CN116251803B - Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method - Google Patents
Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method Download PDFInfo
- Publication number
- CN116251803B CN116251803B CN202310386263.XA CN202310386263A CN116251803B CN 116251803 B CN116251803 B CN 116251803B CN 202310386263 A CN202310386263 A CN 202310386263A CN 116251803 B CN116251803 B CN 116251803B
- Authority
- CN
- China
- Prior art keywords
- vacuum
- cleaning
- microwave
- mounting plate
- reverse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/083—Removing scrap from containers, e.g. removing labels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Drying Of Semiconductors (AREA)
Abstract
The invention discloses graphite boat cleaning equipment for cleaning a silicon nitride coating based on a microwave plasma dry method, which comprises a mounting frame, wherein a cleaning bin is arranged in the mounting frame, a plurality of microwave modules are arranged on the cleaning bin, the cleaning bin is communicated with a vacuum pump through a vacuum conduit, a vacuum gauge is arranged on the cleaning bin, a vacuum breaking valve and a baffle valve are arranged on the vacuum conduit, cavity doors are respectively arranged on two sides of the cleaning bin, the cavity doors are rotatably connected with the cleaning bin, adjacent microwave modules are respectively connected through a shunt conduit, one end of the shunt conduit, which is far away from the microwave modules, is connected with an inflator pump, each microwave module and the cleaning bin are respectively and electrically connected with a control microcomputer through wires, a plurality of protection plates are arranged on the mounting frame, each protection plate is respectively and rotatably connected with the mounting frame, and a plurality of heat dissipation fans are arranged on the protection plates close to the top end of the mounting frame.
Description
Technical Field
The invention relates to the technical field of graphite boat cleaning, in particular to graphite boat cleaning equipment for cleaning a silicon nitride coating based on a microwave plasma dry method.
Background
The graphite boat is a graphite container like a boat, is used as a production mould of the photovoltaic industry like a box, is called a graphite boat because the shape looks like a boat, is commonly called a graphite mould, is a carrier, can be used for placing raw materials and parts which need to be positioned or shaped together in the graphite mould for high-temperature sintering and forming, and is formed by machining artificial graphite, so the graphite mould is sometimes called a graphite boat, and is also called a graphite boat.
However, before or after the graphite boat is used, a large amount of silicon nitride coating exists on the surface layer, in order to avoid the influence of the coating on the next production work, the silicon nitride coating is usually removed, the main process for removing the silicon nitride coating by the graphite boat in the photovoltaic industry is wet-process removal, the conventional wet-process coating removal process has the defects of large equipment occupation area, long treatment time and environmental pollution caused by a large amount of waste liquid generated in the whole wet-process treatment process, and engineers begin to explore a dry-process removal means for removing the silicon nitride coating of the graphite boat and avoiding the pollution problem.
Disclosure of Invention
The invention aims to provide graphite boat cleaning equipment for cleaning a silicon nitride coating based on a microwave plasma dry method, so as to solve the problems in the background technology.
In order to solve the technical problems, the invention provides the following technical scheme: graphite boat cleaning equipment based on microwave plasma dry cleaning silicon nitride coating.
The cleaning equipment comprises a mounting frame, a cleaning bin is arranged in the mounting frame, a plurality of microwave modules are arranged on the cleaning bin, the cleaning bin is communicated with a vacuum pump through a vacuum conduit, a vacuum gauge is arranged on the cleaning bin, a vacuum breaking valve and a baffle valve are arranged on the vacuum conduit, cavity doors are respectively arranged on two sides of the cleaning bin and are in rotary connection with the cleaning bin, adjacent microwave modules are respectively connected through a shunt conduit, one end of each shunt conduit, which is far away from the microwave module, is connected with an air pump, each microwave module and the cleaning bin are respectively electrically connected with a control microcomputer through a wire, a plurality of protection plates are arranged on the mounting frame, each protection plate is respectively and rotatably connected with the mounting frame, a plurality of cooling fans are arranged on the protection plates close to the top end of the mounting frame, products to be processed are placed into a vacuum cavity, the vacuum cavity doors are closed, the cleaning bin reaches the required vacuum environment under the action of the vacuum pump, high-density and stable microwave plasma can be obtained after the process gas passes through the microwave modules, the microwave plasma can enter the cleaning bin, chemical reaction can be generated in the high-density microwave plasma environment, finally, the silicon nitride coating on the graphite can be subjected to chemical reaction can be formed, and finally, after the reaction can be discharged out of the vacuum pump through the vacuum pump, the vacuum pump can be connected with the vacuum pump through the protection plate, the vacuum pump can be connected with the vacuum pump, the vacuum pump can be cooled down, and the vacuum pump can be simultaneously, and the vacuum-cooled down, and the vacuum equipment can be connected with the vacuum pump can be cooled, and the vacuum-down, and the vacuum equipment can be cooled, and the vacuum device can be simultaneously, and the vacuum-cooled, and the vacuum equipment can be well be cooled, and the vacuum equipment can be cooled.
The microwave module comprises microwave generators, an isolator is arranged on each microwave generator, a water load assembly is arranged on the isolator, a three-pin tuner is arranged on the isolator, a corner waveguide is arranged at one end, far away from the isolator, of the three-pin tuner, a feed box is arranged on the corner waveguide, a plurality of radiators are arranged in the feed box, a process air inlet is arranged on the feed box, the feed box is communicated with an inflator through a shunt conduit, a short-circuiting device is arranged on the feed box, an air outlet of the feed box is communicated with a cleaning bin, the microwave generators are sequentially started to generate microwaves, the microwaves pass through the isolator, the water load, the three-pin tuner and the feed box, and are fed into a vacuum cavity from a microwave feed inlet, process gas is evenly shunted into the microwave module from an air inlet shunt network, the process gas enters the cavity from the feed box, the process gas can be ionized to generate microwave plasma, the water load can absorb reflected power of the microwaves, the electromagnetic wave energy can be totally reflected back to the microwave inlet, the microwave power is concentrated to the microwave inlet, and the reflected power is finally eliminated through the three-pin tuner to change the impedance value of the load, so that the reflected power is finally, and the microwave density is stable, so that the microwave matching effect is achieved.
