CN116200713B - Target structure and sputtering coating machine - Google Patents
Target structure and sputtering coating machine Download PDFInfo
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- CN116200713B CN116200713B CN202310491295.6A CN202310491295A CN116200713B CN 116200713 B CN116200713 B CN 116200713B CN 202310491295 A CN202310491295 A CN 202310491295A CN 116200713 B CN116200713 B CN 116200713B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
- B08B5/023—Cleaning travelling work
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a target structure and a sputtering coating machine with the same, comprising a twin target, wherein the twin target comprises two cylinder targets which are arranged in parallel left and right and can rotate relatively, a first gap is arranged between the two cylinder targets, and a magnet is arranged in the cylinder targets; the target structure also comprises a fairing and two air knives; the two cylindrical targets are positioned in the fairing, the front side of the fairing is provided with a strip-shaped sputtering opening, the fairing is provided with two strip-shaped air inlets, and the two strip-shaped air inlets are respectively positioned at the left side and the right side of the strip-shaped sputtering opening; the two air knives are arranged outside the fairing and respectively correspond to the corresponding strip-shaped air inlets, and the strip-shaped air knife edges of the air knives incline backwards towards the target surface of the corresponding cylinder target; and a second gap is respectively arranged between the two cylindrical targets and the fairing. The invention not only can effectively remove dust impurities adsorbed on the surface of the twin target, but also can make sputtering more uniform and improve the utilization rate of process gas and the stability of discharge.
Description
Technical Field
The invention relates to the technical field of coating, in particular to a target structure and a sputtering coating machine.
Background
Sputtering is a vacuum coating technique in which ions formed after discharge ionization of a process gas (e.g., argon) bombard the surface of a target, and atoms of the target are knocked out and deposited on a substrate (e.g., a glass substrate).
In the existing sputtering coating equipment, a twin target is used as the most common target structure of a sputtering target for production, two cylindrical targets which are arranged in parallel are adopted, and a magnet for improving discharge stability is arranged in the cylindrical targets; when the sputtering target works, intermediate frequency voltage is applied between the two cylindrical targets to discharge, so that process gas is ionized to form ions bombarding the surface of the target, and the sputtering target with the target position structure is suitable for coating films of large substrates or multiple substrates because the axial length of the cylindrical targets is very long, and the two cylindrical targets can be driven by a motor to do slow rotary motion, so that the target is uniformly consumed, and the utilization rate of the target is effectively improved.
However, when the sputtering target adopting the target structure is used for coating, the nozzle of the process gas is generally arranged between two cylindrical targets, and the process gas is generally in a low vacuum (the vacuum degree is 0.05-1 Pa) environment in the working process, so that the process gas is very little collided with each other (the average free path of the gas is a plurality of centimeters) molecular flow, therefore, the process gas is difficult to stay on the surfaces of the cylindrical targets after being sprayed, only a small part of the process gas can be ionized, and most of the process gas escapes to other positions of a vacuum chamber, thereby not only reducing the utilization rate of the process gas, but also reducing the discharge stability, and finally causing the problems of uneven thickness of the film and the like easily occurring in the coating.
In addition, dust is easily adsorbed on the surface of the cylindrical target due to static electricity when the cylindrical target is not in operation, and the dust can influence sputtering on the surface of the cylindrical target when in operation, for example, the sputtering rate of the target where the dust is located is reduced, and finally the surface of the cylindrical target is in a tumor shape, so that the service life of the sputtering target is reduced.
Disclosure of Invention
The technical problem to be solved by the invention is to provide a target structure and a sputtering coating machine, which not only can effectively remove dust impurities adsorbed on the surface of a twin target and avoid the influence of the dust impurities on the sputtering process, but also can make the sputtering more uniform and improve the utilization rate of process gas and the stability of discharge. The technical scheme adopted is as follows:
the target structure comprises a twin target, wherein the twin target comprises two cylindrical targets which are arranged in parallel left and right and can rotate relatively, the axis of each cylindrical target is in an up-down direction, a first gap is formed between the two cylindrical targets, and a magnet is arranged in each cylindrical target; the method is characterized in that: the target structure also comprises a fairing and two air knives; the two cylindrical targets are positioned in the inner cavity of the fairing, the front side of the fairing is provided with a strip-shaped sputtering opening for exposing the target surfaces of the two cylindrical targets, the fairing is also provided with two strip-shaped air inlets which are respectively positioned at the left side and the right side of the strip-shaped sputtering opening, and the strip-shaped air inlets extend along the up-down direction; the two air knives are arranged outside the fairing and respectively correspond to the corresponding strip-shaped air inlets, and the strip-shaped air knife edges of the air knives incline backwards towards the target surface of the corresponding cylinder target; a second gap is formed between the two cylindrical targets and the fairing, and the second gap forms a gas flow guide section from the strip-shaped air inlet to the first gap; the first gap constitutes a gas return section.
