CN116313475A - Method for simultaneously improving residual magnetization and coercive force of micron NdFeB-based permanent magnetic film - Google Patents

Method for simultaneously improving residual magnetization and coercive force of micron NdFeB-based permanent magnetic film Download PDF

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CN116313475A
CN116313475A CN202310171756.1A CN202310171756A CN116313475A CN 116313475 A CN116313475 A CN 116313475A CN 202310171756 A CN202310171756 A CN 202310171756A CN 116313475 A CN116313475 A CN 116313475A
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ndfeb
micron
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residual magnetization
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刘伟
李春昊
赵晓天
刘龙
张志东
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/0293—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets diffusion of rare earth elements, e.g. Tb, Dy or Ho, into permanent magnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
    • H01F1/04—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
    • H01F1/047—Alloys characterised by their composition
    • H01F1/053—Alloys characterised by their composition containing rare earth metals
    • H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
    • H01F1/057—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B

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Abstract

The invention provides a method for simultaneously improving the residual magnetization intensity and coercive force of a micron-sized NdFeB-based permanent magnetic thick film. The method is to introduce a combination layer in the growing process of the NdFeB-based thick film, so that the combination layer is arranged between hard magnetic layers, and the arrangement structure of the combination layer is as follows: spacer/soft layer/spacer. The non-magnetic layer in the combined layer acts as an isolating layer to increase the coercivity to some extent and the soft layer increases the remanence by long-range interactions with the hard layer thick film. The isolating layer is preferably Ta and the soft magnetic layer is preferably Fe. When the combination layer is inserted into 7 layers, and the thickness of the soft magnetic layer is 80nm, the residual magnetization of the permanent magnet thick film is 1.2T, and the coercive force is maintained above 1.5T. The method provides performance guarantee for the application of the NdFeB-based permanent magnet thick film on MEMS and miniature permanent magnet motors.

Description

Method for simultaneously improving residual magnetization and coercive force of micron NdFeB-based permanent magnetic film
Technical Field
The invention relates to the technical field of permanent magnet material preparation, and particularly provides a method for simultaneously improving the residual magnetization intensity and coercive force of a micron-sized NdFeB-based permanent magnet thick film.
Background
Modern electronic components are evolving toward miniaturization, integration, flexibility, and systemization. For driving operation of magnetic micro-electromechanical system (MEMS) components such as electromagnetic sensors, electromagnetic actuators, and energy harvesting, it is important to develop high-performance permanent magnets applied to the MEMS.
NdFeB-based permanent magnets have found application in many macroscopic systems, such as permanent magnet motors, speakers, and magnetic resonance imaging apparatus meters, due to their excellent permanent magnet properties. Moreover, the permanent magnets have lower heat losses relative to the electromagnets, and can produce a stable and sufficiently large magnetic field over a limited size range. Microelectromechanical systems are industrial technologies that combine microelectronics and mechanical engineering together, operating in the micrometer scale range, and manufacturing processes are Si-based semiconductor and microelectronics processes. With the maturation of the nano material preparation technology, the preparation of the NdFeB-based permanent magnet thick film by utilizing magnetron sputtering is possible. The NdFeB-based permanent magnetic film sputtered on the Si substrate has an easy magnetization axis growing along the direction of the C axis to obtain a high-performance vertical anisotropic permanent magnetic film, and the method can be well compatible with semiconductor and microelectronic processes.
