CN1212379A - Reflector, method for fabricating the same and reflective liquid crystal display device incorporating the same - Google Patents
Reflector, method for fabricating the same and reflective liquid crystal display device incorporating the same Download PDFInfo
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- CN1212379A CN1212379A CN 97120688 CN97120688A CN1212379A CN 1212379 A CN1212379 A CN 1212379A CN 97120688 CN97120688 CN 97120688 CN 97120688 A CN97120688 A CN 97120688A CN 1212379 A CN1212379 A CN 1212379A
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Abstract
A reflector includes a substrate,a plurality of convex/concave portions formed on the substrate, and a thin reflective film formed over the convex/concave portions. When light is incident upon the reflector from a certain direction, an intensity of reflected light in a viewing angle range of about -45 deg. to +45 deg. with respect to a regular reflection direction of the incident light is about 60% or more of an intesity of light which is incident upon a standard white plate from a direction inclined by about 30 deg. from a direction normal to the plate and is reflected to the direction normal to the plate.
Description
The present invention relates to a kind of method of not having the reverberator that comprised in the reflection of light formula liquid crystal indicator of the back side and making this reverberator, and contain this reverberator reflective LCD device.
In recent years, liquid crystal indicator has been widely used in personal computer, televisor, word processor, video camera etc.But have the demand of further improving these equipment, as miniaturization, energy-conservation, reduce cost etc.For to satisfy in the trial of these requirements, developed no back side reflection of light formula liquid crystal indicator, it comes display image by reflect ambient light.
In order to realize bright demonstration with no back side reflection of light formula liquid crystal indicator, important being effectively utilizes surround lighting.Therefore, the reverberator that this reflective LCD device comprised plays important effect.So, will design and have optimum reflecting properties and can effectively utilize the reverberator that incides the surround lighting on the described device from all directions, but also will develop the method for making this reverberator with high precision and high duplication.
Japanese Unexamined Patent Application 6-75238 discloses a kind of reflective LCD device, this reverberator comprise protruding/concave portion of making by photosensitive resin and one than this protruding/concave portion thin and be positioned at whole protruding/film on the concave portion, thereby make comprise described protruding/reflector surface of concave portion is smooth.This reverberator is used in the liquid crystal indicator that is combined with guest-host type (hereinafter to be referred as " GH " type).
Figure 20 G-20L is top view, the making step of a conventional reflector 106 of each expression, and Figure 20 A-20F is respectively the sectional view along A-A ' line among Figure 20 G-20L.Dotted line among Figure 20 L is represented the level line of reverberator 106.
At first, shown in Figure 20 A and 20G, on glass substrate 101, be coated with, form photosensitive resin layer 102a with photosensitive resin.Then, shown in Figure 20 B and 20H, on whole glass substrate 101, place a photomask 103 that comprises annulus, make described substrate exposure and development again, then such shown in Figure 20 C and 20I, on substrate 101, form cylindrical projections 102b.Then, make whole substrate, make suitably fusion of projection 102b, form level and smooth protuberance 102c, promptly shown in Figure 20 D and 20J through heat-treated.After this, again photosensitive resin is coated on the whole surface with the substrate 101 of level and smooth protuberance 102c, thereby forms the photosensitive resin layer 104 thinner than resin bed 102a, then shown in image pattern 20E and the 20K like that, obtain a surface with level and smooth protruding/concave portion.At last, a thin metal film is deposited on the resin bed 104, forms the reflectance coating 105 shown in Figure 20 F and 20L.So, just make a traditional reverberator 106.
Shown in Figure 20 L, the reverberator of making by the traditional fabrication method 106 comprises a large amount of plane domains.Thereby the optical characteristics of this reverberator 106 is, although do not interfere, incides the direction that most of light on the reverberator 106 all is reflected to plane reflection.For example, when light when injecting on it perpendicular to the direction of conventional reflector 106, most of light is reflected to the direction perpendicular to reverberator 106, this is equivalent to the direction of plane reflection.Therefore, only exist one extremely limitedly can obtain the catoptrical direction of high strength zone therein.In other words, adopt this conventional reflector 106, can not in the direction zone of broad, obtain the high strength reflected light.So when such reverberator is used for reflection-type liquid-crystal display device, and when carrying out multicolor displaying, with regard to practical, display brightness certainly will be sufficient inadequately.
The making of traditional liquid crystal indicator does not take into full account the compatibility between liquid crystal display mode, color filter and the reverberator.So, just there is nonconforming situation, though bright as showing, contrast is low; Though contrast is high, brightness is then low; Perhaps the brightness and contrast is high, but response speed is slow, threshold voltage is high or owing to the internal approach of liquid crystal molecule make show inhomogeneous.
Be the display quality of guaranteeing that actual use is required, the application of this traditional liquid crystal indicator is limited to white and black displays, and perhaps preferably four looks show.So this obviously can not satisfy the demand of carrying out multicolor displaying for increasing information change day by day.
For realizing to be the used multicolor displaying of reality, when improving the reflection characteristic of reverberator, just need the adaptability between consideration reverberator, liquid crystal display mode, color filter and the other factors.Different with band back side optical transmission formula liquid crystal indicator, reflective LCD device depends on surround lighting to a great extent.Thereby, the with due regard to optical characteristics of reverberator and protruding/recessed structure; Also need from multiple display mode, suitably to select display mode, to cooperate the optical characteristics of reverberator best; Need the various parameters of preferred display mode again and suitably design color filter.But,,, still can not realize multicolor displaying because the reflection characteristic of reverberator is not fully even adopt these by preferred factor.
According to a kind of situation of the present invention, a kind of reverberator comprises substrate, at the many protruding/concave portion that forms on the described substrate and a reflective film that forms on described each protruding/concave portion.When light incides on the reverberator with first incident angle with respect to normal direction, with respect to the reflected light direction of plane reflection approximately the intensity of reflected light in-45 ° to+45 ° angulars field of view be referenced strength about 60% or higher, wherein referenced strength is to incide the light on the reference white flat board and be reflected to the light intensity of normal direction with second incident angle with respect to normal direction.
In a kind of specific embodiment of the present invention, each protruding/concave portion comprises a continuous curve surface at least in part.Altogether account for about 40% or littler less than the total area of these parts of 2 ° substrate with respect to the total area of described substrate with the inclination angle of reflector surface.
In another kind of specific embodiment of the present invention, each protruding/concave portion forms by photosensitive resin.
In another specific embodiment of the present invention, each protruding/concave portion forms by inorganic oxide and photosensitive resin.
In another specific embodiment of the present invention, each protruding/concave portion forms by molecule and photosensitive resin.
In another specific embodiment of the present invention, by form a plurality of cylindrical calixconcavities in the photosensitive resin layer that on substrate, forms and heat each cylindrical calixconcavity form described protruding/concave portion.
According to another kind of situation of the present invention, a kind of making comprise many protruding/concave portion of forming on substrate, the substrate and whole protruding/method that is formed with the reverberator of reflective film on the concave portion comprises the steps: to carry out the circulation of a plurality of photoetching processes and heat treatment process, and is protruding in order to form/concave portion; Also be included in whole protruding/form the process of reflective film on the concave portion.
In a kind of specific embodiment of the present invention, the shape of the protruding/concave portion that forms in the single circulation by photoetching process is the same.
In another kind of specific embodiment of the present invention, the shape of the protruding/concave portion that forms in a circulation of photoetching process is different with the shape of protruding/concave portion that another circulation at photoetching process forms.
In another specific embodiment of the present invention, as used photosensitive resin in a plurality of photoetching process circulations, use a kind of negative photosensitive resin earlier, use a kind of positive type photosensitive resin then again.
According to another situation of the present invention, a kind of making comprise many protruding/concave portion of forming on substrate, the substrate and whole protruding/be formed with the method for the reverberator of reflective film on the concave portion, comprise the steps: to carry out photoetching process and heat treatment process, in order to form described protruding/concave portion; Whole protruding/form the process of reflective film on the concave portion.Described method also is included in the step of a kind of oxide of formation on the described substrate and the step of this oxide of etching.
According to another situation of the present invention, a kind of making comprise many protruding/concave portion of forming on substrate, the substrate and whole protruding/method that is formed with the reverberator of reflective film on the concave portion comprises the steps: to carry out photoetching process and heat treatment process, in order to form described protruding/concave portion; Whole protruding/form the process of reflective film on the concave portion, wherein, described method also is included in and uses the organic insulation resin that is mixed with molecule on the described substrate.
According to another situation of the present invention, a kind of making comprise many protruding/concave portion of forming on substrate, the substrate and whole protruding/method that is formed with the reverberator of reflective film on the concave portion comprises the steps: to form photosensitive resin layer on described substrate; Carry out photoetching process, so that on described photosensitive resin layer, form a plurality of cylindrical calixconcavities; Heat described a plurality of cylindrical calixconcavity, so as on described substrate, to form described protruding/concave portion; And whole protruding/form reflective film on the concave portion.
According to another situation of the present invention, a kind of reflective LCD device comprises above-mentioned reverberator.
In a kind of specific embodiment of the present invention, described reflection-type liquid-crystal display device also comprises substrate and the liquid crystal layer between described substrate and reverberator.Described liquid crystal layer comprises a kind of guest-host type liquid crystal material.
