CN116847527A - Technology for generating high-energy particles by high-speed electric pulse - Google Patents
Technology for generating high-energy particles by high-speed electric pulse Download PDFInfo
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- CN116847527A CN116847527A CN202310942003.6A CN202310942003A CN116847527A CN 116847527 A CN116847527 A CN 116847527A CN 202310942003 A CN202310942003 A CN 202310942003A CN 116847527 A CN116847527 A CN 116847527A
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- 239000002245 particle Substances 0.000 title claims abstract description 35
- 238000005516 engineering process Methods 0.000 title claims description 9
- 238000000034 method Methods 0.000 claims abstract description 20
- 150000002500 ions Chemical class 0.000 claims abstract description 7
- 239000012298 atmosphere Substances 0.000 claims abstract description 6
- 230000001133 acceleration Effects 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 9
- 229910052702 rhenium Inorganic materials 0.000 claims description 8
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 4
- 230000005284 excitation Effects 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 2
- 229910021645 metal ion Inorganic materials 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 1
- 230000015556 catabolic process Effects 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 14
- 239000011733 molybdenum Substances 0.000 description 14
- -1 molybdenum ions Chemical class 0.000 description 13
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000007774 positive electrode material Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009296 electrodeionization Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007773 negative electrode material Substances 0.000 description 1
- 230000005433 particle physics related processes and functions Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000002186 photoelectron spectrum Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H5/00—Direct voltage accelerators; Accelerators using single pulses
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a method for generating high-energy particle flow by using high-speed high-voltage pulse. The peak voltage of pulse discharge is over ten thousand volts, the pulse speed is nanosecond to picosecond, and the pulse duty ratio is less than 1/10. The technical advantage of the method of the invention is that a high energy particle beam of the order of MeV can be generated with a simple structure, the kinetic energy of which is controllable from keV to MeV. Meanwhile, the electrode can be replaced and the atmosphere can generate various particle flows such as electrons, metal heavy ions, protons and the like.
Description
Technical Field
The invention relates to the technical field of particle physics, in particular to a realization method for generating stable high-energy ion beam current.
Background
Conventional particle accelerators emit electrons through a hot cathode and then apply a DC or RF accelerating electric field to accelerate the particles to KeV to GeV orders. However, due to the insufficient acceleration gradient of the existing DC or RF synchronous acceleration field, very long acceleration pipes are required to obtain very high particle energies. This greatly increases the cost and space occupation of the accelerator, limiting the industrial applicability of the accelerator. There is a need to develop desktop-level particle sources using new technological routes.
The laser plasma wake acceleration is a novel cross research direction which rapidly grows up along with the development of ultra-short ultra-strong laser pulse technology, plasma physics and accelerator physics and technology in the last forty years, is a novel mechanism for accelerating charged particles by exciting a large plasma wake in gas plasma by ultra-strong laser, and has an acceleration gradient which can be improved by 1000 times compared with the existing conventional radio frequency cavity accelerator to reach GV/cm, lays a foundation for constructing a desktop ultra-compact accelerator and a radiation source, and also provides possibility for constructing a free electron laser device based on plasma and an ultra-high energy positive and negative electron collision machine in the future. Since the concept of the accelerator was proposed by Tajima and Dawson in 1979, laser plasma wake acceleration has been developed from the breakthrough of acceleration principle, the improvement of acceleration quality and the improvement of acceleration energy through several generations of efforts to the continuous expansion of applications to various fields of basic science, medical treatment, industry and the like. Thereby the ion source can be applied to the desktop ion source and the light source of scientific research instrument.
However, the laser tail field acceleration requires an expensive clapping laser, and the laser is not easy to maintain, is huge in size and is not beneficial to industrial production. Therefore, a new technical route capable of replacing strong laser as a plasma excitation source is sought, and the tail field acceleration technology can be pushed to the industrial practical fields of ion implantation, X-ray flaw detection and the like.
The information disclosed in this background section is only for enhancement of understanding of the general background of the invention and should not be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person of ordinary skill in the art.
Disclosure of Invention
The invention aims to provide a method for generating high-energy particle beam by using electric pulse to replace laser and exciting a plasma tail wave field, which can solve the technical problems of high cost and huge volume of a laser in the prior art.
To achieve the above object, embodiments of the present invention provide a method of generating a beam of molybdenum ions with MeV energy and bombarding into TiSe 2 In the method for the inside of the crystal, molybdenum is used as a positive electrode, rhenium is used as a negative plate material under the pulse discharge condition, and a narrow pulse width high voltage is applied between the positive electrode and the negative electrode. At the moment, the electrode tip discharges to excite Mo to generate plasma beam and the plasma beam is accelerated to about 1MeV kinetic energy by a tail field, tiSe 2 Is fixed on a negative plate to receive Mo ion irradiation。
Wherein, the peak voltage of pulse discharge is one million volts, the frequency is 1000HZ, and the pulse width is 100 ps.
In one or more embodiments of the present invention, during the pulse discharge, further comprising: the vacuum cavity is cleaned by inert gas, and is vacuumized to 10Pa, and the partial pressure of the inert gas is maintained to be about 10Pa in the discharging process of 1 hour.
In one or more embodiments of the invention, the particle beam is focused using an array of metal grid plates connected in parallel with a high voltage power supply.
In one or more embodiments of the present invention, a metal ion source is used as the positive electrode, rhenium is used as the negative electrode, the positive electrode is connected to the high voltage of the pulse power supply, and the negative electrode is grounded.
In one or more embodiments of the present invention, the distance between the positive electrode and the negative electrode is 100 to 200mm.
In one or more embodiments of the invention, the negative electrode material is rhenium, tantalum, or graphite.
Compared with the prior art, the method has the technical advantages that the electric pulse is used as a tail field excitation source, integrated circuit formation and programming can be performed, the controllability is better, and the construction and use cost is reduced to one percent.
Compared with the traditional linear accelerator and the synchrotron, the technology adopts a new particle acceleration principle, and can generate extremely high acceleration gradient at a centimeter-level distance, so that the volume and the energy consumption of equipment are greatly reduced.
Compared with the strong laser tail field accelerating technology in the laboratory stage, the technology has high integration level, easy commercialization, capability of generating various particle sources and simple operation and maintenance. Is suitable for the fields of ion implantation, medical ion irradiation, desktop particle accelerators and the like.
Drawings
FIG. 1 is a schematic diagram of a molybdenum electrode ionization and acceleration apparatus according to an embodiment of the present invention, wherein 1 is a high voltage pulse power supply, 2 is a megaohm adjustable potentiometer, 3 is a positive electrode, 4 is a grid focusing array, 5 is a vacuum chamber, and 6 is an electrode negative electrode;
FIG. 2 is a representation of the elemental representation of a high energy molybdenum ion penetrating material 1200nm thick in accordance with an embodiment of the invention;
Detailed Description
The following detailed description of embodiments of the invention is, therefore, to be taken in conjunction with the accompanying drawings, and it is to be understood that the scope of the invention is not limited to the specific embodiments.
Throughout the specification and claims, unless explicitly stated otherwise, the term "comprise" or variations thereof such as "comprises" or "comprising", etc. will be understood to include the stated element or component without excluding other elements or components.
As shown in fig. 1 and 2, a method of generating a MeV ion beam according to a preferred embodiment of the present invention includes the following steps.
Step s1, referring to fig. 1, a particle beam accelerating device is provided, which comprises an anode, a cathode, a vacuum cavity, a megaohm potentiometer, a pulse high-voltage power supply and a particle beam focusing system, wherein the anode of the pulse high-voltage power supply is connected with a metal electrode needle, and the cathode of the pulse high-voltage power supply is grounded.
Wherein, rhenium is used as a negative plate, a particle energy analysis probe is fixed on the negative electrode, and the negative electrode is grounded. The interval between the anode and the cathode is 150mm.
In one embodiment, the positive electrode material is a molybdenum needle.
In the ion irradiation process, the atmosphere is inert gas atmosphere, and the partial pressure is maintained at 1-10Pa.
Step s2, setting pulse discharge conditions, adjusting and opening a pulse high-voltage power supply, releasing electric pulses, chopping by a plasma switching tube, and compressing pulse width. The peak voltage of the pulse discharge is 100 kilovolts, the pulse width is 100ps, and the pulse frequency is 100HZ. The positive electrode material is plasmized and accelerated under the action of the tail flow field to bombard the negative plate.
And step s3, using a particle energy analyzer to read particle energy, and adjusting the electrode gap between the potentiometer and the plasma switch tube according to actual requirements to change pulse width, thereby finally obtaining a specific particle beam.
Example 1
Molybdenum ions generating 1MeV energy and bombarding into TiSe 2 In the crystal.
Firstly, molybdenum needle is used as positive electrode material, rhenium is used as negative plate, and sheet-shaped TiSe 2 The two-dimensional material is fixed on the cathode, and the cathode is grounded. The interval between the anode and the cathode is 150mm.
The vacuum chamber was purged with nitrogen and evacuated three times to maintain the pressure of the nitrogen atmosphere at 10Pa.
Setting pulse discharge conditions, starting a high-voltage power supply to generate molybdenum ions, adjusting the energy of the molybdenum ions to 1MeV, and irradiating the negative electrode for one hour. Wherein, the peak voltage of pulse discharge is 100 kilovolts, the pulse width is 100ps, the pulse frequency is 100HZ, and the discharge time is 1 hour.
After the irradiation is finished, take down the TiSe 2 And (3) placing the two-dimensional material into an photoelectron spectrometer, and etching the thickness of 1200nm on the surface of the material by using an argon ion gun. And then the content of molybdenum ions is represented by X-rays. The penetration depth of the molybdenum ions with the energy of 1MeV obtained by conversion according to the formula is in the order of 1 mu m. As can be seen in the photoelectron spectrum of FIG. 2, after stripping the 1.2 μm surface layer, tiSe 2 The strong molybdenum 3d peak still exists, and the content of molybdenum is estimated to be 8%. This demonstrates that the kinetic energy of the molybdenum ions is indeed of the order of MeV.
Example 2
Resulting in 100KeV nitrogen ions.
The discharge device and the adjustment procedure were the same as in example 1, in which the positive electrode was replaced with a rhenium plate, the negative electrode was replaced with a rhenium needle, and the particle energy analysis probe was mounted on the positive electrode plate. The interval between the positive electrode and the negative electrode is 10mm, the peak voltage of pulse discharge is 10 kilovolts, the pulse width is 1ns, and the pulse frequency is 1000HZ. The partial pressure of the nitrogen atmosphere was maintained at 100pa. The power supply is turned on, the electric pulse ionizes the nitrogen gas, the nitrogen ions are accelerated from the negative electrode, and the nitrogen ions are incident on the positive electrode plate. The nitrogen ion energy was calibrated to 100keV by adjusting the potentiometer.
The foregoing descriptions of specific exemplary embodiments of the present invention are presented for purposes of illustration and description. It is not intended to limit the invention to the precise form disclosed, and obviously many modifications and variations are possible in light of the above teaching. The exemplary embodiments were chosen and described in order to explain the specific principles of the invention and its practical application to thereby enable one skilled in the art to make and utilize the invention in various exemplary embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims and their equivalents.
Claims (9)
1. A technology for generating high-energy particles by high-speed electric pulse features that under the condition of high-speed high-voltage electric pulse breakdown gas discharge, the charged particles are accelerated to keV-MeV energy by the accelerating effect of plasma tail flow field.
Wherein, the peak voltage of pulse discharge is more than ten thousand volts, the pulse width is between 1ns and 10ps, and the pulse frequency is between 10 and 1000Hz.
2. The technique for high-speed electric pulse emission of energetic particles according to claim 1, wherein the wake acceleration field is generated by high-speed high-voltage electric pulse bombardment of the plasmoid, further comprising:
the plasma may be generated by a spark discharge excitation gas of a single electrical pulse and the plasma is bombarded by a next pulse spaced on the order of nanoseconds to picoseconds to generate a wake field. The particles are accelerated by the wake field.
3. The technique for emitting high-energy particles by high-speed electric pulse according to claim 1, wherein the high-speed electric pulse has a narrow pulse width and an adjustable duty cycle, and further comprising:
chopping is carried out by a plasma switch tube with adjustable electrode gap, so that compression and adjustment of pulse width are realized.
4. The technique for emitting energetic particles by high-speed electric pulse according to claim 1, wherein the voltage regulation of the electric pulse further comprises:
the initial output voltage of the high-voltage power supply is fixed, and the voltage is reduced by a megaohm-level potentiometer, so that the final output voltage is regulated within the range of 1-100 kilovolts.
5. The technique for high-speed electric pulse emission of energetic particles according to claim 4, wherein the energy of the particles is adjusted in the order of KeV-MeV by adjusting the potentiometer to change the pulse discharge voltage.
6. The technique for emitting high-energy particles by high-speed electric pulse according to claim 1, wherein various types of particles can be directly emitted without heating by changing the electrode target and atmosphere. For example, when emitting gas ions, a rhenium metal material is required as a positive electrode and a negative electrode, and the gas is used as a discharge atmosphere. When specific metal ions are emitted, the metal materials are used as the positive electrode, inert gas is used as the atmosphere, and the processes of atom ionization and emission are directly completed through spark discharge.
7. The technique for emitting high-energy particles by high-speed electric pulse according to claim 5, wherein the distance between the positive electrode and the negative electrode is 10 to 200mm.
8. A technique for high-speed electric pulse emission of energetic particles according to claim 1, wherein the generation of the high-voltage pulse discharge requires assistance of atmospheric conditions such as rare gas, nitrogen, hydrogen, mercury vapor, etc.
9. The technique for emitting high-energy particles by high-speed electric pulse according to claim 8, wherein the atmospheric pressure of the vacuum chamber is maintained in the range of 0 to 1000Pa during discharge.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310942003.6A CN116847527A (en) | 2023-07-29 | 2023-07-29 | Technology for generating high-energy particles by high-speed electric pulse |
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| CN202310942003.6A CN116847527A (en) | 2023-07-29 | 2023-07-29 | Technology for generating high-energy particles by high-speed electric pulse |
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| CN116847527A true CN116847527A (en) | 2023-10-03 |
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| CN202310942003.6A Withdrawn CN116847527A (en) | 2023-07-29 | 2023-07-29 | Technology for generating high-energy particles by high-speed electric pulse |
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| CN (1) | CN116847527A (en) |
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2023
- 2023-07-29 CN CN202310942003.6A patent/CN116847527A/en not_active Withdrawn
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Application publication date: 20231003 |