CN115684301A - Slurry pH value adjusting and detecting device and slurry processing device - Google Patents
Slurry pH value adjusting and detecting device and slurry processing device Download PDFInfo
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- CN115684301A CN115684301A CN202211203100.5A CN202211203100A CN115684301A CN 115684301 A CN115684301 A CN 115684301A CN 202211203100 A CN202211203100 A CN 202211203100A CN 115684301 A CN115684301 A CN 115684301A
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- 239000002002 slurry Substances 0.000 title claims abstract description 86
- 238000012545 processing Methods 0.000 title abstract description 5
- 238000006243 chemical reaction Methods 0.000 claims abstract description 58
- 238000001514 detection method Methods 0.000 claims abstract description 13
- 239000012066 reaction slurry Substances 0.000 claims abstract description 5
- 238000004140 cleaning Methods 0.000 claims description 70
- 238000003756 stirring Methods 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 30
- 239000000126 substance Substances 0.000 claims description 14
- 238000010979 pH adjustment Methods 0.000 claims description 11
- 238000005507 spraying Methods 0.000 claims description 7
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims 2
- 238000005259 measurement Methods 0.000 abstract description 5
- 239000007921 spray Substances 0.000 description 17
- 238000007599 discharging Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000005070 sampling Methods 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
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- 235000008733 Citrus aurantifolia Nutrition 0.000 description 4
- 235000011941 Tilia x europaea Nutrition 0.000 description 4
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- 238000010079 rubber tapping Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229910001424 calcium ion Inorganic materials 0.000 description 2
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- 238000004891 communication Methods 0.000 description 2
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- 210000004080 milk Anatomy 0.000 description 2
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- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
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- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
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Abstract
The invention provides a slurry pH value adjusting and detecting device and a slurry processing device. The invention provides a slurry pH value adjusting and detecting device, comprising: the reaction tank is suitable for containing reaction slurry, and an inlet of the reaction tank is communicated with an outlet of the slurry pipeline; the inlet of the discharge pipe is communicated with the outlet of the reaction tank, and a discharge pump is arranged on the discharge pipe; the buffer tank is communicated with the discharge pipe through a return pipe so that the slurry in the discharge pipe can be introduced into the buffer tank; a pH meter including a pH electrode positioned within the buffer tank to detect a pH of the slurry within the buffer tank. Therefore, the slurry pH value adjustment and detection device 100 has the advantages of simple structure, convenience in replacement of the pH electrode and accurate pH value measurement.
Description
Technical Field
The invention relates to the technical field of pH value detection, in particular to a slurry pH value adjusting and detecting device and a slurry processing device.
Background
The pH is often used as the end point of a chemical reaction to indicate the end of a process run. In the related art, a main medium, generally a slurry or a solution, is often fed into a pH mixing tank in the process, and a neutralizing agent such as an acid or a base is added into the mixing tank and then pumped to the next process. The pH measurement of the reaction tank is generally carried out in the following ways:
(1) Inserting a pH meter at the top of the reaction tank for direct online measurement, wherein an additional lifting device or an online cleaning device can be added in the measurement mode; because the reaction tank is still in the chemical reaction and the material mixing is not uniform, the pH value in the reaction tank has no production guiding significance, and in addition, the reaction tank is generally provided with stirring and is easy to damage a pH electrode.
(2) Sampling and measuring; sampling and measuring pH can be divided into manual sampling and automatic sampling, the manual sampling belongs to an off-line measuring mode, real-time adjustment on reaction cannot be carried out, in addition, the change of temperature and reaction time after sampling can also generate larger influence on the pH, and generally, the real situation of a site can not be represented. Automatic sampling in the related art mostly adopts a booster pump to depressurize the inside of a filter device, suck a clarifying medium, and measure pH in a sampler, in such a way that the physical properties of the measured medium are changed, and the hydrophilicity and electrical properties of solid particles change the hydrogen radical example concentration in the solution, so that the measured pH has a deviation from an actual value.
