CN117213632B - 一种宽谱调制解调型成像光谱芯片及生产方法 - Google Patents
一种宽谱调制解调型成像光谱芯片及生产方法 Download PDFInfo
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- 238000001228 spectrum Methods 0.000 title claims abstract description 159
- 238000003384 imaging method Methods 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title abstract description 16
- 230000003287 optical effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 13
- 238000002360 preparation method Methods 0.000 abstract description 10
- 238000001514 detection method Methods 0.000 abstract description 5
- 230000008901 benefit Effects 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 abstract description 4
- 230000008569 process Effects 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 238000012544 monitoring process Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 28
- 230000003595 spectral effect Effects 0.000 description 17
- 238000010586 diagram Methods 0.000 description 15
- 230000005693 optoelectronics Effects 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 8
- 239000002184 metal Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 230000000737 periodic effect Effects 0.000 description 5
- 238000001914 filtration Methods 0.000 description 4
- 239000004038 photonic crystal Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002096 quantum dot Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 238000000701 chemical imaging Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 230000000593 degrading effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
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CN117579813B (zh) * | 2024-01-16 | 2024-04-02 | 四川新视创伟超高清科技有限公司 | 一种焦深区域成像芯片位姿角度矫正方法及矫正*** |
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CN216214138U (zh) * | 2021-10-09 | 2022-04-05 | 深圳光启尖端技术有限责任公司 | 超材料结构 |
CN115824410A (zh) * | 2022-08-25 | 2023-03-21 | 上海与光彩芯科技有限公司 | 光谱成像恢复方法及装置 |
WO2023073810A1 (en) * | 2021-10-26 | 2023-05-04 | Nippon Telegraph And Telephone Corporation | Beamformer |
CN116678825A (zh) * | 2023-05-15 | 2023-09-01 | 上海理工大学 | 一种高灵敏远红外超材料器件及样本中特定成分的浓度检测*** |
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CN216214138U (zh) * | 2021-10-09 | 2022-04-05 | 深圳光启尖端技术有限责任公司 | 超材料结构 |
WO2023073810A1 (en) * | 2021-10-26 | 2023-05-04 | Nippon Telegraph And Telephone Corporation | Beamformer |
CN115824410A (zh) * | 2022-08-25 | 2023-03-21 | 上海与光彩芯科技有限公司 | 光谱成像恢复方法及装置 |
CN116678825A (zh) * | 2023-05-15 | 2023-09-01 | 上海理工大学 | 一种高灵敏远红外超材料器件及样本中特定成分的浓度检测*** |
Non-Patent Citations (1)
Title |
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新型超构表面成像光谱芯片研究进展;王婷婷等;《激光与光电子学进展》;第60卷(第11期);全文 * |
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