illustrative embodiment herein.

Claims (12)

1. abrasive product, it comprises:

A backing; With

Be bonded in the three-dimensional abrasive coating of a lip-deep one deck at least of described backing, this coating comprises the diamond particles that is dispersed in the adhesive, described adhesive comprises the adhesive precursor that comprises urethane acrylate oligomer through solidifying, and wherein this abrasive product RPP method of using polishing time to be about 25 seconds can be tested glass that about 0.05 micron or bigger Initial R a value are reduced to about 0.05 micron or littler final Ra value on the base.

2. abrasive product as claimed in claim 1, the wherein said abrasive coating of one deck at least comprise many abrasive compounds that clear and definite shape is arranged.

3. abrasive product as claimed in claim 1, the wherein said abrasive coating of one deck at least comprise many abrasive compounds in irregular shape.

4. abrasive product as claimed in claim 2, wherein each has the shared surface area in bottom of abrasive compound of clear and definite shape greater than top about at the most 60%.

5. abrasive product as claimed in claim 1, wherein the particle mean size of diamond particles is about the 0.01-300 micron.

6. abrasive product as claimed in claim 1, wherein the particle mean size of diamond particles is about 74 microns.

7. abrasive product as claimed in claim 1, wherein adhesive precursor comprises the ethylenically unsaturated monomer of the acrylate monomer and composition thereof of the acrylate monomer that is selected from simple function, dual functional acrylate monomer, trifunctional.

8. glass polishing system, it comprises each described abrasive product among at least a claim 1-7.

9. glass polishing system as claimed in claim 8, its feature are that also it comprises tria capita and requires each described abrasive product among the 1-7, and wherein these three kinds of abrasive products reduce the ability difference of Initial R a.

10. method that glass pieces is polished may further comprise the steps:

Glass pieces is contacted with each described abrasive product among the claim 1-7, and the RPP method that wherein said abrasive product uses polishing time to be about 25 seconds can be tested base from glass and remove about 0.75 gram or more glass blank;

Applicating liquid on the interface of glass pieces and abrasive product;

Make glass pieces and abrasive product relative motion; And

Ra is reduced to about 0.7 micron or lower by initial value.

11. the method that on-plane surface cathode-ray tube glass goods are polished, it may further comprise the steps:

The convex surface of cathode-ray tube goods is contacted with a kind of abrasive product, described abrasive product comprises a backing and is positioned at the three-dimensional abrasive coating of the lip-deep one deck at least of one of this backing, and the three-dimensional abrasive coating of wherein said one deck at least comprises and is dispersed in many diamond particles that are bonded in lip-deep adhesive of described backing;

In the presence of water, make the convex surface and the abrasive product of cathode-ray tube glass goods do relative motion, and

Reduce the surface smoothness of the convex surface of cathode-ray tube glass goods.

12. an instrument that comprises cathode-ray tube, the surface of wherein said cathode-ray tube glass goods is through the described method polishing of claim 11.

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