CN116356577A - Self-cleaning carbon fiber and preparation method thereof - Google Patents
Self-cleaning carbon fiber and preparation method thereof Download PDFInfo
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- CN116356577A CN116356577A CN202310366749.7A CN202310366749A CN116356577A CN 116356577 A CN116356577 A CN 116356577A CN 202310366749 A CN202310366749 A CN 202310366749A CN 116356577 A CN116356577 A CN 116356577A
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- 229920000049 Carbon (fiber) Polymers 0.000 title claims abstract description 67
- 239000004917 carbon fiber Substances 0.000 title claims abstract description 67
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 title claims abstract description 57
- 238000004140 cleaning Methods 0.000 title claims abstract description 31
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 239000002105 nanoparticle Substances 0.000 claims abstract description 42
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 17
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 14
- 239000010935 stainless steel Substances 0.000 claims abstract description 14
- 239000002086 nanomaterial Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- 238000003618 dip coating Methods 0.000 claims description 5
- 238000000025 interference lithography Methods 0.000 claims description 5
- 239000012467 final product Substances 0.000 claims description 4
- 239000003814 drug Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 238000009210 therapy by ultrasound Methods 0.000 claims description 3
- 238000001459 lithography Methods 0.000 claims 1
- 238000001259 photo etching Methods 0.000 claims 1
- 238000007731 hot pressing Methods 0.000 abstract description 2
- 238000004049 embossing Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 230000001427 coherent effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 2
- 238000004556 laser interferometry Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000009440 infrastructure construction Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M23/00—Treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, characterised by the process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/07—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with halogens; with halogen acids or salts thereof; with oxides or oxyacids of halogens or salts thereof
- D06M11/11—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with halogens; with halogen acids or salts thereof; with oxides or oxyacids of halogens or salts thereof with halogen acids or salts thereof
- D06M11/13—Ammonium halides or halides of elements of Groups 1 or 11 of the Periodic Table
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/77—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof
- D06M11/79—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof with silicon dioxide, silicic acids or their salts
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
- D06M2101/40—Fibres of carbon
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M2200/00—Functionality of the treatment composition and/or properties imparted to the textile material
- D06M2200/01—Stain or soil resistance
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- Crystallography & Structural Chemistry (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
Abstract
The invention discloses a self-cleaning carbon fiber and a preparation method thereof, belonging to the field of nano materials, and comprising the following steps: the invention uses stainless steel as a template to carry out laser processing, then dip-coats nano particles on the carbon fiber by a lifting method, then carries out hot pressing, finally uses hydrofluoric acid to remove the nano particles on the carbon fiber, leaves a nano structure, and constructs the carbon fiber with good mechanical property, strong robustness and self-cleaning performance on a stainless steel substrate. The carbon fiber has the advantages of good durability, strong self-cleaning capability, mass preparation and the like.
Description
Technical Field
The invention relates to the field of nano materials, in particular to self-cleaning carbon fiber and a preparation method thereof.
Background
With the increasing development of science and technology, the self-cleaning property has attracted considerable attention from researchers, and the property has wide application in both production and life. The main reason is that natural pollution of outdoor operation is difficult to avoid, regular manual cleaning is often required to maintain the functional efficiency of the material, and huge cleaning cost exists, so that pollution inhibition-self cleaning by using natural conditions becomes the first choice for pollution prevention in production and life. The most important application form of carbon fibers is as reinforcement of resin materials, and the formed carbon fiber reinforced resin (CFRP) has excellent comprehensive properties. The carbon fiber can be used as a fuselage and a bearing structure of a large passenger plane or applied to a ship hull structure in the transportation industry, can be used as a reinforcing structure of a wind power blade and an electrode gas diffusion material of a fuel cell in the energy field, can be used as a key material for public infrastructure construction (bridges and cables) and medical equipment (military emergency stretcher) and industrial equipment (large liquid crystal display panel) in the living field, and therefore, the carbon fiber surface has self-cleaning property and has wide application prospect.
