CN116256918A - Mask for optical alignment, optical alignment method, display panel and device - Google Patents
Mask for optical alignment, optical alignment method, display panel and device Download PDFInfo
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- CN116256918A CN116256918A CN202310288168.6A CN202310288168A CN116256918A CN 116256918 A CN116256918 A CN 116256918A CN 202310288168 A CN202310288168 A CN 202310288168A CN 116256918 A CN116256918 A CN 116256918A
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- 238000000034 method Methods 0.000 title claims abstract description 46
- 230000003287 optical effect Effects 0.000 title claims description 15
- 238000005286 illumination Methods 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims description 116
- 239000004973 liquid crystal related substance Substances 0.000 claims description 24
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000010586 diagram Methods 0.000 description 13
- 239000010408 film Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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Abstract
The application discloses mask plate for photo-alignment and photo-alignment method, display panel and device, mask plate for photo-alignment is used for carrying out photo-alignment to the base plate, and the mask plate includes first figure region and second figure region, and first figure region is used for carrying out photo-alignment to the base plate in first illumination direction, and first figure region includes the first light-transmitting zone that extends along setting for the direction, and first light-transmitting zone is incessantly set up, and second figure region includes second light-transmitting zone and the shading district that sets up in turn along setting for the direction. According to the technical scheme provided by the embodiment of the application, the pixels in the whole range are exposed through the first light-transmitting area, the influence of the accuracy of the first pattern area on the alignment is not required to be considered, the mask is simple to prepare, the exposure alignment process is relatively simple, the influence of the accuracy in the exposure alignment process on the alignment is weakened, and the carried out light alignment process is more convenient.
Description
Technical Field
The present invention relates generally to the field of photoalignment, and in particular, to a mask for photoalignment, a photoalignment method, a display panel, and a device.
Background
The liquid crystal display panel is generally composed of a color film substrate, a thin film transistor substrate and a liquid crystal layer arranged between the two substrates, and the working principle of the liquid crystal display panel is that the liquid crystal molecules of the liquid crystal layer are controlled to rotate by applying driving voltages to the two substrates, so that light rays of the backlight module are refracted out to generate a picture.
In general, UV alignment can be used 2 The alignment process A aligns an alignment film of a CF (color film substrate) and an alignment film of a TFT (thin film transistor) substrate, and the principle is that UV light is utilized to realize accurate alignment control UV of liquid crystal molecules 2 The alignment process A can realize the state that all liquid crystal molecules incline towards the design direction through the alignment film, so that the liquid crystal molecules can incline towards the same direction at the same time when an electric field is loaded, and the response speed is increased. For traditional UV 2 A exposure mode, T (thin film transistor) for realizing wide view angle&When exposing the C (color film substrate), the alignment force of 1/2 sub-bpixel is completely opposite, but in the process, the alignment process in 2 directions is easy to be influenced by exposure precisionAnd rattle, resulting in the case that the alignment unevenness forms luminance unevenness (Mura).
Disclosure of Invention
In view of the foregoing drawbacks or shortcomings of the prior art, it is desirable to provide a mask for photoalignment, a photoalignment method, a display panel, and a device.
In a first aspect, a mask for photoalignment is provided for photoalignment of a substrate, the substrate including a pixel region,
the mask comprises a first graph area and a second graph area, the first graph area is used for carrying out optical alignment on the substrate in a first illumination direction, the first graph area comprises a first light transmission area extending along a set direction, the first light transmission area is arranged uninterruptedly,
the second pattern area is used for carrying out optical alignment on the substrate in a second illumination direction, and comprises second light transmission areas and light shielding areas which are alternately arranged along a set direction.
As a realizable mode, the set direction is a length direction or a width direction of the mask.
As an achievable manner, the sum of the widths of the second light-transmitting region and the light-shielding region is equal to the length of one sub-pixel in the pixel region.
As an achievable manner, the sum of the widths of the second light-transmitting region and the light-shielding region is equal to the width of one sub-pixel in the pixel region.
As an achievable manner, the first graphic region length is not smaller than the second graphic region length, and the first graphic region width is equal to the second graphic region width.
