CN115537750A - N and Ta ion implantation titanium alloy modified coating and preparation method and application thereof - Google Patents
N and Ta ion implantation titanium alloy modified coating and preparation method and application thereof Download PDFInfo
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- CN115537750A CN115537750A CN202211186628.6A CN202211186628A CN115537750A CN 115537750 A CN115537750 A CN 115537750A CN 202211186628 A CN202211186628 A CN 202211186628A CN 115537750 A CN115537750 A CN 115537750A
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- ion implantation
- titanium alloy
- ion
- modified coating
- magnetron sputtering
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- 238000005468 ion implantation Methods 0.000 title claims abstract description 40
- 238000000576 coating method Methods 0.000 title claims abstract description 37
- 239000011248 coating agent Substances 0.000 title claims abstract description 36
- 229910001069 Ti alloy Inorganic materials 0.000 title claims abstract description 29
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 12
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 239000013077 target material Substances 0.000 claims description 4
- 229910000883 Ti6Al4V Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000002513 implantation Methods 0.000 abstract description 5
- 239000011159 matrix material Substances 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 7
- 239000000758 substrate Substances 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 238000004372 laser cladding Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000007745 plasma electrolytic oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
The invention belongs to the technical field of biological implantation materials, and particularly relates to a N and Ta ion implantation titanium alloy modified coating, and a preparation method and application thereof. According to the invention, N ion implantation and Ta ion implantation are carried out on the surface of the titanium alloy, then, magnetron sputtering Ta is carried out on the surface of the titanium alloy after ion implantation is completed, and finally, the titanium alloy modified coating is obtained. The obtained coating has good mechanical properties and excellent binding force with a matrix.
Description
Technical Field
The invention belongs to the technical field of biological implantation materials, and particularly relates to a N and Ta ion implantation titanium alloy modified coating, and a preparation method and application thereof.
Background
At present, the preparation of an antifriction and wear-resistant coating on the surface of a titanium alloy is one of the most effective methods for solving the problem of poor wear resistance of the titanium alloy. The antifriction and wear-resistant coating generally refers to a friction coating with low friction coefficient and small wear loss. The friction pair has the advantages that the friction and abrasion can be reduced or controlled by changing the microstructure of the friction pair or generating metal compounds and ceramics on the surface, such as ion implantation, laser cladding, laser shot blasting, surface nitridation, micro-arc oxidation and the like. Conventional single structure coatings have limitations in the in vivo environment. Therefore, the multi-phase, multi-layer and multi-scale mixed enhanced coating prepared by different surface composite modification technologies can fully exert the coordination, coupling and multifunctional response mechanisms among different phases in the coating.
The accelerated ions in the ion implantation technique are directed to the surface of the target material, but the penetration depth of the ion implantation at the surface of the material is typically only 100-500 nm. Too thin a coating will completely deteriorate the modifying layer. In addition, the friction pair is in direct contact with the substrate in the abrasion process, and the abrasion of the substrate is accelerated by hard particles generated by the abraded modified layer, so that the coating fails. And the bonding force of the substrate to the coating can also affect the protective properties of the coating.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention mainly aims to provide a preparation method of a titanium alloy modified coating by N and Ta ion implantation.
The invention also aims to provide the N and Ta ion implantation titanium alloy modified coating prepared by the method.
The invention further aims to provide application of the N and Ta ion implantation titanium alloy modified coating in preparation of an antifriction and wear-resistant material.
The purpose of the invention is realized by the following scheme:
a preparation method of a titanium alloy modified coating by N and Ta ion implantation comprises the following steps:
and performing N ion implantation and Ta ion implantation on the surface of the titanium alloy, and performing magnetron sputtering Ta on the surface of the titanium alloy after ion implantation is completed to finally obtain the titanium alloy modified coating.
The titanium alloy is Ti6Al4V, ti-2Al-2.5Zr or Ti-5Al-2.5Sn.
And (3) performing surface deoiling treatment on the titanium alloy before injection.
The vacuum pressure during the N ion implantation is 2 x 10 -4 ～5×10 -4 Pa, voltage of 50-80 Kv, and injection amount of 2 × 10 17 ～8×10 17 ion/cm 2 . Preferably, the vacuum pressure is 5 × 10 -4 Pa, voltage 60Kv, injection metering 5X 10 17 ion/cm 2 。
The vacuum pressure during the Ta ion implantation is 2X 10 -4 ～5×10 -4 Pa, voltage of 40-70 Kv, and injection amount of 2 × 10 17 ～8×10 17 ion/cm 2 . Preferably, the vacuum pressure is 5 × 10 -4 Pa, voltage 50Kv, injection amount 5X 10 17 ion/cm 2 。
The specific operation of magnetron sputtering Ta is to use pure Ta target material and pump the vacuum cavity to 5X 10 -4 Pa, heating the chamber to 200-400 ℃, controlling the power supply power to 1800-2000W, and introducing argon while carrying out magnetron sputtering. The magnetron sputtering time is 2-6h.
The N and Ta ion implantation titanium alloy modified coating is prepared by the method.
The N and Ta ion implantation titanium alloy modified coating is applied to preparing antifriction and wear-resistant materials.
Compared with the prior art, the invention has the following advantages and beneficial effects:
the TaN layer is formed on the surface of the titanium alloy firstly through ion implantation, the TaN0.1 phase can be formed through simultaneous implantation of N and Ta, and the TaN0.1 phase is favorable for improving the bonding capacity with the base material.
And carrying out magnetron sputtering on the coating after ion implantation to prepare a coating containing 2 Ta phase structures. In the initial stage of magnetron sputtering, beta-Ta is generated at a low temperature, which results in a hard and brittle coating. The matching degree of the beta-Ta lattice constant and the base material is poor, so that the interface bonding is weak, and the coating is easy to peel off. However, beta-Ta belongs to a metastable phase, taN0.1 unstable phase is formed during ion implantation, a small amount of N in an ion implantation coating seeps out in the high-temperature magnetron sputtering process, the N seepage amount is less, the coating of magnetron sputtering is not nitrided, but the beta-Ta phase is reduced, the generated alpha-Ta phase is increased, the toughness of the coating is improved, and the hardness of the Ta coating is improved.
Meanwhile, N can increase the sputtering work function of Ta atoms, thereby further reducing the activity of adsorbing Ta atoms moving to the surface of the substrate, improving the nucleation rate, promoting the refinement of crystal grains and further increasing the strength of the coating.
Detailed Description
The present invention will be described in further detail with reference to examples, but the embodiments of the present invention are not limited thereto.
The reagents used in the examples are commercially available without specific reference.
Example 1
A preparation method of a wear-resistant coating on the surface of a titanium alloy by N and Ta ion implantation comprises the following steps:
(1) And (3) grinding and polishing the surface of the Ti6Al4V alloy, then ultrasonically cleaning in ethanol, and drying for later use.
(2) Firstly, N ion implantation is carried out, and the vacuum pressure is 4 multiplied by 10 -4 Pa, voltage of 60Kv, and implantation dose of 5 × 10 17 ion/cm 2 . Then implanting Ta element with vacuum pressure of 4X 10 -4 Pa, voltage of 50Kv, and implantation dose of 5 × 10 17 ion/cm 2 . For ion implantation of Ta, argon (Ar) gas was introduced into the cathode arc source at a flow rate of 6sccm (standard cubic centimeters per minute).
(3) Magnetron sputtering of Ta
The specific operation of magnetron sputtering Ta is to use pure Ta target material and pump the vacuum cavity to 5X 10 -4 Pa, heating the chamber to 400 ℃, controlling the power of a power supply at 2000W, introducing argon while carrying out magnetron sputtering, and keeping the magnetron sputtering time for 4h.
Comparative example 1
This comparative example differs from example 1 in that only N ion implantation is performed.
Comparative example 2
This comparative example is different from example 1 in that only N ion implantation and Ta ion implantation are performed.
Comparative example 3
This comparative example differs from example 1 in that only magnetron sputtering of Ta was performed.
Comparative example 4
This comparative example differs from example 1 in that only N ion implantation and magnetron sputtering of Ta were performed.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be construed as equivalents thereof, and all such modifications are intended to be included in the scope of the present invention.
Claims (10)
1. A preparation method of a titanium alloy modified coating by N and Ta ion implantation is characterized by comprising the following steps:
and performing N ion implantation and Ta ion implantation on the surface of the titanium alloy, and performing magnetron sputtering Ta on the surface of the titanium alloy after ion implantation is completed to finally obtain the titanium alloy modified coating.
2. The method of claim 1, wherein: the vacuum pressure during the N ion implantation is 2 x 10 -4 ～5×10 -4 Pa, voltage of 50-80 Kv, and injection amount of 2 × 10 17 ～8×10 17 ion/cm 2 。
3. The method of claim 1, wherein: the vacuum pressure during the N ion implantation is 5X 10 -4 Pa, voltage 60Kv, injection amount 5X 10 17 ion/cm 2 。
4. According to the rightThe method of claim 1, wherein: the vacuum pressure during Ta ion implantation is 2X 10 -4 ～5×10 -4 Pa, voltage of 40-70 Kv, and injection amount of 2 × 10 17 ～8×10 17 ion/cm 2 。
5. The method of claim 1, wherein: the vacuum pressure during the Ta ion implantation is 5X 10 -4 Pa, voltage 50Kv, injection amount 5X 10 17 ion/cm 2 。
6. The production method according to claim 1, characterized in that: the specific operation of magnetron sputtering Ta is to use pure Ta target material, pump the vacuum cavity to 5 x 10 < -4 > Pa, heat the cavity temperature to 200-400 ℃, the power supply power is 1800-2000W, and introduce argon gas while carrying out magnetron sputtering.
7. The production method according to claim 1, characterized in that: the magnetron sputtering time is 2-6h.
8. The method of claim 1, wherein: the titanium alloy is Ti6Al4V, ti-2Al-2.5Zr or Ti-5Al-2.5Sn.
9. A N and Ta ion implanted titanium alloy modified coating prepared by the method of any one of claims 1 to 8.
10. The use of the N and Ta ion implanted titanium alloy modified coating according to claim 9 in the preparation of antifriction wear resistant materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211186628.6A CN115537750A (en) | 2022-09-27 | 2022-09-27 | N and Ta ion implantation titanium alloy modified coating and preparation method and application thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211186628.6A CN115537750A (en) | 2022-09-27 | 2022-09-27 | N and Ta ion implantation titanium alloy modified coating and preparation method and application thereof |
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| CN115537750A true CN115537750A (en) | 2022-12-30 |
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| CN202211186628.6A Pending CN115537750A (en) | 2022-09-27 | 2022-09-27 | N and Ta ion implantation titanium alloy modified coating and preparation method and application thereof |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020053997A (en) * | 2000-12-26 | 2002-07-06 | 신현준 | Manufacturing method of Ta films by magnetron sputtering |
| RU2008135603A (en) * | 2008-09-02 | 2010-03-10 | Общество с ограниченной ответственностью Научно-производственное предприятие "Уралавиаспецтехнология" (RU) | METHOD FOR PRODUCING ION-PLASMA NANO-LAYER COATING ON TURBO MACHINES OF TURBO MACHINES FROM TITANIUM ALLOYS |
| CN102181842A (en) * | 2011-04-14 | 2011-09-14 | 中国科学院上海硅酸盐研究所 | Method for modifying titanium surface |
-
2022
- 2022-09-27 CN CN202211186628.6A patent/CN115537750A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020053997A (en) * | 2000-12-26 | 2002-07-06 | 신현준 | Manufacturing method of Ta films by magnetron sputtering |
| RU2008135603A (en) * | 2008-09-02 | 2010-03-10 | Общество с ограниченной ответственностью Научно-производственное предприятие "Уралавиаспецтехнология" (RU) | METHOD FOR PRODUCING ION-PLASMA NANO-LAYER COATING ON TURBO MACHINES OF TURBO MACHINES FROM TITANIUM ALLOYS |
| CN102181842A (en) * | 2011-04-14 | 2011-09-14 | 中国科学院上海硅酸盐研究所 | Method for modifying titanium surface |
Non-Patent Citations (2)
| Title |
|---|
| 李建萍 等: "钽的氮离子注入法研究", 《表面技术》, vol. 24, no. 6, 31 December 1995 (1995-12-31), pages 16 - 22 * |
| 赵青 等: "升温Ta+N双注入对硬质合金性能的影响", 《核聚变与等离子体物理》, vol. 22, no. 1, 31 March 2002 (2002-03-31), pages 61 - 64 * |
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