As a preferable scheme of the invention, the width of the second gap gradually increases from the strip-shaped air inlet to the first gap.
Generally, the air knife is provided with an inner cavity and a strip-shaped air knife edge communicated with the inner cavity, the inner cavity of the air knife is communicated with an air outlet of a compressed air source through an air path component, the compressed air source can input high-pressure air (such as compressed air and high-pressure nitrogen) and process air (such as argon) into the inner cavity of the air knife through the air path component, and the air knife can be switched by a valve, so that the air knife can spray high-pressure air in a cleaning mode, and can spray process air in a working mode, and the process air can clean residual cleaning air, so that the purity of the air is ensured.
Before sputtering, a cleaning mode can be started in advance to clean the target surface of the cylindrical targets, in the cleaning mode, a compressed air source inputs high-pressure air into the inner cavities of the two air knives, and then the air knives spray the high-pressure air to the target surfaces of the two cylindrical targets through the strip-shaped air knives, because the strip-shaped air knives of the air knives incline towards the corresponding cylindrical target surfaces and are matched with the rotary motion of the cylindrical targets, the high-pressure air can be sprayed to the target surfaces of the cylindrical targets more uniformly to remove dust impurities adsorbed by the target surfaces of the cylindrical targets, the high-pressure air sprayed by the air knives is viscous flow, turbulence and impurity flow formed after acting on the cylindrical targets are decelerated in a gas diversion section and gradually become advection, longitudinal turbulence is reduced, dust adsorbed on the sputtering cylindrical targets is finally and stably floated in the air and is effectively carried out, the influence of dust on the twin targets is prevented, the influence of dust impurities on the sputtering process is avoided, the utilization rate of the targets is improved, the uniformity of sputtering targets is improved, and the target cleaning efficiency is improved.
In a sputtering working mode, under a low vacuum (the vacuum degree is 0.05-1 Pa), the process gas is sprayed out from a strip-shaped air knife edge of the air knife and then is presented as molecular flow, and the process gas presenting the molecular flow makes mutual reflection movement between the target surface of the cylinder target and the inner side surface of the rectifying section (finally, the gas passes through the gas diversion section) because the strip-shaped air knife edge of the air knife is inclined towards the corresponding cylinder target surface; the width of the second gap gradually increases from the strip-shaped air inlet to the first gap, namely, the gas flow guide section is gradually expanded in arc shape relative to the target surface of the cylindrical target, so that the process gas finally has a larger tangential motion component relative to the target surface (rather than escaping from the target surface along the normal direction) on the sputtering area, and the process gas is extremely easy to capture by the magnetic field of the magnet after being ionized, thereby improving the utilization rate of the process gas, ensuring that the sputtering process is more stable, the plasma discharge can be better maintained, the sputtering rate is better maintained, and the distribution of the process gas in the longitudinal direction (Z axis) is very uniform, and the uniformity of the coating film is improved.
As a preferable scheme of the invention, the fairing comprises two arc-shaped cover bodies which are symmetrically arranged left and right, the rear side edges of the two arc-shaped cover bodies are connected, the strip-shaped sputtering opening is formed between the front side edges of the two arc-shaped cover bodies, and the two cylindrical targets are respectively positioned in the corresponding arc-shaped cover bodies; the second gap is formed between the inner surface of the arc-shaped cover body and the target surface of the cylindrical target.
As the preferable scheme of the invention, the target structure also comprises a bottom plate and a top plate, wherein the bottom plate and the top plate are respectively arranged at the lower end and the upper end of the fairing; the air knife is arranged between the bottom plate and the top plate, and two ends of the air knife are respectively connected with the bottom plate and the top plate. The bottom plate and the top plate are used for fixing the fairing and the two air knives and form an upper and lower closed structure of the fairing, and the inner side surfaces of the bottom plate, the top plate and the two arc-shaped cover bodies jointly enclose an inner cavity of the fairing.
As a further preferable scheme of the invention, the upper end of the cylindrical target is provided with a central shaft which is rotatably arranged on the top plate; the magnet is strip-shaped and the lower end of the magnet is arranged on the bottom plate, and the magnet is inserted into the cylindrical target from the opening at the lower end of the cylindrical target. Generally, the central shafts of the two cylindrical targets are in transmission connection with a motor through a transmission mechanism, so that the two cylindrical targets are driven to perform relative rotation (generally at the same speed); the magnet is strip-shaped and is inserted into the cylindrical target from the opening at the lower end of the cylindrical target, so that a magnetic field can be provided for sputtering, and the stability of discharge is ensured.
As a further preferable scheme of the invention, the cross section of the magnet is V-shaped, the V-shaped opening of the magnet faces away from the gas diversion section, and the two side sections of the magnet are respectively N pole and S pole. The magnet can thereby form a magnetic field in the region of the outer side of the cylinder target facing away from the gas-guiding section (i.e. the sputtering zone), so that the process gas is extremely easily captured by the magnetic field of the magnet after being ionized.
As a preferable scheme of the invention, the target structure further comprises two positioning wheel sets, each positioning wheel set comprises at least two positioning wheels, and each positioning wheel is rotatably arranged on the bottom plate and the axis of each positioning wheel is in an up-down trend; the two positioning wheel sets are in one-to-one correspondence with the two cylindrical targets, each positioning wheel of each positioning wheel set is positioned at the inner side of the corresponding cylindrical target, and the wheel surface of each positioning wheel is in rolling fit with the inner side wall of the cylindrical target. The two positioning wheel sets are respectively arranged on the inner sides of the corresponding cylindrical targets, the wheel faces of the positioning wheels of the positioning wheel sets are in rolling fit with the inner side walls of the cylindrical targets, and when the cylindrical targets do rotary motion around the axis of the cylindrical targets, the positioning wheels of the positioning wheel sets roll relative to the inner side walls of the cylindrical targets, so that the lower ends of the cylindrical targets can be positioned, the positions of the positioning wheel sets are stable, and the cylindrical targets are prevented from being blown off under the action of wind force.
As a preferable mode of the invention, the air knife is provided with a strip-shaped inner cavity extending along the up-down direction; the target structure further comprises two air path components, the two air path components are in one-to-one correspondence with the two air knives, each air path component comprises an air inlet pipe, two first shunt pipes and four second shunt pipes, the first ends of the two first shunt pipes are connected and communicated with the second end of the air inlet pipe, the two second shunt pipes are connected and communicated with the second end of one first shunt pipe, the other two second shunt pipes are connected and communicated with the second end of the other first shunt pipe, and the second end openings of the four first shunt pipes are sequentially arranged from top to bottom and are communicated with the strip-shaped inner cavity. Therefore, the pressure intensity of the strip-shaped inner cavity of the air knife can be ensured to be uniform, and the air injection uniformity of the air knife is further improved.
The invention also provides a sputtering coating machine, which is characterized in that: comprising the target structure.
Compared with the prior art, the invention has the following advantages:
according to the target structure and the sputtering coating machine, the fairings are arranged on the outer sides of the two cylindrical targets, and the air knife is used for replacing the nozzle, so that dust impurities adsorbed on the target surface of the twin targets can be effectively removed, the influence of the dust impurities on the sputtering process is avoided, the sputtering is more uniform, and the utilization rate of process gas and the discharge stability are improved.
Drawings
Fig. 1 is a schematic structural view of a target structure according to a preferred embodiment of the present invention.
FIG. 2 is a schematic illustration of the target structure of FIG. 1 in a separated state.
FIG. 3 is a schematic diagram of the target structure of FIG. 1 in a purge mode with gas viscous flow.
Fig. 4 is a schematic diagram of the gas molecular flow of the target structure of fig. 1 in a sputtering mode of operation.
Detailed Description
As shown in fig. 1-4, such a target structure 100 comprises a twin target 1, a fairing 2 and two air knives 3; the twin target 1 comprises two cylindrical targets 11 which are arranged side by side left and right and can rotate relatively, the axis of each cylindrical target 11 is in an up-down trend, a first gap 101 is formed between the two cylindrical targets 11, and a magnet 4 is arranged inside each cylindrical target 11; the two cylindrical targets 11 are positioned in the inner cavity of the fairing 2, the front side of the fairing 2 is provided with a strip-shaped sputtering opening 201 for exposing the target surfaces of the two cylindrical targets 11, the fairing 2 is also provided with two strip-shaped air inlets 202, the two strip-shaped air inlets 202 are respectively positioned at the left side and the right side of the strip-shaped sputtering opening 201, and the strip-shaped air inlets 202 extend along the up-down direction; the two air knives 3 are arranged outside the fairing 2 and respectively correspond to the corresponding strip-shaped air inlets 202, the air knives 3 are provided with strip-shaped inner cavities 301 and strip-shaped air knife edges 302 communicated with the strip-shaped inner cavities 301, the strip-shaped inner cavities 301 and the strip-shaped air knife edges 302 extend in the up-down direction, and the strip-shaped air knife edges 302 are positioned inside the strip-shaped air inlets 202 and incline backwards towards the target surfaces of the corresponding cylindrical targets 11; a second gap 203 is respectively arranged between the two cylindrical targets 11 and the fairing 2, the width of the second gap 203 gradually increases from the strip-shaped air inlet 202 to the first gap 101, and the second gap 203 forms a gas flow guiding section 20 from the strip-shaped air inlet 202 to the first gap 101; the first gap 101 constitutes the gas return section 30.
In this embodiment, the fairing 2 includes two arc-shaped cover bodies 21 symmetrically arranged left and right, the rear sides of the two arc-shaped cover bodies 21 are connected, a strip-shaped sputtering opening 201 is formed between the front sides of the two arc-shaped cover bodies 21, and the two cylinder targets 11 are respectively located in the corresponding arc-shaped cover bodies 21; a second gap 203 is formed between the inner surface of the arcuate shroud 21 and the target surface of the cylindrical target 11.
In the present embodiment, the lower and upper ends of the cowling 2 are respectively provided with a bottom plate 22 and a top plate 23, and the air knife 3 is disposed between the bottom plate 22 and the top plate 23 and both ends thereof are respectively connected to the bottom plate 22 and the top plate 23. The bottom plate 22 and the top plate 23 are used for fixing the cowling 2 and the two air knives 3, and form an upper and lower closed structure for the cowling 2.
In this embodiment, the upper end of the cylindrical target 11 is provided with a central shaft 12, and the central shaft 12 is rotatably mounted on a top plate 23; the magnet 4 is strip-shaped and the lower end thereof is mounted on the bottom plate 22, and the magnet 4 is inserted into the cylindrical target 11 from the opening of the lower end of the cylindrical target 11; the cross section of the magnet 4 is V-shaped, the V-shaped opening of the magnet faces away from the gas diversion section 20, the N pole 41 and the S pole 42 are respectively arranged on two side sections of the magnet 4, and the N pole 41 and the S pole 42 of the magnet 4 face the inner side surface of the cylindrical target 11. The magnet 4 can thereby form a magnetic field in the region of the cylinder target 11 outside of the gas-guiding section 20 (i.e. the sputtering zone), so that the process gas is extremely easily captured by the magnetic field of the magnet 4 after being ionized.
In this embodiment, the target structure further includes two positioning wheel sets 5, each positioning wheel set 5 includes a plurality of positioning wheels 51, each positioning wheel 51 is rotatably mounted on the bottom plate 22, and the axis of each positioning wheel 51 is in an up-down direction; the two positioning wheel 51 sets 5 are in one-to-one correspondence with the two cylindrical targets 11, each positioning wheel 51 of the positioning wheel set 5 is positioned on the inner side of the corresponding cylindrical target 11, and the wheel surface of each positioning wheel 51 is in rolling fit with the inner side wall of the cylindrical target 11. The two positioning wheel sets 5 are respectively arranged on the inner sides of the corresponding cylindrical targets 11, the wheel surfaces of the positioning wheels 51 of the positioning wheel sets 5 are in rolling fit with the inner side walls of the cylindrical targets 11, and when the cylindrical targets 11 do rotary motion around the axis of the cylindrical targets, the positioning wheels 51 of the positioning wheel sets 5 roll relative to the inner side walls of the cylindrical targets 11, so that the lower ends of the cylindrical targets 11 can be positioned, the positions of the cylindrical targets are stable, and the cylindrical targets 11 are prevented from being blown to deflect under the action of wind force.
In this embodiment, the target structure further includes two air path assemblies 6, the two air path assemblies 6 are in one-to-one correspondence with the two air knives 3, the air path assemblies 6 include an air inlet pipe 61, two first shunt pipes 62 and four second shunt pipes 63, the first ends of the two first shunt pipes 62 are all connected and communicated with the second end of the air inlet pipe 61, wherein the two second shunt pipes 63 are connected and communicated with the second end of one first shunt pipe 62, the other two second shunt pipes 63 are connected and communicated with the second end of the other first shunt pipe 62, and the second end openings of the four first shunt pipes 62 are all communicated with the strip-shaped inner cavity 301 of the air knives 3 and are sequentially arranged along the length direction of the air knives 3. Therefore, the pressure intensity of the strip-shaped inner cavity 301 of the air knife can be ensured to be uniform, and the air injection uniformity of the air knife 3 is further improved.
The working principle of the target structure is briefly described below:
the strip-shaped inner cavity 301 of the air knife 3 is communicated with an air outlet of a compressed air source through the air path component 6, the compressed air source can input high-pressure air (such as compressed air and high-pressure nitrogen) and process air (such as argon) into the strip-shaped inner cavity 301 of the air knife through the air path, and the air knife can be switched by a valve, so that the air knife can spray high-pressure air in a cleaning mode, and can spray process air in a working mode, and the process air can clean residual cleaning air, so that the purity of the air is ensured.
Before sputtering, a cleaning mode can be started in advance to clean the target surface of the cylindrical target 11, in the cleaning mode, a compressed air source inputs high-pressure air into the strip-shaped inner cavities 301 of the two air knives 3, and then the strip-shaped air knife edges 302 of the air knives 3 spray the high-pressure air to the target surfaces of the two cylindrical targets 11, because the strip-shaped air knife edges 302 of the air knives 3 incline towards the corresponding cylindrical target 11 target surfaces, the high-pressure air can be uniformly sprayed to the cylindrical target 11 target surfaces in cooperation with the rotary motion of the cylindrical target 11, dust impurities adsorbed on the target surfaces of the cylindrical target 11 are removed, the high-pressure air sprayed by the air knives 3 is viscous flow, turbulence and impurity flow formed after the air knives are acted on the cylindrical target 11 are decelerated in the air guide section 20 to gradually become advection, longitudinal turbulence is reduced, dust adsorbed on the cylindrical target 11 is finally and stably floated in air to be effectively taken out, the dust is prevented from falling on the twin target 1 again to influence the stability of sputtering, the twin target 1 is avoided, the influence of the dust impurities on the sputtering process is avoided, the twin target 1 after a certain time is used, the tumor-shaped surface appears, the uniform utilization rate of the target 11 is improved, and the target can be cleaned more uniformly, and the target cleaning efficiency is improved.
In a sputtering working mode, under a low vacuum (the vacuum degree is 0.05-1 Pa), the process gas is sprayed out from the strip-shaped air knife edge 302 of the air knife 3 and then is presented as molecular flow, and the process gas presented as the molecular flow makes mutual reflection movement between the target surface of the cylinder target 11 and the inner side surface of the rectifying section (finally, the gas passes through the gas diversion section 20) because the strip-shaped air knife edge 302 of the air knife 3 is inclined towards the target surface of the corresponding cylinder target 11; since the width of the second slit 203 gradually increases from the strip-shaped air inlet 202 to the first slit 101, that is, the gas guiding section 20 is in an arc design which gradually expands relative to the target surface of the cylindrical target 11, the process gas eventually has a larger tangential motion component relative to the target surface (rather than escaping from the target surface along the normal direction) on the sputtering area, and is extremely easy to be captured by the magnetic field of the magnet 4 after being ionized, thereby improving the utilization rate of the process gas, ensuring more stable sputtering process, better maintenance of plasma discharge, better maintenance of sputtering rate, and very uniform distribution of the process gas in the longitudinal direction (Z axis), and improving the uniformity of the film plating.
In addition, it should be noted that, in the specific embodiments described in the present specification, names of various parts and the like may be different, and all equivalent or simple changes of the structures, features and principles described in the conception of the present invention are included in the protection scope of the present invention. Those skilled in the art may make various modifications or additions to the described embodiments or substitutions in a similar manner without departing from the scope of the invention as defined in the accompanying claims.
