CN116367406A - Bunching electrode device and implementation method - Google Patents
Bunching electrode device and implementation method Download PDFInfo
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- CN116367406A CN116367406A CN202310202255.5A CN202310202255A CN116367406A CN 116367406 A CN116367406 A CN 116367406A CN 202310202255 A CN202310202255 A CN 202310202255A CN 116367406 A CN116367406 A CN 116367406A
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- electrode
- beam focusing
- buncher
- signal
- bunching
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/001—Arrangements for beam delivery or irradiation
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/02—Circuits or systems for supplying or feeding radio-frequency energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/001—Arrangements for beam delivery or irradiation
- H05H2007/007—Arrangements for beam delivery or irradiation for focusing the beam to irradiation target
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02D—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN INFORMATION AND COMMUNICATION TECHNOLOGIES [ICT], I.E. INFORMATION AND COMMUNICATION TECHNOLOGIES AIMING AT THE REDUCTION OF THEIR OWN ENERGY USE
- Y02D30/00—Reducing energy consumption in communication networks
- Y02D30/70—Reducing energy consumption in communication networks in wireless communication networks
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Particle Accelerators (AREA)
Abstract
The invention discloses a beam focusing electrode device and an implementation method, and aims to provide the beam focusing electrode device capable of effectively focusing beam current.
Description
Technical Field
The invention relates to the field of particle accelerator equipment, in particular to a beam focusing electrode device and an implementation method.
Background
The particle accelerator (particle accelerator) is named as a charged particle accelerator, and is a special electromagnetic and high-vacuum device which enables charged particles to be accelerated by magnetic field force and electric field force in a high-vacuum field to reach high energy. Is equipment for artificially providing various high-energy particle beams.
Particle accelerators are not only widely used in basic science and application science research. Meanwhile, the method has a non-negligible effect in the industrial field. Particle accelerators commonly used in daily life are used in televisions, such as cathode ray tubes and X-ray tubes. Some low energy accelerators are used in nuclear science and nuclear engineering, the remainder are widely used in basic research from chemistry, physics and biology. Up to various fields of national economy such as radiochemistry, radiography, activation analysis, ion implantation, radiation therapy, isotope production, sterilization, welding and smelting, radiation treatment of seeds and foods, national defense, etc.
After the first artificial conversion of elements was achieved by bombarding nitrogen atoms with alpha rays emitted from naturally radioactive elements in E rutherford 1919, physicists realized that the nuclei had to be studied in synchronization with the particles to be recognized. The subsequent use of particle accelerators to find the vast majority of new transuranics and to synthesize thousands of new artificial radionuclides has led to the development of high energy accelerators that have found hundreds of particles including heavy, meson, light and various resonance state particles.
Currently, chinese patent publication No. CN217562513U discloses a charged particle beam manipulation device for a plurality of charged particle beamlets, which has a lens with a main optical axis, the lens comprising at least a first multipole array, each multipole of the first multipole array being configured to compensate for a lens deflection force for a respective charged particle beamlet of the plurality of charged particle beamlets, the lens deflection force being a deflection force generated by the lens for the respective charged particle beamlet towards the lens main optical axis.
Such charged particle beam manipulation devices for a plurality of charged particle beamlets, while avoiding common intersection of at least one beamlet associated with a beamlet through a common lens, often require the use of beam focusing devices in accelerator use to longitudinally focus the ion beam on the beam line to improve beam intensity and quality.
Disclosure of Invention
It is an object of the present invention to provide a beam focusing electrode which has the advantage of making the focusing electric field more uniform while allowing less obstruction of the beam as it passes through the beam shaper.
The technical aim of the invention is realized by the following technical scheme:
the utility model provides a beam focusing electrode device, includes the electrode lead, the electrode lead is fixed the duna still is equipped with beam focusing electrode plate subassembly, beam focusing electrode plate subassembly includes two beam focusing electrode plates, be equipped with a plurality of screw holes on the beam focusing electrode plate, still be equipped with electrically conductive wire between the screw hole.
Further set up: and compression bolts are further arranged around the buncher electrode plate.
Further set up: an insulating support column is further arranged between the edges of the electrode plates of the two bunchers.
Further set up: the conductive metal wires are arranged in parallel along the electrode plate direction of the buncher.
Further set up: and through holes for passing through the conductive metal wires are also formed on two sides of the buncher electrode plate.
Preferably, chamfers are further arranged on two sides of the through hole.
