CN116102254A - OLED glass substrate composition and preparation method thereof - Google Patents
OLED glass substrate composition and preparation method thereof Download PDFInfo
- Publication number
- CN116102254A CN116102254A CN202211663329.7A CN202211663329A CN116102254A CN 116102254 A CN116102254 A CN 116102254A CN 202211663329 A CN202211663329 A CN 202211663329A CN 116102254 A CN116102254 A CN 116102254A
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- Prior art keywords
- glass substrate
- sio
- oled
- oled glass
- substrate composition
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- 239000011521 glass Substances 0.000 title claims abstract description 62
- 239000000758 substrate Substances 0.000 title claims abstract description 35
- 239000000203 mixture Substances 0.000 title claims abstract description 20
- 238000002360 preparation method Methods 0.000 title abstract description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 12
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 7
- 229910006404 SnO 2 Inorganic materials 0.000 claims abstract description 6
- 238000005352 clarification Methods 0.000 claims abstract description 4
- 238000000265 homogenisation Methods 0.000 claims abstract description 4
- 239000007788 liquid Substances 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 6
- 238000000137 annealing Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 239000006066 glass batch Substances 0.000 abstract 1
- 239000006060 molten glass Substances 0.000 abstract 1
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 150000001339 alkali metal compounds Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
The invention relates to an OLED glass substrate composition and a preparation method thereof, and the OLED glass substrate composition is characterized by comprising the following raw materials in percentage by mass: siO (SiO) 2 61~63%、Al 2 O 3 17~20%、CaO4~8%、B 2 O 3 0.5~2%、MgO3~6%、SrO0~4%、BaO2~8%、SnO 2 0.15~0.3%、Sr(NO 3 ) 2 0.07% -0.8%, wherein SiO 2 +Al 2 O 3 80-82%. The glass batch is melted for 7-12 hours at 1660-1700 ℃, molten glass is melted in a platinum crucible and stirred for clarification and homogenization, the strain point of the prepared OLED glass substrate is up to 720 ℃, the elastic modulus can be up to 80GPa, and the OLED glass substrate has few bubbles and good homogeneity.
Description
Technical Field
The invention relates to the field of glass manufacturing, in particular to an OLED glass composition and a preparation method thereof.
Background
The TFT-LCD glass substrate raw material does not contain alkali metal compound substantially, and the alumina content is high, so that the glass melting process is more difficult than the conventional soda-lime silicate glass, the glass melting temperature is high, the viscosity is high, and bubbles are difficult to remove.
The melting and clarifying temperature of the OLED glass substrate is 50-70 ℃ higher than that of the TFT-LCD glass substrate (up to about 1700 ℃), the batch is high in melting difficulty, easy to volatilize, high in viscosity of glass liquid, difficult to discharge bubbles, and high in homogenizing and clarifying process difficulty.
In the glass preparation process, bubbles are the most common defects, which affect the appearance, transmittance, mechanical strength, hardness and the like of a glass product, and when a certain number of microbubbles remain in a glass substrate and the homogeneity is poor, the requirements of the glass substrate for display cannot be met.
The forming temperature of the OLED glass substrate is higher than that of common soda-lime-silica glass by more than 200 ℃, the ultra-high viscosity and extremely short material glass liquid is uniformly spread and thinned for forming and is difficult to form, and the quality indexes such as microscopic quality, thickness difference and the like of the surface of the OLED glass substrate are higher.
Disclosure of Invention
The invention aims to provide an OLED glass substrate with a strain point of more than 720 ℃, an elastic modulus of more than 80GPa, few bubbles and good homogeneity, and provides an OLED glass substrate composition and a preparation method thereof.