Claims (8)
1. The target structure comprises a twin target, wherein the twin target comprises two cylindrical targets which are arranged in parallel left and right and can rotate relatively, the axis of each cylindrical target is in an up-down direction, a first gap is formed between the two cylindrical targets, and a magnet is arranged in each cylindrical target; the method is characterized in that: the target structure also comprises a fairing and two air knives; the two cylindrical targets are positioned in the inner cavity of the fairing, the front side of the fairing is provided with a strip-shaped sputtering opening for exposing the target surfaces of the two cylindrical targets, the fairing is also provided with two strip-shaped air inlets which are respectively positioned at the left side and the right side of the strip-shaped sputtering opening, and the strip-shaped air inlets extend along the up-down direction; the two air knives are arranged outside the fairing and respectively correspond to the corresponding strip-shaped air inlets, and the strip-shaped air knife edges of the air knives incline backwards towards the target surface of the corresponding cylinder target; a second gap is formed between the two cylindrical targets and the fairing, the second gap forms a gas flow guide section from the strip-shaped air inlet to the first gap, and the width of the second gap gradually increases from the strip-shaped air inlet to the first gap;
the first gap constitutes a gas return section.
2. A target structure according to claim 1, wherein: the fairing comprises two arc-shaped cover bodies which are symmetrically arranged left and right, the rear side edges of the two arc-shaped cover bodies are connected, the strip-shaped sputtering opening is formed between the front side edges of the two arc-shaped cover bodies, and the two cylindrical targets are respectively positioned in the corresponding arc-shaped cover bodies; the second gap is formed between the inner surface of the arc-shaped cover body and the target surface of the cylindrical target.
3. A target structure according to claim 1 or 2, characterized in that: the target structure further comprises a bottom plate and a top plate, and the bottom plate and the top plate are respectively arranged at the lower end and the upper end of the fairing; the air knife is arranged between the bottom plate and the top plate, and two ends of the air knife are respectively connected with the bottom plate and the top plate.
4. A target structure according to claim 3, wherein: the upper end of the cylindrical target is provided with a central shaft which is rotatably arranged on the top plate; the magnet is strip-shaped and the lower end of the magnet is arranged on the bottom plate, and the magnet is inserted into the cylindrical target from the opening at the lower end of the cylindrical target.
5. A target structure according to claim 4, wherein: the cross section of the magnet is V-shaped, the V-shaped opening of the magnet faces away from the gas diversion section, and the two side sections of the magnet are respectively N pole and S pole.
6. A target structure according to claim 3, wherein: the target structure further comprises two positioning wheel sets, each positioning wheel set comprises at least two positioning wheels, each positioning wheel is rotatably arranged on the bottom plate, and the axis of each positioning wheel is in an up-down trend; the two positioning wheel sets are in one-to-one correspondence with the two cylindrical targets, each positioning wheel of each positioning wheel set is positioned at the inner side of the corresponding cylindrical target, and the wheel surface of each positioning wheel is in rolling fit with the inner side wall of the cylindrical target.
7. A target structure according to claim 1 or 2, characterized in that: the air knife is provided with a strip-shaped inner cavity extending along the up-down direction; the target structure further comprises two air path components, the two air path components are in one-to-one correspondence with the two air knives, each air path component comprises an air inlet pipe, two first shunt pipes and four second shunt pipes, the first ends of the two first shunt pipes are connected and communicated with the second end of the air inlet pipe, the two second shunt pipes are connected and communicated with the second end of one first shunt pipe, the other two second shunt pipes are connected and communicated with the second end of the other first shunt pipe, and the second end openings of the four first shunt pipes are sequentially arranged from top to bottom and are communicated with the strip-shaped inner cavity.
8. A sputter coating machine, characterized in that: comprising a target structure according to any one of claims 1-7.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310491295.6A CN116200713B (en) | 2023-05-05 | 2023-05-05 | Target structure and sputtering coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310491295.6A CN116200713B (en) | 2023-05-05 | 2023-05-05 | Target structure and sputtering coating machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116200713A CN116200713A (en) | 2023-06-02 |
| CN116200713B true CN116200713B (en) | 2023-07-07 |
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| CN202310491295.6A Active CN116200713B (en) | 2023-05-05 | 2023-05-05 | Target structure and sputtering coating machine |
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| CN2656432Y (en) * | 2003-09-11 | 2004-11-17 | 深圳豪威真空光电子股份有限公司 | Rotary type magnetic controlled sputtering target |
| CN100537833C (en) * | 2005-04-08 | 2009-09-09 | 北京实力源科技开发有限责任公司 | A kind of magnetron sputtering target system and application method thereof with function of on-line cleaning |
| CN201908129U (en) * | 2010-12-18 | 2011-07-27 | 广东爱康太阳能科技有限公司 | Dust collection device of flat type plasma coating equipment |
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