CN1241062C - 预增感平版印刷版 - Google Patents
预增感平版印刷版 Download PDFInfo
- Publication number
- CN1241062C CN1241062C CNB021052611A CN02105261A CN1241062C CN 1241062 C CN1241062 C CN 1241062C CN B021052611 A CNB021052611 A CN B021052611A CN 02105261 A CN02105261 A CN 02105261A CN 1241062 C CN1241062 C CN 1241062C
- Authority
- CN
- China
- Prior art keywords
- aluminium sheet
- pregaining
- pit
- printing plate
- heavy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 title claims abstract description 109
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 191
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 121
- 239000004411 aluminium Substances 0.000 claims description 168
- 239000013078 crystal Substances 0.000 claims description 36
- 238000007669 thermal treatment Methods 0.000 claims description 27
- 239000004429 Calibre Substances 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 abstract description 31
- 238000011282 treatment Methods 0.000 abstract description 28
- 238000007788 roughening Methods 0.000 abstract description 2
- 238000012545 processing Methods 0.000 description 157
- 238000000034 method Methods 0.000 description 136
- 150000001398 aluminium Chemical class 0.000 description 62
- 239000007864 aqueous solution Substances 0.000 description 56
- 230000008569 process Effects 0.000 description 54
- 238000005530 etching Methods 0.000 description 27
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 26
- 239000000243 solution Substances 0.000 description 25
- 239000008151 electrolyte solution Substances 0.000 description 21
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 19
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 18
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 18
- 238000001354 calcination Methods 0.000 description 18
- 229910017604 nitric acid Inorganic materials 0.000 description 18
- 229910000838 Al alloy Inorganic materials 0.000 description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- 239000002253 acid Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 16
- 239000002994 raw material Substances 0.000 description 16
- -1 nitrate compound Chemical class 0.000 description 15
- 239000010936 titanium Substances 0.000 description 15
- 238000005868 electrolysis reaction Methods 0.000 description 14
- 239000011777 magnesium Substances 0.000 description 14
- 238000000137 annealing Methods 0.000 description 13
- 238000002048 anodisation reaction Methods 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- JLDSOYXADOWAKB-UHFFFAOYSA-N aluminium nitrate Chemical compound [Al+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O JLDSOYXADOWAKB-UHFFFAOYSA-N 0.000 description 10
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 230000002378 acidificating effect Effects 0.000 description 8
- 238000005266 casting Methods 0.000 description 8
- 238000003486 chemical etching Methods 0.000 description 8
- 238000000445 field-emission scanning electron microscopy Methods 0.000 description 8
- 230000014509 gene expression Effects 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 238000005097 cold rolling Methods 0.000 description 7
- 230000005611 electricity Effects 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000004677 Nylon Substances 0.000 description 5
- 239000006096 absorbing agent Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 238000005098 hot rolling Methods 0.000 description 5