The cleaning bin comprises a vacuum cavity and a cavity door, the cavity door is rotationally connected with the vacuum cavity through a rotating shaft, a plurality of flow dividing sheets are arranged at the bottom end of the vacuum cavity, each flow dividing sheet is detachably connected with the inner wall of the vacuum cavity, the bottom end of the vacuum cavity is communicated with a vacuum guide pipe, a moving assembly is arranged in the vacuum cavity and arranged on the inner wall of the vacuum cavity, a moving motor is arranged on the vacuum cavity, the output end of the moving motor penetrates through the vacuum cavity and is connected with the moving assembly, after microwave plasma enters the vacuum cavity, the microwave plasma cleans a silicon nitride layer on a graphite boat, after the microwave plasma is cleaned, the microwave plasma enters the vacuum tube with cleaned chips, in order to enable the chips to be completely separated, the moving assembly shakes with the graphite boat under the action of the moving motor, the shaking graphite boat chips can be separated more easily, and meanwhile the mobility of the microwave plasma can be increased, so that the reaction is more complete.
The movable assembly comprises a mounting plate and a locking frame, wherein the mounting plate is in sliding connection with the vacuum cavity, teeth are arranged at the bottom end of the mounting plate, the locking frame is arranged on the mounting plate and in sliding connection with the mounting plate, a spherical gear is arranged at the output end of the movable motor, the teeth on the mounting plate are connected with the spherical gear, a shaking slide way is arranged on the inner wall of the vacuum cavity, the two sides of the mounting plate are respectively embedded into the shaking slide way and in sliding connection with the shaking slide way, the movable motor drives the spherical gear to rotate, the spherical gear is always meshed with the mounting plate, so that the movable motor can drive the mounting plate to move, after the graphite boat is placed on the mounting plate, the locking frame locks the graphite boat, then the graphite boat is conveyed into a cleaning box to be cleaned, the movable motor drives the mounting plate to move in the shaking slide way, and the inclined shaking effect is generated, so that the graphite boat can be cleaned more thoroughly in the vacuum cavity.
The graphite boat is characterized in that a movable roller is arranged on the locking frame, the movable roller is rotationally connected with the locking frame, a locking groove is formed in the locking frame, a locking key is arranged on the mounting plate and is in sliding connection with the mounting plate, the locking frame is in intermittent sliding contact with the locking groove, buffer seats are respectively arranged on two sides of the mounting plate and are respectively in sliding connection with the mounting plate, buffer springs are arranged between the buffer seats and the mounting plate, two ends of each buffer spring are respectively connected with the mounting plate and the buffer seats, in the shaking process, in order to increase the area of chemical reaction, the installation position of the movable roller is cleaned, after the installation is completed, the locking key is pressed, the locking key is clamped into the locking groove, so that the locking frame is fixed, the movable roller is rotated along with the locking groove in the shaking process of the graphite boat, so that the graphite boat is kept in a clamping state at all times, the buffer seats slide on the mounting plate, and the buffer springs are propped against the buffer seats, so that the graphite boat is sufficiently buffered.
The feed box is characterized in that a connecting pipe is arranged on the air outlet of the feed box, an anti-reverse ring is arranged in the connecting pipe, an anti-reverse shaft is arranged on the anti-reverse ring, an anti-reverse turbine is arranged on the anti-reverse shaft and is in rotary connection with the anti-reverse shaft, an anti-reverse groove is arranged on the anti-reverse turbine, an anti-reverse spring piece is in sliding contact with the anti-reverse groove, in order to avoid the problem that the cleaned plasma is in countercurrent, after the microwave plasma comes out of the feed box, the anti-reverse turbine in the feed box rotates under the action of the microwave plasma flow, and the anti-reverse turbine rotates unidirectionally under the action of the anti-reverse shaft and the anti-reverse spring piece, so that the effect of preventing countercurrent is achieved.
Be provided with distribution pipeline on the connecting pipe, be provided with the gas row on the distribution pipeline, be provided with a plurality of gas leaves in the gas row of dividing, gas leaf and distribution pipeline swivelling joint divide the gas leaf to be connected through driving belt, be provided with a plurality of gas holes on the gas row of dividing, be provided with the heating screen panel in the gas hole, the heating screen panel passes through wire and feeder box electric connection, when carrying out microwave plasma distribution, microwave plasma first enters into in the distribution pipeline, under vacuum pump and distribution pipeline's effect, gas leaf will rotate to reach the omnidirectional drainage effect, avoid single direction of giving vent to anger, lead to graphite boat to appear wasing omission or the problem that washs the dynamics is not enough, the heating screen panel can compensate microwave plasma's heat loss in the flow in-process simultaneously.