From the design point of view of the magnetic micro-electromechanical system, the engineering characteristics related to the NdFeB-based permanent magnet include magnetic performance (including coercive force, saturation magnetization, residual magnetization and maximum magnetic energy product), thermal stability (including curie temperature, maximum operating temperature and residual magnetic temperature coefficient) and chemical stability. Wherein the magnitude of the coercive force determines the working magnetic field, anti-demagnetizing capability and working temperature range of the system. The maximum magnetic energy product determines the output energy of the system. Although the magnetocrystalline anisotropy field and saturation magnetization show material theoretical limits, the magnetic properties of the normal operating point of a permanent magnet do not reach this limit. For example, a magnetized permanent magnet film has a magnetization (surface field) near its surface of only 20% -50% of the remanence in an environment without an external magnetic field. The saturation magnetization can be increased by directly increasing the Fe content, but the coercive force is greatly reduced, and the remanence cannot be ensured. Thanks to the characteristic of preparing a film by magnetron sputtering, the performance of the NdFeB-based permanent magnet thick film is optimized by introducing a buffer layer, a covering layer, an isolating layer and the like into the film, so that the NdFeB-based permanent magnet thick film has a large enough surface field to meet the application requirement.
Disclosure of Invention
Aiming at the problems of the residual magnetization intensity and the coercive force of the micron-sized NdFeB-based permanent magnetic thick film, the invention aims to provide a method for enhancing the residual magnetization intensity of the NdFeB-based permanent magnetic thick film and improving the coercive force to a certain extent. The method can improve the residual magnetization to make the saturation magnetization less than 100Am 2 NdFeB-based permanent magnet thick film per kg, raised to over 100Am 2 The coercive force is still maintained above 1.5T, and the method provides performance guarantee for the application of NdFeB-based permanent magnet thick films on MEMS and miniature permanent magnet motors.
The technical scheme of the invention is as follows:
a method for simultaneously improving the residual magnetization intensity and coercive force of a micron-sized NdFeB-based permanent magnetic thick film is characterized by comprising the following steps: by inserting a non-magnetic/soft magnetic combination layer in the growth process of the hard magnetic layers, the combination layer is arranged between the hard magnetic layers, and the arrangement structure of the combination layer is as follows: spacer/soft layer/spacer.
Wherein:
the isolating layer is a non-magnetic layer, prevents the metal of the soft magnetic layer from diffusing into the hard magnetic layer, isolates the adjacent hard magnetic layers, the components of the isolating layer are one or more of Ta, mo, W, ti, and the thickness of the isolating layer is more than or equal to 2nm.
The soft magnetic layer is one of Fe, co and Ni or alloy, and the thickness of the soft magnetic layer is 50-100nm.
The hard magnetic layer is NdFeB-based rare earth permanent magnetic material, nd 2 Fe 14 B is a hard magnetic main phase, the main components are Nd, fe and B, part of Nd can be replaced by one or more of Dy, tb, pr and Ce, and Fe can be replaced by one or more of Co, ga and Nb; the total hard magnetic layer thickness is greater than 6 μm.
As a preferable technical scheme:
the thickness of the isolation layer is 2-5nm, the thickness of the soft magnetic layer is 50-80nm, the thickness of the hard magnetic layer is 500nm-3 mu m, and the number of layers of the combined layer is 2-7.
The isolating layer is Ta, the soft magnetic layer is Fe, and the hard magnetic layer is Nd-Dy-Fe-Co-B.
When the soft magnetic layer is Fe, the optimal thickness is 80nm, the number of the combined layers is 7, the total thickness of each combined layer is 84nm, and the specific structure is [ isolation layer (2 nm)/soft magnetic layer (80 nm)/isolation layer (2 nm)]The method comprises the steps of carrying out a first treatment on the surface of the 84nm of combined layers are inserted into each 0.75 μm hard magnetic layer, so that the total thickness of the NdFeB-based permanent magnet thick film is 6.688 μm (comprising a 50nm buffer layer and a 50nm covering layer). The structure and layer number scheme can furthest improve the residual magnetization intensity and improve the coercive force to a certain extent, and the obtained micron-sized NdFeB-based permanent magnet thick film has the residual magnetization intensity of 100.01Am 2 Per kg, coercivity was 1.55T.
All layers can be prepared by adopting direct current magnetron sputtering, the sequence is buffer layer (Ta)/hard magnetic layer/combined layer/& gtand/or cover layer (Ta), the sputtering temperature is 500-600 ℃, the annealing temperature is 650-750 ℃, and the annealing time is 20-30min. The NdFeB-based hard magnetic layer is formed by sputtering a self-made alloy target material by adopting a powder metallurgy method.