Up to now, scientists have developed various methods for preparing self-cleaning characteristic materials, such as a chemical vapor deposition method, a magnetron sputtering method, a sol-gel method, a normal-temperature normal-pressure spraying method and the like, and the methods often have the problems of high preparation cost, complex preparation process, damage to the performance, poor robustness, difficulty in large-scale preparation and the like. The laser interference lithography technology integrates laser, interference, diffraction optics and optical lithography, is applied to the fields of micromachining technology and microelectronics, solves the defects in the prior art, and has simple process and short preparation period. The template hot pressing solves the problem that large-scale preparation is difficult. The hydrofluoric acid adopted by the invention corrodes the nano particles to leave the nano structure, so that the robustness of the carbon fiber can be improved well, and the carbon fiber can still keep good self-cleaning property after being exposed in the air for a long time. Therefore, the invention has great significance for the preparation of the self-cleaning carbon fiber.
Disclosure of Invention
Aiming at the technical problems, the invention provides self-cleaning carbon fiber and a preparation method thereof. The method comprises the following steps:
step one, manufacturing a template based on laser interference lithography;
step two, designing and preparing a nano particle cluster function;
step three, dip-coating the nano particle clusters obtained in the step two on carbon fibers;
step four, preparing functional imprinting on the carbon fiber based on the laser interference pattern and the nano particles;
and fifthly, removing the nano particles which are coated in the step three from the carbon fiber by using hydrofluoric acid, and leaving the nano structure to obtain the final product, namely the self-cleaning carbon fiber.
The wavelength of the laser in the first step is 1064nm, the frequency is 10Hz, the pulse duration is 7ns, the interference light intensity energy density is 0.7j/cm < 2 >, the etching time is 4s, a double-beam optical system is built, and interference fringes are prepared on an unpolished stainless steel template.
Preparing a nanoparticle solution with 2% of silicon dioxide nanoparticles by using isopropanol, mixing the silicon dioxide nanoparticles with the size of 70nm and 200nm, stirring uniformly by using a medicine spoon, and performing ultrasonic treatment at room temperature for half an hour to obtain the nanoparticle solution.
And thirdly, immersing the carbon fiber into the silicon dioxide nanoparticle solution by using a pulling method for 10s, taking out, controlling the immersing and taking out speed to be 8cm/min, taking out the film, airing at room temperature, and repeating for a plurality of times to ensure that the nanoparticles are completely dip-coated on the carbon fiber.
And fourthly, placing the prepared stainless steel substrate with interference fringes and the carbon fiber with nano particles into an embossing machine for embossing, wherein the temperature is 130 ℃, the pressure is 0.6MPa, the embossing time is 30min, and after the time is up, standing the sample, cooling to room temperature, and demolding the carbon fiber and the stainless steel plate.
In the fifth step, the concentration of hydrofluoric acid is 5%, the treatment time is 1 minute, and the contact angle of the carbon fiber treated by hydrofluoric acid is obviously improved compared with that of the common carbon fiber.
The self-cleaning carbon fiber and the preparation method thereof solve the problems of high preparation cost, complex preparation process, damage to the performance, poor robustness, difficulty in large-scale preparation and the like in the traditional preparation technology. The self-cleaning carbon fiber is simple in preparation process, excellent in mechanical strength and strong in robustness, and can be prepared in a large scale.
Drawings
FIG. 1 is a schematic diagram of a dual beam laser interferometer;
FIG. 2 is an SEM image of a stainless steel template prepared by laser interferometry;
FIG. 3 is an SEM image of a carbon fiber with nanoparticles on the surface;
FIG. 4 is an SEM image of carbon fibers after treatment with hydrofluoric acid;
FIG. 5 is a schematic view of contact angle of plain carbon fiber;
FIG. 6 is a schematic representation of carbon fiber contact angle with nanoparticles on the surface;
fig. 7 is a schematic view of the contact angle of carbon fibers after treatment with hydrofluoric acid.
Detailed Description
In order to more clearly illustrate the present invention, the present invention will be further described with reference to preferred embodiments and the accompanying drawings. Like parts in the drawings are denoted by the same reference numerals. It is to be understood by persons skilled in the art that the following detailed description is illustrative and not restrictive, and that this invention is not limited to the details given herein.