The technical scheme adopted for solving the technical problems is as follows:
the OLED glass substrate composition is characterized by comprising the following components in percentage by mass: siO (SiO) 2 61~63%、Al 2 O 3 17~20%、CaO 4~8%、B 2 O 3 0.5~2%、MgO 3~6%、SrO 0~4%、BaO 2~8%、SnO 2 0.15~0.3%、Sr(NO 3 ) 2 0.07% -0.8%, wherein SiO 2 +Al 2 O 3 80~82%。
Further, the OLED glass substrate composition can also comprise the following components in percentage by mass: siO (SiO) 2 61.8~62.5%、Al 2 O 3 17.6~18.2%、CaO 4.5~7%、B 2 O 3 1~2%、MgO 4.4~5.9%、SrO 0.3~3.8%、BaO 3.2~7.5%、SnO 2 0.17~0.23%、Sr(NO 3 ) 2 0.28% -0.75%, wherein SiO 2 +Al 2 O 3 80~82%。
An OLED glass substrate composition and a preparation method thereof are characterized by comprising the following steps:
(1) According to the proportion of the oxide components of the OLED glass substrate composition, adopting raw materials with corresponding mass proportions to form a batch, and placing the batch in a platinum crucible of a high-temperature furnace to be melted for 7-12 hours at a high temperature of 1660-1700 ℃;
(2) When the glass liquid reaches a molten state, a platinum stirring rod is adopted to stir the glass liquid, so that bubbles are easier to discharge, and the purpose of clarification and homogenization is achieved;
(3) Pouring molten and clarified glass liquid into a mold from a platinum crucible for forming;
(4) Then the glass is put into a muffle furnace for precise annealing, and then the OLED glass substrate is obtained by cutting and polishing the obtained glass.
The invention has the beneficial effects that: the invention provides a platinum crucible which is melted, stirred, clarified and homogenized, the strain point of the prepared OLED glass substrate is up to 720 ℃, the elastic modulus can be up to 80GPa, the bubbles are few, and the homogeneity is good. The strain point is up to 720 ℃ or above, the elastic modulus can reach 80GPa, and the key raw material is SiO 2 +Al 2 O 3 80-82%, and the two mainly play a role in limiting the upper limit and the lower limit of the glass strain point and the elastic modulus in the formula composition, and the two determine the compactness of a glass network structure and play a role in enhancing the glass strength.
Detailed Description
An OLED glass substrate composition and a preparation method thereof, which comprises the following specific implementation steps:
the components and contents of the compositions for preparing the OLED glass substrate in examples 1 to 8 are shown in Table 1:
the OLED glass substrate in each embodiment is prepared according to the following steps:
uniformly mixing the raw materials according to the components shown in the table 1, and placing the mixture into a platinum crucible of a high-temperature furnace to be melted for 7-12 hours at a high temperature of 1660-1700 ℃; when the glass liquid reaches a molten state, a platinum stirring rod is adopted to stir the glass liquid, so that bubbles are easier to discharge, and the purpose of clarification and homogenization is achieved; pouring molten and clarified glass liquid into a mold from a platinum crucible for forming; then the glass is put into a muffle furnace for precise annealing, and then the OLED glass substrate is obtained by cutting and polishing the obtained glass.
The OLED glass substrate was tested for data such as density, elastic modulus, shear modulus, strain point, annealing point, softening point, thermal expansion coefficient, etc., and the test results are shown in table 1.
As can be seen from the data in table 1, the invention is characterized by the proportion of the OLED glass substrate composition and the special preparation process, such as: the platinum crucible is melted and the glass liquid is stirred, so that bubbles are easier to discharge, the clarifying and homogenizing effects are better, the strain point of the prepared OLED glass substrate is up to more than 720 ℃, and the elastic modulus can be up to more than 80 GPa.
Examples 1 to 8
TABLE 1
| 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | |
| SiO 2 | 62 | 62.4 | 62.5 | 62.7 | 61.4 | 62.4 | 62.4 | 62.4 |
| Al 2 O 3 | 18.3 | 17.8 | 17.4 | 18.2 | 17.6 | 17.8 | 17.4 | 17.2 |
| B 2 O 3 | 1 | 2 | 2 | 0.5 | 2 | 2 | 2 | 2 |
| MgO | 3 | 5.4 | 4 | 4.8 | 5.9 | 5.2 | 5.5 | 5.8 |
| CaO | 7.9 | 4 | 6.7 | 5.9 | 4.5 | 4 | 4 | 4 |
| SrO | 2.8 | 1.3 | 1.2 | 3.8 | 1.3 | 0.3 | 0.3 | 2.3 |
| BaO | 4.1 | 6.2 | 5.3 | 3.2 | 6.4 | 7.4 | 7.5 | 5.4 |
| SnO 2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 |
| Sr(NO 3 ) 2 | 0.7 | 0.7 | 0.7 | 0.7 | 0.7 | 0.7 | 0.7 | 0.7 |
| Density g/cm 3 | 2.63 | 2.54 | 2.58 | 2.65 | 2.54 | 2.54 | 2.55 | 2.54 |
| Elastic modulus GPa | 82.59 | 87.32 | 81.31 | 81.7 | 81.69 | 81.47 | 81.34 | 81.99 |
| Shear modulus GPa | 33.2 | 34.63 | 32.89 | 32.91 | 33.15 | 33.01 | 32.79 | 33.44 |
| Strain point Tst (c) | 723.9 | 726.0 | 721.3 | 728.7 | 723.9 | 726.4 | 727.8 | 721.8 |
| Annealing point Ta (. Degree. C.) | 777.5 | 778 | 775 | 780.4 | 777.5 | 777.6 | 779.3 | 776.8 |
| Softening point Ts (. Degree. C.) | 1000.1 | 1013 | 1004 | 997.2 | 1013 | 1012.7 | 1015.4 | 1009.6 |
| The thermal expansion coefficient (20-300 ℃) is multiplied by 10 -6 /℃ | 4.133 | 3.614 | 4.014 | 3.553 | 3.927 | 3.983 | 3.999 | 3.873 |
The above description is only of the preferred embodiments of the present invention and is not intended to limit the present invention in any way; any person skilled in the art can make many possible variations and modifications to the technical solution of the present invention or modifications to equivalent embodiments using the methods and technical contents disclosed above, without departing from the scope of the technical solution of the present invention. Therefore, any simple modification, equivalent substitution, equivalent variation and modification of the above embodiments according to the technical substance of the present invention, which do not depart from the technical solution of the present invention, still fall within the scope of the technical solution of the present invention.
Claims (4)
1. The OLED glass substrate composition is characterized by comprising the following components in percentage by mass: siO (SiO) 2 61~63%、Al 2 O 3 17~20%、CaO 4~8%、B 2 O 3 0.5~2%、MgO 3~6%、SrO 0~4%、BaO 2~8%、SnO 2 0.15~0.3%、Sr(NO 3 ) 2 0.07% -0.8%, wherein SiO 2 +Al 2 O 3 80~82%。
2. The OLED glass substrate composition according to claim 1, wherein: the OLED glass substrate composition comprises the following components in percentage by mass: siO (SiO) 2 61.8~62.5%、Al 2 O 3 17.6~18.2%、CaO 4.5~7%、B 2 O 3 1~2%、MgO 4.4~5.9%、SrO 0.3~3.8%、BaO 3.2~7.5%、SnO 2 0.17~0.23%、Sr(NO 3 ) 2 0.28% -0.75%, wherein SiO 2 +Al 2 O 3 80~82%。
3. The method for preparing the OLED glass substrate composition according to claim 1 or 2, wherein the following steps are adopted:
(1) Uniformly mixing the raw materials of the components according to the mass percentages, and placing the raw materials in a platinum crucible of a high-temperature furnace to be melted for 7-12 hours at a high temperature of 1660-1700 ℃;
(2) When the glass liquid reaches a molten state, a platinum stirring rod is adopted to stir the glass liquid, so that bubbles are easier to discharge, and the purpose of clarification and homogenization is achieved;
(3) Pouring molten and clarified glass liquid into a mold from a platinum crucible for forming;
(4) Then the glass is put into a muffle furnace for precise annealing, and then the OLED glass substrate is obtained by cutting and polishing the obtained glass.
4. A method of preparing an OLED glass substrate composition according to claim 3: the method is characterized in that the strain point of the prepared OLED glass substrate is up to 720 ℃, the elastic modulus can be up to 80GPa, the bubbles are few, and the uniformity is good.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211663329.7A CN116102254A (en) | 2022-12-23 | 2022-12-23 | OLED glass substrate composition and preparation method thereof |
| PCT/CN2023/128674 WO2024131310A1 (en) | 2022-12-23 | 2023-10-31 | Oled glass substrate composition and method for preparing oled glass substrate from same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211663329.7A CN116102254A (en) | 2022-12-23 | 2022-12-23 | OLED glass substrate composition and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116102254A true CN116102254A (en) | 2023-05-12 |
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| CN202211663329.7A Pending CN116102254A (en) | 2022-12-23 | 2022-12-23 | OLED glass substrate composition and preparation method thereof |
Country Status (2)
| Country | Link |
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| CN (1) | CN116102254A (en) |
| WO (1) | WO2024131310A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024131310A1 (en) * | 2022-12-23 | 2024-06-27 | 中建材玻璃新材料研究院集团有限公司 | Oled glass substrate composition and method for preparing oled glass substrate from same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108911501A (en) * | 2018-07-17 | 2018-11-30 | 武汉理工大学 | A kind of high rigidity Aluminiu, boron silicate glass without alkali and the preparation method and application thereof suitable for floating process production |
| CN111484244A (en) * | 2020-04-17 | 2020-08-04 | 中南大学 | Low-density high-strain-point alkali-free electronic glass and preparation method thereof |
| CN112499964A (en) * | 2020-12-29 | 2021-03-16 | 中建材蚌埠玻璃工业设计研究院有限公司 | Substrate glass for TFT-LCD screen and preparation method thereof |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116375338A (en) * | 2014-10-23 | 2023-07-04 | Ａｇｃ株式会社 | Alkali-free glass |
| CN109133615B (en) * | 2015-06-30 | 2022-05-10 | 安瀚视特控股株式会社 | Glass substrate for display and method for manufacturing same |
| KR20230165865A (en) * | 2016-12-28 | 2023-12-05 | 니폰 덴키 가라스 가부시키가이샤 | Glass |
| CN115043576A (en) * | 2017-12-20 | 2022-09-13 | 日本电气硝子株式会社 | Method for manufacturing glass plate |
| CN109231816A (en) * | 2018-10-09 | 2019-01-18 | 成都中光电科技有限公司 | A kind of glass substrate and preparation method thereof can be used for LTPS |
| CN110776254B (en) * | 2019-11-16 | 2021-02-05 | 中建材蚌埠玻璃工业设计研究院有限公司 | Glass composition for liquid crystal display and preparation method of glass |
| CN111606560B (en) * | 2020-06-05 | 2022-03-11 | 中建材蚌埠玻璃工业设计研究院有限公司 | Alkali-free aluminoborosilicate glass |
| CN116102254A (en) * | 2022-12-23 | 2023-05-12 | 中建材玻璃新材料研究院集团有限公司 | OLED glass substrate composition and preparation method thereof |
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2022
- 2022-12-23 CN CN202211663329.7A patent/CN116102254A/en active Pending
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- 2023-10-31 WO PCT/CN2023/128674 patent/WO2024131310A1/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108911501A (en) * | 2018-07-17 | 2018-11-30 | 武汉理工大学 | A kind of high rigidity Aluminiu, boron silicate glass without alkali and the preparation method and application thereof suitable for floating process production |
| CN111484244A (en) * | 2020-04-17 | 2020-08-04 | 中南大学 | Low-density high-strain-point alkali-free electronic glass and preparation method thereof |
| CN112499964A (en) * | 2020-12-29 | 2021-03-16 | 中建材蚌埠玻璃工业设计研究院有限公司 | Substrate glass for TFT-LCD screen and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 李青: "《平板显示基板玻璃技术概论》", 河北科学技术出版社, pages: 34 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024131310A1 (en) * | 2022-12-23 | 2024-06-27 | 中建材玻璃新材料研究院集团有限公司 | Oled glass substrate composition and method for preparing oled glass substrate from same |
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| WO2024131310A1 (en) | 2024-06-27 |
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