CN115990590A - Orifice plate cleaning system and control method - Google Patents
Orifice plate cleaning system and control method Download PDFInfo
- Publication number
- CN115990590A CN115990590A CN202111219743.4A CN202111219743A CN115990590A CN 115990590 A CN115990590 A CN 115990590A CN 202111219743 A CN202111219743 A CN 202111219743A CN 115990590 A CN115990590 A CN 115990590A
- Authority
- CN
- China
- Prior art keywords
- liquid
- cleaning
- liquid level
- waste liquid
- pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a pore plate cleaning system and a control method, which relate to the field of biomedicine and are used for improving the performance of the pore plate cleaning system. The pore plate cleaning system comprises a plate washer, a liquid storage device, a waste liquid recovery device, a first liquid level detection element, a second liquid level detection element and a controller. The plate washer comprises a distribution flow path, a liquid suction flow path and a cleaning area. The reservoir is in fluid communication with the dispensing flow path of the washer to provide a cleaning fluid to the cleaning zone. The waste liquid recovery device is in fluid communication with the liquid suction flow path. The first liquid level detection element is arranged inside the liquid storage device to detect the liquid level of the liquid storage device. The second liquid level detection element is arranged inside the waste liquid recovery device to detect the liquid level of the waste liquid recovery device. The controller is configured to control the trigger to start or stop according to the liquid levels detected by the first liquid level detecting element and the second liquid level detecting element. By adopting the technical scheme, the probability of faults caused by too low cleaning liquid and too high waste liquid of the plate washer is reduced.
Description
Technical Field
The invention relates to the biomedical field, in particular to an orifice plate cleaning system and a control method.
Background
Three experiments exist in the biological enzyme-linked immune reaction experiments: enzyme-linked immunosorbent assay, enzyme-linked immunosorbent assay and enzyme-linked immunochromatography assay. All three experiments required cleaning of a large number of elisa plates. The ELISA plate adopts 96-well plates or well plates with other structures. With the rapid development of the biological scientific research and medical field, the task of the enzyme-linked immunosorbent assay is greatly increased, so that the requirement on the cleaning efficiency of the 96-well plate is higher and higher.
The plate washer is a medical instrument specially used for cleaning the ELISA plate and is mainly used for cleaning some residual substances after detection of the ELISA plate, so that errors caused by the residues in the subsequent detection process are reduced. Plate washers have been widely used for the plate washing work of hospitals, blood stations, hygiene and epidemic prevention stations, reagent factories, research rooms.
The inventors found that at least the following problems exist in the prior art: the phenomenon that the ELISA plate cannot be cleaned easily occurs in the process of cleaning the ELISA plate by the plate washer, so that the ELISA plate cannot be cleaned, and the normal operation of an experiment requiring the ELISA plate is seriously influenced.
Disclosure of Invention
The invention provides a pore plate cleaning system and a control method, which are used for improving the performance of the pore plate cleaning system.
The embodiment of the invention provides an orifice plate cleaning system, which comprises:
the plate washer comprises a distribution flow path, a liquid suction flow path and a cleaning area for accommodating the pore plate;
a liquid storage device configured to store a cleaning liquid for cleaning the orifice plate; the liquid storage device is in fluid communication with the dispensing flow path of the plate washer to provide cleaning liquid to the cleaning zone;
a waste liquid recovery device in fluid communication with the liquid suction flow path; the waste liquid recovery device is configured to recover waste liquid generated in the washing area;
the first liquid level detection element is arranged inside the liquid storage device and used for detecting the liquid level of the liquid storage device;
the second liquid level detection element is arranged inside the waste liquid recovery device and used for detecting the liquid level of the waste liquid recovery device; and
and the controller is electrically connected with the first liquid level detection element, the second liquid level detection element and the plate washer, and is configured to control the plate washer to start and stop according to the liquid levels detected by the first liquid level detection element and the second liquid level detection element.
In some embodiments, the aperture plate washing system further comprises:
a first pump in communication with the reservoir; the first pump is electrically connected with the controller; the controller is configured to activate the first pump to replenish the liquid storage device with cleaning liquid when the liquid level detected by the first liquid level detecting element is below a lower limit value of a first set range.
