CN1194366C - Manufacturing method of plasma display panel silver electrode - Google Patents

Abstract

The present invention provides a manufacturing method for a plasma display panel silver electrode which is comparatively simply controlling an electrode in PDP which uses the silver electrode. The method is manufactured by negative sensitizing silver paste through a photoengraving process. The present invention is characterized in that when the silver electrode is formed, two masking films are respectively used for covering a negative photosensitive silver layer to expose or the same one masking film is used for respectively covering the negative photosensitive silver layer to expose in a positive direction and a negative direction, and the exposure time for every time is t (t<min> <= t<1/2t <max>).

Description

Plasma display panel silver electrode manufacture method

Technical field

The present invention relates to be used for the manufacture method of silver electrode of the plasma display panel of display device etc.

Background technology

The electrode of plasma display panel is the strip conductive layer on the parallel PDP of the being made in substrate.Main at present employing silver electrode with low cost.Among the PDP, the main flow of silver electrode manufacture method is that photoetching negative light-sensitive silver paste coating forms the silver electrode figure.Traditional photoetching process is as shown in Figure 1: (1) is coated on the PDP glass substrate oven dry equably with the whole plate of negative light-sensitive silver paste; (2) with the mask of making electrode pattern it is exposed; (3) develop; (4) burn till.

The silver electrode pattern edge that photoetching process is produced is neat, no burr, and the graphical quality height, but the broken string problem is serious, needs to remedy the broken string problem by a large amount of benefit linemans, has strengthened workload like this, and reduce whole plate service behaviour, even reduce rate of finished products.

Summary of the invention

The objective of the invention is to avoid above-mentioned weak point of the prior art and provide a kind of in using the PDP of silver electrode, the plasma display panel silver electrode manufacture method that fairly simple ground control electrode breaks.

Purpose of the present invention can reach by following measure:

A kind of plasma display panel silver electrode manufacture method, adopt the negative photosensitive silver paste to make by photo-mask process, it is characterized in that when forming silver electrode, adopting two masks to cover the negative light-sensitive silver layer respectively exposes to it, or use the positive respectively negative sense of same mask to cover the negative light-sensitive silver layer it is exposed, and each time for exposure is $t(t_{\min }\&le;t<\frac{1}{2}{t}_{\max }).$

The exposure window of above-mentioned negative light-sensitive silver paste satisfies Δ J=J _Max-J _Min〉=J _Min, i.e. J _Max〉=2J _MinConstant owing to exposure intensity when exposing, so t _Max〉=2t _Min(Δ J is exposure window, J _Max, J _Min, t _Max, t _MinBe respectively maximum, minimum exposure amount, maximum, minimum exposure time.)

At this, the silver electrode broken string of reason can control to(for) the invention described above describes:

Mask has two kinds of chromium plate and mantles in the photoetching process.The cheap mantle of general employing.Be that the employing mantle is an exposure mask among the present invention.Mantle is a kind of plastics organic membrane; the surface is softer; when contacting with other surfaces (as the silver coating surface of waiting to expose, storing compartment surface etc.), some sharp-pointed coarse hard granule scratch surface that are touched easily on the face form groove (this paper is called cut), shown in a among Fig. 4, b, c.There are serious reflection and scattering process in this surface, cut place to light as the frosted glass surface, transmitance is sharply descended.Looking the different transmitances of cut surface appearance can drop to original 10%--90% and not wait.Therefore, in the traditional handicraft as shown in Figure 1, the uv transmittance at cut place has only entopic 10%--90% during exposure, and promptly exposure has only the 10%--90% of set point, when the product of exposure set point and transmitance during, belong to under-exposed less than the minimum exposure amount.During development, herein because of the under-exposed liquid that is developed decomposes to wash away and makes electrode produce broken string, shown in the A among Fig. 5, B, C.Because of broken string is caused by the cut on the mask, so the scratch pattern on broken string vestige and the mask is identical, and the position is identical, and promptly A copies a fully.

In contrast, in the photoetching process of the present invention, adopt double exposure, shown in Fig. 2,3: when exposing for the first time, establishing first mask has cut a at position a place, and corresponding A place forms under-exposed on electrode.When exposing for the second time, use second mask.Because cut produces at random, and the position obedience evenly distribution of cut on mask, according to probability distribution law, for two masks, the probability that occurs identical cut in same position is very little, is considered as impossible event in an incident.So the position a of second mask does not have identical cut, when promptly exposing for the second time on the electrode A place, position obtain being not less than J _MinExposure, thereby cause A place broken string when having avoided development.

In addition, if A place in position is not a cut, but the shading granule that other Electrostatic Absorption causes at random etc., re-expose can be controlled its broken string equally, and is theoretical identical.

The present invention has the following advantages:

(1) adopts the silver electrode manufacture method that double exposes, can use cheap mantle, reduce the PDP cost of manufacture.(2) adopt the silver electrode manufacture method that double exposes, can control effectively, reduce cost because shading or the astigmatic electrode broken strings that cause such as mask cut and Electrostatic Absorption granule reduce to mend the line workload.(3) adopt the silver electrode manufacture method that double exposes, can improve electrode quality, and then improve the performance of plasma display panel.

Description of drawings

Fig. 1 is the key diagram of the method for expression conventional lithography silver electrode.

Fig. 2 is expression forms the method for silver electrode with two mask double exposure photoetching a key diagram.

Fig. 3 is that each forms the key diagram of the method for silver electrode with double exposure photoetching once with a positive negative sense of mask in expression.

Fig. 4 is the key diagram of the scratch pattern on the expression mask.

Fig. 5 is the broken string figure on the silver electrode of representing to produce with mask that has cut shown in Figure 4 and conventional lithography method shown in Figure 1.

Embodiment

Below in conjunction with accompanying drawing the present invention is further described:

Fig. 2, the 3rd, the key diagram of the method for the double exposure photoetching silver electrode that the expression embodiment relates to.

The whole plate of large tracts of land evenly applies negative light-sensitive silver paste 2, oven dry on glass substrate 1.

First mask 3-1 be covered in carry out first time exposure on the negative light-sensitive silver layer, the time for exposure is set at $t(t_{\min }\&le;t<\frac{1}{2}{t}_{\max }).$

Use the position of second mask 3-2 by strict alignment and exposure for the first time instead and overlap fully and carry out second time then and expose, the time for exposure still is $t(t_{\min }\&le;t<\frac{1}{2}{t}_{\max }).$

The double exposure back forms PDP silver electrode 4 with suitable developing liquid developing, oven dry, last sintering.

If the made figure is a centrosymmetric image, after then exposure finishes for the first time, mask 3 forwards are taken off, behind the normal direction Rotate 180 on plane, mask 3 place °, again mask 3 negative senses are placed on the negative light-sensitive silver layer, expose with carrying out the second time first time behind the exposure position alignment, the time for exposure also is $t(t_{\min }\&le;t<\frac{1}{2}{t}_{\max }).$

The double exposure back forms PDP silver electrode 4 with suitable developing liquid developing, oven dry, last sintering.

Claims (4)

1. plasma display panel silver electrode manufacture method, adopt the negative photosensitive silver paste to make by photo-mask process, it is characterized in that when forming silver electrode, adopting two masks to cover the negative light-sensitive silver layer respectively exposes to it, or be under the situation of centrosymmetric image at figure, use the positive respectively negative sense of same mask to cover the negative light-sensitive silver layer it is exposed.

2. plasma display panel silver electrode manufacture method according to claim 1 is characterized in that the exposure window delta J=J of negative light-sensitive silver paste _Max-J _Min〉=J _Min, i.e. J _Max〉=2J _Min, t just _Max〉=2t _Min, J wherein _Max, J _MinBe respectively maximum, minimum exposure amount, t _Max, t _MinBe respectively maximum, minimum exposure time.

3. when plasma display panel silver electrode manufacture method according to claim 1 is characterized in that above-mentioned double exposure, each time for exposure was t, wherein $t_{\min }\&le;t<\frac{1}{2}{t}_{\max },$ t _Max, t _MinBe respectively maximum, minimum exposure time.

4. plasma display panel silver electrode manufacture method according to claim 1 is characterized in that the above-mentioned mask used mantle that is.

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