CN1238768C - Developer solution composition and use method thereof - Google Patents
Developer solution composition and use method thereof Download PDFInfo
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- CN1238768C CN1238768C CN 02156178 CN02156178A CN1238768C CN 1238768 C CN1238768 C CN 1238768C CN 02156178 CN02156178 CN 02156178 CN 02156178 A CN02156178 A CN 02156178A CN 1238768 C CN1238768 C CN 1238768C
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Abstract
The present invention relates to a developing solution composition and a use method thereof, particularly to the developing solution composition used for the fields of integrated circuits, printed circuit boards, color liquid crystal devices or color filtering sheets (LCD) and the use method thereof. Developing solution comprises a color photosensitive resin composition using the following (A), (B) and (C) parts as main components: (A), water, (B), an organic amine compound with the following structural general formula (I), and (C), a nonionic interfacial active agent with the following structural general formula (II). The developing solution of the present invention has the advantages of good developing performance, strong defoaming performance, wide admissible operating temperature range, few residues, low toxicity, little environmental pollution and low metallic ion content, and can be used for manufacturing film transistors and integral LCDs of the color filtering sheets.
Description
Technical field
The invention relates to a kind of composition of developer solution, especially refer on a kind of field that is used in integrated circuit, printed circuit board (PCB), color liquid crystal device or colored filter (hereinafter to be referred as LCD), make photosensitive polymer combination after filming, exposing, the composition and the application process thereof of the developer solution that forms image (pattern) are developed at unexposed position.
Background technology
General colored filter is when making, photosensitive resin coating composition on substrate normally, the mode of its coating has decoration method, print process, electricity method and pigment dispersing method etc., with the pigment dispersing method is example, it is when making colored filter, at first with dispersible pigment dispersion, solvent, photoresist and relevant adjuvant hybrid modulation become the chromatic photosensitivity resin combination, coat this photoresist on the substrate then and carry out in advance roasting, afterwards with after the light shield exposure, again with the unexposed soluble resin of developer solution flush away, can make needed coloured image, and common visualization way there is immersion development, shake development, spray developing (spray), leave standstill development (puddle) etc.
According to known developer solution technology, photosensitive polymer combination is after filming and baking in advance, expose, though can alkaline-based developer dissolve and remove the unexposed membrane portions that is coated with, but be easy to generate do not develop position particle or dissolved matter remaining not when developing, the back of therefore developing is difficult to form accurate photoresist image.In order to improve the disappearance of video picture difference, Japanese kokai publication hei 10-10749 application for a patent for invention case discloses, make developer solution with water, alkali compounds, teepol, though this kind allotment has the developer solution of teepol to have effects such as no residue, video picture be good in use, but the dispersion stability difference and the operating temperature range of the defoaming of developer solution, chromatic photoresist are narrow, and be therefore also undesirable in the use.
Recently, in advanced version liquid crystal flat panel display processing procedure, for reach more high-fineness, the color table expressivity is good, employing on the same substrate chromatic filter layer is combined in membrane transistor pipe picture element on advanced process (CF on Array, hereinafter to be referred as COA), however when the developer solution of general chromatic photoresist was applied to aforementioned advanced process, its development effect was still not enough, there are residue or metallic ion etc. residual, thereby influence the effect of aforementioned advanced product.The patent of the Taiwan patent announcement of the previous invention of this case inventor number No. 460757 for example, it is to be the colored filter developer solution of major component with alkali metal group or alkaline earth compound, however its metal ion content height, it is required not meet the application of this kind processing procedure.
Moreover, obtain whether clean the no burr in via (Contact hole) edge on the COA behind the developing programs, whether the image border on the substrate is smooth after through development also is a big problem.