In some embodiments, the reservoir device comprises:
a reservoir comprising a closed first reservoir chamber;
the first air inlet pipeline is communicated with a first air pump of the plate washer, and the first air pump supplies air to the interior of the first liquid storage cavity through the first air inlet pipeline;
a first air outlet pipeline communicated with the first liquid storage cavity so as to discharge the air conveyed to the first liquid storage cavity through the first air inlet pipeline; the first outlet pipe is configured to have an opening time later than an opening time of the first inlet pipe and later than a closing time of the first inlet pipe;
one end of the first liquid outlet pipe is communicated with the bottom of the first liquid storage cavity, and the other end of the first liquid outlet pipe is in fluid communication with a cleaning area of the plate washer; and
and one end of the first liquid inlet pipe is in fluid communication with the first liquid storage cavity, and the other end of the first liquid inlet pipe is in fluid communication with the first pump.
In some embodiments, the aperture plate washing system further comprises:
a second pump in fluid communication with the waste liquid recovery device; the second pump is electrically connected with the controller; the controller is configured to activate the second pump to discharge the waste liquid in the waste liquid recovery device when the liquid level detected by the second liquid level detecting element is higher than an upper limit value of a second set range.
In some embodiments, the waste liquid recovery device comprises:
a waste liquid recovery container comprising a closed second liquid storage cavity;
a second liquid inlet pipe, one end of which is in fluid communication with the cleaning area of the plate washer, and the other end of which is in fluid communication with the second liquid storage cavity;
a second outlet tube having one end in fluid communication with the bottom of the second reservoir and the other end in fluid communication with the second pump; and
and the gas pipeline is communicated with a second air pump of the plate washer, and the second air pump provides negative pressure for the interior of the second liquid storage cavity through the gas pipeline.
In some embodiments, the aperture plate washing system further comprises:
and the display device is electrically connected with the controller to display the liquid level values detected by the first liquid level detection element and the second liquid level detection element.
The embodiment of the invention also provides a pore plate cleaning control method, which is realized by adopting the pore plate cleaning system provided by any technical scheme of the invention, and comprises the following steps:
detecting the liquid level of the cleaning liquid in the liquid storage device and the liquid level of the waste liquid in the waste liquid recovery device;
and if the liquid level of the cleaning liquid in the liquid storage device is higher than the lower limit value of the first set range and the liquid level of the waste liquid in the waste liquid recovery device is lower than the upper limit value of the second set range, starting the plate washer.
In some embodiments, the aperture plate washing control method further comprises the steps of:
if the liquid level of the cleaning liquid in the liquid storage device is lower than the lower limit value of the first set range, stopping the plate washer;
and replenishing the cleaning liquid to the liquid storage device until the liquid level of the cleaning liquid is not lower than the upper limit value of the first setting range.
In some embodiments, the reservoir is replenished with cleaning fluid in the following manner:
and opening a first pump of the pore plate cleaning system, and supplementing cleaning liquid to the liquid storage device through the first pump and a first liquid inlet pipe.
In some embodiments, the aperture plate washing control method further comprises the steps of:
stopping the plate washer if the liquid level of the waste liquid in the waste liquid recovery device is higher than the upper limit value of the second set range;
and discharging the waste liquid in the waste liquid recovery device until the liquid level of the waste liquid is lower than the lower limit value of the second set range.
In some embodiments, the waste liquid in the waste liquid recovery device is discharged using the following steps:
and starting a second pump of the pore plate cleaning system, and discharging the waste liquid out of the waste liquid recovery device through the second pump and a second liquid outlet pipe.
The pore plate cleaning system provided by the technical scheme is provided with a plate washer, a liquid storage device, a waste liquid recovery device, a first liquid level detection element, a second liquid level detection element and a controller. The liquid storage device is used for storing cleaning liquid required by cleaning the plate washer, and the waste liquid recovery device is used for discharging waste liquid generated after the plate washer is cleaned. Detecting the liquid level of the cleaning liquid in the liquid storage device through a first liquid level detection element, and controlling the plate washer to stop when the liquid level of the cleaning liquid is lower; the liquid level of the waste liquid in the waste liquid recovery device is detected by the second liquid level detection element, and when the liquid level of the cleaning liquid is higher, the plate washer is controlled to stop. According to the technical scheme, faults caused by too low cleaning liquid and too high waste liquid of the plate washer are reduced, and the performance of the plate washer is improved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiments of the invention and together with the description serve to explain the invention and do not constitute a limitation on the invention. In the drawings:
fig. 1 is a schematic perspective view of an orifice plate cleaning system according to an embodiment of the present invention.