The preparation method of the invention comprises the following steps:
1) Template manufacturing based on laser interference lithography;
2) Designing and preparing a nano particle cluster function;
3) Dip-coating the nanoparticle clusters obtained in the step 2) on carbon fibers;
4) Preparing a functional imprint on the carbon fiber based on the laser interference pattern and the nanoparticles;
5) And (3) removing the nano particles coated in the third step from the carbon fiber by using hydrofluoric acid, and leaving the nano structure to obtain the final product, namely the self-cleaning carbon fiber.
Examples
1) Template manufacturing based on laser interference lithography;
a laser with the wavelength of 1064nm, the frequency of 10Hz and the pulse duration of 7ns is used, the interference light intensity energy density is 0.7j/cm < 2 >, the etching time is 4s, a double-beam optical system is built, and interference fringes are prepared on an unpolished stainless steel template. FIG. 1 is a schematic diagram of a dual beam laser interferometry system; the Laser emits a beam of high-energy Laser, the high-energy Laser is reflected to the spectroscope BS through the reflecting mirror M and is divided into two beams of coherent light, and the two beams of coherent light are reflected to the sample stage through the energy adjustment combination formed by the quarter wave plate W and the polaroid P through the two reflecting mirrors M at a certain angle.
2) Designing and preparing a nano particle cluster function;
preparing a nanoparticle solution with 2% of silicon dioxide nanoparticles by using isopropanol, mixing the silicon dioxide nanoparticles with the size of 70nm and 200nm, stirring uniformly by using a medicine spoon, and performing ultrasonic treatment at room temperature for half an hour to obtain the nanoparticle solution.
3) Dip-coating the nanoparticle clusters obtained in the step 2) on carbon fibers;
immersing the carbon fiber into the silicon dioxide nanoparticle solution for 10s by using a pulling method, taking out, controlling the immersing and taking out speed to be 8cm/min, taking out the film, airing at room temperature, and repeating for a plurality of times to ensure that the nanoparticle is completely immersed and coated on the carbon fiber.
4) Preparing a functional imprint on the carbon fiber based on the laser interference pattern and the nanoparticles;
and (3) placing the prepared stainless steel substrate with interference fringes and the carbon fiber with nano particles into an embossing machine for embossing, wherein the temperature is 130 ℃, the pressure is 0.6MPa, the embossing time is 30min, and after the time is up, standing the sample, cooling to room temperature, and demolding the carbon fiber and the stainless steel plate.
5) And (3) removing the nano particles coated in the third step from the carbon fiber by using hydrofluoric acid, and leaving the nano structure to obtain the final product, namely the self-cleaning carbon fiber.
The concentration of hydrofluoric acid is 5%, the treatment time is 1 minute, and the contact angle of the carbon fiber treated by the fluorosilane is obviously improved compared with that of the common carbon fiber.
Fig. 5, 6 and 7 are graphs showing comparison of contact angles of plain carbon fibers and carbon fibers treated with hydrofluoric acid and fluorosilane having interference fringes.
Claims (9)
1. The preparation method of the self-cleaning carbon fiber is characterized by comprising the following steps:
step one, manufacturing a template based on laser interference lithography;
step two, designing and preparing a nano particle cluster function;
step three, dip-coating the nano particle clusters obtained in the step two on carbon fibers;
step four, preparing functional imprinting on the carbon fiber based on the laser interference pattern and the nano particles;
and fifthly, removing the nano particles which are coated in the step three from the carbon fiber by using hydrofluoric acid, and leaving the nano structure to obtain the final product, namely the self-cleaning carbon fiber.
2. The method for preparing the self-cleaning carbon fiber according to claim 1, wherein in the first step, the stainless steel is used as a substrate for photoetching, a double-beam optical system is built, and interference fringes are prepared on the stainless steel template.
3. The method for preparing self-cleaning carbon fiber according to claim 2, wherein the stainless steel surface is not polished, the wavelength of a laser for lithography is 1064nm, the frequency is 10Hz, the pulse duration is more than 7ns, the energy density of interference light intensity is more than 0.7j/cm, and the etching time is more than 4 s.
4. The method for preparing self-cleaning carbon fiber according to claim 1, wherein in the second step, isopropanol is used to prepare a nanoparticle solution with a silicon dioxide nanoparticle ratio of more than 2%, and after the nanoparticle solution is uniformly stirred by a medicine spoon, the nanoparticle solution is obtained by ultrasonic treatment at room temperature for more than half an hour.
5. A method of preparing self-cleaning carbon fibers as claimed in claim 3, wherein the silica particles are selected from the range of 7nm to 200nm in size.
6. The method for preparing self-cleaning carbon fiber according to claim 1, wherein in the third step, the carbon fiber is immersed into the silicon dioxide nanoparticle solution and taken out by using a pulling method, the immersing and taking-out speed is controlled to be more than 8cm/min, the film is dried at room temperature after being taken out, and the complete dip-coating of the nanoparticles on the carbon fiber is repeatedly ensured.
7. The method for preparing self-cleaning carbon fiber according to claim 1, wherein the prepared stainless steel substrate with interference fringes and the carbon fiber with nano particles are put into a stamping machine for stamping, the temperature is more than 130 ℃, the pressure is more than 0.6MPa, the stamping time is more than 30min, and after the time is up, the rest sample is cooled to room temperature, the carbon fiber and the stainless steel plate are demoulded.
8. The method of producing a self-cleaning carbon fiber according to claim 1, wherein the concentration of hydrofluoric acid in the fifth step is 5% or more and the treatment time is 1 minute or more.
9. A self-cleaning carbon fiber, characterized by being produced by the method for producing a self-cleaning carbon fiber according to any one of claims 1 to 8.
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| CN202310366749.7A CN116356577A (en) | 2023-04-07 | 2023-04-07 | Self-cleaning carbon fiber and preparation method thereof |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007169148A (en) * | 2005-11-25 | 2007-07-05 | Mitsubishi Chemicals Corp | Carbon structure production method, carbon structure, and aggregate and dispersion of carbon structure |
| US20090176015A1 (en) * | 2008-01-04 | 2009-07-09 | Tsutomu Nakanishi | Antireflection structure formation method and antireflection structure |
| WO2013187843A1 (en) * | 2012-06-15 | 2013-12-19 | Agency For Science, Technology And Research | Embossing method and embossing arrangement |
| CN107140686A (en) * | 2017-07-07 | 2017-09-08 | 长春理工大学 | A kind of preparation method of the nano titania cluster array of oriented growth |
| CN111337471A (en) * | 2020-02-25 | 2020-06-26 | 有研工程技术研究院有限公司 | Preparation method of SERS substrate based on nanoimprint and electrochemical deposition technology |
-
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- 2023-04-07 CN CN202310366749.7A patent/CN116356577A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007169148A (en) * | 2005-11-25 | 2007-07-05 | Mitsubishi Chemicals Corp | Carbon structure production method, carbon structure, and aggregate and dispersion of carbon structure |
| US20090176015A1 (en) * | 2008-01-04 | 2009-07-09 | Tsutomu Nakanishi | Antireflection structure formation method and antireflection structure |
| WO2013187843A1 (en) * | 2012-06-15 | 2013-12-19 | Agency For Science, Technology And Research | Embossing method and embossing arrangement |
| CN107140686A (en) * | 2017-07-07 | 2017-09-08 | 长春理工大学 | A kind of preparation method of the nano titania cluster array of oriented growth |
| CN111337471A (en) * | 2020-02-25 | 2020-06-26 | 有研工程技术研究院有限公司 | Preparation method of SERS substrate based on nanoimprint and electrochemical deposition technology |
Non-Patent Citations (2)
| Title |
|---|
| 狄宁等: "超疏水表面制备工艺的研究进展", 材料保护, no. 11, 15 November 2021 (2021-11-15), pages 51 - 54 * |
| 董莉彤: "基于激光干涉光刻的反射与润湿功能表面可控制备研究", 中国博士学位论文全文数据库 工程科技I辑, 15 January 2021 (2021-01-15), pages 020 - 3 * |
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