In a second aspect, a photoalignment method of a display panel is provided, and the photoalignment mask is adopted.
As an achievable manner, the display panel comprises a substrate to be optically aligned, the substrate to be optically aligned comprises a plurality of sub-pixel regions distributed in an array, each sub-pixel region is divided into a plurality of exposure regions arranged along a set direction,
according to the first target alignment force direction of each exposure area, respectively carrying out first exposure alignment on the corresponding exposure area, wherein the first exposure alignment is implemented through a first pattern area of the photo-alignment mask,
and respectively carrying out second exposure alignment on the corresponding exposure areas according to the second target alignment force direction of each exposure area, wherein the second exposure alignment is implemented through a second pattern area of the photo-alignment mask.
As an achievable way, the illumination intensity of the second exposure orientation is greater than the illumination intensity of the first exposure orientation.
As an achievable way, the scanning direction of the first exposure orientation is opposite to the scanning direction of the second exposure orientation.
As an achievable manner, the display panel includes a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer disposed between the first substrate and the second substrate,
the substrate to be optically aligned is the first substrate and/or the second substrate.
In a third aspect, there is provided a display panel including: the liquid crystal display device comprises a first substrate, a second substrate and a liquid crystal layer, wherein the first substrate and the second substrate are oppositely arranged, the liquid crystal layer is arranged between the first substrate and the second substrate, and at least one of the first substrate and the second substrate is manufactured by adopting the photo-alignment method.
In a fourth aspect, a display device is provided, including the display panel described above.
According to the technical scheme provided by the embodiment of the application, the pixels in the whole range are exposed through the first light-transmitting area, the influence of the precision of the first pattern area on the alignment is not required to be considered, only the precision problem of the second pattern area in the exposure using process is required to be considered, only the grating precision of the single-column pattern area and the alignment problem in the exposure process are required to be considered relatively speaking, the preparation of the mask plate is simple, the exposure alignment process is relatively simple, the influence of the precision in the exposure alignment process on the alignment is weakened, and the optical alignment process is more convenient.
Drawings
Other features, objects and advantages of the present application will become more apparent upon reading of the detailed description of non-limiting embodiments, made with reference to the following drawings, in which:
FIG. 1 is a related art UV 2 An exposure alignment schematic diagram of one of the alignment processes;
FIG. 2 is a schematic diagram of a mask structure for photoalignment according to an embodiment;
FIG. 3 is a schematic diagram of a mask structure for photoalignment according to another embodiment;
FIG. 4 is a schematic diagram of a photoalignment mode according to an embodiment;
FIG. 5 is a schematic diagram showing the photo-alignment of FIG. 4;
FIG. 6 is a schematic diagram of a photoalignment mode according to another embodiment;
FIG. 7 is a schematic diagram showing the photo-alignment of FIG. 6;
FIG. 8 is a schematic diagram of a display panel according to an embodiment;
FIG. 9 is a schematic diagram of another embodiment of a light alignment of a display panel;
fig. 10 is a schematic diagram of photoalignment of a display panel according to another embodiment.
Detailed Description
The present application is described in further detail below with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be noted that, for convenience of description, only the portions related to the invention are shown in the drawings.
It should be noted that, in the case of no conflict, the embodiments and features in the embodiments may be combined with each other. The present application will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
In the related art, as shown in fig. 1, UV 2 The A-alignment process generally divides a single sub-pixel in a TFT substrate into two regions along the short side direction of the sub-pixel, divides a single sub-pixel in a CF substrate into two regions along the long side direction of the sub-pixel, and couples the TFT substrate and the CF substrateAfter the cartridge, four regions are formed as viewed from the CF substrate side or the TFT substrate side. In the exposure alignment process, two sides of each sub-pixel are required to be exposed respectively, so that alignment of the TFT substrate and the CF substrate is realized. When an electric field is applied, the liquid crystal molecules may be tilted in the same direction at the same time. Taking fig. 1 as an example, the alignment force direction of each region of the three sub-pixels after the two substrates are aligned with each other is shown by each arrow of the third graph in fig. 1, and the liquid crystal molecules (i.e., the cone shown in the fourth graph) of the corresponding region are tilted under the alignment force of the two directions corresponding to each region.
In the exposure alignment process, a mask is generally used to cover the TFT substrate or the CF substrate, and different areas of the two sides corresponding to each sub-pixel are exposed, so that each sub-pixel needs to be exposed in two opposite directions on the TFT substrate side or the CF side, so that the sub-pixel is divided into two parts with different liquid crystal deflection directions, therefore, the mask is provided with corresponding openings for exposure, and the openings are generally arranged in a grating form matched with the sub-pixels.
Referring to fig. 2 and 3, the present disclosure provides a photo-alignment reticle 100 for photo-alignment of a substrate, the substrate including a pixel region,
the mask 100 includes a first pattern area 10 and a second pattern area 20, the first pattern area 10 is used for performing optical alignment on the substrate in a first illumination direction, the first pattern area 10 includes a first light-transmitting area extending along a set direction, the first light-transmitting area is continuously arranged,
the second pattern area 20 is used for performing optical alignment on the substrate in a second illumination direction, and the second pattern area 20 includes second light-transmitting areas 21 and light-shielding areas 22 alternately arranged along a set direction.
The mask 100 provided in the present disclosure is provided with two pattern areas for respectively performing partition exposure on sub-pixels in a pixel area, as shown in fig. 2 and 3, a first pattern area 10 is provided as an uninterrupted first transparent area, the first area is an integrally transparent area, when the first pattern area 10 is used for exposure, an entire row of sub-pixels are exposed, and liquid crystals in the entire row of sub-pixels deflect in the same direction; the second pattern area 20 is arranged as a second transparent area 21 and a light shielding area 22 which are alternately arranged, the second pattern area 20 is arranged in a grating form, each sub-pixel in the pixel area needing light alignment is divided into two corresponding parts, when in use, one part of the sub-pixel is shielded from light and the other part of the sub-pixel is shielded from light, and each sub-pixel is divided into two parts with different deflection directions, and the process of light alignment by the mask 100 with different alignment forces will be described in detail below; the mask 100 is provided with the first graph area 10 as a completely transparent area, and the area is of a completely transparent structure without considering the precision problem when being prepared, and the whole position opening is directly manufactured, so that the preparation of the mask 100 is simpler, and only the problem of the arrangement of the second transparent area 21 in the second graph area 20 is considered, so that the preparation of the mask 100 is simpler and more convenient;
in addition, when the mask 100 is used for photo-alignment, the first pattern region 10 of the first column is exposed through the first light-transmitting region for use, the influence of the accuracy of the first pattern region 10 on the alignment is not required to be considered, and only the accuracy problem of the second pattern region 20 in the exposure use process is required to be considered.
In this embodiment, two types of masks 100 are provided, where the two types of masks 100 have similar structures, and each mask has a first pattern region 10 that is light-transmitting without interruption, and second pattern regions 20 that are alternately arranged, and the widths of the second light-transmitting regions 21 and the light-shielding regions 22 in the second pattern regions 20 that are arranged on the two types of masks 100 are different, and the directions in which the second pattern regions extend on the masks 100 are also different. Since the pixel regions are divided from two directions of the TFT substrate side and the CF substrate side, respectively, and directions for dividing the pixel regions are perpendicular to each other in the photo-alignment process, the extension directions of the second pattern region 20 on the mask 100 for photo-alignment on the TFT substrate side and the mask 100 for photo-alignment on the CF substrate side are also perpendicular to each other.
Preferably, the set direction is a length direction of the mask 100. The size of the mask 100 for photo-alignment is related to the size of the display panel, and a plurality of masks 100 are spliced to form a structure matched with the display panel so as to cover all pixel areas, so that a relatively long side and a relatively narrow side, namely a long side and a wide side (for convenience of explanation, the long side is marked as an X direction in the drawing, and the wide side is marked as a Y direction), the mask 100 shown in fig. 2 extends the first pattern area 10 and the second pattern area 20 along the length direction, and divides each sub-pixel area into a left part and a right part, and when the mask 100 is used, the first pattern area 10 and the second pattern area 20 respectively expose the pixel areas, and when any one column of pattern area is exposed, the other column of pattern area is shielded by a shielding plate.