Fig. 2 is a schematic partial perspective view of an orifice plate cleaning system according to an embodiment of the present invention.
Fig. 3 is a schematic partial perspective view of a first liquid level detecting element and a second liquid level detecting element of an orifice plate cleaning system according to an embodiment of the present invention.
Fig. 4 is a schematic perspective view of a liquid storage device of an orifice plate cleaning system according to an embodiment of the present invention.
Fig. 5 is a schematic perspective view of a waste liquid recycling device of an orifice plate cleaning system according to an embodiment of the present invention.
Fig. 6 is a schematic flow chart of a method for controlling cleaning of an orifice plate according to an embodiment of the present invention.
Reference numerals: 1. plate washing machine; 2. a liquid storage device; 3. a waste liquid recovery device; 4. a first liquid level detection element; 5. a second liquid level detection element; 6. a communication interface; 7. a first pump; 8. a second pump; 9. a display device; 11. a first indicator light; 12. a second indicator light; 13. a power interface; 21. a liquid storage container; 22. a first air intake line; 23. a first outlet line; 24. a first liquid outlet pipe; 25. a first liquid inlet pipe; 31. a waste liquid recovery container; 32. a second liquid inlet pipe; 33. a second liquid outlet pipe; 34. and a gas pipeline.
Detailed Description
The technical scheme provided by the invention is described in more detail below with reference to fig. 1 to 6.
Referring to fig. 1-3, an embodiment of the present invention provides an orifice plate cleaning system. The well plate is a carrier with wells, such as an elisa plate in particular. The pore plate cleaning system comprises a plate washer 1, a liquid storage device 2, a waste liquid recovery device 3, a first liquid level detection element 4, a second liquid level detection element 5 and a controller. The plate washer 1 comprises a washing zone for washing the perforated plate. The liquid storage device 2 is configured to store a cleaning liquid for cleaning the orifice plate; the reservoir 2 is in fluid communication with the washing zone of the plate washer 1. The waste liquid recovery device 3 is in fluid communication with the washing zone; the waste liquid recovery device 3 is configured to recover waste liquid generated in the washing section. The first liquid level detecting element 4 is installed inside the liquid storage device 2 to detect the liquid level of the liquid storage device 2. The second liquid level detecting element 5 is installed inside the waste liquid recovery device 3 to detect the liquid level of the waste liquid recovery device 3. A controller is electrically connected to the first liquid level detecting element 4, the second liquid level detecting element 5 and the plate washer 1, the controller being configured to control the plate washer 1 to start or stop depending on the liquid levels detected by the first liquid level detecting element 4 and the second liquid level detecting element 5.
The plate washer 1 is used for washing well plates, such as an ELISA plate, a 96 well plate, etc. The plate washer 1 comprises a distribution flow path, a liquid suction flow path, a control display system and a washing zone. The orifice plate to be cleaned is placed in the cleaning zone. The cleaning liquid in the liquid storage device 2 is introduced into the cleaning area through the distribution flow path, and the orifice plate is cleaned. The waste liquid generated after the washing of the orifice plate is discharged to the waste liquid recovery device 3 via the liquid suction flow path.
Specifically, the dispensing flow path includes a dispensing needle. The dispensing head has two types of metal tubing, thick and thin. A finer metal tube may be used as the dispensing needle in the dispensing head, and a coarser metal tube may be used as the pipetting needle in the pipetting flow path in the dispensing head. The dispensing flow path withdraws the cleaning liquid from the liquid storage device 2, controls the dispensing amount of the cleaning liquid by the electromagnetic valve, then discharges the cleaning liquid to the dispensing head, and finally discharges the cleaning liquid to the micropores of the pore plate through the dispensing needle of the dispensing head.
The liquid suction flow path includes a liquid suction needle, a waste liquid recovery device 3, and a vacuum pump. Negative pressure generated by the vacuum pump is conducted to the liquid suction needle through the waste liquid recovery device 3, and liquid in the micropores of the liquid suction needle enters the waste liquid recovery device 3 under the action of atmospheric pressure.