The vacuum conduit is provided with a heat exchange conduit, the heat exchange conduit is wound on the vacuum conduit, the vacuum conduit is provided with a heat exchange groove, the heat exchange conduit is embedded into the heat exchange groove, two ends of the heat exchange conduit are communicated with the diversion conduit and the inflator pump, the vacuum conduit is provided with a filter cavity, a vacuum filter screen is arranged in the filter cavity, the vacuum filter screen and the filter cavity are of a detachable connection structure, and in the process of vacuumizing, the cleaned microwave plasma can enter the vacuum conduit, so the vacuum conduit has a certain amount of heat, the heat of the microwave plasma can be transferred onto the vacuum conduit and indirectly transferred onto the heat exchange conduit, the heat exchange conduit can transfer the heat to the process gas which is not ionized yet, the gas entering the feeder box can be fully ionized effectively, and the heating efficiency of the gas is increased.
The installation frame bottom is provided with a plurality of removal wheels, is provided with the locking slider on every removal wheel respectively, and every locking slider is connected with the removal wheel slip that corresponds respectively, and locking slider bottom is provided with anti-skidding rubber sheet, is provided with the removal voussoir on the installation frame, removes voussoir and installation frame sliding connection, removes voussoir and locking slider sliding contact, when the in-process of wasing and material loading, will lock the slider and slide towards ground, and anti-skidding rubber sheet will support ground for locking slider no longer appears removing, simultaneously, will remove the voussoir and press to in the installation frame, will fix locking slider, make locking slider can not easily take place to deflect, thereby make the installation frame no longer take place the problem of removal.
Compared with the prior art, the invention has the following beneficial effects: 1. the method adopts a microwave plasma dry method to remove the graphite boat, adopts plasma gas to chemically separate the silicon nitride coating on the graphite boat, and can also recover the gas, thereby reducing the pollution to the environment and reducing the damage to the graphite boat.
2. The invention adopts the assembled moving component, can lead the graphite boat to shake and swing in the cleaning bin, thereby leading the graphite boat to shake and swing along with the graphite boat, during the shake process, the graphite boat and the mounting plate can disturb microwave plasma, the graphite boat can fully contact with the microwave plasma, simultaneously, some silicon nitride coating to be separated can be separated in time, the removal efficiency is increased,
3. the invention adopts the gas dispersing structure, so that microwave plasmas can be more uniformly dispersed in the vacuum cavity, the graphite boat can be contacted with the same microwave plasmas everywhere, the problem of cleaning carry-over can be fully avoided, and the damage to the graphite boat body caused by concentrated gas distribution is avoided.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:
FIG. 1 is a schematic three-dimensional structure of the present invention;
FIG. 2 is a schematic view of the internal structure of the mounting frame of the present invention;
FIG. 3 is a schematic view of a microwave module structure according to the present invention;
FIG. 4 is a schematic diagram of the outlet structure of the feed box of the present invention;
FIG. 5 is a schematic view of the internal structure of the cleaning bin of the invention;
FIG. 6 is a schematic view showing the internal structure of the connecting pipe according to the present invention;
FIG. 7 is a schematic diagram of the structure of the cooperation relationship between the anti-reverse ring and the connecting pipe;
FIG. 8 is a schematic view of the structure of FIG. 2, partially enlarged A;
FIG. 9 is a schematic view of a vacuum catheter of the present invention in partial cross-section;
in the figure: 1. a mounting frame; 2. cleaning a bin; 201. a vacuum chamber; 203. a diverter blade; 204. shaking the slideway; 3. a microwave module; 301. a microwave generator; 302. an isolator; 303. a water load assembly; 304. a three pin adapter; 305. turning the waveguide; 306. a feed box; 308. a heat sink; 309. a process air inlet; 310. a short-circuiting device; 311. a connecting pipe; 312. an anti-reverse ring; 313. an anti-reverse shaft; 314. an anti-reverse turbine; 315. an anti-reverse spring plate; 316. a distribution pipe; 317. dividing and discharging air; 318. a gas-dividing fan blade; 319. an air dividing hole; 320. heating the net cover; 4. a vacuum pump; 5. a vacuum gauge; 6. a vacuum conduit; 601. a heat exchange tank; 602. a filter chamber; 603. a vacuum filter screen; 9. a shunt catheter; 10. a control microcomputer; 11. a protection plate; 12. a heat radiation fan; 13. a moving assembly; 1301. a mounting plate; 1302. a locking frame; 1303. moving the roller; 1304. a buffer seat; 1305. a buffer spring; 1306. a locking key; 14. a moving motor; 1401. a spherical gear; 15. a heat exchange conduit; 16. a moving wheel; 17. a locking slide; 18. an anti-slip rubber sheet; 19. moving the wedge; 20. a cavity door.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The cleaning equipment comprises a mounting frame 1, a cleaning bin 2 is arranged in the mounting frame 1, a plurality of microwave modules 3 are arranged on the cleaning bin 2, the cleaning bin 2 is communicated with a vacuum pump 4 through a vacuum conduit 6, a vacuum gauge 5 is arranged on the cleaning bin 2, a vacuum breaking valve and a baffle valve are arranged on the vacuum conduit 6, two sides of the cleaning bin 2 are respectively provided with a cavity door 20, the cavity door 20 is rotationally connected with the cleaning bin 2, adjacent microwave modules 3 are respectively connected through a shunt conduit 9, one end of the shunt conduit 9, far away from the microwave modules 3, is connected with an inflator pump, each microwave module 3 and the cleaning bin 2 are respectively and electrically connected with a control microcomputer 10 through wires, a plurality of protection plates 11 are arranged on the mounting frame 1, each protection plate 11 is respectively rotationally connected with the mounting frame 1, a plurality of cooling fans 12 are arranged on the protection plates 11 close to the top end of the mounting frame 1, products to be processed are put into the vacuum cavity, closing the cavity door, enabling the cleaning bin to reach a required vacuum environment under the action of the vacuum pump, enabling process gas to obtain high-density and stable microwave plasma after passing through the microwave module, enabling the microwave plasma to enter the cleaning bin, enabling the silicon nitride coating on the graphite boat to undergo chemical reaction to form gas in the high-concentration microwave plasma environment, finally exhausting the reacted gas out of the cavity through the vacuum pump continuously, achieving the effect of removing the silicon nitride coating on the graphite boat, protecting and supporting internal equipment by the protection plate, simultaneously enabling the internal cleaning bin and other parts to be cooled timely, enabling the baffle valve to be responsible for switching off and switching on a vacuum connecting pipeline between the cleaning bin and the vacuum pump, and enabling the vacuum breaking valve to be communicated with the cleaning bin and the atmosphere.
The microwave module 3 comprises microwave generators 301, an isolator 302 is arranged on each microwave generator 301, a water load assembly 303 is arranged on the isolator 302, a three-pin tuner 304 is arranged on the isolator 302, a turning waveguide 305 is arranged at one end, far away from the isolator 302, of the three-pin tuner 304, a feed box 306 is arranged on the turning waveguide 305, far away from the three-pin tuner 304, a plurality of radiators 308 are arranged in the feed box 306, a process air inlet 309 is arranged on the feed box 306, the feed box 306 is communicated with an inflator pump through a shunt conduit 9, a short-circuiting device 310 is arranged on the feed box 306, an air outlet of the feed box 306 is communicated with the cleaning bin 2, microwaves are sequentially started to generate microwaves, the microwaves pass through the isolator, the water load, the three-pin tuner and the feed box, the process air flows into the vacuum cavity from the microwave feed inlet, the process air is evenly shunted into the microwave module, the process air enters the cavity from the feed box, and the process air is ionized to generate microwave plasma; the water load can absorb the reflected power of the microwave, the short-circuiting device can reflect the electromagnetic wave energy back to the microwave feed port, the impedance value of the load is changed through the three-pin dispatcher, so that the reflected power is eliminated, the effect of matching the microwave is finally achieved, and therefore high-density and stable microwave plasma is obtained.
The cleaning bin 2 comprises a vacuum cavity 201 and a cavity door 20, the cavity door 20 is rotationally connected with the vacuum cavity 201 through a rotating shaft, a plurality of flow dividing sheets 203 are arranged at the bottom end of the vacuum cavity 201, each flow dividing sheet 203 is detachably connected with the inner wall of the vacuum cavity 201, the bottom end of the vacuum cavity 201 is communicated with a vacuum guide pipe 6, a movable assembly 13 is arranged in the vacuum cavity 201, the movable assembly 13 is arranged on the inner wall of the vacuum cavity 201, a movable motor 14 is arranged on the vacuum cavity 201, the output end of the movable motor 14 penetrates through the vacuum cavity 201 and is connected with the movable assembly 13, after microwave plasma enters the vacuum cavity, the microwave plasma can clean a silicon nitride layer on a graphite boat, after the microwave plasma enters the vacuum cavity, the microwave plasma can bring cleaned chips into a vacuum tube, so that the chips are completely separated, the movable assembly can shake with the graphite boat under the action of the movable motor, the shaking graphite boat chips can be separated more easily, and meanwhile the mobility of the microwave plasma can be increased, so that the reaction is more complete.
The moving assembly 13 comprises a mounting plate 1301 and a locking frame 1302, the mounting plate 1301 is in sliding connection with the vacuum cavity 201, teeth are arranged at the bottom end of the mounting plate 1301, the locking frame 1302 is arranged on the mounting plate 1301, the locking frame 1302 is in sliding connection with the mounting plate 1301, a spherical gear 1401 is arranged at the output end of the moving motor 14, the teeth on the mounting plate 1301 are connected with the spherical gear 1401, a shaking slide 204 is arranged on the inner wall of the vacuum cavity 201, two sides of the mounting plate 1301 are respectively embedded into the shaking slide 204 and are in sliding connection with the shaking slide 204, the moving motor drives the spherical gear to rotate, the spherical gear is always meshed with the mounting plate, so that the moving motor can drive the mounting plate to move, the graphite boat is locked by the locking frame after being placed on the mounting plate, then the graphite boat is fed into a cleaning box to be cleaned, the moving motor drives the mounting plate to move in the shaking slide, and an inclined shaking effect is generated, so that the graphite boat can be cleaned more thoroughly in the vacuum cavity.
The movable roller 1303 is arranged on the locking frame 1302, the movable roller 1303 is rotatably connected with the locking frame 1302, a locking groove is arranged on the locking frame 1302, a locking key 1306 is arranged on the mounting plate 1301, the locking key 1306 is in sliding connection with the mounting plate 1301, the locking frame 1302 is in intermittent sliding contact with the locking groove, buffer seats 1304 are respectively arranged on two sides of the mounting plate 1301, the buffer seats 1304 are respectively in sliding connection with the mounting plate 1301, buffer springs 1305 are arranged between the buffer seats 1304 and the mounting plate 1301, two ends of each buffer spring 1305 are respectively connected with the mounting plate 1301 and the buffer seats 1304, in order to increase the area of chemical reaction in the shaking process, the mounting position of the movable roller is cleaned, after the mounting is completed, the locking key is pressed, the locking key is clamped into the locking groove, so that the locking frame is fixed, in the shaking process of the graphite boat, the movable roller rotates along with the locking groove, so that the graphite boat is kept in a clamping state at all times, the buffer seats slide on the mounting plate, and the buffer springs abut against the buffer seats, so that graphite is sufficiently buffered.