Summary of the invention
Therefore, this case inventor is because the known developer solution that is used for photosensitive polymer combination, when using, it can't take into account character such as the dispersion stability of development, defoaming, chromatic photoresist and operating temperature range simultaneously, in line with excelsior spirit, improved at above-mentioned disappearance, provide that a kind of development is good, defoaming is strong, permissible operating temperature range is wide, residue is few, toxicity is low, environmental pollution is few, and the composition of the developer solution that can be used for photosensitive polymer combination that metal ion content is low, said composition comprises:
(A) water;
(B) a kind of content is the organic amine compound of the tool following structural (I) of 0.01～5 weight %;
Wherein, R
8, R
9, R
10Be selected from: hydrogen, alkyl (hydrocarbon), hydroxyalkyl (hydroxyalkyl), and wherein at least one is a hydroxyalkyl;
(C) non-ionic surfactant of a kind of content 0.05～10 weight %; Wherein, non-ionic surfactant (C) has following structural formula (II):
Structural formula (II)
Wherein, R
1, R
2, R
3, R
4, R
5Be selected from: hydrogen, alkyl (alkyl), aryl (aryl), aralkyl (aralkyl), halogen (halogen);
R
6Be selected from: ethylidine (ethylene ,-C
2H
4-), propylidyne (propylene ,-C
3H
6-), butylidyne (butylene ,-C
4H
8-);
R
7Be selected from: hydrogen, acetyl group (acetyl), alkyl (alkyl), aryl;
N is 6～23 integer;
And, R
1, R
2, R
3, R
4, R
5In at least wherein 1 be aralkyl or aryl.
And the total concentration of metal ions in the developer composition is below 5ppm.
Below at each composition used herein (A)～(C) specify.
(A) water:
Generally speaking, developer solution is used as dispersion medium with water, is the developer solution of dispersion medium with water, have hypotoxicity, do not have an incendivity, and management easily, liquid waste processing is easy and advantage such as with low cost.The water quality that is adopted is also without particular limitation, but when being used for the processing procedure of thin film transistor (TFT) and colored filter integral type LCD, its total concentration of metal ions is being good below the 5000ppb, especially being preferable below the 500ppb, 100ppb is following be best: its resistance value is being good more than the 0.05Mohmcm, especially to be preferable more than the 0.5Mohm.cm, 2Mohmcm is above to be best.
(B) organic amine compound:
The present invention uses the organic basic compound of organic amine, and it has following structural (I):
Wherein, R
8, R
9, R
10Be selected from: hydrogen, alkyl (hydrocarbon), hydroxyalkyl (hydroxyalkyl), and wherein at least one is a hydroxyalkyl; The object lesson of organic amine has: monoethanolamine (monoethanolamine), diethanolamine (diethanolamine), triethanolamine (triethanolamine), monoisopropanolamine (monoisopropanolamine), diisopropanolamine (diisopropanolamine), triisopropanolamine (triisopropanolamine), the at least a or two above potpourris of positive ehtylethanolamine (N-ethyl ethanolamine) and normal-butyl monoethanolamine compounds such as (N-butyl ethanolamine).Organic amine compound used in the present invention is also without particular limitation, but when being used for the processing procedure of thin film transistor (TFT) and colored filter integral type LCD, its total concentration of metal ions is to be good below the 20ppm, and especially to be preferable below the 5ppm, 2ppm is following to be best.
For use acrylate (acrylate) as resin as for the cementing agent (binder) of photoresist, be good with the made developer solution of joining of organic amine compound used in the present invention.Be preferable with monoethanolamine (monoethanolamine), diethanolamine (diethanolamine) and triethanolamine (triethanolamine) again wherein.
The present invention is used in the composition of developer solution of LCD substrate, and the use amount of organic amine compound (B) is 0.01～5 weight %, is preferably 0.05～3 weight %, is more preferred from 0.5～1.5 weight %.
(C) non-ionic surfactant
Non-ionic surfactant used in the present invention (C) has following structural (II):
The present invention has in the non-ionic surfactant (C) of structural formula (II), R
1, R
2, R
3, R
4, R
5For being selected from hydrogen, alkyl (alkyl), aryl (aryl), aralkyl (aralkyl), halogen (halogen), the best is an aralkyl.
R in the structural formula of the present invention (II)
6For being selected from ethylidine (ethylene ,-C
2H
4-), propylidyne (propylene ,-C
3H
6-), butylidyne (butylene ,-C
4H
8-); R
7For being selected from hydrogen, acetyl group (acetyl), alkyl (alkyl), aryl (aryl); N is 6～23 integer, is preferably 6～18, is more preferred from 6～14, and when scope 6～23 of the value of n, this non-ionic surfactant (C) is good with the dispersion stability of water (A), and development effect is good, no residue, and the operating temperature range of developer solution is wide.
The photoresist development effect was excellent especially when non-ionic surfactant used in the present invention (C) was applied to thin film transistor (TFT) and colored filter integral type LCD substrate, and the back residue that develops is few, and the defoaming of developer solution itself, dispersion stability are good.
Non-ionic surfactant used in the present invention (C) is more preferred from R in the structural formula (II)
1～R
5In at least wherein 1 be aralkyl (aralkyl) or aryl (aryl).R in non-ionic surfactant (C)
1～R
5When not containing any aralkyl (aralkyl) or aryl (aryl), composition is for the dispersion stability variation of chromatic photoresist, that is residue increases.Non-ionic surfactant used in the present invention (C) is also without particular limitation, but when being used for the processing procedure of thin film transistor (TFT) and colored filter integral type LCD, its total concentration of metal ions is to be good below the 1000ppm, and especially to be preferable below the 300ppm, 100ppm is following to be best.The concrete non-ionic surfactant (C) of the present invention can be as following cited, but not as limit:
1) polyethylene oxide-4-phenethyl phenyl ether (9 moles of addition products of oxirane), English name is: Polyoxyethylene-4-mono (1-phenyl ethyl) phenyl ether, the n value of structural formula (II) is 9, the concrete structure formula is:
2) polyethylene oxide-4-phenethyl phenyl ether (12 moles of addition products of oxirane), English name is: Polyoxyethylene-4-mono (1-phenyl ethyl phenyl ether, the n value of structural formula (II) is 12, the concrete structure formula is:
3) polyethylene oxide-3,5-hexichol ethylphenyl ether (9 moles of addition products of oxirane), English name is: Polyoxyethylene-3,5-bis (1-phenyl ethyl) phenyl ether, the n value of structural formula (II) is 9, the concrete structure formula is:
4) polyethylene oxide-3,5-hexichol ethylphenyl ether (12 moles of addition products of oxirane), English name is: Polyoxyethylene-3,5-bis (1-phenyl ethyl) phenyl ether, the n value in the structural formula (II) is 12, the concrete structure formula is:
5) polyethylene oxide-2,4,6-triphen ethylphenyl ether (9 moles of addition products of oxirane), English name is: Polyoxyethylene-2,4,6-tris (1-phenyl ethyl) phenyl ether, n value in the structural formula (II) is 9, and the concrete structure formula is:
6) polyethylene oxide-2,4,6-triphen ethylphenyl ether (12 moles of addition products of oxirane), English name is: Polyoxyethylene-2,4,6-tris (1-phenyl ethyl) phenyl ether, n value in the structural formula (II) is 12, and the concrete structure formula is:
The present invention is except can using the non-ionic surfactant with structural formula (II), necessary fashion can further add other interfacial agent, for example: polyethylene oxide fatty acid ester (polyoxyethylene fatty acid ester), polyethylene oxide sorbitol anhydride fatty acid ether (polyoxyethylene sorbitan fatty acid ether), polyethylene oxide base ether (polyoxyethylenealkyl ether), polyethylene oxide aryl ether (polyoxyethylene alkyl aryl ether), polyethylene oxide is for phenolic ether compound or its potpourris such as (polyoxyethylene alkyl phenol ether).The weight percent of non-ionic surfactant used in the present invention (C) is 0.05～10%, is preferably 0.2～6%, is more preferred from 0.3～3%.
When the composition of developer solution of the present invention is applied to the processing procedure of thin film transistor (TFT) and colored filter integral type LCD, when the weight percent that is lower than 0.01 weight % and/or non-ionic surfactant (C) when the weight percent of organic aminated compounds (B) is lower than 0.05 weight %, the dispersion stability variation of developer solution, it is many that residue becomes, and development effect is not good; And be higher than 5% and/or the weight percent of non-ionic surfactant (C) when being higher than 10% when the weight percent of aforementioned organic amine compound (B), and the defoaming of developer solution is poor, and developing manufacture process control is difficult for.
In the developer composition of the present invention, filter or adsorb total concentration of metal ions such as sodium that all feasible physics modes make the composition of developer solution, potassium, iron, magnesium, lead below 5ppm via the concentration of metal ions of each composition of control or to developer composition, be preferably below the 3ppm, be more preferred from below the lppm.When total concentration of metal ions of developer composition is lower than 5ppm, and the use amount of organic amine compound (B) is 0.01～5 weight %, and the use amount of non-ionic surfactant (C) is when being 0.05～10 weight %, in the LCD demonstration, when referring to be applied to the processing procedure of thin film transistor (TFT) and colored filter integral type LCD especially, can get good display effect, significantly reduce ghost phenomena and produce.
Developer solution of the present invention is particularly suitable for using and is containing the chromatic photosensitivity resin of colorant, above-mentioned photoresist is also without particular limitation, it can be the photosensitive polymer combination of eurymeric or minus, aspect the chromatic photosensitivity resin combination, it includes usually: compositions such as the binding resin of the pigment of organic or inorganic (colorant), alkali-soluble (binder resin), photosensitive compounds, light initiator and solvent; The binding resin of above-mentioned alkali-soluble can be: the polymkeric substance of novolac resin (Novolac resin), acrylic ester resin (acrylate resin), maleic anhydride (Maleic anhydride) or its half ester (half ester), poly-hydroxy benzenes (polyhydroxy styrene) etc. are good with the acrylic ester resin wherein; And aforementioned acrylic ester resin means that with (methyl) acrylate [(meth) acrylate] and/or (methyl) acrylic acid [(meth) acrylic acid] be Main Ingredients and Appearance, and its object lesson has:
(1) methyl methacrylate (methyl methacrylate)/hydroxy benzenes (hydroxy styrene)/styrene (styrene)/methacrylic acid (methacrylic acid) multipolymer.
(2) methacrylic acid benzene methyl (benzyl methacrylate)/methacrylic acid (methacrylic acid)/styrene (styrene) multipolymer.
(3) methyl methacrylate (methyl methacrylate)/methacrylic acid (methacrylic acid)/styrene (styrene) multipolymer.
(4) methacrylic acid benzene methyl (benzyl methacrylate)/methacrylic acid (methacrylic acid)/huge monomer of styrene (polystyrene macro monomer) multipolymer.
(5) methyl methacrylate (methyl methacrylate)/methacrylic acid (methacrylic acid)/huge monomer of styrene (polystyrene macro monomer) multipolymer.
(6) methyl methacrylate (methyl methacrylate)/methacrylic acid benzene methyl (benzylmethacrylate)/methacrylic acid (methacrylic acid) multipolymer.
(7) methacrylic acid (methylacrylic acid)/methacrylic acid benzene methyl (benzylmethacrylate) multipolymer.
(8) methacrylic acid (methylacrylic acid)/methacrylic acid benzene methyl (benzylmethacrylate)/2-hydroxyethyl methyl acrylate (2-hydroxy ethyl methacrylate) multipolymer.
The evaluation method of developer solution:
One, development effect: on the TFT substrate, with the revolution mode by centrifugal force with photoresist diffusion coating after, behind exposure, developing programs, obtain the COA substrate, whether whether clean inspect edge the no burr of the via (contacthole) on the COA substrate, it is smooth after through development to observe image border on the substrate with 50 power microscopes then.
Zero: be expressed as the clean no burr in edge of via, or the image border is flat
*: be expressed as that the edge of via is unholiness burr, or the image border out-of-flatness.
Two, residue: whether residue is arranged with the non-image position after developing on the above-mentioned LCD glass substrate of 250 times microscopic examination.
Zero: no residue
△: level of residue is few
*: level of residue is many
Three, defoaming: with the prepared developer solution 20c.c. of 100ml graduated cylinder splendid attire, and under appropriate frequency, swayed 30 minutes with rectilinear shaker, after leave standstill its foam height of amount after half an hour, again according to foam height with following benchmark evaluation:
Zero: below the 1.5cm
*: more than the 1.5cm
Four, operating temperature range is measured: with the developer solution of 100ml graduated cylinder splendid attire 20c.c., and insertion mercury thermometer, after graduated cylinder is placed the glass beaker that is filled with water, surface level need be higher than the developer solution liquid level, and heating plate heating slowly thereafter treats to get when developer solution is muddiness this muddy temperature, put again to room temperature and cool off, treat that developer solution is clarification and the time gets this clarifying temp again, average with aforementioned muddy temperature and clarifying temp, and make following benchmark evaluation according to its temperature:
More than zero: 45 ℃, expression operating temperature range broadness
△: 38～45 ℃, the expression operating temperature range is moderate
*: below 38 ℃, the expression operating temperature range is narrow
Five, total concentration of metal ions: get that the developer solution estimated measures with ICP-MS HP7500
Six, disperse stability: (AGILENT corporate system) gets the chromatic photosensitivity resin combination that the developer solution 250g that is estimated adds 1g, after suitable mixed shaking,, in 105 ℃, toasted one hour again with 5 μ m filter paper filterings, scale its filter net weight, according to this weight with following benchmark evaluation:
Zero: net weight is less than 0.04g
*: net weight is greater than 0.04g
Seven, after ghost: the LCD assembling, light a lamp and estimate its image variation
Zero: no ghost
*: ghost is arranged
Embodiment
Embodiment 1
On the TFT glass substrate that forms thin film transistor (TFT) and pixel electrode of 4 inch, following photoresist is disperseed to be coated on the substrate through centrifugal force in the revolution mode, with 10
-2After the torr vacuum drying 10 seconds, can form the base material that preparation forms image, aforementioned substrates after the light shield exposure, be impregnated in the following developer composition about 2 minutes with aforesaid base plate, and then, can on aforementioned TFT substrate, form chromatic filter layer with 200 ℃ of bakings 60 minutes; And the developer composition of present embodiment comprises: the ultrapure water of 99.2 weight % (total concentration of metal ions 2.4ppb, resistance value is 10Mohmcm), the monoethanolamine (monoethanolamine of 0.7 weight %, total concentration of metal ions 1.54ppm), and the polyethylene oxide of 0.1 weight %-3,5-hexichol ethylether (the total concentration of metal ions 56ppm of 9 moles of addition products of oxirane), total concentration of metal ions of developer composition is 0.171ppm), the rerum natura after the development is as shown in Table 2.Promptly with the image on the microscopic examination substrate, good, the no residue of its development effect, and the defoaming of developer solution itself as can be known, operating temperature range and dispersion stability are all good.
The composition and the use amount of above-mentioned Photoresisting agent composition are as shown in the table:
| Form part | The object lesson of composition | Use amount |
| Cementing agent | Methacrylic acid-methacrylic acid benzene methyl multipolymer (methacrylic acid/benzyl methacrylate copolymer) | 8.40 gram |
| Photosensitive compounds | Dipentaerythritol six (methyl) acrylate (dipentaerythritol hexa acrylate) | 0.24 gram |
| The light initiator | 2-benzyl-2-nitrogen, nitrogen-dimethylamine-1 (4-morpholino phenyl) 1-butanone [2-benzy1-2-N, N-dimethylamino-1-(4-morpholino-phenyl)-1-buta none] | 0.14 gram |
| 4,4 '-two (diethylamine) benzophenone [4,4 '-bis (diethylamine) benzophenone] | 0.04 gram | |
| Organic solvent | Propylene glycol methyl ether acetate (Propyleneglycol methyl ether acetate) | 9.54 gram |
| Pigment | PR177 (Ciba-Geigy, trade name Red A2B) | 4.00 gram |
Aforementioned each composition mixes with swing-out stirrer.
Embodiment 2～7, comparative example 1～11
With the mode of operation of embodiment 1, different locating is that the composition of developer solution is changed as shown in Table 1, the results are shown in table two after the development.
The proportion of composing of table one developer solution
| Composition | The embodiment numbering | The comparative example numbering | |||||||||||||||||
| 1 | 2 | 3 | 4 | 5 | 6 | 7 | 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | ||
| Water (metal ion content 2.4ppb) | 99.2 | 96 | 97.95 | 96.5 | 95.9 | 97.9 | 99.2 | 89 | 99.895 | 87.3 | 99.29 | 99.2 | 99.2 | 99.2 | 99.2 | 99.2 | 99.2 | 99.35 | |
| Alkali (gold belongs to pization from p zygote m) thing content | Monoethanolamine (1.54ppm) | 0.7 | 3 | 0.7 | 7 | 0.005 | 0.7 | 0.7 | 0.7 | 0.7 | 0.7 | 0.7 | 0.7 | ||||||
| Diethanolamine (2.07ppm) | 1 | 4 | |||||||||||||||||
| Three ethanol are by (1.86ppm) | 2 | 2 | |||||||||||||||||
| Hydrogen-oxygen tetramethylammonium (2.56ppm) | 0.6 | ||||||||||||||||||
| Na 2CO 3 | 0.7 | ||||||||||||||||||
| (sub-face contains the amount property agent p p m that lives to metal from the boundary) | Interfacial agent (1) (56ppm) | 0.1 | 3 | 0.05 | 4 | 0.1 | 12 | 0.01 | 0.1 | 0.05 | |||||||||
| Interfacial agent (2) (98ppm) | 0.5 | 0.1 | 0.1 | ||||||||||||||||
| Interfacial agent (3) (84ppm) | 0.1 | ||||||||||||||||||
| Interfacial agent (4) (73ppm) | 0.1 | ||||||||||||||||||
| Interfacial agent (5) (1370ppm) | 0.1 | ||||||||||||||||||
| Interfacial agent (6) | 0.1 | ||||||||||||||||||
| Interfacial agent (7) (204ppm) | 0.1 | ||||||||||||||||||
| Interfacial agent (8) (139ppm) | 0.1 | 0.1 | |||||||||||||||||
| Total concentration of metal ions (ppm) | 0.171 | 0.313 | 0.524 | 0.437 | 0.662 | 0.337 | 0.543 | 0.577 | 0.051 | 0.697 | 0.253 | 0.431 | 46.324 | 6.98 | 8.234 | 0.465 | 0.423 | 0.245 | |
Total data is represented weight %
Interfacial agent (1): shown in structural formula (II), R1 wherein, R3, R5 are hydrogen, and R2, R4 are phenethyl, and R6 is an ethylidine, n=9.
Interfacial agent (2): shown in structural formula (II), R2 wherein, R4 is a hydrogen, R1, R3, R5 are phenethyl, R6 is an ethylidine, n=9.
Interfacial agent (3): shown in structural formula (II), R1 wherein, R2, R4, R5 are hydrogen, and R3 is a phenethyl, and R6 is an ethylidine, n=9.
Interfacial agent (4): shown in structural formula (II), R1 wherein, R2, R3, R4, R5 are hydrogen, n=9.
Interfacial agent (5): polyethylene oxide sorbitol anhydride fatty acid ether (polyoxyethylene sorbitan fatty caid ether).
Interfacial agent (6): octadecyl benzene sulfonic acid sodium salt.
Interfacial agent (7): polyethylene oxide 16 oleoyl ethers (polyoxyethylene oleyl cetyl ether).
Interfacial agent (8): shown in structural formula (II), R1 wherein, R3, R5 are hydrogen, and R2, R4 are phenethyl, and R6 is an ethylidine, n=25.
Each embodiment of table two and comparative example experimental result
| Experiment numbers | Development effect | Residue | Defoaming | Operating temperature | Disperse stability | Ghost | |
| Embodiment | 1 | ○ | ○ | ○ | ○ | ○ | ○ |
| 2 | ○ | ○ | ○ | ○ | ○ | ○ | |
| 3 | ○ | ○ | ○ | ○ | ○ | ○ | |
| 4 | ○ | △ | ○ | ○ | ○ | ○ | |
| 5 | ○ | △ | ○ | ○ | ○ | ○ | |
| 6 | ○ | △ | ○ | ○ | ○ | ○ | |
| 7 | ○ | ○ | ○ | ○ | ○ | ○ | |
| 8 | ○ | ○ | ○ | ○ | ○ | ○ | |
| Comparative example | 1 | × | △ | ○ | ○ | ○ | ○ |
| 2 | × | × | ○ | ○ | ○ | × | |
| 3 | × | ○ | × | × | ○ | ○ | |
| 4 | × | × | ○ | ○ | × | × | |
| 5 | × | × | × | × | × | △ | |
| 6 | ○ | △ | ○ | ○ | ○ | × | |
| 7 | × | ○ | × | ○ | × | × | |
| 8 | × | ○ | × | × | × | × | |
| 9 | × | ○ | × | × | × | ○ | |
| 10 | × | △ | ○ | × | × | ○ | |
| 11 | × | △ | ○ | ○ | ○ | ○ | |
Embodiment 8
The base material that reference example is made impregnated in the developer solution about 2 minutes, and then with 200 ℃ of bakings 60 minutes, can form chromatic filter layer on aforementioned TFT substrate; And the developer solution of present embodiment comprises: the monoethanolamine (monoethanolamine) of the water of 98.9 weight %, 0.7 weight %, and the polyethylene oxide of 0.4 weight %-3,5-hexichol ethylether (9 moles of addition products of oxirane), the same interfacial agent of its structural formula (1) but its (total metal ion content is 1326ppm); The developer composition allotment is finished, and after the ring-like filter material of the 8inch of Cuno corporate system O shape filtered, total metal ion content was 0.864ppm again; Rerum natura after the development as shown in Table 2.Promptly with the image on the microscopic examination substrate, good, the no residue of its development effect, and the defoaming of developer solution itself as can be known, operating temperature range and dispersion stability are all good.
