CN115436409A - Method for measuring erosion rates of wall surfaces of different areas of plasma thruster - Google Patents

Method for measuring erosion rates of wall surfaces of different areas of plasma thruster Download PDF

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Publication number
CN115436409A
CN115436409A CN202210972200.8A CN202210972200A CN115436409A CN 115436409 A CN115436409 A CN 115436409A CN 202210972200 A CN202210972200 A CN 202210972200A CN 115436409 A CN115436409 A CN 115436409A
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wave plasma
helicon wave
calibration film
plasma source
film sample
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黄天源
李茂洋
季佩宇
吴雪梅
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Suzhou University
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Suzhou University
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2202Preparing specimens therefor

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
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Abstract

The invention discloses a method for measuring erosion rates of wall surfaces of different areas of a plasma thruster. Comprises the steps of preparing a calibration film sample: and placing the mask with the hole on a quartz substrate, performing sputtering deposition on the quartz substrate by adopting a magnetron sputtering device, uncovering the mask after the deposition is finished to obtain a calibration film sample, and measuring the thickness of the calibration film by adopting a step profiler and a scanning electron microscope. The calibration film sample is deposited on the quartz substrate, the mask is made of quartz material, so that the plasma performance of the plasma thruster is not greatly interfered and polluted, and in addition, the calibration film with the same material can be deposited according to different types of wall surface materials of the plasma thruster.

Description

Method for measuring erosion rates of wall surfaces of different areas of plasma thruster
Technical Field
The invention relates to a method for measuring erosion rates of wall surfaces of different areas of a plasma thruster, and belongs to the field of plasma reactive sputtering deposition.
Background
Over the past several decades, various types of space electric propulsion devices have been developed and successfully used in various types of space missions, such as ion grid thrusters, hall thrusters, and electrodeless magnetic nozzle thrusters based on radio frequency, helicon, microwave heating. The erosion effect of plasma on the wall surface of the plasma thruster is a key factor influencing the performance and the service life of the plasma thruster. For example, during the operation of the hall thruster, the plasma may cause sputtering erosion to the ceramic wall material, and the damage of the wall material may finally cause the magnetic circuit element to be exposed to the plasma, thereby terminating the life of the hall thruster. Even though there is no electromagnetic nozzle propeller, the strong interaction between the high density plasma and the inner wall of the dielectric tube will cause damage to the plasma source. To effectively evaluate the performance and life of a propeller, it is imperative to develop a method for measuring the erosion rate. How to realize quantitative monitoring of net erosion rate and hair erosion rate and net erosion rate is important for understanding the plasma-wall interaction process when the wall is eroded by the plasma and simultaneously accompanied by the redeposition process of sputtered materials from other areas.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a method for measuring the erosion rate of the wall surface of different areas of a plasma thruster.
The invention is realized by the following technical scheme:
a method for measuring erosion rates of different areas of a wall surface of a plasma thruster comprises the steps of preparing a calibration film sample: and placing the mask with the hole on a quartz substrate, performing sputtering deposition on the quartz substrate by adopting a magnetron sputtering device, uncovering the mask after the deposition is finished to obtain a calibration film sample, and measuring the thickness of the calibration film by adopting a step profiler and a scanning electron microscope.
The method for measuring the erosion rate of the wall surface of the plasma thruster in different areas further comprises the step of installing a calibration film sample, and the method comprises the following steps: and attaching the calibration film sample to the inner wall of a helicon wave plasma source tube of the helicon wave plasma device, and then starting the helicon wave plasma device.
The method for measuring the erosion rate of the wall surface of the plasma thruster in different areas further comprises a plasma sputtering process, and comprises the following steps: and adjusting the current of the magnetic field coil, the radio frequency input power and the air inflow parameter, and operating the helicon wave plasma source for 20-40 minutes under the steady state working state.
The method for measuring the erosion rate of the wall surface of the plasma thruster in different areas adopts a step profiler and a scanning electron microscope to measure the thickness of a sputtered film, calculates the erosion rate and the net erosion rate of the wall surface material according to the thickness difference and the running time of a calibration film before and after discharging, and combines the measurement of the calibration film in different wall surface positions to establish the overall sputtering and redeposition process of the inner wall surface of the helicon plasma source medium tube.
According to the method for measuring the erosion rate of the wall surface of the plasma thruster in different areas, the thickness of the calibration film is 0.8-1.2 mu m.
According to the method for measuring the erosion rate of the wall surface of the plasma thruster in different areas, the mask is made of a quartz plate, and two holes with different diameters are formed in the mask.
According to the method for measuring the erosion rate of the wall surface of the plasma thruster in different areas, the calibration film sample is attached to the inner wall of the helicon wave plasma source tube by adopting high-temperature ceramic glue.
The method for measuring the erosion rate of the wall surface of the plasma thruster in different areas comprises the following steps: the magnetic field coil current is 100A, the axial magnetic field strength of the helical wave plasma source region is 1300G, the discharge gas is argon, the flow is 50sccm, the frequency of the radio frequency source is 13.56MHz, the input power is 1000W, and the reflected power is lower than 50W.
The method for measuring the erosion rate of the wall surfaces of the plasma thruster in different areas comprises a vacuum chamber, wherein a helicon wave plasma source pipe is arranged in the vacuum chamber, a radio frequency antenna is arranged at the helicon wave plasma source pipe, a direct current magnetic field coil is further arranged outside the vacuum chamber, and the vacuum chamber is connected with an air inlet pipe.
The method for measuring the erosion rate of the wall surface of the plasma thruster in different areas is characterized in that a helicon wave plasma source shielding shell is arranged outside the helicon wave plasma source pipe.
The invention achieves the following beneficial effects:
1. the method can realize simple and rapid measurement of the erosion rate of the wall surface of the space plasma thruster, is beneficial to deepening understanding of the interaction process of plasma and substances on the wall surface of the thruster, and provides a solution for efficient evaluation of the performance and the service life of the space plasma thruster.
2. The calibration film sample is deposited on the quartz substrate, the mask is made of quartz material, so that the plasma performance of the plasma thruster is not greatly interfered and polluted, and in addition, the calibration film made of the same material can be deposited according to different types of wall surface materials of the plasma thruster.
3. The invention can simultaneously carry out measurement on a plurality of positions of the wall surface of the propeller, particularly electrode gaps, the inner side wall of the source tube and other areas which are difficult to reach by a common measurement method, shortens the experiment period and greatly reduces the experiment cost.
Drawings
FIG. 1 is a flow chart of the present invention for preparing a calibrated film sample.
Fig. 2 is a schematic structural view of a helicon wave plasma device.
In the figure: 1. the device comprises a vacuum chamber, 2, a calibration film sample, 3, a helicon wave plasma source tube, 4, a direct current magnetic field, 5, a helicon wave plasma source shielding shell, 6, a radio frequency antenna, 7, a coaxial transmission line, 8 and an air inlet tube.
Detailed Description
The invention is further described below. The following examples are only for illustrating the technical solutions of the present invention more clearly, and the protection scope of the present invention is not limited thereby.
A method of measuring a plasma thruster wall erosion rate, comprising the steps of:
1. an alumina calibration film sample was prepared for the alumina ceramic inside wall surface of the helicon wave plasma source tube in the example: firstly, two calibration films (the thickness is about 1 mu m) with a large diameter (10 mm) and a small diameter (1 mm) are pre-deposited on a quartz substrate by means of a mask and a magnetron sputtering device, the mask is uncovered after the deposition is finished, and the measurement of the thickness of the calibration films is finished by combining a step profiler and a scanning electron microscope. The mask is preferably a quartz plate (the thickness is 0.2mm, the length and the width are both 20mm, the quartz plate is provided with an opening, the diameter of a large hole is 10mm, and a small hole is 1 mm), the magnetron sputtering target plate is preferably alumina (the purity is 99.99%), and the precision of the calibration optimization of the film thickness is better than that of the measurement of a step instrument or a scanning electron microscope with the thickness of 1 mu m.
2. Calibration film sample installation: and opening the vacuum testing chamber 1, connecting the gas circuit and the circuit of the helicon wave plasma source, simultaneously attaching the calibration film sample 2 to the specified area to be tested on the inner wall surface of the helicon wave plasma source tube 3 by using high-temperature ceramic glue, closing the vacuum chamber after the ceramic glue is completely solidified, pumping the system to a background vacuum, and simulating a space environment. The ceramic glue is preferably SAUEREISEN alumina additive ceramic NO.2 PASTE, and ensures excellent thermal conductivity and solidification time of more than 48 hours on the premise of ensuring high temperature resistance.
3. Helicon plasma source start-up: and adjusting the current of the magnetic field coil 4, the radio frequency input power and the air inlet flow parameters, lighting the high-density helicon wave plasma, and enabling the helicon wave plasma source to run for 30 minutes under a steady-state working state to ensure that the plasma has enough sputtering erosion amount to the calibration film sample. The magnetic field coil current 100A is preferably selected to ensure a helicon wave plasma source area axial magnetic field strength 1300G, preferably argon gas as the discharge gas, a flow rate of 50sccm, preferably a radio frequency source frequency of 13.56MHz, an input power of 1000W, and a reflected power of less than 50W.
4. Helicon plasma source off sampling: stopping igniting the helicon wave plasma source, opening the vacuum chamber, and taking down all the calibration film samples adhered to the wall surface. During sampling, a small amount of alcohol (preferably 50% alcohol solubility) can be injected into the bonding position of the calibration film sample and the wall surface to promote the dissolution of the ceramic adhesive. When the calibration film sample is taken down, attention needs to be paid to not touching the film area so as to avoid the damage of the film, and meanwhile, the film needs to be prevented from touching the polluted area so as to ensure that the film is not polluted.
5. Calibration thin film analysis: and measuring the thickness of the sputtered film by combining the step profiler and the scanning electron microscope, and calculating the rough erosion rate (large-diameter calibration film) and the net erosion rate (small-diameter calibration film) of the wall material according to the thickness difference and the running time of the calibration film before and after discharging. And (3) combining the measurement of calibration samples at different wall surface positions to establish the overall sputtering and redeposition process of the inner wall surface of the dielectric tube of the helicon wave plasma source.
The invention has the following specific application and effects: the method is mainly used for testing the service life of the wall surfaces of the spiral wave and the Hall thruster, and can also be applied to the calibration of the sputtering rate of a target plate in the plasma sputtering deposition technology and the research of the erosion process of a fusion device facing to plasma materials.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.

Claims (10)

1. A method for measuring erosion rates of wall surfaces of different areas of a plasma thruster is characterized by comprising the following steps of preparing a calibration film sample: and placing the mask with the hole on a quartz substrate, performing sputtering deposition on the quartz substrate by adopting a magnetron sputtering device, uncovering the mask after the deposition is finished to obtain a calibration film sample, and measuring the thickness of the calibration film by adopting a step profiler and a scanning electron microscope.
2. The method of claim 1, further comprising a calibrated film sample mount comprising the steps of: and attaching the calibration film sample to the inner wall of a helicon wave plasma source tube of the helicon wave plasma device, and then starting the helicon wave plasma device.
3. The method of claim 2, further comprising a plasma sputtering process comprising the steps of: and adjusting the current of the magnetic field coil, the radio frequency input power and the air inflow parameter, and operating the helicon wave plasma source for 20-40 minutes under the steady state working state.
4. The method as claimed in claim 3, wherein the thickness of the sputtered film is measured by using a step profiler and a scanning electron microscope, the wall material erosion rate and net erosion rate are calculated based on the thickness difference and operating time of the calibration film before and after discharge, and the overall sputtering and redeposition process of the inner wall surface of the helicon plasma source medium tube is established in conjunction with the measurement of the calibration film at different wall surface positions.
5. The method as claimed in claim 4, wherein the thickness of the calibration film is 0.8-1.2 μm.
6. The method of claim 4, wherein the mask is a quartz plate having two holes with different diameters.
7. The method as claimed in claim 4, wherein the calibration film sample is attached to the inner wall of the helicon wave plasma source tube by using a high temperature ceramic adhesive.
8. The method of claim 4, wherein the plasma sputtering process comprises: the magnetic field coil current is 100A, the axial magnetic field strength of the helical wave plasma source region is 1300G, the discharge gas is argon, the flow is 50sccm, the frequency of the radio frequency source is 13.56MHz, the input power is 1000W, and the reflected power is lower than 50W.
9. The method as claimed in any one of claims 2 to 8, wherein the helicon wave plasma device comprises a vacuum chamber, the helicon wave plasma source tube is arranged in the vacuum chamber, a radio frequency antenna is arranged at the helicon wave plasma source tube, a direct current magnetic field coil is arranged outside the vacuum chamber, and the vacuum chamber is connected with an air inlet tube.
10. The method of claim 9, wherein a helicon wave plasma source shielding enclosure is disposed outside the helicon wave plasma source tube.
CN202210972200.8A 2022-08-15 2022-08-15 Method for measuring erosion rates of wall surfaces of different areas of plasma thruster Pending CN115436409A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117233079A (en) * 2023-11-10 2023-12-15 北京东方计量测试研究所 Online calibration device and calibration method for corrosion rate of propeller channel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117233079A (en) * 2023-11-10 2023-12-15 北京东方计量测试研究所 Online calibration device and calibration method for corrosion rate of propeller channel
CN117233079B (en) * 2023-11-10 2024-02-06 北京东方计量测试研究所 Online calibration device and calibration method for corrosion rate of propeller channel

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