The beneficial effects of the invention are as follows:
according to the invention, a non-magnetic/soft magnetic combined layer is inserted into the NdFeB-based permanent magnet thick film, wherein the non-magnetic layer plays a role in isolating adjacent hard magnetic layers, so that the grains of the NdFeB-based hard magnetic layers are preferentially oriented along the out-of-plane direction. From a macroscopic point of view, the effect of reducing the surface roughness of the thick film is achieved. On the other hand, the diffusion of the soft magnetic layer into the hard magnetic layer at high temperature causes the phase formation and orientation of the hard magnetic layer to be affected, and thus the spacer layer also plays a role in preventing the diffusion of the soft magnetic layer. In addition, stress is generated in the preparation process of the film layer, the insertion of the isolating layer can cause the aggregation of the rare earth phase near the non-magnetic layer, the interaction between the hard magnetic crystal grains and the adjacent hard magnetic layer is isolated, and the intrinsic coercivity is improved. The long-range magnetostatic interactions present in the thicker hard and soft magnetic layers can significantly increase the remanence of the magnet. Longer-range magnetostatic interactions with longer range interaction are more advantageous to improve magnetic performance without decoupling than localized exchange coupling. Therefore, the insertion of a soft magnetic layer with proper thickness is the key to improve the residual magnetization of the permanent magnet thick film without reducing the coercive force.
Drawings
Fig. 1 is a schematic diagram of the structure of an NdFeB-based multilayer thick film.
FIG. 2 shows the internal and external hysteresis loops of a Ta/NdDyFeCoB/Ta single layer thick film with a thickness of 6. Mu.m.
FIG. 3 is an out-of-plane hysteresis loop of the composite multilayer thick film Ta/(NdDyFeCoB/[ Ta/Fe/Ta ]) x/NdDyFeCoB/Ta for a combined layer thickness of 54nm and number of layers of 2, 7 and 11 in example 1.
FIG. 4 is a demagnetization curve of the composite multilayer thick film Ta/(NdDyFeCoB/[ Ta/Fe/Ta ]) x/NdDyFeCoB/Ta near the coercivity of the composite multilayer thick film of example 1 with a combined layer thickness of 54nm and the number of layers of 2, 7 and 11.
Fig. 5 is a composite multilayer thick film of example 2 with 7 combined layers at different thicknesses: ta/(NdDyFeCoB/[ Ta/Fe/Ta ] x nm) 7/NdDyFeCoB/Ta.
FIG. 6 is a composite multilayer thick film of example 3 with 7 Fe layers directly inserted: ta/(NdDyFeCoB/Fe 80nm ]) 7/NdDyFeCoB/Ta in-plane and out-of-plane hysteresis loops.
FIG. 7 is a composite multilayer thick film of the hard magnetic layer composition Nd-Fe-B in example 4: ta/(NdFeB/[ Ta/Fe/Ta ]84 nm) 7/NdFeB/Ta.
Detailed Description
The invention is further described below with reference to the accompanying drawings and examples, which are intended to facilitate an understanding of the invention without any limitation thereto.
As shown in fig. 1, the structure of the NdFeB-based permanent magnet multilayer thick film is shown as follows from inside to outside: substrate, buffer layer, (hard magnetic layer/combination layer) x, hard magnetic layer and cover layer, wherein the combination layer is: an isolating layer, a soft magnetic layer and a hard magnetic layer.
Example 1:
in this embodiment, the substrate is a Si substrate, and the target is Nd 15.5 Dy 0.5 Fe 65 Co 10 B 10 The total thickness of the hard magnetic layer in the prepared NdFeB-based multilayer thick film is about 6 mu m, the combined layer is uniformly inserted into the hard magnetic layer and consists of 2nm Ta, 50nm Fe and 2nm Ta, and 2, 7 and 12 layers are respectively inserted, namely, a layer of combined layer is inserted every 2 mu m, 0.75 mu m and 0.5 mu m thick hard magnetic layer is grown. The influence of the number of the insertion layers of the combined layer on the magnetic performance of the composite permanent magnet thick film is explored.
Film making process and conditions:
step (1) buffer layer Ta: the deposition thickness is 50nm, and the deposition temperature is 30-300 ℃.
Step (2) NDFCB hard magnetic layer: the deposition thicknesses were 6 μm, 2 μm and 0.75 μm, and the deposition temperature was 500 ℃.
And (3) combining the layers:
isolation layer Ta: the deposition thickness was 2nm and the deposition temperature was 300 ℃.
Soft magnetic layer Fe: the deposition thickness was 50nm and the deposition temperature was 300 ℃.
Isolation layer Ta: the deposition thickness was 2nm and the deposition temperature was 300 ℃.
The NDFCB hard magnetic layer and the combination layer are then grown cyclically and repeatedly 2, 7 or 12 times.
Step (4) NDFCB hard magnetic layer: the deposition thicknesses were 2 μm, 0.75 μm and 0.5 μm, and the deposition temperature was 500 ℃.
Step (5) covering layer Ta: the deposition thickness is 50nm, and the deposition temperature is 30-300 ℃.
And (6) high-temperature annealing: heating to 650 ℃, and keeping for 20min.
Three samples were counted in total, designated examples 1-1, 1-2 and 1-3, respectively. In addition, as a comparison, the effect of the insertion of the combination layer on the magnetic properties was examined, and a single-layer permanent magnet thick film without the insertion of the combination layer was also prepared in this example and is described as example 1.
Fig. 2 is an in-plane out-of-plane hysteresis loop of a single layer NDFCB permanent magnet thick film of example 1.
FIG. 3 shows the out-of-plane hysteresis loop of Ta/(NdDyFeCoB/[ Ta/Fe/Ta ]) x/NdDyFeCoB/Ta for different layers when the combined layer was [ Ta 2nm/Fe 50nm/Ta 2nm ].
FIG. 4 shows the demagnetization curves near the coercivity of Ta/(NdDyFeCoB/[ Ta/Fe/Ta ]) x/NdDyFeCoB/Ta for different layers in example 1 where the combined layer was [ Ta 2nm/Fe 50nm/Ta 2nm ].
The magnetic properties of the composite permanent magnet thick films were summarized in conjunction with fig. 2, 3 and 4 to give table 1 showing the residual magnetization and coercivity of the NDFCB composite permanent magnet thick films of example 1, examples 1-1, 1-2 and 1-3. The result shows that the residual magnetization and the coercive force of the composite thick film are improved after the composite layer is inserted, and the residual magnetization is higher as the number of the inserted layers is larger (decoupling phenomenon occurs after the composite thick film is inserted into 12 layers, and the residual magnetism is reduced). The NDFCB composite permanent magnet thick film sample inserted with 7 combined layers has higher coercivity and residual magnetization. Example 2 will therefore be performed with the interposition of 7 combined layers.
Table 1:
Figure BDA0004099553850000071
example 2
In this example, the effect of the thickness of the soft magnetic layer in the combined layer on the magnetic properties of the composite permanent magnet thick film was investigated. Si is used as a substrate, and Nd is used as a target material 15.5 Dy 0.5 Fe 65 Co 10 B 10 The self-made alloy target (hereinafter referred to as NDFCB), ta metal target and Fe metal target, the hard magnetic layer thickness in the prepared NdFeB-based multi-layer thick film is about 6 μm, the combined layer is uniformly inserted into the hard magnetic layer, the combined layer is composed of Ta, fe and Ta, and 7 layers are inserted in total, wherein the thickness of the isolation layer Ta is 2nm, and the thickness of the soft magnetic layer Fe is 70nm and 80nm, respectively.
Film making process and conditions:
step (1) buffer layer Ta: the deposition thickness is 50nm, and the deposition temperature is 30-300 ℃.
Step (2) NDFCB hard magnetic layer: the deposition thickness was 0.75 μm and the deposition temperature was 500 ℃.
And (3) combining the layers: isolation layer Ta: the deposition thickness was 2nm and the deposition temperature was 300 ℃.
Soft magnetic layer Fe: the deposition thickness was 70nm and 80nm, and the deposition temperature was 300 ℃.
Isolation layer Ta: the deposition thickness was 2nm and the deposition temperature was 300 ℃.
The NDFCB hard magnetic layer and the combination layer were then grown cyclically and repeatedly a total of 7 times.
Step (4) NDFCB hard magnetic layer: the deposition thickness was 0.75 μm and the deposition temperature was 500 ℃.
Step (5) covering layer Ta: the deposition thickness is 50nm, and the deposition temperature is 30-300 ℃.
And (6) high-temperature annealing: heating to 650 ℃, and keeping for 20min.
The total of two samples were designated as examples 2-1 and 2-2, respectively. In addition, in order to investigate the effect of the thickness of the soft magnetic phase inserted into the composite layer on the magnetic properties, the above samples were compared with examples 1 and examples 1 to 2.
In conjunction with fig. 2, 3 and 5, the magnetic properties of the composite permanent magnet thick films are summarized in table 2, comparing the residual magnetization and saturation magnetization of the NDFCB composite permanent magnet thick films of example 1, examples 1-2, 2-1 and 2-2. The results of comparative example 1 and examples 1-2 show that the residual magnetization of the composite permanent magnet thick film increases with increasing soft layer thickness, and the coercivity remains above 1.5T during this process. In comparison with example 1 without the insertion of the combined layers, the remanent magnetization is set at 62.62Am 2 The/kg is increased to 100.01Am 2 The coercivity was also increased from 1.35T to 1.55T per kg, and no decoupling occurred.
Table 2:
Figure BDA0004099553850000081
example 3
This example serves as a comparative example to example 2-2, and the importance of the Ta layer in the combined layer to maintain the coercivity level was investigated. The hard magnetic layer in the NdFeB-based multilayer thick film was about 6 μm thick with Si as the substrate, and only the soft magnetic layer Fe was interposed, for a total of 7 layers. The thickness of the soft magnetic layer Fe is 80nm.
The film forming process and conditions were the same as in example 2-2 above, totaling one sample: example 3-1. With reference to FIGS. 5 and 6, an example of the presence or absence of a Ta separation layer is analyzed for saturation magnetization, remanent magnetization, and correctionThe variation of the coercivity. The results show that although the saturation magnetization is from 125.75Am 2 Kg is increased to 133.86Am 2 Kg, but with a remanent magnetization of 113.67Am 2 The/kg is reduced to 51.84Am 2 And the coercive force is greatly reduced to 0.4T. It can be judged that the Ta spacer layer is extremely important in the combined layer to maintain the magnitudes of coercive force and remanence.
Example 4
This example serves as a comparative example to example 2-2, where the best choice of hard magnetic layer was explored. Si is used as a substrate, nd-Fe-B is used as a hard magnetic layer, fe is used as a soft magnetic layer, the total thickness of the hard magnetic layer is 6 mu m, and the soft magnetic layer is divided into 7 layers and is inserted into the hard magnetic layer (the Fe layer is 80 nm), and seven layers are formed. The hard and soft magnetic layers are isolated by a Ta layer, and the thickness is 2nm.
The film forming process and conditions were the same as in example 2-2, the number of samples was 2, and the number was designated as: example 4-1 and example 4-2. In connection with fig. 2, 5 and 7, the embodiment after the hard-magnetic layer change was analyzed for changes in saturation magnetization, residual magnetization and coercivity. The results show that although the improvement of magnetic properties is still exhibited after the insertion of the intermediate layer, for example, the coercive force is increased from 0.85T to 1.25T and the residual magnetization is increased from 47.26Am 2 Kg is increased to 81.01Am 2 Perkg, saturation magnetization from 72.42Am 2 Kg is increased to 107.05Am 2 /kg. However, in contrast to example 2-2 (the hard magnetic layer was NdDyFeCoB) in which the Fe layer had a thickness of 80n as a 7-layer intermediate layer, example 4-2 was lower in coercive force, residual magnetization and saturation magnetization than example 2-2, and therefore the hard magnetic layer was preferably Nd-Dy-Fe-Co-B.
The invention is not a matter of the known technology.
The above embodiments are provided to illustrate the technical concept and features of the present invention and are intended to enable those skilled in the art to understand the content of the present invention and implement the same, and are not intended to limit the scope of the present invention. All equivalent changes or modifications made in accordance with the spirit of the present invention should be construed to be included in the scope of the present invention.

Claims (10)

1. A method for simultaneously improving the residual magnetization and coercive force of a micron NdFeB-based permanent magnetic film is characterized by comprising the following steps: by inserting a non-magnetic/soft magnetic combination layer in the growth process of the hard magnetic layers, the combination layer is arranged between the hard magnetic layers, and the arrangement structure of the combination layer is as follows: spacer/soft layer/spacer.
2. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 1, wherein the method comprises the following steps: the isolation layer is one or more than one of Ta, mo, W, ti, and the thickness of the isolation layer is more than or equal to 2nm.
3. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 1, wherein the method comprises the following steps: the soft magnetic layer is one of Fe, co and Ni or alloy, and the thickness of the soft magnetic layer is 50-100nm.
4. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 1, wherein the method comprises the following steps: the hard magnetic layer is NdFeB-based rare earth permanent magnetic material, nd 2 Fe 14 B is a hard magnetic main phase, the main components are Nd, fe and B, part of Nd can be replaced by one or more of Dy, la, pr and Ce, and Fe can be replaced by one or more of Co, ga and Nb; the total hard magnetic layer thickness is not less than 6 μm.
5. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 1, wherein the method comprises the following steps: the thickness of the isolation layer is 2-5nm, the thickness of the soft magnetic layer is 50-80nm, the thickness of the hard magnetic layer is 500nm-3 mu m, and the number of layers of the combined layer is 2-7.
6. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 1, wherein the method comprises the following steps: the isolating layer is Ta, the soft magnetic layer is Fe, and the hard magnetic layer is Nd-Dy-Fe-Co-B.
7. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 6, wherein the method comprises the following steps: the number of the combined layers is 7, the total thickness of each combined layer is 84nm, the thickness of each isolation layer is 2nm, and the thickness of each soft magnetic layer is 80nm; each hard magnetic layer had a thickness of 0.75 μm.
8. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 7, wherein: the residual magnetization intensity of the obtained micron-sized NdFeB-based permanent magnet thick film is 100.01Am 2 Per kg, coercivity was 1.55T.
9. The method for simultaneously improving the residual magnetization and the coercive force of the micron NdFeB-based permanent magnetic film according to claim 1, wherein the method comprises the following steps: all layers are prepared by adopting direct current magnetron sputtering, the sequence is buffer layer/hard magnetic layer/combined layer/& gtand/or cover layer, the sputtering temperature is 500-600 ℃, the annealing temperature is 650-750 ℃, and the annealing time is 20-30min.
10. A micron-sized NdFeB-based permanent magnet thick film prepared by the method according to any one of claims 1 to 6, which is characterized in that: the micron-sized NdFeB-based permanent magnet thick film comprises an NdFeB-based hard magnetic layer and a non-magnetic/soft magnetic combined layer, the residual magnetization enhancement rate of the permanent magnet thick film is 37%, and the coercive force is not lower than 1.5T.
CN202310171756.1A 2023-02-28 2023-02-28 Method for simultaneously improving residual magnetization and coercive force of micron NdFeB-based permanent magnetic film Pending CN116313475A (en)

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