The feed box 306 is provided with connecting pipe 311 on the gas outlet, be provided with anti-reverse ring 312 in the connecting pipe 311, be provided with anti-reverse shaft 313 on the anti-reverse ring 312, be provided with anti-reverse turbine 314 on the anti-reverse shaft 313, anti-reverse turbine 314 and anti-reverse shaft 313 swivelling joint are provided with anti-reverse groove on the anti-reverse shaft 313, be provided with anti-reverse shell fragment 315 on the anti-reverse turbine 314, anti-reverse shell fragment 315 and anti-reverse groove sliding contact, in the abluent in-process, in order to avoid the problem that the gas after wasing takes place against the current, after microwave plasma comes out from the feed box, anti-reverse turbine in the feed box will rotate under the effect of gas flow, anti-reverse turbine carries out unilateral rotation under the effect of anti-reverse shaft and anti-reverse shell fragment, thereby reach the effect that prevents against the current.
The distribution pipeline 316 is arranged on the connecting pipe 311, the distribution pipeline 316 is provided with the distribution row 317, a plurality of distribution blades 318 are arranged in the distribution row 317, the distribution blades 318 are rotationally connected with the distribution pipeline 316, adjacent distribution blades 318 are connected through a transmission belt, a plurality of distribution holes 319 are arranged on the distribution row 317, a heating screen 320 is arranged in the distribution holes 319, the heating screen 320 is electrically connected with the feed box 306 through a wire, when microwave plasma is distributed, the microwave plasma firstly enters the distribution pipeline, the distribution blades rotate under the action of a vacuum pump and the distribution pipeline, so that the omnibearing drainage effect is achieved, the problem that the graphite boat is cleaned in a missing or insufficient cleaning force is avoided, and meanwhile, the heating screen can compensate the heat loss of the microwave plasma in the flowing process.
The vacuum conduit 6 is provided with the heat exchange conduit 15, the heat exchange conduit 15 is wound on the vacuum conduit 6, the vacuum conduit 6 is provided with the heat exchange tank 601, the heat exchange conduit 15 is embedded into the heat exchange tank 601, two ends of the heat exchange conduit 15 are communicated with the shunt conduit 9 and the inflator pump, the vacuum conduit 6 is provided with the filter cavity 602, the filter cavity 602 is internally provided with the vacuum filter screen 603, the vacuum filter screen 603 and the filter cavity 602 are of a detachable connection structure, and in the process of vacuumizing, the cleaned microwave plasma can enter the vacuum conduit, so that the vacuum conduit has certain heat, the heat of the vacuum conduit can be transferred onto the vacuum conduit and indirectly transferred onto the heat exchange conduit, the heat exchange conduit can transfer the heat to the process gas which is not ionized, the gas entering the feed box can be fully ionized effectively, and the heating efficiency of the gas is increased.
The installation frame 1 bottom is provided with a plurality of removal wheels 16, is provided with the locking slider 17 on every removal wheel 16 respectively, and every locking slider 17 respectively with corresponding removal wheel 16 sliding connection, locking slider 17 bottom is provided with anti-skidding sheet rubber 18, is provided with the removal voussoir 19 on the installation frame 1, and removal voussoir 19 and installation frame 1 sliding connection, removal voussoir 19 and locking slider 17 sliding contact, when the in-process of wasing and material loading, will lock the slider and slide towards ground, anti-skidding sheet rubber will support ground for the locking slider no longer appears moving, simultaneously, will move the voussoir and press to the installation frame in, will fix the locking slider for the locking slider can not take place the deflection easily, thereby makes the installation frame no longer take place the problem of removal.
The working principle of the invention is as follows: the product to be processed is placed into the vacuum cavity 201, the cavity door 20 is closed, the vacuum cavity 201 reaches the needed vacuum environment under the action of the vacuum pump 4, the microwave generator 301 is sequentially started to generate microwaves, the microwaves pass through the isolator 302, the water load component 303, the three pin dispenser 304 and the feed box 306, and enter the vacuum cavity 201 from the air outlet of the feed box 306, process gas is uniformly distributed into the microwave module 3 from the air inlet distribution conduit 9, the process gas enters the cavity from the microwave module 3, the process gas is ionized to generate microwave plasma, the water load component 303 can absorb the reflected power of the microwaves, the short-circuiting device 310 can totally reflect the electromagnetic wave energy back to the microwave feed port, the impedance value of the load is changed through the three pin dispenser 304 to eliminate the reflected power, and finally the microwave matching effect is achieved, so that high-density and stable microwave plasma is obtained, and finally, the process gas is discharged into the vacuum cavity 201 through the connecting pipe, the silicon nitride coating on the high-concentration microwave plasma environment is subjected to chemical reaction to form gas, finally, the reaction gas is continuously pumped into the cavity 3, the process gas is ionized to generate microwave plasma, the reflected by the water load component 303 can absorb the reflected power of the microwaves, the electromagnetic wave energy is totally reflected back to the microwave feed port, the reflected power is concentrated to the microwave feed port, the microwave impedance value is changed through the three pin dispenser 304, and finally, the microwave matching effect is achieved, and the microwave plasma is completely, and the effect is achieved.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Finally, it should be noted that: the foregoing description is only a preferred embodiment of the present invention, and the present invention is not limited thereto, but it is to be understood that modifications and equivalents of some of the technical features described in the foregoing embodiments may be made by those skilled in the art, although the present invention has been described in detail with reference to the foregoing embodiments. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. Graphite boat cleaning equipment based on microwave plasma dry cleaning silicon nitride coating, its characterized in that: the cleaning equipment comprises a mounting frame (1), a cleaning bin (2) is arranged in the mounting frame (1), a plurality of microwave modules (3) are arranged on the cleaning bin (2), the cleaning bin (2) is communicated with a vacuum pump (4) through a vacuum conduit (6), a vacuum gauge (5) is arranged on the cleaning bin (2), a vacuum breaking valve and a baffle valve are arranged on the vacuum conduit (6), cavity doors (20) are respectively arranged on two sides of the cleaning bin (2), the cavity doors (20) are rotationally connected with the cleaning bin (2), adjacent microwave modules (3) are respectively connected through a shunt conduit (9), one end, far away from the microwave modules (3), of each shunt conduit (9) is connected with an air pump, each microwave module (3) and each cleaning bin (2) are respectively electrically connected with a control microcomputer (10) through wires, a plurality of protection plates (11) are respectively arranged on the mounting frame (1), and a plurality of heat dissipation fans (12) are respectively arranged on the protection plates (11) close to the top of the mounting frame (1);
the cleaning bin (2) comprises a vacuum cavity (201) and a cavity door (20), the cavity door (20) is rotationally connected with the vacuum cavity (201) through a rotating shaft, a plurality of flow dividing sheets (203) are arranged at the bottom end of the vacuum cavity (201), each flow dividing sheet (203) is detachably connected with the inner wall of the vacuum cavity (201), the bottom end of the vacuum cavity (201) is communicated with a vacuum guide pipe (6), a moving assembly (13) is arranged in the vacuum cavity (201), the moving assembly (13) is arranged on the inner wall of the vacuum cavity (201), a moving motor (14) is arranged on the vacuum cavity (201), and the output end of the moving motor (14) penetrates through the vacuum cavity (201) to be connected with the moving assembly (13);
the movable assembly (13) comprises a mounting plate (1301) and a locking frame (1302), the mounting plate (1301) is in sliding connection with the vacuum cavity (201), teeth are arranged at the bottom end of the mounting plate (1301), the locking frame (1302) is arranged on the mounting plate (1301), the locking frame (1302) is in sliding connection with the mounting plate (1301), a spherical gear (1401) is arranged at the output end of the movable motor (14), the teeth on the mounting plate (1301) are connected with the spherical gear (1401), a shaking slide way (204) is arranged on the inner wall of the vacuum cavity (201), and two sides of the mounting plate (1301) are respectively embedded into the shaking slide way (204) and are in sliding connection with the shaking slide way (204);
the novel anti-theft lock is characterized in that a movable roller (1303) is arranged on the lock frame (1302), the movable roller (1303) is rotationally connected with the lock frame (1302), a locking groove is arranged on the lock frame (1302), a locking key (1306) is arranged on the mounting plate (1301), the locking key (1306) is in sliding connection with the mounting plate (1301), the lock frame (1302) is in intermittent sliding contact with the locking groove, buffer seats (1304) are respectively arranged on two sides of the mounting plate (1301), the buffer seats (1304) are respectively in sliding connection with the mounting plate (1301), buffer springs (1305) are arranged between the buffer seats (1304) and the mounting plate (1301), and two ends of each buffer spring (1305) are respectively connected with the mounting plate (1301) and the buffer seats (1304).
2. The graphite boat cleaning apparatus for cleaning silicon nitride coating based on microwave plasma dry method as claimed in claim 1, wherein: the microwave module (3) comprises a microwave generator (301), an isolator (302) is arranged on each microwave generator (301), a water load assembly (303) is arranged on each isolator (302), a three-pin adjuster (304) is arranged on each isolator (302), a corner waveguide (305) is arranged at one end, far away from each isolator (302), of each three-pin adjuster (304), a feed box (306) is arranged on each corner waveguide (305), a plurality of radiators (308) are arranged in each feed box (306), process air inlets (309) are formed in the feed boxes (306), the feed boxes (306) are communicated with an air pump through shunt pipes (9), short-circuiting devices (310) are arranged on the feed boxes (306), and air outlets of the feed boxes (306) are communicated with a cleaning bin (2).
3. The graphite boat cleaning apparatus for cleaning silicon nitride coating based on microwave plasma dry method as claimed in claim 2, wherein: be provided with connecting pipe (311) on feed case (306) gas outlet, be provided with anti-reverse ring (312) in connecting pipe (311), be provided with anti-reverse axle (313) on anti-reverse ring (312), be provided with anti-reverse turbine (314) on anti-reverse axle (313), anti-reverse turbine (314) and anti-reverse axle (313) swivelling joint, be provided with anti-reverse groove on anti-reverse axle (313), be provided with anti-reverse shell fragment (315) on anti-reverse turbine (314), anti-reverse shell fragment (315) and anti-reverse groove sliding contact.
4. A graphite boat cleaning apparatus for cleaning silicon nitride coating by microwave plasma dry method according to claim 3, characterized in that: be provided with distribution pipeline (316) on connecting pipe (311), be provided with on distribution pipeline (316) and divide gas row (317), be provided with a plurality of minute gas flabellums (318) in dividing gas row (317), divide gas flabellum (318) and distribution pipeline (316) swivelling joint, it is adjacent divide gas flabellum (318) to pass through drive belt and connect, be provided with a plurality of minute gas holes (319) on dividing gas row (317), be provided with heating screen panel (320) in minute gas hole (319), heating screen panel (320) pass through wire and feeder box (306) electric connection.
5. The graphite boat cleaning apparatus for cleaning silicon nitride coating based on microwave plasma dry method as claimed in claim 1, wherein: be provided with heat transfer pipe (15) on vacuum pipe (6), heat transfer pipe (15) twine on vacuum pipe (6), be provided with heat transfer groove (601) on vacuum pipe (6), in heat transfer pipe (15) embedding heat transfer groove (601), heat transfer pipe (15) both ends and reposition of redundant personnel pipe (9), pump intercommunication, be provided with filter chamber (602) on vacuum pipe (6), be provided with vacuum filter screen (603) in filter chamber (602), vacuum filter screen (603) are detachable connection structure with filter chamber (602).
6. The graphite boat cleaning apparatus for cleaning silicon nitride coating based on microwave plasma dry method as claimed in claim 1, wherein: the anti-slip device is characterized in that a plurality of moving wheels (16) are arranged at the bottom end of the mounting frame (1), each moving wheel (16) is provided with a locking slide block (17) respectively, each locking slide block (17) is connected with the corresponding moving wheel (16) in a rotating mode, an anti-slip rubber sheet (18) is arranged at the bottom end of each locking slide block (17), a moving wedge block (19) is arranged on the mounting frame (1), the moving wedge blocks (19) are connected with the mounting frame (1) in a sliding mode, and the moving wedge blocks (19) are in sliding contact with the locking slide blocks (17).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310386263.XA CN116251803B (en) | 2023-04-12 | 2023-04-12 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310386263.XA CN116251803B (en) | 2023-04-12 | 2023-04-12 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116251803A CN116251803A (en) | 2023-06-13 |
| CN116251803B true CN116251803B (en) | 2023-09-22 |
Family
ID=86688155
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310386263.XA Active CN116251803B (en) | 2023-04-12 | 2023-04-12 | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116251803B (en) |
Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1048568A (en) * | 1989-06-28 | 1991-01-16 | 佳能株式会社 | Form the microwave plasma chemical vapor deposition method and the equipment of big area film continuously |
| US5797195A (en) * | 1993-07-26 | 1998-08-25 | Air Products And Chemicals, Inc. | Nitrogen trifluoride thermal cleaning apparatus and process |
| CN201669245U (en) * | 2010-05-04 | 2010-12-15 | 宁波大学 | Plasma washing device |
| CN102397859A (en) * | 2011-11-22 | 2012-04-04 | 镇江大全太阳能有限公司 | Graphite boat (frame) dry-type cleaning machine |
| CN102522358A (en) * | 2011-12-30 | 2012-06-27 | 上海集成电路研发中心有限公司 | Photoresist stripping technical cavity and photoresist stripping method for semiconductor silicon wafer |
| CN108505016A (en) * | 2018-04-08 | 2018-09-07 | 河南佰特科技有限公司 | A kind of deposition method of cvd diamond thick film |
| CN109814339A (en) * | 2017-11-20 | 2019-05-28 | 台湾积体电路制造股份有限公司 | For the equipment of photoetching and the method and apparatus of the electrostatic mask fixing seat of cleaning |
| CN109848127A (en) * | 2019-01-16 | 2019-06-07 | 程春丽 | A kind of coating film on glass cleaning process cradle |
| CN209715929U (en) * | 2019-03-25 | 2019-12-03 | 昆山普乐斯电子科技有限公司 | A kind of plasma chamber conducive to wafer cleaning |
| CN210730444U (en) * | 2019-06-13 | 2020-06-12 | 江苏邑文微电子科技有限公司 | Cleaning mechanism for semiconductor etching equipment chamber |
| CN112725766A (en) * | 2020-12-29 | 2021-04-30 | 理想晶延半导体设备(上海)股份有限公司 | Production method applied to tubular PECVD deposition equipment |
| CN113000487A (en) * | 2021-02-24 | 2021-06-22 | 理想晶延半导体设备(上海)股份有限公司 | Tubular cleaning equipment and photovoltaic coating system |
| CN214052924U (en) * | 2020-11-26 | 2021-08-27 | 博裕明机电(苏州)有限公司 | Vacuum plasma cleaning machine |
| CN214683285U (en) * | 2021-04-15 | 2021-11-12 | 宿迁学院 | Micro-fluidic chip plasma cleaning work cabin structure |
| CN217797812U (en) * | 2022-06-28 | 2022-11-15 | 广东澳地特电气技术有限公司 | Microwave plasma cleaning machine |
| CN115354298A (en) * | 2022-07-05 | 2022-11-18 | 湖南红太阳光电科技有限公司 | PECVD equipment graphite boat cleaning system |
| CN115548163A (en) * | 2022-10-14 | 2022-12-30 | 常州阿普智能科技有限公司 | Reactive ion etching process for cleaning graphite boat for photovoltaic production |
| CN115634882A (en) * | 2022-10-24 | 2023-01-24 | 湖北鼎锐半导体有限公司 | CMP polishing pad cleaning device and cleaning method |
| CN218460338U (en) * | 2022-09-05 | 2023-02-10 | 湖南红太阳光电科技有限公司 | Graphite boat belt cleaning device |
| CN115954406A (en) * | 2022-10-14 | 2023-04-11 | 常州阿普智能科技有限公司 | Microwave plasma dry etching process for cleaning graphite boat for photovoltaic production |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6626185B2 (en) * | 1996-06-28 | 2003-09-30 | Lam Research Corporation | Method of depositing a silicon containing layer on a semiconductor substrate |
| KR100767762B1 (en) * | 2000-01-18 | 2007-10-17 | 에이에스엠 저펜 가부시기가이샤 | A CVD semiconductor-processing device provided with a remote plasma source for self cleaning |
| US6532977B2 (en) * | 2000-03-16 | 2003-03-18 | Bridgestone Corporation | Cleaning vessel and silicon carbide sintered body used therefor |
| US20050211264A1 (en) * | 2004-03-25 | 2005-09-29 | Tokyo Electron Limited Of Tbs Broadcast Center | Method and processing system for plasma-enhanced cleaning of system components |
-
2023
- 2023-04-12 CN CN202310386263.XA patent/CN116251803B/en active Active
Patent Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1048568A (en) * | 1989-06-28 | 1991-01-16 | 佳能株式会社 | Form the microwave plasma chemical vapor deposition method and the equipment of big area film continuously |