The control display system includes digital circuitry, a display, and an input device such as a keyboard or the like.
The first liquid level detecting element 4 is configured to detect a liquid level of the liquid storage device 2, and send the detected liquid level value of the liquid storage device 2 to the controller. The first liquid level detecting element 4 is a liquid level sensor or the like capable of detecting a liquid level.
The second liquid level detecting element 5 is used for detecting the liquid level of the waste liquid recovery device 3 and sending the detected liquid level value of the waste liquid recovery device 3 to the controller. The second liquid level detecting element 5 is a liquid level sensor or the like capable of detecting a liquid level.
The controller controls the starting and stopping of the plate washer 1 according to the liquid level value of the liquid storage device 2 and the liquid level value of the waste liquid recovery device 3. The controller may employ a control display system of the washer 1. Or, a controller is separately arranged and is used for controlling the starting and stopping of the plate washer 1 according to the liquid level value of the liquid storage device 2 and the liquid level value of the waste liquid recovery device 3; the control display system of the plate washer 1 controls the cleaning parameters of the plate washer 1 in the state that the plate washer 1 is started up: such as setting a working program, displaying setting parameters, controlling dispensing amount, washing times, soaking time, delay time, liquid suction time, automatic pre-washing interval time, etc., so as to realize an automatic washing function.
Referring to fig. 1 and 2, in some embodiments, the well plate washing system further comprises a first pump 7, the first pump 7 being in communication with the reservoir 2. A solenoid valve 14 may also be provided between the first pump 7 and the reservoir 2 to control flow path parameters. The first pump 7, the controller, and other electrical components may be electrically connected to the power interface 13, so that the electrical components conduct power. The first pump 7 is also electrically connected to the controller. In particular, may be electrically connected to the controller via the communication interface 6. The controller is configured to activate the first pump 7 to replenish the liquid reservoir 2 with cleaning liquid when the liquid level detected by the first liquid level detecting element 4 is below the lower limit value of the first set range. The peristaltic pump is adopted by the first pump 7, the displacement of the peristaltic pump can be accurately controlled, and the performance is reliable.
Referring to fig. 1, 2 and 4, in some embodiments, the liquid storage device 2 includes a liquid storage container 21, a first inlet pipe 22, a first outlet pipe 23, a first outlet pipe 24, and a first inlet pipe 25. The reservoir 21 includes a closed first reservoir chamber 21a. The first air intake line 22 communicates with a first air pump (not shown) of the plate washer 1, which supplies air to the inside of the first reservoir 21a via the first air intake line 22. The first gas outlet pipe 23 communicates with the first liquid storage chamber 21a to discharge the gas delivered to the first liquid storage chamber 21a via the first gas inlet pipe 22. The first outlet pipe 23 is configured to have an opening time later than that of the first inlet pipe 22 and later than that of the first inlet pipe 22. One end of the first liquid outlet pipe 24 is communicated with the bottom of the first liquid storage cavity 21a, and the other end of the first liquid outlet pipe 24 is in fluid communication with the cleaning area of the plate washer 1. One end of the first liquid inlet pipe 25 is in fluid communication with the first liquid storage chamber 21a, and the other end of the first liquid inlet pipe 25 is in fluid communication with the first pump 7. The first pump 7 is in fluid communication with the first liquid inlet pipe 25, the cleaning liquid enters the first liquid storage cavity 21a via the first liquid inlet pipe 25 for storage, and the cleaning liquid is automatically replenished to the first liquid storage cavity 21a when the liquid level in the first liquid storage cavity 21a is too low. The first liquid outlet pipe 24 conveys the cleaning liquid in the first liquid storage cavity 21a to the cleaning area for cleaning the pore plate under the positive pressure effect of the gas conveyed by the first air inlet pipeline 22 to the first liquid storage cavity 21a of the liquid storage device 2.
The following will describe the drainage of waste liquid from the washing section. In some embodiments, the well plate washing system further comprises a second pump 8, the second pump 8 being in fluid communication with the waste liquid recovery device 3; the second pump 8 is electrically connected to the controller, in particular via the communication interface 6. The controller is configured to activate the second pump 8 to discharge the waste liquid in the waste liquid recovery device 3 when the liquid level detected by the second liquid level detection element 5 is higher than the upper limit value of the second set range. The second pump 8 is for example a peristaltic pump.
