CN115616690A - Optical anti-counterfeiting element with intersected micro-relief three-dimensional structure, product and preparation method - Google Patents
Optical anti-counterfeiting element with intersected micro-relief three-dimensional structure, product and preparation method Download PDFInfo
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- CN115616690A CN115616690A CN202210480753.1A CN202210480753A CN115616690A CN 115616690 A CN115616690 A CN 115616690A CN 202210480753 A CN202210480753 A CN 202210480753A CN 115616690 A CN115616690 A CN 115616690A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/324—Reliefs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/342—Moiré effects
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
- G02B30/26—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type
- G02B30/27—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type involving lenticular arrays
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Abstract
The invention relates to an optical anti-counterfeiting element with an intersected micro-relief three-dimensional structure, a product and a preparation method, wherein the preparation method comprises the following steps: s1, manufacturing a micro-relief three-dimensional structure array, enabling the micro-image-text array and the fixed point of the micro-lens array to be basically superposed, then synthesizing and superposing to obtain an intersected micro-relief three-dimensional structure array, and generating a corresponding micro-relief photoetching file; s2, preparing a metal nickel plate; s3, preparing a composite die metal nickel plate; s4, preparing an optical anti-counterfeiting film; s5, manufacturing a reflecting medium layer: and arranging a reflecting medium layer on the surface of the micro-relief three-dimensional structure array layer of the optical anti-counterfeiting film prepared in the step S4. The invention reduces the production difficulty, simplifies the process flow and ensures that the quality of the optical anti-counterfeiting element is more stable.
Description
Technical Field
The invention belongs to the technical field of optical anti-counterfeiting, and particularly relates to an optical anti-counterfeiting element with an intersected micro-relief three-dimensional structure, a product and a preparation method.
Background
With the rapid development of market economy, the requirements of middle and high-end products on the expression form, the image-text content and the anti-counterfeiting effect of the packaging product are higher and higher. Compared with the common packaging material, the dynamic and three-dimensional display anti-counterfeiting packaging material has attracted high attention of the industry due to the advantages of good anti-counterfeiting effect, high imitation difficulty, good visual effect and the like, and has made a remarkable breakthrough.
The microlens array imaging technology is a main technical classification of stereoscopic display, and becomes a novel public anti-counterfeiting technology exceeding the traditional optically variable image due to the fact that the microlens array imaging technology can be watched by naked eyes and the angle is free. The microlens array anti-counterfeiting film is characterized in that a microlens array and a matched microlens image-text array are manufactured on the surface of a film, the integrated imaging effect of the microlens array on the microlens image-text array is utilized to form various effects such as strong dynamic effect, stereo effect, transformation and the like, the film also comprises floating, sinking, parallel movement, orthogonal movement, double channels and the like, the film simultaneously has horizontal parallax and vertical parallax, the observation angle is free, and an observer can see stereo images and texts without any special observation equipment or skill; moreover, the technology has higher technical threshold, the micro-image-text can not be obtained by the traditional copying method, and the anti-counterfeiting effect is good.
Three essential elements of the existing microlens array imaging technology are: microlens array, transparent basement membrane and have the similar picture and text array with the microlens. The transparent basement membrane with certain thickness can make the focus of lens focus to little picture and text array layer to utilize the moir e principle of enlargeing to present clear, active picture and text. For example: patent documents CN 10156640, CN101443692, CN101120139, CN101346244, US5712731, US0034082, US4765656, US4892336, CN 105313529, CN1271106, CN 10156640 and the like disclose moire amplifiers with microlens arrays and image-text array structures on the same surface of a base film or on both surfaces of the base film. However, the applicant found that: the moir e amplifiers in these patent documents have the following drawbacks:
1. the design period errors of the micro lens array and the micro image-text array are in the submicron level, the precision requirement is extremely high, and the production difficulty is overhigh;
2. in the production process, the micro-lens array and the image-text array need to be processed respectively, so that the process flow is complex;
3. in order to meet the imaging requirement of the original processing method, the micro image-text needs to be positioned in the focal length interval of the micro lens, so that a thick base film is needed to meet the requirement of the focal length. In the conventional processing method, the thickness of the substrate needs to be increased to increase the rigidity of the whole structure, so that the cost is high, in order to avoid inaccurate alignment and pattern deformation caused by the problem of poor deformation of two times of processing.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide an optical anti-counterfeiting element which can provide a unique 3D visual effect and is low in production cost; another purpose is to provide a preparation method of the optical anti-counterfeiting element, which reduces the production difficulty, simplifies the process flow and further reduces the cost; another object is to provide at least one product applying said optical security element.
In order to achieve the purpose, the invention adopts the following technical scheme:
a preparation method of an optical anti-counterfeiting element with an intersected micro-relief three-dimensional structure comprises the following steps:
s1, manufacturing a micro-relief three-dimensional structure array: designing a micro image-text array and a micro lens array, carrying out space three-dimensional framework modulation on the micro image-text array and the micro lens array to ensure that the fixed points of the micro image-text array and the micro lens array are superposed, then synthesizing and superposing to obtain an intersected micro relief three-dimensional structure array, and generating a micro relief photoetching file corresponding to the intersected micro relief three-dimensional structure array; the synthesis superposition specifically comprises the following steps: intersecting and superposing the surface topography and the curvature of the micro image-text array and the micro lens array, so that the micro image-text array is nested in the micro lens array;
s2, preparing a metal nickel plate: exposing and cleaning a photosensitive adhesive layer on the photoetching glass according to the micro-relief photoetching file generated in the step S1 to obtain a micro-relief three-dimensional structure array A recorded on the photosensitive adhesive layer, then performing chemical plating on the surface of the micro-relief three-dimensional structure array A to form a conductive silver layer, and then immersing the conductive silver layer into an electrolytic bath for electroplating to obtain a metal nickel plate;
s3, preparing a composite die metal nickel plate: copying the micro-relief three-dimensional structure array A on the metal nickel plate by adopting an embossing method, and combining the array A with other arrays according to the design requirements of packagingHolographic laser junctionThe method comprises the following steps of (1) carrying out combined arrangement on the structures to obtain a composite die with a micro-relief three-dimensional structure array B, then carrying out chemical plating on the surface of the micro-relief three-dimensional structure array B to form a conductive silver layer, and then immersing the conductive silver layer into an electrolytic bath for electroplating to obtain a composite die metal nickel plate;
s4, preparing an optical anti-counterfeiting film: copying the micro-relief three-dimensional structure array B on the composite mold metal nickel plate obtained in the step S3 onto one side surface of a base material by adopting an imprinting method, curing, and forming a micro-relief three-dimensional structure array layer on one side surface of the base material to obtain an optical anti-counterfeiting film;
s5, manufacturing a reflecting medium layer: and arranging a reflecting medium layer on the surface of the micro-relief three-dimensional structure array layer of the optical anti-counterfeiting film prepared in the step S4.
Further, the structural line width of the micro image-text array in the micro-relief three-dimensional structure array obtained in S1 is in a range from 500 nanometers to 50 micrometers, the structural periods of the micro image-text array and the micro lens array are similar, and the ratio of the magnification of the micro image-text array after the imaging of the optical anti-counterfeiting element to the period difference between the micro image-text array and the micro lens array should meet the following requirements:
magnification M:
in the formula T L Is the lens period, T p Is the picture and text period;
radius of curvature r of lens:
wherein h is the lens height, phi L Is the lens size;
lens focal length f:
wherein n is the refractive index;
moire image size H i ：
Further, in S2, before the exposure, the method further includes: and adjusting exposure energy compensation according to the photosensitive adhesive layer so as to improve the generation quality of the surface curvatures of the micro image-text array and the micro lens array in the micro relief three-dimensional structure array A.
Preferably, in S2, the thickness of the photosensitive adhesive layer is 3 to 10 micrometers, and an included angle between the boundary side wall of the intersection region of the micro image-text array and the micro lens array in the micro relief three-dimensional structure array a and the photosensitive adhesive layer is not less than 60 degrees.
Preferably, the surface curve height of the micro graphic and text array is about 1/2 of the height of the micro lens array.
Further, in the step S2, the exposure is a first exposure to fabricate the micro image-text array and the micro lens array of the micro-relief three-dimensional structure array a, or a second exposure to sequentially fabricate the micro lens array and the micro image-text array of the micro-relief three-dimensional structure array a.
In some embodiments, the substrate in S4 is a substrate with an adhesion enhancement layer, and the surface of the micro-relief three-dimensional structure array layer is simultaneously subjected to a strong corona treatment in S5.
In other embodiments, the substrate in S4 is a release substrate, and the surface of the micro-relief three-dimensional structure array layer is simultaneously subjected to strong corona treatment in S5.
In other embodiments, the substrate in S4 is a substrate of an adhesion enhancing layer, and the surface of the micro-relief three-dimensional structure array layer is not treated in S5.
An optical security element of an intersecting micro-relief three-dimensional structure, comprising:
a substrate which is a transparent or translucent sheet material;
the micro-relief three-dimensional structure layer is arranged on the lower surface of the substrate and comprises a micro-lens array structure and a micro-image-text array structure; the micro-relief three-dimensional structure layer is an intersected micro-relief three-dimensional structure layer, the micro-image-text array structure is nested in the micro-lens array structure, and the micro-lens array structure is provided with a through groove communicated to the micro-image-text array structure;
and the reflecting medium layer is arranged on the lower surface of the micro relief three-dimensional structure layer.
Preferably, the side walls of the through slots are perpendicular to the horizontal plane.
Optionally, the microlens array structure is a convex microlens array or a concave microlens array.
The product is laser paper and comprises paper and the optical anti-counterfeiting element, wherein the surface of a reflecting medium layer of the optical anti-counterfeiting element is bonded with the paper.
A product which is laser composite paper and comprises paper and the optical anti-counterfeiting element prepared by the preparation method of claim 7, wherein the surface of the reflecting medium layer of the optical anti-counterfeiting element is bonded with the paper.
The other product is a full-transfer laser transfer paper with an anti-counterfeiting element, which comprises paper, a micro-embossed three-dimensional structure layer of the optical anti-counterfeiting element prepared by the preparation method of claim 8 and a reflecting medium layer, wherein the substrate of the optical anti-counterfeiting element is mechanically peeled off, and the surface of the reflecting medium layer is in adhesive connection with the paper; or the medium laser transfer paper with the anti-counterfeiting element three-dimensional structure comprises paper and a reflection medium layer of the optical anti-counterfeiting element, the substrate of the optical anti-counterfeiting element and the micro-relief three-dimensional structure layer are mechanically stripped, and the surface of the reflection medium layer is in adhesive connection with the paper.
In the embodiment of the invention, the adhesion enhancement layer is a solvent-type surface energy enhancement resin layer.
Compared with the prior art, the invention has the beneficial effects that:
1. the production difficulty is reduced: the method comprises the steps of respectively designing a micro image-text array and a micro lens array, synthesizing and superposing the micro image-text array and the micro lens array to obtain an intersected micro relief three-dimensional structure array, generating a micro relief photoetching file corresponding to the intersected micro relief three-dimensional structure array, and then carrying out processes of plate making, stamping and the like. Compared with the prior art, the method has the advantages that the micro-lenses and the micro-pictures and texts are respectively manufactured on the two sides of the substrate twice, the two times of processing are involved, deformation is generated during each time of processing, material loss is caused, the micro-pictures and the micro-lenses need to be accurately aligned, the alignment accuracy of some effects is required to be within 50 micrometers, so that a lot of waste products are low in qualification rate, the problems are well solved, and the production difficulty is reduced.
2. The process flow is simplified: the method comprises the steps of solving images to be presented to form a micro image-text array, manufacturing a micro lens array, carrying out synthetic operation on the micro image-text array and the micro lens array, synthesizing the surface topography and curvature of the micro image-text array and the micro lens array into a micro-relief three-dimensional microstructure, carrying out subsequent processing, changing plate making twice into one time, stamping twice into one time, and processing a substrate double-sided enhancement layer into a single side, thereby simplifying the process flow.
3. The image of the invention is a virtual image, so the focal length has no influence on the image, the problem of deformation in one-time processing is avoided, and the problem of registration in one-time structure making is avoided, so that the manufactured optical anti-counterfeiting element has high quality stability and high yield.
4. The micro image-text array and the micro lens array are overlapped in an intersecting mode, and the stereoscopic vision effect of the element is enhanced on the premise that the thickness of the element is not increased.
Drawings
FIG. 1 is a schematic flow chart of a method for manufacturing an optical security element according to the present invention;
FIG. 2 is a schematic view of an optical security element according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a method for manufacturing an optical security element according to an embodiment of the present invention;
fig. 4 is a schematic detailed schematic diagram of a manufacturing method of the optical anti-counterfeiting element according to an embodiment of the present invention;
fig. 5 is a schematic view of an optical security element according to a second embodiment of the present invention;
FIG. 6 is a schematic diagram of a method for manufacturing an optical security element according to a second embodiment of the present invention;
fig. 7 is a schematic detailed schematic diagram of a manufacturing method of an optical anti-counterfeiting element according to a second embodiment of the present invention;
fig. 8 is a schematic top view of a partial schematic view and a floating visual effect diagram of a micro-embossed three-dimensional structure array in an optical anti-counterfeiting element according to an embodiment of the present invention;
fig. 9 is a schematic top view of a partial schematic view and a sinking visual effect diagram of an array of micro-relief three-dimensional structures in an optical security element according to an embodiment of the present invention;
fig. 10 is a schematic top view, a partial schematic view and a floating visual effect diagram of a micro-embossed three-dimensional structure array in an optical anti-counterfeiting element according to a second embodiment of the present invention;
fig. 11 is a schematic top view of a partial schematic view and a sinking visual effect diagram of an array of micro-relief three-dimensional structures in an optical security element according to a second embodiment of the present invention;
FIG. 12 is a schematic view of an embodiment of the optical security element according to the present invention showing a 3D dynamic visual effect;
fig. 13 is a schematic view of an embodiment of the optical security element according to the present invention showing a multi-dimensional moving visual effect.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
As shown in fig. 1, the method for preparing an optical anti-counterfeiting element according to the present invention comprises:
s1, manufacturing a micro relief three-dimensional structure array: designing a micro image-text array and a micro lens array, carrying out space three-dimensional framework modulation on the designed micro image-text array and the designed micro lens array to ensure that the fixed points of the micro image-text array and the micro lens array are accurately superposed, then synthesizing and superposing to obtain a micro relief three-dimensional structure array, and generating a micro relief photoetching file; the arrangement mode of the micro-lens array can be square rectangle, hexagon, circumference and random distribution, the arrangement mode of the micro-image-text array corresponds to the micro-lens array, and the synthetic superposition refers to intersecting superposition (namely intersecting superposition, the surface appearance and the curvature of the micro-image-text array and the micro-lens array are intersected and superposed, so that the micro-image-text array is nested in the micro-lens array, and the micro-relief three-dimensional structure array file is obtained through synthesis).
The steps specifically include the following:
firstly, an image (vector or bitmap file) to be presented is solved to form a micro image-text array, meanwhile, a micro lens array is manufactured according to parameters such as the period, crown height, caliber, array (rectangle, hexagon, circumference, random distribution) and the like of the designed micro lens, the period of the micro lens is 30-100 micrometers, preferably 30-50 micrometers, the crown height is 2-9 micrometers, preferably 2-5 micrometers, the micro lens array at least comprises one of a spherical micro lens, an ellipsoid micro lens, a cylindrical micro lens and a Fresnel lens, and preferably a spherical micro lens;
and secondly, synthesizing and superposing the designed micro-lens array and the micro-image-text array in engineering software to generate a micro-relief photoetching file, wherein the space three-dimensional framework of the two arrays can be modulated by the software during superposition, the intersection superposition is selected, the convex micro-lens array or the concave micro-lens array can be selected as the micro-lens array, and the convex micro-lens array and the intersection superposition are preferably adopted.
Moreover, the structural line width range of the micro image-text array in the micro relief stereo structure array obtained by synthesis and superposition is between 500 nanometers and 50 micrometers, the structural period of the micro image-text array is similar to that of the micro lens array, and simultaneously the ratio of the multiplying power of the micro image-text array after the imaging of the optical anti-counterfeiting element and the period difference of the micro image-text array and the micro lens array meets the following requirements;
magnification M:
in the formula T L Is the lens period, T p Is the picture and text period;
lens curvature radius r:
wherein h is the lens height, phi L Is the lens size;
lens focal length f:
wherein n is the refractive index;
moire image size H i ：
S2, preparing a metal nickel plate: exposing and cleaning a photosensitive adhesive layer on the photoetching glass according to the micro-relief photoetching file generated in the step S1 to obtain a micro-relief three-dimensional structure array A recorded on the photosensitive adhesive layer, then performing chemical plating on the surface of the micro-relief three-dimensional structure array A to form a conductive silver layer, and then immersing the conductive silver layer into an electrolytic bath for electroplating to obtain a metal nickel plate; the method specifically comprises the following steps: loading the generated micro-relief photoetching file into high-speed laser direct writing equipment, exposing a photosensitive adhesive layer (photosensitive adhesive layer) on positive photoetching glass, then immersing the exposed photoetching glass into an alkaline developing solution for cleaning, removing the photosensitive adhesive after light exposure to obtain a micro-relief three-dimensional structure array A recorded on the photosensitive adhesive layer, plating a conductive silver layer on the surface of the micro-relief three-dimensional structure array A by using a chemical plating method (silver mirror reaction), and immersing the photoetching glass attached with a conductive layer into an electrolytic bath as a cathode to prepare the metallic nickel plate. The micro-image-text array and the micro-lens array of the micro-relief three-dimensional structure array A can be manufactured by adopting one-time exposure according to the structure of the micro-relief three-dimensional structure array in the micro-relief photoetching file, or the micro-lens array and the micro-image-text array of the micro-relief three-dimensional structure array A can be manufactured by adopting two-time exposure respectively and sequentially.
S3, preparing a composite die metal nickel plate: firstly, copying a micro-relief three-dimensional structure array A on a metal nickel plate by adopting an imprinting method, and combining and arranging other holographic laser structures according to the packaging design requirements to obtain a composite mold of a micro-relief three-dimensional structure array B; and then carrying out chemical plating on the surface of the micro-relief three-dimensional structure array B on the composite mould to form a conductive silver layer, immersing the conductive silver layer into an electrolytic bath for electroplating to prepare the composite mould metal nickel plate.
In a possible implementation mode, a micro-relief three-dimensional structure array A on a metal nickel plate is copied on the surface of a polyethylene terephthalate (PET) film with the thickness of 100-300 microns or Polycarbonate (PC) with the thickness of 1 mm by an ultraviolet curing nanoimprint lithography technology, and holographic laser structures such as diffraction gratings, blazed gratings, sine reflection gratings, sawtooth gratings, fresnel lenses and the like are combined and arranged according to the packaging design requirements to prepare a composite mold of a micro-relief three-dimensional structure array B; the micro-relief three-dimensional structure array A and the holographic laser structure are very flexible and diversified in arrangement and combination, and multiple micro-relief three-dimensional structure arrays A can be combined with different micro-nano structures at different positions, and meanwhile, the optimized PET with the thickness of 188 microns is obtained.
S4, preparing an optical anti-counterfeiting film: and copying the micro-relief three-dimensional structure array B on the composite mold metal nickel plate obtained in the step S3 onto one side surface of the base material by adopting an imprinting method, curing, and forming a micro-relief three-dimensional structure array layer on one side surface of the base material to obtain the optical anti-counterfeiting film.
In a possible embodiment, the optical anti-counterfeiting film is prepared by a rotary UV nanoimprint method, specifically, a micro-relief three-dimensional structure array B on a metal nickel plate of a composite mold manufactured in S3 is copied onto a substrate with the thickness of 15-50 microns by a reel nanoimprint equipment, and a material for forming the relief structure of the micro-relief layer needs to have the property that the material can deform at a certain temperature and pressure to form a required relief structure, and then can be shaped after cooling and energy absorption to maintain the three-dimensional structure of the micro-relief layer, so that the optical anti-counterfeiting film is obtained; the paint used in this step is an ultraviolet curing paint, preferably an ultraviolet curing paint mainly containing acrylic resin or epoxy resin or a mixed resin of the acrylic resin and the epoxy resin.
Of course, the conventional hot-pressing, die pressing, EB electron beam curing and other methods of the same imprinting can be adopted, and correspondingly, the thermoplastic coating and the EB electron beam curing coating are selected.
S5, manufacturing a reflecting medium layer: arranging a reflecting medium layer on the surface of the micro-relief three-dimensional structure array layer of the optical anti-counterfeiting film prepared in the S4; specifically, a reflective medium layer is coated on the surface of the micro-relief three-dimensional structure array layer in a coating, printing, deposition and other modes.
Preferably, before the exposure of S2, the exposure energy compensation is adjusted according to the photosensitive adhesive layer (the adjusting method is that firstly, a linear decreasing energy gradient ruler mode is adopted to test the etching depth of the photosensitive adhesive layer, then a depth curve is generated according to the test result, and the gain compensation is carried out according to the difference value between the depth curve and the depth curve), so that the generation quality of the surface curvatures of the micro-image-text array and the micro-lens array in the micro-relief three-dimensional structure array A is improved.
Preferably, in S2, the thickness of the photosensitive adhesive layer is 3 to 10 micrometers, and an included angle between a boundary side wall of an intersection region (i.e., a through groove 21 described below) of the micro image-text array and the micro lens array in the micro relief three-dimensional structure array a and the photosensitive adhesive layer is not less than 60 degrees. The design can avoid the inclination of the side wall of the intersection area of the micro image-text array and the micro lens array in the micro relief three-dimensional structure layer A on the photosensitive adhesive layer caused by the excessive energy absorbed by the surface layer of the photoresist due to poor matching degree of the positive photoresist and the exposure laser, so that the side wall of the through groove 21 in the micro relief three-dimensional structure layer of the optical anti-counterfeiting element can not be perpendicular to the horizontal plane, and the optical anti-counterfeiting element is deformed and blurred due to the excessive inclination of the side wall, and unfavorable light diffraction and stray light are generated.
Preferably, in S1, the height of the surface curve of the micro image-text array is about 1/2 of the height of the micro lens array, and the shapes of the micro lens array and the micro image-text array are ensured to be as complete as possible under the limited thickness of the photosensitive resist layer, so that the 3D visual effect is improved.
As shown in fig. 2 and 5, the optical anti-counterfeiting element prepared by the preparation method comprises a substrate 1, a micro-relief three-dimensional structure layer 2 and a reflective medium layer 3.
Wherein:
the substrate 1 is a transparent or semitransparent sheet material, and specifically may be a substrate with a thickness of 15 to 50 micrometers, the substrate may be at least partially transparent, may also be a colored dielectric layer, and may also be a multilayer film formed by compounding, and the substrate is generally formed by a thin film material with good physical and chemical resistance and high mechanical strength, for example: plastic films such as polyethylene terephthalate (PET) film, polyethylene naphthalate (PEN) film and biaxially oriented polypropylene (BOPP) film, preferably polyethylene terephthalate (PET) film having a thickness of 15 μm.
The micro-relief three-dimensional structure layer 2 is arranged on the lower surface of the substrate 1 and comprises a micro-lens array structure and a picture and text array structure; wherein the microlens array structure may be a convex microlens array (see fig. 3) or a concave microlens array (see fig. 6); the micro-relief three-dimensional structure layer 2 is an intersecting micro-relief three-dimensional structure layer (see fig. 3), the image-text array structure of the micro-relief three-dimensional structure layer is nested in the micro-lens array structure, a through groove 21 communicated with the image-text array structure is formed in the micro-lens array structure, the side wall of the through groove 21 in the micro-relief three-dimensional structure layer is perpendicular to a horizontal plane (the substrate 1), and the micro-relief three-dimensional structure layer is easy to process during photoetching.
The reflecting medium layer 3 is arranged on the micro-relief stereo structure layer2, lower surface. The reflecting medium layer 3 may include any one or a combination of the following various plating layers: a single-layer metal coating; a plurality of metal coatings; the coating is formed by sequentially stacking an absorption layer, a low-refractive-index dielectric layer and a reflection layer, and the absorption layer is in contact with the surface of the micro-relief three-dimensional structure layer 2; a high refractive index dielectric layer coating; a multi-medium layer coating formed by sequentially stacking a first high-refractive-index medium layer, a low-refractive-index medium layer and a second high-refractive-index medium layer, wherein the first high-refractive-index medium layer is in contact with the surface of the micro-relief three-dimensional structure layer 2; and a coating formed by sequentially stacking an absorption layer, a high-refractive-index medium layer and a reflection layer, wherein the absorption layer is in contact with the surface of the micro-relief three-dimensional structure layer 2. The high refractive index dielectric layer coating, the first high refractive index dielectric layer, the low refractive index dielectric layer and the second high refractive index dielectric layer are dielectric layers with refractive index of more than or equal to 1.7, and can be made of ZnS, tiN or TiO 2 、TiO、Ti 2 O 3 、Ti 3 O 5 、Ta 2 O 5 、Nb 2 O 5 、CeO 2 、Bi 2 O 3 、Cr 2 O 3 、Fe 2 O 3 、HfO 2 And ZnO, etc. The low-refractive-index dielectric layer is a dielectric layer with a refractive index less than 1.7, and the material of the low-refractive-index dielectric layer can be MgF 2 Or SiO 2 And the like. The material of the metal plating layer and the reflecting layer can be one metal or a mixture and an alloy of Al, cu, ni, cr, ag, fe, sn, au, pt and the like, and the material of the absorbing layer can be one metal or a mixture and an alloy of Cr, ni, cu, co, ti, V, W, sn, si, ge and the like. The material of the single-layer metal coating is preferably Al or ZnS.
The optical anti-counterfeiting element obtained by the preparation method can provide a unique 3D visual effect that naked eyes, dynamic 3D and micro characters can move in multiple dimensions: as shown in fig. 12, with the movement of the viewing angle, the micro-image, text, star of the optical anti-counterfeiting element presents a flickering dynamic visual effect that appears and disappears; as further shown in fig. 13, the micrographs a and B present a visual effect of movement in different dimensions when the optical security element is viewed from different perspectives. On the other hand, the refractive index range of the optical anti-counterfeiting element is 1.3-1.7, the imaging quality of the moire amplifier is high, the micro image-text layer array is formed by overlapping a plurality of image-texts with different periods, the hierarchical difference is displayed in a moire amplified image, namely, moire images with different depths of view are displayed, and the moire images which are three-dimensional and are floated, sunk, floated and staggered, sunk and transited to floated are generated.
The optical anti-counterfeiting element and the preparation method of the invention are further explained by the following specific examples.
The first embodiment is as follows:
the preparation method of the intersecting micro-relief three-dimensional structure of the embodiment comprises the following steps:
solving an image (vector or bitmap file) to be presented to form a micro image-text array P, and simultaneously manufacturing a micro lens array L (a convex micro lens array L +) according to parameters of a designed micro lens such as period, crown height, caliber, array (rectangle, hexagon, circumference, random distribution) and the like;
then, performing synthetic operation on the micro image-text array P and the micro lens array L in an intersection superposition mode to synthesize a micro-relief three-dimensional microstructure N by the surface topography and the curvature of the micro image-text array P and the micro lens array L, wherein the height of a surface curve of the micro image-text array P is about 1/2 of the height of the convex micro lens array L + (see 3a in fig. 3);
then, a rotary nanoimprint method is used, the micro-relief three-dimensional microstructure array is copied to the substrate 1 by solidifying the coating layer 2, and a reflecting medium layer 3 is arranged on the surface (non-substrate connecting surface) of the micro-relief three-dimensional microstructure array, so that the optical anti-counterfeiting element is obtained;
eventually an image of the moir e magnifier will be observed through the substrate 1 direction (see 3b in fig. 3).
As shown in fig. 4:
performing space three-dimensional framework modulation on the designed micro image-text array P and the convex micro lens array L +, and synthesizing the surface appearances and curvatures of the micro image-text array P and the convex micro lens array L + by adopting an intersection superposition method to obtain a micro-relief three-dimensional microstructure N; then recording the micro-relief three-dimensional microstructure N on a photosensitive adhesive layer D on the photoetching glass through exposure and development, forming a micro-relief three-dimensional structure array A on the photosensitive adhesive layer D on the photoetching glass, and then carrying out chemical plating and electroplating to obtain a metal nickel plate F; copying a micro-relief three-dimensional structure array A on the metal nickel plate by adopting an imprinting method, combining and arranging holographic laser effect structures according to the packaging design requirement to obtain a composite mold of a micro-relief three-dimensional structure array B, and then carrying out chemical plating and electroplating to obtain a metal nickel plate N of the composite mold; then copying the micro-relief three-dimensional structure array B on the composite die metal nickel plate N to one side surface of the base material G01 by adopting a rotary nano-imprinting method, and forming a micro-relief three-dimensional structure array layer G02 on one side surface of the base material G01 after curing; and finally, arranging a reflecting medium layer G03 on the surface of the micro-relief three-dimensional structure array layer G02 to obtain the optical anti-counterfeiting element G.
Because the microimage and text are not at the focus of the lens array in this embodiment, the finally observed image is a black forward magnified virtual image, and the magnification of the image conforms to the magnification principle of the microlens array:
when T is p Greater than T L When, a sink image (background) is presented, see fig. 5; when T is p Less than T L The time-lapse presents a floating image (foreground), see fig. 9.
Example two:
as shown in fig. 6, the second embodiment is substantially the same as the first embodiment except that the microlens array is a concave lens array, which is described as follows:
solving an image (vector or bitmap file) to be presented to form a micro image-text array P, and simultaneously manufacturing a micro lens array L (a concave micro lens array L-), according to parameters such as the period, crown height, caliber, array (rectangle, hexagon, circumference, random distribution) and the like of the designed micro lens;
then, performing synthetic operation on the micro image-text array P and the micro lens array L in an intersection superposition mode, so that the surface appearance and the curvature of the micro image-text array P and the micro lens array L are synthesized into a micro relief three-dimensional microstructure N, wherein the height of a surface curve of the micro image-text array P is about 1/2 of the height of the concave micro lens array L (see 6a in fig. 6);
then, a rotary nanoimprint method is used, the micro-relief three-dimensional microstructure array is copied to the substrate 1 by solidifying the coating layer 2, and a reflecting medium layer 3 is arranged on the surface (non-substrate connecting surface) of the micro-relief three-dimensional microstructure array;
eventually an image of the moir e magnifier will be observed through the substrate 1 direction (see 6b in fig. 6).
As shown in fig. 7: carrying out space three-dimensional framework modulation on the designed micro image-text array P and the concave micro lens array L-, and synthesizing the surface appearance and the curvature of the micro image-text array P and the concave micro lens array L-by adopting an intersection superposition method to obtain a micro relief three-dimensional microstructure N; then recording the micro-relief three-dimensional microstructure N on a photosensitive adhesive layer D on the photoetching glass through exposure and development, forming a micro-relief three-dimensional structure array A on the photosensitive adhesive layer D on the photoetching glass, and then carrying out chemical plating and electroplating to obtain a metal nickel plate F; copying a micro-relief three-dimensional structure array A on the metal nickel plate by adopting an imprinting method, combining and arranging holographic laser effect structures according to the packaging design requirement to obtain a composite mold of a micro-relief three-dimensional structure array B, and then carrying out chemical plating and electroplating to obtain a metal nickel plate N of the composite mold; then copying the micro-relief three-dimensional structure array B on the composite die metal nickel plate N to one side surface of the base material G01 by adopting a rotary nano-imprinting method, and forming a micro-relief three-dimensional structure array layer G02 on one side surface of the base material G01 after curing; and finally, arranging a reflecting medium layer G03 on the surface of the micro-relief three-dimensional structure array layer G02 to obtain the optical anti-counterfeiting element G.
Because the microimage-text designed by the embodiment is not in the focus of the lens array, the finally observed image is a black forward amplified virtual image, and the amplification factor of the image accords with the amplification principle of the microlens array:
when T is p Greater than T L The floating image (foreground) is presented, see in particular fig. 7, when T is p Less than T L A sinking image (background) is presented, see in particular fig. 11.
In fact, the optical anti-counterfeiting element can be used for bonding paper on the surface of the reflecting medium layer, and heating and curing to prepare laser paper with the anti-counterfeiting element; the base material with the adhesion enhancement layer can be adopted in S4, meanwhile, strong corona treatment (which can increase the binding force when a reflecting medium layer is subsequently vacuum-plated) is carried out on the surface of the micro-relief three-dimensional structure array layer in S5, and paper is bonded on the surface of the reflecting medium layer, so that the laser composite paper with the anti-counterfeiting element is prepared; and a release substrate can be adopted in S4, the surface treatment is not carried out on the micro-relief three-dimensional structure array layer in S5, and paper is bonded on the surface of the reflecting medium layer to prepare the laser transfer paper with the anti-counterfeiting element.
At present, under the requirement of a plastic limit order, a film base material is forbidden by a plurality of packaging products, and the reduction of the aperture of a micro-lens array unit is mostly utilized in the industry to reduce the thickness of the film, thereby reducing the use of the plastic film, but the problem of removing the plasticization of the packaging material is not fundamentally solved. According to the invention, a release substrate can be adopted in S4, strong corona treatment is carried out on the surface of the micro-relief three-dimensional structure array layer in S5, paper is adhered to the surface of the reflecting medium layer, and then the substrate is peeled off to prepare the full-transfer laser transfer paper with the anti-counterfeiting element, so that packaging and de-plasticizing are realized; and (4) adopting a base material with an adhesion enhancement layer in the step (S4), not processing the surface of the micro-relief three-dimensional structure array layer in the step (S5), adhering paper on the surface of the reflecting medium layer, then stripping the micro-relief three-dimensional structure layer from the base material to prepare the medium laser transfer paper with the anti-counterfeiting element three-dimensional structure, and also realizing the purpose of packaging and de-plasticizing.
The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited thereby, and any insubstantial changes and substitutions made by those skilled in the art based on the present invention are within the protection scope of the present invention.
Claims (17)
1. A preparation method of an optical anti-counterfeiting element with an intersected micro-relief three-dimensional structure is characterized by comprising the following steps:
s1, manufacturing a micro relief three-dimensional structure array: designing a micro image-text array and a micro lens array, carrying out space three-dimensional framework modulation on the micro image-text array and the micro lens array to ensure that the fixed points of the micro image-text array and the micro lens array are basically superposed, then synthesizing and superposing to obtain an intersected micro relief three-dimensional structure array, and generating a micro relief photoetching file corresponding to the intersected micro relief three-dimensional structure array; the synthesis superposition specifically comprises the following steps: intersecting and superposing the surface topography and the curvature of the micro image-text array and the micro lens array, so that the micro image-text array is nested in the micro lens array;
s2, preparing a metal nickel plate: exposing and cleaning a photosensitive adhesive layer on the photoetching glass according to the micro-relief photoetching file generated in the step S1 to obtain a micro-relief three-dimensional structure array A recorded on the photosensitive adhesive layer, then performing chemical plating on the surface of the micro-relief three-dimensional structure array A to form a conductive silver layer, and then immersing the conductive silver layer into an electrolytic bath for electroplating to obtain a metal nickel plate;
s3, preparing a composite die metal nickel plate: copying the micro-relief three-dimensional structure array A on the metal nickel plate by adopting an embossing method, and combining the array A with other arrays according to the design requirements of packagingHolographic laser junctionThe structures are combined and arranged to obtain a composite die with a micro-relief three-dimensional structure array B, then the surface of the micro-relief three-dimensional structure array B is chemically plated to form a conductive silver layer, and the conductive silver layer is immersed in an electrolytic bath for electroplating to obtain a composite die metal nickel plate;
s4, preparing an optical anti-counterfeiting film: copying the micro-relief three-dimensional structure array B on the composite mold metal nickel plate obtained in the step S3 onto one side surface of a base material by adopting an imprinting method, curing, and forming a micro-relief three-dimensional structure array layer on one side surface of the base material to obtain an optical anti-counterfeiting film;
s5, manufacturing a reflecting medium layer: and arranging a reflecting medium layer on the surface of the micro-relief three-dimensional structure array layer of the optical anti-counterfeiting film prepared in the step S4.
2. The preparation method according to claim 1, wherein the range of the structural line width of the micro image-text array in the micro relief three-dimensional structure array obtained in S1 is 500 nm to 50 μm, the structural periods of the micro image-text array and the micro lens array are similar, and the ratio of the magnification of the micro image-text array after the imaging of the optical anti-counterfeiting element to the period difference between the micro image-text array and the micro lens array satisfies the following requirements:
magnification M:
in the formula T L Is the lens period, T p Is the picture and text period;
radius of curvature r of lens:
wherein h is the lens height, phi L Is the lens size;
lens focal length f:
wherein n is the refractive index;
moire image size H i ：
3. The method according to claim 1, wherein the step S2, before the exposure, further comprises: and adjusting exposure energy compensation according to the photosensitive adhesive layer so as to improve the generation quality of the surface curvatures of the micro image-text array and the micro lens array in the micro relief three-dimensional structure array A.
4. The preparation method according to claim 1, wherein in the step S2, the thickness of the photosensitive adhesive layer is 3 to 10 micrometers, and an included angle between a boundary side wall of an intersection of the micro image-text array and the micro lens array in the micro relief three-dimensional structure array a and the photosensitive adhesive layer is not less than 60 degrees.
5. The method of claim 1 or 2 or 3 or 4 wherein the surface curve height of the microimage array is about 1/2 of the height of the microlens array.
6. The method according to claim 5, wherein the exposure in S2 is a first exposure to produce the micro image-text array and the micro lens array of the micro-relief three-dimensional structure array a, or a second exposure to produce the micro lens array and the micro image-text array of the micro-relief three-dimensional structure array a sequentially.
7. The preparation method according to claim 1, 2, 3, 4 or 6, wherein the substrate in S4 is a substrate with an adhesion enhancement layer, and in S5, while a reflective medium layer is disposed on the surface of the micro-relief three-dimensional structure array layer of the optical anti-counterfeiting film prepared in S4, strong corona treatment is performed on the surface of the micro-relief three-dimensional structure array layer.
8. The preparation method according to claim 1, 2, 3, 4 or 6, wherein the substrate in S4 is a release substrate, and in S5, a reflective medium layer is arranged on the surface of the micro-relief three-dimensional structure array layer of the optical anti-counterfeiting film prepared in S4, and simultaneously, strong corona treatment is performed on the surface of the micro-relief three-dimensional structure array layer.
9. The method according to claim 1, 2, 3, 4 or 6, wherein the substrate in S4 is a substrate having an adhesion enhancing layer, and the surface of the micro-relief three-dimensional structure array layer in S5 is not treated.
10. An optical anti-counterfeiting element with an intersected micro-relief three-dimensional structure, which is prepared by the preparation method of any one of claims 1 to 6, and is characterized by comprising the following steps:
a substrate (1) which is a transparent or translucent sheet of a layered material;
the micro-relief three-dimensional structure layer (2) is arranged on the lower surface of the substrate and comprises the micro-lens array structure and the micro-image-text array structure; the micro-relief three-dimensional structure layer (2) is an intersected micro-relief three-dimensional structure layer, the micro-image-text array structure is nested in the micro-lens array structure, and the micro-lens array structure is provided with a through groove (21) communicated to the micro-image-text array structure; and
and the reflecting medium layer (3) is arranged on the lower surface of the micro-relief three-dimensional structure layer (2).
11. An optical security element according to claim 10, characterized in that the side walls of the through slot (21) are perpendicular to the horizontal plane.
12. An optical security element according to claim 10, wherein the microlens array structure is a convex microlens array or a concave microlens array.
13. A product provided with an optical security element having an intersecting microrelief spatial structure according to any one of claims 1 to 6 or 10 or 11 or 12.
14. The product of claim 13, which is a laser paper comprising a paper and the optical security element, wherein the surface of the reflective medium layer of the optical security element is adhesively bonded to the paper.
15. A product, which is laser composite paper, comprising paper and the optical anti-counterfeiting element prepared by the method of claim 7, wherein the surface of the reflecting medium layer of the optical anti-counterfeiting element is bonded with the paper.
16. A product is characterized in that the product is a full-transfer laser transfer paper with an anti-counterfeiting element, and comprises paper, a micro-embossed three-dimensional structure layer of the optical anti-counterfeiting element prepared by the method of claim 8 and a reflecting medium layer, wherein the micro-embossed three-dimensional structure layer is mechanically peeled off from a substrate of the optical anti-counterfeiting element, and the surface of the reflecting medium layer is in adhesive connection with the paper.
17. A product is characterized by being medium laser transfer paper with a three-dimensional structure of an anti-counterfeiting element, comprising paper and a reflection medium layer of the optical anti-counterfeiting element prepared by the preparation method of claim 9, wherein the micro-relief three-dimensional structure layer is mechanically stripped from a substrate of the optical anti-counterfeiting element, and the surface of the reflection medium layer is in adhesive connection with the paper.
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