| US5797195A (en) * | 1993-07-26 | 1998-08-25 | Air Products And Chemicals, Inc. | Nitrogen trifluoride thermal cleaning apparatus and process |
| CN201669245U (en) * | 2010-05-04 | 2010-12-15 | 宁波大学 | Plasma washing device |
| CN102397859A (en) * | 2011-11-22 | 2012-04-04 | 镇江大全太阳能有限公司 | Graphite boat (frame) dry-type cleaning machine |
| CN102522358A (en) * | 2011-12-30 | 2012-06-27 | 上海集成电路研发中心有限公司 | Photoresist stripping technical cavity and photoresist stripping method for semiconductor silicon wafer |
| CN109814339A (en) * | 2017-11-20 | 2019-05-28 | 台湾积体电路制造股份有限公司 | For the equipment of photoetching and the method and apparatus of the electrostatic mask fixing seat of cleaning |
| CN108505016A (en) * | 2018-04-08 | 2018-09-07 | 河南佰特科技有限公司 | A kind of deposition method of cvd diamond thick film |
| CN109848127A (en) * | 2019-01-16 | 2019-06-07 | 程春丽 | A kind of coating film on glass cleaning process cradle |
| CN209715929U (en) * | 2019-03-25 | 2019-12-03 | 昆山普乐斯电子科技有限公司 | A kind of plasma chamber conducive to wafer cleaning |
| CN210730444U (en) * | 2019-06-13 | 2020-06-12 | 江苏邑文微电子科技有限公司 | Cleaning mechanism for semiconductor etching equipment chamber |
| CN214052924U (en) * | 2020-11-26 | 2021-08-27 | 博裕明机电(苏州)有限公司 | Vacuum plasma cleaning machine |
| CN112725766A (en) * | 2020-12-29 | 2021-04-30 | 理想晶延半导体设备(上海)股份有限公司 | Production method applied to tubular PECVD deposition equipment |
| CN113000487A (en) * | 2021-02-24 | 2021-06-22 | 理想晶延半导体设备(上海)股份有限公司 | Tubular cleaning equipment and photovoltaic coating system |
| CN214683285U (en) * | 2021-04-15 | 2021-11-12 | 宿迁学院 | Micro-fluidic chip plasma cleaning work cabin structure |
| CN217797812U (en) * | 2022-06-28 | 2022-11-15 | 广东澳地特电气技术有限公司 | Microwave plasma cleaning machine |
| CN115354298A (en) * | 2022-07-05 | 2022-11-18 | 湖南红太阳光电科技有限公司 | PECVD equipment graphite boat cleaning system |
| CN218460338U (en) * | 2022-09-05 | 2023-02-10 | 湖南红太阳光电科技有限公司 | Graphite boat belt cleaning device |
| CN115548163A (en) * | 2022-10-14 | 2022-12-30 | 常州阿普智能科技有限公司 | Reactive ion etching process for cleaning graphite boat for photovoltaic production |
| CN115954406A (en) * | 2022-10-14 | 2023-04-11 | 常州阿普智能科技有限公司 | Microwave plasma dry etching process for cleaning graphite boat for photovoltaic production |
| CN115634882A (en) * | 2022-10-24 | 2023-01-24 | 湖北鼎锐半导体有限公司 | CMP polishing pad cleaning device and cleaning method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116251803A (en) | 2023-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101681808B (en) | Regenerating process and regenerating system to regenerate waste slurry from semiconductor wafer manufacturing process | |
| CN210787379U (en) | High-temperature smoldering device for production of regenerated activated carbon | |
| CN116251803B (en) | Graphite boat cleaning equipment for cleaning silicon nitride coating based on microwave plasma dry method | |
| CN106607132A (en) | Smashing and stirring drying all-in-one device for electrode materials of hydrogen storage batteries | |
| CN218410595U (en) | Drying device for producing and processing plywood | |
| CN216288328U (en) | Multi-wafer brushing device | |
| CN115970896A (en) | A tail gas processing apparatus for synthetic ammonia production | |
| KR101022781B1 (en) | Fan filter unit, and substrate treating apparatus with the same | |
| CN110814354A (en) | Multiple preparation facilities of nano-material | |
| US20220203299A1 (en) | Waste Gas Separation and Treatment Apparatus and Control Method Thereof | |
| CN212051090U (en) | Box sludge drying conveyer | |
| CN210788336U (en) | Cartridge cleaning automation device | |
| CN218179555U (en) | Seed processing is with even drying device | |
| CN219083546U (en) | Microwave drying device for crushed polysilicon | |
| CN217103326U (en) | Novel EDI ion exchange ultrapure water preparation device | |
| CN110873535A (en) | Sintering device for photovoltaic panel processing and working method thereof | |
| CN212882693U (en) | Cold water circulation milling machine | |
| CN217947928U (en) | Continuous feeding and discharging device for low-temperature vacuum drying of sludge | |
| CN216860266U (en) | Water circulation cooling device for efficiently producing granules | |
| CN210411526U (en) | Separator of cobaltosic oxide particle | |
| CN213841756U (en) | Efficient heating equipment for producing inorganic non-metallic materials | |
| CN213886526U (en) | Reducing mechanism is used in granulator workshop | |
| CN217465231U (en) | Drying device is used in polyimide film production | |
| CN218397571U (en) | Surface layer polishing machine is used in production of antibiotic carbonization bamboo core | |
| CN216205051U (en) | Integrative equipment of drying is washd to polycrystalline silicon |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |