CN117979525A - Dynamic scanning electron beam high-brightness microfocus ray source based on annular target - Google Patents
Dynamic scanning electron beam high-brightness microfocus ray source based on annular target Download PDFInfo
- Publication number
- CN117979525A CN117979525A CN202410077961.6A CN202410077961A CN117979525A CN 117979525 A CN117979525 A CN 117979525A CN 202410077961 A CN202410077961 A CN 202410077961A CN 117979525 A CN117979525 A CN 117979525A
- Authority
- CN
- China
- Prior art keywords
- electron beam
- target
- annular
- deflection
- scanned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 82
- 238000003384 imaging method Methods 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 238000001816 cooling Methods 0.000 claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 230000010287 polarization Effects 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 238000002083 X-ray spectrum Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 5
- 230000033001 locomotion Effects 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 230000003068 static effect Effects 0.000 description 3
- 241000276425 Xiphophorus maculatus Species 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 229910001338 liquidmetal Inorganic materials 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 238000000638 solvent extraction Methods 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000002591 computed tomography Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Landscapes
- X-Ray Techniques (AREA)
Abstract
The invention discloses a dynamic scanning electron beam high-brightness micro Jiao Dianshe line source based on an annular target, which is characterized by comprising an electron gun, a focusing coil, a deflection system and an annular reflecting target; the electron gun is used for generating electron beam current and entering the annular reflecting target through the focusing coil and the deflection system in sequence; the focusing coil is used for focusing the incident electron beam and reducing the beam spot size of the electron beam; the deflection system is used for controlling the deflection direction and angle of the electron beam so that the electron beam bombards the annular reflecting target along multiple angles; the annular reflecting target is used for generating X rays for imaging an object to be scanned after being bombarded by the electron beam; the annular reflecting target sequentially comprises a target film, a heat conducting substrate and a water cooling channel layer from outside to inside, wherein the target film is used for generating X rays by reacting with incident electron beams, and the heat conducting substrate is used for transferring heat deposited on the target film to the water cooling channel layer. The invention can realize high-speed online detection.
Description
Technical Field
The invention belongs to the technical field of X-ray computer tomography, and relates to an electron beam scanning type X-ray source, in particular to an electron beam high-brightness micro Jiao Dianshe line source based on dynamic scanning of an annular reflecting target, which is called CL (Computed Laminography) for short.
Background
The electron beam scanning type X-ray source aims at nondestructive detection of a plate-shaped power electronic device and three-dimensional imaging of a plate-shaped fossil, and the system structure is shown in figure 1 and consists of an X-ray source, a two-dimensional object carrying moving platform and a flat panel detector: the X-ray source is positioned at the lower end of the platform and can realize translation in the three-dimensional direction; the flat panel detector is arranged on the C-shaped arm at the upper end and can slide along the C-shaped arm or rotate around a rotating shaft along with the C-shaped arm; the two-dimensional object carrying platform can realize two-dimensional precise translational motion.
The publication CN115020172a discloses a ring-shaped electron beam reflective liquid metal anode device, in which a ring-shaped electron beam strikes a liquid metal target (gallium, indium, tin), is reflected to a secondary conversion target (tungsten, molybdenum), and outputs characteristic X-rays of tungsten or molybdenum. Patent document CN 217334003U discloses an open reflective target microfocus X-ray tube.
The existing scheme has the following problems:
(1) The single cathode non-scanning beam and the conventional reflecting target make the electron beam intensively bombard the same target surface area, so that the target power is smaller in consideration of the heat dissipation problem of the target material.
(2) The same problem is true for single cathode non-scanned beam + conventional transmissive targets, which have lower target power and shorter lifetime than conventional reflective targets.
(3) The traditional reflection target ray source needs to be provided with a high-precision two-dimensional motion platform so as to be applied to CL equipment.
Disclosure of Invention
Aiming at the problems in the prior art, the invention aims to provide an electron beam high-brightness micro Jiao Dianshe line source based on dynamic scanning of a ring-shaped reflecting target. The annular reflecting target based on the electron beam scanning X-ray source utilizes the precisely controlled electron beam annular scanning targeting, replaces the mechanical circular motion of a sample with the deflection movement of the focal point of the ray source, reduces a two-dimensional motion platform, reduces the cost of imaging equipment, improves the scanning efficiency, can be applied to a large-size platy CL imaging system, has higher X-ray brightness compared with the traditional transmission target ray source, and can realize high-speed online detection.
The technical scheme of the invention is as follows:
An electron beam high-brightness micro Jiao Dianshe line source based on dynamic scanning of an annular target is characterized by comprising an electron gun, a focusing coil, a deflection system and an annular reflecting target;
the electron gun is used for generating electron beam current and entering the annular reflecting target through the focusing coil and the deflection system in sequence;
the focusing coil is used for focusing the incident electron beam and reducing the beam spot size of the electron beam;
The deflection system is used for controlling the deflection direction and angle of the electron beam so that the electron beam bombards the annular reflecting target along multiple angles;
The annular reflecting target is used for generating X rays for imaging an object to be scanned after being bombarded by the electron beam; the annular reflecting target sequentially comprises a target film, a heat conducting substrate and a water cooling channel layer from outside to inside, wherein the target film is used for generating X rays by reacting with incident electron beams, the heat conducting substrate is used for transferring heat deposited on the target film to the water cooling channel layer, and the thermal expansion coefficient of the heat conducting substrate is between that of the target film and that of the water cooling channel layer.
Further, the target film comprises a plurality of subareas provided with different materials, and different X-ray energy spectrums are generated by bombarding the different subareas through electron beams.
Further, the target film is made of tungsten, molybdenum, tantalum or chromium; the heat conducting substrate is made of diamond; the water cooling channel layer is made of copper.
Furthermore, the deflection system controls the deflection direction and angle of the electron beam, so that the electron beam is sequentially incident to different areas of the target film, and X-rays for multi-angle imaging of a stationary object to be scanned are generated.
Further, the track of the electron beam incident on the target film is a circular track, and X-rays for circularly scanning and imaging the static object to be scanned are generated.
Further, a transmission target is arranged in the center of the annular reflection target.
Further, the deflection system comprises two sets of orthogonal deflection magnets; by adjusting the current of the two sets of deflection magnets, the deflection of the electron beam at any angle is realized.
An imaging method based on the electron beam high-brightness micro Jiao Dianshe line source comprises the following steps:
1) Placing an object to be scanned between the annular reflective target and the annular detector;
2) Generating electron beam current by using the electron gun and sequentially entering the annular reflecting target through the focusing coil and the deflection system;
3) The annular reflecting target is bombarded by the electron beam to generate X-rays for imaging the object to be scanned and projecting the X-rays onto the annular detector to obtain projection data of the object to be scanned;
4) Adjusting the polarization system, and changing the deflection direction and angle of the electron beam to obtain projection data of different angles of the object to be scanned;
5) And processing the projection data to obtain the internal structure of the object to be scanned.
According to the invention, under the working of the deflection magnet, the electron beam can realize the partition bombardment of different positions on the inner wall of the annular reflecting target, so that the problem of target heat dissipation is relatively easy to solve, thereby improving the target power and prolonging the service life of the target.
The invention can make the detection sample in static state, and reduce imaging artifact caused by mechanical motion system. Different X-ray energy spectrums are generated by bombarding different targets through electron beams, and energy resolution imaging (a multi-energy spectrum source and a non-energy spectrum detector) can be realized.
The invention can realize the imaging at the absorption edge without using an energy resolution detector in the existing ray source structure.
Compared with a fixed reflecting target, the annular reflecting target can obtain annular X-rays with multiple angles, has higher beam power than a conventional reflecting target, and is particularly suitable for large-size platy CL imaging.
The invention has the following advantages:
(1) The electron beam can deflect any angle under the work of the deflection magnet, and the X-ray emitted from multiple angles can be obtained after the electron beam bombards the target surface, so that the problem of artifact caused by a mechanical motion scanning mode of the traditional static CT is solved, and high-speed online detection can be realized.
(2) Discontinuous discrete form target shooting solves the problem of target power density limitation, and improves target power so as to improve brightness.
(3) Different targets are arranged in a partitioning mode, and meanwhile, multiple characteristic X-rays are obtained, so that different imaging requirements are facilitated.
(4) The annular reflecting target based on the electron beam scanning X-ray source is suitable for large-size plate-shaped CL imaging system.
Drawings
Fig. 1 is a schematic diagram of the operation of the CL system.
Fig. 2 is a schematic diagram of the structure of an electron beam high-brightness microfocus radiation source.
Fig. 3 is a schematic diagram of electron beam high brightness microfocus source scanning.
Fig. 4 is a structural view of an annular reflecting target.
FIG. 5 is a schematic diagram of a target membrane material partition.
FIG. 6 is a diagram of a composite target structure of a toroidal reflective target plus a transmissive target.
Detailed Description
The invention will now be described in further detail with reference to the accompanying drawings, which are given by way of illustration only and are not intended to limit the scope of the invention.