(3) The pump outlet is measured in-line. Chinese patent CN105056742A discloses a coal-fired desulfurization slurry pH detection device, which selects pH measured at the outlet of a pump to indicate the end point of reaction, but because media such as lime, lime milk, acid and the like are added into most reaction tanks, and in addition, calcium and magnesium ions carried by materials can generate scale formation. Just increasing cleaning equipment under this kind of circumstances, and the ejection of compact pipeline area presses, needs additionally to set up sealing device for directly setting up pH detection device structure on ejection of compact pipe (pump export) is comparatively complicated, and is with high costs, and the fault point is many, easily produces in the actual production operation and leaks, corrodes the scheduling problem. The workload is large, and the discharge pipe of the pH electrode must be stopped to output slurry in the replacement process, so that the production is inconvenient.
Disclosure of Invention
The present invention is directed to solving, at least in part, one of the technical problems in the related art. Therefore, the embodiment of the invention provides a slurry pH value adjusting and detecting device and a slurry processing device.
The slurry pH value adjusting and detecting device provided by the embodiment of the invention comprises:
the reaction tank is suitable for containing reaction slurry, and an inlet of the reaction tank is communicated with an outlet of the slurry pipeline;
the inlet of the discharge pipe is communicated with the outlet of the reaction tank, and a discharge pump is arranged on the discharge pipe;
the buffer tank is communicated with the discharge pipe through a return pipe so that the slurry in the discharge pipe can be introduced into the buffer tank;
a pH meter including a pH electrode positioned within the buffer tank to detect a pH of the slurry within the buffer tank.
Therefore, the slurry pH value adjustment detection device 100 according to the embodiment of the invention has the advantages of simple structure, convenience in replacement of the pH electrode and accurate pH value measurement.
The slurry pH value adjusting and detecting device provided by the embodiment of the invention further comprises an overflow pipe, wherein the buffer tank is positioned above the reaction tank, the buffer tank is provided with an overflow hole, the overflow hole is positioned above an inlet of the buffer tank, and the overflow hole is communicated with the inlet of the reaction tank through the overflow pipe.
In some embodiments, the return pipe is provided with a valve for controlling the opening and closing of the return pipe.
The slurry pH value adjusting and detecting device of the embodiment of the invention also comprises
The outlet of the acid-base neutralizer adding device is communicated with the inlet of the reaction tank;
the stirring device comprises a motor, a stirring shaft and stirring blades, wherein the motor is connected with the stirring shaft, the stirring blades are arranged on the stirring shaft, and the stirring blades are positioned in the reaction tank.
The slurry pH value adjusting and detecting device further comprises a cleaning device, and the cleaning device is used for cleaning the pH electrode.
In some embodiments, the top of the buffer tank is opened with a mounting hole, the pH electrode is detachably mounted in the mounting hole, and the pH electrode extends into the buffer tank.
In some embodiments, the cleaning device comprises an ultrasonic cleaning device, a water cleaning device, a chemical cleaning device, and a mechanical cleaning device.
In some embodiments, the cleaning device is an ultrasonic cleaning device comprising an ultrasonic generator located within the buffer tank;
or, the cleaning device is mechanical cleaning device, mechanical cleaning device includes cleaning brush and arm, the cleaning brush with the arm all is located in the buffer tank, the cleaning brush with the arm links to each other so that the arm drives the cleaning brush is followed the extending direction of pH electrode removes and with the surface contact of pH electrode.
In some embodiments, the cleaning device is a water cleaning device comprising a water spray device with an outlet directed towards a pH electrode located within the buffer tank;
or the cleaning device is a chemical cleaning device which comprises a cleaning solution spraying device, and an outlet of the cleaning solution spraying device faces to the pH electrode in the buffer tank.
The invention also provides a slurry treatment device which comprises the slurry pH value adjusting and detecting device provided by the embodiment of the invention.
Drawings
Fig. 1 is a schematic diagram of a slurry pH adjustment detection device according to an embodiment of the present invention.
Fig. 2 is a schematic view of a buffer tank according to an embodiment of the present invention.
Fig. 3 is a plan view of a buffer tank according to an embodiment of the present invention.