In another kind of specific embodiment of the present invention, the birefraction of liquid crystal display material (Δ n) approximately is 0.15 or littler; The anisotropy of liquid crystal display material specific inductive capacity (Δ ε) meets expression 4＜Δ ε＜12; The torsion angle of liquid crystal display material is set in about 180 ° to 360 ° scopes; The thickness of liquid crystal box that is formed by substrate, reverberator and liquid crystal layer is in about 3-10 mu m range.
In another specific embodiment of the present invention, described reflection-type liquid-crystal display device also comprises the color filter with the coloured part of three kinds of different colours, and the thickness difference between wherein adjacent coloured part is about 0.3 μ m or littler.
So the present invention described herein can bring following advantage, (1) provides a reverberator, and its reflection characteristic is suitable for reflective LCD device or similar corresponding reverberator most, thereby effectively utilizes surround lighting, and does not have interference; (2) provide a kind of method of making this reverberator; (3) provide a kind of reliable reflective LCD device, can allow multicolor displaying by the compatibility between preferred reverberator, liquid crystal layer and the color filter with fabulous display quality.
Read and understand following detailed by the reference accompanying drawing, these and other advantage of the present invention will be become more for clear for those skilled in the art.
Figure 1A to 1M illustrates the manufacturing process of the reverberator of the embodiment of the invention 1;
Fig. 2 A is the figure of expression embodiment 1 reflector surface tilt profiles;
Fig. 2 B is the figure of expression embodiment 2 reflector surface tilt profiles;
Fig. 2 C is the figure of expression comparative example 1 reflector surface tilt profiles;
Fig. 2 D is the figure of expression comparative example 2 reflector surface tilt profiles;
Fig. 2 E is the figure of expression embodiment 5 reflector surface tilt profiles;
Fig. 3 is the synoptic diagram of expression test reverberator reflection characteristic;
Fig. 4 A is the curve of expression embodiment 1 reverberator reflection characteristic;
Fig. 4 B is the curve of expression embodiment 2 reverberator reflection characteristics;
Fig. 4 C is the curve of expression comparative example 2 reverberator reflection characteristics;
Fig. 4 D is the curve of expression comparative example 2 reverberator reflection characteristics;
Fig. 4 E is the curve of expression embodiment 5 reverberator reflection characteristics;
Fig. 5 A to 5I illustrates the manufacturing process of the reverberator of the embodiment of the invention 2;
Fig. 6 A to 6J illustrates the manufacturing process of comparative example 2 reverberators, and wherein Fig. 6 F to 6J respectively is the top view of a making step, and Fig. 6 A to 6E is respectively the sectional view of getting along A-A ' line among Fig. 6 F to 6J;
Fig. 7 A to 7D illustrates the manufacturing process of the embodiment of the invention 3 reverberators;
Fig. 8 A to 8C illustrates the manufacturing process of the embodiment of the invention 4 reverberators;
Fig. 9 A to 9L illustrates the manufacturing process of the embodiment of the invention 5 reverberators; Wherein Fig. 9 G to 9L respectively represents the top view of a making step, and Fig. 9 A to 9F is respectively the sectional view of getting along A-A ' line among Fig. 9 G to 9L;
Figure 10 is the curve map of the expression embodiment of the invention 5 reverberator sections;
Figure 11 is the sectional view of the expression embodiment of the invention 6 reflection-type liquid-crystal display device structures;
Figure 12 is the curve map that concerns between expression birefraction Δ n of liquid crystal indicator and the contrast;
Figure 13 is the sectional schematic diagram of used color filter among the expression embodiment 6 and 7;
Figure 14 A is the correlativity curve map at expression reflective light intensity and visual angle when employing embodiment 6 reflective LCD devices;
Figure 14 B is the correlativity curve map at expression reflective light intensity and visual angle when employing conventional reflective liquid crystal indicator;
Figure 15 A is the correlativity curve map at expression embodiment 6 reflective LCD device contrast ratings and visual angle;
Figure 15 B is the correlativity curve map at expression conventional reflective liquid crystal indicator contrast rating and visual angle;
Figure 16 A is the synoptic diagram of expression from single light source gained incident light;
Figure 16 B is the synoptic diagram of expression from a plurality of light source gained incident lights;
Figure 17 A is illustrated in the direction of light scope that is reflected by reverberator of the present invention under the single light source situation;
Figure 17 B is illustrated in the direction of light scope that is reflected by conventional reflector under the single light source situation;
Figure 18 A is illustrated in the direction of light scope that is reflected by reverberator of the present invention under a plurality of light source situations;
Figure 18 B is illustrated in the direction of light scope that is reflected by conventional reflector under a plurality of light source situations;
Figure 19 is the color filter in the reflective LCD device of the present invention and the chromaticity diagram of the color filter in the traditional reflective type liquid crystal indicator;
Figure 20 A to 20L illustrates the manufacture process of conventional reflector, and wherein Figure 20 G to 20L respectively represents the top view of a making step, and Figure 20 A to 20F is respectively the sectional view of getting along A-A ' line among Figure 20 G to 20L;
Figure 21 A to 21J illustrates the manufacturing process of comparative example 1 reverberator, and wherein Figure 21 F to 21J respectively represents the top view of a making step, and Figure 21 A to 21E is respectively the sectional view of getting along A-A ' line among Figure 21 F to 21J;
Figure 22 is the curve map that concerns between expression reflector surface shape and the reflective light intensity.
Below an embodiment of the present invention will be described reverberator of 1 and preparation method thereof.
The method of the reverberator of making the embodiment of the invention 1 is described referring now to the manufacturing process of reverberator shown in Figure 1A to 1M.
Shown in Figure 1A, with photosensitive resin (as TOKYO OHKA KOGYO CO., LTD. " OFPR-8000 ") being preferably under about 500-3000rpm condition rotation is coated on the surface such as the transparent substrate 11 of glass substrate (as " 7059 " of CORNING INC.) class, to form photosensitive resin layer 12a.In the present embodiment, will be as " OFPR-8000 " (TOKYOOHKA KOGYO CO. of photosensitive resin, LTD.) be added in as substrate, thickness is about on " 7059 " (CORNING INC.) of 1.1mm, rotation glass substrate 11 under about 1000rpm condition, last about 30 seconds, thereby on glass substrate 11, form the thick photosensitive resin layer 12a of 1.2 μ m.Then, under about 100 ℃ of conditions, made described substrate prebake about 30 minutes, for another example shown in Figure 1B, have the photomask 13 that pre-determines figure with one and be placed on the whole glass substrate 11 afterwards.Then, make this substrate exposure, and (the NMD-3:TOKYO OHKA KOGYO CO. as 2.38% develops LTD.), thereby form small cylindrical projections 12b like that shown in Fig. 1 C with developer solution.Below, abbreviate series of steps as " photoetching process " from the coating photosensitive resin layer to exposure.
Comprise many small circular photic zones that are distributed in randomly wherein for forming the used photomask 13 of cylindrical projections 12b in Figure 1B step.Photomask 13 is designed so that the neighboring projection 12b that forms separates the interval of about 2 μ m each other at least in single photoetching process, any one projection 12b is all unlikely to be contacted with neighboring projection 12b thereby make.In addition, photomask 13 is designed so that be approximately 80% of the pixel region total area through the total area of three formed all projections of photoetching process circulation.
After the heat treatment process under the 120-250 ℃ of condition subsequently, make the projection 12b on the substrate 11 circular, thereby obtain surface smoothing, the protuberance 12c of no any limbus on it, shown in Fig. 1 D.Thermal treatment in the present embodiment is to carry out about 30 minutes under about 180 ℃ of conditions.Following this step is abbreviated as " heat treatment process ".
Then, make the series of steps repetitive cycling repeatedly (shown in Fig. 1 E to 1H and 1I value 1L, being in this example) that shown in Figure 1A-1D, comprises photoetching process and heat treatment process greater than twice circulation.
For circulation at every turn in three circulation steps, the condition in these making steps is shown in the following table 1.Table 1
| Substrate rotating speed when being coated with photosensitive resin | Be coated with the duration of photosensitive resin | Synthetic film thickness | The aperture shape of photomask | The aperture diameter of photomask | |
| First circulation | 1000rpm | ????30sec | ?0.5μm | Circular | 20μm |
| Second circulation | 2000rpm | ????30sec | ?1.2μm | Circular | 10μm |
| The 3rd circulation | 3000rpm | ????30sec | ?0.2μm | Circular | 5μm |
According to embodiments of the invention 1,, the temperature of heat treatment process is set in about 180 ℃ for whole repeatedly circulation.But, if adopt the polymkeric substance that has than the low cross-linking characteristic, then preferably set follow-up round-robin heat treatment temperature lower, so that the shaping of the protuberance 12c that forms in the previous cycles becomes more stable than the previous cycles.
Then shown in Fig. 1 M, form a thin metal film 14 above making the protuberance 12c of all formation, it has high reflection characteristic (hereinafter to be referred as " reflectance coating ").Reflectance coating 14 in the present embodiment is that the vacuum evaporation by aluminium forms.Except that aluminium, other has high reflectance and is not difficult to be deposited into the metal of film (as Ni, Cr, Ag) and all can adopts.Preferably make the thickness formation of reflectance coating 14 be about 0.01-1.0 μ m.
So, promptly obtain the reverberator 15 of embodiment 1 by above-mentioned manufacturing process.
