CN117038747A - High-reflectivity photovoltaic reflective film and preparation method thereof - Google Patents
High-reflectivity photovoltaic reflective film and preparation method thereof Download PDFInfo
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- CN117038747A CN117038747A CN202311061652.1A CN202311061652A CN117038747A CN 117038747 A CN117038747 A CN 117038747A CN 202311061652 A CN202311061652 A CN 202311061652A CN 117038747 A CN117038747 A CN 117038747A
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- photovoltaic
- reflecting
- reflector
- high reflectivity
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- 238000002310 reflectometry Methods 0.000 title claims abstract description 24
- 238000002360 preparation method Methods 0.000 title claims description 7
- 239000010410 layer Substances 0.000 claims abstract description 108
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 239000012790 adhesive layer Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 13
- 239000011521 glass Substances 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 238000001723 curing Methods 0.000 claims description 6
- -1 polyethylene terephthalate Polymers 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 239000004698 Polyethylene Substances 0.000 claims description 3
- 239000004793 Polystyrene Substances 0.000 claims description 3
- 238000004026 adhesive bonding Methods 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 238000013007 heat curing Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 229920006122 polyamide resin Polymers 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 229920000573 polyethylene Polymers 0.000 claims description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 3
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 2
- 238000005266 casting Methods 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 230000000903 blocking effect Effects 0.000 abstract description 2
- 230000002035 prolonged effect Effects 0.000 abstract description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 7
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 7
- 239000000463 material Substances 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 238000003475 lamination Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007688 edging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
Landscapes
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The application discloses a high-reflectivity photovoltaic reflective film which comprises an adhesive layer, a second reflective layer, a substrate layer, a microstructure layer and a first reflective layer which are sequentially arranged from bottom to top, wherein the microstructure layer is of a microprism structure, and the reflective layer is arranged below the substrate layer and plays a role in reflecting light again. Under the action of the microprism structure, the first reflecting layer and the second reflecting layer, the reflecting film provided by the application not only can effectively improve the conversion efficiency of the photovoltaic module, and the reflectivity of the reflecting film can reach more than 95%, but also can be better protected by blocking the first reflecting layer by the substrate layer and the microstructure layer, so that the service life of the reflecting film is prolonged.
Description
Technical Field
The application belongs to the field of photovoltaics, and particularly relates to a photovoltaic reflective film with high reflectivity and a preparation method thereof.
Background
The photovoltaic industry is environment-friendly and free of environmental pollution, is a renewable resource, and under the condition of current energy shortage, solar photovoltaic is a novel energy with wide development prospect.
The conversion efficiency in the existing solar photovoltaic module is used as an index which is most important in the photovoltaic industry, and the higher the conversion efficiency, the more expensive the photovoltaic module is. At present, in order to increase conversion efficiency, besides the improvement of a battery piece body, a reflection film is additionally arranged on the surface of a welding strip, and the reflection film is additionally arranged by utilizing a battery piece gap, so that unavailable light is reflected back to the periphery for recycling, and the conversion efficiency can be increased by 2-3%.
The first is to apply a reflective film on the surface of the welding strip, and the welding strip is generally eliminated in the market at present due to the fact that the welding strip width is reduced and the thickness is increased;
the second type is to apply a reflecting film to the gap of the battery piece, and to apply a reflecting film with a triangular prism structure to the surface of the lower glass layer or the surface of the back plate, but the reflecting strip has a simple structure, only the outermost layer is provided with a reflecting layer, aluminum is conventionally used as a reflecting layer material, the reflectivity is 85-88%, and the light reflection utilization rate is not enough.
In view of this, how to maximize the utilization of the light irradiation area and improve the conversion efficiency is a technical problem that needs to be solved in the industry.
Disclosure of Invention
The application aims to provide a photovoltaic reflective film with high reflectivity and a preparation method thereof, so as to solve the problems in the background technology.
In order to achieve the above purpose, the present application provides the following technical solutions:
the utility model provides a photovoltaic reflective membrane of high reflectivity, includes from down and go up gluing layer, second reflector layer, substrate layer, micro-structure layer and the first reflector layer that sets gradually, micro-structure layer sets up to micro-prism structure, the second reflector layer sets up the below on substrate layer plays the effect of reflection light once more.
According to the technical scheme, the first reflecting layer and the second reflecting layer are matched through the arranged microprism structure, so that the reflectivity of the reflecting film reaches more than 95%.
As a preferable scheme of the application, the microprism structure consists of a plurality of microprisms with equal height or one height.
The technical scheme is realized so as to be conveniently composed of a plurality of equal-height microprisms or a plurality of high-low microprisms.
As a preferable mode of the application, the microprism is a triangular prism, the cross section of the triangular prism is triangular, and all vertex angles of the microprism are 111-131 degrees.
The technical scheme is realized so as to facilitate the reflection of light rays.
As a preferred embodiment of the present application, the substrate layer includes one of polycarbonate, polyethylene terephthalate, polyamide resin, polystyrene, polyethylene, and polymethyl methacrylate.
The technical scheme is realized, and the flexibility and the portability are excellent.
As a preferred embodiment of the present application, the first light reflecting layer and the second light reflecting layer are provided as an aluminized layer or a silver-plated layer.
The technical scheme is realized so that the reflectivity of the reflective film can reach more than 95%.
As a preferable mode of the present application, the thickness of the first light reflecting layer is set to 0.05-1.0 μm; the thickness of the second reflecting layer is set to be 0.01-0.05 mu m.
The technical scheme is realized, the weight of the reflecting film is reduced, and the adhesive force of the adhesion of the back EVA layer is improved.
As a preferred embodiment of the present application, the adhesive layer is connected to the surface of the glass layer or the back plate layer.
According to the technical scheme, the adhesive layer is adhered to the surface of the glass layer or the backboard layer in a thermosetting pressurizing mode.
As a preferable scheme of the application, the reflective film is in a roll shape, and the width of the cut reflective film is larger than or equal to the width of the cell gap.
The preparation method of the photovoltaic reflective film with high reflectivity comprises the following steps:
step one: manufacturing a female die of a corresponding microprism structure;
step two: carrying out negative etching on the surface of a female die by using a UV (ultraviolet) curing or heat curing method, and curing on the surface of a substrate layer to obtain a corresponding microprism structure;
step three: obtaining a first reflecting layer on the surface of the micro-prism structure through chemical plating, vapor plating, spraying plating and other methods;
step four: the same method is used for the lower surface of the substrate layer, and a second reflecting layer is obtained on the lower surface of the substrate layer through chemical plating, vapor deposition, spray plating and other methods;
step five: and (3) carrying out curtain coating co-extrusion treatment on the surface of the second reflecting layer to obtain an adhesive layer, and then cutting to obtain a reflecting film finished product corresponding to the requirement.
In a preferred embodiment of the present application, the female mold is made of copper, nickel or chromium.
Compared with the prior art, the application has the beneficial effects that:
under the action of the microprism structure, the first reflecting layer and the second reflecting layer, the reflecting film provided by the application not only can effectively improve the conversion efficiency of the photovoltaic module, and the reflectivity of the reflecting film can reach more than 95%, but also can be better protected by blocking the first reflecting layer by the substrate layer and the microstructure layer, so that the service life of the reflecting film is prolonged.
Drawings
Fig. 1 is a schematic diagram of a structure according to the present application.
Fig. 2 is a schematic structural diagram of a second embodiment of the present application.
In the figure: the light-emitting diode comprises a first light-reflecting layer 1, a microstructure layer 2, a substrate layer 3, a second light-reflecting layer 4, an adhesive layer 5, glass 6 and an EVA layer 7.
Description of the embodiments
The following description of the embodiments of the present application will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present application, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
Examples
The utility model provides a photovoltaic reflective membrane of high reflectivity, refer to fig. 1, include from the lower gluing layer 5 that sets gradually on, second reflector layer 4, substrate layer 3, micro-structure layer 2 and first reflector layer 1, wherein, micro-structure layer 2 sets up to micro-prism structure, in this embodiment, second reflector layer 4 is plated the aluminized layer in substrate layer 3 below, play the effect of light that reflects once more, and micro-prism structure comprises a plurality of equal altitude micro-prism, first reflector layer 1 is plated the aluminized layer on micro-prism surface. In other embodiments, the micro-prism structure may be composed of a plurality of micro-prisms with a height, and the second light reflecting layer 4 and the first light reflecting layer 1 may be silver plating layers.
Referring to fig. 1, in the present embodiment, the microprisms are triangular prisms, the cross sections of which are arranged in a triangle shape, and all apex angles of the microprisms are arranged at 121 °. In other embodiments, the triangle may take the form of an isosceles triangle and the apex angle of the microprisms may be set at 111-131.
Referring to fig. 1, in the present embodiment, the apex angle is set as a sharp angle. In other embodiments, the apex angle may be set as a circular arc angle (0.5 < r <5 mm) or wave-like.
Referring to fig. 1, in order to increase the flexibility and portability of the reflective film. In the present embodiment, the base material layer 3 includes one of polycarbonate, polyethylene terephthalate, polyamide resin, polystyrene, polyethylene, and polymethyl methacrylate.
Referring to fig. 1, in order to increase the portability of the reflective film, the adhesion of the back EVA layer is facilitated to be improved. In the present embodiment, the thickness of the first light reflecting layer is set at 0.05 μm, and the thickness of the second light reflecting layer 4 is set at 0.01 μm. In other embodiments, the thickness of the first light reflecting layer may be set to 0.05-1.0 μm, and the thickness of the second light reflecting layer 4 may be set to 0.01-0.05 μm.
Referring to fig. 2, in the present embodiment, all the microprisms extend at an angle of 10 ° to the direction of the substrate layer 3. In other embodiments, the microprism extends at an angle of 0-45 ° to the direction of the substrate layer 3.
Referring to fig. 1, in the present embodiment, the adhesive layer 5 is adhered to the surface of the glass layer or the back plate layer by means of thermosetting pressurization.
In order to facilitate the use of the retroreflective sheeting. In this embodiment, the reflective film is rolled, and the width of the cut reflective film is greater than or equal to the width of the cell gap.
The preparation method of the photovoltaic reflective film with high reflectivity comprises the following steps:
step one: manufacturing a female die of a corresponding microprism structure;
step two: carrying out negative etching on the surface of a female die by using a UV (ultraviolet) curing or heat curing method, and curing on the surface of the substrate layer 3 to obtain a corresponding microprism structure;
step three: obtaining a first reflecting layer 1 on the surface of the micro-prism structure through chemical plating, vapor deposition, spray plating and other methods;
step four: a second reflecting layer 4 is obtained on the lower surface of the substrate layer 3 by electroless plating, vapor deposition, thermal spraying and the like using the same method on the lower surface of the substrate layer 3;
step five: and (3) carrying out curtain coating co-extrusion treatment on the surface of the second reflecting layer 4 to obtain an adhesive layer 5, and then cutting to obtain a reflecting film finished product corresponding to the requirement.
In this embodiment, the female mold is made of copper. In other embodiments, the female mold may be made of nickel or chromium.
In this embodiment, the angle of the extending direction of the microprism structures on the female mold is opposite to the angle on the finished product, i.e. -10 °. In other embodiments, the angle of the extending direction of the microprism structure is 0 ° to-45 ° with respect to the finished product.
Specifically, in actual use, the reflective film is applied on the surface of the lower glass 6 in advance in a thermal bonding mode to form a latticed space, and the reserved position is the placement position of the battery piece;
a photovoltaic upper glass 6, an upper EVA layer 7 (ethylene-vinyl acetate copolymer), a series-connected battery sheet, a lower EVA layer 7, and a lower glass 6 were prepared. And (3) laminating according to the sequence, placing the paved materials into a laminating machine for high-temperature vacuum lamination, edging the redundant EVA and the backboard after lamination, mounting the aluminum frame and the wire box after the lamination piece is cooled, and finally detecting a series of data such as component power.
The reflective film photovoltaic component with the high microprism structure can reflect incident light on the reflective film, and the reflective light can be totally reflected at the interface of the glass and the air due to the fact that the refractive index of the glass is larger than that of the air, and finally the totally reflected light can enter the battery piece again, so that the conversion efficiency is improved.
The reflective film with the microprism structure with the alternately high and low regularity can prevent the reflective light source on the edge battery piece from reflecting to the outside of the battery piece, and further reflect the reflective light source back to the battery piece for recycling, so that the conversion efficiency of the reflective film is improved.
The extending direction of the microprism is 45 degrees with the direction of the base material, namely, the light sources with different illumination directions can be reflected to surrounding battery pieces, so that the conventional assembly can be suitable for areas with different illumination directions, and the universality of the reflective film is improved. Through a large number of test data comparison analysis, the conventional component has 3% -4% of power gain, and the reflectivity of more than 95% can be achieved.
Although embodiments of the present application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the application, the scope of which is defined in the appended claims and their equivalents.
Claims (10)
1. The utility model provides a photovoltaic reflective membrane of high reflectivity, its characterized in that, includes from down and go up gluing layer (5), second reflector layer (4), substrate layer (3), micro-structure layer (2) and first reflector layer (1) that set gradually, micro-structure layer (2) set up to micro-prism structure, second reflector layer (4) set up the below of substrate layer (3), play the effect of reflection light again.
2. The high reflectivity photovoltaic reflector of claim 1, wherein said microprism structure is comprised of a plurality of microprisms of equal height or a plurality of microprisms of higher and lower height.
3. The high reflectivity photovoltaic reflective film according to claim 2, wherein said microprisms are triangular prisms having a triangular cross section with all apex angles of the microprisms set between 111 ° and 131 °.
4. The high reflectance photovoltaic reflective film according to claim 1, wherein said substrate layer (3) comprises one of polycarbonate, polyethylene terephthalate, polyamide resin, polystyrene, polyethylene and polymethyl methacrylate.
5. A high reflectivity photovoltaic reflector as claimed in claim 1, characterized in that the first reflector layer (1) and the second reflector layer (4) are provided as aluminized or silvered layers.
6. A high reflectivity photovoltaic retroreflective film according to claim 1, characterized in that the thickness of the first retroreflective layer (1) is set at 0.05-1.0 μm; the thickness of the second reflecting layer (4) is set to be 0.01-0.05 mu m.
7. A high reflectivity photovoltaic reflector film as claimed in claim 1, characterized in that the adhesive layer (5) is attached to the surface of the glass layer or the backsheet layer.
8. The high reflectivity photovoltaic reflector of claim 1, wherein the reflector is rolled and has a width after cutting greater than or equal to the width of the cell gap.
9. A preparation method of a photovoltaic reflective film with high reflectivity is characterized by comprising the following steps: the method comprises the following steps:
step one: manufacturing a female die of a corresponding microprism structure;
step two: carrying out negative etching on the surface of a female die by using a UV (ultraviolet) curing or heat curing method, and curing on the surface of a substrate layer (3) to obtain a corresponding microprism structure;
step three: obtaining a first reflecting layer (1) on the surface of the micro-prism structure through chemical plating, vapor deposition, spray plating and other methods;
step four: a second reflecting layer (4) is obtained on the lower surface of the substrate layer (3) by using the same method and adopting methods such as electroless plating, vapor deposition, spray plating and the like on the lower surface of the substrate layer (3);
step five: and (3) obtaining an adhesive layer (5) on the surface of the second reflecting layer (4) through casting and coextrusion treatment, and then obtaining a reflecting film finished product corresponding to the requirement through slitting.
10. The method for preparing a high-reflectivity photovoltaic reflecting film according to claim 9, wherein the female mold is made of copper, nickel or chromium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311061652.1A CN117038747A (en) | 2023-08-23 | 2023-08-23 | High-reflectivity photovoltaic reflective film and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311061652.1A CN117038747A (en) | 2023-08-23 | 2023-08-23 | High-reflectivity photovoltaic reflective film and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117038747A true CN117038747A (en) | 2023-11-10 |
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ID=88638931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311061652.1A Withdrawn CN117038747A (en) | 2023-08-23 | 2023-08-23 | High-reflectivity photovoltaic reflective film and preparation method thereof |
Country Status (1)
| Country | Link |
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| CN (1) | CN117038747A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118039720A (en) * | 2024-04-15 | 2024-05-14 | 常州凝耀新材料有限公司 | Insulating high-reflection photovoltaic reflective film, preparation method thereof and application thereof in photovoltaic |
-
2023
- 2023-08-23 CN CN202311061652.1A patent/CN117038747A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118039720A (en) * | 2024-04-15 | 2024-05-14 | 常州凝耀新材料有限公司 | Insulating high-reflection photovoltaic reflective film, preparation method thereof and application thereof in photovoltaic |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20231110 |
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| WW01 | Invention patent application withdrawn after publication |