Referring to fig. 1, 2 and 5, in some embodiments, the waste liquid recovery device 3 includes a waste liquid recovery vessel 31, a second liquid inlet pipe 32, a second liquid outlet pipe 33, and a gas line 34. The waste liquid recovery container 31 includes a closed second liquid storage chamber 31a. The waste liquid recovery vessel 31 is, for example, the waste liquid recovery device 3. One end of the second liquid inlet pipe 32 is in fluid communication with the washing zone of the plate washer 1, and the other end of the second liquid inlet pipe 32 is in fluid communication with the second liquid storage chamber 31a. The second liquid inlet pipe 32 is used for receiving the waste liquid generated in the cleaning area and delivering the waste liquid into the second liquid storage cavity 31a for storage. One end of the second outlet pipe 33 is in fluid communication with the bottom of the second reservoir 31a, and the other end of the second outlet pipe 33 is in fluid communication with the second pump 8. The second liquid outlet pipe 33 is used for discharging the waste liquid in the second liquid storage cavity 31a, so that the second liquid storage cavity 31a can smoothly receive the waste liquid generated in the cleaning area. The gas line 34 communicates with a second air pump of the plate washer 1, which provides negative pressure to the interior of the second reservoir 31a via the gas line 34. The second liquid storage chamber 31a is internally provided with a negative pressure which is lower than the pressure of the washing area, so that the waste liquid of the washing area is sucked into the waste liquid recovery device 3.
With continued reference to fig. 1 and 2, in some embodiments, the aperture plate washing system further includes a display device 9. The display device 9 is electrically connected to the controller to display the liquid level values detected by the first liquid level detecting element 4 and the second liquid level detecting element 5. The display device 9 is, for example, a liquid crystal display, and the liquid level can be displayed in a relative or absolute manner. Such as by volume percent, or liquid level, etc.
With continued reference to fig. 1 and 2, the aperture plate washing system further includes a first indicator light 11 and/or a second indicator light 12. The first indicator lamp 11 is electrically connected with the controller to display the working state of the plate washer 1 and whether the liquid storage device 2 performs the liquid supplementing operation. The first indicator light 11 is a green light when the plate washer 1 is operating normally. When the liquid storage device 2 supplements liquid, the lamp is red. The second indicator lamp 12 is also electrically connected to the controller to indicate the operating state of the washer 1 and whether the waste liquid recovery device 3 is performing a liquid discharge operation. The second indicator light 12 is a green light when the washer 1 is operating normally. When the waste liquid recovery device 3 discharges liquid, the liquid is red light. By the first indicator lamp 11 and the second indicator lamp 12, the state of the orifice plate washing system can be accurately displayed.
Referring to fig. 6, the embodiment of the invention also provides a method for controlling cleaning of an orifice plate, which is implemented by adopting the orifice plate cleaning system provided by any technical scheme of the invention, and the method comprises the following steps:
step S100, detecting the liquid level of the cleaning liquid in the liquid storage device 2 and the liquid level of the waste liquid in the waste liquid recovery device 3.
Step 200, if the liquid level of the cleaning liquid is higher than the lower limit value of the first set range and the liquid level of the waste liquid is lower than the upper limit value of the second set range, the plate washer 1 is started.
The first setting range is, for example, 95% -45% of the volume of the liquid storage device 2. The upper limit of the first set range is 95% of the volume of the liquid storage device 2. The lower limit of the first setting range is 45% of the volume of the liquid storage device 2. The second setting range is, for example, 70% to 10% of the volume of the waste liquid recovery device 3. Then, the upper limit value of the second setting range is 70% of the volume of the waste liquid recovery device 3, and the lower limit value of the second setting range is 10% of the volume of the waste liquid recovery device 3.
After the trigger 1 is started, the first air inlet pipeline 22 of the liquid storage device 2 is opened to supplement the first liquid storage cavity 21a with air, so that the inside of the first liquid storage cavity 21a is positive air pressure. The cleaning liquid is discharged to the cleaning area along the first liquid outlet pipe 24 under the positive pressure provided inside the liquid storage device 2. The plate washer 1 works normally to clean the aperture plate.
In some embodiments, the aperture plate washing control method further comprises the steps of:
step S300, if the liquid level of the cleaning liquid in the liquid storage device 2 is lower than the lower limit value of the first set range, stopping the plate washer 1. The liquid level of the cleaning liquid is lower than the lower limit value of the first set range, which means that the amount of the cleaning liquid in the liquid storage device 2 is too small to complete the cleaning operation. At this time, the controller controls the trigger 1 to stop and then controls the first pump 7 to start, and the first pump 7 pumps the cleaning liquid into the liquid storage device 2 to add the cleaning liquid to the liquid storage device 2. When the level of the cleaning liquid reaches the upper limit value of the first set range, it is indicated that the cleaning liquid in the liquid storage device 2 is sufficient and the first pump 7 is stopped.
Step 400, the cleaning solution is supplemented to the liquid storage device 2 until the liquid level of the cleaning solution reaches the upper limit value of the first set range. The upper limit of the first setting range is, for example, 95% of the volume of the liquid storage device 2. When the cleaning liquid reaches the upper limit value of the first set range, which means that the amount of cleaning liquid in the liquid storage device 2 is already sufficient, the plate washer 1 can use these cleaning liquids to complete the cleaning operation.
In some embodiments, the reservoir 2 is replenished with cleaning fluid in the following manner: the first pump 7 of the orifice plate cleaning system is turned on and the cleaning liquid is replenished to the liquid storage device 2 via the first pump 7 and the first liquid inlet pipe 25.
In some embodiments, the aperture plate washing control method further comprises the steps of:
step S500, if the liquid level of the waste liquid in the waste liquid recovery device 3 is higher than the upper limit value of the second set range, the plate washer 1 is stopped. The upper limit value of the second setting range is, for example, 70% of the volume of the waste liquid recovery device 3. When the liquid level of the waste liquid reaches the upper limit value of the second set range, which means that there is a relatively large amount of waste liquid in the waste liquid recovery device 3, there may be insufficient volume to store the waste liquid generated by the plate washer 1, so that the plate washer 1 needs to be stopped to avoid the phenomenon that the waste liquid is sucked into the plate washer 1 reversely, thereby causing the plate washer 1 to malfunction.
If the liquid level of the waste liquid in the waste liquid recovery device 3 is higher than the upper limit value of the second set range, the waste liquid in the waste liquid recovery device 3 is excessive; if not discharged, it may cause waste liquid in the washing area not to enter the waste liquid recovery device 3, and may also cause waste liquid to be sucked back, causing malfunction of the panel washer 1. Therefore, it is necessary to stop the plate washer 1 at this time.
And step S600, discharging the waste liquid in the waste liquid recovery device 3 until the liquid level of the waste liquid reaches the lower limit value of the second set range. Then, the lower limit value of the second setting range is 10% of the volume of the waste liquid recovery device 3.
In some embodiments, the waste liquid in the waste liquid recovery device 3 is discharged by the following steps: the second pump 8 of the orifice plate cleaning system is activated and the waste liquid is discharged out of the waste liquid recovery device 3 via the second pump 8 and the second liquid outlet pipe 33. The second pump 8 adopts a peristaltic pump, and the discharge amount of the waste liquid can be accurately controlled through the peristaltic pump.
As can be seen from the above-described shutdown conditions of the plate washer 1 and the above-described shutdown conditions of the plate washer 1, the plate washer 1 is shutdown when any one of the following conditions is satisfied: the liquid level of the cleaning liquid in the liquid storage device 2 is lower than the lower limit value of the first set range, and the liquid level of the waste liquid is higher than the upper limit value of the second set range. The plate washer 1 is started up only when the following two conditions are met simultaneously: the liquid level of the cleaning liquid in the liquid storage device 2 is higher than the lower limit value of the first set range, and the liquid level of the waste liquid is lower than the upper limit value of the second set range.
According to the pore plate cleaning control method provided by the technical scheme, whether the liquid level of the liquid storage device 2 is too low or not and whether the liquid level of the waste liquid in the waste liquid recovery device 3 is too high or not can be automatically identified, and the plate washer 1 is automatically stopped under the conditions that cleaning is impossible and liquid draining is impossible, so that the phenomenon of failure of the plate washer 1 caused by reverse suction of the waste liquid into the plate washer 1 is reduced; and can realize that washing liquid is automatic to be replenished, waste liquid is discharged automatically, does not need artifical frequent fluid replacement, flowing back, has saved the manpower, efficient.