By adopting the technical scheme, in order to longitudinally focus the particle beam on the beam line in the accelerator, the beam focusing device is needed to be used for improving the beam intensity and quality, the saw-tooth waveform design is often adopted to be a method for improving the beam focusing performance, the beam focusing electrode is positioned in the vacuum pipeline of the accelerator, the beam focusing structure is needed to realize the beam focusing of particles, and meanwhile, the distribution parameters are as small as possible so as to realize interface impedance matching with a high-frequency generation system, and the vacuum chamber is used for realizing the isolation between an external circuit and a particle vacuum component. The output of the high frequency generation system enters the vacuum chamber through the feedthru connector and is connected to the bunching electrode. The beam focusing electrode is positioned at the right center of the beam transmission path, and the effect of beam focusing can be directly influenced by the quality of the beam focusing electrode.
Another object of the present invention is to provide a beam focusing electrode implementation method, which has the advantage that a beam focusing device compresses a particle beam generated by a particle accelerator in a particle-casting advancing direction (longitudinal direction) by using an electric field in the form of a triangular wave generated between the beam focusing electrodes, thereby implementing a beam focusing effect.
The technical aim of the invention is realized by the following technical scheme:
the beam focusing electrode implementation method comprises a beam focusing system, wherein the beam focusing system comprises a beam focusing electrode, a vacuum cavity, a matching sampling circuit, a power amplifier and a signal generator, and the beam focusing electrode comprises the following steps: s1, a signal generator sends out a signal; s2, amplifying the signal through a power amplifier; s3, placing the beam focusing electrode device in a vacuum chamber, and matching through a matching sampling circuit according to signals sent by a signal generator, so that corresponding current is introduced into the beam focusing electrode device in the vacuum chamber, and an electric field is formed to achieve the beam focusing purpose; s4, continuously feeding back an electric signal to the matching sampling circuit by the beam focusing electrode device in the vacuum chamber, and feeding back the signal to the signal generator again after the signal is sampled by the matching sampling circuit, so as to adjust the fed-in current, thereby completing feedback.
In summary, the invention has the following beneficial effects: the beam-focusing device compresses the advancing direction (longitudinal direction) of the particle beam casting particles generated by the particle accelerator by utilizing the electric field in the form of triangular waves generated between the electrodes of the beam-focusing device, thereby realizing the beam-focusing effect.
The conductive metal wires uniformly distributed on the beam-buncher electrode are used for shielding the beam current as little as possible, and meanwhile, the electric field distribution at the position where the beam current passes through the center of the beam-buncher electrode is more uniform. So as to achieve a better bunching effect.
Drawings
The invention is further described below with reference to the accompanying drawings.
FIG. 1 is a schematic view of the overall structure of a beam focusing electrode device;
FIG. 2 is a schematic view of a bunching electrode apparatus for showing the structure of a conductive wire;
fig. 3 is a schematic flow chart of a method for implementing the beam focusing electrode device.
In the figure, 1, an electrode lead; 2. a buncher electrode plate assembly; 21. a buncher electrode plate; 22. a threaded hole; 23. a conductive wire; 3. a compression bolt; 4. an insulating support column; 5. a through hole; 6. chamfering.
Detailed Description
The following describes the embodiments of the present invention further with reference to the drawings.
The technical scheme adopted by the invention is as follows: the bunching electrode device comprises an electrode lead 1, wherein the electrode lead 1 is fixedly provided with a buncher electrode plate assembly 2, the buncher electrode plate assembly 2 comprises two buncher electrode plates 21, a plurality of threaded holes 22 are formed in the buncher electrode plates 21, through holes 5 used for penetrating through conductive wires 23 are formed in two sides of the buncher electrode plates 21, and chamfers 6 are formed in two sides of the through holes 5. And a conductive metal wire 23 is arranged between the threaded holes 22, meanwhile, a compression bolt 3 is also arranged around the buncher electrode plate 21, an insulating support column 4 is also arranged between the edges of the two buncher electrode plates 21, and the conductive metal wires 23 are arranged in parallel along the direction of the buncher electrode plates 21.
As shown in fig. 3, the main implementation method of the device comprises a beam focusing system, wherein the beam focusing system comprises a beam focusing electrode, a vacuum cavity, a matching sampling circuit, a power amplifier and a signal generator, and the beam focusing electrode comprises the following steps: s1, a signal generator sends out a signal; s2, amplifying the signal through a power amplifier; s3, placing the beam focusing electrode device in a vacuum chamber, and matching through a matching sampling circuit according to signals sent by a signal generator, so that corresponding current is introduced into the beam focusing electrode device in the vacuum chamber, and an electric field is formed to achieve the beam focusing purpose; s4, continuously feeding back an electric signal to the matching sampling circuit by the beam focusing electrode device in the vacuum chamber, and feeding back the signal to the signal generator again after the signal is sampled by the matching sampling circuit, so as to adjust the fed-in current, thereby completing feedback.
The main working principle of the whole equipment is as follows: the beam focusing electrode is positioned in the vacuum pipeline of the accelerator, the beam focusing structure needs to realize beam focusing of particles, and meanwhile, distribution parameters are as small as possible so as to realize interface impedance matching with a high-frequency generation system, and the vacuum chamber realizes isolation of an external circuit and a particle vacuum component. The output of the high frequency generation system enters the vacuum chamber through the feedthru connector and is connected to the bunching electrode. The beam focusing electrode is positioned at the very center of the beam transmission path. The effect of beam focusing will be directly affected by the quality of the beam focusing electrode, so that the beam focusing electric field is more uniform, and the beam is less shielded when passing through the beam focusing device. The intervals between the conductive wires 23 can be equal or unequal, the middle holes of the buncher electrode plate 21 can pass through beam current, and the through holes 5 and the threaded holes 22 of the double-side chamfers 6 are designed at symmetrical positions on the central annular disk. The through holes 5 of the double-sided chamfer 6 are used for stringing the conductive metal wires 23, the chamfer 6 can protect the metal wires from being easily cut off, the threaded holes 22 are used for installing the compression screws, the compression screws are used for realizing the fixing effect on the conductive metal wires 23, the conductive metal wires 23 are connected and fixed with the electrode plates by means of the compression screws, the through holes 5 of the double-sided chamfer 6 are straightened in the horizontal direction, then the other side of the conductive metal wires penetrate through the through holes 5 of the double-sided chamfer 6 again to be compressed by the compression screws, and the conductive metal wires 23 can be fixed on the electrode plates. As shown in the above figures, the buncher electrode is finally formed by continuously winding equidistant metal wires in a zigzag shape.
The foregoing is a preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and any simple modification, equivalent variation and variation of the above embodiment according to the technical substance of the present invention falls within the scope of the technical solution of the present invention.
Claims (7)
1. The utility model provides a beam focusing electrode device which characterized in that: the novel solar battery is characterized by comprising an electrode lead (1), wherein the electrode lead (1) is fixedly provided with a beam-buncher electrode plate assembly (2), the beam-buncher electrode plate assembly (2) comprises two beam-buncher electrode plates (21), a plurality of threaded holes (22) are formed in the beam-buncher electrode plates (21), and conductive metal wires (23) are further arranged between the threaded holes (22).
2. A bunching electrode apparatus according to claim 1, wherein: compression bolts (3) are further arranged around the buncher electrode plate (21).
3. A bunching electrode apparatus according to claim 2, wherein: an insulating support column (4) is arranged between the edges of the two buncher electrode plates (21).
4. A bunching electrode apparatus according to claim 3, wherein: the conductive metal wires (23) are arranged in parallel along the direction of the buncher electrode plate (21).
5. A bunching electrode apparatus in accordance with claim 4, wherein: and through holes (5) for penetrating through the conductive metal wires (23) are also formed in two sides of the buncher electrode plate (21).
6. A bunching electrode apparatus in accordance with claim 5, wherein: chamfer angles (6) are further arranged on two sides of the through hole (5).
7. The method for realizing the bunching electrode according to claims 1-6, wherein the method comprises the following steps: the device comprises a beam focusing system, wherein the beam focusing system comprises a beam focusing electrode, a vacuum cavity, a matching sampling circuit, a power amplifier and a signal generator, and the beam focusing electrode comprises the following steps: s1, a signal generator sends out a signal; s2, amplifying the signal through a power amplifier; s3, placing the beam focusing electrode device in a vacuum chamber, and matching through a matching sampling circuit according to signals sent by a signal generator, so that corresponding current is introduced into the beam focusing electrode device in the vacuum chamber, and an electric field is formed to achieve the beam focusing purpose; s4, continuously feeding back an electric signal to the matching sampling circuit by the beam focusing electrode device in the vacuum chamber, and feeding back the signal to the signal generator again after the signal is sampled by the matching sampling circuit, so as to adjust the fed-in current, thereby completing feedback.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310202255.5A CN116367406A (en) | 2023-03-02 | 2023-03-02 | Bunching electrode device and implementation method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310202255.5A CN116367406A (en) | 2023-03-02 | 2023-03-02 | Bunching electrode device and implementation method |
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| Publication Number | Publication Date |
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| CN116367406A true CN116367406A (en) | 2023-06-30 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202310202255.5A Pending CN116367406A (en) | 2023-03-02 | 2023-03-02 | Bunching electrode device and implementation method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117596764A (en) * | 2023-11-17 | 2024-02-23 | 中国科学院近代物理研究所 | Interdigital H-mode radio-frequency quadrupole accelerator and acceleration system |
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2023
- 2023-03-02 CN CN202310202255.5A patent/CN116367406A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117596764A (en) * | 2023-11-17 | 2024-02-23 | 中国科学院近代物理研究所 | Interdigital H-mode radio-frequency quadrupole accelerator and acceleration system |
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