Optionally, the set direction is a width direction of the mask 100. As shown in fig. 3, in the mask 100 structure provided in this embodiment, the first pattern area 10 and the second pattern area 20 extend along the width direction, and each sub-pixel area is divided into an upper portion and a lower portion, where the setting directions of the mask 100 shown in fig. 3 are different from the setting directions of the mask 100 shown in fig. 2, and the setting directions of the mask 100 are respectively applied to different sides to perform exposure operations. Since the number of the subpixels in the length direction and the number of the subpixels in the width direction on each display panel are different, the numbers of the second light-transmitting regions 21 and the light-shielding regions 22 in the second pattern region 20 in fig. 2 and 3 are not completely the same, and different masks 100 are set according to the different sizes of the display panels to perform the photo-alignment.
In this embodiment, the mask plates 100 formed in fig. 2 and fig. 3 are different in setting direction, and when in use, the first pattern areas 10 of each mask plate 100 are generally disposed at the same position, for example, disposed above or below, and are operated, after the light alignment operation of the first side substrate is completed, the display substrate is rotated and turned over, and the light alignment of the other side substrate is performed, so that the scanning direction of the light source in the light alignment process is on the same straight line, and no adjustment of the light source is required, so that the light alignment operation precision is higher, therefore, in the specific light alignment diagrams in fig. 4 and fig. 6, both mask plates 100 are disposed at the lower position, and when the mask plate 100 in fig. 6 is used, the mask plate 100 and the display panel are both rotated.
Further, the sum of the widths of the second light-transmitting region 21 and the light-shielding region 22 is greater than or equal to the length of one sub-pixel in the pixel region.
As shown in fig. 4, when the mask 100 is used for performing the photo-alignment operation, firstly, the first pattern area 10 is used for exposing the whole row of pixels in the first illumination direction, then, the second pattern area 20 is used for exposing a part of the whole row of pixels in the second illumination direction, so that each sub-pixel is divided into two parts with different directions, the first pattern area 10 is set to be in a completely open form, the problems of exposure precision and setting form are not considered, each sub-pixel of the pixel area needs to be divided by the second pattern area 20, preferably, the adjacent second transparent area 21 and light-shielding area 22 in the second pattern area 20 are used as a small unit to divide one sub-pixel in the length direction of the display panel, namely the X direction, and the required position of the sub-pixel in the corresponding position can be ensured to be exposed by the second transparent area 21 and the light-shielding area 22, the sum of the widths of the two sub-pixels is equal to or greater than the length of one sub-pixel (the width is the length of the second transparent area 21 and the light-shielding area 22 in the X direction), the two sub-pixel can be conveniently divided by the second transparent area 21 and the light-shielding area 22 in the length direction, and the two sub-pixel can be conveniently adjusted in the opposite direction.
Optionally, the sum of the widths of the second light-transmitting region 21 and the light-shielding region 22 is greater than or equal to the width of one sub-pixel in the pixel region.
As shown in fig. 6, when the mask 100 is used for performing the photoalignment operation, as in the foregoing embodiment, first, the first pattern area 10 is used for exposing the entire row of pixels in the first illumination direction, and then the second pattern area 20 is used for exposing a portion of the entire row of pixels in the second illumination direction, so that each sub-pixel is divided into two portions with different directions, where the difference between the exposure substrate side of the mask 100 and the above embodiment is different, and the manner of dividing each sub-pixel into two portions is also different, in the above embodiment, each sub-pixel is divided into two left and right portions. In this embodiment, the first pattern area 10 is also set to be in a completely open form, and the sub-pixels of the pixel area are divided by the second pattern area 20 without considering the problem of the exposure accuracy and the setting form, and it is preferable that the adjacent second light transmitting area 21 and light shielding area 22 in the second pattern area 20 are divided into one sub-pixel as a small unit in the width direction of the display panel, that is, in the Y direction, and the sum of the widths of the two is equal to or greater than the width of one sub-pixel (the width is the length occupied by the second light transmitting area 21 and the light shielding area 22 in the Y direction, and the range of the sub-pixel in the Y direction is also referred to as the width of the sub-pixel), so that each sub-pixel can be divided into two portions in opposite directions by the exposure operation.
Optionally, the length of the first graphic region 10 is not less than the length of the second graphic region 20, and the width of the first graphic region 10 is equal to the width of the second graphic region 20. In this embodiment, the first pattern area 10 and the second pattern area 20 are used to perform photo-alignment operation on the substrate, and the first pattern area 10 exposes all the pixel areas, so that the setting position is at least not smaller than the length of the second pattern area 20, so that the exposure of the first pattern area 10 can be completely random and is not affected by factors such as pixels and exposure precision.
Although the above embodiments propose two types of masks 100, the difference between the two types of masks 100 is only that the active substrate side is different, and the photo-alignment directions adopted by the two types of masks 100 are the same, which will be described in detail in the following embodiments.
The embodiment also provides a photo-alignment method of the display panel, and the photo-alignment mask 100 is adopted. Since the mask 100 provided in this embodiment has the first pattern area 10 that is completely open, exposure accuracy is not affected when the exposure alignment of the first pattern area 10 is performed, and the preparation of the grating is simpler in the photo-alignment process, and the photo-alignment process is simpler and more convenient.
Further, the display panel comprises a substrate to be light-aligned, the substrate to be light-aligned comprises a plurality of sub-pixel areas distributed in an array, each sub-pixel area is divided into a plurality of exposure areas arranged along a set direction,
according to the first target alignment force direction of each exposure area, respectively performing first exposure alignment on the corresponding exposure area, wherein the first exposure alignment is implemented through the first pattern area 10 of the photo-alignment mask 100,
and respectively carrying out second exposure alignment on the corresponding exposure areas according to the second target alignment force direction of each exposure area, wherein the second exposure alignment is implemented through the second pattern area 20 of the photo-alignment mask 100.
In this embodiment, the substrate to be optically aligned is provided with a plurality of sub-pixel regions distributed in an array, and each sub-pixel region needs to be exposed and irradiated in opposite directions, so that the liquid crystal in each sub-pixel region is divided into two parts and deflected in opposite directions. Each sub-pixel is divided into exposure areas arranged along the length direction or the width direction of the display panel, taking fig. 4 and 5 as an example, the exposure areas are exposed according to the first target alignment force direction by a first pattern area 10, namely, a column a, the exposure areas at this time are all sub-pixel areas of the column a, the scanning direction is the direction indicated by a solid line arrow of the column a, then the exposure areas are exposed according to the second target alignment force direction by a second pattern area 20, namely, a column B, the exposure areas at this time are part of sub-pixel areas exposed after the column B covers the substrate, and the scanning direction is the direction indicated by a dashed line arrow of the column B, so that each sub-pixel part is subjected to exposure scanning in the column a direction, and the other part is subjected to exposure scanning in the column a direction and exposure scanning in the column B direction, thereby realizing alignment effects in two different directions.
Similarly, in fig. 6 and fig. 7, exposure scanning in different directions is performed through two rows of pattern areas, and each sub-pixel portion is subjected to exposure scanning in the a row direction, and the other sub-pixel portion is subjected to exposure scanning in the a row direction and exposure scanning in the B row direction, so as to achieve the alignment effect in two different directions shown in fig. 7. Fig. 4, 5, 6 and 7 represent substrates of different sides, with the same photoalignment.
Further, the scanning direction of the first exposure alignment is opposite to the scanning direction of the second exposure alignment.
In the above steps, the target alignment force directions of the two exposure alignments are different, and the light source scanning directions matched with the target alignment force directions are also different, and in order to achieve the final directions shown in fig. 5 and 7, the scanning directions of the two exposure alignments are set to opposite directions.
Further, the illumination intensity of the second exposure orientation is greater than the illumination intensity of the first exposure orientation.
In the above exposure alignment process, the partial sub-pixels of the second exposure alignment are scanned by two light sources in opposite directions, so that in order to make the partial sub-pixels of the second exposure alignment present opposite directions to the sub-pixels of other areas, the illumination intensity of the second exposure alignment is preferably set to be greater than the illumination intensity of the first exposure alignment, where the illumination intensity of the first exposure alignment may be conventional illumination intensity, and only the alignment force of a single column, that is, the illumination intensity of a B column, needs to be adjusted, thereby achieving a predetermined alignment effect. In the actual operation process, the specific illumination intensity of the second exposure alignment is set to be several times of the illumination intensity of the first exposure alignment, and the illumination intensity needs to be determined according to the actual situation.
Further, the display panel comprises a first substrate and a second substrate which are oppositely arranged, and a liquid crystal layer arranged between the first substrate and the second substrate,
the substrate to be optically aligned is the first substrate and/or the second substrate.
In a specific implementation process, the display panel includes a first substrate and a second substrate that are oppositely disposed, a liquid crystal box is disposed between the first substrate and the second substrate, the first substrate includes a plurality of first sub-pixel regions arranged in an array, and a plurality of second sub-pixel regions corresponding to the first sub-pixel regions are disposed on the second substrate, so that specific numbers of the plurality of first sub-pixel regions and the plurality of second sub-pixel regions can be set according to display resolution of the display panel in practical application, and the specific manner of setting the second pattern region 20 on the mask 100 corresponding to the first sub-pixel regions and the second sub-pixel regions is not limited, and is determined according to practical requirements. Either one of the first substrate and the second substrate is a TFT substrate, and the other is a CF substrate.
The present embodiment also provides a display panel, including: the liquid crystal display device comprises a first substrate, a second substrate and a liquid crystal layer, wherein the first substrate and the second substrate are oppositely arranged, the liquid crystal layer is arranged between the first substrate and the second substrate, and at least one of the first substrate and the second substrate is manufactured by adopting the photo-alignment method.
The display panel provided in this embodiment is provided with two opposite substrates, namely, a TFT substrate and a CF substrate, and when the two substrates perform the photoalignment operation, any one of the two substrates can perform the photoalignment operation by using the mask 100, so that the photoalignment operation is simpler, the precision is not affected by exposure, and the mask 100 used is simpler, more convenient and easy to prepare.
When the two opposite substrates perform the optical alignment operation, the mask 100 may be selected to perform the optical alignment operation, the directions of performing the optical alignment operation by the above method are marked by the dotted line and the solid line arrow respectively, and the methods of performing the optical alignment operation by the conventional method are all standard by the solid line arrow;
in the following three embodiments, if the mask 100 is used, referring to the photo-alignment schematic diagram of the display panel shown in fig. 8, the TFT substrate and the CF substrate on both sides are operated by using the photo-alignment method,
if any one of the TFT substrate and the CF substrate is operated by using the above-mentioned photoalignment method, referring to the photoalignment diagrams of the display panel shown in fig. 9 and 10, the substrate on one side is selected to be operated by using the photoalignment method, and the substrate on the other side may be any substrate on one side, and the photoalignment operation is performed by using a conventional manner, and specifically, which substrate on one side is selected to be determined according to the actual scene and the requirement.
The embodiment also provides a display device, which comprises the display panel.
In a specific implementation process, the display device provided in this embodiment may be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, and a navigator. Other essential components of the display device will be understood by those skilled in the art, and are not described herein in detail, nor should they be considered as limiting the invention.
It is to be understood that the above references to the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., are for convenience in describing the present invention and simplifying the description only, and do not indicate or imply that the apparatus or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present invention; the orientation word "inner and outer" refers to inner and outer relative to the contour of the respective component itself. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature.
Spatially relative terms, such as "above … …," "above … …," "upper surface at … …," "above," and the like, may be used herein for ease of description to describe one device or feature's spatial location relative to another device or feature as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "above" or "over" other devices or structures would then be oriented "below" or "beneath" the other devices or structures. Thus, the exemplary term "above … …" may include both orientations of "above … …" and "below … …". The device may also be oriented 90 degrees or at other orientations and the spatially relative descriptors used herein interpreted accordingly.
The foregoing description is only of the preferred embodiments of the present application and is presented as a description of the principles of the technology being utilized. It will be appreciated by persons skilled in the art that the scope of the invention referred to in this application is not limited to the specific combinations of features described above, but it is intended to cover other embodiments in which any combination of features described above or equivalents thereof is possible without departing from the spirit of the invention. Such as the above-described features and technical features having similar functions (but not limited to) disclosed in the present application are replaced with each other.
Claims (12)
1. A mask for photo-alignment is characterized in that the mask is used for photo-alignment of a substrate, the substrate comprises a pixel area,
the mask comprises a first graph area and a second graph area, the first graph area is used for carrying out optical alignment on the substrate in a first illumination direction, the first graph area comprises a first light transmission area extending along a set direction, the first light transmission area is arranged uninterruptedly,
the second pattern area is used for carrying out optical alignment on the substrate in a second illumination direction, and comprises second light transmission areas and light shielding areas which are alternately arranged along a set direction.
2. The mask for photoalignment according to claim 1, wherein the set direction is a length direction or a width direction of the mask.
3. The mask for photoalignment according to claim 1, wherein a sum of widths of the second light-transmitting region and the light-shielding region is equal to or greater than a length of one sub-pixel in the pixel region.
4. The mask for photoalignment according to claim 1, wherein a sum of widths of the second light-transmitting region and the light-shielding region is equal to or greater than a width of one sub-pixel in the pixel region.
5. The photoalignment mask according to any of claims 1 to 4, wherein the length of the first pattern area is not smaller than the length of the second pattern area, and the width of the first pattern area is equal to the width of the second pattern area.
6. A photoalignment method of a display panel, characterized in that the photoalignment mask according to any one of claims 1 to 5 is used.
7. The method according to claim 6, wherein the display panel comprises a substrate to be photoaligned, the substrate to be photoaligned comprises a plurality of sub-pixel regions distributed in an array, each sub-pixel region is divided into a plurality of exposure regions arranged along a set direction,
according to the first target alignment force direction of each exposure area, respectively carrying out first exposure alignment on the corresponding exposure area, wherein the first exposure alignment is implemented through a first pattern area of the photo-alignment mask,
and respectively carrying out second exposure alignment on the corresponding exposure areas according to the second target alignment force direction of each exposure area, wherein the second exposure alignment is implemented through a second pattern area of the photo-alignment mask.
8. The photoalignment method of a display panel according to claim 7, wherein the illumination intensity of the second exposure alignment is greater than the illumination intensity of the first exposure alignment.
9. The photoalignment method of a display panel according to claim 7, wherein a scanning direction of the first exposure alignment is opposite to a scanning direction of the second exposure alignment.
10. The photoalignment method according to claim 7, wherein the display panel comprises a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer disposed between the first substrate and the second substrate,
the substrate to be optically aligned is the first substrate and/or the second substrate.
11. A display panel, comprising: a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer disposed between the first substrate and the second substrate, at least one of the first substrate and the second substrate being manufactured using the photoalignment method according to any one of claims 6 to 10.
12. A display device comprising the display panel of claim 11.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310288168.6A CN116256918A (en) | 2023-03-22 | 2023-03-22 | Mask for optical alignment, optical alignment method, display panel and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310288168.6A CN116256918A (en) | 2023-03-22 | 2023-03-22 | Mask for optical alignment, optical alignment method, display panel and device |
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| Publication Number | Publication Date |
|---|---|
| CN116256918A true CN116256918A (en) | 2023-06-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310288168.6A Pending CN116256918A (en) | 2023-03-22 | 2023-03-22 | Mask for optical alignment, optical alignment method, display panel and device |
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| Country | Link |
|---|---|
| CN (1) | CN116256918A (en) |
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2023
- 2023-03-22 CN CN202310288168.6A patent/CN116256918A/en active Pending
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