In the description of the present invention, it should be understood that the terms "center," "longitudinal," "lateral," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, merely to facilitate description of the present invention and simplify the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the protection of the present invention.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may be modified or some technical features may be replaced with others, which may not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (11)
1. An aperture plate cleaning system, comprising:
a plate washer (1) comprising a distribution flow path, a liquid suction flow path and a washing zone for accommodating the orifice plate;
a liquid storage device (2) configured to store a cleaning liquid for cleaning the orifice plate; the liquid storage device (2) is in fluid communication with a distribution flow path of the plate washer (1) to provide cleaning liquid to the cleaning zone;
a waste liquid recovery device (3) in fluid communication with the liquid suction flow path; the waste liquid recovery device (3) is configured to recover waste liquid generated in the washing zone;
the first liquid level detection element (4) is arranged inside the liquid storage device (2) to detect the liquid level of the liquid storage device (2); and
a second liquid level detection element (5) installed inside the waste liquid recovery device (3) to detect the liquid level of the waste liquid recovery device (3); and
and the controller is electrically connected with the first liquid level detection element (4), the second liquid level detection element (5) and the plate washer (1), and is configured to control the plate washer (1) to start and stop according to the liquid levels detected by the first liquid level detection element (4) and the second liquid level detection element (5).
2. The orifice plate cleaning system of claim 1, further comprising:
a first pump (7) in communication with the reservoir (2); the first pump (7) is electrically connected with the controller; the controller is configured to activate the first pump (7) to replenish the liquid reservoir (2) with cleaning liquid when the liquid level detected by the first liquid level detection element (4) is below a lower limit value of a first set range.
3. An orifice plate cleaning system as claimed in claim 2, wherein said reservoir (2) comprises:
a reservoir (21) comprising a closed first reservoir chamber (21 a);
a first air inlet pipeline (22) communicated with a first air pump of the plate washer (1), wherein the first air pump supplies air to the interior of the first liquid storage cavity (21 a) through the first air inlet pipeline (22);
a first air outlet pipe (23) which is communicated with the first liquid storage cavity (21 a) so as to discharge the air which is conveyed to the first liquid storage cavity (21 a) through the first air inlet pipe (22); the first outlet line (23) is configured to have an opening time that is later than the opening time of the first inlet line (22) and later than the closing time of the first inlet line (22);
a first liquid outlet pipe (24), one end of which is communicated with the bottom of the first liquid storage cavity (21 a), and the other end of which is in fluid communication with a cleaning area of the plate washer (1); and
a first inlet pipe (25) with one end in fluid communication with the first reservoir (21 a) and the other end in fluid communication with the first pump (7).
4. The orifice plate cleaning system of claim 1, further comprising:
a second pump (8) in fluid communication with the waste liquid recovery device (3); the second pump (8) is electrically connected with the controller; the controller is configured to activate the second pump (8) to discharge the waste liquid in the waste liquid recovery device (3) when the liquid level detected by the second liquid level detection element (5) is higher than an upper limit value of a second set range.
5. The orifice plate cleaning system of claim 4, wherein the waste liquid recovery device (3) comprises:
a waste liquid recovery container (31) comprising a closed second liquid storage chamber (31 a);
a second liquid inlet pipe (32), one end of which is in fluid communication with the cleaning zone of the plate washer (1) and the other end of which is in fluid communication with the second liquid storage cavity (31 a);
a second outlet pipe (33), one end of which is in fluid communication with the bottom of the second liquid storage chamber (31 a), and the other end of which is in fluid communication with the second pump (8); and
and the gas pipeline (34) is communicated with a second air pump of the plate washer (1), and the second air pump provides negative pressure to the inside of the second liquid storage cavity (31 a) through the gas pipeline (34).
6. The orifice plate cleaning system of claim 1, further comprising:
and a display device (9) electrically connected with the controller for displaying the liquid level values detected by the first liquid level detection element (4) and the second liquid level detection element (5).
7. A method for controlling the cleaning of an orifice plate, characterized in that the method is realized by using the orifice plate cleaning system according to any one of claims 1 to 6, comprising the steps of:
detecting the liquid level of the cleaning liquid in the liquid storage device (2) and the liquid level of the waste liquid in the waste liquid recovery device (3);
and if the liquid level of the cleaning liquid in the liquid storage device (2) is higher than the lower limit value of the first set range and the liquid level of the waste liquid in the waste liquid recovery device (3) is lower than the upper limit value of the second set range, starting the plate washer (1).