The above is only for several preferable possible embodiments of the present invention, allly has the knack of this technology personage, and it all ought to be included in this case claim scope according to modification or change that the present invention's spirit category is done.
Claims (8)
1, a kind of composition of developer solution, it is an alkaline water-based developer solution used when being used in the image formation of photoresist exposure back, said composition comprises:
(A) water;
(B) organic amine compound of a kind of content 0.01～5 weight %;
Wherein, this organic amine compound is at least a or two above potpourris in monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, triisopropanolamine, positive ehtylethanolamine, the normal-butyl monoethanolamine;
(C) a kind of content 0.05～10 weight % non-ionic surfactant; Wherein, non-ionic surfactant (C) has following structural formula (II):
----Knot Agencies formulas (II)
Wherein, R
1, R
2, R
3, R
4, R
5Be selected from: hydrogen, aryl, aralkyl;
R
6Be selected from: ethylidine, propylidyne, butylidyne;
R
7Be selected from: hydrogen;
N is 6～14 integer;
And, R
1, R
2, R
3, R
4, R
5In at least wherein 1 be aralkyl or aryl;
And the total concentration of metal ions in the developer composition is below 5ppm.
2, the composition of developer solution according to claim 1 is characterized in that the R in the structural formula (II)
1, R
2, R
3, R
4, R
5Be selected from hydrogen, aralkyl, and R
1, R
2, R
3, R
4, R
5In at least 1 be aralkyl.
3, the composition of developer solution according to claim 1, wherein, the R in the structural formula (II)
2, R
4Be aralkyl.
4, the composition of developer solution according to claim 1, wherein, the R in the structural formula (II)
2, R
4Be phenethyl.
5, the composition of developer solution according to claim 1, wherein, the R in the structural formula (II)
1, R
3, R
5Be aralkyl.
6, the composition of developer solution according to claim 1, wherein, the R in the structural formula (II)
1, R
3, R
5Be phenethyl.
7, the composition of developer solution according to claim 1, it is applicable to the processing procedure of thin film transistor (TFT) and colored filter integral type LCD.
8, application rights requires 1 or 7 described developer compositions to make the method for thin film transistor (TFT) and colored filter integral type LCD, it is characterized in that may further comprise the steps: 1) on the substrate that contains thin film transistor (TFT) and pixel electrode, and the coating chromatic photoresist; 2) after the light shield exposure, develop with developer composition.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02156178 CN1238768C (en) | 2002-12-13 | 2002-12-13 | Developer solution composition and use method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02156178 CN1238768C (en) | 2002-12-13 | 2002-12-13 | Developer solution composition and use method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN1508633A CN1508633A (en) | 2004-06-30 |
| CN1238768C true CN1238768C (en) | 2006-01-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02156178 Expired - Lifetime CN1238768C (en) | 2002-12-13 | 2002-12-13 | Developer solution composition and use method thereof |
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| Country | Link |
|---|---|
| CN (1) | CN1238768C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007028294A1 (en) * | 2005-09-05 | 2007-03-15 | Byd Company Limited | A developer solution for photoresist |
| CN1928724B (en) * | 2005-09-05 | 2010-09-29 | 比亚迪股份有限公司 | Photoresistance developer |
| CN102096344B (en) * | 2010-12-17 | 2013-02-06 | 合肥茂丰电子科技有限公司 | Developing solution as well as preparation method and application thereof |
| KR101603565B1 (en) * | 2015-09-10 | 2016-03-16 | 영창케미칼 주식회사 | Developer Composition For Color Filter Image Sensor |
-
2002
- 2002-12-13 CN CN 02156178 patent/CN1238768C/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1508633A (en) | 2004-06-30 |
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