When observing reverberator 15, the little group of taper that its lip-deep protuberance shape is mild fluctuating, at least wherein part is continuous curved surface, and has the protuberance peak of stochastic distribution.And then, use interference microscope, obtain the tilt profiles on reverberator 15 surfaces.For the reverberator of embodiment 1, its result is expressed as the curve of Fig. 2 A.Shown in this curve, reverberator 15 surperficial top rades are 0 ° or greater than 0 ° but be estimated as about 17% of the pixel region total area less than 2 ° zone (hereinafter to be referred as " the flat zone ") total area.
The reflection characteristic of test reverberator 15 under truth, described truth is that a reverberator 15 and an actual liquid crystal indicator are combined.How Fig. 3 carries out if schematically illustrating described test, Fig. 4 A then represents the test result to embodiment 1 reverberator 15.
Be that adhesive with UV curable is added on the surface of reverberator 15 among Fig. 3, form the adhesive layer 16 that sticks glass substrate 17 (test with).In order to realize the truth of actual use liquid crystal indicator, adopt the UV curable adhesive that has with liquid crystal layer and glass substrate 17 essentially identical refractive indexes (about 1.5), to form described adhesive layer 16.What should illustrate is that the interface that adhesive layer 16 and glass substrate are 17 can not influence test result.So, can will think actual reflection characteristic at the interface between reverberator 15 and liquid crystal layer through the reflection characteristic that so records.
In described test, the light 19 that light source 18 is sent incides on the reverberator 15 under certain angle.The reflected light 20 of reverberator 15 surfaces is detected by photomultiplier 21, with the reflection characteristic of test reverberator 5.Particularly, when changing the pitch angle (represented) of light photomultiplier 21 with respect to direction 22 as the arrow that Fig. 3 oppositely points to, catoptrical intensity obtains measuring, and said here direction 22 is the directions that incide on the reverberator 15 again the light indication that is reflected by regular reflection by certain angle.Photomultiplier 21 is to measure pitch angle 23 with respect to the pitch angle of regular reflection direction 22, promptly is the angle (visual angle of reverberator 15 just) of observing the reflective LCD device that has reverberator 15 corresponding to the observer.
In whole Fig. 4 A-4E, X-axis represents to measure the pitch angle, and Y-axis is represented the intensity that the records number percent (%) with respect to referenced strength.Here, when photomultiplier 21 was in regular reflection direction 22, described measurement pitch angle was 0 °.
Obtain described referenced strength by following mode.At first, light is incided on the reference white flat board (MgO).To be set to basically the angle that incides on the reverberator that will test with light identical with respect to incide angle on this plate perpendicular to the dull and stereotyped direction of reference white light.Then, detect by the light of reference white flat reflective with photomultiplier 21, described photomultiplier 21 is placed with in order to accept part towards the light that is reflected perpendicular to the dull and stereotyped direction of reference white again.This part light intensity that will be detected by photomultiplier 21 is with being referenced strength.
As an example, description makes light incide the situation of on the reverberator reverberator of determining being tested with 30 ° of angles with respect to the reverberator normal direction.In this case, make catoptrical intensity obtain test under the situation of the position that changes photomultiplier 21 with respect to regular reflection direction 22, described direction 22 is a part of light directions by the regular reflection indication.So, just obtain tested intensity.Other all obtains referenced strength in a similar manner except photomultiplier 21 positions.Specifically, under the situation that becomes 30 ° of angles with respect to reference white flat board normal direction, light is incided on the reference white flat board.Photomultiplier 21 is positioned at towards the normal direction of reference white flat board, then obtains the light intensity of described referenced strength for reflection from the reference white flat board towards normal direction.In another case, for example utilize to incide under 50 ° of conditions and carry out test to reverberator earlier on the reverberator, the incident angle that light is incided on the reference white flat board is set at 50 °.
In the test of the reverberator 15 of present embodiment, make light 19 become 30 ° of angles to incide on the reverberator 15 with respect to direction perpendicular to reverberator 15.Test result is shown among Fig. 4 A.Shown in Fig. 4 A, at about 0 ° place, measurement pitch angle, reverberator 15 shows maximum reflectivity.In the gamut with respect to about-45 to+45 ° of regular reflection direction, catoptrical intensity is greater than about 60% of reference light intensity.Particularly, approximately-30 ° in+30 ° of scopes, catoptrical intensity is greater than about 160% of reference light intensity.So, the reverberator 15 of embodiment 1 provides bright demonstration in the mode at wide region like this visual angle, and suppressed the reflection of light to regular reflection direction (conventional reflector reflects most of incident ray to this direction, thereby strengthens in the direction reflective light intensity greatly).
Though in the present embodiment be with transparent glass substrate with being the substrate 11 of reverberator 15, adopt also can reach similar effects such as light tight substrates such as Si.When using light tight substrate, an advantage is arranged, it is integrated promptly to be easy to the circuit (as: driving comprises the circuit of the LCD of reverberator) that will be provided with on substrate.
In addition, by provide a plane can reach similar effects to reverberator with an above different refractivity.In this case, some advantages are arranged, as improve the printing of each electrode on the reverberator, also improve the orientation of liquid crystal molecule.Embodiment 2
Reverberator of the embodiment of the invention 2 and preparation method thereof will be discussed below.
The method of the reverberator of making the embodiment of the invention 2 is described now with reference to Fig. 5 A-5I that reverberator manufacturing process is shown.
Shown in Fig. 5 A, at first, with negative-type photosensitive (as NIPPON STEEL CHEMICALCO., Ltd. " V259PA ") be preferably under about 500-3000rpm condition rotation and be coated in transparent substrate, on the surface as glass substrate (as " 7059 " of CORNINGINC.) 31, has the photosensitive resin layer 32a of desired thickness with formation.In the present embodiment, with " V259PA " (NIPPONSTEEL CHEMICAL CO. Ltd.) as photosensitive resin, be added on " 7059 " (CORNING INC.) substrate of thick about 1.1mm, last 30 seconds, approximately rotate described glass substrate 31 under the 1000rpm condition simultaneously, thereby on glass substrate 31, forming the photosensitive resin layer 32a of thick about 1.2 μ m.Such shown in Fig. 5 B then, under about 100 ℃ of conditions, made described substrate preliminary drying about 30 minutes, afterwards, be with the photomask 33 of predetermined pattern to place on the whole glass substrate 31 with one.Then, make described substrate exposure, and use CaCO
3Solution (4%) develops, thus shown in Fig. 5 C like that, the zone of being interdicted at many light of substrate 31 forms microspike 32b.
After the heat treatment process under 200-240 ℃ of condition subsequently, make the projection 32b on the substrate 31 circular, thereby obtain surface smoothing, the protuberance 32c of no any limbus on it, shown in Fig. 5 D.Thermal treatment in the present embodiment is to carry out about 30 minutes under about 220 ℃ of conditions.
Then, shown in Fig. 5 E, conformal photosensitive resin is preferably under about 500-3000rpm condition rotation is coated on the substrate 31 that comprises protuberance 32c, form photosensitive resin layer 34a with desired thickness.In the present embodiment, use " MFR " (Japanese SYNTHETIC RUBBER CO, .LTD make) as being added in on-chip conformal photosensitive resin, last 30 seconds, under about 2000rpm condition, rotate glass substrate 31 simultaneously, thereby on described glass substrate 31, form the photosensitive resin layer 34a of thick about 0.5 μ m.
Then, shown in Fig. 5 F, like that, under about 100 ℃ of conditions, made described substrate preliminary drying about 30 minutes, afterwards, be with the photomask 35 of predetermined pattern to place on the whole glass substrate 31 one.Then, make described substrate exposure.Be designed so that not have light to incide on the protuberance 32c of the formed described negative-type photosensitive of photoetching process in first circulation described photomask 35.Thereby in second circulation, the shape of protuberance 32c is kept.
Comprise many small circular shading regions for forming projection 32b and used each photomask 33 and 35 of 34b in the present embodiment, they are distributed in wherein randomly.Described photomask 33 and 35 is designed so that to be able to the neighboring projection 32b of single photoetching process formation and the interval that 34b separates about 2 μ m each other at least.In addition, the total area that photomask 33 and 35 is designed so that all projections that circulation forms through two photoetching processes estimates to be about 80% of the pixel region total area.
Then, develop, shown in Fig. 5 G, like that, on substrate 31, form a plurality of microspike 34b with KOH solution (1%).As mentioned above,, use conformal photosensitive resin again, can form stable shaped projection by using negative-type photosensitive earlier.Its reason is, the step of exposure in second circulation makes the light that must incide on the protuberance 32c that forms in first circulation be blocked by photomask 35.
Shown in Fig. 5 H, by the heat treatment process under the ensuing 140-240 ℃ condition, make the projection 34b on the substrate 31 circular, the projection 34b on the substrate 31 is cured into the protuberance 34c that has smooth surface and do not have any limbus simultaneously.Be under about 180 ℃ of conditions, to carry out 10 minutes thermal treatment in the present embodiment.
Shown in Fig. 5 I, after these steps, on the whole protuberance 32c and 34c that a reflectance coating 36 is formed at gained on the substrate 31.Reflectance coating 36 in the present embodiment is that the vacuum evaporation by aluminium forms.Except that aluminium, other has high reflectance and is not difficult to be deposited into the metal of film 36 (as Ai, Ni, Cr, Ag) and all may be utilized.Preferably make the thickness formation of reflectance coating 36 be about 0.01-1.0 μ m.
So, obtain the reverberator 37 of embodiment 2 by above-mentioned manufacturing process.
When observing reverberator 37, the little group of taper that its lip-deep protuberance shape is mild fluctuating, at least wherein part is continuous curved surface, has the protuberance peak of stochastic distribution.The diameter of protuberance 32c approximately is 20 μ m, and the diameter of protuberance 34c approximately is 10 μ m.And then, use interference microscope, obtain the tilt profiles on reverberator 37 surfaces.For the reverberator 37 of embodiment 2, its result is expressed as the curve of Fig. 2 B.After protuberance 32c and 34c were accurately formed corresponding to the figure of photomask 33 and 35, (inclination angle was 0 ° or is about 20% of the pixel region total area greater than 0 ° but less than 2 ° the total area reverberator 37 lip-deep flat sites.
Fig. 4 B represents the test result of reverberator 37 reflection characteristics of present embodiment 2.As embodiment 1, carry out described test.Shown in Fig. 4 B, in the whole wide region with respect to about-45 ° to+45 ° of regular reflection direction, catoptrical intensity surpasses about 60% of referenced strength.Particularly, in about-30 ° to+30 ° scopes with respect to the regular reflection direction, catoptrical intensity is greater than referenced strength about 150%.So the reverberator 37 of embodiment 2 provides bright demonstration in the scope at wide region visual angle like this.In other words, the light reflection to regular reflection direction (conventional reflector reflects most of light incident thereon to this direction, thereby too strengthens reflective light intensity in the direction) is suppressed.Comparative example 1
Reverberator of comparative example 1 and preparation method thereof will be discussed below.
Now with reference to the method that the reverberator of comparative example 1 is made in Figure 21 A-21J description, wherein Figure 21 F to 21J respectively represents the top view of a making step of reverberator 125, and Figure 21 A to 21E is respectively each sectional view of getting along A-A ' line among Figure 21 F to 21J.
Shown in Figure 21 A and 21F, at first, photosensitive resin is preferably in rotation is coated in transparent substrate under the condition of about 500-3000rpm, on the surface as glass substrate 121, have the photosensitive resin layer 122a of desired thickness with formation.In the present embodiment, with " OFPR-800 " (TOKYOOHKA KOGYO Co., Ltd.) be added on " 7059 " (CORNING INC.) as substrate, thick about 1.1mm as photosensitive resin, last 30 seconds, under the condition of about 1000rpm, rotate described glass substrate 121 simultaneously, thereby on glass substrate 121, form the photosensitive resin layer 122a of thick about 1.2 μ m.Then, shown in Figure 21 B and 21G, like that, under about 100 ℃ of conditions, made described substrate preliminary drying about 30 minutes, afterwards, be with the photomask 123 of predetermined pattern to place on the whole glass substrate 121 one.Then, make described substrate exposure and development, thus such shown in Figure 21 C and 21H, form small cylindrical projections 122b at substrate 121.
Comprise the zone that many small circles that are distributed in randomly wherein are in the light for forming the used photomask 123 of cylindrical projections 122b in the step of Figure 21 B and 21G.Photomask 123 is designed so that to separate the interval of about 2 μ m each other at least at the neighboring projection 122b that single photoetching process forms, and any one projection 122b is all unlikely to be combined with neighboring projection 122b thereby make.In addition, photomask 123 is designed so that be approximately 40% of the pixel region total area through the total area of formed all projections of photoetching process.
By the heat treatment process under about 120-250 ℃ condition subsequently, shown in Figure 21 D and 21I, like that, make each the projection 122b on the substrate 121 rounded, and be cured into a plurality of surface smoothings and do not have the protuberance 122c of any limbus.The thermal treatment of present embodiment is to carry out about 30 minutes under about 180 ℃ of conditions.
After the step shown in Figure 21 E and the 21J, with a reflectance coating 124 be formed on the substrate 121 prepared each above the protuberance 122c.Reflectance coating 124 in the present embodiment is that the vacuum evaporation by aluminium forms.Except that aluminium, other has high reflectance and is not difficult to be deposited into the metal of film (as Ai, Ni, Cr, Ag) and all may be utilized.Preferably make the thickness formation of reflectance coating 124 be about 0.01-1.0 μ m.
So, promptly get the reverberator 125 of comparative example 1 by above-mentioned manufacturing process.
When observing reverberator 125, the shape of its lip-deep protuberance 122c is the little group of taper of mild fluctuating, and at least wherein part is continuous curved surface, the peak stochastic distribution of protuberance 122c.And then, use interference microscope, obtain the tilt profiles on reverberator 125 surfaces.For the reverberator 125 of comparative example 1, its result is expressed as the curve of Fig. 2 C.In addition, Fig. 4 C represents the test result to the reflection characteristic of the reverberator 125 of comparative example 1.This test is carried out as embodiment 1.
Shown in Fig. 2 C, the total area that flat site is gone up on reverberator 125 surfaces is about 60% of the pixel region total area.
Shown in Fig. 4 C, the reflection characteristic of reverberator 125 makes being very high with respect to about-15 ° to+15 ° scope internal reflection light intensity of regular reflection direction, then reduces fast beyond this zone.Particularly, with respect to the regular reflection direction approximately in-5 ° to+5 ° scopes, and test tilting position at other and compare, catoptrical intensity is extremely strong.
The reason that can not obtain high reflective light intensity why in wideer scope is that the area of flat site is excessive, thereby most of light incident thereon all is reflected by regular reflection.Comparative example 2
Reverberator of comparative example 2 and preparation method thereof will be discussed below.
Now with reference to the method that the reverberator of comparative example 2 is made in Fig. 6 A-6J description, wherein reference number 111 is represented glass substrates; Label 112a represents photosensitive resin; Label 112b represents cylindrical projections; Label 112c represents level and smooth protuberance; Label 114 expression reflectance coatings; Label 115 expression reverberators.The photomask 113 that is used for forming cylindrical projections 112b comprises many small circular shading regions that are distributed in randomly wherein.In this example, separate the so little interval of about 0.5 μ m at least between the neighboring projection 112b that photomask 113 is designed so that to be generated, thereby make the total area of all projections become smaller with respect to the pixel region total area.Particularly the total area of all projections that photomask 113 is designed to form in photoetching process is approximately 80% of the pixel total area.
In addition, as comparative example 1, make the reverberator 15 of comparative example 2 by photoetching process and heat treatment process.
Use interference microscope, obtain having the tilt profiles on reverberator 115 surfaces of structure like this.For the reverberator 115 of comparative example 2, its result is expressed as the curve of Fig. 2 D.Shown in this curve, the total area that the flat region is gone up on reverberator 115 surfaces is approximately 50% of the pixel region total area.
Fig. 4 D represents the test result of reverberator 115 reflection characteristics of comparative example 2.This test is to carry out with embodiment 1 described same mode.Shown in the curve of Fig. 4 D, only with respect to about-15 ° to+15 ° higher of regular reflection direction than close limit internal reflection light intensity.Particularly, approximately-5 ° in+5 ° scope, come compared with other test inclination angle, its reflective light intensity is high especially.
Though the total area of projection 112b is set in about 80% such very high percentage with respect to the substrate total area, still be very large by the light quantity that regular reflection reflected.This is because by being spaced apart the so little cause of about 0.5 μ m between the formed neighboring projection 112b of single photoetching process.So little interval just makes adjacent projection 112b connect together mutually when fusion, thereby certainly will increase the total area of flat region.Specifically, a large amount of neighboring projection 112b form the part of a monoblock.Have only the marginal portion of this monoblock part to form sweep by the distortion when heating.Therefore, the remainder of this monoblock part just must form a flat.Embodiment 3
Reverberator of the embodiment of the invention 3 and preparation method thereof will be discussed below.
Fig. 7 A-7D now with reference to expression reverberator manufacturing process describes the method for making the embodiment of the invention 3 reverberators.
Shown in Fig. 7 A, at first,,,, promptly form sull 52 as forming one deck oxide on the surface of glass substrate (as " 7059 " of CORNINGINC.) 51 at transparent substrate by sputter.Material as forming sull 52 can use such as SiO
2, Al
2O
2, SiO, TiO
2, SnO
2, ITO inorganic oxides such as (tin indium oxides).The reflection characteristic of the reverberator of considering the size of the projection that will become with photosensitive resin-shaped and will making, the thickness of this sull 52 is preferably in about 0.01-1 mu m range.In the present embodiment, use SnO
2Going up formation sull 52 as the substrate " 7059 " (CORNING INC.) of thick about 1.1mm, and making the thickness of this sull 52 form about 0.1 μ m.
Then, will carry out following photoetching process.By in containing hydrofluorite (47% solution) that weight ratio is about 1: 100 and nitric acid (60% solution) mixed solution (under about 25 ℃ of conditions) immersed about 10 minutes, make the transparent substrate 51 that comprises sull 52 on it by wet etching.Thereby, shown in Fig. 7 B, like that, on the surface of glass substrate 51, form a large amount of small protruding/concave portions 53.