8. The orifice plate cleaning control method of claim 7, further comprising the steps of:
stopping the plate washer (1) if the liquid level of the cleaning liquid in the liquid storage device (2) is lower than the lower limit value of the first set range;
and replenishing the cleaning solution to the liquid storage device (2) until the liquid level of the cleaning solution is not lower than the upper limit value of the first setting range.
9. The orifice plate cleaning control method according to claim 7, characterized in that the cleaning liquid is replenished to the liquid storage device (2) by:
a first pump (7) of the orifice plate cleaning system is turned on, and cleaning liquid is supplemented to the liquid storage device (2) through the first pump (7) and a first liquid inlet pipe (25).
10. The orifice plate cleaning control method of claim 7, further comprising the steps of:
stopping the plate washer (1) if the liquid level of the waste liquid in the waste liquid recovery device (3) is higher than the upper limit value of the second set range;
and discharging the waste liquid in the waste liquid recovery device (3) until the liquid level of the waste liquid is lower than the lower limit value of the second set range.
11. The orifice plate cleaning control method according to claim 10, characterized in that the waste liquid in the waste liquid recovery device (3) is discharged by:
a second pump (8) of the orifice plate cleaning system is started, and waste liquid is discharged out of the waste liquid recovery device (3) through the second pump (8) and a second liquid outlet pipe (33).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111219743.4A CN115990590A (en) | 2021-10-20 | 2021-10-20 | Orifice plate cleaning system and control method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111219743.4A CN115990590A (en) | 2021-10-20 | 2021-10-20 | Orifice plate cleaning system and control method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115990590A true CN115990590A (en) | 2023-04-21 |
Family
ID=85990792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111219743.4A Pending CN115990590A (en) | 2021-10-20 | 2021-10-20 | Orifice plate cleaning system and control method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115990590A (en) |
-
2021
- 2021-10-20 CN CN202111219743.4A patent/CN115990590A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101750647B1 (en) | Liquid supply device and substrate processing device | |
| EP2100149B1 (en) | Liquid waste management system | |
| CN201182590Y (en) | Cleaning and sterilizing device for endoscope | |
| CN107709997B (en) | Liquid discharge system and sample analyzer | |
| CN110034041B (en) | Treatment liquid supply device and degassing method thereof | |
| JP3628895B2 (en) | Treatment liquid supply device | |
| US9789425B2 (en) | Filter device and method of cleaning a filter element | |
| CN115990590A (en) | Orifice plate cleaning system and control method | |
| EP1820652A3 (en) | Method of detecting liquid residual quantity, failure detection device, liquid consuming apparatus, and liquid container | |
| CN216174757U (en) | Orifice plate cleaning system | |
| CN112881089A (en) | Sampling device, liquid path system and method thereof and sample analyzer | |
| CN112858660A (en) | Magnetic separation cleaning system and imbibition needle subassembly, immunoassay appearance thereof | |
| CN111456189A (en) | Air-lock type strong sewage draining device and sewage draining system | |
| CN114166830B (en) | Sampling needle pipeline and sampling judgment method | |
| CN114018877B (en) | Liquid path structure and method with double substrates capable of being automatically switched and removing bubbles | |
| JPH06265558A (en) | Container cleaner | |
| CN111150892A (en) | Docking equipment, waste liquid collecting and treating system and waste liquid treating method | |
| CN221148709U (en) | Liquid conveying device and sample analyzer | |
| CN217005985U (en) | Liquid path monitoring device for pipettor cleaning system and sample analyzer | |
| KR101266886B1 (en) | Apparatus for providing photoresists | |
| JPH08220106A (en) | Suction/delivery unit and automatic chemical analyzer employing it | |
| KR102644286B1 (en) | Quantitative supply pump of chemical liquid to remove bubbles | |
| CN217251251U (en) | Needle washing liquid path structure | |
| CN112786479B (en) | System and method for managing liquid supply | |
| CN218099210U (en) | Liquid path system of chemiluminescence immunoassay analyzer and chemiluminescence immunoassay analyzer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |