CN117148710B - Self-adaptive plasma monitoring method and system - Google Patents
Self-adaptive plasma monitoring method and system Download PDFInfo
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- 238000012544 monitoring process Methods 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims abstract description 47
- 230000002159 abnormal effect Effects 0.000 claims abstract description 21
- 238000012216 screening Methods 0.000 claims abstract description 15
- 238000004458 analytical method Methods 0.000 claims abstract description 11
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- 210000002381 plasma Anatomy 0.000 description 176
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
- G05B13/0205—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric not using a model or a simulator of the controlled system
- G05B13/024—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric not using a model or a simulator of the controlled system in which a parameter or coefficient is automatically adjusted to optimise the performance
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- H—ELECTRICITY
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- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Abstract
The invention relates to the technical field of plasma analysis, in particular to a self-adaptive plasma monitoring method and system. The method comprises the steps of setting a corresponding control mode set for a current plasma generator to be monitored, forming curves of voltage, current and plasma density corresponding to different control modes, setting an operation constraint range for the current plasma generator, judging whether the voltage, current and plasma density exceed the operation constraint range in real time, sending out a curve abnormal command if the voltage, current and plasma density exceed the operation constraint range, screening an optimal control mode of the current plasma generator after the curve abnormal command is received, obtaining the optimal control mode, and switching the control mode of the plasma generator. The scheme monitors the voltage, current and density of the plasma comprehensively, so that the plasma is formed to carry out various real-time control schemes.
Description
Technical Field
The invention relates to the technical field of plasma analysis, in particular to a self-adaptive plasma monitoring method and system.
Background
Plasma (Plasma) is a Plasma in thermal equilibrium, i.e. a medium whose temperature is below absolute temperature (about 1030K), but which is capable of affecting the surrounding environment in the form of heat exchange. In nature, almost all substances are composed of plasma, such as a large amount of hydrogen dissolved in natural water, a large amount of nitrogen in the atmosphere, and a large amount of methane, ethane, etc. buried underground. This is because these molecules are in thermal equilibrium. A plasma is a very high temperature, very dense, positively charged gaseous state.
Prior to the present invention, there has been provided a plasma monitoring apparatus for obtaining a plasma emission state by an image capturing section, analyzing the obtained image by a control section, observing the plasma state in real time by using a measured value of the image, and adjusting a supply amount of a reaction gas and a discharge condition of the plasma supplied to a plasma supply apparatus to control a plurality of plasma supply apparatuses arranged so as to uniformly emit the plasma, but this is mainly a manner in which a competitive supply apparatus can uniformly emit the plasma, and how to realize a more comprehensive analysis and feedback control of a plasma abnormal state based on a voltage, a current, and a plasma density of the plasma has not been clarified.
Disclosure of Invention
In view of the above problems, the present invention provides a method and a system for monitoring self-adaptive plasma, which are capable of performing various real-time control schemes on the plasma by comprehensively monitoring the voltage, current and density of the plasma.
According to a first aspect of an embodiment of the present invention, an adaptive plasma monitoring method is provided.
In one or more embodiments, preferably, the adaptive plasma monitoring method includes:
setting a corresponding control mode set for a current plasma generator to be monitored;
forming curves of voltage, current and plasma density corresponding to different control modes along with time;
setting an operation constraint range for a current plasma generator;
judging whether the voltage, the current and the plasma density exceed the operation constraint range in real time, and if so, issuing a curve abnormality command;
when the curve abnormal command is received, screening an optimal control mode of the current plasma generator;
and obtaining an optimal control mode, and switching the control mode of the plasma generator.
In one or more embodiments, preferably, the setting a corresponding control mode set for the current to-be-monitored plasma generator specifically includes:
acquiring a variable which can be controlled on line by the current plasma generator;
setting the online controlled variable;
and combining the variable values into different control mode sets according to different variable values of the online control set by an operator.
In one or more embodiments, preferably, the forming curves of the voltage, the current and the plasma density corresponding to different control modes with time specifically includes:
sequentially starting the plasma generator, and setting an operation monitoring period to be 2T;
for each control mode, monitoring the data of the voltage, current and plasma density changing along with time under the condition that the operation monitoring period is 2T, and storing the data as an online monitoring data set until all the control modes are operated;
setting a first change curve function for each control mode to meet a first calculation formula to obtain an optimal voltage coefficient set;
setting a second change curve function for each control mode to meet a second calculation formula to obtain an optimal current coefficient set;
setting a third change curve function for each control mode to meet a third calculation formula to obtain an optimal plasma density coefficient group;
storing the first change curve function, the second change curve function and the third change curve function as curves of voltage, current and plasma density which change along with time in sequence;
the first change curve function is:
；
wherein A (t) is the calculated value of the first change curve function at the moment t, i is the number of the voltage coefficient, n is the total number of the voltage coefficient, K i The ith voltage coefficient is represented by the formula, and t is time;
the first calculation formula is as follows:
；
wherein { K i An optimal set of voltage coefficients, argmin1[ []For extraction ofAt minimum, as, a function of the corresponding set of voltage coefficients(T) is a voltage calculated value corresponding to the time T in the online monitoring data set, and 2T is an operation monitoring period;
the second change curve function is:
；
wherein B (t) is the calculated value of the second change curve function at the moment t, j is the number of the current coefficient, m is the total number of the voltage coefficient, K j Is the j-th current coefficient;
the second calculation formula is as follows:
；
wherein { K j Current coefficient set optimal, argmin2[ []For extraction ofAt minimum, bs (t) is the current calculation value corresponding to the time t in the online monitoring data set, which is a function of the corresponding current coefficient set;
the third change curve function is:
；
wherein C (t) is the calculated value of the third change curve function at the moment t, z is the number of the plasma density coefficient, q is the total number of the plasma density coefficients, and K z Is the z-th plasma density coefficient;
the third calculation formula is as follows:
；
wherein { K z Set of optimal plasma density coefficients, argmin3[ ]]For extraction ofMinimum time, correspond toCs (t) is a function of the set of plasma density coefficients, cs (t) being a calculated value of plasma density corresponding to time t in the online monitoring data set.
In one or more embodiments, preferably, the setting an operation constraint range for the current plasma generator specifically includes:
setting an operation constraint range of the plasma generator by an operator;
judging whether an operation constraint range exists in a future 2T time at the current moment, if so, continuing to operate, and if not, giving an alarm;
after receiving the alarm, the operator complements the operating constraint range of the plasma generator.
In one or more embodiments, preferably, the determining, in real time, whether the voltage, the current and the plasma density exceed the operation constraint range or not, if yes, issues a curve anomaly command specifically includes:
judging the voltage, current and plasma density in a future 2T period according to the curve of the voltage, current and plasma density changing along with time;
judging whether the voltage, current and plasma density in the future 2T period exceed the operation constraint range or not, if so, issuing a curve abnormal command, and if not, not processing;
comparing whether the voltage, current and plasma density at the current moment exceed the operation constraint range, if so, issuing a curve abnormal command, and if not, not processing.
In one or more embodiments, preferably, when the curve anomaly command is received, the screening of the optimal control mode of the current plasma generator specifically includes:
after receiving the curve abnormal command, extracting an operation constraint range at the current moment;
judging which control modes in all control modes can be controlled to exceed an operation constraint range in a future 2T time period by utilizing curves of voltage, current and density which change along with time, and taking the rest control modes as candidate control modes;
in the control modes to be selected, calculating a control index of each control mode by using a seventh calculation formula;
selecting a control mode with the lowest comprehensive index as an optimal control mode;
the seventh calculation formula is:
；
wherein W is a control index, R1 is an average value of a voltage constraint range, R2 is an average value of a current constraint range, and R3 is an average value of a plasma density constraint range.
In one or more embodiments, preferably, the obtaining an optimal control mode, switching the control mode of the plasma generator specifically includes:
the plasma generator monitors whether the optimal control mode changes in real time;
when the optimal control mode is changed, setting all parameters of the control mode to the plasma generator within a preset switching interval according to a preset input sequence.
According to a second aspect of an embodiment of the present invention, an adaptive plasma monitoring system is provided.
In one or more embodiments, preferably, the adaptive plasma monitoring system includes:
the preset mode module is used for setting a corresponding control mode set for the current plasma generator to be monitored;
the change curve analysis module is used for forming curves of voltage, current and plasma density corresponding to different control modes along with time change;
the operation constraint analysis module is used for setting an operation constraint range for the current plasma generator;
the abnormality analysis module is used for judging whether the voltage, the current and the plasma density exceed the operation constraint range in real time, and if so, issuing a curve abnormality command;
the optimal screening module is used for screening the optimal control mode of the current plasma generator after receiving the curve abnormal command;
and the optimal control module is used for obtaining an optimal control mode and switching the control mode of the plasma generator.
According to a third aspect of embodiments of the present invention, there is provided a computer readable storage medium having stored thereon computer program instructions which, when executed by a processor, implement a method according to any of the first aspect of embodiments of the present invention.
According to a fourth aspect of embodiments of the present invention there is provided an electronic device comprising a memory and a processor, the memory being for storing one or more computer program instructions, wherein the one or more computer program instructions are executable by the processor to implement the method of any of the first aspects of embodiments of the present invention.
The technical scheme provided by the embodiment of the invention can comprise the following beneficial effects:
in the scheme of the invention, aiming at the problem that parameters set by different plasma generators are completely different, a curing parameter is difficult to form, a mapping function of a plasma generation scheme and voltage, current and density is obtained through an online learning stage, functions of the voltage, current and density under different plasma schemes are formed, and curves of the voltage, current and density changing along with time are predicted through point positions.
According to the scheme, according to the preset operation constraint range of each plasma generator, the control mode is adjusted in advance when the position of 80% of the constraint range is reached through the comparison of the on-line voltage, current and density curves with time changes and the operation constraint range, so that the comparison index generated by adjusting the voltage, current and density of the plasmas in the future preset range of the corresponding curve target is closest.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims thereof as well as the appended drawings.
The technical scheme of the invention is further described in detail through the drawings and the embodiments.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a flow chart of an adaptive plasma monitoring method according to one embodiment of the present invention.
Fig. 2 is a flow chart of a method for adaptive plasma monitoring in which a corresponding set of control modes is set for a current plasma generator to be monitored, in accordance with one embodiment of the present invention.
Fig. 3 is a flow chart illustrating a voltage, current and plasma density profile over time for different control modes in an adaptive plasma monitoring method according to an embodiment of the present invention.
Fig. 4 is a flow chart of setting an operating constraint range for a current plasma generator in an adaptive plasma monitoring method according to one embodiment of the present invention.
FIG. 5 is a flow chart of a method for adaptive plasma monitoring in which a curve anomaly command is issued if a condition exists that determines in real time whether voltage, current, and plasma density exceed operating constraints in accordance with one embodiment of the present invention.
Fig. 6 is a flowchart of a method for adaptive plasma monitoring in accordance with an embodiment of the present invention, when the curve anomaly command is received, for screening an optimal control mode of a current plasma generator.
Fig. 7 is a flowchart of a method for adaptive plasma monitoring to obtain an optimal control mode and switching the control mode of a plasma generator according to an embodiment of the present invention.
Fig. 8 is a block diagram of an adaptive plasma monitoring system according to one embodiment of the present invention.
Fig. 9 is a block diagram of an electronic device in one embodiment of the invention.
Detailed Description
In some of the flows described in the specification and claims of the present invention and in the foregoing figures, a plurality of operations occurring in a particular order are included, but it should be understood that the operations may be performed out of order or performed in parallel, with the order of operations such as 101, 102, etc., being merely used to distinguish between the various operations, the order of the operations themselves not representing any order of execution. In addition, the flows may include more or fewer operations, and the operations may be performed sequentially or in parallel. It should be noted that, the descriptions of "first" and "second" herein are used to distinguish different messages, devices, modules, etc., and do not represent a sequence, and are not limited to the "first" and the "second" being different types.
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to fall within the scope of the invention.
Plasma (Plasma) is a Plasma in thermal equilibrium, i.e. a medium whose temperature is below absolute temperature (about 1030K), but which is capable of affecting the surrounding environment in the form of heat exchange. In nature, almost all substances are composed of plasma, such as a large amount of hydrogen dissolved in natural water, a large amount of nitrogen in the atmosphere, and a large amount of methane, ethane, etc. buried underground. This is because these molecules are in thermal equilibrium. A plasma is a very high temperature, very dense, positively charged gaseous state.
Prior to the present invention, there has been provided a plasma monitoring apparatus for obtaining a plasma emission state by an image capturing section, analyzing the obtained image by a control section, observing the plasma state in real time by using a measured value of the image, and adjusting a supply amount of a reaction gas and a discharge condition of the plasma supplied to a plasma supply apparatus to control a plurality of plasma supply apparatuses arranged so as to uniformly emit the plasma, but this is mainly a manner in which a competitive supply apparatus can uniformly emit the plasma, and how to realize a more comprehensive analysis and feedback control of a plasma abnormal state based on a voltage, a current, and a plasma density of the plasma has not been clarified.
The embodiment of the invention provides a self-adaptive plasma monitoring method and a self-adaptive plasma monitoring system. The scheme monitors the voltage, current and density of the plasma comprehensively, so that the plasma is formed to carry out various real-time control schemes.
According to a first aspect of an embodiment of the present invention, an adaptive plasma monitoring method is provided.
Fig. 1 is a flow chart of an adaptive plasma monitoring method according to one embodiment of the present invention.
In one or more embodiments, preferably, the adaptive plasma monitoring method includes:
s101, setting a corresponding control mode set for a current plasma generator to be monitored;
s102, forming curves of voltage, current and plasma density corresponding to different control modes along with time;
s103, setting an operation constraint range for the current plasma generator;
s104, judging whether the voltage, the current and the plasma density exceed the operation constraint range in real time, and if so, issuing a curve abnormal command;
s105, screening an optimal control mode of the current plasma generator after receiving the curve abnormal command;
s106, obtaining an optimal control mode, and switching the control mode of the plasma generator.
In the embodiment of the invention, firstly, a preset control mode is set, and how to respectively run each control mode is definitely and clearly; further forming response data sets under different control modes, and calculating curves of voltage, current and density along with time; obtaining an operation constraint range of each plasma generator operated in real time; judging whether the curve of the voltage, the current and the density which change along with time is abnormal or not in a preset time period; how to perform optimal control mode screening under the abnormal condition of the clear processing curve; finally, the optimal control mode is executed.
Fig. 2 is a flow chart of a method for adaptive plasma monitoring in which a corresponding set of control modes is set for a current plasma generator to be monitored, in accordance with one embodiment of the present invention.
As shown in fig. 2, in one or more embodiments, preferably, the setting a corresponding control mode set for the current to-be-monitored plasma generator specifically includes:
s201, acquiring a variable which can be controlled on line by a current plasma generator;
s202, setting the variable of the online control;
s203, combining the variable values into different control mode sets according to different variable values of the online control set by an operator.
In the embodiment of the present invention, in order to perform corresponding adaptive control according to different plasma generators, it is first required to form a set of control modes of each plasma generator, where the set actually directly follows the plasma generator, and before performing control based on online monitoring, each plasma generator needs to set such a set of control modes.
Fig. 3 is a flow chart illustrating a voltage, current and plasma density profile over time for different control modes in an adaptive plasma monitoring method according to an embodiment of the present invention.
In one or more embodiments, as shown in fig. 3, preferably, the forming curves of the voltage, the current and the plasma density corresponding to different control modes with time specifically includes:
s301, starting a plasma generator in sequence, and setting an operation monitoring period to be 2T;
s302, under each control mode, monitoring data of voltage, current and plasma density changing along with time under the condition that the operation monitoring period is 2T, and storing the data as an online monitoring data set until all the control modes are operated;
s303, setting a first change curve function for each control mode to meet a first calculation formula to obtain an optimal voltage coefficient group;
s304, setting a second change curve function for each control mode to meet a second calculation formula to obtain an optimal current coefficient group;
s305, setting a third change curve function for each control mode to meet a third calculation formula to obtain an optimal plasma density coefficient group;
s306, storing the first change curve function, the second change curve function and the third change curve function as curves of voltage, current and plasma density which change along with time in a corresponding mode;
the first change curve function is:
；
wherein A (t) is the calculated value of the first change curve function at the moment t, i is the number of the voltage coefficient, n is the total number of the voltage coefficient, K i The ith voltage coefficient is represented by the formula, and t is time;
the first calculation formula is as follows:
；
wherein { K i An optimal set of voltage coefficients, argmin1[ []For extraction ofAt minimum, as (T) is a function of the corresponding voltage coefficient set, as (T) is a voltage calculation value corresponding to the time T in the online monitoring data set, and 2T is an operation monitoring period;
the second change curve function is:
；
wherein B (t) is the calculated value of the second change curve function at the moment t, j is the number of the current coefficient, m is the total number of the voltage coefficient, K j Is the j-th current coefficient;
the second calculation formula is as follows:
；
wherein { K j Current coefficient set optimal, argmin2[ []For extraction ofAt minimum, bs (t) is the current calculation value corresponding to the time t in the online monitoring data set, which is a function of the corresponding current coefficient set;
the third change curve function is:
；
wherein C (t) is the calculated value of the third change curve function at the moment t, z is the number of the plasma density coefficient, q is the total number of the plasma density coefficients, and K z Is the z-th plasma density coefficient;
the third calculation formula is as follows:
；
wherein { K z Set of optimal plasma density coefficients, argmin3[ ]]For extraction of) At minimum, cs (t) is a function of the corresponding set of plasma density coefficients, and Cs (t) is the calculated value of the plasma density corresponding to time t in the online monitoring data set.
In the embodiment of the invention, the plasma generator is started, and then corresponding different control mode sets are read to perform an automatic operation mode to form response data sets under different control modes, so that a curve of voltage, current and density changing along with time can be formed in a current learning mode.
Fig. 4 is a flow chart of setting an operating constraint range for a current plasma generator in an adaptive plasma monitoring method according to one embodiment of the present invention.
As shown in fig. 4, in one or more embodiments, preferably, the setting an operation constraint range for the current plasma generator specifically includes:
s401, setting an operation constraint range of the plasma generator by an operator;
s402, judging whether an operation constraint range exists in a 2T time in the future of the current moment, if so, continuing to operate, and if not, sending an alarm;
s403, after receiving the alarm, the operator complements the operation constraint range of the plasma generator.
In the embodiment of the invention, the operation constraint range is preset in the actual operation process of the plasma generator, but in the actual operation, the plasma generator may generate some operation conditions possibly exceeding the preset operation constraint range, so that the operation constraint ranges of different time periods are firstly set, or the operation constraint ranges in the future operation process are set in real time in the operation process.
FIG. 5 is a flow chart of a method for adaptive plasma monitoring in which a curve anomaly command is issued if a condition exists that determines in real time whether voltage, current, and plasma density exceed operating constraints in accordance with one embodiment of the present invention.
In one or more embodiments, as shown in fig. 5, preferably, the determining, in real time, whether the voltage, the current and the plasma density exceed the operation constraint range or not, if yes, issues a curve anomaly command specifically includes:
s501, judging the voltage, the current and the plasma density in a future 2T period according to the curve of the voltage, the current and the plasma density changing along with time;
s502, judging whether the voltage, current and plasma density in a future 2T period exceed the operation constraint range, if so, issuing a curve abnormal command, and if not, not processing;
s503, comparing whether the voltage, the current and the plasma density at the current moment exceed the operation constraint range, if so, issuing a curve abnormality command, and if not, not processing.
In the embodiment of the invention, in order to complete the on-line operation control of the plasma generator, the corresponding operation constraint range is firstly read, then the current moment and the future moment are judged one by one according to the curves of the voltage, the current and the plasma density changing along with time, and whether the overrun condition occurs in the future 2T period is judged, if the overrun condition exists, a curve abnormal command is sent out, if the overrun condition exists, the operation constraint range can be adjusted to be the original 80% for safer control, for example, if the operation constraint range is [100,200], and the operation constraint range is adjusted to be 80%, and then the operation constraint range is modified to be [110,190].
Fig. 6 is a flowchart of a method for adaptive plasma monitoring in accordance with an embodiment of the present invention, when the curve anomaly command is received, for screening an optimal control mode of a current plasma generator.
In one or more embodiments, as shown in fig. 6, preferably, after receiving the curve anomaly command, the screening of the optimal control mode of the current plasma generator specifically includes:
s601, after receiving the curve abnormal command, extracting an operation constraint range at the current moment;
s602, judging which control modes in all control modes can be controlled to exceed an operation constraint range in a future 2T time period by utilizing curves of voltage, current and density which change along with time, and taking the rest control modes as candidate control modes;
s603, in the control modes to be selected, calculating a control index of each control mode by using a seventh calculation formula;
s604, selecting a control mode with the lowest comprehensive index as an optimal control mode;
the seventh calculation formula is:
；
wherein W is a control index, R1 is an average value of a voltage constraint range, R2 is an average value of a current constraint range, and R3 is an average value of a plasma density constraint range.
In the embodiment of the invention, in the process of curve exception handling, the comparison and selection of the current running state is mainly carried out, the comparison and selection process comprises 2 steps, the first step is to screen out firstly, control exceeding the running constraint range can occur in the future 2T time period, the control modes are removed, the comprehensive index of each control mode is judged by utilizing a seventh calculation formula, and the control mode with the lowest comprehensive index is selected as the optimal control mode.
Fig. 7 is a flowchart of a method for adaptive plasma monitoring to obtain an optimal control mode and switching the control mode of a plasma generator according to an embodiment of the present invention.
In one or more embodiments, as shown in fig. 7, preferably, the obtaining an optimal control mode, and switching the control mode of the plasma generator specifically includes:
s701, the plasma generator monitors whether the optimal control mode changes in real time;
s702, setting all parameters of the control mode to the plasma generator according to a preset input sequence within a preset switching interval when the optimal control mode is changed.
In the embodiment of the invention, when the optimal control mode is changed, all parameters of the control mode are set into the plasma generator according to a preset input sequence within a preset switching interval according to a preset switching mode, and then the control mode is switched to the latest control mode.
According to a second aspect of an embodiment of the present invention, an adaptive plasma monitoring system is provided.
Fig. 8 is a block diagram of an adaptive plasma monitoring system according to one embodiment of the present invention.
In one or more embodiments, preferably, the adaptive plasma monitoring system includes:
a preset mode module 801, configured to set a corresponding control mode set for a current plasma generator to be monitored;
the change curve analysis module 802 is configured to form curves of voltage, current and plasma density corresponding to different control modes over time;
an operation constraint analysis module 803 for setting an operation constraint range for the current plasma generator;
the abnormality analysis module 804 is configured to determine in real time whether the voltage, the current, and the plasma density exceed the operation constraint range, and if so, issue a curve abnormality command;
an optimal screening module 805, configured to screen an optimal control mode of the current plasma generator after receiving the curve anomaly command;
and the optimal control module 806 is configured to obtain an optimal control mode, and switch the control mode of the plasma generator.
In the embodiment of the invention, a system suitable for different structures is realized through a series of modularized designs, and the system can realize closed-loop, reliable and efficient execution through acquisition, analysis and control.
According to a third aspect of embodiments of the present invention, there is provided a computer readable storage medium having stored thereon computer program instructions which, when executed by a processor, implement a method according to any of the first aspect of embodiments of the present invention.
According to a fourth aspect of an embodiment of the present invention, there is provided an electronic device. Fig. 9 is a block diagram of an electronic device in one embodiment of the invention. The electronic device shown in fig. 9 is a general-purpose adaptive plasma monitor apparatus, which includes a general-purpose computer hardware structure including at least a processor 901 and a memory 902. The processor 901 and the memory 902 are connected by a bus 903. The memory 902 is adapted to store instructions or programs executable by the processor 901. The processor 901 may be a stand-alone microprocessor or may be a set of one or more microprocessors. Thus, the processor 901 performs the process of data and control of other devices by executing the instructions stored in the memory 902, thereby performing the method flow of the embodiment of the present invention as described above. The bus 903 connects the above components together, while connecting the above components to the display controller 904 and display device and input/output (I/O) device 905. Input/output (I/O) device 905 may be a mouse, keyboard, modem, network interface, touch input device, somatosensory input device, printer, and other devices known in the art. Typically, the input/output devices 905 are connected to the system through input/output (I/O) controllers 906.
The technical scheme provided by the embodiment of the invention can comprise the following beneficial effects:
in the scheme of the invention, aiming at the problem that parameters set by different plasma generators are completely different, a curing parameter is difficult to form, a mapping function of a plasma generation scheme and voltage, current and density is obtained through an online learning stage, functions of the voltage, current and density under different plasma schemes are formed, and curves of the voltage, current and density changing along with time are predicted through point positions.
According to the scheme, according to the preset operation constraint range of each plasma generator, the control mode is adjusted in advance when the position of 80% of the constraint range is reached through the comparison of the on-line voltage, current and density curves with time changes and the operation constraint range, so that the comparison index generated by adjusting the voltage, current and density of the plasmas in the future preset range of the corresponding curve target is closest.
It will be appreciated by those skilled in the art that embodiments of the present invention may be provided as a method, system, or computer program product. Accordingly, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, magnetic disk storage, optical storage, and the like) having computer-usable program code embodied therein.
The present invention is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems) and computer program products according to embodiments of the invention. It will be understood that each flow and/or block of the flowchart illustrations and/or block diagrams, and combinations of flows and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.
Claims (9)
1. An adaptive plasma monitoring method, comprising:
setting a corresponding control mode set for a current plasma generator to be monitored;
forming curves of voltage, current and plasma density corresponding to different control modes along with time;
setting an operation constraint range for a current plasma generator;
judging whether the voltage, the current and the plasma density exceed the operation constraint range in real time, and if so, issuing a curve abnormality command;
when the curve abnormal command is received, screening an optimal control mode of the current plasma generator;
obtaining an optimal control mode, and switching the control mode of the plasma generator;
the forming curves of voltage, current and plasma density corresponding to different control modes along with time specifically comprises the following steps:
sequentially starting the plasma generator, and setting an operation monitoring period to be 2T;
for each control mode, monitoring the data of the voltage, current and plasma density changing along with time under the condition that the operation monitoring period is 2T, and storing the data as an online monitoring data set until all the control modes are operated;
setting a first change curve function for each control mode to meet a first calculation formula to obtain an optimal voltage coefficient set;
setting a second change curve function for each control mode to meet a second calculation formula to obtain an optimal current coefficient set;
setting a third change curve function for each control mode to meet a third calculation formula to obtain an optimal plasma density coefficient group;
storing the first change curve function, the second change curve function and the third change curve function as curves of voltage, current and plasma density which change along with time in sequence;
the first change curve function is:
；
wherein A (t) is the calculated value of the first change curve function at the moment t, i is the number of the voltage coefficient, n is the total number of the voltage coefficient, K i The ith voltage coefficient is represented by the formula, and t is time;
the first calculation formula is as follows:
；
wherein { K i An optimal set of voltage coefficients, argmin1[ []For extraction ofAt minimum, as (T) is a function of the corresponding voltage coefficient set, as (T) is a voltage calculation value corresponding to the time T in the online monitoring data set, and 2T is an operation monitoring period;
the second change curve function is:
；
wherein B (t) is the calculated value of the second change curve function at the moment t, j is the number of the current coefficient, m is the total number of the voltage coefficient, K j Is the j-th current coefficient;
the second calculation formula is as follows:
；
wherein { K j Current coefficient set optimal, argmin2[ []For extraction ofAt minimum, bs (t) is the current calculation value corresponding to the time t in the online monitoring data set, which is a function of the corresponding current coefficient set;
the third change curve function is:
；
wherein C (t) is the calculated value of the third change curve function at the moment t, z is the number of the plasma density coefficient, q is the total number of the plasma density coefficients, and K z Is the z-th plasma density coefficient;
the third calculation formula is as follows:
；
wherein { K z Set of optimal plasma density coefficients, argmin3[ ]]For extraction ofAt minimum, cs (t) is a function of the corresponding set of plasma density coefficients, and Cs (t) is the calculated value of the plasma density corresponding to time t in the online monitoring data set.
2. The method for adaptively monitoring plasma according to claim 1, wherein said setting a corresponding set of control modes for a current plasma generator to be monitored comprises:
acquiring a variable which can be controlled on line by the current plasma generator;
setting the online controlled variable;
and combining the variable values into different control mode sets according to different variable values of the online control set by an operator.
3. The method of claim 1, wherein said setting an operating constraint range for a current plasma generator comprises:
setting an operation constraint range of the plasma generator by an operator;
judging whether an operation constraint range exists in a future 2T time at the current moment, if so, continuing to operate, and if not, giving an alarm;
after receiving the alarm, the operator complements the operating constraint range of the plasma generator.
4. The method for monitoring adaptive plasma according to claim 1, wherein the real-time determination of whether the voltage, current and plasma density exceed the operation constraint range or not, if so, issuing a curve abnormality command, specifically comprises:
judging the voltage, current and plasma density in a future 2T period according to the curve of the voltage, current and plasma density changing along with time;
judging whether the voltage, current and plasma density in the future 2T period exceed the operation constraint range or not, if so, issuing a curve abnormal command, and if not, not processing;
comparing whether the voltage, current and plasma density at the current moment exceed the operation constraint range, if so, issuing a curve abnormal command, and if not, not processing.
5. The method for adaptively monitoring plasma as set forth in claim 3, wherein said screening the optimal control mode of the current plasma generator after receiving said curve abnormality command comprises:
after receiving the curve abnormal command, extracting an operation constraint range at the current moment;
judging which control modes in all control modes can be controlled to exceed an operation constraint range in a future 2T time period by utilizing curves of voltage, current and density which change along with time, and taking the rest control modes as candidate control modes;
in the control modes to be selected, calculating a control index of each control mode by using a seventh calculation formula;
selecting a control mode with the lowest comprehensive index as an optimal control mode;
the seventh calculation formula is:
；
wherein W is a control index, R1 is an average value of a voltage constraint range, R2 is an average value of a current constraint range, and R3 is an average value of a plasma density constraint range.
6. The method for adaptively monitoring plasma according to claim 1, wherein said obtaining an optimal control mode switches the control mode of the plasma generator, comprising:
the plasma generator monitors whether the optimal control mode changes in real time;
when the optimal control mode is changed, setting all parameters of the control mode to the plasma generator within a preset switching interval according to a preset input sequence.
7. An adaptive plasma monitoring system for implementing the method of any one of claims 1 to 6, the system comprising:
the preset mode module is used for setting a corresponding control mode set for the current plasma generator to be monitored;
the change curve analysis module is used for forming curves of voltage, current and plasma density corresponding to different control modes along with time change;
the operation constraint analysis module is used for setting an operation constraint range for the current plasma generator;
the abnormality analysis module is used for judging whether the voltage, the current and the plasma density exceed the operation constraint range in real time, and if so, issuing a curve abnormality command;
the optimal screening module is used for screening the optimal control mode of the current plasma generator after receiving the curve abnormal command;
and the optimal control module is used for obtaining an optimal control mode and switching the control mode of the plasma generator.
8. A computer readable storage medium, on which computer program instructions are stored, which computer program instructions, when executed by a processor, implement the method of any of claims 1-6.
9. An electronic device comprising a memory and a processor, wherein the memory is configured to store one or more computer program instructions, wherein the one or more computer program instructions are executed by the processor to implement the method of any of claims 1-6.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001321949A (en) * | 2000-05-18 | 2001-11-20 | Komatsu Ltd | Plasma arc spot welding equipment |
| KR20050027668A (en) * | 2003-09-16 | 2005-03-21 | 한국과학기술연구원 | Diagnosis system and method for measuring pulsed plasma characteristics variable |
| CN102598200A (en) * | 2009-09-22 | 2012-07-18 | 多纳尔·奥沙利文 | Sensor for measuring plasma parameters |
| CN104769707A (en) * | 2012-08-28 | 2015-07-08 | 先进能源工业公司 | Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system |
| CN115428117A (en) * | 2020-04-24 | 2022-12-02 | 应用材料公司 | Process control and monitoring method under dynamic plasma conditions by plasma spectroscopy |
-
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001321949A (en) * | 2000-05-18 | 2001-11-20 | Komatsu Ltd | Plasma arc spot welding equipment |
| KR20050027668A (en) * | 2003-09-16 | 2005-03-21 | 한국과학기술연구원 | Diagnosis system and method for measuring pulsed plasma characteristics variable |
| CN102598200A (en) * | 2009-09-22 | 2012-07-18 | 多纳尔·奥沙利文 | Sensor for measuring plasma parameters |
| CN104769707A (en) * | 2012-08-28 | 2015-07-08 | 先进能源工业公司 | Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system |
| CN115428117A (en) * | 2020-04-24 | 2022-12-02 | 应用材料公司 | Process control and monitoring method under dynamic plasma conditions by plasma spectroscopy |
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