- 239000011572 manganese Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229920001778 nylon Polymers 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 230000035484 reaction time Effects 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 229910002651 NO3 Inorganic materials 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 208000010392 Bone Fractures Diseases 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 206010017076 Fracture Diseases 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- 208000013201 Stress fracture Diseases 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 239000008267 milk Substances 0.000 description 2
- 210000004080 milk Anatomy 0.000 description 2
- 235000013336 milk Nutrition 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 235000010344 sodium nitrate Nutrition 0.000 description 2
- 239000004317 sodium nitrate Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 241000743339 Agrostis Species 0.000 description 1
- 229910018575 Al—Ti Inorganic materials 0.000 description 1
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- 208000034189 Sclerosis Diseases 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910033181 TiB2 Inorganic materials 0.000 description 1
- 239000012445 acidic reagent Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910021502 aluminium hydroxide Inorganic materials 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 229910052571 earthenware Inorganic materials 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CBXWGGFGZDVPNV-UHFFFAOYSA-N so4-so4 Chemical compound OS(O)(=O)=O.OS(O)(=O)=O CBXWGGFGZDVPNV-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
- Glass Compositions (AREA)
- Organic Insulating Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
铝合金 | Fe(wt%) | Si(wt%) | Ti(wt%) | Cu(wt%) | Mg(wt%) | Mn(wt%) | 其它(wt%) | Al(wt%) | 标记 |
1 | 0.30 | 0.07 | 0.03 | 0.015 | 0.014 | 0.001 | 0.02 | 99.55 | JIS A1000材料 |
2 | 0.20 | 0.03 | 0.005 | 0.002 | 0.002 | 0.000 | 0.02 | 99.74 | JIS A1000材料 |
3 | 0.30 | 0.25 | 0.02 | 0.30 | 0.30 | 1.10 | 0.03 | 97.7 | JIS A3000材料 |
铝合金 | 疲劳断裂强度 | 弄糙处理的稳定性 | 原料费用 | 印刷过程中疲劳断裂比率 | |||
加热前(时间) | 加热后(时间) | B/A×100(%) | |||||
实施例1实施例2实施例3比较例1比较例2比较例3比较例4 | 1231223 | 1200010000107001100097001000020000 | 104008900820075006300730017000 | 87897768657385 | 优异优异优异优异优异优异差 | 102100100102100100120 | 00051030 |
0.2%容许应力 | 晶粒宽度(μm) | 晶粒长度(μm) | |||||
加热前(A)(MPa) | 加热后(B)(MPa) | B/A×100(%) | 平均 | 最大 | 平均 | 最大 | |
实施例1实施例2实施例3比较例1比较例2比较例3比较例4 | 160151151160150150220 | 12011110411795105190 | 75736973637086 | 456075889710550 | 7090140200280350100 | 210290360508780640180 | 3004204806401500950280 |
铝合金 | 弄糙方法 | 凹坑特征 | 疲劳断裂比率(%) | 显示缺陷图象的纸张数 | ||
平均口径 | 深度/口径比 | |||||
实施例4实施例5实施例6实施例7 | 2222 | (3)(1)(2)(3) | 0.50.30.10.5 | 0.160.160.250.33 | 0000 | 105150170150 |
Claims (6)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001033358 | 2001-02-09 | ||
JP2001033358 | 2001-02-09 | ||
JP2001304521A JP2002307849A (ja) | 2001-02-09 | 2001-09-28 | 平版印刷版原版 |
JP2001304521 | 2001-09-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1369746A CN1369746A (zh) | 2002-09-18 |
CN1241062C true CN1241062C (zh) | 2006-02-08 |
Family
ID=26609181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB021052611A Expired - Lifetime CN1241062C (zh) | 2001-02-09 | 2002-02-09 | 预增感平版印刷版 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7037635B2 (zh) |
EP (1) | EP1231075B1 (zh) |
JP (1) | JP2002307849A (zh) |
CN (1) | CN1241062C (zh) |
AT (1) | ATE324270T1 (zh) |
DE (1) | DE60210836T2 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004230624A (ja) * | 2003-01-29 | 2004-08-19 | Fuji Photo Film Co Ltd | 平版印刷版用支持体、平版印刷版原版および平版印刷版原版の処理方法 |
JP4250490B2 (ja) * | 2003-09-19 | 2009-04-08 | 富士フイルム株式会社 | 平版印刷版用アルミニウム合金素板および平版印刷版用支持体 |
US7442491B2 (en) | 2005-03-17 | 2008-10-28 | Fujifilm Corporation | Aluminum alloy blank for lithographic printing plate and support for lithographic printing plate |
JP4714576B2 (ja) * | 2005-12-22 | 2011-06-29 | 古河スカイ株式会社 | 平版印刷版用アルミニウム合金板およびその製造方法 |
JP2007204775A (ja) * | 2006-01-31 | 2007-08-16 | Furukawa Sky Kk | 平版印刷版用アルミニウム合金板およびその製造方法 |
CN101182611B (zh) * | 2007-12-11 | 2010-10-13 | 乳源东阳光精箔有限公司 | 一种印刷版用铝板基及其制造方法 |
CN107561148A (zh) * | 2017-10-09 | 2018-01-09 | 中铝瑞闽股份有限公司 | 一种验证ctp铝版基表面缺陷的方法 |
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JPS6063340A (ja) | 1983-09-16 | 1985-04-11 | Kobe Steel Ltd | 印刷版用高強度アルミニウム合金冷間圧延板およびその製造方法 |
DE3582263D1 (de) | 1984-04-06 | 1991-05-02 | Fuji Photo Film Co Ltd | Aluminiumlegierung fuer druckplatten. |
JPS61146598A (ja) | 1984-12-20 | 1986-07-04 | Furukawa Alum Co Ltd | 平版印刷版用支持体及びその製造方法 |
DE3507402A1 (de) | 1985-03-02 | 1986-09-04 | Vereinigte Aluminium-Werke AG, 1000 Berlin und 5300 Bonn | Aluminiumoffsetband und verfahren zu seiner herstellung |
JPS6274693A (ja) | 1985-09-30 | 1987-04-06 | Nippon Light Metal Co Ltd | オフセツト印刷用アルミニウム合金支持体 |
JPS62181190A (ja) | 1986-02-06 | 1987-08-08 | Furukawa Alum Co Ltd | 平版印刷版用アルミニウム合金支持体の製造方法 |
DE3714059C3 (de) | 1987-04-28 | 1995-12-07 | Vaw Ver Aluminium Werke Ag | Material in Band- oder Plattenform und Verfahren zu seiner Herstellung sowie dessen Verwendung als Träger für Flachdruckformen |
JP2520694B2 (ja) * | 1988-06-06 | 1996-07-31 | 富士写真フイルム株式会社 | 平版印刷版用支持体 |
GB8926404D0 (en) | 1989-11-22 | 1990-01-10 | Alcan Int Ltd | Aluminium alloys suitable for lithographic printing plates |
JP3177071B2 (ja) | 1993-07-26 | 2001-06-18 | 富士写真フイルム株式会社 | 平版印刷版支持体 |
JP3506265B2 (ja) | 1993-11-09 | 2004-03-15 | 富士写真フイルム株式会社 | 平版印刷版用アルミニウム合金支持体の製造方法 |
JPH07305133A (ja) | 1994-03-17 | 1995-11-21 | Fuji Photo Film Co Ltd | 平版印刷版用支持体、及びその製造方法 |
EP0887430B2 (en) | 1997-06-26 | 2009-06-24 | Sky Aluminium Co., Ltd. | Aluminum alloy support for lithographic printing plate |
JP3693485B2 (ja) | 1998-03-09 | 2005-09-07 | 日本軽金属株式会社 | 平版印刷版用アルミニウム合金素板の製造方法 |
JP3700907B2 (ja) | 1998-07-24 | 2005-09-28 | 富士写真フイルム株式会社 | 平版印刷版用支持体 |
DE29924474U1 (de) * | 1999-07-02 | 2003-08-28 | Hydro Aluminium Deutschland GmbH, 53117 Bonn | Lithoband |
US6638686B2 (en) * | 1999-12-09 | 2003-10-28 | Fuji Photo Film Co., Ltd. | Planographic printing plate |
DE60102614T2 (de) * | 2000-02-07 | 2005-03-31 | Kodak Polychrome Graphics Co. Ltd., Norwalk | Lithographische Druckplatte aus Aluminiumlegierung und Verfahren zu ihrer Herstellung |
EP1188580B1 (en) * | 2000-09-14 | 2008-08-13 | FUJIFILM Corporation | Aluminum support for planographic printing plate, process for its production, and planographic printing master place |
US6780305B2 (en) * | 2001-02-20 | 2004-08-24 | Fuji Photo Film Co., Ltd. | Method for producing support for planographic printing plate, support for planographic printing plate, and planographic printing plate precursor |
US6808864B2 (en) * | 2001-09-12 | 2004-10-26 | Fuji Photo Film Co., Ltd. | Support for lithographic printing plate and presensitized plate |
-
2001
- 2001-09-28 JP JP2001304521A patent/JP2002307849A/ja not_active Withdrawn
-
2002
- 2002-01-31 US US10/059,378 patent/US7037635B2/en not_active Expired - Lifetime
- 2002-02-08 DE DE60210836T patent/DE60210836T2/de not_active Expired - Lifetime
- 2002-02-08 AT AT02002064T patent/ATE324270T1/de not_active IP Right Cessation
- 2002-02-08 EP EP02002064A patent/EP1231075B1/en not_active Expired - Lifetime
- 2002-02-09 CN CNB021052611A patent/CN1241062C/zh not_active Expired - Lifetime
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EP1231075A3 (en) | 2003-09-17 |
EP1231075B1 (en) | 2006-04-26 |
EP1231075A2 (en) | 2002-08-14 |
ATE324270T1 (de) | 2006-05-15 |
US20020155377A1 (en) | 2002-10-24 |
JP2002307849A (ja) | 2002-10-23 |
DE60210836T2 (de) | 2007-04-26 |
US7037635B2 (en) | 2006-05-02 |
DE60210836D1 (de) | 2006-06-01 |
CN1369746A (zh) | 2002-09-18 |
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