Sull 52 is subjected to etching as top said, thereby forms a large amount of small protruding/concave portions 53 on transparent substrate 51.Photosensitive resin is added in these are protruding/above the concave portion 53.Shown in Fig. 7 C, like that, after photoetching process and heat treatment process, produce the protruding/concave portion 54 of photosensitive resin.Also can adopt as embodiment 1 or 2 described similar approach and form protruding/concave portion 54.As photosensitive resin, can adopt " MFR " (Japanese SYNTHETIC RUBBER CO .LTD. makes), " OFPR-800 " (TOKYO OHKA KOGYO CO., LTD. makes) etc.
Then, shown in Fig. 7 D, on the surface of the protruding/concave portion 53 that makes on the substrate 51 and 54, form reflectance coating 55.In the present embodiment, it is thick that the vacuum evaporation by aluminium makes reflectance coating 55 form about 0.2 μ m.Except that aluminium, other has high reflectance and is not difficult to be deposited into the metal of film (as Ni, Cr, Ag) and all may be utilized.Preferably make the thickness of formed reflectance coating 55 be about 0.01-1.0 μ m.
So,, obtain the reverberator 56 of embodiment 3 by above-mentioned manufacturing process.
Use interference microscope, obtain the tilt profiles on reverberator 56 surfaces.The surface of reverberator 56 comprises the protruding/concave portion 53 of inorganic oxide and the protruding/concave portion 54 of photosensitive resin.As mentioned above, before forming protruding/concave portion 54, just formed small protruding/concave portion 53 by photoetching process and heat treatment process.Because protruding/concave portion 53 forms formerly, so just make that the flat region area on the reverberator 56 that does not form protruding/concave portion 54 as yet will reduce.As a result, with respect to the pixel region total area, the total area of flat region is estimated to be about 40% or littler.This has just reduced the light quantity by the normal direction reflection.When with the actual test of the sort of method reflective light intensity described in the embodiment 1, arrive in+45 ° the relative broad range for about-45 ° with respect to the regular reflection direction, reverberator 56 shows the intensity of reflected light that surpasses about 60% referenced strength.
In the present embodiment, the diameter of in advance substrate 51 surfaces being gone up small protruding/concave portion 53 of intending formation is set at about 2 μ m.But this diameter is not limited to this, but can be less than by photoetching process and heat treatment process formed protruding/any value of the diameter of concave portion 54, and can not cause adjacent protruding/concave portion 53 to overlap mutually.Embodiment 4
Reverberator of the embodiment of the invention 4 and preparation method thereof will be discussed below.
Fig. 8 A-8C now with reference to expression reverberator manufacturing process describes the method for making the embodiment of the invention 4 reverberators.
Shown in Fig. 8 A, the organic insulation resin 63 that at first will be mixed with molecule 62 is added in transparent substrate, on the surface as glass substrate.In the present embodiment, particle diameter is about the spherical SiO of 0.5 μ m
2With being described particle 62, and with " 7059 " (CORNING INC.) as described substrate 61.Remove SiO
2Outward, the material of described particle 62 can also be glass, plastics, metal etc.This particle can have the fixing or unfixed shape of any kind, as spherical, fibrous, spindle shape etc.The particle 62 of sneaking into how much be preferably 10% of organic insulation resin 63.As an example, organic insulation resin 63 can adopt " OCD7 " type (TOKYO OHKA KOGYO CO., LTD. makes).Various other resins (as thermoset resin, light-cured resin) also can be used as organic insulation resin 63.
Be preferably under the condition of about 500-3000rpm, with organic insulation resin 63 spin coateds that are mixed with molecule 62 on the surface of substrate 61, to obtain having the layer of desired thickness.In the present embodiment, the described substrate of rotation lasts about 30 minutes under the condition of about 1000rpm, and organic insulation resin 63 is added on the substrate.Then, carry out about 3 minutes thermal treatment under about 90 ℃ of conditions, carry out another about 60 minutes thermal treatment again under about 250 ℃ of conditions subsequently, after this, resin is cured, and forms the thick organic insulation resin bed 63 of about 1 μ m on glass substrate 61.
Shown in Fig. 8 A,, on glass substrate 61, form the protruding/concave portion of small in a large number particle 62 by above-mentioned steps.
After this, shown in Fig. 8 B, adopt and embodiment 1 or 2 described similar methods, further on the surface of organic insulation resin bed 63, form photosensitive resin protruding/concave portion 64.Then, shown in Fig. 8 C, form reflectance coating 65, so obtain the reverberator 66 of embodiment 4.
Utilize the protruding/concave portion on particle 62 and the photosensitive resin formation reverberator 66.As mentioned above, before forming protruding/concave portion 64, form protruding/concave portion 63 by photoetching process and heat treatment process.Because protruding/concave portion 63 forms formerly, so just make that the flat region area on the reverberator 66 that does not form protruding/concave portion 64 as yet will reduce.As a result, with respect to the pixel region total area, the total area of flat region is about 40% or littler.When with the actual test of the sort of method reflective light intensity described in the embodiment 1, arrive in+45 ° the relative broad range for about-45 ° with respect to the regular reflection direction, reverberator 66 shows the intensity of reflected light that surpasses about 60% referenced strength.
In the present embodiment, except sneaking into particle, also can adopt sandblast, polishing etc. is as the method that forms protruding/concave portion in advance on glass substrate 61.In the present embodiment, the diameter of the small protruding/concave portion that will form in advance is set at about 0.5 μ m on substrate 61 surfaces.But be not limited to this diameter, and depend on the characteristic of the resin that will adopt, desirable any value less than protruding/concave portion 64 diameters that form through photoetching process is so that the unlikely mutual overlap joint of adjacent protruding/concave portion.Embodiment 5
Reverberator of the embodiment of the invention 5 and preparation method thereof will be discussed below.
Now with reference to the method that the reverberator of embodiment 5 is made in Fig. 9 A-9L description, wherein Fig. 9 G to 9L respectively represents the top view of a making step of reverberator 76, and Fig. 9 A to 9F is respectively each sectional view of getting along A-A ' line among Fig. 9 G to 9L.
At first carry out photoetching process.Shown in Fig. 9 A and 9G, with the photosensitive resin spin coated at transparent substrate, on the surface as glass substrate 71, to form photosensitive resin layer 72a.In the present embodiment, with " OFPR-800 " (TOKYO OHKA KOGYO CO., LTD.) as photosensitive resin, be added in thick about 1.1mm as " 7059 " of substrate (CORNINGINC.) on, thereby form the photosensitive resin layer 72a of thick about 1.2 μ m.Such shown in Fig. 9 B and 9H then, under about 100 ℃ of conditions, made described substrate preliminary drying about 30 minutes, afterwards, be with the photomask 73 of predetermined pattern to place on the whole glass substrate 71 with one.Then, make the exposure of described substrate and develop with developer solution (LTD. makes for the NMD-3 as 2.38%, TOKYO OHKA KOGYO CO.), thus shown in Fig. 9 C and 9I like that, the small cylindrical calixconcavity 72b of formation in photosensitive resin layer 72a.
By following heat treatment process under ensuing 120-250 ℃ condition, make that the cylindrical calixconcavity 72b among the photosensitive resin layer 72a is rounded on the substrate 71, thereby shown in Fig. 9 D and 9J, like that, obtaining having level and smooth continuous surface, no any limbus is protruding on it/concave portion 72c.Make resin solidification then.Thermal treatment in the present embodiment was carried out about 30 minutes under about 200 ℃ of conditions.
After this, shown in Fig. 9 E and 9K, the surface of/concave portion 72c protruding for making is more level and smooth, further forms photosensitive resin on the surface of protruding/concave portion 72c.This photosensitive resin is rotated coating, and it can be the same resin used with photosensitive resin layer 72a.Preferably the thickness setting with formed photosensitive resin layer is about 0.3-5.0 μ m.In the present embodiment, be about 0.3 μ m with the thickness setting of this layer photosensitive resin layer.Then,, make the distortion of this layer photosensitive resin, to form the second protruding layer 74 by another time thermal treatment.Current thermal treatment in the present embodiment was carried out about 30 minutes under about 200 ℃ of conditions.So, provide a smooth surface that comprises protruding/concave portion with the flat site that has reduced.
After above-mentioned steps, shown in Fig. 9 F, form reflectance coating 75 on the surface of protruding/concave portion at substrate 71.Do at Fig. 9 L, dotted line is represented the level line of reflectance coating 75.Reflectance coating 75 in the present embodiment is that the vacuum evaporation by aluminium forms thick about 0.2 μ m.Except that aluminium, any metal described in the embodiment 1 all may be utilized.Preferably make the thickness formation of reflectance coating 75 be about 0.01-1.0 μ m.
So, promptly obtain the reverberator 76 of embodiment 5 by above-mentioned manufacturing process.
The characteristic of the reverberator 76 of embodiment 5 will be described below.
Figure 10 represents to use interference microscope to measure the result of the surface configuration of reverberator 76 from the top.X-axle among the figure is represented the distance of an arbitrfary point on reverberator, and the height on the Y-axle is represented protruding/recess separate substrates 71 surfaces.There are many depressions with mild gradient on reverberator 76 surfaces, and they are distributed on the position at random of some shown in Figure 10 section.In addition, the result that the tilt profiles on reverberator 76 surfaces is tested is illustrated among Fig. 2 E.Shown in Fig. 2 E, the total area that the flat region is gone up on reverberator 76 surfaces has only 12% of the pixel region total area.
As embodiment 1, come the reflection characteristic of the reverberator 76 of test implementation example 5.The result is shown in the curve of Fig. 4 E.Shown in this curve, the reflection characteristic of reverberator 76 makes catoptrical intensity all surpass 60% of reference light intensity for about-45 ° in+45 ° relative broad range with respect to the regular reflection direction.Particularly, approximately-35 ° in+35 ° of scopes, reverberator 76 shows the reflective light intensity higher than referenced strength.
As mentioned above, among the embodiment 5,, make using for the second time and add to protruding/photosensitive resin fusion above the concave portion 72c in the resin, thereby filled bent angle and bottom of described each depression when when heating.In addition, be distributed on some positions at random by formed each depression of single photoetching process with mild gradient.So obtain having reverberator 76 as the desirable characteristics of embodiment 1 to 4 reverberator.
In the present embodiment, be circular (cross section in being parallel to the plane of substrate) by formed each depression of photoetching process (or recess).But, adopt recess, also can reach same effect with polygonal cross section.
Now, reverberator optical characteristics and with the relation between the brightness of the liquid crystal indicator of this reverberator is discussed.After deliberation can influence reverberator optical characteristics with the brightness of the liquid crystal indicator of described reverberator (when make such liquid crystal indicator and during with eye-observation).The result is, the visual angle correlativity of having found reflective light intensity measured under the single light source situation can influence the brightness of observing with the liquid crystal indicator of described reverberator under multiple light courcess.To 18B this point is described in more detail hereinafter with reference to Figure 16 A.
When a light source 200 like that only was provided shown in Figure 16 A, 201 of light incided on the reverberator 203 in limited direction scope.Therefore, the intensity that incides the light 201 on the reverberator 203 is stronger in this restricted portion only.On the other hand, when shown in Figure 16 B like that, when diverse location was provided with a plurality of light source 200, then light 201 incided on the reverberator 203 from all directions.So, to compare with the situation of single light source, the intensity of described incident light 201 becomes more even.
Figure 17 A represents a reverberator 204a, and it is one of reverberator of embodiment 1 to 5, its with respect to the regular reflection direction approximately-45 ° all show 60% or the more reflective light intensity that is about with reference to light intensity in+45 ° the relative broad range.Under the situation shown in Figure 16 B, reverberator 204a can be towards the described incident light 201 of relative broad range internal reflection of direction of observation (shown in the circular cone among Figure 18 A).Can believe,, and therefore can make incident light 201 by direction scope reflection, so will see the improved effect of the intensity of reflected light 202 towards a broad because the path of light has reversibility.On the other hand, the reverberator 204b shown in Figure 17 B is one of reverberator in comparative example 1 and 2, and it reflects most of light incident thereon by normal direction, and therefore makes light point to a direction scope that is restricted.Such reverberator 204b makes in the direction scope of 201 qualifications of sensing shown in Figure 18 B of incident light, therefore can not look to improving the brightness of reflected light 202.
The liquid crystal indicator with different reverberators has been tested display brightness, described different reverberator is by have different reflectivity on the about 45 ° direction of observation of regular reflection deviation in driction.The result is illustrated in the following table 2.Express,, need on 45 ° of drift angle directions, have about 60% or the reverberator of high reflectance more for realizing bright demonstration.
Table 2
| Reflectivity (%) from 45 ° of regular reflection deviations in driction the time | ????30 | ????40 | ????50 | ????60 | ????70 |
| The indoor display brightness of a plurality of fluorescent lights is being arranged | ????× | ????× | ????△ | ????○ | ????◎ |
*: very dark zero: bright
△: dark ◎: very bright
In addition, the shape of reverberator epirelief/concave portion and the relation between its optical characteristics have also been tested.Special also the test with respect to the flat site total area on the reverberator of the pixel total area and at the reflectivity that tilts from the regular reflection direction 45 ° the time on it.These results are illustrated among Figure 22.Erect image from Figure 22 can see like that, along with the increase of flat site area, increase along the ratio of the relative entire emission light quantity of regular reflection direction reflection light quantity, thereby reduced the reflectivity of reverberator along about 45 ° of directions that tilt with respect to the regular reflection direction.Also express, for realizing bright demonstration, the flat site total area be the pixel total area about 40% or littler.Embodiment 6
Below, have reflective LCD device of reverberator of the present invention and preparation method thereof with what the embodiment of the invention 6 was discussed.
The reflective LCD device of embodiment 6 combines with surface with the reflector surface that is similar to embodiment 5 and the reverberator that shows by the GH mode, wherein without the polarizer.
Figure 11 represents the reflective LCD device of the embodiment of the invention 6.
As shown in figure 11, the reverberator 81 that plays the active matrix substrate effect is attached on the relative substrate with color filter 82 83, predetermined interval is arranged between them.Liquid crystal indicator 84 and is enclosed in wherein between reverberator 81 and opposite substrate 83.In the present embodiment,, use a kind of GH type liquid crystal display material for liquid crystal layer 84.The reasons are as follows that reverberator 81 does not keep good polarization to incident light.Therefore, when the liquid crystal indicator that reverberator 81 is used for show by the birefringence mode (using a polarizer), the contrast ratio of demonstration reduces.Because this reason adopts the GH mode in the present embodiment.
The structure of the reverberator 81 of embodiment 6 is described now.
On insulating substrates such as glass substrate 85, form a plurality of TFT (thin film transistor (TFT)) 86.Pixel capacitors 87 is set, in order to connect the drain electrode of each TFT86.Form photosensitive resin layer 88, in order to cover each TFT86 and pixel capacitors 87.The photosensitive resin layer 88 corresponding with formed photosensitive resin layer on the glass substrate of the reverberator of embodiment 1 to 5 have with one of embodiment 1 to 5 described method formed protruding/concave portion.Form the reflection pixel capacitors 89 corresponding with reflectance coating among the embodiment 1 to 5 with matrix form on photosensitive resin layer 88, they are electrically connected with each pixel capacitors 87 through contact hole 90.Form one and adjust film 91, in order to cover whole described reflection pixel capacitors 89.Surface with reverberator 81 of structure like this is similar to the reverberator of embodiment 5.
On the other hand, the substrate 83 on opposite has the insulating substrate 85 of a category of glass.Substrate 85 is provided with the color filter 82 that comprises red part, green portion and blue portion.The thickness of color filter 82 changes according to the different colours part, thereby produces thickness difference between adjacent coloured part.For reducing this thickness difference, on color filter 82, form one deck flatness layer 92.According to electrode of opposite 93 and the order of adjusting film 91 on flatness layer 92 with they further formation.
When making above-mentioned reflection-type liquid-crystal display device, preferred various conditions (mainly being the characteristic about described liquid crystal layer) are so that use reverberator 81.
At first, the thickness of the substrate 83 on consideration composition reverberator 81, opposite and the liquid crystal cell of liquid crystal layer 84 when described box is done thickly more, is become many more by the light absorption of the molecule of contained dyestuff in the liquid crystal layer 84, so for conventional apparatus, show just dark excessively.Yet, the more important thing is that the speed of response (being the speed of the change in orientation of contained dye molecule in orientation and the liquid crystal layer of liquid crystal) is by reducing with a described box thickness square mode that is directly proportional.Therefore, this response change rate is regarded as most important condition, preferably the maximal value with box thickness is set at about 10 μ m (about 7 μ m are best), so that reach the speed of response of about 200ms, for practical application, this speed is necessary.On the other hand, from contrast of display degree and the angle of simplifying making, preferably the minimum value with element thickness is set at about 3 μ m (about 4 μ m are best).In the present embodiment, described box is made into thickness is about 5 μ m.Here used " thickness of liquid crystal box " is thickness deduction resin bed and the resulting value of metal layer thickness that never exists the described contact hole place of protruding/recessed variation to record.
Subsequent, preferably the twist angle with liquid crystal material is set at about 180 ° to 360 °.When adopting GH type liquid crystal material, need be by dye molecule absorbing environmental light, this dye molecule is to be included in as in the liquid crystal material of " master " as " guest ", and be orientated according to liquid crystal molecular orientation.For this reason, preferably the minimum value of twist angle is set at about 180 °.From the bistability of liquid crystal material, preferably the maximal value with twist angle is set at about 360 °.In the present embodiment twist angle is set at about 240 °.
Consider the birefraction Δ n of liquid crystal material, because incident light can not be followed the distortion of the liquid crystal material in above-mentioned twist angle scope, so when reality was used, it is relevant with this birefraction Δ n that display quality (particularly contrast ratio) becomes.Figure 12 represents the birefraction Δ n of liquid crystal material and the relation between the contrast ratio.General be approximately 4 or the figure that is shown regarded when higher as " watching comfortable " when contrast ratio, and when contrast ratio be " watching discomfort " less than 3.5 the time.So, preferably the birefraction Δ n of liquid crystal material is set for and is about 0.15 or littler (about 0.10 or littler then better).Be that birefraction Δ n with liquid crystal material sets for and is about 0.09 in the present embodiment.
In addition, in above-mentioned twist angle scope,, also can cause the striate region easily, thereby cause hysteresis phenomenon even described thickness of liquid crystal box is slightly inconsistent.Under these circumstances, just can not realize that gray shade scale shows.And then in liquid crystal indicator of the present invention, the reverberator itself that its surface has protruding/concave portion contacts with liquid crystal layer.So, protruding/concave portion on the reverberator has increased the weight of the striate region, thereby cause hysteresis phenomenon, even be set with ratio d/p (d: thickness of liquid crystal box, p: the normal pitch of liquid crystal material) consequently on smooth reverberator, can not take place in the liquid crystal material of striate region.In view of these shortcomings,, the suitable shape of protruding/concave portion has been done research for making reverberator have good optical characteristics and reducing the generation of striate region.
A kind of optical active substance is added to birefraction Δ n is about in 0.09 the liquid crystal material, in order to the d/p rate regulation into about being 0.58.Utilize this liquid crystal material to make the reflective LCD device of embodiment 6.The thickness of liquid crystal box of liquid crystal indicator is about 5 μ m, and twist angle is about 240 °.When by the wherein alive this liquid crystal indicator of microscopic examination, described striate region occurs in G (green) pixel and B (blueness) pixel along the groove between each protuberance.This be since R (red) pixel than G, cause that the B pixel is thick, promptly shown in the cut-open view of Figure 13 of the used color filter of expression present embodiment like that.The G here, B, R pixel are respectively green portion, blue portion and the redness pixels partly that color filter is set.The maximum differential of thickness is observed about 0.3 μ m between each coloured part of color filter.Therefore, can believe at thickness of liquid crystal box and produce the striate region in less than the G of R pixel and B pixel.
Make a kind of d/p of having ratio and be about 0.60 similar liquid crystal indicator.When voltage is added to this device, do not produce the striate region.This just shows, considers the tolerance tolerance different with color filter thickness of thickness of liquid crystal box inconsistency, and in order not produce the striate region, the d/p ratio that must make liquid crystal indicator is 0.60 or higher.
(the d/p ratio of the two is 0.58 when two kinds of liquid crystal indicators that at protruding/concave portion diameter respectively are about 9 μ m and 5 μ m, when comparing pitch 8.6 μ m), show have device that protruding/concave portion diameter is about 5 μ m compared with another kind protruding/device that the concave portion diameter is about 9 μ m comes, the former produces less striate region.So, can believe, during the diameter of protruding/concave portion shown in the pitch of used liquid crystal material is substantially equal in installing, easier generation striate region.
In addition, consider the reliability of voltage resistance, conversion element (TFT) and the liquid crystal layer of driving circuit, and the portability of shown device, this device is worked under the low energy consumption condition.For this reason, preferably the anisotropy Δ ε of specific inductive capacity is made as 4 to 12.As shown in table 3, if Δ ε less than 4 and thickness of liquid crystal box be approximately 5 μ m, then threshold voltage will surpass about 3V.In this case, need a kind of driver with high voltage resistance.Yet, this driver for shown in conversion element and liquid crystal layer be a kind of bad load.When Δ ε surpasses approximately 12 the time, take place probably to stain and retain figure, even the only aging very short time.Δ ε in the present embodiment is made as about 7.Table 3
| Liquid crystal material | Δε | Be detained (%) | Threshold voltage (V) | Wire retain image and contamination time of origin ( *) |
| ????A | ?12.3 | ?96.4 | ????1.8 | ????× |
| ????B | ?12.0 | ?96.2 | ????1.8 | ????○ |
| ????C | ?10.9 | ?95.3 | ????1.8 | ????○ |
| ????D | ?8.6 | ?94.5 | ????2.0 | ????○ |
| ????E | ?7.0 | ?96.5 | ????2.2 | ????◎ |
| ????F | ?5.8 | ?96.6 | ????2.4 | ????◎ |
| ????G | ?5.7 | ?96.7 | ????2.6 | ????◎ |
| ????H | ?5.9 | ?95.5 | ????2.5 | ????◎ |
| ????I | ?4.8 | ?94.8 | ????2.7 | ????◎ |
| ????J | ?4.0 | ?95.1 | ????3.0 | ????◎ |
| ????K | ?3.5 | ?96.0 | ????3.4 | ????◎ |
(
*) occur wire retain the image before time
*: less than 200hrs
○：200-500hrs
◎: greater than 500hrs
So, use the reverberator of the present invention's making and adopt GH type liquid crystal display material can make reflective LCD device, and its parameter is optimized.Figure 14 A and 15A represent the viewing angle characteristic of the reflective LCD device of embodiment 6; Figure 14 B and 15B represent the viewing angle characteristic of the reflective LCD device that combines with conventional reflector.
Referring to Figure 14 A and 15A, the reflective LCD device of embodiment 6 has carried out desirable demonstration, promptly have about 3.5 or higher contrast ratio, and with respect to the regular reflection direction approximately-45 ° have an appointment 40% or higher brightness in+45 ° the relative broad range.On the other hand, as Figure 14 B and 15B, the demonstration that the liquid crystal indicator that combines with conventional reflector carries out has about 3.5 or higher contrast ratio, and with respect to the regular reflection direction approximately-15 ° have an appointment 40% or higher brightness in+15 ° the limited range, but the i.e. sharply reduction of brightness beyond this scope.
In addition, when using eye-observation under a plurality of light sources as embodiment 5 is described, the reflective LCD device of embodiment 6 not only shows the visual angle of expansion, but also shows brightlyer.
Because reverberator of the present invention and by in the reflective LCD device that it is attached to GH type liquid crystal material with optimised parameter, obtained brighter than conventional apparatus, its contrast is high and do not have the demonstration of hysteresis.Thereby realize the demonstration of multi-grey level.Therefore, can be as will liquid crystal indicator and color filter being combined described in Fig. 7.So, the multicolor reflection formula liquid crystal indicator that realization can practical application.Embodiment 7
In the embodiments of the invention 7 discussion is suitable for the reflective LCD device of the embodiment 6 that combines with color filter.
Figure 19 represents the chromatic diagram and the color filter of adapted in the conventional reflective liquid crystal indicator of the color filter of adapted in the reflective LCD device of embodiment 7.In Figure 19, traditional color filter (representing with △) only shows feint color, and because transmission light quantity is increased, so the number of color only limits to two kinds.The color filter of embodiment 7 (with zero He ● expression) performance three kinds of colors (red, green and blue), they are more bright-colored than what traditional color filter showed.
Figure 13 represents the sectional view of used color filter among the embodiment 7.
As shown in figure 13, it is poor to have the maximum ga(u)ge of about 0.6 μ m between the adjacent coloured part of described color filter.When such color filter is attached on the relative substrate, and make liquid crystal indicator and when not doing any special measure with relative like this substrate, because the thickness difference between adjacent coloured part, thereby will produce the striate region.In order to reduce this defective, one deck planar film is set on described color filter, thereby being reduced to, thickness difference between adjacent coloured part is about 0.3 μ m.When thickness difference between the adjacent coloured part of color filter during less than 0.3 μ m, then need not planar film, described color filter can be used.
So, can realize the liquid crystal indicator that combines with color filter, and not have any delay.This just makes it possible to realize having the demonstration of any gray level.Therefore, the color reproduction of liquid crystal indicator is improved.The liquid crystal indicator of present embodiment has been illustrated in the multicolor displaying with 256 kinds or more colors is provided under the condition of low energy consumption level, and this to be presented at aspects such as brightness, contrast, the speed of response, reliability all be good.
As mentioned above, according to the present invention, a kind of reverberator be provided with substrate, the many protruding/concave portion that forms on the described substrate, whole protruding/the thin reflectance coating that forms on the concave portion.When light when specific direction incides on this reverberator, with respect to the regular reflection direction of incident light approximately the intensity of reflected light in-45 ° to+45 ° angulars field of view be with reference to light intensity 60% or more.So, compare with conventional reflector, can in the scope of broad, obtain the high strength reflected light.Under surround lighting, light is incident on the reverberator from all directions, can make light be pointed to the visual angle of a broad by reverberator.So, catoptrical total intensity is improved.
By partly comprising each protruding/concave portion of formation under the continuous curve surface condition at least, the inclination angle of its reflector surface is about 40% or littler less than the total area of 2 ° substrate with respect to total chip area.So, the relative entire emission photophase of light quantity by the normal direction reflection is reduced, thereby in the broad angular field of view, obtain high reflective light intensity.And then under surround lighting, light is incident on the reverberator from all directions, can make light be pointed to the visual angle of a broad by reverberator.So, catoptrical total intensity is improved.
Described each protruding/concave portion can be formed by photosensitive resin.So, can form required protruding/concave portion by photoetching process, and not need to be used for the photosensitive resin of additional composition technology.In addition, as selection, described protruding/concave portion can form by inorganic oxide and photosensitive resin.In the case, can form required protruding/concave portion by simple process.
In addition, according to the present invention, can by following steps make a kind of comprise substrate, on the substrate formed many protruding/concave portion and whole protruding/reverberator of the reflective film that forms on the concave portion, described step comprises: carry out the circulation of a plurality of photoetching processes and heat treatment process, with form described protruding/concave portion; And whole protruding/form the thin reflectance coating of one deck on the concave portion.So, can control the density of substrate epirelief/concave portion.As a result, can very high repeatability make reverberator with required reflection characteristic.
Make by the constant shape of the independent photoetching process circulation protruding/concave portion that forms, can just make reverberator based on simple design with required reflection characteristic with very high repeatability.In addition, make the shape of the protruding/concave portion that in the circulation of photoetching process, forms be different from the shape of the protruding/concave portion that forms in other photoetching process circulation, just can on described substrate, form difform protruding/concave portion.So, because the interference of protruding/recessed pattern does not appear, so but painted (coloring) of inhibitory reflex light.
In addition,, at first use negative-type photosensitive, re-use conformal photosensitive resin thereafter as used photosensitive resin in a plurality of photoetching process circulations.Therefore, can make in the preceding step formed protruding/shape of concave portion remains unchanged.
In addition, by following steps make a kind of comprise substrate, on the substrate formed protruding/reverberator of the reflective film that forms on concave portion and the protruding/concave portion, described step comprises: carry out the circulation of a photoetching process and heat treatment process, with form described protruding/concave portion; And whole protruding/form the thin reflectance coating of one deck on the concave portion.Described method also is included in the step that forms oxide and this oxide of etching on the described substrate.So, can form required protruding/concave portion by simple procedure.
In addition, by following steps make a kind of comprise substrate, on the substrate formed protruding/reverberator of the reflective film that forms on concave portion and the protruding/concave portion, described step comprises: carry out the circulation of a photoetching process and heat treatment process, with form described protruding/concave portion; And whole protruding/form the thin reflectance coating of one deck on the concave portion, wherein said method also comprises a kind of organic insulation resin of sneaking into molecule is added in described on-chip step.So, can form required protruding/concave portion by simple procedure.
And then, by with reverberator adapted of the present invention in reflective LCD device, can realize having the demonstration of high brightness and high-contrast.In addition, described reflective LCD device can comprise that also one deck is inserted in the host and guest's nematic phase type liquid crystal material between substrate and the reverberator.In this case, can realize having the demonstration of high brightness and high-contrast.
In addition, the birefraction of liquid crystal material (Δ n) is about 0.15 or littler; The anisotropy of the specific inductive capacity of liquid crystal display material (Δ ε) meets expression 4＜Δ ε＜12; The torsion angle of liquid crystal display material is set in about 180 ° to 360 ° scopes; The thickness of liquid crystal box of being made up of substrate, reverberator and liquid crystal layer is in about 3-10 mu m range.So, can realize low energy consumption, reliable, bright, high-contrast, response shows that this is a kind of demonstration that realizes having multi-grayscale fast.
In addition, reflective LCD device can also comprise color filter, and it has the coloured part of three kinds of different colours, and the thickness difference between wherein adjacent coloured part is approximately 0.3 μ m or littler.Thereby can realize the multicolor displaying of practical application.
Adopt reverberator of the present invention, can utilize surround lighting, in the angular field of view of broad, obtain higher reflective light intensity, and suppress along the ratio of the reflection light quantity of regular reflection direction for entire emission luminous energy.So,, can be issued to bright demonstration in ambient light conditions like this although surround lighting all is uniformly along the intensity of all directions.In addition, make the method for reverberator according to the present invention, above-mentioned reverberator can be made the reflector design with good reproducibility exactly.
And then the liquid crystal indicator that combines with reverberator of the present invention can more effectively utilize surround lighting compared with conventional art, thus the demonstration that realization has desirable contrast.In addition, by the characteristic of preferred described liquid crystal layer, can provide the reflective LCD device of multi-grayscale, it has Ideal Characteristics at aspects such as brightness, contrast, response speed, reliability, energy consumptions, and any hysteresis can not take place.Color filter is attached in this device, can also realizes showing the multicolor reflection formula liquid crystal indicator of ideal color.
Under unlikely situation about departing from the scope of the present invention with marrow, various other remodeling will be conspicuous for those are familiar with the people of this area and be easy to manufactured.Therefore, should be with the scope of appended each claim as restriction to former description, and should make these claims obtain the explanation of broad sense.
Claims (17)
1. reverberator comprises substrate, at many protruding/concave portion that forms on the described substrate and the reflective film that forms on described each protruding/concave portion,
Wherein, when light incides on the reverberator with first incident angle with respect to normal direction, by reverberator towards with respect to the regular reflection direction of light approximately the intensity of reflected light of the direction in-45 ° to+45 ° scopes be referenced strength about 60% or higher, wherein referenced strength is that first incident angle and second incident angle are equal to each other basically with the light intensity that second incident angle with respect to normal direction incides on the reference white flat board and quilt reflects towards normal direction.
2. reverberator as claimed in claim 1, wherein, each protruding/concave portion comprises a continuous curve surface at least in part; And
Account for about 40% or littler less than the total area of these parts of 2 ° substrate with respect to the total area of described substrate with the inclination angle of reflector surface.
3. reverberator as claimed in claim 1, wherein, each protruding/concave portion forms by photosensitive resin.
4. reverberator as claimed in claim 1, wherein, each protruding/concave portion forms by inorganic oxide and photosensitive resin.
5. reverberator as claimed in claim 1, wherein, each protruding/concave portion forms by molecule and photosensitive resin.
A making comprise substrate, a plurality of protruding/recess that forms on the substrate and whole protruding/method of the reverberator of the reflective film that forms on the concave portion, comprise the steps:
Carry out a plurality of photoetching processes and heat treatment process the circulation, with form described protruding/concave portion;
Whole protruding/to form reflectance coating on the concave portion thin.
7. the method for a making reverberator as claimed in claim 6, wherein, by an independent photoetching process circulate formed protruding/shape of concave portion is the same.
8. the method for a making reverberator as claimed in claim 6, wherein, in a photoetching process circulation formed protruding/shape of concave portion be different from other photoetching process circulation formed protruding/shape of concave portion.
9. the method for a making reverberator as claimed in claim 6 wherein, as used photosensitive resin in a plurality of photoetching process circulations, is at first used negative-type photosensitive, re-uses conformal photosensitive resin thereafter.
A making comprise substrate, the many protruding/concave portion that forms on the substrate and whole protruding/method of the reverberator that the reflectance coating that forms on the concave portion is thin, comprise the steps:
Carry out photoetching process and heat treatment process, in order to form described protruding/concave portion;
Whole protruding/form reflective film on the concave portion;
Wherein said method is further comprising the steps of,
On substrate, form oxide; And
This oxide of etching.
11. a making comprise substrate, the many protruding/concave portion that forms on the substrate and whole protruding/method of the reverberator of the reflective film that forms on the concave portion, comprise the steps:
Carry out photoetching process and heat treatment process, in order to form described protruding/concave portion;
Whole protruding/form reflective film on the concave portion; Wherein, described method also is included in and adds the organic insulation resin that is mixed with molecule on the described substrate.
12. a reflective LCD device comprises the described reverberator of claim 1.
13. a reflective LCD device as claimed in claim 12 also comprises substrate and is inserted in liquid crystal layer between described substrate and the reverberator that wherein said liquid crystal layer comprises a kind of guest-host type liquid crystal material.
14. a reflective LCD device as claimed in claim 13, wherein,
The birefraction of liquid crystal display material (Δ n) approximately is 0.15 or littler;
The anisotropy of liquid crystal display material specific inductive capacity (Δ ε) meets expression 4＜Δ ε＜12;
The torsion angle of liquid crystal display material is set in about 180 ° to 360 ° scope;
The thickness of liquid crystal box that is formed by substrate, reverberator and liquid crystal layer is in about 3-10 mu m range.
15. a reflective LCD device as claimed in claim 12 also comprises the color filter with the coloured part of three kinds of different colours, the thickness difference between wherein adjacent coloured part is about 0.3 μ m or littler.
16. a reverberator as claimed in claim 1 wherein, by forming a large amount of cylindrical calixconcavities in on-chip photosensitive resin layer, and heats described a large amount of cylindrical calixconcavity, form described protruding/concave portion.
17. a making comprise substrate, the many protruding/concave portion that forms on the substrate and whole protruding/method of the reverberator of the reflective film that forms on the concave portion, comprise the steps:
On described substrate, form photosensitive resin layer;
Carry out photoetching, so that on described photosensitive resin layer, form a plurality of cylindrical calixconcavities;
Heat described a large amount of cylindrical calixconcavity, so as on described substrate, to form described protruding/concave portion; And
Whole protruding/form reflective film on the concave portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 97120688 CN1212379A (en) | 1997-09-20 | 1997-09-20 | Reflector, method for fabricating the same and reflective liquid crystal display device incorporating the same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 97120688 CN1212379A (en) | 1997-09-20 | 1997-09-20 | Reflector, method for fabricating the same and reflective liquid crystal display device incorporating the same |
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| CN1212379A true CN1212379A (en) | 1999-03-31 |
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| CN 97120688 Pending CN1212379A (en) | 1997-09-20 | 1997-09-20 | Reflector, method for fabricating the same and reflective liquid crystal display device incorporating the same |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100409072C (en) * | 2001-04-19 | 2008-08-06 | 阿尔卑斯电气株式会社 | Liquid crystal display device and portable electronic apparatus using the same |
| CN100445856C (en) * | 2001-08-01 | 2008-12-24 | 三星电子株式会社 | Liquid crystal display device and method for fabricating the same |
-
1997
- 1997-09-20 CN CN 97120688 patent/CN1212379A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100409072C (en) * | 2001-04-19 | 2008-08-06 | 阿尔卑斯电气株式会社 | Liquid crystal display device and portable electronic apparatus using the same |
| CN100445856C (en) * | 2001-08-01 | 2008-12-24 | 三星电子株式会社 | Liquid crystal display device and method for fabricating the same |
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