As shown in fig. 2, the working relationship of each part of the electron beam high-brightness micro-focus ray source is as follows: the electron gun is used for generating electron beam current; the focusing coil is used for focusing the electron beam, so that the size of the beam spot is as small as possible; the deflection magnet is used for controlling the deflection direction and angle of the electron beam; the heavy metal target film on the annular reflecting target surface is bombarded by electron beams to generate X-rays for imaging.
Scanning and imaging process: the cathode filament of the electron gun heats and emits electrons, then accelerates to working voltage (100 kV-160 kV) through high voltage, gathers beams through a focusing coil, deflects through two sets of deflection magnets orthogonal to X and Y directions, can realize arbitrary angle deflection of the electron beams by adjusting currents of the two sets of deflection magnets, finally strikes the arbitrary position on the annular reflecting target surface of the electron beam, different materials can be arranged on the target surface in a partitioning manner, X rays with different characteristics are generated after the electron beam acts with different target materials, the emergent X rays pass through stationary samples, finally are projected onto a detector, and the internal structure of the sample can be obtained after the detector obtains projection data of a plurality of position angles of the sample through processing, as shown in figure 3.
The annular reflecting target consists of a target film, a heat conducting substrate and a water cooling channel, wherein the target film is used for generating X rays by reacting with an electron beam, and the target film material comprises tungsten, molybdenum, tantalum, chromium and the like; the heat conducting substrate is used for conducting heat deposited on the target film, and the material is mainly diamond; the water cooling channels are used to cool the thermally conductive substrate, and copper is generally used, and because copper and the target film have different thermal expansion coefficients, an intermediate excess thermally conductive substrate material is required for thermal conduction (as shown in fig. 4).
Different materials can be arranged in the inner target film in a zoned manner, different X-ray energy spectrums are generated by bombarding different targets through electron beams, and then multi-energy spectrum imaging can be achieved (as shown in figure 5).
The annular reflecting target can be combined with the transmission target to form a composite target, the scanning electron beam can irradiate the transmission target at the center, and the scanning electron beam is controlled to deflect onto the annular reflecting target, so that a multi-angle annular X-ray beam can be emitted (shown in figure 6).
The invention also provides an imaging method based on the electron beam high-brightness micro Jiao Dianshe line source, which comprises the following steps:
1) Placing an object to be scanned between the annular reflective target and the annular detector;
2) Generating electron beam current by using the electron gun and sequentially entering the annular reflecting target through the focusing coil and the deflection system;
3) The annular reflecting target is bombarded by the electron beam to generate X-rays for imaging the object to be scanned and projecting the X-rays onto the annular detector to obtain projection data of the object to be scanned;
4) Adjusting the polarization system, and changing the deflection direction and angle of the electron beam to obtain projection data of different angles of the object to be scanned;
5) And processing the projection data to obtain the internal structure of the object to be scanned.
Although specific embodiments of the invention have been disclosed for illustrative purposes, it will be appreciated by those skilled in the art that the invention may be implemented with the help of a variety of examples: various alternatives, variations and modifications are possible without departing from the spirit and scope of the invention and the appended claims. Therefore, it is intended that the invention not be limited to the particular embodiment disclosed as the best mode contemplated for carrying out this invention, but that the invention will have the scope indicated by the scope of the appended claims.
Claims (8)
1. An electron beam high-brightness micro Jiao Dianshe line source based on dynamic scanning of an annular target is characterized by comprising an electron gun, a focusing coil, a deflection system and an annular reflecting target;
the electron gun is used for generating electron beam current and entering the annular reflecting target through the focusing coil and the deflection system in sequence;
The focusing coil is used for focusing the incident electron beam and reducing the beam spot size of the electron beam;
The deflection system is used for controlling the deflection direction and angle of the electron beam so that the electron beam bombards the annular reflecting target along multiple angles;
The annular reflecting target is used for generating X rays for imaging an object to be scanned after being bombarded by the electron beam; the annular reflecting target sequentially comprises a target film, a heat conducting substrate and a water cooling channel layer from outside to inside, wherein the target film is used for generating X rays by reacting with incident electron beams, the heat conducting substrate is used for transferring heat deposited on the target film to the water cooling channel layer, and the thermal expansion coefficient of the heat conducting substrate is between that of the target film and that of the water cooling channel layer.
2. The electron beam high intensity micro Jiao Dianshe line source of claim 1, wherein the target film comprises a plurality of sections arranged with different materials, and different X-ray spectra are generated by electron beam bombardment of different sections.
3. The electron beam high brightness micro Jiao Dianshe line source according to claim 2, wherein the material of the target film is tungsten, molybdenum, tantalum or chromium; the heat conducting substrate is made of diamond; the water cooling channel layer is made of copper.
4. A source of electron beam high intensity micro Jiao Dianshe according to claim 1,2 or 3, wherein said deflection system controls the deflection direction and angle of the electron beam such that the electron beam is sequentially incident on different areas of said target film, generating X-rays for multi-angle imaging of a stationary object to be scanned.
5. The electron beam high intensity micro Jiao Dianshe line source of claim 4 wherein the trajectory of the electron beam incident on the target film is a circular trajectory, producing X-rays that image a stationary circular scan of the object to be scanned.
6. A source of electron beam high intensity micro Jiao Dianshe as claimed in claim 1, 2 or 3 wherein a transmissive target is provided in the centre of the annular reflective target.
7. A source of electron beam high intensity micro Jiao Dianshe as claimed in claim 1,2 or 3 wherein the deflection system comprises two sets of orthogonal deflection magnets; by adjusting the current of the two sets of deflection magnets, the deflection of the electron beam at any angle is realized.
8. A method of imaging based on the electron beam high brightness micro Jiao Dianshe line source of claim 1, comprising the steps of:
1) Placing an object to be scanned between the annular reflective target and a detector;
2) Generating electron beam current by using the electron gun and sequentially entering the annular reflecting target through the focusing coil and the deflection system;
3) The annular reflecting target is bombarded by the electron beam to generate X-rays for imaging the object to be scanned and projecting the X-rays onto the detector to obtain projection data of the object to be scanned;
4) Adjusting the polarization system, and changing the deflection direction and angle of the electron beam to obtain projection data of different angles of the object to be scanned;
5) And processing the projection data to obtain the internal structure of the object to be scanned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410077961.6A CN117979525A (en) | 2024-01-19 | 2024-01-19 | Dynamic scanning electron beam high-brightness microfocus ray source based on annular target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410077961.6A CN117979525A (en) | 2024-01-19 | 2024-01-19 | Dynamic scanning electron beam high-brightness microfocus ray source based on annular target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117979525A true CN117979525A (en) | 2024-05-03 |
Family
ID=90860885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202410077961.6A Pending CN117979525A (en) | 2024-01-19 | 2024-01-19 | Dynamic scanning electron beam high-brightness microfocus ray source based on annular target |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117979525A (en) |
-
2024
- 2024-01-19 CN CN202410077961.6A patent/CN117979525A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8520803B2 (en) | Multi-segment anode target for an X-ray tube of the rotary anode type with each anode disk segment having its own anode inclination angle with respect to a plane normal to the rotational axis of the rotary anode and X-ray tube comprising a rotary anode with such a multi-segment anode target | |
| US9991085B2 (en) | Apparatuses and methods for generating distributed x-rays in a scanning manner | |
| EP0147009B1 (en) | X-ray scanner | |
| US7197116B2 (en) | Wide scanning x-ray source | |
| US5629969A (en) | X-ray imaging system | |
| JP5175841B2 (en) | System and method for improving the field of view of x-ray imaging using a non-stationary anode | |
| US4607380A (en) | High intensity microfocus X-ray source for industrial computerized tomography and digital fluoroscopy | |
| US9852875B2 (en) | X-ray tube | |
| JP5675794B2 (en) | X-ray tube for generating two focal spots and medical device having the same | |
| CN103227082B (en) | X ray emitter and X ray production method | |
| CN1723743A (en) | High speed modulation of switched-focus X-ray tube | |
| CN103219211B (en) | X-ray source and X ray production method | |
| JP2018537820A (en) | Electronic induction and receiving element | |
| CN117174557B (en) | High-energy micro-focus X-ray tube | |
| CN108777248A (en) | A kind of scan-type x-ray source and its imaging system | |
| CN202142495U (en) | Array X-ray source based on cold cathode of field emission | |
| CN208336145U (en) | A kind of scan-type x-ray source and its imaging system | |
| CN117979525A (en) | Dynamic scanning electron beam high-brightness microfocus ray source based on annular target | |
| CN117832045A (en) | Micro-focus ray source based on electron beam dynamic scanning of transmission target | |
| US20100290594A1 (en) | X-ray tube having a rotating and linearly translating anode | |
| CN208903967U (en) | A kind of X-ray tube of magnetic scanning formula | |
| US11569055B2 (en) | Scanning-type x-ray source and imaging system therefor | |
| CN109119312A (en) | A kind of X-ray tube of magnetic scanning formula | |
| JP7028922B2 (en) | Electron induction and receiving elements | |
| JP2010146992A (en) | Scanning type x-ray tube |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination |