CN117008421A - Optical device deformation compensation method and system and photoetching machine - Google Patents
Optical device deformation compensation method and system and photoetching machine Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
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Abstract
The optical device deformation compensation method and system and the photoetching machine, wherein the optical device is used for transferring the pattern on the mask plate onto the wafer, and the optical device deformation compensation method comprises the following steps: determining a region with aberration in the actually formed pattern according to the difference between the actually formed pattern on the surface of the wafer and a preset pattern; obtaining deformation compensation quantity of the corresponding area of the optical device according to the actual aberration in the area with the aberration; and generating corresponding compensation control signals according to the deformation compensation quantity of the corresponding area of the optical device, and controlling the corresponding compensation device to compensate the corresponding area of the optical device. By adopting the scheme, the local deformation of the optical device can be accurately compensated, so that the imaging quality of the optical device is improved.
Description
Technical Field
The embodiment of the specification relates to the technical field of semiconductor manufacturing, in particular to an optical device deformation compensation method and system and a photoetching machine.
Background
In semiconductor manufacturing, the photolithographic process is a critical technique for pattern transfer, whose control accuracy and resolution directly determine the yield of semiconductors. Among the many factors affecting the lithographic process, the quality of the lithographic apparatus optics plays a decisive role, and the quality of the imaging is directly determined by the optics.
During exposure, the optical device is deformed due to irradiation of high-power laser light, so that a certain aberration is generated in final imaging. Currently, in order to reduce the influence of deformation of an optical device on imaging, a piezoelectric sensor is generally used to control the displacement offset of the optical device, and the displacement sensor detects the displacement offset of the optical device to compensate the deformation of the optical device.
However, in the application process, the deformation of the optical device is compensated by adopting the piezoelectric sheet and the displacement sensor, and only the whole optical device can be uniformly compensated.
Disclosure of Invention
In view of this, the embodiments of the present disclosure provide a method and a system for compensating deformation of an optical device, and a lithographic apparatus, which can accurately compensate local deformation of the optical device, thereby improving imaging quality of the optical device.
First, an embodiment of the present disclosure provides a method for compensating deformation of an optical device, where the optical device is used to transfer a pattern on a mask onto a wafer, the method includes:
determining a region with aberration in the actually formed pattern according to the difference between the actually formed pattern on the surface of the wafer and a preset pattern;
obtaining deformation compensation quantity of the corresponding area of the optical device according to the actual aberration in the area with the aberration;
and generating corresponding compensation control signals according to the deformation compensation quantity of the corresponding area of the optical device, and controlling the corresponding compensation device to compensate the corresponding area of the optical device.
Optionally, the obtaining the deformation compensation amount of the corresponding area of the optical device according to the actual aberration in the area with aberration includes:
obtaining Zernike constant term aberration existing in the corresponding area of the optical device according to the actual aberration in the area with the aberration;
and converting the obtained Zernike constant term aberration into deformation compensation quantity of the corresponding area of the optical device.
Optionally, the generating a corresponding compensation control signal according to the deformation compensation amount of the corresponding area of the optical device, controlling the corresponding compensation device to compensate the corresponding area of the optical device, includes:
determining the compensation voltage of the compensation device at the corresponding position according to the deformation compensation quantity of the corresponding area of the optical device and the mapping relation between the deformation compensation quantity and the compensation voltage stored in advance, and generating a compensation voltage signal;
and the compensation device outputs the compensation voltage signal to a corresponding position to compensate the corresponding area of the optical device.
Optionally, the compensation device outputting the compensation voltage signal to a corresponding position, compensates a corresponding region of the optical device, and includes:
and according to the compensation voltage signal, the compensation device applies force to the corresponding area of the optical device so as to drive the optical device to move, and compensates the corresponding area of the optical device.
Optionally, the compensating device applies a force to a corresponding region of the optical device according to the compensation voltage signal to drive the optical device to move, so as to compensate the corresponding region of the optical device, including:
and according to the compensation voltage signal, the compensation device applies a force to the corresponding area in the direction perpendicular to the surface of the wafer, so as to drive the optical device to move, and the deformation of the corresponding area of the optical device is compensated.
Optionally, the optical device deformation compensation method further includes:
and detecting the displacement of the corresponding area of the optical device, and stopping outputting the compensation control signal to the compensation device at the corresponding position when the displacement of the optical device is equal to the deformation of the corresponding area of the optical device.
Correspondingly, the embodiment of the specification also provides an optical device deformation compensation system, wherein the optical device is used for transferring the pattern on the mask plate onto the wafer, and the deformation compensation system comprises an aberration acquisition device, a compensation control device and a compensation device, wherein:
the aberration obtaining device is suitable for determining an area with aberration in the actually formed pattern according to the difference between the actually formed pattern on the surface of the wafer and a preset pattern;
the compensation control device is suitable for obtaining the deformation compensation quantity of the corresponding area of the optical device according to the actual aberration in the area with the aberration; generating corresponding compensation control signals according to the deformation compensation quantity of the corresponding area of the optical device;
the compensation device is suitable for compensating the corresponding area of the optical device according to the compensation control signal.
Optionally, the compensation control device includes a compensation amount calculation unit and a compensation control unit, wherein:
the compensation amount calculating unit is adapted to obtain zernike constant term aberration existing in the optical device corresponding area according to actual aberration in the area with aberration, and convert the obtained zernike constant term aberration into deformation compensation amount of the optical device corresponding area;
the compensation control unit is suitable for determining the corresponding deformation compensation amount of the corresponding area of the optical device and the mapping relation between the pre-stored deformation compensation amount and the compensation voltage.
Optionally, the compensation device is adapted to apply a force to the corresponding region of the optical device according to the compensation voltage signal, so as to drive the optical device to move, and compensate the corresponding region of the optical device.
Optionally, the optical device deformation compensation system further comprises:
the displacement detection device is suitable for detecting the displacement of the corresponding area of the optical device and outputting the displacement to the compensation control device;
the compensation control device is further adapted to stop outputting the compensation voltage signal to the compensation device at the corresponding position when it is determined that the displacement amount of the optical device is equal to the deformation compensation amount of the corresponding region of the optical device.
Optionally, the compensation device comprises a piezoceramic actuator, and the displacement detection device comprises a displacement sensor;
and a plurality of piezoelectric ceramic drivers and a plurality of displacement sensors are respectively arranged on two opposite sides of the optical device in the direction vertical to the surface of the wafer, and the positions of the piezoelectric ceramic drivers and the displacement sensors are in one-to-one correspondence.
The embodiment of the specification also provides a lithography machine, including:
an optical device adapted to transfer the pattern on the reticle onto the wafer;
the optical device deformation compensation system of any of the preceding embodiments adapted to compensate for deformation of the optical device.
Optionally, the optical device is a lens.
According to the deformation compensation scheme of the optical device provided by the embodiment of the specification, according to the difference between the actually formed pattern on the surface of the wafer and the preset pattern, the region with the aberration in the actually formed pattern can be determined, and the region with the aberration in the pattern can reflect the deformation of the corresponding region of the optical device, so that the deformation compensation quantity of the corresponding region of the optical device can be obtained according to the actual aberration in the region with the aberration, and further, based on the deformation compensation quantity of the corresponding region of the optical device, a corresponding compensation control signal can be generated to control the corresponding compensation device to compensate the corresponding region with the deformation of the optical device, and therefore, the local deformation of the optical device can be accurately compensated, and the imaging quality of the optical device is improved.
Further, according to the actual aberration in the area with the aberration, the zernike constant term aberration existing in the area corresponding to the optical device can be obtained, and the difficulty in calculating the deformation compensation amount of the optical device can be reduced and the calculation efficiency can be improved by converting the zernike constant term aberration into the deformation compensation amount of the area corresponding to the optical device.
Further, according to the deformation compensation amount of the corresponding area of the optical device and the mapping relation between the deformation compensation amount and the compensation voltage stored in advance, the compensation voltage of the compensation device at the corresponding position can be determined, and then a corresponding compensation voltage signal is generated, so that the compensation device at the corresponding position can accurately compensate the area where the optical device is deformed according to the compensation voltage signal.
Further, by detecting the displacement amount of the optical device corresponding region, when it is determined that the displacement amount of the optical device is equal to the deformation amount of the optical device corresponding region, the output of the compensation control signal to the compensation device at the corresponding position can be stopped, and overcompensation of the optical device deformation region by the compensation device can be avoided, so that the compensation accuracy can be further improved.
Further, the compensation device comprises a piezoelectric ceramic driver, the displacement detection device comprises a displacement sensor, a plurality of piezoelectric ceramic drivers and a plurality of displacement sensors are respectively arranged on two opposite sides of the optical device in the direction perpendicular to the surface of the wafer, the piezoelectric ceramic drivers are in one-to-one correspondence with the positions of the displacement sensors, when the area where aberration exists in the actually formed graph is determined, deformation of the area corresponding to the optical device can be compensated through the piezoelectric ceramic drivers, and displacement of the area corresponding to the optical device is detected by the displacement sensors corresponding to the piezoelectric ceramic drivers, so that compensation precision can be improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the description of the embodiments of the present invention and the prior art will be briefly described below, it being obvious that the drawings described below are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 shows an imaging schematic of an optical device;
FIG. 2 shows a schematic diagram of an optical device deformation compensation system;
FIG. 3 is a flow chart illustrating a method of optical device deformation compensation in an embodiment of the present disclosure;
FIG. 4 is a flowchart of compensating the corresponding area of the optical device in a specific application scenario in the embodiment of the present disclosure;
FIG. 5 is a schematic diagram showing the structure of an optical device deformation compensation system according to the embodiment of the present disclosure;
FIG. 6 is a schematic diagram of an optical device deformation compensation system according to one embodiment of the present disclosure;
FIG. 7 is a schematic diagram of a lithographic apparatus according to an embodiment of the present disclosure.
Detailed Description
In order to better understand the aberration problems associated with imaging in the prior art, a brief description of imaging with an optical device is provided below.
Referring to an imaging schematic diagram of an optical device shown in fig. 1, a light L emitted from a light source of a lithography machine (not shown) passes through a mask 11 to reach an optical device 12, and is refracted by the optical device 12 1 Reach the surface of the wafer 13 and converge to the center O of the wafer 13 1 Thereby transferring the pattern on the reticle 11 to the wafer 13 so that the actually formed pattern is identical to the preset pattern (i.e., the pattern on the reticle 11).
With continued reference to FIG. 1, if the optical device 12 is deformed, e.g., refracted by the optical device 12, a light ray L may be formed 2 And converges to a point O on the surface of the wafer 13 2 Wherein, the convergence point O 2 Offset from the center O of the wafer 13 1 The actual pattern is different from the preset pattern (i.e., the pattern on the mask 11), i.e., the aberration d is generated.
In order to reduce the influence of deformation of the optical device on imaging, as described in the background art, it is common to control the displacement offset of the optical device by using a piezoelectric sensor, and detect the displacement offset of the optical device by using the displacement sensor to compensate the deformation of the optical device.
However, in the application process, the deformation of the optical device is compensated by adopting the piezoelectric sheet and the displacement sensor, and only the whole optical device can be uniformly compensated, so that the compensation precision is low.
Referring to the schematic structural diagram of an optical device deformation compensation system shown in fig. 2, as shown in fig. 2, an optical device 2A is respectively connected with a moving shaft 23 and a scale 25 through a connecting shaft 24, wherein the moving shaft 23 can move up and down and drive the connecting shaft 24 to move, and then the whole optical device 2A and the scale 25 can move up and down along with the moving shaft 23, at this time, a displacement sensor 26 can detect and obtain the moving distance of the optical device 2A by detecting the change of the scale value on the scale 25, and then a plurality of piezoelectric sheets 22 arranged on the driver 21 can drive the moving shaft 23 to move up and down by providing different voltages for the driver 21 according to the detected moving distance of the optical device 2A in a clamping/unclamping manner, so as to perform deformation compensation on the optical device. Wherein the piezoelectric sheet 22 can clamp the moving axis when the voltage applied to the driver 21 is from small to large; when the voltage applied to the driver 21 is from large to small, the piezoelectric sheet 22 can unclamp the movement axis.
However, with the above-described device, when the movement axis 23 moves up and down, since the entire optical device 2A moves along the movement axis 23, if the optical device 2A is deformed, the entire optical device 2A can be uniformly compensated, and the compensation accuracy is low.
In order to solve the above-mentioned technical problems, the embodiments of the present disclosure provide an optical device deformation compensation method, according to the difference between an actually formed pattern and a preset pattern on a wafer surface, an area with an aberration in the actually formed pattern can be determined, and since the area with an aberration of the pattern can reflect the deformation of a corresponding area of an optical device, according to the actual aberration in the area with an aberration, the deformation compensation amount of the corresponding area of the optical device can be obtained, and further based on the deformation compensation amount of the corresponding area of the optical device, a corresponding compensation control signal can be generated to control the corresponding compensation device to compensate the corresponding area with the deformation of the optical device, so that the local deformation of the optical device can be accurately compensated, thereby improving the imaging quality of the optical device.
In order to make the technical conception, technical principle, advantages and the like included in the embodiments of the present disclosure more clearly understood, the following detailed description will be made with reference to the accompanying drawings by way of specific embodiments and specific application scenarios and the like.
Referring to fig. 3, which is a flowchart of a method for compensating deformation of an optical device in an embodiment of the present disclosure, the optical device is used to transfer a pattern on a mask onto a wafer, and specifically, the deformation of the optical device may be compensated according to the following steps:
s31, determining the area with aberration in the actually formed pattern according to the difference between the actually formed pattern on the surface of the wafer and the preset pattern.
Specifically, when the optical device is used to transfer the pattern on the mask onto the wafer, the optical device may deform, so that the actually formed pattern on the surface of the wafer may be different from the preset pattern (for example, the pattern on the mask), and according to the photolithography principle, the pattern on the mask and the pattern transferred onto the wafer should have consistency, so that according to the generated difference, the area where the aberration exists in the actually formed pattern can be determined.
S32, obtaining the deformation compensation quantity of the corresponding area of the optical device according to the actual aberration in the area with the aberration.
Specifically, since the region in which the image has aberration can reflect the deformation of the region corresponding to the optical device, the deformation compensation amount of the region corresponding to the optical device can be obtained from the actual aberration in the region in which the aberration has occurred.
S23, generating corresponding compensation control signals according to the deformation compensation quantity of the corresponding area of the optical device, and controlling the corresponding compensation device to compensate the corresponding area of the optical device.
Specifically, through steps S21 and S22, the deformation and the corresponding deformation compensation amount of the area of the optical device can be determined according to the actual aberration in the area having the aberration, and a corresponding compensation control signal can be generated according to the deformed area of the optical device and the deformation compensation amount corresponding to the area, so as to control the corresponding compensation device to compensate the corresponding area (deformed area) of the optical device.
In some embodiments of the present disclosure, deformation of the optic may be purposefully compensated in a plurality of different directions, depending on the actual aberrations in the region where the aberrations are present.
According to the compensation control process, the deformation of the corresponding area of the optical device can be reflected by the area with the aberration of the graph, so that the deformation compensation quantity of the corresponding area of the optical device can be obtained according to the actual aberration of the area with the aberration, and further, based on the deformation compensation quantity of the corresponding area of the optical device, a corresponding compensation control signal can be generated, and the corresponding compensation device is controlled to compensate the corresponding area with the deformation of the optical device, so that the local deformation of the optical device can be accurately compensated, and the imaging quality of the optical device is improved.
In order for those skilled in the art to better understand and practice the optical device deformation compensation methods of the embodiments of the present disclosure, the following detailed description is provided by way of specific examples with reference to the accompanying drawings.
In a specific implementation, when it is determined that the pattern actually formed on the surface of the wafer is different from the preset pattern, the difference is caused by deformation of the optical device, so that the actual aberration in the area with the aberration can be converted into the deformation compensation amount of the corresponding area of the optical device, and the deformation of the optical device is compensated, so that the imaging aberration on the surface of the wafer is reduced, and the photoetching quality can be improved.
In a specific implementation, the deformation compensation amount of the corresponding region of the optical device can be obtained in various manners. As a specific example, the actual aberration in the area with aberration may be zernike expanded to obtain a corresponding zernike polynomial, and the deformation compensation amount of the area corresponding to the optical device may be obtained according to the zernike constant term aberration corresponding to each order in the zernike polynomial.
Specifically, the zernike constant term aberration existing in the optical device corresponding region may be obtained according to the actual aberration in the aberration-existing region, and the obtained zernike constant term aberration may be converted into the deformation compensation amount of the optical device corresponding region.
By converting the Zernike constant term aberration into the deformation compensation quantity of the corresponding area of the optical device, the difficulty of calculating the deformation compensation quantity of the optical device can be reduced, and the calculation efficiency is improved.
The deformation compensation quantity of the corresponding region of the optical device can be obtained based on the Zernike constant term aberration, and the corresponding compensation device can be controlled to compensate the corresponding region of the optical device according to the deformation compensation quantity of the corresponding region.
Referring to the flowchart for compensating the corresponding area of the optical device in a specific application scenario in the embodiment of the present disclosure shown in fig. 4, in the embodiment of the present disclosure, the compensation of the corresponding area of the optical device may specifically be performed according to the following steps:
s41, determining the compensation voltage of the compensation device at the corresponding position according to the deformation compensation quantity of the corresponding area of the optical device and the mapping relation between the deformation compensation quantity and the compensation voltage stored in advance, and generating a compensation voltage signal.
S42, outputting the compensation voltage signal to a compensation device at a corresponding position to compensate the corresponding region of the optical device.
Specifically, since the compensation voltage signal is obtained according to the deformation compensation amount of the deformation area of the optical device and the mapping relation between the deformation compensation amount and the compensation voltage stored in advance, when the compensation voltage signal is output to the compensation device, the compensation device accurately compensates the deformation area of the optical device according to the compensation voltage signal.
As described above, the optical device may be deformed due to the irradiation of the high-power laser light, which may cause deviation of the image formed on the wafer surface. Based on the method, the shape of the optical device can be corrected, namely, which area of the optical device is deformed, the area is corrected in a targeted way, so that the optical device can be restored to the original state, the corresponding compensation effect is achieved, the imaging aberration is reduced, and the photoetching precision is improved.
For step S42, in a specific implementation, according to the compensation voltage signal, the compensation device may apply a force to a corresponding area (a deformed area) of the optical device, so as to drive the optical device to move, so as to compensate the corresponding area of the optical device. Therefore, by applying force to the deformed area of the optical device, the deformed area of the optical device can be driven to move, so that the shape of the optical device is locally and accurately corrected, and a corresponding compensation effect is achieved.
In a specific application, when the photoetching process is carried out, the wafer is positioned at the bottommost part, and the optical device and the mask plate are sequentially arranged in the vertical direction, the inventor finds that when the pattern on the mask plate is transferred onto the wafer by using the optical device, the imaging quality is better when the center of the mask plate, the center of the optical device and the center of the wafer are positioned at the same horizontal line. Therefore, in some embodiments of the present disclosure, when it is determined that the corresponding area of the optical device is deformed, according to the compensation voltage signal, the compensation device may apply a force to the corresponding area of the optical device in a direction perpendicular to the surface of the wafer, so as to drive the deformed area of the optical device to move, compensate the deformation amount of the corresponding area of the optical device, and the obtained actual focal plane is closer to the spherical focal plane under an ideal state, so that the center of the mask, the center of the optical device, and the center of the wafer are located on the same horizontal line.
In some other embodiments of the present disclosure, the amount of deformation of the corresponding region of the optical device may also be compensated by applying a force to the corresponding region in a direction parallel to the wafer surface.
In summary, according to the calculated deformation compensation amount of the corresponding region of the optical device and the mapping relationship between the deformation compensation amount and the compensation voltage stored in advance, the compensation voltage signal of the compensation device output to the corresponding position can be determined, and the compensation device can compensate according to the compensation voltage signal corresponding region of the optical device, so that the influence of the deformation of the optical device on imaging can be reduced.
As described above, the compensation device can drive the optical device to move according to the compensation voltage signal, and when the movement distance of the optical device is equal to the deformation compensation amount of the corresponding area of the optical device, it indicates that the compensation of the corresponding area of the optical device is completed.
In a specific implementation, due to the inertia effect in the motion process of the compensation device, overcompensation may occur, so as to avoid overcompensation of the deformation area of the optical device, further improve compensation accuracy.
The embodiments of the present disclosure also provide a deformation compensation system corresponding to the deformation compensation method of an optical device, and the detailed description will be made below by way of specific examples with reference to the accompanying drawings.
Referring to fig. 5, a schematic structural diagram of an optical device deformation compensation system according to an embodiment of the present disclosure is shown, where an optical device is used to transfer a pattern on a reticle onto a wafer.
In some embodiments of the present description, the optics deformation compensation system 50 comprises an aberration acquisition device 51, a compensation control device 52, and a compensation device 53, wherein:
the aberration obtaining device 51 is adapted to determine an area in which an aberration exists in the actually formed pattern according to a difference between the actually formed pattern on the wafer surface and a preset pattern;
the compensation control device 52 is adapted to obtain a deformation compensation amount of the corresponding region of the optical device according to the actual aberration in the region with aberration; generating corresponding compensation control signals according to the deformation compensation quantity of the corresponding area of the optical device;
the compensation device 53 is adapted to compensate the corresponding area of the optical device according to the compensation control signal.
The principle of operation of the optical device deformation compensation system 50 is briefly described below in conjunction with fig. 5:
the aberration obtaining device 51 may determine, according to a difference between an actually formed pattern on the wafer surface and a preset pattern, a region in which an aberration exists in the actually formed pattern, and the compensation control device 52 calculates, according to an actual aberration in the region in which the aberration exists, a deformation compensation amount of a region corresponding to the optical device, and generates, according to the calculated deformation compensation amount of the region corresponding to the optical device, a corresponding compensation control signal and outputs the compensation control signal to the compensation device 53, where the compensation device 53 may compensate the region corresponding to the optical device under the control of the compensation control signal.
With the above-mentioned optical device deformation compensation system 50, since the aberration-existing region of the pattern determined by the aberration obtaining device 51 can reflect the deformation of the corresponding region of the optical device, the compensation control device 52 can obtain the deformation compensation amount of the corresponding region of the optical device according to the actual aberration in the aberration-existing region, and further generate a corresponding compensation control signal based on the deformation compensation amount of the corresponding region of the optical device and output the corresponding compensation control signal to the compensation device 53, and control the corresponding compensation device 53 to compensate the corresponding region of the optical device where the deformation exists, so that the local deformation of the optical device can be accurately compensated, thereby improving the imaging quality of the optical device.
In a specific implementation, when the aberration obtaining device determines that the pattern actually formed on the surface of the wafer has a difference from the preset pattern, the compensation control device can convert the actual aberration in the area with the aberration into the deformation compensation amount of the area corresponding to the optical device, and can reduce the imaging aberration on the surface of the wafer by compensating the area where the optical device is deformed, so that the photoetching precision can be improved.
In some examples of the present specification, the aberration obtaining apparatus may include a complementary metal oxide semiconductor (Complementary Metal Oxide Semiconductor, CMOS) image sensor.
In a specific implementation, the deformation compensation amount of the corresponding region of the optical device can be obtained in various manners. As a specific example, the compensation control device may perform zernike expansion on the actual aberration in the area with aberration to obtain a corresponding zernike polynomial, and obtain the deformation compensation amount of the area corresponding to the optical device according to the zernike constant term aberration corresponding to each order in the zernike polynomial
In some embodiments of the present description, with continued reference to fig. 5, the compensation control device 52 may include a compensation amount calculating unit 521 and a compensation control unit 522, where:
the compensation amount calculating unit 521 is adapted to obtain a zernike constant term aberration existing in the optical device corresponding area according to an actual aberration in the area where the aberration exists, and convert the obtained zernike constant term aberration into a deformation compensation amount of the optical device corresponding area;
the compensation control unit 522 is adapted to determine the compensation voltage of the compensation device at the corresponding position according to the deformation compensation amount of the corresponding region of the optical device and the mapping relationship between the deformation compensation amount and the compensation voltage stored in advance, and output the generated compensation voltage signal to the compensation device at the corresponding position.
In a specific implementation, the compensation control device 52 may be implemented by a processing chip such as a central processing unit (Central Processing Unit, CPU), a field programmable gate array (Field Programmable Gate Array, FPGA), or may be implemented by a specific integrated circuit (Application Specific Integrated Circuit, ASIC) or one or more integrated circuits configured to implement embodiments of the present invention.
By adopting the compensation control device, the Zernike constant term aberration existing in the area corresponding to the optical device can be obtained according to the actual aberration in the area with the aberration, and the difficulty in calculating the deformation compensation amount of the optical device can be reduced and the calculation efficiency can be improved by converting the Zernike constant term aberration into the deformation compensation amount of the area corresponding to the optical device.
In a specific implementation, the compensation control unit may generate a corresponding compensation voltage signal according to the deformation compensation amount of the corresponding region, and control the corresponding compensation device to compensate the corresponding region of the optical device.
Since the compensation voltage signal is obtained according to the deformation compensation amount of the deformation region of the optical device, when the compensation voltage signal is output to the compensation device, with continued reference to fig. 5, the compensation device 53 is adapted to apply a force to the corresponding region (deformation region) of the optical device according to the compensation voltage signal, so as to drive the optical device to move, and compensate the corresponding region of the optical device.
Thus, by applying a force to the deformed region of the optical device, the optical device can be driven to move, and the shape of the optical device can be corrected, thereby realizing compensation of the corresponding region of the optical device.
As an alternative example, the compensation means 53 may comprise a piezo-ceramic actuator.
In summary, according to the deformation compensation amount of the corresponding region of the optical device obtained by calculation and the mapping relationship between the deformation compensation amount and the compensation voltage stored in advance, the compensation control device can determine the compensation voltage signal of the compensation device at the corresponding position, and the compensation device can compensate the corresponding region (the deformed region) of the optical device according to the compensation voltage signal, so that the influence of the deformation of the optical device on imaging can be reduced.
As described above, the compensation device can drive the optical device to move according to the compensation voltage signal, and when the movement distance of the optical device is equal to the deformation compensation amount of the corresponding area of the optical device, it is indicated that the compensation of the corresponding area of the optical device is completed.
In an implementation, due to inertial effects during the movement of the compensation device, overcompensation may occur, so as to further improve compensation accuracy in order to avoid overcompensation of the deformation region of the optical device, and in an implementation, with continued reference to fig. 5, the deformation compensation system 50 of the optical device may further include: a displacement detecting device 54 adapted to detect a displacement amount of the optical device corresponding region and output the detected displacement amount to the compensation control device 52; accordingly, the compensation control device 52 is further adapted to stop outputting the compensation voltage signal to the compensation device 53 at the corresponding position to complete the compensation of the deformed region of the optical device when it is determined that the displacement amount of the optical device is equal to the deformation compensation amount of the corresponding region of the optical device.
As an alternative example, the displacement detection means 54 may comprise a displacement sensor. As a specific example, the displacement sensor may specifically be a grating scale displacement sensor.
In a specific application, when the photoetching process is carried out, the wafer is positioned at the bottommost part, the optical device and the mask plate are sequentially arranged in the vertical direction, and the inventor finds that when the pattern on the mask plate is transferred onto the wafer by using the optical device, the imaging quality is better when the center of the mask plate, the center of the optical device and the center of the wafer are positioned at the same horizontal line. Therefore, in some embodiments of the present disclosure, when it is determined that the corresponding area of the optical device is deformed, according to the compensation voltage signal, the compensation device may apply a force to the corresponding area of the optical device in a direction perpendicular to the surface of the wafer, so as to drive the optical device to move, compensate the deformation amount of the corresponding area of the optical device, and the obtained actual focal plane is closer to the spherical focal plane under an ideal state, so that the center of the mask, the center of the optical device, and the center of the wafer are located on the same horizontal line, and accordingly, the displacement detection device may detect the displacement amount of the optical device.
In some embodiments of the present disclosure, to compensate for the deformation of the optical device in the direction perpendicular to the surface of the wafer, a plurality of piezoelectric ceramic drivers and a plurality of displacement sensors may be respectively disposed on two opposite sides of the optical device in the direction perpendicular to the surface of the wafer, where the piezoelectric ceramic drivers and the displacement sensors are in one-to-one correspondence
In order to enable those skilled in the art to better understand and implement the optical device deformation compensation scheme in the embodiments of the present disclosure, a specific application scenario is described below as an example.
Referring to the schematic structural diagram of the optical device deformation compensation system in a specific application scenario in the embodiment of the present disclosure shown in fig. 6, as shown in fig. 6, the optical device deformation compensation system 60 is suitable for compensating the deformed area of the optical device 6A, where the optical device deformation compensation system 60 may include an aberration obtaining device (not shown in fig. 6), a compensation control device (not shown in fig. 6), and a plurality of piezoelectric ceramic drivers 61 and a plurality of displacement sensors 62 respectively disposed on opposite sides of the optical device 6A in a direction perpendicular to the wafer surface, and positions of the plurality of piezoelectric ceramic drivers 61 and the plurality of displacement sensors 62 are in one-to-one correspondence.
In some embodiments of the present disclosure, when the aberration obtaining device determines, according to a difference between an actually formed pattern on the wafer surface and a preset pattern, a region in which an aberration exists in the actually formed pattern, the compensation control device may obtain, according to an actual aberration in the region in which the aberration exists, a zernike constant term aberration existing in the region corresponding to the optical device, and convert the obtained zernike constant term aberration into a deformation compensation amount of the region corresponding to the optical device 6A; according to the deformation compensation amount of the corresponding area of the optical device 6A and the mapping relation between the deformation compensation amount and the compensation voltage stored in advance, a corresponding compensation voltage signal is generated to the piezoelectric ceramic driver 61 at the corresponding position, and under the action of the compensation voltage signal, the piezoelectric ceramic driver 61 can be extended and contracted, wherein when the voltage value of the compensation voltage signal changes in a forward direction (from small to large), the piezoelectric ceramic driver 61 can be extended to drive the optical device 6A to move in the direction indicated by the arrow a; when the voltage value of the compensation voltage signal changes in the opposite direction (from large to small), the piezoceramic actuator 61 may contract, driving the optical device 6A to move in the direction opposite to the arrow a.
When the piezoelectric ceramic actuator 61 drives the optical device 6A to move up and down in the direction indicated by the arrow a, the displacement sensor 62 corresponding to the piezoelectric ceramic actuator 61 can detect the displacement amount of the optical device 6A and output to the compensation control device, and when it is determined that the displacement amount of the optical device 6A is the same as the calculated deformation compensation amount, the compensation control device stops outputting the compensation voltage signal to the piezoelectric ceramic actuator 61 at the corresponding position and stops compensating the deformation of the optical device 6A.
It should be noted that the distribution of the displacement sensor and the piezoceramic actuator on the optical device is merely illustrative. In implementations, the displacement sensor and the piezoceramic actuator may be disposed in a region where the optical device is susceptible to deformation.
Embodiments of the present disclosure also provide a lithographic apparatus, in some embodiments of the present disclosure, as shown in fig. 7, a lithographic apparatus 70 may include: an optics 71 and an optics deformation compensation system 72, wherein:
the optical device 71 is adapted to transfer the pattern on the mask onto the wafer;
the optical device deformation compensation system 72 is adapted to compensate for deformations of the optical device.
The optical device deformation compensation system 72 may adopt the scheme shown in any of the foregoing embodiments, and in particular, reference may be made to the foregoing embodiments, which will not be described herein.
When the optical device 71 is used to transfer the pattern on the mask onto the surface of the wafer, the optical device deformation compensation system 72 can determine the deformation compensation amount of the area corresponding to the optical device 71 according to the difference between the actually formed pattern on the surface of the wafer and the preset pattern, and drive the optical device 71 to move according to the determined deformation compensation amount of the corresponding area, and stop outputting the compensation control signal to the compensation device at the corresponding position when the displacement amount of the optical device is equal to the deformation amount of the area corresponding to the optical device, so as to complete the compensation of the deformation area of the optical device 71.
In some embodiments of the present description, the optical device 71 may be a lens. The use of the lithography machine 70 with the optics distortion compensation system 72 compensates for the distortion produced by the lens, thereby improving the imaging quality of the lithography machine.
Although the embodiments of the present specification are disclosed above, the invention is not limited thereto. Various changes and modifications may be made by one skilled in the art without departing from the spirit and scope of the invention, and the scope of the invention should be assessed accordingly to that of the appended claims.
Claims (13)
1. A method of optical device deformation compensation, wherein an optical device is used to transfer a pattern on a reticle onto a wafer, the method comprising:
determining a region with aberration in the actually formed pattern according to the difference between the actually formed pattern on the surface of the wafer and a preset pattern;
obtaining deformation compensation quantity of the corresponding area of the optical device according to the actual aberration in the area with the aberration;
and generating corresponding compensation control signals according to the deformation compensation quantity of the corresponding area of the optical device, and controlling the corresponding compensation device to compensate the corresponding area of the optical device.
2. The method according to claim 1, wherein the obtaining the deformation compensation amount of the corresponding region of the optical device according to the actual aberration in the region having the aberration includes:
obtaining Zernike constant term aberration existing in the corresponding area of the optical device according to the actual aberration in the area with the aberration;
and converting the obtained Zernike constant term aberration into deformation compensation quantity of the corresponding area of the optical device.
3. The method for compensating for deformation of an optical device according to claim 1, wherein generating a corresponding compensation control signal according to the deformation compensation amount of the corresponding region of the optical device, controlling the corresponding compensation device to compensate the corresponding region of the optical device, comprises:
determining the compensation voltage of the compensation device at the corresponding position according to the deformation compensation quantity of the corresponding area of the optical device and the mapping relation between the deformation compensation quantity and the compensation voltage stored in advance, and generating a compensation voltage signal;
and the compensation device outputs the compensation voltage signal to a corresponding position to compensate the corresponding area of the optical device.
4. A method of compensating for deformation of an optical device according to claim 3, wherein the compensating means for outputting the compensation voltage signal to a corresponding location compensates for a corresponding region of the optical device, comprising:
and according to the compensation voltage signal, the compensation device applies force to the corresponding area of the optical device so as to drive the optical device to move, and compensates the corresponding area of the optical device.
5. The method of claim 4, wherein the compensating means applies a force to a corresponding region of the optical device to drive the optical device to move according to the compensation voltage signal, and compensating the corresponding region of the optical device, comprising:
and according to the compensation voltage signal, the compensation device applies a force to the corresponding area in the direction perpendicular to the surface of the wafer, so as to drive the optical device to move, and the deformation of the corresponding area of the optical device is compensated.
6. The optical device deformation compensation method according to any one of claims 1 to 5, further comprising:
and detecting the displacement of the corresponding area of the optical device, and stopping outputting the compensation control signal to the compensation device at the corresponding position when the displacement of the optical device is equal to the deformation of the corresponding area of the optical device.
7. An optical device deformation compensation system, wherein, optical device is used for transferring the figure on the mask version to the wafer, its characterized in that, deformation compensation system includes aberration acquisition device, compensation controlling means and compensation device, wherein:
the aberration obtaining device is suitable for determining an area with aberration in the actually formed pattern according to the difference between the actually formed pattern on the surface of the wafer and a preset pattern;
the compensation control device is suitable for obtaining the deformation compensation quantity of the corresponding area of the optical device according to the actual aberration in the area with the aberration; generating corresponding compensation control signals according to the deformation compensation quantity of the corresponding area of the optical device;
the compensation device is suitable for compensating the corresponding area of the optical device according to the compensation control signal.
8. The optical device deformation compensation system according to claim 7, wherein the compensation control means includes a compensation amount calculation unit and a compensation control unit, wherein:
the compensation amount calculating unit is adapted to obtain zernike constant term aberration existing in the optical device corresponding area according to actual aberration in the area with aberration, and convert the obtained zernike constant term aberration into deformation compensation amount of the optical device corresponding area;
the compensation control unit is suitable for determining the compensation voltage of the compensation device at the corresponding position according to the deformation compensation quantity of the corresponding region of the optical device and the mapping relation between the pre-stored deformation compensation quantity and the compensation voltage, and outputting the generated compensation voltage signal to the compensation device at the corresponding position.
9. An optical device deformation compensation system according to claim 8, wherein the compensation means is adapted to apply a force to a corresponding region of the optical device in response to the compensation voltage signal to drive the optical device to move to compensate the corresponding region of the optical device.
10. The optical device deformation compensation system of claim 9, further comprising:
the displacement detection device is suitable for detecting the displacement of the corresponding area of the optical device and outputting the displacement to the compensation control device;
the compensation control device is further adapted to stop outputting the compensation voltage signal to the compensation device at the corresponding position when it is determined that the displacement amount of the optical device is equal to the deformation compensation amount of the corresponding region of the optical device.
11. The optical device deformation compensation system of claim 10, wherein the compensation means comprises a piezoceramic actuator and the displacement detection means comprises a displacement sensor;
and a plurality of piezoelectric ceramic drivers and a plurality of displacement sensors are respectively arranged on two opposite sides of the optical device in the direction vertical to the surface of the wafer, and the positions of the piezoelectric ceramic drivers and the displacement sensors are in one-to-one correspondence.
12. A lithographic apparatus, comprising:
an optical device adapted to transfer the pattern on the reticle onto the wafer;
the optical device deformation compensation system of any one of claims 7-11 adapted to compensate for deformation of the optical device.
13. The lithographic apparatus of claim 12, wherein the optical device is a lens.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210461971.0A CN117008421A (en) | 2022-04-28 | 2022-04-28 | Optical device deformation compensation method and system and photoetching machine |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210461971.0A CN117008421A (en) | 2022-04-28 | 2022-04-28 | Optical device deformation compensation method and system and photoetching machine |
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| CN117008421A true CN117008421A (en) | 2023-11-07 |
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| CN202210461971.0A Pending CN117008421A (en) | 2022-04-28 | 2022-04-28 | Optical device deformation compensation method and system and photoetching machine |
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| CN (1) | CN117008421A (en) |
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