Reference numerals:
a slurry pH value adjusting and detecting device 100;
the device comprises a reaction tank 1, a discharge pipe 2, a discharge pump 3, a buffer tank 4, a mounting hole 5, a return pipe 6, a pH meter 7, a pH electrode 8, an overflow pipe 9, an overflow hole 10, a valve 11, acid-base neutralizer adding equipment 12, a water cleaning device 13, a motor 14, a stirring shaft 15, a stirring blade 16 and a slurry pipeline 17.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
The slurry pH adjustment detecting device 100 according to the embodiment of the present invention will be described below with reference to the drawings. As shown in fig. 1 to 3, a slurry pH adjustment detecting apparatus 100 according to an embodiment of the present invention includes a reaction tank 1, a discharge pipe 2, a buffer tank 4, and a pH meter 7.
The reaction tank 1 is adapted to contain a reaction slurry therein, and an inlet of the reaction tank 1 is communicated with an outlet of the slurry conduit 17. The inlet of the discharge pipe 2 is communicated with the outlet of the reaction tank 1, and the discharge pipe 2 is provided with a discharge pump 3.
The buffer tank 4 is communicated with the discharge pipe 2 through a return pipe 6 so that the slurry in the discharge pipe 2 can be introduced into the buffer tank 4. The pH meter 7 includes a pH electrode 8, and the pH electrode 8 is disposed in the buffer tank 4 so as to detect the pH of the slurry in the buffer tank 4.
In the related technology, a pH detection device is directly arranged on a discharge pipe (an outlet of a pump), and due to the fact that media such as lime, lime milk, acid and the like can be added into most reaction tanks, and in addition, calcium and magnesium ions carried by materials can generate scaling. Just increasing cleaning equipment under this kind of circumstances, and the ejection of compact pipeline area presses, needs additionally to set up sealing device for directly setting up pH detection device structure on ejection of compact pipe (pump export) is comparatively complicated, and is with high costs, and the fault point is many, easily produces in the actual production operation and leaks, corrodes the scheduling problem. The workload is large, and the discharge pipe of the pH electrode must be stopped to output slurry in the replacement process, so that the production is inconvenient.
The buffer tank 4 of the slurry pH value adjustment detecting device 100 according to the embodiment of the present invention is communicated with the discharging pipe 2 through the return pipe 6 so that the slurry in the discharging pipe 2 can be introduced into the buffer tank 4, and the pH electrode 8 is provided in the buffer tank 4 so as to detect the pH value of the slurry in the buffer tank 4. Therefore, when the slurry in the reaction tank 1 is discharged through the discharge pipe 2 after reaction, a part of the slurry in the discharge pipe 2 can be introduced into the buffer tank 4 through the return pipe 6, so that the pH electrode 8 can detect the pH value of the reacted slurry, the temperature, time and medium fluidity changes of the slurry measured by the pH electrode 8 are small, and the accuracy of the detected pH value of the slurry is improved.
Compared with the prior art in which the pH detection device is directly arranged on the discharge pipe (pump outlet), the slurry pH value adjustment detection device 100 provided by the embodiment of the invention is provided with the buffer tank 4 and the pH electrode in the buffer tank, so that the pH electrode can be positioned in a normal pressure environment, the structure is simple, the setting difficulty is low, the operation is simple when the pH electrode is replaced, the discharge pipe 2 is not required to stop outputting slurry, and the continuous production is facilitated.
Therefore, the slurry pH value adjustment detection device 100 according to the embodiment of the invention has the advantages of simple structure, convenience in replacement of the pH electrode and accurate pH value measurement.
As shown in fig. 1 to 3, a slurry pH adjustment detecting apparatus 100 according to an embodiment of the present invention includes a reaction tank 1, an acid-base neutralizing agent adding device 12, a stirring device, a discharging pipe 2, a buffer tank 4, an overflow pipe 9, a pH meter 7, and a cleaning device.
The reaction tank 1 is adapted to contain a reaction slurry therein, and an inlet of the reaction tank 1 is communicated with an outlet of the slurry conduit 17. The outlet of the acid-base neutralizer adding device 12 is communicated with the inlet of the reaction tank 1, and the acid-base neutralizer adding device 12 can spray acidic substances and alkaline substances. Specifically, the inlet of the reaction tank 1 is located at the top of the reaction tank 1, and the outlet of the reaction tank 1 is located at the lower side of the reaction tank 1. The slurry is introduced into the reaction tank 1 from the outlet of the slurry pipeline 17, and the acidic substance and the alkaline substance are introduced into the reaction tank 1 through the outlet of the acid-base neutralizing agent adding device 12 so as to neutralize the slurry in the reaction tank 1, so that the pH value of the slurry after reaction meets the production requirement. The up-down direction is shown by the arrows in fig. 1 and 2.
As shown in fig. 1, the stirring device comprises a motor 14, a stirring shaft 15 and a stirring blade 16, wherein the motor is connected with the stirring shaft, the stirring blade is arranged on the stirring shaft, and the stirring blade 16 is positioned in the reaction tank 1. Specifically, the motor 14 is located above the reaction tank 1, the stirring shaft 15 extends in the up-down direction, and the lower portion of the stirring shaft 15 extends into the reaction tank 1. The stirring blade 16 is provided at the bottom of the stirring shaft 15 so that the stirring device can stir the slurry in the reaction tank 1, thereby enabling the slurry to be uniformly mixed with the acidic substance or the alkaline substance, and further facilitating the adjustment of the pH value of the slurry.
As shown in FIG. 1, an inlet of a tapping pipe 2 is connected to an outlet of a reaction tank 1, and a tapping pump 3 is provided on the tapping pipe 2. So that the slurry can be discharged through the discharge pipe 2 after the pH value of the slurry is adjusted in the reaction tank 1.
As shown in fig. 1 to 3, the buffer tank 4 is communicated with the discharging pipe 2 through a return pipe 6 so that the slurry in the discharging pipe 2 can be passed into the buffer tank 4. Specifically, the inlet of the return pipe 6 is communicated with the position, which is located at the downstream of the discharging pump 3 and is adjacent to the discharging pump 3, of the discharging pipe 2, and the outlet of the return pipe 6 is communicated with the inlet of the buffer tank 4, so that slurry after the pH value is adjusted in the reaction tank 1 can be introduced into the buffer tank 4 through the discharging pipe 2 and the return pipe 6 in sequence. The buffer tank 4 can contain the slurry, so that the environment inside the buffer tank 4 is a normal pressure environment, thereby facilitating the installation and replacement of the pH meter 7.
As shown in fig. 1, in some embodiments, the buffer tank 4 is located above the reaction tank 1, the buffer tank 4 is provided with an overflow hole 10, the overflow hole 10 is located above an inlet of the buffer tank 4, and the overflow hole 10 is communicated with the inlet of the reaction tank 1 through an overflow pipe 9. This allows the slurry after the pH measurement to return to the reaction tank 1 through the overflow pipe 6, thereby reducing the waste of the slurry.
In some embodiments, the return pipe 6 is provided with a valve 11 for controlling the opening and closing of the return pipe. Specifically, the valve 11 is a ball valve which has a strong scraping effect on slurry shutoff and has a better sealing effect. Whereby it is possible to control whether the return pipe 6 is in communication with the outlet pipe 2 by means of a ball valve.
The pH meter 7 includes a pH electrode 8, and the pH electrode 8 is disposed in the buffer tank 4 so as to detect the pH of the slurry in the buffer tank 4. Specifically, the pH electrode 8 and the acid-base neutralizing agent adding device 12 are connected to the control system, and if the pH value of the slurry in the buffer tank 4 does not meet the requirement, the control system can control the amount of the acidic substance or the alkaline substance added into the reaction tank 1 by the acid-base neutralizing agent adding device 12, so that the adjusted pH value of the slurry meets the requirement.
As shown in fig. 2 and 3, in some embodiments, the top of the buffer tank 4 is opened with a mounting hole 5, the pH electrode 8 is detachably mounted in the mounting hole 5, and the pH electrode 8 extends into the buffer tank 4. Specifically, the top of the buffer tank 4 is provided with a flange communicated therewith, and the flange and the buffer tank 4 define a mounting hole 5. The pH electrode 8 is installed in the installation hole 5, so that the replacement of the pH electrode 8 is facilitated.
The cleaning device is used for cleaning the pH electrode 8. Specifically, the cleaning device includes an ultrasonic cleaning device, a water cleaning device 13, a chemical cleaning device, and a mechanical cleaning device.
In some embodiments, the cleaning device is an ultrasonic cleaning device comprising an ultrasonic generator located within the buffer tank 4, the ultrasonic generator emitting ultrasonic waves that can clean the slurry on the surface of the pH electrode 8.
In some embodiments, the mechanical cleaning device includes a cleaning brush and a mechanical arm, both of which are located in the buffer tank 4, and the cleaning brush is connected to the mechanical arm so that the mechanical arm moves the cleaning brush in the extending direction of the pH electrode 8 and contacts the outer surface of the pH electrode 8. For example, the robot arm includes a telescopic rod, and a telescopic portion of the telescopic rod is connected to the cleaning brush so as to drive the cleaning brush to clean the pH electrode 8.
In some embodiments, the cleaning device is a water cleaning device 13, the water cleaning device 13 comprising a water spray device, the outlet of the water spray device facing the pH electrode 8 located within the buffer tank 4. Specifically, the pH electrode 8 extends in the up-down direction, and the water cleaning device 13 further has a production water pipe connected to a water spray device, the production water pipe can supply water to the water spray device, the water spray device is located above the pH electrode 8, and a water spray opening of the water spray device faces downward, so that the water spray device can spray water downward and clean the pH electrode 8. For example, the water spray device is a water spray ring, and the water spray ring and the upper part of the pH electrode 8 are positioned in the water spray pipe, so that the water spray ring cleans the pH electrode 8.
In some embodiments, the cleaning device is a chemical cleaning device comprising a cleaning solution spray device, the outlet of which is directed towards the pH electrode 8 located within the buffer tank 4. The cleaning liquid spraying device is internally stored with cleaning liquid, the cleaning liquid is prepared by a special chemical reagent and water according to a certain proportion, and the cleaning device can effectively remove scale on the surface of the pH electrode 8. The cleaning modes of the electrodes are controlled by the controller and can be carried out discontinuously according to working conditions and actual conditions.
The invention also provides a slurry treatment device which comprises the slurry pH value adjusting and detecting device 100 according to the embodiment of the invention. Therefore, the slurry treatment device provided by the embodiment of the invention is convenient for treating slurry, and the environmental pollution is reduced.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, but are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and are not to be construed as limiting the invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; may be mechanically coupled, may be electrically coupled or may be in communication with each other; they may be directly connected or indirectly connected through intervening media, or they may be interconnected within two elements or in a relationship where two elements interact with each other unless otherwise specifically limited. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
In the present disclosure, the terms "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" and the like mean that a specific feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present disclosure. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although the above embodiments have been shown and described, it should be understood that they are exemplary and should not be construed as limiting the present invention, and that many changes, modifications, substitutions and alterations to the above embodiments may be made by those of ordinary skill in the art without departing from the scope of the present invention.
Claims (10)
1. A slurry pH value adjustment detection device is characterized by comprising:
the reaction tank is suitable for containing reaction slurry, and an inlet of the reaction tank is communicated with an outlet of the slurry pipeline;
the inlet of the discharge pipe is communicated with the outlet of the reaction tank, and a discharge pump is arranged on the discharge pipe;
the buffer tank is communicated with the discharge pipe through a return pipe so that the slurry in the discharge pipe can be introduced into the buffer tank;
a pH meter including a pH electrode positioned within the buffer tank to detect a pH of the slurry within the buffer tank.
2. The apparatus for adjusting and detecting pH value of slurry according to claim 1, further comprising an overflow pipe, wherein the buffer tank is located above the reaction tank, the buffer tank is provided with an overflow hole, the overflow hole is located above an inlet of the buffer tank, and the overflow hole is communicated with the inlet of the reaction tank through the overflow pipe.
3. The apparatus for detecting pH adjustment of slurry according to claim 1, wherein the return pipe is provided with a valve for controlling the opening and closing of the return pipe.
4. The apparatus for detecting pH adjustment of slurry according to claim 1, further comprising
The outlet of the acid-base neutralizer adding device is communicated with the inlet of the reaction tank;
the stirring device comprises a motor, a stirring shaft and stirring blades, wherein the motor is connected with the stirring shaft, the stirring blades are arranged on the stirring shaft, and the stirring blades are positioned in the reaction tank.
5. The apparatus for detecting pH adjustment of slurry according to any one of claims 1 to 4, further comprising a washing device for washing the pH electrode.
6. The apparatus as claimed in claim 5, wherein the top of the buffer tank is provided with a mounting hole, the pH electrode is detachably mounted in the mounting hole, and the pH electrode extends into the buffer tank.
7. The apparatus for detecting pH adjustment of slurry according to claim 6, wherein said cleaning means comprises an ultrasonic cleaning means, a water cleaning means, a chemical cleaning means and a mechanical cleaning means.
8. The apparatus for detecting pH adjustment of slurry according to claim 7,
the cleaning device is an ultrasonic cleaning device, the ultrasonic cleaning device comprises an ultrasonic generator, and the ultrasonic generator is positioned in the buffer tank;
or, the cleaning device is mechanical cleaning device, mechanical cleaning device includes cleaning brush and arm, the cleaning brush with the arm all is located in the buffer tank, the cleaning brush with the arm links to each other so that the arm drives the cleaning brush is followed the extending direction of pH electrode removes and with the surface contact of pH electrode.
9. The apparatus for detecting pH adjustment of slurry according to claim 7,
the cleaning device is a water cleaning device, the water cleaning device comprises a water spraying device, and an outlet of the water spraying device faces to the pH electrode positioned in the buffer tank;
or the cleaning device is a chemical cleaning device which comprises a cleaning solution spraying device, and an outlet of the cleaning solution spraying device faces to the pH electrode in the buffer tank.
10. A slurry treatment apparatus comprising the slurry pH adjustment detection apparatus according to any one of claims 1 to 9.
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| CN202211203100.5A CN115684301A (en) | 2022-09-29 | 2022-09-29 | Slurry pH value adjusting and detecting device and slurry processing device |
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| CN202211203100.5A CN115684301A (en) | 2022-09-29 | 2022-09-29 | Slurry pH value adjusting and detecting device and slurry processing device |
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| CN204177813U (en) * | 2014-09-04 | 2015-02-25 | 南京钛白化工有限责任公司 | Slurry pH value real-time detection apparatus |
| CN204320082U (en) * | 2014-12-16 | 2015-05-13 | 广西大新县雷平永鑫糖业有限公司 | Sugar refinery calcium carbonate activation equipment |
| CN210647485U (en) * | 2019-09-11 | 2020-06-02 | 中东金润新材料有限公司 | Automatic cleaning device for online detection pH meter |
| CN112619397A (en) * | 2020-11-04 | 2021-04-09 | 光大环境科技（中国）有限公司 | A thick liquid performance detection device for wet process deacidification |
| CN114790048A (en) * | 2021-01-26 | 2022-07-26 | 台湾地区“炜业中央投资有限公司” | Method for reducing fluorine content in wastewater by removing heavy metal process by-products |
| CN216039059U (en) * | 2021-07-30 | 2022-03-15 | 苏州宝典环保科技有限公司 | Sequencing batch type electric flocculation device |
| CN216747521U (en) * | 2022-01-24 | 2022-06-14 | 华能重庆珞璜发电有限责任公司 | Desulfurization slurry parameter measurement device with self-cleaning function |
| CN217392129U (en) * | 2022-02-17 | 2022-09-09 | 广东省豪鹏新能源科技有限公司 | Silicon negative electrode slurry stirring device |
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